JPS6352782A - Electron beam welding machine - Google Patents
Electron beam welding machineInfo
- Publication number
- JPS6352782A JPS6352782A JP19395086A JP19395086A JPS6352782A JP S6352782 A JPS6352782 A JP S6352782A JP 19395086 A JP19395086 A JP 19395086A JP 19395086 A JP19395086 A JP 19395086A JP S6352782 A JPS6352782 A JP S6352782A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- electron beam
- welding
- gas
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000003466 welding Methods 0.000 title claims abstract description 42
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 35
- 238000010586 diagram Methods 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 241000566113 Branta sandvicensis Species 0.000 description 1
- 235000010005 Catalpa ovata Nutrition 0.000 description 1
- 240000004528 Catalpa ovata Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、電子ビーム溶接機、特に、その陰極寿命を
伸ばすようにした電子ビーム溶接機に関するものである
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an electron beam welding machine, and more particularly to an electron beam welding machine whose cathode life is extended.
第2図は、三菱電機枝線vDL、j−4<A 3 、
/910P’1t−10に示されている従来の電子ビー
ム溶接機の一例の構成図である。Figure 2 shows Mitsubishi Electric branch line vDL, j-4<A 3 ,
910P'1t-10 is a configuration diagram of an example of a conventional electron beam welding machine shown in FIG.
図において、符号(1)は電子ビーム(2)を発生させ
るための陰極、(3)は電子ビーム(2)を発生させる
だめの陰極(1)と、電子ビーム(,2)を加速させる
ための陽極(り)とにパワーを供給するための高電圧の
電源、(りは第2収束レンズに入る電子ビーム角度を調
整する第1収束レンズ、(6)は電子ビーム(,2)の
焦点を被溶接物(f)に合わせるための第コ収束レンズ
、(7)は電子ビーム(2)を偏向させて被溶接物(g
)Vc当てる偏向レンズ、(9)は陰極(1)および陽
極(り)を真空雰囲気にする電子銃室、(10)は電子
銃室(9)と溶接室との差圧を調整するための差圧室で
あって、(//)はそのオリフィスであシ、(/2)は
被溶接物(g)を真空雰囲気にするための溶接室である
。In the figure, the symbol (1) is the cathode for generating the electron beam (2), the symbol (3) is the cathode (1) for generating the electron beam (2), and the cathode (1) for accelerating the electron beam (, 2). (6) is the focal point of the electron beam (2), the first converging lens adjusts the angle of the electron beam entering the second converging lens, and A third converging lens (7) is used to align the electron beam (2) with the workpiece (g).
) A deflection lens that applies Vc, (9) is an electron gun chamber that creates a vacuum atmosphere for the cathode (1) and anode (ri), and (10) is an electron gun chamber for adjusting the differential pressure between the electron gun chamber (9) and the welding chamber. This is a differential pressure chamber, (//) is its orifice, and (/2) is a welding chamber for creating a vacuum atmosphere for the workpiece (g).
次に、この従来装置の動作について説明する。Next, the operation of this conventional device will be explained.
電子ビーム(2)は陰極(1)の加熱によ多発生する。The electron beam (2) is generated by heating the cathode (1).
発生した電子ビーム(2)は、高電圧電源(3)により
、陰極(1)と陽極(ll)との間で加速され、陽極(
り)に明けられている穴を通して、電子銃室(9)より
加速出力される。The generated electron beam (2) is accelerated between the cathode (1) and the anode (ll) by the high voltage power supply (3), and the anode (
Acceleration is output from the electron gun chamber (9) through the hole made in the electron gun chamber (9).
その後、差圧室(io)にある第1収束ンンズ(!r)
によって収束角度を調整され、溶接室(/、2)にある
第コ収束ンンズ(6)により、被溶接物(ff)に偏向
レンズ(7)によって偏向された角度で収束し、被溶接
物(r)に当たることにより、運動エネルギーが熱エネ
ルギーに変わシ、被溶接物(f)を溶融し、溶接を行な
う。After that, the first convergence lens (!r) located in the differential pressure chamber (io)
The convergence angle is adjusted by the welding chamber (/, 2), and the convergence lens (6) in the welding chamber (/, 2) converges on the workpiece (ff) at an angle deflected by the deflection lens (7). By hitting r), kinetic energy is changed to thermal energy, melting the workpiece (f) and performing welding.
なお、第2図中、矢印は真空排気装置による真空引きを
示す。Note that in FIG. 2, arrows indicate evacuation by the evacuation device.
その際、第3図に示すよ5K、逆に、被溶接物(ざ)に
より、多量のガスおよび金属蒸気が発生し、これらが電
子ビーム(2)により、イオン化され、電子ビーム(,
2)と反対に加速され、陰極(1)に当たる。At that time, as shown in Fig. 3, a large amount of gas and metal vapor is generated by the object to be welded, which is ionized by the electron beam (2).
It is accelerated in the opposite way to 2) and hits the cathode (1).
その結果、陰極(1)の表面は消耗され、また、アーキ
ング等を引き起こす。As a result, the surface of the cathode (1) is consumed, and arcing and the like occur.
次に、電子銃室(テ)、差圧室(10)、溶接室(〆2
)の関係について説明する。Next, the electron gun room (Te), the differential pressure room (10), the welding room (〆2
).
電子銃室(テ)は、上記のように、陰極(1)を加熱す
るために、通常高真空例えば、tX / 0−jPa
、 1ixt□−’艷rrにする必要があシ、また、−
服、溶接室(lコ)は、電子ビーム(コ)が空気中にあ
る気体分子と衝突して、エネルギーを失わない程度の圧
力、例えばりPa1 りX / 0−’ Torrの圧
力以下にする必要がある。従って、溶接室(/2)を相
対的に圧力の高い状態とし、電子銃室(ワ)を圧力の低
い状態にして使用しようとするためKは、差圧室(10
)およびオリフィス(//)が必要となる。As mentioned above, the electron gun chamber (TE) is usually kept under a high vacuum, e.g. tX/0-jPa, in order to heat the cathode (1).
, 1ixt□−'艷rr, and −
The pressure in the welding chamber (l) is set to a level that does not cause the electron beam (l) to collide with gas molecules in the air and lose energy, for example, at a pressure of Pa1/X/0-' Torr or less. There is a need. Therefore, in order to use the welding chamber (/2) in a relatively high pressure state and the electron gun chamber (W) in a low pressure state, K is the differential pressure chamber (10
) and orifice (//) are required.
従来の電子ビーム溶接機は、以上のように構成されてい
るので、陰極の消耗に応じて陰極を交換しなければなら
ず、また、アーキングを起こすという問題点があった。Since the conventional electron beam welding machine is configured as described above, the cathode must be replaced as it wears out, and there are also problems in that arcing occurs.
この発明は、上記のような問題点を解決するためになさ
れたもので、陰極の寿命を伸ばすとともにアーキングを
起こしにくい電子ビーム溶接機を得ることを目的とする
。This invention was made to solve the above-mentioned problems, and aims to provide an electron beam welding machine that extends the life of the cathode and is less likely to cause arcing.
この発明に係る電子ビーム溶接機は、溶接室中の電子ビ
ームの通路に当たる部分に、被溶接物に対して負の電位
が与えられ、かつ、溶接室の圧力よυ低い圧力を有し、
溶接室との境界部の電子ビームの通路にオリフィスを備
えている室を設けている。In the electron beam welding machine according to the present invention, a negative potential is applied to the workpiece to be welded to a part of the welding chamber corresponding to the path of the electron beam, and the pressure is lower than the pressure of the welding chamber,
A chamber with an orifice is provided in the electron beam path at the boundary with the welding chamber.
この発明における電子ビーム溶接機は、溶接室中で電子
ビームが被溶接物に当たり、これによって、被溶接物よ
υでる多量のガスおよび金属蒸気のイオン化されたもの
が、被溶接物に対して負の電位が与えられかつ溶接室の
圧力より低い圧力にした室により除去され、従って、電
子銃室にある陰極には当たらない。In the electron beam welding machine according to the present invention, the electron beam hits the workpiece in the welding chamber, and as a result, a large amount of ionized gas and metal vapor from the workpiece is negatively affected by the workpiece. , and is removed by the chamber at a pressure lower than that of the welding chamber, so that it does not impinge on the cathode located in the electron gun chamber.
以下、この発明をその一実施例を示す図に基づいて説明
する。The present invention will be explained below based on the drawings showing one embodiment thereof.
wc1図においで、符号(2/)は溶接室(/2)の圧
力より低い圧力をした室、(1)は室(2/)に被溶接
物Cr’)に対して負の電位を与えるための電源、(コ
3)および(,2p)は室(2/)のオリフィス、(,
2よ)は室(2/)と溶接室(/、りとを絶縁するだめ
の絶縁物である。In the wc1 diagram, the symbol (2/) is a chamber whose pressure is lower than that of the welding chamber (/2), and (1) is a chamber (2/) that gives a negative potential to the workpiece Cr'). The power supply for, (ko3) and (,2p) are the orifice of chamber (2/), (,
2) is an insulator that insulates the chamber (2/) and the welding chamber (/).
また、室(21)を溶接室(/2)より低い圧力に保つ
ため、および、電子ビーム(2)の通路を妨げないよう
にするために、室(2/)の上部と下部にオリフィス(
23) (2g)を設けている。In addition, orifices (
23) (2g) is provided.
また、その他の構成では、第コ収束ンンズ(A)と偏向
レンズ(ワ)とを室(2/)に取り付けている以外は、
第2図に示す従来の電子ビーム溶接機と同じ構成である
。従って、上記説明以外の符号によって示されるものは
、従来の電子ビーム溶接機におゆる同一符号によって示
すものと同等のものである。In addition, in other configurations, except that the converging lens (A) and the deflecting lens (W) are attached to the chamber (2/),
It has the same configuration as the conventional electron beam welding machine shown in FIG. Therefore, items indicated by reference numerals other than those described above are equivalent to those indicated by the same reference numerals in conventional electron beam welding machines.
次にこの実施例の動作について説明する。Next, the operation of this embodiment will be explained.
被溶接物(y)からヤだイオン化されたガスおよび金属
蒸気は、室(2/)の下部のオリフィス(2り)を通じ
て室(,2/ )中に入る。こ−の際、室(21)の壁
面に当ったガスおよび金属蒸気は、負の電荷を与えられ
て中性化さit、剛着−するか、又は、中性化されて室
(,2/) kこ入る。し、か12、気体分子よりも分
子量が太き゛いために、察(−2)〆)には入りにくい
し、また、室(,2/)の圧力より溶接g (/、2)
のff力が高いために、々g (,2/) K入つても
、上部のオリフィス(,2,?)より出K<<た:る。The ionized gas and metal vapor from the workpiece (y) enter the chamber (2/) through the orifice (2) at the bottom of the chamber (2/). At this time, the gas and metal vapor that hit the wall of the chamber (21) are either given a negative charge and become neutralized, or are neutralized and left in the chamber (21). /) Enter k. However, since the molecular weight is thicker than gas molecules, it is difficult to detect (-2)〆), and the pressure in the chamber (,2/) makes welding g (/,2)
Because of the high ff force of , even if ~g (,2/)K enters, K << will come out from the upper orifice (,2,?).
また、室(2/)の室内で拡散した分は壁面等に当たシ
、中性化されやすくなる。従って、中性化すると、加速
されなくなシ、ますます、上部のオリフィス(23)よ
り出にくくなる。Moreover, the amount diffused inside the room (2/) hits the wall surface, etc., and is easily neutralized. Therefore, when it is neutralized, it is no longer accelerated and it becomes increasingly difficult for it to come out from the upper orifice (23).
以上のように、この発明によれば、電子ビーム溶接機の
溶接室中の電子ビームの通路に当たる部分に被溶接物に
対して負の電位が与えられ、かつ、溶接室の圧力より低
い圧力にし、隣接する溶接室との境界部の電子ビームの
通路にオリフィスを備えている室を設けて構成している
ので、被溶接物から生じたガスや金属蒸気は室によって
これより陰極側へは進まず、従って、陰極に当たること
はなく、その結果、陰極の表面の消耗も少なくなシ、陰
極の交換頻度を減することができ、また、アーキングも
起きにくい電子ビーム溶接機が得られる効果を有してい
る。As described above, according to the present invention, a negative potential is applied to the workpiece to be welded to the part of the welding chamber of the electron beam welding machine that corresponds to the path of the electron beam, and the pressure is lower than the pressure of the welding chamber. Since the structure includes a chamber equipped with an orifice in the electron beam path at the boundary with the adjacent welding chamber, gas and metal vapor generated from the workpiece are prevented from advancing toward the cathode side by the chamber. First, it does not hit the cathode, and as a result, there is less wear on the surface of the cathode, which reduces the frequency of cathode replacement, and provides an electron beam welding machine that is less likely to cause arcing. are doing.
第1図はこの発明の一実施列による電子ビーム溶接機を
示す構成図、第2図は従来の電子ビーム溶接機を示す構
成図、第3図は陰極の消耗原理を示す説明図である。
(,2)・・電子ビーム、(ざ)・・被溶接物、(//
) 。
(,2,7) 、 (,2グ)・・オリフィス、(/2
)・・溶接室、(コ/)・・室、(,2,2)・・電源
。
なお、各図中、同一符号は同−又は相当部分を示す。
篤1図
2 : 電+ビーへ
8 ° 根寝+4#物
11.23.24 : オリフィス12; 溶梓
室
21: 霊
22:電源
′7tf、2図FIG. 1 is a block diagram showing an electron beam welding machine according to one embodiment of the present invention, FIG. 2 is a block diagram showing a conventional electron beam welding machine, and FIG. 3 is an explanatory diagram showing the principle of cathode consumption. (,2)...electron beam, (za)...workpiece, (//
). (,2,7), (,2g)...orifice, (/2
)...Welding room, (ko/)...Room, (,2,2)...Power supply. In each figure, the same reference numerals indicate the same or corresponding parts. Atsushi 1 Figure 2: Electric + Bee 8 ° Nene + 4 # thing 11.23.24: Orifice 12; Azusa chamber 21: Spirit 22: Power supply '7tf, 2 figure
Claims (1)
に対して負の電位が与えられており、かつ、溶接室の圧
力より低い圧力を有し、隣接する溶接室との境界部の電
子ビームの通路にオリフィスを備えている室を設けてい
ることを特徴とする電子ビーム溶接機。The part of the welding chamber that corresponds to the path of the electron beam is given a negative potential with respect to the workpiece, and has a pressure lower than the pressure of the welding chamber, and the electron beam at the boundary with the adjacent welding chamber is An electron beam welding machine characterized by having a chamber provided with an orifice in the beam passage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19395086A JPS6352782A (en) | 1986-08-21 | 1986-08-21 | Electron beam welding machine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19395086A JPS6352782A (en) | 1986-08-21 | 1986-08-21 | Electron beam welding machine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6352782A true JPS6352782A (en) | 1988-03-05 |
Family
ID=16316454
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19395086A Pending JPS6352782A (en) | 1986-08-21 | 1986-08-21 | Electron beam welding machine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6352782A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019121390A1 (en) * | 2017-12-22 | 2019-06-27 | Arcam Ab | Enhanced electron beam generation |
-
1986
- 1986-08-21 JP JP19395086A patent/JPS6352782A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019121390A1 (en) * | 2017-12-22 | 2019-06-27 | Arcam Ab | Enhanced electron beam generation |
CN111512410A (en) * | 2017-12-22 | 2020-08-07 | 阿尔卡姆公司 | Enhanced electron beam generation |
US11517975B2 (en) | 2017-12-22 | 2022-12-06 | Arcam Ab | Enhanced electron beam generation |
CN111512410B (en) * | 2017-12-22 | 2023-05-26 | 阿尔卡姆公司 | Enhanced electron beam generation |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US3046936A (en) | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof | |
US8878422B2 (en) | Device for producing an electron beam | |
CA2205576C (en) | An apparatus for generation of a linear arc discharge for plasma processing | |
JP6095568B2 (en) | ARC deposition source with defined electric field | |
US20220384138A1 (en) | Electron beam welding systems employing a plasma cathode | |
US3639151A (en) | Vapor randomization in vacuum deposition of coatings | |
EP0289577B1 (en) | Dynamic electron emitter | |
JPS6352782A (en) | Electron beam welding machine | |
US4531077A (en) | Ion source with improved primary arc collimation | |
KR100852114B1 (en) | Plasma gun | |
US5866974A (en) | Electron beam generator with magnetic cathode-protection unit | |
JP4113772B2 (en) | Negative ion source and negative ion beam generation method | |
Singh et al. | Various sputtered coating deposition techniques for the development of boron nitride based thin film coating: A review | |
JPH10275566A (en) | Ion source | |
JP2013008471A (en) | Gas ion source | |
JPS6117386A (en) | Electron beam welding machine | |
JPH03295199A (en) | High-speed atomic beam source device | |
JPH043056B2 (en) | ||
JP2689929B2 (en) | Evaporation source | |
JP2876248B2 (en) | Ion source | |
JPH01265439A (en) | Device for ionic beams | |
JPH01126598A (en) | Electron source | |
JPH01189838A (en) | Ion source | |
Opower et al. | Instability problems in transverse dc-discharges for high power CO2-lasers | |
JPS58157033A (en) | Ion generator |