JPS6355560A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS6355560A JPS6355560A JP19799986A JP19799986A JPS6355560A JP S6355560 A JPS6355560 A JP S6355560A JP 19799986 A JP19799986 A JP 19799986A JP 19799986 A JP19799986 A JP 19799986A JP S6355560 A JPS6355560 A JP S6355560A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- acid
- resin
- charge generation
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 10
- 239000011347 resin Substances 0.000 claims abstract description 10
- 229920006122 polyamide resin Polymers 0.000 claims abstract description 9
- 150000001875 compounds Chemical class 0.000 claims abstract description 8
- 108091008695 photoreceptors Proteins 0.000 claims description 21
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 6
- 238000012546 transfer Methods 0.000 abstract description 14
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 abstract description 5
- 229940005642 polystyrene sulfonic acid Drugs 0.000 abstract description 5
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 abstract description 5
- 239000002253 acid Substances 0.000 abstract description 2
- ILFFFKFZHRGICY-UHFFFAOYSA-N anthracene-1-sulfonic acid Chemical compound C1=CC=C2C=C3C(S(=O)(=O)O)=CC=CC3=CC2=C1 ILFFFKFZHRGICY-UHFFFAOYSA-N 0.000 abstract description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 abstract description 2
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 abstract description 2
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 1
- 239000000049 pigment Substances 0.000 description 15
- 239000000126 substance Substances 0.000 description 11
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 9
- 239000000203 mixture Substances 0.000 description 8
- 239000000243 solution Substances 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- 229920001778 nylon Polymers 0.000 description 4
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- SXQCTESRRZBPHJ-UHFFFAOYSA-M lissamine rhodamine Chemical compound [Na+].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=C(S([O-])(=O)=O)C=C1S([O-])(=O)=O SXQCTESRRZBPHJ-UHFFFAOYSA-M 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000515 polycarbonate Polymers 0.000 description 2
- 239000004417 polycarbonate Substances 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920002050 silicone resin Polymers 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- NGQSLSMAEVWNPU-YTEMWHBBSA-N 1,2-bis[(e)-2-phenylethenyl]benzene Chemical group C=1C=CC=CC=1/C=C/C1=CC=CC=C1\C=C\C1=CC=CC=C1 NGQSLSMAEVWNPU-YTEMWHBBSA-N 0.000 description 1
- VERMWGQSKPXSPZ-BUHFOSPRSA-N 1-[(e)-2-phenylethenyl]anthracene Chemical compound C=1C=CC2=CC3=CC=CC=C3C=C2C=1\C=C\C1=CC=CC=C1 VERMWGQSKPXSPZ-BUHFOSPRSA-N 0.000 description 1
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 1
- PYSRRFNXTXNWCD-UHFFFAOYSA-N 3-(2-phenylethenyl)furan-2,5-dione Chemical compound O=C1OC(=O)C(C=CC=2C=CC=CC=2)=C1 PYSRRFNXTXNWCD-UHFFFAOYSA-N 0.000 description 1
- CLQYLLIGYDFCGY-UHFFFAOYSA-N 4-(2-anthracen-9-ylethenyl)-n,n-diethylaniline Chemical compound C1=CC(N(CC)CC)=CC=C1C=CC1=C(C=CC=C2)C2=CC2=CC=CC=C12 CLQYLLIGYDFCGY-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229920000147 Styrene maleic anhydride Polymers 0.000 description 1
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 1
- MKYQPGPNVYRMHI-UHFFFAOYSA-N Triphenylethylene Chemical compound C=1C=CC=CC=1C=C(C=1C=CC=CC=1)C1=CC=CC=C1 MKYQPGPNVYRMHI-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 125000000609 carbazolyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3NC12)* 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- MRQIXHXHHPWVIL-UHFFFAOYSA-N chembl1397023 Chemical compound OC1=CC=C2C=CC=CC2=C1N=NC1=CC=CC=C1 MRQIXHXHHPWVIL-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 235000019325 ethyl cellulose Nutrition 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical group C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 229940079865 intestinal antiinfectives imidazole derivative Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- GACNTLAEHODJKY-UHFFFAOYSA-N n,n-dibenzyl-4-[1-[4-(dibenzylamino)phenyl]propyl]aniline Chemical compound C=1C=C(N(CC=2C=CC=CC=2)CC=2C=CC=CC=2)C=CC=1C(CC)C(C=C1)=CC=C1N(CC=1C=CC=CC=1)CC1=CC=CC=C1 GACNTLAEHODJKY-UHFFFAOYSA-N 0.000 description 1
- 229910001120 nichrome Inorganic materials 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 150000004866 oxadiazoles Chemical class 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920001467 poly(styrenesulfonates) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 229920006215 polyvinyl ketone Polymers 0.000 description 1
- 229920002102 polyvinyl toluene Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 150000004032 porphyrins Chemical group 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- RCYFOPUXRMOLQM-UHFFFAOYSA-N pyrene-1-carbaldehyde Chemical compound C1=C2C(C=O)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 RCYFOPUXRMOLQM-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229940006186 sodium polystyrene sulfonate Drugs 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 150000001651 triphenylamine derivatives Chemical class 0.000 description 1
- 125000006617 triphenylamine group Chemical group 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】 遺4分更 本発明は電子写真感光体に関するものである。[Detailed description of the invention] 4th anniversary The present invention relates to an electrophotographic photoreceptor.
丈米遺権
従来、アゾ顔料及びポリビニルブチラール樹脂を含有す
る電荷発生層と導電層との中間にポリアミド樹脂を含有
する下引層を設けることは、特開昭58−30757号
に見られるように公知である。しかしながら、このもの
は低温低湿下において、残留電位が上昇してしまう欠点
があった。Conventionally, a subbing layer containing a polyamide resin has been provided between a charge generation layer containing an azo pigment and a polyvinyl butyral resin and a conductive layer, as seen in JP-A-58-30757. It is publicly known. However, this product had the drawback that the residual potential increased under low temperature and low humidity conditions.
また、特開昭58−95744号にはポリアミド樹脂及
び導電性ポリマーを含有する下引層を設けた感光体を開
示しているが、このものは繰返し使用による疲労によっ
て感光体の感度が変化してしまう欠点があった。Furthermore, JP-A No. 58-95744 discloses a photoreceptor provided with an undercoat layer containing a polyamide resin and a conductive polymer, but this photoreceptor's sensitivity changes due to fatigue caused by repeated use. There was a drawback.
目 的
本発明は従来の欠点を克服したもので、繰返し使用して
も、残留電位が上昇したり、感度変化が少ない電子写真
感光体を提供することを目的とする。OBJECTS The present invention overcomes the conventional drawbacks, and aims to provide an electrophotographic photoreceptor that exhibits little increase in residual potential and little change in sensitivity even after repeated use.
碧−一一戒。Ao - 11 precepts.
本発明は前記目的を達成するために鋭意研究した結果、
導電性支持体と感光層との間に樹脂を主成分とする下引
層を設けた電子写真感光体において、前記下引層が、ス
ルホン酸基を有する化合物及びポリアミド樹脂を含有す
るものから構成されることを特徴とする電子写真感光体
を提供することによって前記目的が達成できることを見
出した。The present invention was developed as a result of intensive research to achieve the above object.
An electrophotographic photoreceptor in which a subbing layer mainly composed of a resin is provided between a conductive support and a photosensitive layer, wherein the subbing layer contains a compound having a sulfonic acid group and a polyamide resin. It has been found that the above object can be achieved by providing an electrophotographic photoreceptor characterized by:
以下、添付図面に従って本発明をさらに詳しく説明する
。第1図は本発明の電子写真感光体の構成例を示す断面
図であり、導電性支持体ll上に下引層12、感光層1
5が設けられている。感光層15は電荷発生層13.電
荷移動層14から構成さる。Hereinafter, the present invention will be described in more detail with reference to the accompanying drawings. FIG. 1 is a cross-sectional view showing an example of the structure of the electrophotographic photoreceptor of the present invention, in which a subbing layer 12 and a photosensitive layer 1 are provided on a conductive support 11.
5 is provided. The photosensitive layer 15 is the charge generating layer 13. It is composed of a charge transfer layer 14.
下引層12はスルホン酸基を有する化合物及びポリアミ
ド樹脂を含むものから構成される。The undercoat layer 12 is composed of a compound having a sulfonic acid group and a polyamide resin.
スルホン酸基を有する化合物としては、ポリエチレンス
ルホン酸、ポリスチレンスルホン酸、ベンゼンスルホン
酸、パラ−トルエン−スルホン酸、ナフタレンスルホン
酸、アントラセンスルホン酸等が挙げられる。好ましく
は、ポリスチレンスルホン酸、パラ−トルエン−スルホ
ン酸である。Examples of the compound having a sulfonic acid group include polyethylene sulfonic acid, polystyrene sulfonic acid, benzenesulfonic acid, para-toluene-sulfonic acid, naphthalene sulfonic acid, anthracene sulfonic acid, and the like. Preferred are polystyrene sulfonic acid and para-toluene sulfonic acid.
ポリアミド樹脂は線状のポリアミドが好ましく、いわゆ
るナイロン及び共重合ナイロンが用いられる。またN−
メトキシメチル化ナイロンも用いられる。The polyamide resin is preferably linear polyamide, and so-called nylon and copolymerized nylon are used. Also N-
Methoxymethylated nylons are also used.
スルホン酸基を有する化合物はポリアミド樹脂に対して
1〜20重量%添加するのが適当であり、好ましくは3
〜10重量%である。It is appropriate to add the compound having a sulfonic acid group in an amount of 1 to 20% by weight based on the polyamide resin, preferably 3% by weight.
~10% by weight.
下引層の膜厚は0.1〜5μmが好ましく、特に0.3
〜2μmが好適である。膜厚が薄くなりすぎると支持体
表面のごくわずかな欠陥、汚れ、付着物、傷などによる
異常画像が発生してしまう。The thickness of the subbing layer is preferably 0.1 to 5 μm, particularly 0.3 μm.
~2 μm is suitable. If the film thickness becomes too thin, abnormal images will occur due to minute defects, dirt, deposits, scratches, etc. on the surface of the support.
又、厚くなりすぎると、残留電位が上昇し、コピー上に
地肌汚れが発生してしまう。Furthermore, if it becomes too thick, the residual potential will increase and background stains will occur on the copy.
電荷発生層13は電荷発生物質のみから形成されていて
も、又、電荷発生物質がバインダーに均一に分散されて
形成されていてもよい。The charge generation layer 13 may be formed only from a charge generation substance, or may be formed by uniformly dispersing the charge generation substance in a binder.
バインダーとしては、ポリアミド、ポリウレタン、ポリ
エステル、エポキシ樹脂、ポリケトン、ポリカーボネー
ト、シリコーン樹脂、アクリル樹脂、ポリビニルブチラ
ール、ポリビニルホルマール、ポリビニルケトン、ポリ
スチレン。Binders include polyamide, polyurethane, polyester, epoxy resin, polyketone, polycarbonate, silicone resin, acrylic resin, polyvinyl butyral, polyvinyl formal, polyvinyl ketone, and polystyrene.
ポリ−N−ビニルカルバゾール、ポリアクリルアミドな
どが用いられる。Poly-N-vinylcarbazole, polyacrylamide, etc. are used.
電荷発生層としては、例えばシーアイピグメントブルー
25[カラーインデックス(CI)21180) 。As the charge generation layer, for example, CI Pigment Blue 25 [Color Index (CI) 21180] is used.
シーアイピグメントレッド41(CI 21200)、
シーアイアシッドレッド52(CI 45100)、シ
ーアイベーシックレッド3 (CI 45210)、さ
らに、ポリフィリン骨格を有するフタロシアニン系顔料
、カルバゾール骨格を有するアゾ顔料(特開昭53−9
5033号公報に記載)、ジスチリルベンゼン骨格を有
するアゾ顔料(特開昭53−133455号公報に記載
)、トリフェニルアミン骨格を有するアゾ顔料(特開昭
53−132547号公報に記載)、ジベンゾチオフェ
ン骨格を有するアゾ顔料(特開昭54−21728号公
報に記載)、オキサジアゾール骨格を有するアゾ顔料(
特開昭54−12742号公報に記載)、フルオレノン
骨格を有するアゾ顔料(特開昭54−22834号公報
に記載)、ビススチルベン骨格を有するアゾ顔料(特開
昭54−17733号公報に記載)、ジスチリルオキサ
ジアゾール骨格を有するアゾ顔料(特開昭54−212
9号公報に記載)。CI Pigment Red 41 (CI 21200),
C.I. Acid Red 52 (CI 45100), C.I. Basic Red 3 (CI 45210), phthalocyanine pigments having a porphyrin skeleton, azo pigments having a carbazole skeleton (JP-A-53-9
5033), azo pigments having a distyrylbenzene skeleton (described in JP-A-53-133455), azo pigments having a triphenylamine skeleton (described in JP-A-53-132547), dibenzo Azo pigments having a thiophene skeleton (described in JP-A-54-21728), azo pigments having an oxadiazole skeleton (
(described in JP-A-54-12742), azo pigments having a fluorenone skeleton (described in JP-A-54-22834), azo pigments having a bisstilbene skeleton (described in JP-A-54-17733) , an azo pigment having a distyryloxadiazole skeleton (JP-A-54-212
(described in Publication No. 9).
ジスチリルカルバゾール骨格を有するアゾ顔料(特開昭
54−17734号公報に記載)、 さらに、シーアイ
ピグメントブルー16 (CI 74100)等のフタ
ロシアニン系顔料、シーアイバットブラウン5 (CI
73410)、シーアイバットダイ(cエフ3030
)等のインジゴ系顔料、アルゴスカーレ□ットB(バイ
オレット社製)、インダンスレンスカーレットR(バイ
エル社製)等のペリレン系顔料などが挙げられる。これ
らの電荷発生物質は単独であるいは2種以上併用して用
いられる。Azo pigments having a distyrylcarbazole skeleton (described in JP-A-54-17734), phthalocyanine pigments such as C.I. Pigment Blue 16 (CI 74100), and C.I. Bat Brown 5 (CI
73410), C I Bat Die (c F3030)
), and perylene pigments such as Argo Scarlet B (manufactured by Violet) and Indance Scarlet R (manufactured by Bayer). These charge generating substances may be used alone or in combination of two or more.
バインダー樹脂は、電荷発生物質100重量部に対して
5〜100重量部用いるのが適当であり、好ましくは1
0〜50重量部である。The binder resin is suitably used in an amount of 5 to 100 parts by weight, preferably 1 to 100 parts by weight, based on 100 parts by weight of the charge generating substance.
It is 0 to 50 parts by weight.
電荷発生層は、電荷発生物質単独又は電荷発生物質とバ
インダーとを、テトラヒドロフラン、シクロヘキサン、
ジオキサン、ジクロルエタン等の溶媒を用いてボールミ
ル、アトライター、サンドミルなどにより分散し1分散
液を適度に希釈して、塗布することにより形成できる。The charge generation layer contains a charge generation substance alone or a charge generation substance and a binder, such as tetrahydrofuran, cyclohexane,
It can be formed by dispersing in a ball mill, attritor, sand mill, etc. using a solvent such as dioxane or dichloroethane, diluting the dispersion liquid appropriately, and applying the dispersion.
電荷発生層13の膜厚は、0.1〜1μm程度が適当で
ある。The thickness of the charge generation layer 13 is suitably about 0.1 to 1 μm.
電荷移動層14は、電荷移動物質およびバインダーを適
当な溶剤に溶解ないし分散し、これを電荷発生層13上
に塗布、乾燥することにより形成できる。また、必要に
より可塑剤やレベリング剤等を添加することもできる。The charge transfer layer 14 can be formed by dissolving or dispersing a charge transfer substance and a binder in a suitable solvent, coating the solution on the charge generation layer 13, and drying the solution. Moreover, a plasticizer, a leveling agent, etc. can also be added if necessary.
電荷移動物質としては、ポリ−N−ビニルカルバゾール
およびその誘導体、ポリ−ツーカルバゾリルエチルグル
タメートおよびその誘導体、ピレン−ホルムアルデヒド
縮合物およびその誘導体、ポリビニルピレン、ポリビニ
ルフェナントレン、オキサゾール誘導体、オキサジアゾ
ール誘導体、イミダゾール誘導体、トリフェニルアミン
誘導体、9−(p−ジエチルアミノスチリル)アントラ
セン、1,1−ビス−(4−ジベンジルアミノフェニル
)プロパン、スチリルアントラセン、スチリルピラゾリ
ン、フェニルヒドラゾン類、α−フェニルスチルベン誘
導体等の電子供与性物質が挙げられる。Charge transfer substances include poly-N-vinylcarbazole and its derivatives, poly-twocarbazolylethylglutamate and its derivatives, pyrene-formaldehyde condensate and its derivatives, polyvinylpyrene, polyvinylphenanthrene, oxazole derivatives, oxadiazole derivatives. , imidazole derivatives, triphenylamine derivatives, 9-(p-diethylaminostyryl)anthracene, 1,1-bis-(4-dibenzylaminophenyl)propane, styrylanthracene, styrylpyrazoline, phenylhydrazones, α-phenylstilbene Examples include electron-donating substances such as derivatives.
バインダーとしてはポリスチレン、スチレン−アクリロ
ニトリル共重合体、スチレン−ブタジェン共重合体、ス
チレン−無水マレイン酸共重合体、ポリエステル、ポリ
塩化ビニル、塩化ビニル−酢酸ビニル共重合体、ポリ酢
酸ビニル、ポリ塩化ビニリデン、ポレアリレート樹脂、
フェノキシ樹脂、ポリカーボネート、酢酸セルロース樹
脂、エチルセルロース樹脂、ポリビニルブチラール、ポ
リビニルホルマール、ポリビニルトルエン、ポリ−N−
ビニルカルバゾール、アクリル樹脂、シリコーン樹脂、
エポキシ樹脂、メラミン樹脂、ウレタン樹脂、フェノー
ル樹脂。Binders include polystyrene, styrene-acrylonitrile copolymer, styrene-butadiene copolymer, styrene-maleic anhydride copolymer, polyester, polyvinyl chloride, vinyl chloride-vinyl acetate copolymer, polyvinyl acetate, polyvinylidene chloride. , polyarylate resin,
Phenoxy resin, polycarbonate, cellulose acetate resin, ethyl cellulose resin, polyvinyl butyral, polyvinyl formal, polyvinyltoluene, poly-N-
vinyl carbazole, acrylic resin, silicone resin,
Epoxy resin, melamine resin, urethane resin, phenolic resin.
アルキレッド樹脂等の熱可塑性または熱硬化性樹脂が挙
げられる。溶剤としては、テトラヒドロフラン、ジオキ
サン、トルエン、モノクロルベンゼン、ジクロルエタン
、塩化メチレンなどが用いられる。Examples include thermoplastic or thermosetting resins such as alkyred resins. As the solvent, tetrahydrofuran, dioxane, toluene, monochlorobenzene, dichloroethane, methylene chloride, etc. are used.
電荷移動層14の厚さは、 5〜30μI程度が適当で
ある。The appropriate thickness of the charge transfer layer 14 is about 5 to 30 μI.
導電性支持体11としてはアルミニウム、ニッケル、ク
ロム、ニクロム、銅、酸化スズ、酸化インジウム等をプ
ラスチックフィルムに蒸着したもの、アルミニウム、ニ
ッケル、ステンレス等の板およびそれら゛をり、1..
1.1.、押出し。The conductive support 11 may be a plastic film on which aluminum, nickel, chromium, nichrome, copper, tin oxide, indium oxide, or the like is vapor-deposited, a plate made of aluminum, nickel, stainless steel, or the like; ..
1.1. , extrusion.
引抜き等の工法で素管化後、切削、超仕上げ、研摩等で
表面処理した管等を使用するここができる。It is possible to use pipes that have been made into blank pipes using methods such as drawing, and then surface-treated by cutting, superfinishing, polishing, etc.
以下、本発明を下記の実施例によってさらに具体的に説
明するが、本発明はこれらに限定されるものではないこ
とを理解すべきである。EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to the following examples, but it should be understood that the present invention is not limited thereto.
実施例1
0.2mm厚のアルミニウム板(JIS1070住友軽
金属製)に下記組成、
共重合ナイロン CM 8000(東し) 6.4
gメタノール 51・5gブタノ
ール 22.1g30%水溶液
(R紡N5C) 1.4gからなる下引
層用塗工液を乾燥後の膜厚が1μになる様に浸漬塗工し
た。Example 1 The following composition was applied to a 0.2 mm thick aluminum plate (JIS1070 manufactured by Sumitomo Light Metals), copolymerized nylon CM 8000 (East) 6.4
A coating solution for an undercoat layer consisting of 51.5 g of methanol, 22.1 g of butanol, and 1.4 g of a 30% aqueous solution (Rbo N5C) was applied by dip coating so that the film thickness after drying was 1 μm.
一方、次の組成、
シクロヘキサノン 19gから成る
混合物をボールミルポットに取り、ミル部材としてlO
φSUSボールを使用し、48時間ボールミリングした
後、さらにシクロヘキサノン20gを加えて1時間ミリ
ングした。On the other hand, take a mixture consisting of 19 g of cyclohexanone with the following composition into a ball mill pot, and use it as a mill member.
After ball milling for 48 hours using a φSUS ball, 20 g of cyclohexanone was further added and milling was carried out for 1 hour.
ミリングした後、ミルベースを取出し、固形分濃度が1
重量%になる様にミクロヘキサノンを加えて希釈、攪拌
して電荷発生層形成用の分散液を調整した。After milling, remove the mill base and make sure the solid content is 1.
A dispersion liquid for forming a charge generation layer was prepared by adding microhexanone to the mixture and diluting it to a weight %, and stirring the mixture.
この電荷発生層形成液を下引層上に浸漬塗布し、乾燥後
の厚さが0.2μの電荷発生層を形成した。 続いて、
下記組成、
下記構造式のヒドラゾン化合物 9g塩化メチレン
75gからなる電荷移動層形成
液を作成し、電荷発生層上に浸漬塗布し、乾燥後の厚さ
が約22μの電荷移動層を設け、導電性支持体−下引層
一電荷発生層一電荷移動層より成る電子写真感光体を作
成した。This charge generation layer forming liquid was dip coated onto the undercoat layer to form a charge generation layer having a thickness of 0.2 μm after drying. continue,
A charge transfer layer forming solution having the following composition and 9 g of a hydrazone compound having the following structural formula and 75 g of methylene chloride was prepared, and applied by dip coating onto the charge generation layer to form a charge transfer layer with a thickness of about 22 μm after drying. An electrophotographic photoreceptor consisting of a support, a subbing layer, a charge generation layer, and a charge transfer layer was prepared.
実施例2
実施例1の下引層塗工液において、ポリスチレンX/L
/ホン酸(VER3A−TL &72g紡N5C) ノ
代りにパラ−トルエンスルホン酸(関東化学層)を用い
て、膜厚1μの下引層を作成した。Example 2 In the undercoat layer coating solution of Example 1, polystyrene
/phonic acid (VER3A-TL & 72g Spun N5C) Using para-toluenesulfonic acid (Kanto Kagaku Seiya) instead of the above, a subbing layer with a film thickness of 1 μm was prepared.
また、下記の組成、
〔実施例1〕の電荷発生層形成液 50gからなる
電荷発生層形成液を下引層上に浸漬塗布し、乾燥後の厚
さが0.15μの電荷発生層を設けた。Further, a charge generation layer forming liquid having the following composition and 50 g of the charge generation layer forming liquid of [Example 1] was applied by dip coating onto the undercoat layer to form a charge generation layer having a thickness of 0.15 μm after drying. Ta.
続いて、下記組成、
1.1−ビス(4−ジベンジル
アミノフェニル)プロパン 9g(にF2O
、信越化学> 0.002g塩化メチ
レン 76gからなる電荷移動層
形成液を用意し、電荷発生層上に浸漬塗布し、乾燥後の
膜厚が約22μの電荷移動層を設け、導電性支持体−下
引層一電荷発生層一電荷移動層より成る電子写真感光体
を作成した。Subsequently, the following composition, 1.1-bis(4-dibenzylaminophenyl)propane 9g (in F2O
, Shin-Etsu Chemical > Prepare a charge transfer layer forming solution consisting of 76 g of 0.002 g methylene chloride, dip coat it onto the charge generation layer to form a charge transfer layer with a thickness of about 22 μm after drying, and apply the charge transfer layer to the conductive support. An electrophotographic photoreceptor consisting of an undercoat layer, a charge generation layer, and a charge transfer layer was prepared.
比較例1
実施例1の下引層塗工液においてポリスチレンスルホン
酸(VER5A−TL &72M紡N5C) (7)代
りにポリスチレンスルホン酸ナトリウム(ケミスタット
6120、三洋化成)を用いた以外は実施例1と全く同
一の材料、条件で電子写真感光体を作成した。Comparative Example 1 Same as Example 1 except that sodium polystyrene sulfonate (Chemistat 6120, Sanyo Chemical) was used instead of polystyrene sulfonic acid (VER5A-TL & 72M N5C) (7) in the undercoat layer coating solution of Example 1. Electrophotographic photoreceptors were produced using exactly the same materials and conditions.
比較例2
実施例1の下引層塗工液においてポリスチレンスルホン
酸(VER3A−TL Na12M、紡NSC)を除い
た以外は実施例1と全く同一の材料1条件で電子写真感
光体を作成した。Comparative Example 2 An electrophotographic photoreceptor was prepared using the same materials and conditions as in Example 1, except that polystyrene sulfonic acid (VER3A-TL Na12M, Spun NSC) was removed from the undercoat layer coating solution in Example 1.
以上のようにして作成した4種の電子写真感光体を静電
複写紙試験袋@ (SP 428型、川口電気製作所)
を使用し、以下の条件で電子写真特性を評価した(ダイ
ナミックモードで測定)。The four types of electrophotographic photoreceptors prepared as described above were placed in an electrostatic copying paper test bag @ (SP 428 type, Kawaguchi Electric Seisakusho)
The electrophotographic properties were evaluated using the following conditions (measured in dynamic mode).
まず、−6KVのコロナ放電を20秒間行ない、感光体
を帯電させた。帯電2秒後、20秒後の表面電位V2
(V) 、V+a(V)を測定し、更に20秒間暗所に
放置後の表面電位V、(V)を測定し、ついで4 、5
Luxのタングステン光を照射し、voが1/lOに減
衰する露光量E工、。(Lux−s、ec)および照射
30秒後の表面電位V、。(V)を測定し、初期特性と
した。First, -6 KV corona discharge was performed for 20 seconds to charge the photoreceptor. Surface potential V2 after 2 seconds and 20 seconds after charging
(V), V+a (V) was measured, and the surface potential V, (V) was further measured after being left in the dark for 20 seconds, and then 4, 5
Lux tungsten light is irradiated, and the exposure amount is E, where vo is attenuated to 1/1O. (Lux-s, ec) and surface potential V, 30 seconds after irradiation. (V) was measured and used as an initial characteristic.
更に、専用の疲労試験機に感光体サンプルを移し、−6
KVのコロナ放電と50Luxの光照射を40回/分、
約5000回繰返した後、直ちに感光体サンプルを前述
の静電複写紙試験装置に移し、初期特性を測定したとき
と同一条件でV z HV m gV、、E□、。、■
、。を測定し疲労特性とした。Furthermore, the photoreceptor sample was transferred to a dedicated fatigue tester, and -6
KV corona discharge and 50 Lux light irradiation 40 times/min.
Immediately after repeating about 5000 times, the photoreceptor sample was transferred to the electrostatic copying paper tester described above, and V z HV m gV,, E□, under the same conditions as when the initial characteristics were measured. ,■
,. was measured and used as fatigue characteristics.
測定結果を表−1に示す。The measurement results are shown in Table-1.
表 −1
表−1より、本発明の電子写真感光体は優れた電子写真
特性を示し、疲労により特性の変化も少ない、一方、比
較例1、比較例2の電子写真感光体は疲労により残留電
位V、。の上昇が大きく、また、感度E工、。の変化が
大きい。Table-1 Table-1 shows that the electrophotographic photoreceptor of the present invention exhibits excellent electrophotographic properties and shows little change in properties due to fatigue.On the other hand, the electrophotographic photoreceptors of Comparative Examples 1 and 2 have residual properties due to fatigue. Potential V. The increase in sensitivity is large, and the sensitivity E is also large. The change is large.
効 果
以上、述べたように、ポリアミド樹脂にスルホン酸基を
有する化合物を添加した下引層を形成することにより、
繰返し使用によっても残留電位の上昇や感度変化の少な
い電子写真感光体を実現できる。Effects As mentioned above, by forming an undercoat layer in which a compound having a sulfonic acid group is added to a polyamide resin,
It is possible to realize an electrophotographic photoreceptor with little increase in residual potential or change in sensitivity even after repeated use.
第1図は本発明の電子写真感光体の概略図を示す。
11・・・導電性支持体 12・・・下引層13・
・・電荷発生層 14・・・電荷移動層15・・
・感光層FIG. 1 shows a schematic diagram of the electrophotographic photoreceptor of the present invention. 11... Conductive support 12... Undercoat layer 13.
...Charge generation layer 14...Charge transfer layer 15...
・Photosensitive layer
Claims (1)
下引層を設けた電子写真感光体において、前記下引層が
、スルホン酸基を有する化合物及びポリアミド樹脂を含
有することを特徴とする電子写真感光体。1. In an electrophotographic photoreceptor in which a subbing layer mainly composed of a resin is provided between a conductive support and a photosensitive layer, the subbing layer contains a compound having a sulfonic acid group and a polyamide resin. An electrophotographic photoreceptor featuring:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19799986A JPS6355560A (en) | 1986-08-26 | 1986-08-26 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19799986A JPS6355560A (en) | 1986-08-26 | 1986-08-26 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6355560A true JPS6355560A (en) | 1988-03-10 |
Family
ID=16383828
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19799986A Pending JPS6355560A (en) | 1986-08-26 | 1986-08-26 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6355560A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0655654A1 (en) * | 1993-11-24 | 1995-05-31 | Fuji Electric Co., Ltd. | Photosensitive body for electrophotography |
-
1986
- 1986-08-26 JP JP19799986A patent/JPS6355560A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0655654A1 (en) * | 1993-11-24 | 1995-05-31 | Fuji Electric Co., Ltd. | Photosensitive body for electrophotography |
US5456989A (en) * | 1993-11-24 | 1995-10-10 | Fuji Electric Co., Ltd. | Photosensitive body for electrophotography |
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