JPS6342702B2 - - Google Patents
Info
- Publication number
- JPS6342702B2 JPS6342702B2 JP11653784A JP11653784A JPS6342702B2 JP S6342702 B2 JPS6342702 B2 JP S6342702B2 JP 11653784 A JP11653784 A JP 11653784A JP 11653784 A JP11653784 A JP 11653784A JP S6342702 B2 JPS6342702 B2 JP S6342702B2
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- flange
- cathode body
- backing plate
- ultra
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 9
- 229910052802 copper Inorganic materials 0.000 claims description 9
- 239000010949 copper Substances 0.000 claims description 9
- 239000003507 refrigerant Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 description 5
- 238000007789 sealing Methods 0.000 description 4
- 229920001971 elastomer Polymers 0.000 description 3
- 239000000806 elastomer Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000010943 off-gassing Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明はスパツタリング装置用カソードに関す
るものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a cathode for a sputtering device.
従来の技術
スパツタリング装置用の従来のカソードにおい
ては冷媒（冷却水）のシールは一般にエラストマ
Ｏリングを用いて行なわれてきた。そして従来の
スパツタリング装置においては要求される到達圧
は精精10-7Torr台であつたためＯリングシール
でもガス放出等が問題となることはなかつた。し
かし近年残留ガスを少なくする観点からスパツタ
リング装置でも到達圧として10-8Torr〜
10-10Torr程度が要求されるようになつてきてい
る。従来のＯリングシールでは十分に焼出しもで
きず、ガス放出が多いため10-10Torr台は無論の
こと10-8Torr台にすることも困難であつた。BACKGROUND OF THE INVENTION In conventional cathodes for sputtering equipment, refrigerant (cooling water) sealing has generally been accomplished using elastomeric O-rings. In conventional sputtering equipment, the ultimate pressure required was in the precision range of 10 -7 Torr, so gas release did not pose a problem even with an O-ring seal. However, in recent years, from the perspective of reducing residual gas, even sputtering equipment has an ultimate pressure of 10 -8 Torr ~
Approximately 10 -10 Torr is becoming required. Conventional O-ring seals cannot be sufficiently baked out and a large amount of gas is released, so it is difficult to achieve a seal in the 10 -10 Torr range, let alone a 10 -8 Torr range.
ところで、従来超高真空用フランジとしてコン
フラツトフランジ（商品名）が多く用いられてお
り、このコンフラツトフランジはSUS製のフラ
ンジのシート面にエツジを付け、銅製のガスケツ
トをはさんで締付けることによつて信頼性の高い
シールを保証し、そしてこれは焼出しにも耐える
ことができ、従つてガス放出も少ない等の利点が
ある。しかしコンフラツトフランジをそのままの
形でカソードに用いることはバツキングプレート
の材質が銅であるので困難である。 By the way, Conflat Flange (product name) has been widely used as a flange for ultra-high vacuum, and this Conflat Flange is made by attaching an edge to the seat surface of the SUS flange and tightening it by sandwiching a copper gasket. This ensures a reliable seal, which has the advantage of being resistant to burn-out and therefore having low outgassing. However, it is difficult to use the flat flange as it is for the cathode because the material of the backing plate is copper.
発明が解決しようとする問題点
そこで、本発明では、従来スパツタリング装置
用カソードにおいて冷媒のシールに用いられてき
たエラストマＯリングに代つて超高真空用フラン
ジとして知られているコンフラツトフランジのシ
ール方式を適用してカソードを超高真空装置内で
使用できるようにすることを目的としている。Problems to be Solved by the Invention Therefore, in the present invention, a sealing method for a conflat flange, known as an ultra-high vacuum flange, is used to replace the elastomer O-ring that has been conventionally used to seal the refrigerant in cathodes for sputtering equipment. The purpose is to apply this to enable the cathode to be used in ultra-high vacuum equipment.
問題点を解決するための手段
上記目的を達成するために、本発明による超高
真空用カソードは、カソード本体と、カソード本
体の内側に冷媒通路を画定、密封する銅製のバツ
キングプレートとを有し、上記カソード本体の上
記バツキングプレートと圧接する周囲部分にコン
フラツトシール状のフランジを設け、上記フラン
ジに対し上記バツキングプレートを押え枠部材で
押圧保持したことを特徴としている。Means for Solving the Problems In order to achieve the above object, the cathode for ultra-high vacuum according to the present invention has a cathode body and a backing plate made of copper that defines and seals a refrigerant passage inside the cathode body. The cathode body is characterized in that a flange in the shape of a flat seal is provided on the peripheral portion of the cathode main body that comes into pressure contact with the bucking plate, and the bucking plate is pressed and held against the flange by a holding frame member.
作 用
このように構成した本発明による超高真空用カ
ソードにおいては、銅製のバツキングプレートに
コンフラツトフランジにおけるガスケツトの機能
を持たせ、従つてこのバツキングプレートをカソ
ード本体の周囲圧接部分に設けられたフランジ
（エツジ）に圧接することによつてガス放出の少
ない信頼性の高いシールが形成される。Function: In the cathode for ultra-high vacuum according to the present invention configured as described above, the copper backing plate has the function of a gasket in the conflat flange, and therefore, the backing plate is provided at the peripheral pressure contact portion of the cathode body. By press-fitting the flange (edge), a reliable seal with low outgassing is formed.
実施例
以下添附図面を参照して本発明の超高真空用カ
ソードの一実施例について説明する。Embodiment An embodiment of the ultra-high vacuum cathode of the present invention will be described below with reference to the accompanying drawings.
図示装置において１はカソードで電源接続導体
２に結合され、３，４は冷媒（好ましくは冷却
水）の導入、導出路であり、カソード本体１の内
側に形成された冷媒通路５に連通している。この
冷媒通路５は銅製のバツキングプレート６で画定
されかつ密封されている。すなわち図示したよう
にカソード本体１の周囲圧接面部分１ａにはコン
フラツトフランジ状のフランジ１ｂが形成され、
この上にガスケツトとして作用する銅製のバツキ
ングプレート６のシール面６ａが当接し、そして
バツキングプレート６の上から押え枠７によつて
締付けボルト８でカソード本体１に対して締付け
ることによつて確実なシールが得られる。 In the illustrated device, 1 is a cathode which is connected to a power supply connection conductor 2, and 3 and 4 are passages for introducing and extracting a refrigerant (preferably cooling water), which communicate with a refrigerant passage 5 formed inside the cathode body 1. There is. This refrigerant passage 5 is defined and sealed by a backing plate 6 made of copper. That is, as shown in the figure, a flange 1b in the form of a flat flange is formed on the peripheral pressure contact surface portion 1a of the cathode body 1.
A sealing surface 6a of a copper bucking plate 6 which acts as a gasket is brought into contact with this, and by tightening the clamping bolt 8 against the cathode body 1 using a holding frame 7 from above the bucking plate 6. A reliable seal can be obtained.
また図面において９はターゲツトであり、１０
はシールド部材である。図面では簡明にするため
カソード本体１の内部構造およびその他の部分の
関連構造は本発明の要旨を構成してないので省略
した。従つて各構成要素の形状や寸法等は実際の
使用目的に合わせて任意に設計することができ
る。 Also, in the drawing, 9 is the target, and 10
is a shield member. In the drawings, for the sake of clarity, the internal structure of the cathode body 1 and related structures of other parts are omitted because they do not constitute the gist of the present invention. Therefore, the shape, dimensions, etc. of each component can be arbitrarily designed according to the actual purpose of use.
このように構成することによつて従来のエラス
トマＯリングでは不可能であつた10-10Torr〜
10-9Torr台の到達圧の装置内においても十分使
用可能なシールが得られる。 With this configuration, it is possible to achieve a torque of 10 -10 Torr, which was impossible with conventional elastomer O-rings.
A seal that can be used even in equipment with ultimate pressures on the order of 10 -9 Torr can be obtained.
効 果
以上説明してきたように、本発明によれば次の
ような効果が得られる。Effects As explained above, according to the present invention, the following effects can be obtained.
(1) 従来のエラストマＯリングを用いたものに比
べてガス放出の少ない
(2) 銅製のバツキングプレート自体をシール面と
しているので構造が簡単化されしかもカソード
本体上に設けたエツジとの圧接で確実なシール
が保証できる。(1) Less gas is released compared to conventional elastomer O-rings. (2) The copper backing plate itself serves as the sealing surface, simplifying the structure and making pressure contact with the edge provided on the cathode body. A reliable seal can be guaranteed.
(3) 従来困難であつた焼出しを十分行なうことが
できるので10-10〜10-9Torr台の到達圧をもつ
真空装置内でも十分に使用できる。(3) Since baking out, which has been difficult in the past, can be performed sufficiently, it can be used satisfactorily even in a vacuum apparatus with an ultimate pressure in the range of 10 -10 to 10 -9 Torr.
図面は本発明の一実施例による超高真空用カソ
ードを示す概略断面図である。
図中、１：カソード本体、１ｂ：フランジ、
５：冷媒通路、６：銅製バツキングプレート、
７：押え枠、８：締付けボルト。
The drawing is a schematic cross-sectional view showing an ultra-high vacuum cathode according to an embodiment of the present invention. In the figure, 1: cathode body, 1b: flange,
5: Refrigerant passage, 6: Copper bucking plate,
7: Presser frame, 8: Tightening bolt.
Claims (1)
路を晝定、密封する銅製のバツキングプレートと
を有し、上記カソード本体の上記バツキングプレ
ートと圧接する周囲部分にコンフラツトシール状
のフランジを設け、上記フランジに対し上記バツ
キングプレートを押え枠部材で押圧保持したこと
を特徴とする超高真空用カソード。1. It has a cathode body and a copper backing plate that establishes and seals a refrigerant passage inside the cathode body, and a flange in the form of a conflat seal is provided on the peripheral portion of the cathode body that comes into pressure contact with the backing plate, An ultra-high vacuum cathode, characterized in that the bucking plate is pressed and held against the flange by a holding frame member.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11653784A JPS60262968A (en) | 1984-06-08 | 1984-06-08 | Cathode for very high vacuum |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11653784A JPS60262968A (en) | 1984-06-08 | 1984-06-08 | Cathode for very high vacuum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60262968A JPS60262968A (en) | 1985-12-26 |
| JPS6342702B2 true JPS6342702B2 (en) | 1988-08-25 |
Family
ID=14689575
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11653784A Granted JPS60262968A (en) | 1984-06-08 | 1984-06-08 | Cathode for very high vacuum |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60262968A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR910004839A (en) * | 1989-08-17 | 1991-03-29 | 후루까와 마사히꼬 | Sputtering targets for use in DC magnetron reactive stuffing, methods of forming thin layers using the targets, and optical discs having layers formed by the process |
| US5433835B1 (en) * | 1993-11-24 | 1997-05-20 | Applied Materials Inc | Sputtering device and target with cover to hold cooling fluid |
| US6199259B1 (en) | 1993-11-24 | 2001-03-13 | Applied Komatsu Technology, Inc. | Autoclave bonding of sputtering target assembly |
-
1984
- 1984-06-08 JP JP11653784A patent/JPS60262968A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60262968A (en) | 1985-12-26 |
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