JPS6331038Y2 - - Google Patents

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Publication number
JPS6331038Y2
JPS6331038Y2 JP11064586U JP11064586U JPS6331038Y2 JP S6331038 Y2 JPS6331038 Y2 JP S6331038Y2 JP 11064586 U JP11064586 U JP 11064586U JP 11064586 U JP11064586 U JP 11064586U JP S6331038 Y2 JPS6331038 Y2 JP S6331038Y2
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JP
Japan
Prior art keywords
water
tank
processing
storage tank
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11064586U
Other languages
Japanese (ja)
Other versions
JPS6230200U (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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Priority to JP11064586U priority Critical patent/JPS6331038Y2/ja
Publication of JPS6230200U publication Critical patent/JPS6230200U/ja
Application granted granted Critical
Publication of JPS6331038Y2 publication Critical patent/JPS6331038Y2/ja
Expired legal-status Critical Current

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  • Gas Separation By Absorption (AREA)

Description

【考案の詳細な説明】 (産業上の利用分野) この考案は、核融合等において生ずるトリチユ
ームを含むガス或いは重水素ガス中の含有成分を
除去して無害ガスとして放出する処理装置に係
る。
[Detailed Description of the Invention] (Industrial Application Field) This invention relates to a processing device that removes components contained in tritium-containing gas or deuterium gas produced in nuclear fusion, etc., and releases them as harmless gas.

(従来の技術) トリチユームを含有するガスに水或いは水蒸気
を接触させて交換反応によりトリチユームを回収
することは特開昭48−17100号、特開昭51−39398
号公報によつて開示される。
(Prior art) JP-A-48-17100 and JP-A-51-39398 disclose that tritium is recovered by an exchange reaction by contacting water or steam with a gas containing tritium.
Disclosed by the publication No.

(考案が解決しようとする問題点) 上記従来のものは、トリチユームを含有するガ
スを水或いは水蒸気と接触させて交換反応させる
ことを主旨とするものであつて、交換反応のため
前者のものは疑縮性ガスを使用し、又後者は水化
物の無水粉末を使用するものであり、又夫々の交
換反応処理に綿密な処理工程を必要とすることは
避けられない。
(Problems to be solved by the invention) The above-mentioned conventional method aims to bring a tritium-containing gas into contact with water or water vapor to cause an exchange reaction. A pseudocondensable gas is used, and the latter uses an anhydrous powder of a hydrate, and it is inevitable that each exchange reaction treatment requires detailed treatment steps.

(問題点を解決するための手段) 本考案は従来のような交換反応手段を避け、前
処理として処理ガスを加湿して、該ガス中のトリ
チユーム又は重水素成分を水で溶去し、ガスは冷
却減湿して無害ガスとした後放出し、水に溶存す
る成分は貯溜槽に導いて該槽内をを経て水と共に
排除し、且つ貯溜槽を経た一部の水は加湿用とし
て再使用するようにした装置を提供するもので、
一端を処理ガスの導入口とし他端を導出口とした
処理筒内に、前処理加熱部と次で噴水による加湿
部と更に冷却による減湿部とを設け、処理筒の下
面に形成した水槽を連通管により貯溜槽に連通
し、貯溜槽はその内部上流側に、下部を前記連通
管と接続し導入した処理水を上部から槽内に溢流
させ内部に上下数段の多孔板を設けた供給室を区
画形成し、下流側には上部から処理水を導入し下
部から排水し内部に上下数段の多孔板を設けた排
出室を区画形成すると共に供給室と排出室との間
に、槽底板と間隔を存して複数枚の仕切板を平行
な間隔を存して縦方向に並設し、排出室の下部を
吸引ポンプを介して導管により処理筒内の噴水管
に連通させ、貯溜槽底の一側端部に排出口を設け
て成る。
(Means for solving the problem) The present invention avoids conventional exchange reaction means, humidifies the processing gas as a pretreatment, dissolves tritium or deuterium components in the gas with water, and The water is cooled and dehumidified to become a harmless gas and then released. Components dissolved in the water are led to a storage tank and removed along with the water through the tank, and some of the water that has passed through the storage tank is recycled for humidification. It provides equipment designed for use.
A processing cylinder with a processing gas inlet at one end and an outlet at the other end is provided with a pre-processing heating section, a humidifying section using a fountain, and a dehumidifying section using cooling, and a water tank formed on the lower surface of the processing cylinder. is connected to the storage tank through a communication pipe, and the storage tank is provided with several upper and lower perforated plates inside the tank, on the upstream side thereof, the lower part is connected to the communication pipe, and the introduced treated water overflows into the tank from the upper part. On the downstream side, treated water is introduced from the upper part and drained from the lower part, and a discharge chamber with several upper and lower perforated plates installed inside is divided. , a plurality of partition plates are arranged vertically in parallel with the tank bottom plate at parallel intervals, and the lower part of the discharge chamber is connected to the fountain pipe in the processing cylinder by a conduit via a suction pump. , a discharge port is provided at one end of the bottom of the storage tank.

(作用) 本装置は図示の実施例で示すように導入口2か
ら例えばトリチユームを含んだガスを処理筒1内
に導入すれば、該処理ガスは先づ加熱部4により
適度に加熱され次で噴水管5から噴霧と接触加湿
することにより前記加熱により適度に加熱された
処理ガスとの接触により噴霧は水蒸気となり、処
理ガス中の含有成分は該水蒸気又は水滴中に溶け
込んで下部の水槽7に溜められ、更に処理ガスは
減湿部6において加熱部4よりも低い温度で処理
されるからその温度差による冷却でガス中の水分
を凝縮分離させ、その水分を水槽7に溜め、減湿
部6で除湿され乾燥されたガスは導出口3に至
り、更に再加熱部14で加熱して乾燥処理を施し
て無害ガスとして放出する。
(Function) As shown in the illustrated embodiment, in this device, when a gas containing, for example, tritium is introduced into the processing cylinder 1 from the inlet 2, the processing gas is first heated appropriately by the heating section 4 and then heated. By contacting and humidifying the spray from the fountain pipe 5, the spray turns into water vapor through contact with the processing gas that has been moderately heated by the heating, and the components contained in the processing gas dissolve into the water vapor or water droplets and flow into the lower water tank 7. Furthermore, since the processing gas is processed in the dehumidification section 6 at a lower temperature than the heating section 4, the moisture in the gas is condensed and separated by cooling due to the temperature difference, and the moisture is stored in the water tank 7 and then processed in the dehumidification section 6. The dehumidified and dried gas in step 6 reaches the outlet 3, is further heated in a reheating section 14, undergoes a drying process, and is discharged as a harmless gas.

含有成分を溶存した水槽7内の液は連通管8を
経て貯溜槽9の供給室17内に流入して溢流によ
り槽17内に充満し、以後は供給室17の多孔板
17aにより整流されつつ供給室17の上部から
溢流して漸次他側の排出室18に向つて徐々に流
動するが、この間にトリチユームを溶存するトリ
チユーム水は僅かながら水との比重差によつて
徐々に沈降する傾向を有し、又槽9内の水を下部
排出口20から排水するため並設した仕切板19
の間隔において下向きの流れを生じ、従つて徐々
に沈降するトリチユームを溶存した重水は仕切板
19の配設部の下面間隔部で排出口20から流出
し、槽内上層で一部の溶存水を交えた軽水は徐々
に排出室18側に流動して該室18の上部から進
入した後ポンプ10により噴水管5に循環させ、
トリチユーム等を含んで排出口20から流出する
水は後処理槽に送つてトリチユーム等の分離処理
を施す。
The liquid in the water tank 7 with the dissolved components flows through the connecting pipe 8 into the supply chamber 17 of the storage tank 9, overflowing and filling the tank 17. Thereafter, the liquid is rectified by the perforated plate 17a of the supply chamber 17, overflowing from the top of the supply chamber 17 and gradually flows toward the discharge chamber 18 on the other side. During this time, the tritium water with dissolved tritium has a tendency to gradually settle due to the slight difference in specific gravity with the water. Also, the water in the tank 9 is drained from the lower discharge port 20 by the partition plate 19 provided in parallel.
A downward flow occurs in the interval, and the heavy water with dissolved tritium gradually sinks and flows out of the discharge port 20 at the lower surface interval of the partition plate 19, while the light water mixed with some dissolved water in the upper layer of the tank gradually flows toward the discharge chamber 18 and enters the upper part of the chamber 18, and is circulated to the spray pipe 5 by the pump 10.
The water containing tritium and the like flowing out from the outlet 20 is sent to a post-treatment tank where the tritium and the like are separated.

尚、槽9内で処理水の一部を排出し且つ溶存成
分の含む水を交えて噴水管5に循環させるも槽9
からの排水量に応じた量の水を循環路中に補給す
るから該循環水による処理ガスの加湿効果に支障
を生ずることはなく、水の絶対量も変ることはな
い。
Note that a portion of the treated water in the tank 9 is discharged and mixed with water containing dissolved components and circulated through the fountain pipe 5.
Since water is replenished into the circulation path in an amount corresponding to the amount of water discharged from the pump, the humidifying effect of the circulating water on the process gas is not affected, and the absolute amount of water does not change.

かくて処理ガスは処理筒1内を通過させること
によりトリチユーム等の成分を噴射水に溶存除去
させて無害ガスとして放出し、トリチユーム等を
溶存した水は貯溜槽9内を経そ再び噴射水として
循環させる一方貯溜槽9内において該溶存水の一
部を槽外に排出して溶存成分の分離を行なうよう
にした。
In this way, the processing gas passes through the processing cylinder 1 to dissolve and remove components such as tritium in the injection water and release it as a harmless gas, and the water containing dissolved tritium passes through the storage tank 9 and is again used as injection water. While circulating, part of the dissolved water in the storage tank 9 was discharged to the outside of the tank to separate dissolved components.

(実施例) 本考案の実施例を図面について説明する。(Example) Embodiments of the present invention will be described with reference to the drawings.

1は水平に設けた処理筒で、その前部を処理ガ
スの導入口2とし後部を導出口3として処理ガス
を通過させるようにし、導入口2と導出口3との
間に前部から前処理加熱部4と噴水管5による加
湿部と更に減湿部6を順次設け、処理筒1の下面
に水槽7を形成し、該水槽7内を連通管8により
貯溜槽9に連通し、更に貯溜槽9内をポンプ10
を備えた導管11により噴水管5に導通させた。
Reference numeral 1 denotes a processing cylinder installed horizontally, with the front part serving as a processing gas inlet 2 and the rear part serving as an outlet 3 through which the processing gas passes. A processing heating section 4, a humidifying section with a fountain pipe 5, and a dehumidifying section 6 are sequentially provided, a water tank 7 is formed on the lower surface of the processing cylinder 1, the inside of the water tank 7 is communicated with a storage tank 9 through a communication pipe 8, and further Pump 10 inside the storage tank 9
The fountain pipe 5 was electrically connected to the water fountain pipe 5 through a conduit 11 equipped with the following.

図示例において加熱部4および減湿部6は加熱
コイルで構成し、圧縮機12による加熱媒体をこ
れらに循環させるようにし、更に減湿部6の後部
にエリミネータ13と再加熱部14を設けて減湿
部6を経た処理ガス中の水分を更に除湿して放散
させるようにし、該再加熱部14にも熱媒体を循
環させるようにしたもので、該再加熱部14は筒
1内に設置した温度検出器15によつて開閉する
電動三方弁16によつて作動を制御されるように
した。即ち図示例の場合は該電磁弁16の開路に
より熱媒体は矢示のように流通して加熱部4、除
湿部6および再加熱部14を稼動するが、温度検
出器15の検出により電動三方弁16を閉じるこ
とにより加熱部4を休止させることもできるよう
にした。貯溜槽9は一側を連通管8と接続される
区画供給室17に形成して内部を数段の多孔板1
7aで区画し、且つ他側も同様に多孔板18aで
数段に区画した排出室18に形成してこれを導管
11中のポンプ10の吸引側に連通させ、貯溜槽
9内に底板と間隔を有する数枚の仕切板19を平
行な間隔を存して縦方向に設けると共に構底の一
側に排出口20を設けてこれを後処理槽(図示せ
ず)に接続させる。
In the illustrated example, the heating section 4 and the dehumidification section 6 are constructed of heating coils, and the heating medium from the compressor 12 is circulated therethrough, and an eliminator 13 and a reheating section 14 are provided at the rear of the dehumidification section 6. The moisture in the processing gas that has passed through the dehumidifying section 6 is further dehumidified and dissipated, and a heat medium is also circulated in the reheating section 14, which is installed inside the cylinder 1. The operation is controlled by an electric three-way valve 16 which is opened and closed by a temperature sensor 15. That is, in the illustrated example, when the electromagnetic valve 16 is opened, the heat medium flows as shown by the arrow to operate the heating section 4, dehumidifying section 6, and reheating section 14, but when the temperature sensor 15 detects the heating medium, the electric three-way The heating section 4 can also be stopped by closing the valve 16. The storage tank 9 has one side formed into a compartment supply chamber 17 connected to the communication pipe 8, and the interior is equipped with several stages of perforated plates 1.
7a, and the other side is similarly divided into several stages by a perforated plate 18a, forming a discharge chamber 18, which is communicated with the suction side of the pump 10 in the conduit 11, and is placed in the storage tank 9 with a gap from the bottom plate. A plurality of partition plates 19 are provided vertically at parallel intervals, and a discharge port 20 is provided on one side of the bottom of the structure and connected to a post-treatment tank (not shown).

尚、槽9内における処理水の下流側ではトリチ
ユーム等の溶存水の沈降が漸次進むことにより該
溶存水の水位が下流側への下向き傾斜線となるこ
と想定して仕切板19上縁の高さを上記下向き傾
斜線に沿わせて順次低くし、処理水上層の軽水層
が無駄に仕切板19によつて流動を阻止され渦流
を生ずる等の弊害をなくし円滑に供給室18側に
向うようにした。
Note that the height of the upper edge of the partition plate 19 is adjusted assuming that on the downstream side of the treated water in the tank 9, as the dissolved water such as tritium gradually settles, the level of the dissolved water will become a downward sloping line toward the downstream side. The height of the treated water is gradually lowered along the downwardly inclined line, so that the light water layer in the upper layer of the treated water can smoothly flow toward the supply chamber 18 side, eliminating problems such as the flow of the light water layer in the upper layer of the treated water being blocked by the partition plate 19 and creating eddy currents. I made it.

(考案の効果) 本考案によるときはトリチユームおよび重水素
を含んだガスを加湿し、次で冷却減湿することに
より該含有成分を水を溶かしてガスから分離する
ためこれら有害成分の除去によつて無害ガスとし
て安易に放出することができ、又上記の処理によ
つて含有成分を溶存させた水は一旦貯溜槽内に導
入した後、再び加湿用としてガス処理筒内に循環
させるから経済的であり、溶存水を溜めた貯溜槽
内では該溶存水を供給室側から排出室側に流動さ
せる一方貯溜槽底に設けた排出口から槽内水を後
処理部に向つて流出させるから槽内下部に設けた
仕切板による上下方向の間隔内に下向きの層流に
よつて、槽内上部に供給された処理水は僅かであ
るが水とトリチユーム等の溶存水との比重差によ
つて溶存水が沈降する傾向と前記下向きの層流作
用により溶存水の一部はは常に槽外に排出され一
部の溶存水を交えた上層の軽水は再度加湿用とし
て使用されるも、これが再び貯溜槽内に循環し
て、その一部が常に槽外に排除されるからトリチ
ユーム等の溶存量が逐次増加残存することがなく
繰返えされる循環作用によるも処理筒内でのガス
の加湿処理に支障を生ずることがない効果を有す
る。
(Effect of the invention) According to the invention, the gas containing tritium and deuterium is humidified, and then the gas containing tritium and deuterium is cooled and dehumidified to dissolve the water and separate the contained components from the gas. It can be easily released as a harmless gas, and it is economical because the water with dissolved components through the above treatment is once introduced into the storage tank and then circulated back into the gas processing cylinder for humidification. In the storage tank containing dissolved water, the dissolved water flows from the supply chamber side to the discharge chamber side, while the water in the tank flows out from the discharge port provided at the bottom of the storage tank toward the aftertreatment section. A small amount of treated water is supplied to the upper part of the tank by a downward laminar flow within the vertical distance between the partition plates installed at the lower part of the tank, but due to the difference in specific gravity between the water and dissolved water such as tritium. Due to the tendency of dissolved water to settle and the downward laminar flow effect, some of the dissolved water is always discharged outside the tank, and the light water in the upper layer mixed with some of the dissolved water is used again for humidification. Since it circulates in the storage tank and a part of it is always removed outside the tank, the amount of dissolved tritium etc. gradually increases.The humidification process of the gas in the processing cylinder is also possible due to the repeated circulation action without remaining. It has the effect of not causing any problems.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本考案装置を線図で示す截断面図であ
る。 1……処理筒、2……導入口、3……導出口、
4……加熱部、5……加湿部、6……減湿部、7
……水槽、8……連通管、9……貯溜槽、10…
…吸引ポンプ、11……導管、17……供給室、
18……排出室、17a,18a……多孔板、1
9……仕切板、20……排出口。
The drawing is a cross-sectional view diagrammatically showing the device of the invention. 1... Processing tube, 2... Inlet, 3... Outlet,
4... Heating section, 5... Humidifying section, 6... Dehumidifying section, 7
...Water tank, 8...Communication pipe, 9...Storage tank, 10...
... Suction pump, 11 ... Conduit, 17 ... Supply chamber,
18... Discharge chamber, 17a, 18a... Perforated plate, 1
9... Partition plate, 20... Outlet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 一端を処理ガスの導入口とし他端を導出口とし
た処理筒内に、前処理加熱部と次で噴水による加
湿部と更に冷却による減湿部とを設け、処理筒の
下面に形成した水槽を連通管により貯溜槽に連通
し、貯溜槽はその内部上流側に、下部を前記連通
管と接続し導入した処理水を上部から槽内に溢流
させ内部に上下数段の多孔板を設けた供給室を区
画形成し、下流側には上部から処理水を導入し下
部から排水し内部に上下数段の多孔板を設けた排
出室を区画形成すると共に供給室と排出室との間
に、槽底板と間隔を存して複数枚の仕切板を平行
な間隔を存して縦方向に並設し、排出室の下部を
吸引ポンプを介して導管により処理筒内の噴水管
に連通させ、貯溜槽底の一側端部に排出口を設け
て成るトリチユームおよび重水素を含むガスの処
理装置。
A processing cylinder with a processing gas inlet at one end and an outlet at the other end is provided with a pre-processing heating section, a humidifying section using a fountain, and a dehumidifying section using cooling, and a water tank formed on the lower surface of the processing cylinder. is connected to the storage tank through a communication pipe, and the storage tank is provided with several upper and lower perforated plates inside the tank on the upstream side thereof, and the lower part is connected to the communication pipe so that the introduced treated water overflows into the tank from the upper part. On the downstream side, treated water is introduced from the upper part and drained from the lower part, and a discharge chamber with several upper and lower perforated plates installed inside is divided. , a plurality of partition plates are arranged vertically in parallel with each other at parallel intervals to the bottom plate of the tank, and the lower part of the discharge chamber is connected to the fountain pipe in the processing cylinder through a suction pump and a conduit. , a processing device for gas containing tritium and deuterium, comprising an outlet at one end of the bottom of a storage tank.
JP11064586U 1986-07-21 1986-07-21 Expired JPS6331038Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11064586U JPS6331038Y2 (en) 1986-07-21 1986-07-21

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11064586U JPS6331038Y2 (en) 1986-07-21 1986-07-21

Publications (2)

Publication Number Publication Date
JPS6230200U JPS6230200U (en) 1987-02-23
JPS6331038Y2 true JPS6331038Y2 (en) 1988-08-18

Family

ID=30989838

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11064586U Expired JPS6331038Y2 (en) 1986-07-21 1986-07-21

Country Status (1)

Country Link
JP (1) JPS6331038Y2 (en)

Also Published As

Publication number Publication date
JPS6230200U (en) 1987-02-23

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