JPS63316813A - Position adjusting method for hologram lens and semiconductor laser - Google Patents

Position adjusting method for hologram lens and semiconductor laser

Info

Publication number
JPS63316813A
JPS63316813A JP15400687A JP15400687A JPS63316813A JP S63316813 A JPS63316813 A JP S63316813A JP 15400687 A JP15400687 A JP 15400687A JP 15400687 A JP15400687 A JP 15400687A JP S63316813 A JPS63316813 A JP S63316813A
Authority
JP
Japan
Prior art keywords
semiconductor laser
anaerobic
hologram lens
resin
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15400687A
Other languages
Japanese (ja)
Inventor
Akira Nagahara
長原 明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15400687A priority Critical patent/JPS63316813A/en
Publication of JPS63316813A publication Critical patent/JPS63316813A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To decrease the man-hours of adjusting processes by using anaerobic ultraviolet ray setting resin (anaerobic UV resin) to adjust and fix the position of a hologram lens and a semiconductor laser. CONSTITUTION:The slide surface 11 of a base 3 is coated with the anaerobic UV resin, a jogging arm 13 having a semiconductor laser 1 is slid with the macrometer push pin 9 of an adjusting jig 8, and while a beam shape on a target 10 is observed, the arm is jogged in an X, a Y, and a Z direction. An ultraviolet ray is projected from a fiber 4 when the beam diameter enters a set value range, the anaerobic UV resin sets to fix the jogging arm 13 and base 3 temporarily by an UV setting part 15 which swells at the periphery of the jogging arm 13, and then the slide surface 11 and anaerobic setting part 14 are adhered completely by anaerobic setting.

Description

【発明の詳細な説明】 〔概 要〕 本発明はレーザプリンタ等に用いられる光学系のホログ
ラムレンズと半導体レーザーの位置調整方法に関し、 半導体レーザー1を基台3に固定する時に、位置調整し
た半導体レーザーlがずれないような位置調整方法を目
的とし、 L型基台上の一辺にホログラムレンズを、他辺に半導体
レーザーをスライド可能に位置させ、該半導体レーザー
からのレーザー光が前記ホログラムレンズを介してター
ゲットを照射するように、ホログラムレンズと半導体レ
ーザーの位置を調整する際、該半導体レーザーのスライ
ド面に嫌気性紫外線硬化型樹脂を塗布し、ホログラムレ
ンズと半導体レーザーの位置関係が定った時に、紫外線
を照射し周囲に盛り上がった嫌気性紫外線硬化型樹脂に
より仮固定し、本硬化はスライド面にて嫌気性質を利用
して行なう構成する。
[Detailed Description of the Invention] [Summary] The present invention relates to a method for adjusting the position of a hologram lens and a semiconductor laser in an optical system used in a laser printer, etc. Aiming at a position adjustment method that prevents the laser l from shifting, a hologram lens is placed on one side of an L-shaped base and a semiconductor laser is slidably positioned on the other side, and the laser light from the semiconductor laser hits the hologram lens. When adjusting the position of the hologram lens and semiconductor laser so that the target is irradiated through the hologram lens, an anaerobic ultraviolet curing resin is applied to the slide surface of the semiconductor laser, and the positional relationship between the hologram lens and semiconductor laser is determined. At times, the material is temporarily fixed by irradiating it with ultraviolet rays and using an anaerobic ultraviolet curable resin that rises around it, and the main curing is performed by utilizing the anaerobic properties of the slide surface.

〔産業上の利用分野〕[Industrial application field]

本発明はレーザプリンタ等に用いられる光学系のホログ
ラムレンズと半導体レーザーの位置調整方法に関する。
The present invention relates to a method for adjusting the position of a hologram lens and a semiconductor laser in an optical system used in a laser printer or the like.

レーザープリンタ等は低コスト化のニーズが強く、かつ
印字品質は維持しなければならない為、精度を保証した
安価なプリンタを製造する製造方法が必要とされる。
There is a strong need for cost reduction in laser printers and the like, and printing quality must be maintained, so a manufacturing method for manufacturing inexpensive printers with guaranteed accuracy is required.

〔従来の技術〕[Conventional technology]

第3図はレーザープリンタ用光学系を示す図である。図
において、1は半導体レーザー、2はホログラムレンズ
、3は基台、5はホログラムスキャナ、6はミラー、7
は止めネジ、13は半導体レーザー1を取付けている微
動アームである。
FIG. 3 is a diagram showing an optical system for a laser printer. In the figure, 1 is a semiconductor laser, 2 is a hologram lens, 3 is a base, 5 is a hologram scanner, 6 is a mirror, and 7
13 is a set screw, and 13 is a fine movement arm to which the semiconductor laser 1 is attached.

上記光学系は電子プリンタ等に用いられ、半導体レーザ
ー1からのレーザ光をホログラムレンズ2により収斂し
て、ホログラムスキャナ5に入射し、ホログラムスキャ
ナ5によりドラム面を走査する。このドラム面の走査は
、精度が±zOμ醜位でないと印字が乱れる為、半導体
レーザーlからのレーザー光は常にホログラムスキャナ
5の一点に入射する必要がある。その為にホログラムレ
ンズ2と半導体レーザー1の位置を調整している。
The optical system described above is used in electronic printers and the like, and the laser beam from the semiconductor laser 1 is converged by the hologram lens 2 and is incident on the hologram scanner 5, which scans the drum surface. This scanning of the drum surface will result in irregular printing unless the accuracy is ±zOμ, so the laser light from the semiconductor laser 1 must always be incident on one point on the hologram scanner 5. For this purpose, the positions of the hologram lens 2 and the semiconductor laser 1 are adjusted.

従来の位置調整方法は、第4図のように基台3が調整用
治具8に固定され、かつターゲット10の一点にホログ
ラムレンズ2からの光が入射される位置にある。微動ア
ーム13はスライド面11をX、Y、Z方向に微動する
構成であり、半導体レーザー1を有する微動アーム13
を調整治具8のマイクロ付き押しピン9でスライドさせ
、所定のターゲット10上のビーム形状を観察しながら
X、Y、Z方向に微動して、ビーム径が設定値内に入っ
たところで、微動アーム13を止めネジ7で基台3に固
定する。
In the conventional position adjustment method, the base 3 is fixed to the adjustment jig 8 as shown in FIG. 4, and the target 10 is positioned at a point where light from the hologram lens 2 is incident. The fine movement arm 13 is configured to finely move the slide surface 11 in the X, Y, and Z directions, and has the semiconductor laser 1.
Slide it with the micro push pin 9 of the adjustment jig 8, and finely move it in the X, Y, and Z directions while observing the beam shape on the predetermined target 10. When the beam diameter is within the set value, finely move it. The arm 13 is fixed to the base 3 with a set screw 7.

〔発明が解決しようとする問題点] 第4図の従来のホログラムレンズ2と半導体レーザーl
の位置調整方法では、所定のターゲット10に入射され
るビーム径を見ながら、最少のど−ム径になる位置で、
微動アーム13をネジ止めしている。
[Problems to be solved by the invention] Conventional hologram lens 2 and semiconductor laser l shown in FIG.
In the position adjustment method, while observing the beam diameter incident on a predetermined target 10, at the position where the diameter of the beam is the minimum,
The fine movement arm 13 is screwed.

ネジ固定する場合、止めネジ7は回転運動するため、折
角位置調整した半導体レーザー1の位置がずれ、調整値
が狂ってしまう、その為、何度も繰り返えして調整せね
ばならず多大な工数を必要としていた。
When fixing with screws, the set screw 7 rotates, so the position of the semiconductor laser 1, which has been carefully adjusted, becomes misaligned and the adjusted value becomes incorrect. Therefore, the adjustment has to be repeated many times, resulting in a large amount of work. It required a lot of man-hours.

本発明は、微動アーム13を基台3に固定する時に、位
置調整した半導体レーザー1の位置が変化しないホログ
ラムレンズ2と半導体レーザーlの位置調整方法を提供
することを目的とする。
An object of the present invention is to provide a method for adjusting the position of the hologram lens 2 and the semiconductor laser 1, in which the position of the adjusted semiconductor laser 1 does not change when the fine movement arm 13 is fixed to the base 3.

〔問題点を解決するための手段〕[Means for solving problems]

前記問題点は、第1図に示されるように基台(定温装置
付)3にホログラムレンズ2と半導体レーザー1をスラ
イド可能に位置させ、該半導体レーザー1からのレーザ
ー光が前記ホログラムレンズ2を介してターゲット(ビ
ーム径測定装置付)10を照射するように、ホログラム
レンズと半導体レーザーの位置を調整する際、 半導体レーザー1のスライド面11に、嫌気性紫外線硬
化型樹脂(嫌気性UV接着剤)を塗布し、ホログラムレ
ンズ2と半導体レーザー1の位置関係が定った時に、フ
ァイバー4より紫外線を照射し、周囲に盛り上がった嫌
気性紫外線硬化型樹脂により仮固定し、本硬化はスライ
ド面11にて嫌気性質を利用して行なう本発明のホログ
ラムレンズと半導体レーザーの位置調整方法によって解
決される。
The problem is as shown in FIG. 1, the hologram lens 2 and the semiconductor laser 1 are slidably positioned on the base 3 (equipped with a constant temperature device), and the laser light from the semiconductor laser 1 does not affect the hologram lens 2. When adjusting the positions of the hologram lens and the semiconductor laser so as to irradiate the target (with a beam diameter measurement device) 10 through the ) is applied, and when the positional relationship between the hologram lens 2 and the semiconductor laser 1 is determined, ultraviolet rays are irradiated from the fiber 4, and temporary fixation is performed using the anaerobic ultraviolet curable resin raised around the periphery. This problem is solved by the method of adjusting the position of a hologram lens and a semiconductor laser according to the present invention, which takes advantage of anaerobic properties.

〔作 用〕[For production]

即ち、本発明では半導体レーザー1のスライド面11に
嫌気性UV樹脂を使用しているため、調整時ターゲット
lOのビーム径を見ながら微動アーム13により半導体
レーザー1が微動できる。半導体レーザー1の位置を調
整した後、紫外線照射装置のファイバー4より照射され
た紫外線により、微動アーム13のスライド面11周囲
に盛り上がった嫌気性UV樹脂が固定され、微動アーム
13は変動することなく基台3に仮固定される。さらに
U■樹脂が嫌気性であるので、時間の経過とともにスラ
イド面11と微動アーム13の接触面は固定され、強固
な面接着となる。
That is, in the present invention, since anaerobic UV resin is used for the sliding surface 11 of the semiconductor laser 1, the semiconductor laser 1 can be slightly moved by the fine movement arm 13 while observing the beam diameter of the target IO during adjustment. After adjusting the position of the semiconductor laser 1, the anaerobic UV resin raised around the sliding surface 11 of the fine movement arm 13 is fixed by the ultraviolet rays irradiated by the fiber 4 of the ultraviolet irradiation device, and the fine movement arm 13 does not move. It is temporarily fixed to the base 3. Furthermore, since the U resin is anaerobic, the contact surface between the slide surface 11 and the fine movement arm 13 becomes fixed over time, resulting in a strong surface bond.

〔実施例〕〔Example〕

第2図(イ)〜(ハ)は本発明の一実施例を説明する図
で、(イ)は側面図、(ロ)は正面図、(ハ)は接着部
の拡大図である。なお、企図を通じて同一符号は同一対
象物を示す。
FIGS. 2(A) to 2(C) are views for explaining one embodiment of the present invention, in which (A) is a side view, (B) is a front view, and (C) is an enlarged view of the bonded portion. Note that the same reference numerals refer to the same objects throughout the plan.

図中、1は半導体レーザー、2はホログラムレンズ、3
はL型の基台(定温装置付)、4は照射装置のファイバ
ー、8は調整用治具、9マイクロ付押しピン、10はタ
ーゲット(ビーム径測定装置付)、11はスライド面、
12は半導体レーザー調整方向、13は微動アームであ
る。
In the figure, 1 is a semiconductor laser, 2 is a hologram lens, and 3 is a semiconductor laser.
is an L-shaped base (with a constant temperature device), 4 is a fiber of the irradiation device, 8 is an adjustment jig, 9 is a push pin with a micro, 10 is a target (with a beam diameter measuring device), 11 is a slide surface,
12 is a semiconductor laser adjustment direction, and 13 is a fine movement arm.

本発明の位置調整方法は、第2図のように基台3が調整
用治具8に固定され、かつターゲラ目Oはホログラムレ
ンズ2からの光が入射される位置にある。微動アーム1
3はスライド面11をX、Y、Z方向に微動する構成で
ある。本発明では嫌気性UV樹脂を基台3のスライド面
11に塗布しておき、半導体レーザー1を有する微動ア
ーム13を調整治具8のマイクロ付き押しピン9でスラ
イドさせ、ターゲット10上のビーム形状を観察しなか
らX、YSZ方向に微動する。そしてビーム径が設定値
内に入ったところで、照射装置のファイバー4より紫外
線を照射する。これによりUV樹脂が固定し、第2図(
ハ)に示すように微動アーム13の周囲に盛り上がった
UV硬化部15において、微動アーム13と基台3が仮
止され、その後嫌気性硬化によりスライド面11の嫌気
硬化部14が完全に接着される。なお、基台3は定温装
置付(例えばシークシンク等)であり、半導体レーザー
1を有する微動アーム13が基台3に面接着されている
ので、熱伝導性が保証される。
In the position adjustment method of the present invention, the base 3 is fixed to the adjustment jig 8 as shown in FIG. 2, and the target eye O is located at a position where the light from the hologram lens 2 is incident. Fine movement arm 1
3 is a configuration in which the slide surface 11 is slightly moved in the X, Y, and Z directions. In the present invention, anaerobic UV resin is applied to the sliding surface 11 of the base 3, and the fine movement arm 13 having the semiconductor laser 1 is slid with the micro-equipped push pin 9 of the adjustment jig 8, thereby shaping the beam on the target 10. While observing this, move slightly in the X and YSZ directions. Then, when the beam diameter falls within the set value, ultraviolet rays are irradiated from the fiber 4 of the irradiation device. This fixes the UV resin, as shown in Figure 2 (
As shown in c), the fine movement arm 13 and the base 3 are temporarily fixed in the UV cured part 15 raised around the fine movement arm 13, and then the anaerobic cured part 14 of the slide surface 11 is completely bonded by anaerobic curing. Ru. Note that the base 3 is equipped with a temperature constant device (for example, a seek sink, etc.), and the fine movement arm 13 having the semiconductor laser 1 is surface-bonded to the base 3, so that thermal conductivity is guaranteed.

また、従来のホログラムレンズと半導体レーザーの位置
調整方法では、調整後基台にネジ化めする際調整値が狂
う為、何度も調整を繰り返さねばならず、多大な工数を
必要としていたが、本発明では調整後の変動なく調整工
数の大幅な減少となった。
In addition, with the conventional method of adjusting the position of the hologram lens and semiconductor laser, the adjustment value becomes incorrect when screwing it into the base after adjustment, so the adjustment has to be repeated many times, requiring a large amount of man-hours. In the present invention, there was no change after adjustment, and the number of adjustment steps was significantly reduced.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、嫌気性UV樹脂を
使用することにより、調整したままで変動な(固定でき
、また半導体レーザーを有する微動アームが基台に面接
着であるから強固な接着力、熱伝導性も保証され、かつ
調整工数の大幅な減少となる。
As explained above, according to the present invention, by using anaerobic UV resin, it can be fixed without changing while being adjusted, and since the fine movement arm having a semiconductor laser is surface-adhered to the base, strong adhesion can be achieved. Power and thermal conductivity are also guaranteed, and the number of adjustment steps is greatly reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の詳細な説明する図、 第2図(イ)〜(ハ)は本発明の一実施例を説明する図
、 第3図はレーザープリンタ用光学系を示す図、図におい
て、 1は半導体レーザー、 2はホログラムレンズ、 3は基台、 4はUV用ファイバー、 8は調整用治具、 9はマイクロ付き押しピン、 10はターゲット、 11はスライド面、 12は半導体レーザー調整方向、 13は微動アーム、 14は嫌気硬化部、 奮1 図 レーザープ(ルク用紙≠1弊ゴ1T図 メ3 z 貞9良の広Oり°う1.、じス”と11本し−サ°−a
信厘訓繋方り1g肢θ打6図74図
Fig. 1 is a diagram explaining the present invention in detail, Fig. 2 (a) to (c) are diagrams explaining an embodiment of the present invention, and Fig. 3 is a diagram showing an optical system for a laser printer. , 1 is a semiconductor laser, 2 is a hologram lens, 3 is a base, 4 is a UV fiber, 8 is an adjustment jig, 9 is a push pin with a micro, 10 is a target, 11 is a slide surface, 12 is a semiconductor laser adjustment direction, 13 is the fine movement arm, 14 is the anaerobic hardening section, °-a
Shinrin Kun connection method 1g limb θ stroke 6 figure 74 figure

Claims (1)

【特許請求の範囲】 基台(3)上にホログラムレンズ(2)と半導体レーザ
ー(1)をスライド可能に位置させ、該半導体レーザー
(1)からのレーザー光が前記ホログラムレンズ(2)
を介してターゲット(10)を照射するように、ホログ
ラムレンズ(2)と半導体レーザー(1)の位置を調整
する際、 該半導体レーザー(1)のスライド面に嫌気性紫外線硬
化型樹脂を塗布し、ホログラムレンズ(2)と半導体レ
ーザー(1)の位置関係が定った時に、紫外線を照射し
周囲に盛り上がった紫外線硬化型樹脂硬化部(15)に
より仮固定し、本硬化はスライド面(11)の嫌気硬化
部(14)により行なうことを特徴とするホログラムレ
ンズと半導体レーザーの位置調整方法。
[Claims] A hologram lens (2) and a semiconductor laser (1) are slidably positioned on a base (3), and a laser beam from the semiconductor laser (1) is transmitted to the hologram lens (2).
When adjusting the positions of the hologram lens (2) and the semiconductor laser (1) so as to irradiate the target (10) through the When the positional relationship between the hologram lens (2) and the semiconductor laser (1) is determined, they are temporarily fixed by irradiating the hologram lens (2) and the semiconductor laser (1) with the raised ultraviolet curing resin curing portion (15) around the periphery, and the main curing is carried out on the slide surface (11). ) A method for adjusting the position of a hologram lens and a semiconductor laser, characterized in that the method is carried out using the anaerobic curing section (14).
JP15400687A 1987-06-19 1987-06-19 Position adjusting method for hologram lens and semiconductor laser Pending JPS63316813A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15400687A JPS63316813A (en) 1987-06-19 1987-06-19 Position adjusting method for hologram lens and semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15400687A JPS63316813A (en) 1987-06-19 1987-06-19 Position adjusting method for hologram lens and semiconductor laser

Publications (1)

Publication Number Publication Date
JPS63316813A true JPS63316813A (en) 1988-12-26

Family

ID=15574851

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15400687A Pending JPS63316813A (en) 1987-06-19 1987-06-19 Position adjusting method for hologram lens and semiconductor laser

Country Status (1)

Country Link
JP (1) JPS63316813A (en)

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