JPS63317680A - Formation of chromium oxide film having excellent resistance to heat and corrosion - Google Patents
Formation of chromium oxide film having excellent resistance to heat and corrosionInfo
- Publication number
- JPS63317680A JPS63317680A JP15150587A JP15150587A JPS63317680A JP S63317680 A JPS63317680 A JP S63317680A JP 15150587 A JP15150587 A JP 15150587A JP 15150587 A JP15150587 A JP 15150587A JP S63317680 A JPS63317680 A JP S63317680A
- Authority
- JP
- Japan
- Prior art keywords
- film
- chromic acid
- chromium oxide
- ammonium
- oxide film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 title claims abstract description 23
- 229910000423 chromium oxide Inorganic materials 0.000 title claims abstract description 12
- 230000007797 corrosion Effects 0.000 title claims abstract description 12
- 238000005260 corrosion Methods 0.000 title claims abstract description 12
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 239000002245 particle Substances 0.000 claims abstract description 45
- 238000000034 method Methods 0.000 claims abstract description 23
- 239000002002 slurry Substances 0.000 claims abstract description 19
- 238000010438 heat treatment Methods 0.000 claims abstract description 16
- 229910052751 metal Inorganic materials 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims abstract description 4
- 239000007864 aqueous solution Substances 0.000 claims description 21
- 239000000243 solution Substances 0.000 claims description 15
- 238000009826 distribution Methods 0.000 claims description 5
- 230000001186 cumulative effect Effects 0.000 claims description 3
- 239000011812 mixed powder Substances 0.000 claims 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract description 40
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract description 40
- 238000005470 impregnation Methods 0.000 abstract description 18
- PMJNEQWWZRSFCE-UHFFFAOYSA-N 3-ethoxy-3-oxo-2-(thiophen-2-ylmethyl)propanoic acid Chemical compound CCOC(=O)C(C(O)=O)CC1=CC=CS1 PMJNEQWWZRSFCE-UHFFFAOYSA-N 0.000 abstract description 16
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract description 16
- 229910052593 corundum Inorganic materials 0.000 abstract description 15
- 229910001845 yogo sapphire Inorganic materials 0.000 abstract description 15
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 abstract description 8
- 239000000463 material Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 7
- 239000011248 coating agent Substances 0.000 abstract description 6
- 239000000843 powder Substances 0.000 abstract description 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 abstract description 4
- 239000000919 ceramic Substances 0.000 abstract description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 229910052681 coesite Inorganic materials 0.000 abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract 2
- 239000000377 silicon dioxide Substances 0.000 abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract 2
- 229910052682 stishovite Inorganic materials 0.000 abstract 2
- 229910052905 tridymite Inorganic materials 0.000 abstract 2
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 16
- 239000011148 porous material Substances 0.000 description 15
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical compound [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 description 12
- 230000000694 effects Effects 0.000 description 12
- 230000035939 shock Effects 0.000 description 11
- 239000010419 fine particle Substances 0.000 description 10
- 238000007796 conventional method Methods 0.000 description 7
- BYFGZMCJNACEKR-UHFFFAOYSA-N aluminium(i) oxide Chemical compound [Al]O[Al] BYFGZMCJNACEKR-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 238000010304 firing Methods 0.000 description 4
- 239000011651 chromium Substances 0.000 description 3
- 239000011362 coarse particle Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- CMMUKUYEPRGBFB-UHFFFAOYSA-L dichromic acid Chemical compound O[Cr](=O)(=O)O[Cr](O)(=O)=O CMMUKUYEPRGBFB-UHFFFAOYSA-L 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- -1 (:r20:1)) Chemical compound 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910020489 SiO3 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- RTKOBJLAEACCQP-UHFFFAOYSA-L azane;dihydroxy(dioxo)chromium Chemical compound N.O[Cr](O)(=O)=O RTKOBJLAEACCQP-UHFFFAOYSA-L 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 230000009528 severe injury Effects 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Chemical Treatment Of Metals (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、高温環境及び腐食性雰囲気で使用されている
機械構造部材又はロール類の表面改質に適用するに適し
た耐熱性・耐食性に富んだクロム酸化物皮膜の形成方法
に関するものである。Detailed Description of the Invention (Field of Industrial Application) The present invention provides heat resistance and corrosion resistance suitable for surface modification of mechanical structural members or rolls used in high temperature environments and corrosive atmospheres. The present invention relates to a method for forming a chromium oxide-rich film.
(従来の技術)
従来から無水クロム酸水溶液と5i02. Al2O3
粉末を使用して焼成皮膜を形成させる方法として、第1
図に示す工程が知られている。尚、無水クロム酸水溶液
とは無水クロム酸の結晶を水に溶解したものを言う、す
なわち、金属材料の被処理体を脱脂した後ブラスト処理
を行って本処理に適した表面とする。これに無水クロム
酸(以下単にクロム酸)水溶液とSiO□・Al2O.
粉末より構成されるスラリを浸漬法又は塗布法によって
スラリ層をつくり、乾燥して水分を蒸発させた後、50
0〜600℃で約1時間加熱する。この焼成処理によっ
て、金属材料表面にクロム酸の焼成物をマトリックスと
し、 5in2. Al2O3を骨材とする皮膜が生成
する。しかし、この皮膜は多孔質であるため全屈材料と
の密着性はもとより皮膜そのものの結合力が弱く、又耐
食性にも乏しい欠点かあるので、クロム酸水溶液中に浸
漬して空孔部にクロム酸を含浸させた後、再びこれを5
00〜600’Cに加熱する操作を繰返している。この
含浸と加熱を繰返すことによって空孔部にクロム酸の焼
成物(主として(:r20:1)を充填させると共に、
表面にも緻密な焼成物層を形成させている。しかし、こ
の含浸と加熱を繰返しても空孔への充填と表面部への緻
密な皮膜の形成が困難であるため、含浸#加熱の操作を
非常に多く繰返す必要かある。(Prior art) Conventionally, chromic anhydride aqueous solution and 5i02. Al2O3
The first method for forming a fired film using powder is
The process shown in the figure is known. The aqueous solution of chromic acid anhydride refers to a solution in which crystals of chromic anhydride are dissolved in water; that is, after degreasing the metal material to be treated, a blasting process is performed to make the surface suitable for this treatment. This was mixed with an aqueous solution of chromic acid anhydride (hereinafter simply chromic acid) and SiO□・Al2O.
A slurry layer composed of powder is made by dipping or coating, and after drying to evaporate water,
Heat at 0-600°C for about 1 hour. Through this firing process, the fired product of chromic acid is made into a matrix on the surface of the metal material, and a 5in2. A film with Al2O3 as aggregate is formed. However, since this film is porous, it has weak adhesion with the total bending material, weak bonding strength of the film itself, and poor corrosion resistance. After impregnating with acid, this is again
The operation of heating to 00 to 600'C is repeated. By repeating this impregnation and heating, the pores are filled with a fired product of chromic acid (mainly (:r20:1)), and
A dense fired layer is also formed on the surface. However, even if this impregnation and heating are repeated, it is difficult to fill the pores and form a dense film on the surface, so it is necessary to repeat the impregnation and heating operations many times.
また、含浸液についての従来の技術(特公昭49−28
011.同51−18445、同55−14833.同
56−:16215゜同41−18708及び特開昭5
9−47:182.同59−31867、同59−20
5480.同57−196779.同58−19729
3 >を見ると、クロム酸をはじめ塩化クロム、硝酸ク
ロム。In addition, the conventional technology regarding impregnation liquid (Special Publication Publication No. 49-28
011. 51-18445, 55-14833. 56-:16215゜41-18708 and JP-A-5
9-47:182. 59-31867, 59-20
5480. 57-196779. 58-19729
3 If you look at >, you will find chromic acid, chromium chloride, and chromium nitrate.
醋酸クロム、硫酸クロムなどの各種クロム酸塩の効果に
ついての知見が知られているが、これらを用いても効果
は不十分である。更に、クロム酸アンモンの使用(特公
昭55−14833及び同4l−18708)について
も試験されているが、その効果は焼成皮膜中の空孔を充
填させるが、表面部に緻密で硬い皮膜を生成させること
はできないとされており、現在の技術では解決されてい
ない。Knowledge about the effects of various chromates such as chromium acetate and chromium sulfate is known, but even when these are used, the effects are insufficient. Furthermore, the use of ammonium chromate (Japanese Patent Publications No. 55-14833 and No. 41-18708) has also been tested, but its effect is to fill the pores in the fired film, but it does not produce a dense and hard film on the surface. It is said that it is impossible to do so, and current technology has not solved it.
(発明が解決しようとする問題点)
従来のクロム酸水溶液にSiO□・Al2O3粉末を加
えたスラリを用い、含浸;加熱にクロム酸水溶液を使用
する処理法では、次に示す問題点かある。(Problems to be Solved by the Invention) The conventional processing method in which a slurry of SiO□.Al2O3 powder is added to an aqueous chromic acid solution and the aqueous chromic acid solution is used for impregnation and heating has the following problems.
■SiO3・Al2O3の粒子径が大きい場合(通常2
,5〜5μm)焼成後の皮膜内に形成される空孔が大き
くなるため、被処理材(耐熱ステンレス鋼)と皮膜の接
触面積が小さくなり、両者の密着力が低い原因となって
いる。■When the particle size of SiO3/Al2O3 is large (usually 2
, 5 to 5 μm) Since the pores formed in the film after firing become larger, the contact area between the material to be treated (heat-resistant stainless steel) and the film becomes smaller, which is the cause of low adhesion between the two.
■焼成後の皮膜中に分布している5in2・Al2O3
粒子径が大きい場合、粒子同志及び粒子とクロム酸焼成
物との接触面積が少なくなり、相互の結合力が弱い原因
となフている。■5in2・Al2O3 distributed in the film after firing
When the particle size is large, the contact area between the particles and between the particles and the fired chromic acid product decreases, which is the cause of weak mutual bonding force.
■これに対し5i02. Al2O3粒子径を小さくす
ると焼成皮膜中の空孔も小さくなり、空孔の分布も粗粒
子のものに比較し均等化するが、含浸#加熱繰返しに無
水クロム酸水溶液のみを使用する限り空孔の充填が不十
分であったり、又焼成皮膜表面に緻密な皮膜を形成でき
ない欠点があった。このため含浸#加熱の操作を10〜
2o回も繰返しているのが実状である。■On the other hand, 5i02. When the Al2O3 particle size is reduced, the pores in the fired film become smaller, and the pore distribution becomes more even than that of coarse particles. There were drawbacks such as insufficient filling and inability to form a dense film on the surface of the fired film. For this reason, the impregnation #heating operation is performed from 10 to
The reality is that it is repeated 20 times.
■含浸#加熱の繰返しは高価なエネルギの労費原因とな
っている。■Repeated impregnation #heating causes expensive energy and labor costs.
(問題点を解決・するための手段)
本発明では次の方法を採用することにより前記問題点を
解決した。(Means for solving the problem) In the present invention, the above-mentioned problem was solved by adopting the following method.
(1)含浸用のクロム酸水溶液中にクロム酸アンモン[
(NH<)*Cr0n]又は重クロム酸アンモン[(N
II4)2Cr207]を所定量添加したものを用いる
。(1) Ammonium chromate [
(NH<)*Cr0n] or ammonium dichromate [(N
II4) 2Cr207] is added in a predetermined amount.
(2) SiO□及びAl2O,粒子径を小さくして、
単位重量当りの粒子数を増加させる。(2) SiO□ and Al2O, reducing the particle size,
Increase the number of particles per unit weight.
(作用)
(1)クロム酸アンモン又は重クロム酸アンモンを添加
したクロム酸水溶液な含浸液として焼成処理すると次の
ような現象が起る。すなわち、クロム酸アンモン及び重
クロム酸アンモンは190’C付近から分解をはじめ、
アンモニアを放出するとともにクロム酸化物(Cr20
3)の微粒子を生成する。この微粒子は焼成皮膜中の僅
かな空孔中に分散充填された状態となり、さらに加熱昇
温させると200℃付近からクロム酸アンモン1重りロ
ム酸アンモンと共存しているクロム酸が主体となってい
るクロム酸そのものが溶融してくるので、これか接着剤
的な作用を示し、Sin、及びへ1203粒子とCr2
0rが相互に固着するようになる。クロム酸アンモン及
び重クロム酸アンモンの分解によって生成するCr、O
,粒子は、Igm又はそれ以下の微粒子であるので、皮
膜中の空孔中に存在していても皮n9cの熱的及び機械
的衝撃を吸収して皮膜の破壊を防ぐ作用を示す。又、外
部から腐食性の成分か浸入してくる場合には、空孔容積
の減少効果によって浸入量を抑制し、耐食性を向上させ
る役割を果たすこととなる。(Function) (1) When the impregnating liquid is an aqueous chromic acid solution to which ammonium chromate or ammonium dichromate is added, the following phenomenon occurs. In other words, ammonium chromate and ammonium dichromate begin to decompose around 190'C.
Ammonia is released and chromium oxide (Cr20
3) Generate fine particles. These fine particles become dispersed and filled in the few pores in the fired film, and when the temperature is further increased, from around 200℃, 1 weight of ammonium chromate and chromic acid coexisting with ammonium romate become the main component. Since the chromic acid itself melts, it acts like an adhesive and binds Sin and He1203 particles and Cr2.
0r become fixed to each other. Cr, O produced by decomposition of ammonium chromate and ammonium dichromate
Since the particles are fine particles of Igm or lower, even if they exist in the pores in the coating, they absorb the thermal and mechanical impact of the coating n9c and exhibit the effect of preventing the coating from being destroyed. Furthermore, when corrosive components enter from the outside, the effect of reducing the pore volume suppresses the amount of infiltration and improves corrosion resistance.
さらに、このクロム酸アンモン及び屯クロム酸アンモン
を添加したクロム酸水溶液を用いる方法ては、その作用
機構から明らかなように、SiO□。Furthermore, as is clear from the mechanism of action, this method using ammonium chromate and an aqueous chromic acid solution to which ammonium chromate has been added is effective against SiO□.
Al2O3粒子か多少大きくても焼成皮膜中に形成され
る空孔中へ侵入して微粒のCr2O3を充填させるのて
、SiO□、 Al2O,粒子径の利用範囲を拡大させ
る効果もある。Even if the Al2O3 particles are somewhat large, they can penetrate into the pores formed in the fired film and fill them with fine Cr2O3 particles, which has the effect of expanding the range of use of SiO□, Al2O, and particle size.
焼成皮膜中の空孔がCr2O3の微粉で充填されると、
その後の含浸#加熱工程で供給されるクロム酸水溶液は
、皮膜表面の緻密な焼成層の形成に使用されるようにな
る。この場合にもクロム酸アンモン及び重クロム酸アン
モンを添加したクロム酸水溶液を用いると、それぞれの
アンモニウム塩が昇温過程で早く分解してクロム酸化物
(Cr203)の微粒子を生成し、これが骨材となるた
め、皮膜の、 形成速度が早く、しかも緻密で硬い皮
膜が生成される。本発明者らの調査では、クロム酸アン
モン及び重クロム酸アンモンの添加量がクロム酸水溶液
に対し重量で1oz以内の時、本発明の目的を達させる
ことを見出した。10%を超えると皮膜は脆弱となって
くる。When the pores in the fired film are filled with fine powder of Cr2O3,
The chromic acid aqueous solution supplied in the subsequent impregnation/heating step is used to form a dense fired layer on the surface of the film. In this case as well, if a chromic acid aqueous solution containing ammonium chromate and ammonium dichromate is used, each ammonium salt decomposes quickly during the temperature rising process to produce fine particles of chromium oxide (Cr203), which form the aggregate. As a result, the film formation rate is fast, and a dense and hard film is produced. In our investigation, we found that the object of the present invention can be achieved when the amount of ammonium chromate and ammonium dichromate added is within 1 oz by weight relative to the aqueous chromic acid solution. If it exceeds 10%, the film becomes brittle.
以上のように本発明においては、従来技術ではSiO□
、 AI、03粒子径を小さくしても空孔の充填が不十
分であったり、又皮膜表面に緻密な皮膜を形成すること
が困難であったものが、クロム酸アンモン又は重クロム
酸アンモンを使用することによりこの問題点を解決した
ものである。As described above, in the present invention, SiO□
, AI, 03 Even if the particle size was reduced, the filling of pores was insufficient, or it was difficult to form a dense film on the film surface. By using this, this problem was solved.
(2) 5iO7及びAl2O3粒子径を小さくするこ
とによって単位重量当りの粒子数が増加する。例えばこ
れらの粒子を球状と仮定し、粒子径と表面積比及び粒子
数比を計算すると、概路次のような関係にある。すなわ
ち粒子径4.4μmの粒子の表面積及び粒子数をそれぞ
れ1とすると
粒子径(μm) 表面積比(4πr 2)4.4
12.0 2
.2
1.0 4.40.2
22
粒子数比(4πr 3/3)
10.600
2.04mの粒子径のそれは2.2と11となり、lJ
Lmの粒子径ては4.4と85となる。このように重量
か同じ粒子ても微粒子にすると表面積比と粒子数比か非
常に大となる。特に後者の粒子数の増加は著しいので、
焼成皮膜中に均一に分散すると共にクロム酸との接触面
積が増え、結合力の強化に大きな効果を示す・。(2) By reducing the particle size of 5iO7 and Al2O3, the number of particles per unit weight increases. For example, if these particles are assumed to be spherical and the particle diameter, surface area ratio, and particle number ratio are calculated, the approximate relationship is as follows. In other words, if the surface area and number of particles of a particle with a particle diameter of 4.4 μm are each 1, then the particle diameter (μm) and the surface area ratio (4πr 2) 4.4
12.0 2
.. 2 1.0 4.40.2
22 Particle number ratio (4πr 3/3) 10.600 The particle diameter of 2.04 m is 2.2 and 11, lJ
The particle diameters of Lm are 4.4 and 85. In this way, even if the particles have the same weight, when they are made into fine particles, the surface area ratio and the particle number ratio become extremely large. In particular, the increase in the number of particles in the latter is remarkable;
It is uniformly dispersed in the fired film and increases the contact area with chromic acid, which has a great effect on strengthening the bonding strength.
また、細粒の場合においても、クロム酸を用いる従来の
方法ては、空孔への充填および表面部への緻密な皮膜の
形成が困難であるが、本発明のクロム酸に10z以下の
クロム酸アンモン又は重クロム酸アンモンを添加した溶
液を用いることにより、表層部に緻密なCr、0.皮膜
を形成するとともに、内部も緻密な皮膜を得ることかで
きる。この細粒化による皮膜の緻密化の効果は、SiO
□およびAl2O3の平均粒径(粒径分布の累積値が5
0%になるときの値)2.0gm以下において著しい。Furthermore, even in the case of fine particles, it is difficult to fill the pores and form a dense film on the surface using the conventional method using chromic acid. By using a solution containing ammonium acid or ammonium dichromate, dense Cr, 0. In addition to forming a film, it is also possible to obtain a dense film on the inside. The effect of densification of the film due to this grain refinement is that SiO
□ and the average particle size of Al2O3 (cumulative value of particle size distribution is 5
(value when it becomes 0%) is significant at 2.0 gm or less.
この効果は1.0gm未満においても得ることができる
が、粒径な1.071m未満にするためには長時間の粉
砕、混練を必要とし、経済的てないため、実用的には1
.0〜2.0ILmとすることが好ましい。This effect can be obtained even when the particle size is less than 1.0 gm, but it requires long grinding and kneading to make the particle size less than 1.071 m, which is not economical.
.. It is preferable to set it as 0-2.0ILm.
(実施例) 実施例1 本発明の効果は次に示すような実験によって確認した。(Example) Example 1 The effects of the present invention were confirmed by the following experiments.
(1)試験片(被処理体)の形状及び寸法縦100mm
x横50s−X厚さ5■のSO8304試験片を被処
理体とし、この表面に本発明の焼成皮膜を形成させた。(1) Shape and dimensions of test piece (object to be treated) 100mm long
An SO8304 test piece measuring 50 cm in width and 5 cm in thickness was used as an object to be treated, and the fired film of the present invention was formed on its surface.
(2)スラリ用粒子の種類とその粒径
スラリ用粒子として市販のSiO□及びAl2O3を重
量で9=1に混合した0次いで混合粒子を同重量の50
駕クロム酸水溶液中に添加した後、これを磁性ボールミ
ルにより混練しつつ粒子の細粒化を行った0粒子径の調
整はボールミルの運転時間によって行ったが、この実験
では16時間運転したものの粒子径の分布は平均2.5
〜3ILm、48時間のものは平均1.5〜2.0gm
てあった。(いずれも粒径分布の累積値が50%のとき
の値)以下前者な粗粒、後者な細粒とする。(2) Types and particle sizes of slurry particles Commercially available SiO□ and Al2O3 were mixed in a weight ratio of 9=1 as slurry particles.
After adding it to the aqueous chromic acid solution, it was kneaded with a magnetic ball mill to make the particles finer. The particle size was adjusted by the operating time of the ball mill, but in this experiment, the particles were reduced after 16 hours of operation. The average diameter distribution is 2.5
~3ILm, 48 hours average 1.5-2.0gm
There was. (Both values are when the cumulative value of particle size distribution is 50%) Hereinafter, the former will be referred to as coarse particles, and the latter will be referred to as fine particles.
(3)皮膜形成工程及びクロム酸水溶液の種類皮膜形成
工程はさきに第1図に示した通常の工程に従った。すな
わち、S[JS :104の被処理体を有機溶剤(キシ
レン)で脱脂した後、アルミナグリッド524を用いて
プラストし表面を調整した。(3) Film forming process and type of chromic acid aqueous solution The film forming process followed the usual process shown in FIG. 1 above. That is, after degreasing the S[JS:104 object to be treated with an organic solvent (xylene), it was blasted with alumina grid 524 to adjust the surface.
その後前記(2)の方法で製造した粗粒及び細粒スラリ
中に浸漬した後、静かに引−ヒげて被処理体表面に50
〜60gm厚さの皮膜を形成させた。次いて100〜2
00℃の加温空気によって水分を蒸発させた後、sso
’cに保持した電気炉中て1時間加熱した。この処理に
よって被処理体表面には気孔率30〜SOSの皮膜か構
成された。After that, it was immersed in the coarse grain and fine grain slurry produced by the method (2) above, and then gently pulled to coat the surface of the object to be treated.
A film of ~60 gm thickness was formed. Then 100-2
After evaporating moisture with heated air at 00℃, sso
The mixture was heated for 1 hour in an electric furnace maintained at . Through this treatment, a film with a porosity of 30 to SOS was formed on the surface of the object to be treated.
次いで多孔質皮膜をクロム酸水溶液中に浸漬し、皮膜の
空孔部にクロム酸を含浸させたが、この工程で従来法と
本発明の方法をそれぞれ区別して実施した。すなわち
〈従来法〉60駕クロム酸水溶液(重量2)く本発明〉
■60駕クロム酸水溶液中に含まれているクロム酸j1
¥に対しクロム耐アンモンを3z添加したもの(重量2
)
■60zクロム酸水溶液中に含まれているクロム酸μに
対し重クロム酸γン
モンを3%添加したちの(重:八%)
含浸後それぞれの被処理体を550℃の電気炉中に入れ
、1時間焼成後電気炉からとり出し再びクロム酸水溶液
中に浸漬した。この操作を10〜20回繰返すことによ
って5i02とA1□03スラリを含む焼成皮膜中に生
成している空孔部を酸化クロムによって充填すると共に
、その表面に緻密な酸化クロム皮膜を形成させた。Next, the porous film was immersed in an aqueous solution of chromic acid to impregnate the pores of the film with chromic acid, and in this step, the conventional method and the method of the present invention were carried out separately. That is, <conventional method> 60 kg chromic acid aqueous solution (weight 2) vs. present invention>
■Chromic acid j1 contained in a 60-ton chromic acid aqueous solution
Added 3z of chromium and ammonium resistant to ¥ (weight 2
) ■3% of dichromic acid γ is added to the chromic acid μ contained in the 60z chromic acid aqueous solution (weight: 8%) After impregnation, each object to be treated is placed in an electric furnace at 550°C. After firing for 1 hour, it was taken out from the electric furnace and immersed again in an aqueous chromic acid solution. By repeating this operation 10 to 20 times, the voids formed in the fired film containing the 5i02 and A1□03 slurries were filled with chromium oxide, and a dense chromium oxide film was formed on the surface.
第2図に本発明の含浸液を用いて含浸#加熱を10回繰
返した焼成皮膜の断面写真を示した。この写真から明ら
かなように皮膜中の空孔部を充填すると共に、その表層
部に緻密な焼成皮膜か形成されている。SiO□、 A
I□03粒子径の大きさに余り影響されないが、微細な
ものの表面(第2図(b))に生成する皮膜は非常に均
一である。又第3図はSiO□、 Al2O3の粗粒を
用いて従来法によって含浸#加熱を10回繰返したもの
の断面写真を示したものである。従来法では焼成皮膜表
面に生成される皮膜か殆んど認められていない。FIG. 2 shows a cross-sectional photograph of a fired film obtained by repeating impregnation and heating 10 times using the impregnating solution of the present invention. As is clear from this photograph, the pores in the film are filled, and a dense fired film is formed on the surface layer. SiO□, A
The film formed on the surface of fine particles (FIG. 2(b)) is very uniform, although it is not affected much by the size of the I□03 particles. Moreover, FIG. 3 shows a cross-sectional photograph of a product obtained by repeating impregnation and heating 10 times by the conventional method using coarse particles of SiO□ and Al2O3. In the conventional method, almost no film is observed on the surface of the fired film.
(4)評価方法
本発明の焼成皮膜の性能は次のような試験を行うことに
よって評価した。(4) Evaluation method The performance of the fired film of the present invention was evaluated by conducting the following tests.
(℃熱衝撃試験
770℃、800℃、900℃、tooo℃に保持した
電気炉中に焼成皮膜を、形成させたSO3:104試験
片を30分間放置した後、これを水道水(20°C)中
に投入した。この加熱→水中投入を10回繰返しく 1
000°Cのみ7回)、焼成皮膜の剥離の有無及びその
程度によって皮膜の耐熱衝撃性を評価した。(℃ Thermal Shock Test After leaving the SO3:104 test piece with a fired film formed in an electric furnace maintained at 770℃, 800℃, 900℃, tooo℃ for 30 minutes, pour it into tap water (20℃ ). Repeat this process of heating → pouring into water 10 times. 1
Thermal shock resistance of the film was evaluated based on the presence or absence of peeling of the fired film and its degree.
■耐食性試験
5z硫酸水溶液(35°C)及びJIS 8502によ
るキャス試験を行い、焼成皮膜が剥離するまでの時間に
よって耐食性を評価した。(2) Corrosion Resistance Test 5Z A cast test was conducted using a sulfuric acid aqueous solution (35°C) and JIS 8502, and the corrosion resistance was evaluated based on the time until the fired film peeled off.
(5)試験結果
■熱衝撃試験結果
試験結果を第1表に示す。この結果から次のようなこと
がわかる。(5) Test results - Thermal shock test results The test results are shown in Table 1. The following conclusions can be drawn from this result.
a、従来法は熱衝撃に弱く剥離しやすい。特に粗粒のス
ラリを用いたものはこの傾向か顕著である。a. The conventional method is susceptible to thermal shock and easily peels off. This tendency is particularly noticeable when using coarse slurry.
b、細粒スラリは粗粒スラリよりよい性能を示し、さら
にクロム酸水溶液の含浸回数か増加するほど耐熱衝撃性
能が向上している。b. The fine-grained slurry exhibited better performance than the coarse-grained slurry, and the thermal shock resistance improved as the number of impregnations with the chromic acid aqueous solution increased.
C0以上のように従来法においても細粒スラリを用いた
もの及びクロム酸水溶液の含浸回数か多いものほど耐熱
#N撃性能の向上が見られる。As shown in C0 and above, even in the conventional method, the heat resistance #N impact performance is improved as the fine particle slurry is used and the number of impregnations with the chromic acid aqueous solution is increased.
d、これに対し本発明の方法、すなわちクロム酸アンモ
ン及び重クロム酸アンモンを添加したクロム酸水溶液な
含浸焼成した皮膜は、細粒スラリの場合はもちろん粗粒
スラリに対しても有効に作用し#熱衝撃性能が向上して
いる。特に細粒スラリの皮膜に対する効果が大きい。ク
ロム酸アンモンと重クロム酸アンモンの優位差は認めら
れず1両者とも有効であることか判明した。d. On the other hand, the method of the present invention, that is, the coating obtained by impregnating and baking a chromic acid aqueous solution containing ammonium chromate and ammonium dichromate, works effectively not only on fine-grained slurries but also on coarse-grained slurries. # Improved thermal shock performance. Particularly effective on coatings of fine slurry. No superiority difference was observed between ammonium chromate and ammonium dichromate, indicating that both are effective.
■腐食試験結果:
試験結果を第2表に示した。この結果から明らかなよう
に本発明の方法て焼成した皮膜は硫酸及びキャスの腐食
条件にも十分耐え、すぐれた耐食皮膜を形成しているこ
とがわかる。■Corrosion test results: The test results are shown in Table 2. As is clear from these results, the film fired by the method of the present invention can sufficiently withstand the corrosive conditions of sulfuric acid and Cath, forming an excellent corrosion-resistant film.
第2表
実施例2
含浸;加熱用のクロム酸水溶液に対するクロム酸アンモ
ン及び重クロム酸アンモンの添加量の影響について調査
した。被処理体の材質、寸法、及び皮膜処理工程は実施
例1と同じものを用い、スラリ用粒子としては細粒のも
のに限定し、含浸;加熱繰返し用のクロム酸水溶液の組
成のみ次のように変化させた。Table 2 Example 2 Impregnation: The influence of the amounts of ammonium chromate and ammonium dichromate added to the chromic acid aqueous solution for heating was investigated. The material and dimensions of the object to be treated and the film treatment process were the same as in Example 1, the slurry particles were limited to fine particles, and the composition of the chromic acid aqueous solution for impregnation and repeated heating was as follows. changed to.
含浸用クロム酸水溶液
■60%クロム酸水溶液(比較液)
■同上液中のクロム酸含有量に対しクロム酸アンモンl
t 1 、3 、5 、10.15.20.30%添加
(屯−品−2)
■同上液中のクロム酸含有量に対し重クロム酸アンモン
を1 、3.5. +0.15.20.30%添加(同
上)
(1)評価方法
前記含浸用クロム酸水溶液を用いて、スラリ焼成皮膜に
対し15四含浸;加熱を繰返したものを試験片とし、8
00℃×30分;水冷の熱衝撃試験を行ってクロム酸ア
ンモン及び重クロム酸アンモン添加の影響を調査した。Chromic acid aqueous solution for impregnation ■ 60% chromic acid aqueous solution (comparative solution) ■ Chromic acid ammonium l relative to the chromic acid content in the above solution
t 1, 3, 5, 10.15.20.30% addition (Tun-product-2) ■ Ammonium dichromate was added at 1, 3.5% relative to the chromic acid content in the above solution. Addition of +0.15.20.30% (same as above) (1) Evaluation method Using the aqueous chromic acid solution for impregnation, the slurry fired film was impregnated with 154; heated repeatedly, and the test piece was 8.
A water-cooled thermal shock test was conducted at 00° C. for 30 minutes to investigate the effects of adding ammonium chromate and ammonium dichromate.
(2)熱衝撃試験結果
第3表に試験結果を示す。この結果は!衝撃によって皮
膜の′A離か全体の3zに達したときの回数で示した。(2) Thermal shock test results Table 3 shows the test results. This result is! It is expressed as the number of times when the total distance of 'A' of the film due to impact reaches 3z.
アンモニウム塩の添加濃度か大となるに従って、耐熱衝
撃性が向上するが、あまり多量に添加すると焼成皮膜の
表面に生成する皮膜が脆弱となり、熱衝撃によって非常
に!Lu1lやすくなり、無添加のクロム酸水溶液より
性能が劣化してくる。アンモニウム塩の添加量が1oz
以下では皮膜の剥離現象が起り難く、耐熱衝撃性か向上
していることかわかる。Thermal shock resistance improves as the concentration of ammonium salt increases, but if too much is added, the film formed on the surface of the fired film will become brittle, resulting in severe damage due to thermal shock! Lu1l becomes easier, and the performance deteriorates compared to an additive-free chromic acid aqueous solution. The amount of ammonium salt added is 1oz.
The following shows that the peeling phenomenon of the film is less likely to occur and that the thermal shock resistance is improved.
以上の結果からアンモニウム塩の添加はクロム酸、重ク
ロム酸とも10z以下の濃度範囲かよいことかわかる。From the above results, it can be seen that ammonium salts should be added in a concentration range of 10z or less for both chromic acid and dichromic acid.
(発明の効果)
上述したように、本発明による方法により緻密て結合力
の強いセラミックス皮膜を形成することかてきる。本皮
膜は#熱性および耐食性に優れ、広範囲な用途に適用が
可能である。(Effects of the Invention) As described above, the method according to the present invention makes it possible to form a ceramic film that is dense and has strong bonding strength. This film has excellent heat resistance and corrosion resistance, and can be applied to a wide range of applications.
【図面の簡単な説明】
第1図は無水クロム酸水溶液とSin、、 Al2O3
粉末を使用して皮膜を形成させる製造工程の流れ図であ
る。第2図は本発明法により金属母材(SO3304)
に焼成皮膜を形成した場合の断面組織写真で、(a)は
皮膜中の5102. Al2O3が従来粒径のもの、(
b)は5i02. AIJiか2.OILm以下の細粒
のものを示す。第3図は従来法によって金属母材(SO
3:104)に皮膜を形成した場合の断面組織写真であ
る。[Brief explanation of the drawings] Figure 1 shows a chromic anhydride aqueous solution and Sin, Al2O3
1 is a flowchart of a manufacturing process for forming a film using powder. Figure 2 shows the metal base material (SO3304) produced by the method of the present invention.
This is a photograph of the cross-sectional structure when a fired film is formed on the film, and (a) shows 5102. Al2O3 with conventional particle size, (
b) is 5i02. AIJi?2. Shows fine grains below OILm. Figure 3 shows the metal base material (SO
3:104) is a photograph of the cross-sectional structure when a film is formed.
Claims (2)
3混合粉末を加えて調整したスラリを金属表面に塗布し
た後、これを500〜600℃に加熱して多孔質皮膜を
形成させたものに、無水クロム酸水溶液を含浸させた後
500〜600℃に加熱する工程を繰返し行うことによ
って得られるクロム酸化物皮膜の形成方法において、含
浸させる無水クロム酸水溶液中に、クロム酸含有量に対
しクロム酸アンモン又は重クロム酸アンモンを重量で1
0%以下となるように添加することを特徴とする耐熱性
・耐食性に富んだクロム酸化物皮膜の形成方法。(1) SiO_2 and Al_2O_ in chromic anhydride aqueous solution
3. After applying the slurry prepared by adding the mixed powder to the metal surface, it was heated to 500 to 600°C to form a porous film, which was then impregnated with an aqueous chromic acid anhydride solution and heated to 500 to 600°C. In the method for forming a chromium oxide film obtained by repeatedly performing the heating step to
A method for forming a chromium oxide film with high heat resistance and corrosion resistance, characterized in that the amount of chromium oxide added is 0% or less.
(粒径分布の累積値が50%となるときの値)が1.0
〜2.0μmである特許請求の範囲第1項記載のクロム
酸化物皮膜の形成方法。(2) The average particle size of the SiO_2 and Al_2O_3 mixed powder (value when the cumulative value of particle size distribution is 50%) is 1.0
The method for forming a chromium oxide film according to claim 1, wherein the thickness is 2.0 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15150587A JPS63317680A (en) | 1987-06-19 | 1987-06-19 | Formation of chromium oxide film having excellent resistance to heat and corrosion |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15150587A JPS63317680A (en) | 1987-06-19 | 1987-06-19 | Formation of chromium oxide film having excellent resistance to heat and corrosion |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63317680A true JPS63317680A (en) | 1988-12-26 |
Family
ID=15519976
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15150587A Pending JPS63317680A (en) | 1987-06-19 | 1987-06-19 | Formation of chromium oxide film having excellent resistance to heat and corrosion |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63317680A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003092064A1 (en) * | 2002-04-25 | 2003-11-06 | Tokyo Electron Limited | Member for semiconductor manufacturing system and its manufacturing method |
US6805968B2 (en) | 2001-04-26 | 2004-10-19 | Tocalo Co., Ltd. | Members for semiconductor manufacturing apparatus and method for producing the same |
US8569177B2 (en) | 2012-01-25 | 2013-10-29 | Hitachi High-Technologies Corporation | Plasma processing apparatus and plasma processing method |
-
1987
- 1987-06-19 JP JP15150587A patent/JPS63317680A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6805968B2 (en) | 2001-04-26 | 2004-10-19 | Tocalo Co., Ltd. | Members for semiconductor manufacturing apparatus and method for producing the same |
WO2003092064A1 (en) * | 2002-04-25 | 2003-11-06 | Tokyo Electron Limited | Member for semiconductor manufacturing system and its manufacturing method |
US8569177B2 (en) | 2012-01-25 | 2013-10-29 | Hitachi High-Technologies Corporation | Plasma processing apparatus and plasma processing method |
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