JPS63311201A - Plate type beam splitter - Google Patents
Plate type beam splitterInfo
- Publication number
- JPS63311201A JPS63311201A JP14646087A JP14646087A JPS63311201A JP S63311201 A JPS63311201 A JP S63311201A JP 14646087 A JP14646087 A JP 14646087A JP 14646087 A JP14646087 A JP 14646087A JP S63311201 A JPS63311201 A JP S63311201A
- Authority
- JP
- Japan
- Prior art keywords
- film
- semi
- interference multilayer
- multilayer film
- beam splitter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 230000005540 biological transmission Effects 0.000 claims abstract description 8
- 239000012528 membrane Substances 0.000 claims description 14
- 230000002708 enhancing effect Effects 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract 5
- 238000000576 coating method Methods 0.000 abstract 5
- 239000010408 film Substances 0.000 description 63
- 230000003287 optical effect Effects 0.000 description 10
- 238000002474 experimental method Methods 0.000 description 6
- 230000000873 masking effect Effects 0.000 description 6
- 230000035699 permeability Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Landscapes
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、光学部品である平板形ビームスプリッタに関
し、特に同一平面内に半透鏡膜と増透膜とを隣接して設
けた平板形ビームスプリッタに関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a flat beam splitter which is an optical component, and in particular to a flat beam splitter in which a semi-transparent mirror film and a transparent film are adjacently provided in the same plane. Regarding splitters.
［従来の技術〕
従来、ビームスプリッタとしては、偏光プリズム形また
は非偏光プリズム形のものが一般的であった。その利点
は、光路の設定が簡単であり、また収差の発生を抑える
ことが可能であることでおる。ところが、近年、光デイ
スク再生装置などにおいて、平板形ビームスプリッタが
多用されている。それは、平板形のほうが装置の小形化
やコストの低減化に向いているからである。[Prior Art] Conventionally, beam splitters have generally been of a polarizing prism type or a non-polarizing prism type. The advantage is that the optical path can be easily set and the occurrence of aberration can be suppressed. However, in recent years, flat beam splitters have come into widespread use in optical disc playback devices and the like. This is because the flat plate type is more suitable for downsizing the device and reducing costs.
この平板形ビームスプリッタの一般的な使用方法を第５
図に示す。発光素子１からの光は、平板形ビームスプリ
ッタ２の半透１１１１１３で一部が反射され、光ディス
ク４に達する。光ディスク４で反射した光は、その一部
が半透鏡膜３を通過し、ざらに増透１ｇ＄５を通過して
受光素子６に達する。なお、分かり易くするために、こ
の図面では膜の厚さを誇張して示してあり、このことは
他の図面においても同様である。The general method of using this flat beam splitter is explained in the fifth section.
As shown in the figure. A portion of the light from the light emitting element 1 is reflected by the semi-transparent 111113 of the flat beam splitter 2 and reaches the optical disk 4. A portion of the light reflected by the optical disk 4 passes through the semi-transparent mirror film 3 and roughly passes through the transmittance enhancement device 1g$5 to reach the light receiving element 6. Note that, for clarity, the thickness of the film is exaggerated in this drawing, and this also applies to other drawings.
このような配置構成と比較して、第１図に示すような配
置構成をとると光路が専有する空間が小さくなる。すな
わち、発光素子１と受光素子６とを近接して配置するこ
とができる。このような配置にするためには、平板形ビ
ームスプリッタ２の構成として、同一平面上に半透鏡膜
３と増透ｍ５とを隣接して配置する必要がある。この場
合、光ディスク４から戻ってきた光は、その一部が半透
ｖＡ！１１３を通過し、反射ｖＡ７で反射して、さらに
増透膜５を通過して受光素子６に達する。Compared to such an arrangement, the arrangement shown in FIG. 1 reduces the space occupied by the optical path. That is, the light emitting element 1 and the light receiving element 6 can be arranged close to each other. In order to achieve such an arrangement, it is necessary to arrange the semi-transparent mirror film 3 and the transparency m5 adjacent to each other on the same plane as the configuration of the flat beam splitter 2. In this case, a portion of the light returning from the optical disc 4 is semi-transparent vA! 113, is reflected by reflection vA7, further passes through the transparent film 5, and reaches the light receiving element 6.
第１図に示すような配置構成をとることができれば、装
置の専有容積が小さくなることに加えて、発光素子や受
光素子などの部品の配置が簡単になり、生産を合理化で
きる可能性もある。If the configuration shown in Figure 1 can be adopted, in addition to reducing the exclusive space of the device, the arrangement of components such as light-emitting elements and light-receiving elements can be simplified, potentially streamlining production. .
ところで、光の反射や透過を適当に制御するには干渉多
ｍ１ｌｌｉを利用するのが一般的である。光学ガラス素
材として最も一般的なりＫ７を例にとると、その表面に
４５度の角度で光が入射すると５％以上の光を反射する
。このような而を光の透過面として利用するには反射が
大きすぎるので、薄膜の干渉を利用して表面反射を減ら
す工夫をしている。このような膜が増透膜である。また
、平板形ビームスプリッタには、所定の反射率をもった
面も必要である。これについても薄膜の干渉を利用して
任意の反射率の膜を作ることができる。これが半透鏡膜
である。By the way, in order to appropriately control the reflection and transmission of light, it is common to use an interference multiplier m1lli. Taking K7, the most common optical glass material, as an example, when light is incident on its surface at an angle of 45 degrees, more than 5% of the light is reflected. Since the reflection is too large to use such a surface as a light transmission surface, we devised a method to reduce surface reflection by using thin film interference. Such a membrane is a permeability membrane. The flat beam splitter also requires a surface with a predetermined reflectance. In this case as well, it is possible to create a film with an arbitrary reflectance by utilizing thin film interference. This is a semi-transparent membrane.
［発明が解決しようとする問題点］
ところで、平板形ビームスプリッタの同一平面上に半透
１！躾と増透膜とを形成するにはそれぞれをマスキング
によって分離し、別個に作るのが普通である。しかし、
このようにして作られた二つの膜の境界部分には、マス
クの形状誤差や位置ずれのために、これら二つの膜とは
光学的性質の異なる面ができてしまう。すなわち、第６
図に示すように増透膜５と半透鏡膜３との間に隙間がで
きたり、第７図に示すように増透膜５と半透鏡膜３とが
部分的に重なったりしてしまう。このような不完全な部
分を、光学部品として実用可能な程度にまで小さくする
には、マスク治具精度を向上させ、かつ、手間のかかる
調整作業をしなければならない。[Problems to be Solved by the Invention] By the way, there is a semi-transparent film on the same plane of the flat beam splitter! In order to form the diaphragm and the permeability membrane, it is common to separate them by masking and make them separately. but,
At the boundary between the two films produced in this manner, a surface having optical properties different from those of these two films is created due to a shape error or positional shift of the mask. That is, the sixth
As shown in the figure, a gap is created between the transparent membrane 5 and the semi-transparent mirror membrane 3, or as shown in FIG. 7, the transparent membrane 5 and the semi-transparent membrane 3 partially overlap. In order to reduce such imperfections to a size that can be used as a practical optical component, it is necessary to improve the precision of the mask jig and to perform time-consuming adjustment work.
本発明の目的は、同一平面上に増透膜と半透鏡膜とを形
成するにあたり、極めて簡単な構成によって、これら膜
の境界部分の不完全性をなくすことのできる平板形ビー
ムスプリッタを提供することにある。An object of the present invention is to provide a flat beam splitter that can eliminate imperfections at the boundary between a transparent film and a semi-transparent film with an extremely simple structure when forming a transparent film and a semi-transparent film on the same plane. There is a particular thing.
［問題点を解決するための手段］
本発明者は、隣接する二つの膜面を唯１回のマスキング
を施すだけで完成できれば上述の不完全部分を無くすこ
とができることに気が付いた。そして、そのためには、
増透膜の構成が半透鏡膜の構成の一部と共通であれば、
このことが可能なことを見出だした。[Means for Solving the Problems] The inventors of the present invention have realized that the above-mentioned incomplete portion can be eliminated if two adjacent film surfaces can be completed by masking only once. And for that,
If the configuration of the diaphragm membrane is part of the configuration of the semi-transparent membrane,
We have found that this is possible.
したがって、本発明の平板形ビームスプリッタは、干渉
多層膜で構成されて所定の光反射特性を有する半透鏡膜
と、干渉多層膜で構成されて所定の光透過特性を有する
増透膜とを有し、これら半透鏡膜と増透膜とが基板上の
同一平面上に隣接して配置され、前記増透膜を構成する
干渉多層膜の全部と前記半透鏡膜を構成する干渉多層膜
の一部とが共通の膜で形成されていることを特徴とする
ものでおる。Therefore, the flat beam splitter of the present invention includes a semi-transparent mirror film made of an interference multilayer film and having predetermined light reflection characteristics, and a transparent mirror film made of an interference multilayer film and having predetermined light transmission characteristics. The semi-transparent mirror film and the transmission film are arranged adjacent to each other on the same plane on the substrate, and all of the interference multilayer film forming the transmission film and one of the interference multilayer films forming the semi-transmission film are disposed adjacent to each other on the same plane on the substrate. It is characterized in that the two parts are formed of a common membrane.
このような平板形ビームスプリッタの具体的な構成とし
ては、まず前記基板の上に前記共通の膜を形成し、その
上に、前記半透鏡膜を構成する干渉多層膜の前記一部以
外の残りの部分を形成することができる。As for the specific structure of such a flat beam splitter, first, the common film is formed on the substrate, and then the rest of the interference multilayer film constituting the semi-transparent mirror film other than the part is formed on the common film. can form part of the
あるいは、まず前記基板の上に、前記半透鏡膜を構成す
る干渉多層膜の前記一部以外の残りの部分を形成し、そ
の上に、前記共通の膜を形成することもできる。Alternatively, the remaining portions of the interference multilayer film constituting the semi-transparent mirror film other than the part may be formed on the substrate first, and the common film may be formed thereon.
ざらに別の構成として、まず前記基板の上に、前記共通
の膜の一部を形成し、その上に、前記半透鏡膜を構成す
る干渉多層膜の前記一部以外の残りの部分を形成し、さ
らにその上に、前記共通の模の残りの部分を形成するこ
ともできる。As a slightly different configuration, first, a part of the common film is formed on the substrate, and the remaining parts other than the part of the interference multilayer film constituting the semi-transparent mirror film are formed thereon. However, the remaining portion of the common pattern can be further formed thereon.
もちろん、全く独立した二つの干渉多層膜を形成する場
合と比較すれば、本発明は、干渉多層膜の設計上、制約
が多くなることは確かである。しかし、以下の実施例か
ら明らかなように、本発明によっても十分実用可能な平
板形ビームスプリッタが得られており、二つの膜の境界
に不完全な部分がほとんど存在しない利点の分だけ本発
明のほうが有利と言えよう。Of course, compared to the case where two completely independent interference multilayer films are formed, it is certain that the present invention has more restrictions on the design of the interference multilayer film. However, as is clear from the following examples, a sufficiently practical flat beam splitter has been obtained according to the present invention, and the present invention has the advantage that there is almost no imperfection at the boundary between two films. It can be said that it is more advantageous.
［実施例］
以下、図面を参照して本発明の実施例を詳細に説明する
。[Example] Hereinafter, an example of the present invention will be described in detail with reference to the drawings.
次に述べる三つの実験例は、いずれも第１図に示す配置
構成で使用される平板形ビームスプリッタである。基板
には８に７ガラスを厚さ１．４ミリメートルの平行平板
に仕上げたものを用いた。The three experimental examples described below are all flat beam splitters used in the arrangement shown in FIG. The substrate used was a parallel flat plate made of 8 to 7 glass with a thickness of 1.4 mm.
そして、基板の裏面にはあらかじめ反射面を形成しであ
るものを用いた。A reflective surface was previously formed on the back surface of the substrate.
干渉膜を構成する材料としては、ＭｇＦｚ、５ｉＯｚ、
Ａｌ２Ｏ３、Ｔｉ０ｚ、Ｚｒ０ｚ、Ｙｚ ０３の６種類
を用いた。以下、本明細書ではこれらをそれぞれＭ、Ｓ
、Ａ、Ｔ、Ｚ、Ｙと表わす。Materials constituting the interference film include MgFz, 5iOz,
Six types were used: Al2O3, Ti0z, Zr0z, and Yz03. Hereinafter, in this specification, these will be referred to as M and S, respectively.
, A, T, Z, Y.
これらの膜の厚さはそれぞれ光学的厚さ０．２７７２と
した。λは使用する光の波長であり、この実施例では基
準波長を８００ナノメートルとした。８膜は真空１着で
形成した。The thickness of each of these films was an optical thickness of 0.2772. λ is the wavelength of the light used, and in this example, the reference wavelength was 800 nanometers. 8 films were formed in one vacuum.
〈実験１〉
第２図において、基板８の上に、まずＭ−＋Ａ→Ｍの順
で３１１１の干渉多層膜９を形成した。次に、領域１０
をマスキングして、干渉多層膜９の上に５−Ｔ−Ａ−４
Ｔ→Ａ→Ｔ→Ａ→Ｍ→Ａ→Ｍ→Ａ→Ｔ−８の順で１３１
１の干渉多層膜１１を形成した。<Experiment 1> In FIG. 2, an interference multilayer film 9 of 3111 was formed on the substrate 8 in the order of M-+A→M. Next, area 10
5-T-A-4 on the interference multilayer film 9.
131 in the order of T→A→T→A→M→A→M→A→T-8
An interference multilayer film 11 of No. 1 was formed.
その後マスキングを取り外した。その結果、領域１０が
増透膜（３層）となり、４５度の入射光に対して反射率
は約０．５％であった。領域１２は半透鏡膜（１６層）
となり、反則率はほぼ４９％で光の吸収はなかった。The masking was then removed. As a result, region 10 became a transparent film (three layers), and the reflectance was about 0.5% for incident light at 45 degrees. Region 12 is a semi-transparent mirror film (16 layers)
The foul rate was approximately 49%, and there was no light absorption.
く実験２〉
第３図において、まず膜を形成する前に領域１０をマス
キングした。そして、基板８の上に、Ｍ→Ａ−＋Ｔ→Ａ
−Ｔ→Ａ→Ｔ→Ａ→Ｍ→Ａの順で１０層の干渉多層膜１
３を形成した。次に、マスキングを取り外して、全面に
Ｚ−Ａの順で２１ｉ１の干渉多層！ｌ！１４を形成した
。その結果、領域１０が増透膜（２層）となり、４５度
の入射光に対して反射率は約０．５％で必った。領域１
２は半透鏡ｌ１ｌ（１２層）となり、反射率は約４５％
で光の吸収はなかった。Experiment 2> In FIG. 3, the region 10 was first masked before forming the film. Then, on the board 8, M→A-+T→A
- 10 layers of interference multilayer film 1 in the order of T→A→T→A→M→A
3 was formed. Next, remove the masking and apply a 21i1 interference multilayer on the entire surface in the order of Z-A! l! 14 was formed. As a result, the region 10 became a transparent film (two layers), and the reflectance for incident light at 45 degrees was approximately 0.5%. Area 1
2 is a semi-transparent mirror (12 layers), and the reflectance is approximately 45%.
There was no absorption of light.
く実験３〉
第４図において、基板８の上に、まずＳ−＋Ｙの順で２
層の干渉多層膜１５を形成した。次に、領域１０をマス
キングして、干渉多層膜１５の上にニー４Ａ−＋Ｔ−４
Ａ→Ｔ→Ａ→Ｍ→Ａ→Ｍ→Ａ→Ｔの順で１１層の干渉多
層ｗＡ１６を形成した。その後マスキングを取り外し、
最債に全面に８層１７を形成した。その結果、領域１０
が増透膜（３層）となり、４５度の入射光に対して反射
率は０．５％以下であった。領域１２は半透１！ＩＤＩ
（１４層）となり、反射率は約５０％で光の吸収はなか
った。Experiment 3> In Fig. 4, 2 pieces are first placed on the substrate 8 in the order of S-+Y.
An interference multilayer film 15 of layers was formed. Next, the area 10 is masked and the knee 4A-+T-4 is placed on the interference multilayer film 15.
An interference multilayer wA16 of 11 layers was formed in the order of A→T→A→M→A→M→A→T. Then remove the masking and
8 layers 17 were formed on the entire surface of the bond. As a result, area 10
became a transparent film (three layers), and the reflectance was 0.5% or less for incident light at 45 degrees. Area 12 is semi-transparent 1! IDI
(14 layers), the reflectance was about 50%, and no light was absorbed.
［発明の効果］
以上説明したように本発明は、増透膜を構成する干渉多
層膜の全部と半透鏡膜を構成する干渉多層膜の一部とを
共通の膜で形成したことにより、マスキングは唯１回で
済んで簡単に製作でき、二つの膜の境界には不完全な部
分がほとんど存在しないという効果がある。[Effects of the Invention] As explained above, the present invention provides a masking effect by forming all of the interference multilayer film constituting the transparency film and a part of the interference multilayer film constituting the semitransparent mirror film with a common film. The method is easy to manufacture, requiring only one step, and has the advantage that there are almost no imperfections at the boundary between the two films.
第１図は本発明の平板形ビームスプリッタの使用例を示
す説明図、
第２図、第３図、第４図は、それぞれ実験１、実験２、
実験３で得られた平板形ビームスプリッタの側面図、
第５図は平板形ビームスプリッタの従来の使用例を示す
説明図
第６図と第７図は従来の平板形ビームスプリッタの側面
図である。
２・・・晶子板形ビームスプリッタ
３・・・・・・半透鏡膜
５・・・・・・増透膜
８・・・・・・基板
９・・・・・・干渉多層膜（共通のｖＡ）１０・・・・
・・増透膜の領域
１１・・・・・・干渉多層膜（半透鏡膜の残りの部分）
１２・・・・・・半透鏡膜の領域
特許出願人 株式会社 マ − り代理人 弁理
士 井 ノ ロ 溝片１図
才２図
才３図
才４＠
第５図FIG. 1 is an explanatory diagram showing an example of the use of the flat plate beam splitter of the present invention, and FIGS. 2, 3, and 4 are Experiment 1, Experiment 2,
A side view of the flat beam splitter obtained in Experiment 3. Figure 5 is an explanatory diagram showing an example of a conventional use of a flat beam splitter. Figures 6 and 7 are side views of a conventional flat beam splitter. . 2... Crystallite beam splitter 3... Semi-transparent mirror film 5... Enhancing film 8... Substrate 9... Interference multilayer film (common vA) 10...
...Permeability membrane area 11...Interference multilayer film (remaining part of semi-transparent mirror film)
12... Semi-transparent mirror membrane area Patent applicant Marri Co., Ltd. Patent attorney Inoro Groove piece 1 Figure 2 Figure 3 Figure 4 @ Figure 5
Claims (4)
る半透鏡膜と、干渉多層膜で構成されて所定の光透過特
性を有する増透膜とを有し、これら半透鏡膜と増透膜と
が基板上の同一平面上に隣接して配置され、前記増透膜
を構成する干渉多層膜の全部と前記半透鏡膜を構成する
干渉多層膜の一部とが共通の膜で形成されていることを
特徴とする平板形ビームスプリッタ。(1) It has a semi-transparent mirror film composed of an interference multilayer film and has a predetermined light reflection property, and a transmission enhancing film composed of an interference multilayer film and having a predetermined light transmission property. The transparent membranes are arranged adjacent to each other on the same plane on the substrate, and the entire interference multilayer film constituting the transparent film and a part of the interference multilayer film constituting the semi-transparent mirror film are formed of a common film. A flat beam splitter characterized by:
に、前記半透鏡膜を構成する干渉多層膜の前記一部以外
の残りの部分が形成されていることを特徴とする特許請
求の範囲第１項に記載の平板形ビームスプリッタ。(2) A patent characterized in that the common film is formed on the substrate, and the remaining parts other than the part of the interference multilayer film constituting the semi-transparent mirror film are formed thereon. A flat beam splitter according to claim 1.
層膜の前記一部以外の残りの部分が形成され、その上に
、前記共通の膜が形成されていることを特徴とする特許
請求の範囲第１項に記載の平板形ビームスプリッタ。(3) A remaining part other than the part of the interference multilayer film constituting the semi-transparent mirror film is formed on the substrate, and the common film is formed thereon. A flat beam splitter according to claim 1.
、その上に、前記半透鏡膜を構成する干渉多層膜の前記
一部以外の残りの部分が形成され、さらにその上に、前
記共通の膜の残りの部分が形成されていることを特徴と
する特許請求の範囲第１項に記載の平板形ビームスプリ
ッタ。(4) A part of the common film is formed on the substrate, a remaining part other than the part of the interference multilayer film constituting the semi-transparent mirror film is formed on it, and further 2. The planar beam splitter according to claim 1, wherein the remaining portion of the common film is formed on.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14646087A JPS63311201A (en) | 1987-06-12 | 1987-06-12 | Plate type beam splitter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14646087A JPS63311201A (en) | 1987-06-12 | 1987-06-12 | Plate type beam splitter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63311201A true JPS63311201A (en) | 1988-12-20 |
Family
ID=15408139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14646087A Pending JPS63311201A (en) | 1987-06-12 | 1987-06-12 | Plate type beam splitter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63311201A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991006031A1 (en) * | 1989-10-16 | 1991-05-02 | Libbey-Owens-Ford Co. | Display panel for a vehicle windshield |
| WO1994000782A1 (en) * | 1992-06-19 | 1994-01-06 | Fujitsu Limited | Photocoupler |
| US6538809B1 (en) * | 1992-09-17 | 2003-03-25 | Leica Microsystems Wetzlar Gmbh | Variable epi-illumination interference attachment |
| JP2007225392A (en) * | 2006-02-22 | 2007-09-06 | Spectratech Inc | Optical interference device |
-
1987
- 1987-06-12 JP JP14646087A patent/JPS63311201A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1991006031A1 (en) * | 1989-10-16 | 1991-05-02 | Libbey-Owens-Ford Co. | Display panel for a vehicle windshield |
| WO1994000782A1 (en) * | 1992-06-19 | 1994-01-06 | Fujitsu Limited | Photocoupler |
| US5699187A (en) * | 1992-06-19 | 1997-12-16 | Fujitsu Limited | Optical coupler |
| US6538809B1 (en) * | 1992-09-17 | 2003-03-25 | Leica Microsystems Wetzlar Gmbh | Variable epi-illumination interference attachment |
| JP2007225392A (en) * | 2006-02-22 | 2007-09-06 | Spectratech Inc | Optical interference device |
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