JPS6355428U - - Google Patents

Info

Publication number
JPS6355428U
JPS6355428U JP14808286U JP14808286U JPS6355428U JP S6355428 U JPS6355428 U JP S6355428U JP 14808286 U JP14808286 U JP 14808286U JP 14808286 U JP14808286 U JP 14808286U JP S6355428 U JPS6355428 U JP S6355428U
Authority
JP
Japan
Prior art keywords
ultraviolet light
semiconductor manufacturing
irradiation surface
mercury
lamp
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14808286U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14808286U priority Critical patent/JPS6355428U/ja
Priority to US07/097,188 priority patent/US4768464A/en
Priority to US07/154,290 priority patent/US4803095A/en
Publication of JPS6355428U publication Critical patent/JPS6355428U/ja
Priority to US07/190,355 priority patent/US4974542A/en
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は照度対膜厚（ＳｉＯ２）の相関関係を
示す。第２図は従来ランプの放射照度分布を示す
。第３図は中心部に発光体のないランプの一例で
ある。第４図は中心部に発光体のないランプの放
射照度分布を示す。第５図は本考案の実施例を示
す。 FIG. 1 shows the correlation between illuminance and film thickness (SiO 2 ). FIG. 2 shows the irradiance distribution of a conventional lamp. FIG. 3 is an example of a lamp without a light emitter in the center. FIG. 4 shows the irradiance distribution of a lamp without a light emitter in the center. FIG. 5 shows an embodiment of the invention.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 大気圧より減圧状態に保持された光源用バルブ
内に水銀のみ、または水銀及びＡｒ，Ｋｒ等の希
ガスを封入した紫外光源用ランプを使用する半導
体作製用装置において、紫外光照射面での放射照
度分布を一定とするため、前記ランプの発光体中
心付近に紫外光照射面の外形と相似形の遮光板を
設けることを特徴とする半導体作製用装置。 In semiconductor manufacturing equipment that uses an ultraviolet light source lamp in which the light source bulb is kept at a pressure lower than atmospheric pressure and filled with mercury alone or with mercury and a rare gas such as Ar or Kr, radiation on the ultraviolet light irradiation surface is used. A semiconductor manufacturing apparatus characterized in that, in order to maintain a constant illuminance distribution, a light shielding plate having a shape similar to the outer shape of the ultraviolet light irradiation surface is provided near the center of the light emitting body of the lamp.
JP14808286U 1986-09-26 1986-09-26 Pending JPS6355428U (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP14808286U JPS6355428U (en) 1986-09-26 1986-09-26
US07/097,188 US4768464A (en) 1986-09-26 1987-09-16 Chemical vapor reaction apparatus
US07/154,290 US4803095A (en) 1986-09-26 1988-02-10 Chemical vapor reaction process by virtue of uniform irradiation
US07/190,355 US4974542A (en) 1986-09-26 1988-05-05 Photochemical vapor reaction apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14808286U JPS6355428U (en) 1986-09-26 1986-09-26

Publications (1)

Publication Number Publication Date
JPS6355428U true JPS6355428U (en) 1988-04-13

Family

ID=31062029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14808286U Pending JPS6355428U (en) 1986-09-26 1986-09-26

Country Status (1)

Country Link
JP (1) JPS6355428U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015520010A (en) * 2012-03-26 2015-07-16 ヘレーウス ノーブルライト ゲゼルシャフト ミット ベシュレンクテルハフツングＨｅｒａｅｕｓ Ｎｏｂｌｅｌｉｇｈｔ ＧｍｂＨ Substrate irradiation device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053016A (en) * 1983-09-02 1985-03-26 Toshiba Corp Sample processing equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6053016A (en) * 1983-09-02 1985-03-26 Toshiba Corp Sample processing equipment

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015520010A (en) * 2012-03-26 2015-07-16 ヘレーウス ノーブルライト ゲゼルシャフト ミット ベシュレンクテルハフツングＨｅｒａｅｕｓ Ｎｏｂｌｅｌｉｇｈｔ ＧｍｂＨ Substrate irradiation device

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