JPS6335477A - Treatment of oxide base ceramic surface layer - Google Patents
Treatment of oxide base ceramic surface layerInfo
- Publication number
- JPS6335477A JPS6335477A JP17784086A JP17784086A JPS6335477A JP S6335477 A JPS6335477 A JP S6335477A JP 17784086 A JP17784086 A JP 17784086A JP 17784086 A JP17784086 A JP 17784086A JP S6335477 A JPS6335477 A JP S6335477A
- Authority
- JP
- Japan
- Prior art keywords
- surface layer
- treated
- treatment
- aqueous solution
- pores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002344 surface layer Substances 0.000 title claims description 25
- 239000000919 ceramic Substances 0.000 title claims description 12
- 238000011282 treatment Methods 0.000 title description 5
- 239000000463 material Substances 0.000 claims description 18
- 239000007864 aqueous solution Substances 0.000 claims description 13
- 239000011148 porous material Substances 0.000 claims description 13
- 238000000034 method Methods 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 3
- 239000011224 oxide ceramic Substances 0.000 description 7
- 229910052574 oxide ceramic Inorganic materials 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 6
- 239000010410 layer Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 238000005253 cladding Methods 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000013532 laser treatment Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Surface Treatment Of Glass (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、酸化物系セラミックス表層の処理方法に関し
、さらに詳しくはレーザ光を照射することによって該表
層を均平にすると共に、気孔のない状態に処理する方法
に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for treating the surface layer of oxide-based ceramics, and more specifically, the present invention relates to a method for treating the surface layer of oxide-based ceramics, and more specifically, it flattens the surface layer by irradiating it with laser light and makes it free from pores. It concerns how to process the state.
酸化物系セラミックスからなる物質、例えばアルミナの
焼結体や溶射被膜は第１図（ａ）の模式的拡大断面図に
示すように一般に多数の気孔が存在する多孔質の構造と
なっている。図において、１はアルミナの溶射被膜等の
被処理物、２は内部に生成した気孔である。Substances made of oxide ceramics, such as alumina sintered bodies and thermally sprayed coatings, generally have a porous structure in which a large number of pores exist, as shown in the schematic enlarged cross-sectional view of FIG. 1(a). In the figure, 1 is an object to be treated such as a sprayed coating of alumina, and 2 is a pore generated inside.
かかる気孔が多数存在すると、基材の耐食性が劣化する
ことになるので、溶射被膜の表層のみでも気孔を消失さ
せることが望まれている。そこで、かかる気孔の封孔処
理方法の１つとして、例えばＣ０２レーザによる表層溶
融法が試みられている。If a large number of such pores exist, the corrosion resistance of the base material will deteriorate, so it is desired to eliminate the pores even in the surface layer of the thermally sprayed coating. Therefore, as one method for sealing such pores, a surface layer melting method using, for example, a C02 laser has been attempted.
しかしながら、アルミナの場合はレーザ光の吸収率が非
常に高いため、レーザ光を照射すると表層が高温となっ
てたちまちのうちに蒸発してしまい、表層の溶融状態を
つくることができず、そのため表面に大きな凹部を形成
し、アルミナのレーザによる処理は極めて困難であると
いう問題点があった。また、アルミナ等の被処理物の表
面は従来の封孔処理をした状態のままでは凹凸面を呈し
均平でないという問題点があった。However, in the case of alumina, the absorption rate of laser light is extremely high, so when irradiated with laser light, the surface layer becomes high temperature and evaporates immediately, making it impossible to create a molten state on the surface layer. There was a problem in that large recesses were formed in the alumina, making it extremely difficult to treat alumina with a laser. Further, there is a problem in that the surface of the object to be treated, such as alumina, exhibits an uneven surface and is not level when it has been subjected to the conventional sealing treatment.
本発明に係る酸化物系セラミックス表層の処理方法は、
セラミックスに吸収されるレーザ光のエネルギーを抑制
すると共に、表面の凹凸状態を均平にするよう被処理物
の表面にその被処理物と同一材料又は異種材料の水溶液
を塗布し、その後にレーザ光を照射するようにしたもの
である。The method for treating the surface layer of oxide ceramics according to the present invention includes:
An aqueous solution of the same material as the workpiece or a different material is applied to the surface of the workpiece to suppress the energy of the laser light absorbed by the ceramic and to even out the unevenness of the surface, and then the laser light is applied to the surface of the workpiece. It is designed to irradiate.
本発明においては、被処理物の表面に塗布する水溶液を
エネルギーコントロール材及びフィラー材として使用す
るもので、レーザ光を照射した場合にそのエネルギーが
例えば水の気化熱に一部消費されろため被処理物表面の
過剰な蒸発を防ぎ、かつその表層を溶融させ気孔を消失
させる一方、水溶液中のセラミックス成分が被処理物の
凹凸表面を埋めて均平にする。そして、水溶液中のセラ
ミックス成分が被処理物と同一材料である場合は単に表
面の平滑化材料として、異種材料の場合は共晶反応等に
よって生成された混合相がクラッド層として機能する。In the present invention, an aqueous solution applied to the surface of the object to be treated is used as an energy control material and a filler material. Excessive evaporation on the surface of the object to be treated is prevented, and the surface layer is melted to eliminate pores, while the ceramic components in the aqueous solution fill in the uneven surface of the object to be treated and level it out. If the ceramic component in the aqueous solution is the same material as the object to be treated, it simply functions as a surface smoothing material, and if it is a different material, a mixed phase generated by a eutectic reaction or the like functions as a cladding layer.
以下、本発明による酸化物系セラミックス表層の処理方
法を図面を参照しながら具体的に説明する。Hereinafter, the method for treating the surface layer of oxide-based ceramics according to the present invention will be specifically explained with reference to the drawings.
第１図（ｂ）は本発明方法による被処理物表層部の模式
的拡大断面図である。なお、同図では理解を容易にする
ためにレーザ処理後において処理層と非処理層とは明白
な境界を画しているが、実際にはクラッド層として形成
される場合を除き、かかる境界は存在しない。FIG. 1(b) is a schematic enlarged sectional view of the surface layer of the object to be treated according to the method of the present invention. In addition, in the same figure, a clear boundary is drawn between the treated layer and the untreated layer after laser treatment for ease of understanding, but in reality, such a boundary is not formed unless it is formed as a cladding layer. not exist.
この実施例では、ＡＩ、Ｏ，，８１０８等の酸化物系セ
ラミックスからなる被処理物１の凹凸表面にその被処理
物１と同−又は異種の材料からなる水溶液を均平になる
よう塗布する。なお、被処理物１は焼結体或いは溶射被
膜等いずれでもよい。In this example, an aqueous solution made of the same or different material as the workpiece 1 is evenly applied to the uneven surface of the workpiece 1 made of oxide ceramics such as AI, O, , 8108, etc. . Note that the object to be treated 1 may be a sintered body, a thermally sprayed coating, or the like.
また、水溶液の塗布の厚さは０．１〜２．Ｏｍａ位であ
る。The thickness of the aqueous solution applied is 0.1 to 2. It's about 100%.
次に、この状態でレーザ光を通常のように照射する。す
ると、レーザ光のエネルギーの一部は水溶液に含まれて
いる水分の気化熱に消費されるので、水溶液内のセラミ
ックス成分及び被処理物１の表層の蒸発を防止しこれら
を溶融せしめろ。したがって、乙のレーザ処理ＨＩ３の
ために、被処理物１の表層の気孔２は消失し封孔される
と共に、凹部を埋め均一な表面に仕上げることができる
。Next, in this state, laser light is irradiated as usual. Then, part of the energy of the laser beam is consumed by the heat of vaporization of the water contained in the aqueous solution, so the ceramic components in the aqueous solution and the surface layer of the object 1 to be treated are prevented from evaporating and melted. Therefore, due to the laser treatment HI3 of step B, the pores 2 in the surface layer of the object to be processed 1 disappear and are sealed, and the recesses can be filled and a uniform surface can be finished.
次に、上記実施例による実験結果を示す。Next, experimental results according to the above examples will be shown.
〈具体例１〉
被処理物：Ａｊｚ０３常圧溶射材−膜厚Ｑ、５＋ｍ（基
材はＳＳ４１鋼−板厚５鴫）
フィラー材：Ａ＃ｚ０３粉末（粒径４４μｎ以下）の水
溶液
レーザ照射条件： Ｃｏ、レーザ
（波長１０．６μｍ）
出力 ７５０Ｗ
照射点ビーム径 １０ｍ５φ
移動速度 ６０ｅｍ１０＋１ｎ
ＡＩ、０．焼結体表面にフィラー材を０．５園塗布後、
レーザを上記条件で照射した。フィラー材中の水分はレ
ーザ照射により全て蒸発し、Ａｌ２Ｏ、成分は一部蒸発
したが焼結体表層部とともに溶融した。<Specific Example 1> Object to be treated: Ajz03 normal pressure sprayed material - film thickness Q, 5+m (base material is SS41 steel - plate thickness 5) Filler material: Aqueous solution laser irradiation conditions for A#z03 powder (particle size 44 μn or less) : Co, laser (wavelength 10.6μm) Output 750W Irradiation point beam diameter 10m5φ Traveling speed 60em10+1n AI, 0. After applying 0.5 inch of filler material on the surface of the sintered body,
Laser irradiation was performed under the above conditions. All of the moisture in the filler material was evaporated by laser irradiation, and Al2O and other components were partially evaporated but melted together with the surface layer of the sintered body.
その結果、処理層の気孔は消失し、かつ表面は平滑な仕
上りとなった（表１参照）。As a result, the pores in the treated layer disappeared and the surface became smooth (see Table 1).
表１
く具体例２〉
被処理物：Ａｌ２Ｏ，焼結体
ブイラー材： ＳＬＯ□粉末＋Ａｌ２Ｏ，粉末の水溶液
レーザ照射条件：具体例１と同様
処理層１！ＳｉＯ，２５％、Ａｔ＋、０３７ｓ％ツムラ
イト相となり、第２図のようなＡＩ、０．＋ムライトの
クラッドセラミックスが形成された。もちろん、ムライ
ト相には気孔はほとんどなく表面も平滑であった。Table 1 Specific Example 2> Object to be treated: Al2O, sintered body Boiler material: SLO□ powder + Al2O, powder aqueous solution Laser irradiation conditions: Same as Example 1 Treated layer 1! SiO, 25%, At+, 037s% tumulitic phase, and AI, 0.0% as shown in Figure 2. + Mullite clad ceramics were formed. Of course, the mullite phase had almost no pores and the surface was smooth.
以上のように本発明によれば、酸化物系セラミックスの
被処理物の表面にその被処理物と同−又は異種の材料の
水溶液を塗布することにより、被処理物に照射されるレ
ーザ光のエネルギーを例えば水の気化熱に一部消費する
ようにして被処理物表層及び水溶液中のセラミックス成
分の蒸発を防ぎ、かつその表層を溶融させるものである
。As described above, according to the present invention, by applying an aqueous solution of the same or different material to the surface of the oxide ceramic workpiece, the laser beam irradiated onto the workpiece can be reduced. Part of the energy is consumed as heat of vaporization of water, for example, to prevent the evaporation of the surface layer of the object to be treated and the ceramic components in the aqueous solution, and to melt the surface layer.
したがって、これにより被処理物の表層の気孔を殆ど消
失させることができると共に、表面を均平にすることが
できる。そのため、本発明は従来困難とされていた酸化
物系セラミックスに対するレーザ光照射による封孔処理
と平滑化処理を同時に行うことができるという効果を奏
する。Therefore, this makes it possible to almost eliminate the pores in the surface layer of the object to be treated, and also to make the surface level. Therefore, the present invention has the effect that sealing treatment and smoothing treatment by laser beam irradiation on oxide ceramics, which have been considered difficult in the past, can be performed at the same time.
第１図（ｂ）４よ本発明方法による被処理物の模式的拡
大断面図、同図（ａ）は処理前の酸化物系セラミックス
表層の模式的拡大断面図、第２図はクラッドセラミック
スの場合の模式的拡大断面図である。
１：被処理物、２：気孔。
代理人 弁理士 佐 藤 正 竿
部 ２ 図
手続補正書、旧の
昭和６１年 ９月２日Figure 1(b) 4 is a schematic enlarged sectional view of the object to be treated by the method of the present invention, Figure 1(a) is a schematic enlarged sectional view of the surface layer of oxide ceramics before treatment, and Figure 2 is a schematic enlarged sectional view of the surface layer of oxide ceramics. FIG. 3 is a schematic enlarged sectional view of the case. 1: object to be treated, 2: pores. Agent Patent Attorney Tadashi Sato Kanabe 2 Draft procedure amendment, formerly dated September 2, 1986
Claims (1)
射することにより該被処理物の表層を処理する方法にお
いて、前記被処理物の表面に該被処理物と同一材料又は
異種材料の水溶液を塗布し、その後にレーザ光を照射し
て前記表層を気孔のない均平な表面に仕上げることを特
徴とする酸化物系セラミックス表層の処理方法。In a method of treating the surface layer of an oxide-based ceramic object by irradiating the surface of the object with laser light, an aqueous solution of the same material or a different material as the object is applied to the surface of the object. 1. A method for treating a surface layer of oxide-based ceramics, which comprises coating the surface layer and then irradiating the surface layer with a laser beam to finish the surface layer into a flat surface without pores.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17784086A JPS6335477A (en) | 1986-07-30 | 1986-07-30 | Treatment of oxide base ceramic surface layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17784086A JPS6335477A (en) | 1986-07-30 | 1986-07-30 | Treatment of oxide base ceramic surface layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6335477A true JPS6335477A (en) | 1988-02-16 |
Family
ID=16038035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17784086A Pending JPS6335477A (en) | 1986-07-30 | 1986-07-30 | Treatment of oxide base ceramic surface layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6335477A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7419028B2 (en) | 2004-09-30 | 2008-09-02 | Honda Motor Co., Ltd. | Motorcycle |
-
1986
- 1986-07-30 JP JP17784086A patent/JPS6335477A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7419028B2 (en) | 2004-09-30 | 2008-09-02 | Honda Motor Co., Ltd. | Motorcycle |
| DE102005043362B4 (en) * | 2004-09-30 | 2008-10-30 | Honda Motor Co., Ltd. | motorcycle |
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