JPS6342455Y2 - - Google Patents

Info

Publication number
JPS6342455Y2
JPS6342455Y2 JP16349482U JP16349482U JPS6342455Y2 JP S6342455 Y2 JPS6342455 Y2 JP S6342455Y2 JP 16349482 U JP16349482 U JP 16349482U JP 16349482 U JP16349482 U JP 16349482U JP S6342455 Y2 JPS6342455 Y2 JP S6342455Y2
Authority
JP
Japan
Prior art keywords
aperture
diaphragm
piece
mirror body
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16349482U
Other languages
Japanese (ja)
Other versions
JPS5966849U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP16349482U priority Critical patent/JPS5966849U/en
Publication of JPS5966849U publication Critical patent/JPS5966849U/en
Application granted granted Critical
Publication of JPS6342455Y2 publication Critical patent/JPS6342455Y2/ja
Granted legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は試料筒やレンズ磁極等との接触による
破損を防止し得る電子顕微鏡等用の絞り装置に関
する。
[Detailed Description of the Invention] The present invention relates to an aperture device for an electron microscope, etc., which can prevent damage due to contact with a sample tube, lens magnetic pole, etc.

電子顕微鏡、特に透過電子顕微鏡においては幾
つかの電子線絞り装置が使用されているが、この
内対物レンズ絞りは性能上極めて重要な働きをな
している。該対物レンズ絞りは通常狭隘なレンズ
磁極片間に挿入されるため該絞り装置を挿入する
場合や移動する場合、或いは試料筒を上下したり
試料の傾料を行う場合には該絞りと試料筒或いは
対物レンズ磁極片とが接触し、それにより絞りを
破損し、又磁極片に損傷を与える事がしばしば生
ずる。
Several electron beam aperture devices are used in electron microscopes, particularly transmission electron microscopes, and among these devices, the objective lens aperture plays an extremely important role in terms of performance. The objective lens diaphragm is usually inserted between a narrow lens magnetic pole piece, so when inserting or moving the diaphragm device, or when moving the sample tube up and down or tilting the sample, the diaphragm and the sample tube must be Alternatively, the objective lens often comes into contact with the magnetic pole piece, thereby damaging the diaphragm and damaging the magnetic pole piece.

この様な接触事故を防止するために従来は試料
の上下移動装置や試料傾斜装置に機械的にある制
限を付し、一定以上は動かないように構成してい
る。しかし乍ら、斯かる装置は試料の移動側のみ
の規制であり、絞り装置との関係では規制がなさ
れないので絞り装置の試料筒及び対物レンズとの
相対位置変化による接触事故は防止のしようがな
い。
In order to prevent such contact accidents, conventionally, a device for moving the sample up and down or a device for tilting the sample is mechanically limited to prevent it from moving beyond a certain level. However, since such a device only regulates the moving side of the sample, and does not regulate the relationship with the diaphragm device, there is no way to prevent contact accidents due to changes in the relative position of the diaphragm device to the sample tube and objective lens. do not have.

上記欠点を解決すべく絞り装置を電子顕微鏡の
鏡体から電気的に浮かし、試料筒等が絞りに接触
したときに得られる電気抵抗の変化により危険状
態を知るような装置も考えられたが、この装置の
場合には絞り片を位置検知手段として利用するの
で電流を流すリード線を可動絞りの軸の中に収納
しなければならず、又ハーメチツクシール等も必
要となり構造的に複雑、大型となるのは避けられ
ず、絞り装置として精度の高い動きの確保が甚だ
困難になる。
In order to solve the above-mentioned drawbacks, a device was considered in which the aperture device was electrically suspended from the mirror body of the electron microscope, and a dangerous situation could be detected by the change in electrical resistance obtained when a sample tube etc. came into contact with the aperture. In the case of this device, since the diaphragm piece is used as a position detection means, the lead wire that carries the current must be housed in the shaft of the movable diaphragm, and hermetic seals are also required, resulting in a complicated structure. It is inevitable that it will be large, and it will be extremely difficult to ensure highly accurate movement as a diaphragm device.

本考案は斯かる点に鑑みてなされたもので、絞
り装置を位置検知手段として利用するにも拘わら
ずリード線の導入をなくし、構造簡単にして高精
度の移動が可能で且つ接触事故による装置の破損
を防止し得る電子顕微鏡等用絞り装置を提供す
る。
The present invention was developed in view of these points, and although the aperture device is used as a position detection means, it eliminates the introduction of lead wires, has a simple structure, enables high-precision movement, and eliminates the possibility of contact accidents. Provided is a diaphragm device for an electron microscope, etc. that can prevent damage to the electron microscope.

本考案の構成は絞り片と該絞り片を保持するホ
ルダーと前記絞り片を移動させるための駆動機構
とからなる絞り機構を有し、該駆動機構の少くと
も一部を鏡体外に配置した装置において、前記絞
り機構を鏡体に対し電気的に絶縁して取付け、前
記駆動機構の少くとも鏡体外に置かれる部分の外
周は電気絶縁物にて被覆し、前記絞り機構と鏡体
との間を抵抗体を介して接続し、前記絞り機構を
直流電源に接続して一定電位に保持しておき、前
記絞り片が試料筒やレンズ磁極等の部材に接触し
たとき変化する電圧又は電流を検知する手段を備
えてなる電子顕微鏡等用絞り装置に特徴がある。
The configuration of the present invention is an apparatus having an aperture mechanism including an aperture piece, a holder for holding the aperture piece, and a drive mechanism for moving the aperture piece, and at least a part of the drive mechanism is disposed outside the mirror body. The diaphragm mechanism is mounted to the mirror body in an electrically insulated manner, the outer periphery of at least a portion of the drive mechanism placed outside the mirror body is covered with an electrical insulator, and the diaphragm mechanism is electrically insulated from the mirror body. is connected through a resistor, the aperture mechanism is connected to a DC power source and held at a constant potential, and the voltage or current that changes when the aperture piece comes into contact with a member such as a sample tube or lens magnetic pole is detected. A diaphragm device for an electron microscope, etc. is characterized by a means for doing so.

以下本考案の一実施例を図面に基づき詳細に説
明する。
An embodiment of the present invention will be described in detail below with reference to the drawings.

図中、1は対物レンズであり、上磁極2、下磁
極3、ヨーク4及び励磁コイル5より構成されて
いる。該対物レンズの上には試料室6が載置され
ており、この試料室の中に試料ステージ7が配置
されている。該試料ステージは図示しないが電子
線の光軸に対して垂直な平面内で自由に移動でき
るようになしてある。この試料ステージには上下
台8が設けられ、試料を有した試料筒9がこの台
の中に保持されている。台8にはラツク10が設
けられ、このラツクにピニオン11が噛み合つて
いる。該ピニオンは回転駆動装置12に接続さ
れ、外部から任意に回転される。前記試料筒の下
端部は対物レンズの磁極間隙内に配置され、その
下端と下磁極3との間には可動絞り片13が置か
れる。該絞り片は通常複数個の相異なる直径の絞
り穴を有しており、適宜切換えて使用するように
なつている。前記絞り片13はホルダー14に固
定されて鏡体外より挿入される。該ホルダーは摘
子15を有する駆動機構16に保持されており、
摘子15の操作及び図示しないが紙面と直角な方
向に設けたもう一つの摘子の操作により前後・左
右に移動できる。前記駆動機構は電気絶縁体18
を介して対物レンズ(鏡体)1に取付けられ、そ
の結果13,14,15、及び16からなる絞り
機構は電子顕微鏡の鏡体に対し電気的に浮いた状
態で設置されることになる。電気絶縁体18には
貫通穴19が設けられ、この中に例えば100KΩ
程度の高抵抗体20が挿入される。該抵抗体20
の一端は対物レンズや試料室の鏡体に、他端は絞
りの駆動機構に電気的に接続されており、この低
抗体を介して微小電流が流れるようになつてい
る。前記駆動機構16及び摘子15の外周は電気
絶縁物21,22により被覆されており、オペレ
ータが接触しても何等の危険もないようにされて
いる。23は直流電源であり、抵抗24を介して
前記絞り機構の任意な個所、例えば駆動機構16
に接続されており、絞り機構を一定の電位(例え
ば5V)に浮かしてある。25は増幅器、26は
異常検知回路で、絞り機構の電位変化(又は電流
変化)を検知している。該検知回路からの信号は
表示計又は警報器27に送られ異常をオペレータ
に知らせるようになつている。又、該検知回路の
出力は前記試料筒の上下動駆動機構12にも送ら
れており、異常が発生した場合直ちにその駆動を
停止するように働く。勿論、試料の傾斜を行なつ
ている場合には該傾斜の駆動装置が検知回路26
からの信号によつて停止されることになる。
In the figure, 1 is an objective lens, which is composed of an upper magnetic pole 2, a lower magnetic pole 3, a yoke 4, and an excitation coil 5. A sample chamber 6 is placed above the objective lens, and a sample stage 7 is disposed within this sample chamber. Although not shown, the sample stage is designed to be able to move freely within a plane perpendicular to the optical axis of the electron beam. This sample stage is provided with an upper and lower table 8, and a sample tube 9 having a sample is held in this table. A rack 10 is provided on the stand 8, and a pinion 11 is engaged with this rack. The pinion is connected to a rotary drive device 12 and rotated arbitrarily from the outside. The lower end of the sample cylinder is placed within the magnetic pole gap of the objective lens, and a movable diaphragm piece 13 is placed between the lower end and the lower magnetic pole 3. The aperture piece usually has a plurality of aperture holes of different diameters, and is adapted to be used by switching as appropriate. The aperture piece 13 is fixed to a holder 14 and inserted from outside the mirror body. The holder is held by a drive mechanism 16 having a knob 15,
It can be moved back and forth and left and right by operating the knob 15 and another knob (not shown) provided in a direction perpendicular to the page. The drive mechanism includes an electrical insulator 18
As a result, the diaphragm mechanism consisting of 13, 14, 15, and 16 is installed in an electrically floating state with respect to the mirror body of the electron microscope. A through hole 19 is provided in the electrical insulator 18, and a through hole 19 is provided in the electrical insulator 18.
A high-resistance element 20 of about 100 mL is inserted. The resistor 20
One end is electrically connected to the objective lens and the mirror body of the sample chamber, and the other end is electrically connected to the aperture drive mechanism, so that a minute current flows through this low antibody. The outer peripheries of the drive mechanism 16 and knob 15 are covered with electrical insulators 21 and 22, so that there is no risk of any danger even if the operator comes into contact with them. Reference numeral 23 denotes a DC power supply, which connects any part of the aperture mechanism, for example, the drive mechanism 16, via a resistor 24.
The aperture mechanism is floated at a constant potential (for example, 5V). 25 is an amplifier, and 26 is an abnormality detection circuit, which detects potential changes (or current changes) of the aperture mechanism. A signal from the detection circuit is sent to an indicator or alarm 27 to notify the operator of an abnormality. Further, the output of the detection circuit is also sent to the vertical movement drive mechanism 12 of the sample cylinder, and works to stop the drive immediately if an abnormality occurs. Of course, when the sample is tilted, the tilt driving device is connected to the detection circuit 26.
It will be stopped by a signal from.

以上の装置において、図示の状態の如く何等の
異常もない場合には抵抗20を介して僅かに電流
が流れるようになつているので、絞り片13上に
投射された電子はチヤージアツプすることなく該
抵抗を介して鏡体に放電される。一方、例えば試
料筒が下がり過ぎて該試料筒の下端が絞り片13
に接触した場合、該試料筒9と絞り片13とが同
電位になり、電源23からの電流が絞り機構、試
料筒、上下台、試料ステージを介してアース電位
の電子顕微鏡鏡体に流れる。該異常は電位の変化
として回路26で検出され、直ちに警報器27に
よつて警報され、及び若しくは試料上下動の駆動
装置12に送られ、試料の上下動が即刻停止され
る。絞り片が対物レンズの磁極片に接触した場合
も同様な警報がなされ、絞り機構の移動が停止さ
れるような安全機構を設けると良い。
In the above device, when there is no abnormality as shown in the figure, a slight current flows through the resistor 20, so that the electrons projected onto the aperture piece 13 do not charge up and reach the target. It is discharged to the mirror body through the resistor. On the other hand, for example, if the sample cylinder is lowered too much, the lower end of the sample cylinder
When the sample cylinder 9 and the aperture piece 13 come into contact with each other, the potential becomes the same, and current from the power source 23 flows through the aperture mechanism, the sample cylinder, the upper and lower stands, and the sample stage to the electron microscope mirror body at ground potential. The abnormality is detected by the circuit 26 as a change in potential, and is immediately alarmed by the alarm 27 and/or sent to the sample vertical movement drive device 12, so that the sample vertical movement is immediately stopped. It is preferable to provide a safety mechanism such that a similar alarm is issued and movement of the diaphragm mechanism is stopped even if the diaphragm piece comes into contact with the magnetic pole piece of the objective lens.

以上説明したような構成となすことにより、絞
り片に試料筒が接触した場合や絞り片が対物レン
ズの磁極片に接触した場合等の異常事態は直ちに
検知できるので、試料筒、絞り機構及び対物レン
ズの磁極片等の損傷、破損を防止できる。又、絞
り機構の可動軸の中に電流供給用のリード線を通
していないので、構造は簡単・小型になり絞り装
置としての移動に何等の制約も与えない。従つ
て、高精度の移動を行なうことの可能な絞り装置
が実現できる。更に、絞り片へ入射した電子は抵
抗を通して鏡体に放電されるので、チヤージアツ
プの危険性もなく、又絞り機構の外周は電気絶縁
物にて被覆されているので、オペレータの危険も
皆無である。
With the configuration described above, abnormal situations such as when the sample tube comes into contact with the diaphragm piece or when the diaphragm piece comes into contact with the magnetic pole piece of the objective lens can be immediately detected. Damage and damage to the magnetic pole piece of the lens can be prevented. Furthermore, since no lead wire for supplying current is passed through the movable shaft of the diaphragm mechanism, the structure is simple and compact, and there are no restrictions on the movement of the diaphragm device. Therefore, it is possible to realize a diaphragm device that can move with high precision. Furthermore, since the electrons incident on the aperture piece are discharged to the mirror body through a resistor, there is no risk of charge-up, and since the outer periphery of the aperture mechanism is covered with an electrical insulator, there is no danger to the operator. .

【図面の簡単な説明】[Brief explanation of the drawing]

添付図面は本考案の一実施例を示す一部断面図
である。 1:対物レンズ、2:上磁極、3:下磁極、
4:ヨーク、5:励磁コイル、6:試料室、7:
試料ステージ、8:上下台、9:試料筒、10:
ラツク、11:ピニオン、12:回転駆動装置、
13:絞り片、14:ホルダー、15:摘子、1
6:駆動機構、18:電気絶縁体、19:貫通
穴、20:高抵抗体、21,22:電気絶縁物、
23:直流電源、26:異常検知回路、27:表
示又は警報器。
The accompanying drawings are partially sectional views showing one embodiment of the present invention. 1: Objective lens, 2: Upper magnetic pole, 3: Lower magnetic pole,
4: Yoke, 5: Excitation coil, 6: Sample chamber, 7:
Sample stage, 8: Upper and lower table, 9: Sample tube, 10:
rack, 11: pinion, 12: rotational drive device,
13: Squeezing piece, 14: Holder, 15: Pinch, 1
6: Drive mechanism, 18: Electrical insulator, 19: Through hole, 20: High resistance body, 21, 22: Electrical insulator,
23: DC power supply, 26: Abnormality detection circuit, 27: Display or alarm.

Claims (1)

【実用新案登録請求の範囲】 1 絞り片と該絞り片を保持するホルダーと前記
絞り片を移動させるための駆動機構とからなる
絞り機構を有し、該駆動機構の少くとも一部を
鏡体外に配置した装置において、前記絞り機構
を鏡体に対し電気的に絶縁して取付け、前記駆
動機構の少くとも鏡体外に置かれる部分の外周
は電気絶縁物にて被覆し、前記絞り機構と鏡体
との間を抵抗体を介して接続し、前記絞り機構
を直流電源に接続して一定電位に保持してお
き、前記絞り片が試料筒やレンズ磁極等の部材
に接触したとき変化する電圧又は電流を検知す
る手段を備えてなる電子顕微鏡等用絞り装置。 2 前記検知手段からの異常信号を表示する又は
その信号に基づき警報を発する手段を有してい
る実用新案登録請求の範囲第1項記載の電子顕
微鏡等用絞り装置。 3 前記検知手段からの異常信号により試料上下
動機構や傾斜機構の移動を停止させる実用新案
登録請求の範囲第1項記載の電子顕微鏡等用の
絞り装置。
[Claims for Utility Model Registration] 1. An aperture mechanism consisting of an aperture piece, a holder for holding the aperture piece, and a drive mechanism for moving the aperture piece, and at least a part of the drive mechanism is located outside the mirror body. In the apparatus, the diaphragm mechanism is mounted in an electrically insulated manner with respect to the mirror body, the outer periphery of at least a portion of the drive mechanism placed outside the mirror body is covered with an electrical insulator, and the diaphragm mechanism and the mirror body are The aperture mechanism is connected to the body through a resistor, and the aperture mechanism is connected to a DC power source and held at a constant potential, and the voltage changes when the aperture piece comes into contact with a member such as a sample tube or a lens magnetic pole. Or an aperture device for an electron microscope, etc., which is equipped with a means for detecting current. 2. The aperture device for an electron microscope, etc. according to claim 1, which has a means for displaying an abnormal signal from the detecting means or for issuing an alarm based on the signal. 3. A diaphragm device for an electron microscope or the like according to claim 1, which stops the movement of a sample vertical movement mechanism or a tilting mechanism in response to an abnormal signal from the detection means.
JP16349482U 1982-10-28 1982-10-28 Aperture device for electron microscopes, etc. Granted JPS5966849U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16349482U JPS5966849U (en) 1982-10-28 1982-10-28 Aperture device for electron microscopes, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16349482U JPS5966849U (en) 1982-10-28 1982-10-28 Aperture device for electron microscopes, etc.

Publications (2)

Publication Number Publication Date
JPS5966849U JPS5966849U (en) 1984-05-04
JPS6342455Y2 true JPS6342455Y2 (en) 1988-11-07

Family

ID=30358723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16349482U Granted JPS5966849U (en) 1982-10-28 1982-10-28 Aperture device for electron microscopes, etc.

Country Status (1)

Country Link
JP (1) JPS5966849U (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019186937A1 (en) 2018-03-29 2019-10-03 株式会社日立ハイテクノロジーズ Charged-particle beam device

Also Published As

Publication number Publication date
JPS5966849U (en) 1984-05-04

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