JPS6335608A - Production of curable resin composition having ethylenically unsaturated group - Google Patents

Production of curable resin composition having ethylenically unsaturated group

Info

Publication number
JPS6335608A
JPS6335608A JP17749986A JP17749986A JPS6335608A JP S6335608 A JPS6335608 A JP S6335608A JP 17749986 A JP17749986 A JP 17749986A JP 17749986 A JP17749986 A JP 17749986A JP S6335608 A JPS6335608 A JP S6335608A
Authority
JP
Japan
Prior art keywords
parts
ethylenically unsaturated
anhydride
reacted
unsaturated group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17749986A
Other languages
Japanese (ja)
Inventor
Makio Sugai
菅井 牧雄
Takashi Mihoya
隆 三保谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Ink SC Holdings Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP17749986A priority Critical patent/JPS6335608A/en
Publication of JPS6335608A publication Critical patent/JPS6335608A/en
Pending legal-status Critical Current

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  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE:To produce the title composition having a relaxed shrinkage strain upon radiation curing and excellent flexibility, rigidity and adhesiveness, by reacting a specified polymer with a carboxylic acid anhydride and an epoxy monomer having an ethylenically unsaturated group. CONSTITUTION:A polymer (A) having 0.1-10 hydroxyl groups per 1,000 of MW in the molecule and having an MW >=5,000 (e.g., phenoxy resin) is reacted with part of a carboxylic acid anhydride (B) (e.g., succinic anhydride), and the free carboxyl groups formed in this reaction are reacted with the glycidyl groups of an epoxy monomer (C) having an ethylenically unsaturated group [e.g., glycidyl (meth)acrylate] or alternately, components B and C are added to component A, and the mixture is reacted at 80-150 deg.C in a nitrogen gas atmosphere in the presence of a catalyst (e.g., NaOH).

Description

【発明の詳細な説明】 〔発明の目的〕 (産業上の利用分野) 本発明は、エチレン性不飽和基を有する硬化性樹脂組成
物の製造法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a method for producing a curable resin composition having an ethylenically unsaturated group.

(従来の技術) 金属、プラスチックスなどへの塗料、感光性樹脂版など
の分野において放射線硬化性の樹脂組成物が従来から研
究されている。特に塗料分野においては。
(Prior Art) Radiation-curable resin compositions have been researched in the fields of coatings for metals, plastics, etc., photosensitive resin plates, and the like. Especially in the paint field.

耐久性、加工密着性、耐熱性、耐候性、耐薬品性。Durability, processing adhesion, heat resistance, weather resistance, and chemical resistance.

耐水性などの諸物性のほか、高速塗装性、低エネルギー
硬化性などが要求されるために満足すべき樹脂組成物は
未だに完成されていないのが現状である。
At present, a resin composition that satisfies the requirements for various physical properties such as water resistance, high-speed coating properties, and low-energy curing properties has not yet been completed.

すなわち、硬化性を向上せしめるためには、エチレン性
不飽和基の含有量を多くした樹脂を用いるか。
That is, in order to improve curability, should a resin with a higher content of ethylenically unsaturated groups be used?

重合性希釈剤の使用量を増すことがよいとされている。It is said that it is better to increase the amount of polymerizable diluent used.

しかし、こうした系においては、硬化塗膜が一般に脆く
、加工密着性、耐久性などの物性が劣る。
However, in such systems, the cured coating film is generally brittle and has poor physical properties such as processing adhesion and durability.

また、物性に重点を置いた場合には硬化性が確保できな
いという二律背反が解決されていない。
Furthermore, the trade-off that curability cannot be ensured when emphasis is placed on physical properties has not been resolved.

また、一般によ(使用されている放射線硬化性樹脂とし
ては、活性水酸基を有する樹脂とエチレン性不飽和基を
有するイソシアネート化合物とを反応さする方法、ある
いは(メタ)アクリル酸をエステル化反応させる方法が
あるが、エチレン性不飽和基を多量に導入しようとする
場合、前者においては不純物として存在するジイソシア
ネート化合物の存在によって”架橋反応が生じ、高粘度
化して塗装性に問題が生じ、また、後者においてはラジ
カル重合の生じない低い温度で反応させなければならず
未反応の(メタ)アクリル酸モノマーの除去が必要とな
り、臭気も問題となる。
In addition, generally used radiation-curable resins include a method in which a resin having an active hydroxyl group is reacted with an isocyanate compound having an ethylenically unsaturated group, or a method in which (meth)acrylic acid is subjected to an esterification reaction. However, when attempting to introduce a large amount of ethylenically unsaturated groups, the presence of diisocyanate compounds that exist as impurities in the former causes a crosslinking reaction, resulting in high viscosity and problems in paintability; In this case, the reaction must be carried out at a low temperature at which radical polymerization does not occur, and unreacted (meth)acrylic acid monomer must be removed, and odor also becomes a problem.

〔発明の構成〕[Structure of the invention]

(問題点を解決するための手段) 本発明は、上記のような問題点を解決し′たものであり
9分子中に水酸基を有する分子量5,000以上のポリ
マー(A)、カルボン酸無水物(B)およびエチレン性
不飽和基を有するエポキシモノマー(C)を反応せしめ
るエチレン性不飽和基を有する硬化性樹脂組成物の製造
法において、ポリマー(A)にカルボン酸無水物(B)
の一部を予め反応せしめた後。
(Means for Solving the Problems) The present invention solves the above problems and uses a polymer (A) having a molecular weight of 5,000 or more having hydroxyl groups in 9 molecules, a carboxylic acid anhydride (B) and an epoxy monomer (C) having an ethylenically unsaturated group, in a method for producing a curable resin composition having an ethylenically unsaturated group, in which a carboxylic acid anhydride (B) is added to the polymer (A).
After pre-reacting a part of.

もしくは反応せしめずして、カルボン酸無水物(B)お
よびエポキシモノマー(C)を添加して反応せしめるこ
とを特徴とする製造法に関するものである。
Alternatively, it relates to a production method characterized in that the carboxylic acid anhydride (B) and the epoxy monomer (C) are added and reacted without reacting.

本発明において2分子中に水酸基を有する分子量5.0
00以上のポリマー(A)としては、アクリルポリオー
ル、塩化ビニル−酢酸ビニル共重合体のケン化物、 塩
化ビニル−酢酸ビニル−(メタ)ヒドロキシアルキル共
重合体、セルロース系樹脂、フェノキシ樹脂、ポリビニ
ルアセタール樹脂、フェノール系樹脂、ポリ酢酸ビニル
の部分ケン化物、水酸基を有するポリエステルなどを挙
げることができる。これらの樹脂の分子量が5.000
未満であると効果塗膜が脆くなり、また、接着性にも問
題を生ずる。ポリマー(A)としては分子量が10.0
00以上のものを使用することが好ましい。分子量の上
限としては反応に関与しない溶媒に溶解することができ
る範囲であれば使用可能であり、この場合の溶媒として
は、エチレン性不飽和基を有するモノマーであってもよ
い。
In the present invention, the molecular weight is 5.0, which has hydroxyl groups in two molecules.
Examples of the polymer (A) of 00 or higher include acrylic polyols, saponified vinyl chloride-vinyl acetate copolymers, vinyl chloride-vinyl acetate-(meth)hydroxyalkyl copolymers, cellulose resins, phenoxy resins, and polyvinyl acetal resins. , phenolic resins, partially saponified products of polyvinyl acetate, polyesters having hydroxyl groups, and the like. The molecular weight of these resins is 5.000
If it is less than that, the effect coating will become brittle and there will also be problems in adhesion. The polymer (A) has a molecular weight of 10.0
It is preferable to use 00 or more. As the upper limit of the molecular weight, it can be used as long as it can be dissolved in a solvent that does not participate in the reaction, and the solvent in this case may be a monomer having an ethylenically unsaturated group.

水酸基の数は分子量1 、000あたり、0.1〜10
個、好ましくは0.3〜5個のものを使用する。
The number of hydroxyl groups is 0.1 to 10 per molecular weight 1,000.
, preferably 0.3 to 5.

本発明において、カルボン酸無水物(B)としては、飽
和もしくは不飽和の脂肪族ジカルボン酸無水物、芳香族
ジカルボン酸無水物、脂環式ジカルボン酸無水物などで
あり、これらは飽和もし、くは不飽和の炭化水素基、了
り−ル基、ハロゲン基、ヘテロ環基などで置換されてい
るものでもよい。例示すれば無水マレイン酸、無水フタ
ル酸、無水1.2−シクロヘキサンジカルボン酸無水物
、無水イタコン酸、無水グルタル酸、無水コハク酸、無
水メチルハイミック酸、テトラクロロ無水フタル酸、無
水ヘット酸などを挙げることができ、また、無水トリメ
リット酸を使用することができる。
In the present invention, the carboxylic anhydride (B) includes saturated or unsaturated aliphatic dicarboxylic anhydride, aromatic dicarboxylic anhydride, alicyclic dicarboxylic anhydride, etc. may be substituted with an unsaturated hydrocarbon group, a ring group, a halogen group, a heterocyclic group, or the like. Examples include maleic anhydride, phthalic anhydride, 1,2-cyclohexanedicarboxylic anhydride, itaconic anhydride, glutaric anhydride, succinic anhydride, methylhimic anhydride, tetrachlorophthalic anhydride, het's acid anhydride, etc. Also, trimellitic anhydride can be used.

本発明において、エチレン性不飽和基を有するエポキシ
モノマー(C)としては、グリシジル(メタ)アクリレ
ート、グリシジルシンナメート、アリルグリシジルエー
テル、ビニルシクロヘキサンモツエボキサイド、1.3
−ブタジェンモノエポキサイドなどがあり、これらは飽
和もしくは不飽和の炭化水素基。
In the present invention, examples of the epoxy monomer (C) having an ethylenically unsaturated group include glycidyl (meth)acrylate, glycidyl cinnamate, allyl glycidyl ether, vinylcyclohexane motueboxide, 1.3
-butadiene monoepoxide, etc., and these are saturated or unsaturated hydrocarbon groups.

アリール基、ハロゲン基、ヘテロ環基などで置換されて
いるものでもよい。
It may be substituted with an aryl group, a halogen group, a heterocyclic group, or the like.

本発明に係る製造法においては、ポリマー(A)中の水
酸基とカルボン酸無水物(B)中の酸無水物が優先的に
反応し1次いでこの反応により生じた遊離カルボン酸基
とエポキシモノマー(C)のグリシジル基とが反応する
。この反応においては自体公知のとおり、2級の水酸基
が生じ、この水酸基と酸無水物とが反応し、さらにこの
反応により生成した遊離カルボン酸基とグリシジル基と
が反応するというように、グラフト鎖の長さを調節する
ことにより。
In the production method according to the present invention, the hydroxyl groups in the polymer (A) and the acid anhydride in the carboxylic anhydride (B) react preferentially, and then the free carboxylic acid groups generated by this reaction and the epoxy monomer ( C) reacts with the glycidyl group. As is known per se, in this reaction, a secondary hydroxyl group is generated, this hydroxyl group reacts with the acid anhydride, and furthermore, the free carboxylic acid group generated by this reaction reacts with the glycidyl group, and so on. By adjusting the length of.

エチレン性不飽和基がポリマー(A)に分岐鎖として所
望の数だけ導入することができる。得られる樹脂組成物
は、ポリマー(A)の種類、ポリマー(A)中の水酸基
の数、使用するカルボン酸無水物(B)の種類および量
、並びにエポキシモノマー(C)の種類および量によ設
計することができる。さらに本発明に係る製造法におい
てはエチレン性不飽和基がポリマー(A)にグラフト鎖
に導入されるため、硬化性が付与されていながら9本来
ポリマー(A)が有する可撓性、剛直性、接着性が硬化
後も維持されるため、物性の面からの分子設計も容易と
なり、特に架橋密度の密の部分と疎の部分とがあり、放
射線硬化時に従来起りがちであった収縮歪が緩和される
などの特徴のある組成物を得ることができる。
A desired number of ethylenically unsaturated groups can be introduced into the polymer (A) as branched chains. The resulting resin composition depends on the type of polymer (A), the number of hydroxyl groups in polymer (A), the type and amount of carboxylic anhydride (B) used, and the type and amount of epoxy monomer (C). can be designed. Furthermore, in the production method according to the present invention, ethylenically unsaturated groups are introduced into the graft chains of the polymer (A), so that while curability is imparted, the flexibility and rigidity that the polymer (A) originally has, Since adhesive properties are maintained even after curing, molecular design from a physical property perspective becomes easier.In particular, there are areas with dense crosslinking density and areas with sparse crosslinking density, which alleviates the shrinkage strain that conventionally tends to occur during radiation curing. It is possible to obtain a composition with characteristics such as:

本発明においては、水酸基含有ポリマー(A)の水酸基
数m、カルボン酸無水物(B)nモルおよびエポキシモ
ノマー(C) 11モルの関係は、n#6となっていれ
ば特に固定されるわけではなく1例えばm≦nl=+1
とすることもでき、この場合ポリマー(A)中の水酸基
の一部は未反応のままであることもある。
In the present invention, the relationship between the number m of hydroxyl groups in the hydroxyl group-containing polymer (A), n moles of carboxylic acid anhydride (B), and 11 moles of epoxy monomer (C) is particularly fixed if n#6. Instead of 1, for example m≦nl=+1
In this case, some of the hydroxyl groups in the polymer (A) may remain unreacted.

本発明の製造法においては、窒素ガス雰囲気中。In the production method of the present invention, in a nitrogen gas atmosphere.

80〜150℃、好ましくは100〜120℃にて行い
1反応に際しては公知の触媒例えば水酸化ナトリウム。
One reaction is carried out at 80-150°C, preferably 100-120°C, using a known catalyst such as sodium hydroxide.

水酸化カリウム、リチウムクロライド、トリエチルアミ
ン、テトラ(n−ブトキシ)−チタン、N、N−ジメチ
ルベンジルアミンなどを用いることができ、また。
Potassium hydroxide, lithium chloride, triethylamine, tetra(n-butoxy)-titanium, N,N-dimethylbenzylamine, etc. can also be used.

公知のラジカル重合禁止剤2例えば、ハイドロキノン、
モノメトキシハイドロキノンなどを使用することが好ま
しい。
Known radical polymerization inhibitors 2, such as hydroquinone,
It is preferable to use monomethoxyhydroquinone or the like.

また、ポリマー(A)が固体であれば2反応に関与しな
い溶媒により熔解して反応することが必要となる。
Moreover, if the polymer (A) is solid, it is necessary to melt it and react with a solvent that does not participate in the two reactions.

本発明に係る樹脂組成物は、必要に応じて不飽和上ツマ
−もしくは揮発性溶媒で希釈して対象基材に塗布し、揮
発性溶媒の場合にはこれを揮発せしめた後に、放射線照
射により硬化せしめる。紫外線硬化の場合にはベンゾイ
ンメチルエーテルなどのベンゾインエーテル類、ベンゾ
フェノンなどのベンゾフェノン類など自体公知の増感剤
を添加する。電子線。
The resin composition according to the present invention is diluted with an unsaturated solvent or a volatile solvent as necessary and applied to the target substrate, and in the case of a volatile solvent, the resin composition is evaporated and then irradiated with radiation. Let it harden. In the case of ultraviolet curing, a known sensitizer such as benzoin ethers such as benzoin methyl ether or benzophenones such as benzophenone is added. Electron beam.

α線、β線、γ線、X線などの電離放射線を使用する場
合には特別の増感剤を使用しなくともよい。
When using ionizing radiation such as α-rays, β-rays, γ-rays, and X-rays, no special sensitizer is required.

また9本発明に係る樹脂組成物は、必要に応じて顔料、
染料などの着色剤、界面活性剤、充項剤、磁性酸化鉄、
可塑剤などの添加剤を適宜添加して使用する。
In addition, the resin composition according to 9 the present invention may contain pigments,
Colorants such as dyes, surfactants, fillers, magnetic iron oxide,
Additives such as plasticizers are used as appropriate.

以下、実施例および比較例により本発明をより具体的に
説明する。例中2部および%はそれぞれ重量部を重量%
を示す。
Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples. In the examples, 2 parts and % are respectively parts by weight and % by weight.
shows.

実施例1 攪拌機、冷却器、温度計および滴下ロートを備えた反応
器に窒素ガスで置換した後、メチルイソブチルケトン3
29部およびシクロへキサノン329部を仕込み、攪拌
しながらフェノキシ樹脂(ベークライトPKHI+、ユ
ニオンカーバイド社製商標名)154部を徐々に添加し
溶解する。ついで無水コハク酸13.5部を添加し同温
度で反応し、赤外線スペクトルで酸無水物の吸収ピーク
(1790および1B70c1m−1)の消滅を確認し
、その後さらに無水コハク酸13.5部、グリシジルメ
タクリレートjs、3部、ハイドロキノン0.04部お
よびN、N−ジメチルベンジルアミン0.11部を徐々
に添加し同温度で200時間反応せて酸価が4以下であ
ることを確認し、1分子中に約27(gilのエチレン
性不飽和基を有し3分子量約22100の樹脂(A)を
得た。
Example 1 A reactor equipped with a stirrer, a cooler, a thermometer, and a dropping funnel was purged with nitrogen gas, and then methyl isobutyl ketone 3
29 parts and 329 parts of cyclohexanone were charged, and while stirring, 154 parts of phenoxy resin (Bakelite PKHI+, trade name manufactured by Union Carbide) was gradually added and dissolved. Next, 13.5 parts of succinic anhydride was added and reacted at the same temperature, and the disappearance of the absorption peaks of the acid anhydride (1790 and 1B70c1m-1) was confirmed in the infrared spectrum, and then 13.5 parts of succinic anhydride and glycidyl were added. Gradually add 3 parts of methacrylate js, 0.04 part of hydroquinone and 0.11 part of N,N-dimethylbenzylamine, react at the same temperature for 200 hours, confirm that the acid value is 4 or less, and make one molecule. A resin (A) having an ethylenically unsaturated group of about 27 (gil) and a molecular weight of about 22,100 was obtained.

樹脂(A)の溶液100部にエチレン性不飽和基を有す
るモノマー(Nにエステル14G、新中村化学製商標名
)20部を混合熔解した後、ブリキ板上に固形分で 2
0μとなるように塗装し、揮発性溶媒を揮発せしめた後
に電子線照射装置CB15O−15−10(エナージー
サイエンス社)を用い加速電圧165KV、 3Mra
dで照射し硬化させた。硬化塗膜の物性などは表1に示
す。
After mixing and melting 20 parts of a monomer having an ethylenically unsaturated group (Ester 14G for N, trade name manufactured by Shin Nakamura Chemical Co., Ltd.) in 100 parts of a solution of resin (A), 2 parts of the solid content were placed on a tin plate.
After coating the film so as to have a particle diameter of 0μ and volatilizing the volatile solvent, it was irradiated with an electron beam irradiation device CB15O-15-10 (Energy Science Co., Ltd.) at an acceleration voltage of 165KV and 3Mra.
It was irradiated and cured at d. The physical properties of the cured coating film are shown in Table 1.

実施例2 実施例1と同じ反応器に、窒素ガスで置換した後。Example 2 The same reactor as in Example 1 was replaced with nitrogen gas.

メチルイソブチルケトン473部およびシクロヘキサノ
ン473部を仕込み、攪拌しながら実施例1と同じ樹脂
(ベークライトPKIIH) 200部を徐々に添加し
溶解する。ついで無水1.2−シクロヘキサンジカルボ
ン酸l048部を添加し同温度で反応し、赤外線スペク
トルで酸無水物の吸収ピークの消滅を確認し、その後さ
らに無水1.2−シクロヘキサンジカルボン酸49.2
部。
473 parts of methyl isobutyl ketone and 473 parts of cyclohexanone were charged, and while stirring, 200 parts of the same resin as in Example 1 (Bakelite PKIIH) was gradually added and dissolved. Next, 1048 parts of 1,2-cyclohexanedicarboxylic anhydride was added and reacted at the same temperature, and disappearance of the absorption peak of the acid anhydride was confirmed in the infrared spectrum, and then 49.2 parts of 1,2-cyclohexanedicarboxylic anhydride
Department.

グリシジルメタクリレート55.4部、ハイドロキノン
0.06部およびN、N−ジメチルベンジルアミン0.
16部を徐々に添加し同温度で15時間反応させて酸価
が4以下であることを確認し、1分子中に約30個のエ
チレン性不飽和基を有し1分子量約24300の樹脂(
B)を得た。
55.4 parts of glycidyl methacrylate, 0.06 parts of hydroquinone and 0.0 parts of N,N-dimethylbenzylamine.
16 parts were gradually added and reacted at the same temperature for 15 hours to confirm that the acid value was 4 or less.
B) was obtained.

樹脂CB)の溶液280部にエチレン性不飽和基を有す
るモノマー(アニロックス1200.東亜合成製商標名
)20部およびカヤラッドDPIIA (日本化薬製商
標名) 10部を混合熔解し、さらにカーボンブラック
(MA−11,三菱化成製)70部を加えガラスピーズ
100部と共にサンドミルで分散し黒色塗料を作製し、
この塗料を15μ厚のポリエチレンテレフタレートフィ
ルムの上に固形分で5μとなるように塗装し、揮発性溶
媒を揮発せしめた後に実施例1と同様に電子線照射して
硬化させた。
20 parts of a monomer having an ethylenically unsaturated group (Anilox 1200, trademark name of Toagosei Co., Ltd.) and 10 parts of Kayarad DPIIA (trade name of Nippon Kayaku Co., Ltd.) were mixed and melted in 280 parts of a solution of resin CB), and then carbon black ( 70 parts of MA-11 (manufactured by Mitsubishi Kasei) were added and dispersed in a sand mill with 100 parts of glass beads to make a black paint.
This coating material was applied onto a polyethylene terephthalate film having a thickness of 15 .mu.m so that the solid content was 5 .mu.m, and after the volatile solvent was evaporated, it was cured by electron beam irradiation in the same manner as in Example 1.

実施例3 キシレン84部、酢酸ブチル56部およびOH含有アク
リル系樹脂(アクリデックへ−811.大日本インキ化
学製商標名)300部を実施例1と同様にして無水コハ
ク酸1.8部と予め反応させ1次いで無水コハク酸16
.2部、グリシジルメタクリレート38.3部、ハイド
ロキノン0.03部およびトリエチルアミン0.001
部を徐々に添加し同温度で22時間反応させて酸価が5
以下であることを確認し、1分子中荷役18個のエチレ
ン性不飽和基を有し1分子量約19500の樹脂(C)
を得た。
Example 3 84 parts of xylene, 56 parts of butyl acetate, and 300 parts of OH-containing acrylic resin (Acrydec-811. Trade name manufactured by Dainippon Ink Chemical Co., Ltd.) were mixed in advance with 1.8 parts of succinic anhydride in the same manner as in Example 1. React 1 then succinic anhydride 16
.. 2 parts, 38.3 parts of glycidyl methacrylate, 0.03 parts of hydroquinone and 0.001 parts of triethylamine.
1 part was gradually added and reacted at the same temperature for 22 hours until the acid value reached 5.
Confirm that the resin (C) has 18 ethylenically unsaturated groups in one molecule and has a molecular weight of approximately 19,500.
I got it.

樹脂(C)の溶液87.5部にエチレン性不飽和基を有
するモノマー(NKエステルNPC,新中村化学製商標
名)15部およびベンゾフェノン1部を混合溶解した後
、ブリキ板上に固形分で25μとなるように塗装し。
After mixing and dissolving 15 parts of a monomer having an ethylenically unsaturated group (NK Ester NPC, trade name manufactured by Shin Nakamura Chemical Co., Ltd.) and 1 part of benzophenone in 87.5 parts of a solution of resin (C), the solid content was poured onto a tin plate. Paint it to be 25μ.

揮発性溶媒を揮発せしめた後、80L’c+mの紫外゛
線うンプの下10cmのところをl m / win、
のラインスピードで2回照射して硬化させた。
After evaporating the volatile solvent, place 10 cm below an 80 L'c+m ultraviolet light pump at l m/win,
It was cured by irradiating it twice at a line speed of .

実施例4 メチルエチルケトン289.9 部、  )ルエン2B
9.9 部および塩化ビニル/酢酸ビニル共重合樹脂の
部分ケン化物(ビニライトVAGII、ユニオンカーバ
イド社製商標名)200部を仕込み、攪拌しながら実施
例1と同様にして無水1,2−シクロヘキサンジカルボ
ン酸8゜4部を添加して反応させ9次いで無水1.2−
シクロヘキサンジカルボン酸16.8部、グリシジルメ
タクリレート23.2部、ハイドロキノン0.02部お
よびトリエタノールアミン0.12部を徐々に添加し同
温度で25時間反応させて酸価が4以下であることを確
認し、1分子中に約20個のエチレン性不飽和基を有し
1分子量約31000の樹脂(D)を得た。
Example 4 289.9 parts of methyl ethyl ketone, ) Luene 2B
9.9 parts of vinyl chloride/vinyl acetate copolymer resin and 200 parts of a partially saponified vinyl chloride/vinyl acetate copolymer resin (Vinyrite VAG II, trade name manufactured by Union Carbide) were charged, and anhydrous 1,2-cyclohexane dicarbonate was prepared in the same manner as in Example 1 while stirring. Add 8.4 parts of acid and react.9 Then anhydride 1.2-
16.8 parts of cyclohexanedicarboxylic acid, 23.2 parts of glycidyl methacrylate, 0.02 parts of hydroquinone and 0.12 parts of triethanolamine were gradually added and reacted at the same temperature for 25 hours to confirm that the acid value was 4 or less. After confirmation, a resin (D) having about 20 ethylenically unsaturated groups in one molecule and a molecular weight of about 31,000 was obtained.

樹脂(D)の溶液25部にエチレン性不飽和基を有する
モノマー(アニロフクスM−7100.東亜合成製商標
名)20部およびNKエステルA−TMPT、新中村化
学製商標名)5部を混合溶解し、ブリキ板上に固形分で
50μとなるように塗装し、揮発性溶媒を揮発せしめた
後実施例1と同様に電子線照射して硬化させた。
Mix and dissolve 20 parts of a monomer having an ethylenically unsaturated group (Anilovx M-7100, trade name manufactured by Toagosei Co., Ltd.) and 5 parts of NK Ester A-TMPT, trade name manufactured by Shin Nakamura Chemical Co., Ltd.) in 25 parts of a solution of resin (D). Then, it was coated on a tin plate so that the solid content was 50 μm, and after the volatile solvent was evaporated, it was irradiated with an electron beam and cured in the same manner as in Example 1.

比較例1 メチルエチルケトン289.9部、トルエン289.9
 部およびビニライトVAG)1200部を仕込み、i
拌しながら溶解し、これにアクリル酸11.2部および
P−)ルエンスルホン酸0.06部を仕込み、空気気流
下100℃で10時間反応させた。酸価は約19であり
、約4割の未反応アクリル酸が残存し、結果として1分
子中に約12個のエチレン性不飽和基が導入された樹脂
組成物が得られた。この樹脂組成物は残存アクリル酸の
臭気が酷かった。
Comparative Example 1 289.9 parts of methyl ethyl ketone, 289.9 parts of toluene
and Vinylite VAG) 1200 parts, i
The mixture was dissolved while stirring, and 11.2 parts of acrylic acid and 0.06 part of P-)luenesulfonic acid were added thereto, and the mixture was reacted at 100° C. for 10 hours under a stream of air. The acid value was about 19, and about 40% of unreacted acrylic acid remained, resulting in a resin composition in which about 12 ethylenically unsaturated groups were introduced into one molecule. This resin composition had a strong odor from residual acrylic acid.

比較例1 フェノール樹脂(ベークライトCKl’12432.昭
和ユニオン製商標名)150部をメチルエチルケトン1
28.3部で熔解し、80℃にて実施例1と同様にして
無水コハク酸112.5部を反応甘さ1次いで無水コハ
ク酸112.5部、グリシジルメタクリレート213部
、ハイドロキノン0,2部およびトリエタノールアミン
0.26部を徐々に添加し同温度で20時間反応させて
酸価がlO以下であることを確認し、1分子中に約10
個のエチレン性不飽和基を有し1分子量約2400の樹
脂(E)を得た。
Comparative Example 1 150 parts of phenol resin (Bakelite CKl'12432. Trade name manufactured by Showa Union) was mixed with 1 part of methyl ethyl ketone.
Melt 28.3 parts of succinic anhydride and react with 112.5 parts of succinic anhydride at 80°C in the same manner as in Example 1. Then, 0.26 parts of triethanolamine was gradually added and reacted at the same temperature for 20 hours, and the acid value was confirmed to be less than 1O.
A resin (E) having ethylenically unsaturated groups and having a molecular weight of about 2,400 was obtained.

樹脂(E)の溶液100部にNKエステル14G 20
部を混合し、実施例1と同様に電子線照射して硬化させ
た。
NK ester 14G 20 to 100 parts of resin (E) solution
The components were mixed and cured by electron beam irradiation in the same manner as in Example 1.

比較例2 メチルエチルケトン100部、トルエン1000部およ
び塩化ビニル/酢酸ビニル共重合樹脂の部分ケン化物(
UCARソリュションビニル樹脂VYf!S、分子量的
4゜000、ユニオンカーバイド社製商標名)200部
を仕込み、攪拌しながら実施例4と同様にして無水1,
2−シクロヘキサンジカルボン酸23.1部を添加して
反応させ9次いで無水1.2−シクロヘキサンジカルボ
ン酸53.9部、グリシジルメタクリレート71.0部
、ハイドロキノン0.07部およびトリエタノールアミ
ン0.18部を徐々に添加し同温度で25時間反応させ
て酸価が4以下であることを確認し、1分子中に約20
個のエチレン性不飽和基を有し1分子量約31000の
樹脂(F)を得た。
Comparative Example 2 100 parts of methyl ethyl ketone, 1000 parts of toluene and partially saponified vinyl chloride/vinyl acetate copolymer resin (
UCAR solution vinyl resin VYf! 200 parts of S, molecular weight 4°000, trade name manufactured by Union Carbide Co., Ltd.) were added, and anhydrous 1,
23.1 parts of 2-cyclohexanedicarboxylic acid was added and reacted.9 Then, 53.9 parts of 1,2-cyclohexanedicarboxylic acid anhydride, 71.0 parts of glycidyl methacrylate, 0.07 parts of hydroquinone and 0.18 parts of triethanolamine were added. was gradually added and reacted at the same temperature for 25 hours, and it was confirmed that the acid value was 4 or less.
A resin (F) having 3 ethylenically unsaturated groups and a molecular weight of about 31,000 was obtained.

樹脂(F)を用い実施例4と同様にして硬化塗膜を得た
A cured coating film was obtained in the same manner as in Example 4 using resin (F).

表1 実施例 MEK   鉛筆 密着性   折曲 光沢尚
  ラビング 硬度       加工1100回以上
 3 H100/100 0 02    〃   −
〃   −0 3〃4H〃    ○  0 4   〃   4H〃   ○  ○比較例1  〃
3HO/100  xx  −比較例2  〃3H50
/100  xx  −注) MEKラビング:メチル
エチルケトン含浸布により表面をこすり被塗装物が露出
する までの回数 鉛筆硬度  ;三菱鉛筆ユニ 密着性   ;・ゴバン目カット後(IOX 10)の
粘着テープ剥離による残存数 折曲加工性 ;lT折曲 光沢    ;目視
Table 1 Example MEK Pencil Adhesion Bending Glossiness Rubbing Hardness Processing 1100 times or more 3 H100/100 0 02 〃 -
〃 -0 3〃4H〃 ○ 0 4 〃 4H〃 ○ ○Comparative example 1 〃
3HO/100xx - Comparative Example 2 〃3H50
/100 xx - Note) MEK rubbing: Number of times the surface is rubbed with a cloth impregnated with methyl ethyl ketone until the object to be coated is exposed Pencil hardness; Mitsubishi Pencil Uni adhesion; - Number remaining after peeling off the adhesive tape after cutting (IOX 10) Bending processability; LT bending gloss; visual inspection

Claims (1)

【特許請求の範囲】 1、分子中に水酸基を有する分子量5,000以上のポ
リマー(A)、カルボン酸無水物(B)およびエチレン
性不飽和基を有するエポキシモノマー(C)を反応せし
めるエチレン性不飽和基を有する硬化性樹脂組成物の製
造法において、ポリマー(A)にカルボン酸無水物(B
)の一部を予め反応せしめた後、もしくは反応せしめず
して、カルボン酸無水物(B)およびエポキシモノマー
(C)を添加して反応せしめることを特徴とする製造法
。 2、分子中に水酸基を有する分子量10,000以上の
ポリマー(A)を用いることを特徴とする特許請求の範
囲第1項記載の製造法。
[Claims] 1. An ethylenic polymer in which a polymer (A) with a molecular weight of 5,000 or more having a hydroxyl group in the molecule, a carboxylic acid anhydride (B), and an epoxy monomer (C) having an ethylenically unsaturated group are reacted. In the method for producing a curable resin composition having an unsaturated group, a carboxylic anhydride (B) is added to the polymer (A).
) A production method characterized in that after reacting a portion of (B) in advance or without reacting, carboxylic acid anhydride (B) and epoxy monomer (C) are added and reacted. 2. The production method according to claim 1, characterized in that a polymer (A) having a hydroxyl group in the molecule and having a molecular weight of 10,000 or more is used.
JP17749986A 1986-07-30 1986-07-30 Production of curable resin composition having ethylenically unsaturated group Pending JPS6335608A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17749986A JPS6335608A (en) 1986-07-30 1986-07-30 Production of curable resin composition having ethylenically unsaturated group

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17749986A JPS6335608A (en) 1986-07-30 1986-07-30 Production of curable resin composition having ethylenically unsaturated group

Publications (1)

Publication Number Publication Date
JPS6335608A true JPS6335608A (en) 1988-02-16

Family

ID=16031973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17749986A Pending JPS6335608A (en) 1986-07-30 1986-07-30 Production of curable resin composition having ethylenically unsaturated group

Country Status (1)

Country Link
JP (1) JPS6335608A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837993A (en) * 1971-09-18 1973-06-04
JPS5322589A (en) * 1976-08-14 1978-03-02 Matsushita Electric Works Ltd Hardening resin composition
JPS5580407A (en) * 1978-12-07 1980-06-17 Ici Ltd Macromonomer and graft copolymer

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4837993A (en) * 1971-09-18 1973-06-04
JPS5322589A (en) * 1976-08-14 1978-03-02 Matsushita Electric Works Ltd Hardening resin composition
JPS5580407A (en) * 1978-12-07 1980-06-17 Ici Ltd Macromonomer and graft copolymer

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