JPS6340210A - Conducting composition for electronic component electrode - Google Patents

Conducting composition for electronic component electrode

Info

Publication number
JPS6340210A
JPS6340210A JP61183938A JP18393886A JPS6340210A JP S6340210 A JPS6340210 A JP S6340210A JP 61183938 A JP61183938 A JP 61183938A JP 18393886 A JP18393886 A JP 18393886A JP S6340210 A JPS6340210 A JP S6340210A
Authority
JP
Japan
Prior art keywords
minutes
powder
electronic component
plating
extraction electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61183938A
Other languages
Japanese (ja)
Other versions
JPH0752602B2 (en
Inventor
外丸 隆
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Yuden Co Ltd
Original Assignee
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Yuden Co Ltd filed Critical Taiyo Yuden Co Ltd
Priority to JP61183938A priority Critical patent/JPH0752602B2/en
Publication of JPS6340210A publication Critical patent/JPS6340210A/en
Publication of JPH0752602B2 publication Critical patent/JPH0752602B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Conductive Materials (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、電子部品用電極を形成するのに使用される導
電性組成物に関し、さらに詳しくは。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a conductive composition used for forming electrodes for electronic components, and more particularly.

多層配線回路セラミック裁板や積層コンデンサの引出し
電極を形成するのに好適な導電性組成物に関する。
The present invention relates to a conductive composition suitable for forming multilayer wiring circuit ceramic cutting boards and lead electrodes of multilayer capacitors.

〔従来の技術〕[Conventional technology]

多層配線回路セラミック基板や積層コンデンサ等の電子
部品は、アルミナやチタン酸バリウム等を主成分とする
セラミックシートに、導電材料としてNiを含む導電ペ
ーストで電極や配線パターン等を印刷し、これらを還元
雰囲気中で焼成して作られる。上記セラミックシートに
形成される電極は、積層されたセラミックシートの中に
配置されるものと、外部の導体との接続のため、セラミ
ックシートの表面に露出されるものとに大別することが
できる。前者をいわゆる内部電極、後者をいわゆる引出
し電極と称する。このうち、後者の引出し電極は、外部
の導体との半田付性を良好にするため、焼成後。
Electronic components such as multilayer wiring circuit ceramic boards and multilayer capacitors are produced by printing electrodes and wiring patterns on ceramic sheets whose main ingredients are alumina, barium titanate, etc. with a conductive paste containing Ni as a conductive material, and then reducing these. It is made by firing in an atmosphere. The electrodes formed on the ceramic sheets can be roughly divided into those that are placed inside the laminated ceramic sheets and those that are exposed on the surface of the ceramic sheet for connection to an external conductor. . The former are called internal electrodes, and the latter are called extraction electrodes. Of these, the latter lead-out electrode is made after firing in order to improve solderability with external conductors.

表面にNiメツキを施したり、半田屑で被覆することが
行われている。
The surface is plated with Ni or covered with solder chips.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、上記のような引出し電極は、導電ペーストをセ
ラミックシートと同時焼成し、無電解メツキ法によって
この表面にNiメツキを施すときに、メツキ膜の付着性
が悪い。このため。
However, in the above-mentioned lead-out electrode, when a conductive paste is co-fired with a ceramic sheet and Ni plating is applied to the surface by an electroless plating method, the adhesion of the plating film is poor. For this reason.

上記メツキ膜の上に半田付しでも、半田付性が悪く、密
着強度が弱いという問題があった。
Even when soldering was performed on the plating film, there were problems in that the solderability was poor and the adhesion strength was weak.

本発明の目的は、従来の導電材料における上記のような
問題を解消するためなされたもので。
An object of the present invention was to solve the above-mentioned problems with conventional conductive materials.

焼成後のNiメノキ工程で、メツキ膜の付着性の良い引
出し電極が形成できる導電性組成物を提供することにあ
る。
The object of the present invention is to provide a conductive composition capable of forming an extraction electrode with good plating film adhesion in the Ni agate process after firing.

〔問題を解決するための手段〕[Means to solve the problem]

即ち、この発明による導電性組成物は、Liが0.6〜
6.2a t%と、残部がNiとからなるものである。
That is, the conductive composition according to the present invention has Li of 0.6 to
6.2at%, and the balance is Ni.

〔実 施 例〕〔Example〕

次に、この発明の具体的な実施例について説明する。 Next, specific embodiments of the present invention will be described.

(実施例1) 純度99.9%のNi粉末90.1gと、純度99.9
%のl、12cO3粉末とに、エチルセルローズ。
(Example 1) 90.1g of Ni powder with a purity of 99.9% and a purity of 99.9%
%L, 12cO3 powder and ethyl cellulose.

ブチルカルピトールを主成分とするバインター114g
を加え、これらを雷潰機で3時間混合した後、ロールミ
ルで1時間混練して導電性ペーストを製作した。
114g of binder whose main ingredient is butylcarpitol
were mixed using a lightning crusher for 3 hours, and then kneaded using a roll mill for 1 hour to produce a conductive paste.

これとは別に、l3aTiO3系のセラミックグリーン
シート上に、従来公知のNiペーストを塗布して積層し
た未焼成積層セラミックコンデンサ素体を用意した。こ
の未焼成積層セラミックコンデンサ素体の両端及び両端
周縁とに上記導電ペーストをデイツプ塗装し、これに1
00℃の温度を30分間与えて乾燥した。
Separately, an unfired multilayer ceramic capacitor body was prepared by coating and laminating a conventionally known Ni paste on a l3aTiO3 ceramic green sheet. The above-mentioned conductive paste is dip-coated on both ends and the periphery of both ends of this unfired multilayer ceramic capacitor body, and then
It was dried by applying a temperature of 00° C. for 30 minutes.

次いでこれを次のプロファイルで焼成した。This was then fired with the following profile.

まず、2%のH2ガスを含むN2ガス雰囲気中で、昇温
速度100℃/ h rで最高1200℃まで昇温し、
この温度を2時間保持した。その後、降温速度300℃
/ h rで室温まで冷却した。こうして焼成された積
層セラミックコンデンサの引出し用電極は、Liが2.
1at%、Niが97.9at%とからなるものであっ
た。
First, in an N2 gas atmosphere containing 2% H2 gas, the temperature was raised to a maximum of 1200°C at a heating rate of 100°C/hr.
This temperature was maintained for 2 hours. After that, the temperature decrease rate is 300℃
/ hr to room temperature. The lead electrode of the multilayer ceramic capacitor thus fired has an Li content of 2.
1 at% and 97.9 at% of Ni.

このような積層セラミックコンデンサ800個を、20
0個づつ4組に分け、各グループをそれぞれ市販の無電
解ニッケルメッキ浴で5分間、10分間、15分間、2
0分間ずつメツキした。これら各グループの200t[
lilの積層コンデンサの引出し電極を目視観察し、そ
の全面にNiメツキ膜が析出しているグループをOl一
部Niメツキ膜が析出していないグループを△、全<N
iメック膜が析出していないものを×とし、この結果を
表1に示した。
800 such multilayer ceramic capacitors were
Divide into 4 groups of 0 pieces each, and each group is coated in a commercially available electroless nickel plating bath for 5 minutes, 10 minutes, 15 minutes, and 2 minutes.
It was printed for 0 minutes at a time. 200t of each of these groups [
Visually observe the extraction electrodes of lil's multilayer capacitors, and the group where the Ni plating film is deposited on the entire surface is O, the group where the Ni plating film is not deposited on some parts is △, and the total <N
Samples in which no i-MEC film was precipitated were marked as x, and the results are shown in Table 1.

(実施例2) 実施例1において、Ni粉末90.1gに代えて93.
8 gとしたこと、及びl、12cO3粉末9.9gに
代えて6.2gとしたこと以外は、実施例1と同じ方法
と条件で引出し電極を形成し、これにNiを無電解メツ
キし、同様にメツキ膜の状態を調べた結果を表1に示す
(Example 2) In Example 1, 93.1 g of Ni powder was used instead of 90.1 g of Ni powder.
An extraction electrode was formed using the same method and conditions as in Example 1, except that 8 g was used, and 6.2 g was used instead of 9.9 g of l,12cO3 powder, and Ni was electrolessly plated on this. Table 1 shows the results of similarly examining the condition of the plating film.

なお、上記引出し用電極は、Liが1.2at%。Note that the extraction electrode contains 1.2 at% Li.

Niが98 、8a t%とからなるものであった。It consisted of 98.8 at % of Ni.

(実施例3) 実施例1において、Ni粉末90.1gに代えて75.
2 gとしたこと、及び[,12cO3粉末9.9gに
代えて24.8gとしたこと以外は、実施例1と同じ方
法と条件で引出し電極を形成し、これにNiを無電解メ
ツキし、同様にメツキ膜の状態を調べた結果を表1に示
す。
(Example 3) In Example 1, 75.1 g of Ni powder was used instead of 90.1 g of Ni powder.
An extraction electrode was formed using the same method and conditions as in Example 1, except that 2 g was used, and 24.8 g was used instead of 9.9 g of [,12cO3 powder, and Ni was electrolessly plated on this. Table 1 shows the results of similarly examining the condition of the plating film.

なお、上記引出し用電極は、Liが6.2at%。Note that the extraction electrode contains 6.2 at% Li.

Niが93.8at%とからなるものであった。It consisted of 93.8 at% Ni.

(実施例4) 実施例1において、Ni粉末90.1gに代えて96.
8gとしたこと、Li2CO3粉末9.9gに代えて3
.2gとしたこと、及びメツキ時間を10分間、15分
間、20分間、25分間に分けて実施した以外は、実施
例1と同じ方法と条件で引出し電極を形成し、これにN
iを無電解メツキし。
(Example 4) In Example 1, 96.1 g of Ni powder was used instead of 90.1 g of Ni powder.
8g, and 3 instead of 9.9g of Li2CO3 powder.
.. An extraction electrode was formed using the same method and conditions as in Example 1, except that the plating time was 2g, and the plating time was divided into 10 minutes, 15 minutes, 20 minutes, and 25 minutes.
Electroless plating of i.

同様にメツキ膜の状態を調べた結果を表1に示す。Table 1 shows the results of similarly examining the condition of the plating film.

なお、上記引出し用電極は、Liが0.6at%。Note that the extraction electrode contains 0.6 at% Li.

Niが99.4at%とからなるものであった。It consisted of 99.4 at% Ni.

(比較例) 実施例1において、Li2CO3粉末を用いずに、Ni
粉末を100g使用したこと、及びメツキ時間を、20
分間、25分間、30分間、35分間に分けて実施した
以外は、実施例1と同じ方法と条件で引出し電極を形成
し、これにNiを無電解メツキし、同様にメツキ膜の状
態を調べた結果を表1に示す。
(Comparative example) In Example 1, Ni
100g of powder was used and the plating time was 20
An extraction electrode was formed using the same method and conditions as in Example 1, except that the test was carried out separately for 25 minutes, 25 minutes, 30 minutes, and 35 minutes.Ni was electrolessly plated on this electrode, and the condition of the plated film was similarly examined. The results are shown in Table 1.

なお、上記引出し電極は、Niが99.9at%からな
るものであった。
Note that the above-mentioned extraction electrode was made of 99.9 at% Ni.

以上実施例及び比較例から明らかなように。As is clear from the above Examples and Comparative Examples.

表   1 本発明の実施例では2表面へのNiメツキ膜の付き回り
がよく、短時間で密着強度の高いNiメツキ膜が形成で
きる引出し電極が得られた。
Table 1 In the examples of the present invention, a lead electrode was obtained in which the Ni plating film was well spread over the two surfaces and a Ni plating film with high adhesion strength could be formed in a short time.

なお、導電性組成物中のLiの割合を、0.6〜6.2
at%に限定したのは、Liの含有量がこれより多い場
合でも少ない場合でも、引出し電極へのNiメツキの付
着性が悪くなり、従来の導電ペーストを使用した場合に
比べて、顕著な相違が認められないことによる。
Note that the proportion of Li in the conductive composition is 0.6 to 6.2.
The reason for limiting the Li content to at% is that whether the Li content is higher or lower than this, the adhesion of Ni plating to the extraction electrode will deteriorate, and there will be a noticeable difference compared to when conventional conductive paste is used. This is due to the fact that it is not recognized.

〔発明の効果〕〔Effect of the invention〕

以上説明した通り9本発明によれば、電子部品の引出し
電極の無電解法によるNtメツキ膜の付着性が良(、こ
れによって引出し電極に短時間で従来と同等、或いはそ
れ以上の密着強度を有するNiメツキ膜を施すことがで
きる効果がある。
As explained above, 9 According to the present invention, the adhesion of the Nt plating film by the electroless method to the extraction electrode of electronic components is good (thereby, it is possible to provide the extraction electrode with an adhesion strength equal to or higher than that of the conventional method in a short time). This has the effect of being able to apply a Ni plating film having the following characteristics.

発明者外丸 隆Inventor Takashi Sotomaru

Claims (1)

【特許請求の範囲】[Claims] Liを0.6〜6.2at%と、残部がNiとからなる
電子部品電極用導電性組成物。
A conductive composition for an electrode of an electronic component comprising 0.6 to 6.2 at% of Li and the balance being Ni.
JP61183938A 1986-08-05 1986-08-05 Conductive composition for electrodes of electronic parts Expired - Lifetime JPH0752602B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61183938A JPH0752602B2 (en) 1986-08-05 1986-08-05 Conductive composition for electrodes of electronic parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61183938A JPH0752602B2 (en) 1986-08-05 1986-08-05 Conductive composition for electrodes of electronic parts

Publications (2)

Publication Number Publication Date
JPS6340210A true JPS6340210A (en) 1988-02-20
JPH0752602B2 JPH0752602B2 (en) 1995-06-05

Family

ID=16144428

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61183938A Expired - Lifetime JPH0752602B2 (en) 1986-08-05 1986-08-05 Conductive composition for electrodes of electronic parts

Country Status (1)

Country Link
JP (1) JPH0752602B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215329A (en) * 1990-11-22 1993-06-01 Toyota Jidosha Kabushiki Kaisha Twist beam type rear suspension reinforced against side force with longitudinal compliance

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814728A (en) * 1981-07-20 1983-01-27 Shoichi Teraoka Multistage superposing mold

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814728A (en) * 1981-07-20 1983-01-27 Shoichi Teraoka Multistage superposing mold

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5215329A (en) * 1990-11-22 1993-06-01 Toyota Jidosha Kabushiki Kaisha Twist beam type rear suspension reinforced against side force with longitudinal compliance

Also Published As

Publication number Publication date
JPH0752602B2 (en) 1995-06-05

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