JPS6347785B2 - - Google Patents

Info

Publication number
JPS6347785B2
JPS6347785B2 JP15293479A JP15293479A JPS6347785B2 JP S6347785 B2 JPS6347785 B2 JP S6347785B2 JP 15293479 A JP15293479 A JP 15293479A JP 15293479 A JP15293479 A JP 15293479A JP S6347785 B2 JPS6347785 B2 JP S6347785B2
Authority
JP
Japan
Prior art keywords
shield ring
cathode
magnet
sputtering
sputter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15293479A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5677380A (en
Inventor
Kensuke Nakada
Takehisa Nitsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP15293479A priority Critical patent/JPS5677380A/ja
Publication of JPS5677380A publication Critical patent/JPS5677380A/ja
Publication of JPS6347785B2 publication Critical patent/JPS6347785B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405Magnetron sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15293479A 1979-11-28 1979-11-28 Sputtering apparatus Granted JPS5677380A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15293479A JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15293479A JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Publications (2)

Publication Number Publication Date
JPS5677380A JPS5677380A (en) 1981-06-25
JPS6347785B2 true JPS6347785B2 (US20110009641A1-20110113-C00116.png) 1988-09-26

Family

ID=15551331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15293479A Granted JPS5677380A (en) 1979-11-28 1979-11-28 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5677380A (US20110009641A1-20110113-C00116.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112075U (US20110009641A1-20110113-C00116.png) * 1990-02-28 1991-11-15

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110873A (ja) * 1983-11-17 1985-06-17 Fujitsu Ltd タ−ゲットの冷却方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03112075U (US20110009641A1-20110113-C00116.png) * 1990-02-28 1991-11-15

Also Published As

Publication number Publication date
JPS5677380A (en) 1981-06-25

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