JPS63292125A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPS63292125A JPS63292125A JP12942087A JP12942087A JPS63292125A JP S63292125 A JPS63292125 A JP S63292125A JP 12942087 A JP12942087 A JP 12942087A JP 12942087 A JP12942087 A JP 12942087A JP S63292125 A JPS63292125 A JP S63292125A
- Authority
- JP
- Japan
- Prior art keywords
- silver halide
- sensitive material
- photographic
- groups
- halide emulsion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 66
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 31
- 239000004332 silver Substances 0.000 title claims abstract description 31
- 239000000463 material Substances 0.000 title claims abstract description 26
- 239000000839 emulsion Substances 0.000 claims abstract description 27
- 230000035945 sensitivity Effects 0.000 claims abstract description 14
- 230000001235 sensitizing effect Effects 0.000 claims abstract description 12
- 230000003595 spectral effect Effects 0.000 claims abstract description 7
- 150000001875 compounds Chemical class 0.000 claims description 13
- 230000005070 ripening Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 abstract description 18
- 239000000084 colloidal system Substances 0.000 abstract description 11
- 108010010803 Gelatin Proteins 0.000 abstract description 9
- 125000003118 aryl group Chemical group 0.000 abstract description 9
- 239000008273 gelatin Substances 0.000 abstract description 9
- 229920000159 gelatin Polymers 0.000 abstract description 9
- 235000019322 gelatine Nutrition 0.000 abstract description 9
- 235000011852 gelatine desserts Nutrition 0.000 abstract description 9
- 239000004065 semiconductor Substances 0.000 abstract description 7
- 125000003342 alkenyl group Chemical group 0.000 abstract description 6
- 125000003710 aryl alkyl group Chemical group 0.000 abstract description 4
- 102000009027 Albumins Human genes 0.000 abstract description 2
- 108010088751 Albumins Proteins 0.000 abstract description 2
- 125000004432 carbon atom Chemical group C* 0.000 abstract description 2
- 239000005018 casein Substances 0.000 abstract description 2
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 abstract description 2
- 235000021240 caseins Nutrition 0.000 abstract description 2
- 239000001913 cellulose Substances 0.000 abstract description 2
- 229920002678 cellulose Polymers 0.000 abstract description 2
- 239000000470 constituent Substances 0.000 abstract description 2
- 230000032683 aging Effects 0.000 abstract 2
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 abstract 1
- 239000004354 Hydroxyethyl cellulose Substances 0.000 abstract 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 abstract 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 abstract 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 abstract 1
- 238000000034 method Methods 0.000 description 18
- 239000000975 dye Substances 0.000 description 17
- 239000010410 layer Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 6
- 206010070834 Sensitisation Diseases 0.000 description 6
- 239000004020 conductor Substances 0.000 description 6
- 229920001223 polyethylene glycol Polymers 0.000 description 6
- 230000008313 sensitization Effects 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- ZCQWOFVYLHDMMC-UHFFFAOYSA-N Oxazole Chemical compound C1=COC=N1 ZCQWOFVYLHDMMC-UHFFFAOYSA-N 0.000 description 4
- 229910019142 PO4 Inorganic materials 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 235000021317 phosphate Nutrition 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical compound C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical compound C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 2
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910021612 Silver iodide Inorganic materials 0.000 description 2
- 229920002472 Starch Polymers 0.000 description 2
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical compound O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- 239000004848 polyfunctional curative Substances 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 229940045105 silver iodide Drugs 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000008107 starch Substances 0.000 description 2
- 235000019698 starch Nutrition 0.000 description 2
- 235000000346 sugar Nutrition 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- JNYAEWCLZODPBN-JGWLITMVSA-N (2r,3r,4s)-2-[(1r)-1,2-dihydroxyethyl]oxolane-3,4-diol Chemical class OC[C@@H](O)[C@H]1OC[C@H](O)[C@H]1O JNYAEWCLZODPBN-JGWLITMVSA-N 0.000 description 1
- LUMLZKVIXLWTCI-NSCUHMNNSA-N (e)-2,3-dichloro-4-oxobut-2-enoic acid Chemical compound OC(=O)C(\Cl)=C(/Cl)C=O LUMLZKVIXLWTCI-NSCUHMNNSA-N 0.000 description 1
- AIGNCQCMONAWOL-UHFFFAOYSA-N 1,3-benzoselenazole Chemical compound C1=CC=C2[se]C=NC2=C1 AIGNCQCMONAWOL-UHFFFAOYSA-N 0.000 description 1
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical class C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical class C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- YLVACWCCJCZITJ-UHFFFAOYSA-N 1,4-dioxane-2,3-diol Chemical compound OC1OCCOC1O YLVACWCCJCZITJ-UHFFFAOYSA-N 0.000 description 1
- SIQZJFKTROUNPI-UHFFFAOYSA-N 1-(hydroxymethyl)-5,5-dimethylhydantoin Chemical compound CC1(C)N(CO)C(=O)NC1=O SIQZJFKTROUNPI-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- JAAIPIWKKXCNOC-UHFFFAOYSA-N 1h-tetrazol-1-ium-5-thiolate Chemical class SC1=NN=NN1 JAAIPIWKKXCNOC-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- OWIRCRREDNEXTA-UHFFFAOYSA-N 3-nitro-1h-indazole Chemical class C1=CC=C2C([N+](=O)[O-])=NNC2=C1 OWIRCRREDNEXTA-UHFFFAOYSA-N 0.000 description 1
- OCVLSHAVSIYKLI-UHFFFAOYSA-N 3h-1,3-thiazole-2-thione Chemical class SC1=NC=CS1 OCVLSHAVSIYKLI-UHFFFAOYSA-N 0.000 description 1
- GIQKIFWTIQDQMM-UHFFFAOYSA-N 5h-1,3-oxazole-2-thione Chemical compound S=C1OCC=N1 GIQKIFWTIQDQMM-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 102000004190 Enzymes Human genes 0.000 description 1
- 108090000790 Enzymes Proteins 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical class OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- RAXXELZNTBOGNW-UHFFFAOYSA-O Imidazolium Chemical compound C1=C[NH+]=CN1 RAXXELZNTBOGNW-UHFFFAOYSA-O 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- QPFYXYFORQJZEC-FOCLMDBBSA-N Phenazopyridine Chemical compound NC1=NC(N)=CC=C1\N=N\C1=CC=CC=C1 QPFYXYFORQJZEC-FOCLMDBBSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 229940023476 agar Drugs 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 238000007754 air knife coating Methods 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000005078 alkoxycarbonylalkyl group Chemical group 0.000 description 1
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 1
- 125000005599 alkyl carboxylate group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229940045714 alkyl sulfonate alkylating agent Drugs 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229940037003 alum Drugs 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
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- 239000002280 amphoteric surfactant Substances 0.000 description 1
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- 229910052786 argon Inorganic materials 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
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- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 125000004181 carboxyalkyl group Chemical group 0.000 description 1
- 125000002057 carboxymethyl group Chemical group [H]OC(=O)C([H])([H])[*] 0.000 description 1
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- 239000003153 chemical reaction reagent Substances 0.000 description 1
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- 125000000068 chlorophenyl group Chemical group 0.000 description 1
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- 229910052804 chromium Inorganic materials 0.000 description 1
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- WYYQVWLEPYFFLP-UHFFFAOYSA-K chromium(3+);triacetate Chemical compound [Cr+3].CC([O-])=O.CC([O-])=O.CC([O-])=O WYYQVWLEPYFFLP-UHFFFAOYSA-K 0.000 description 1
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- 125000004093 cyano group Chemical group *C#N 0.000 description 1
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- 238000009792 diffusion process Methods 0.000 description 1
- 125000005594 diketone group Chemical group 0.000 description 1
- 150000002012 dioxanes Chemical class 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
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- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000007850 fluorescent dye Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
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- 150000002334 glycols Chemical class 0.000 description 1
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- 150000002344 gold compounds Chemical class 0.000 description 1
- 229920000578 graft copolymer Polymers 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- AKCUHGBLDXXTOM-UHFFFAOYSA-N hydroxy-oxo-phenyl-sulfanylidene-$l^{6}-sulfane Chemical class SS(=O)(=O)C1=CC=CC=C1 AKCUHGBLDXXTOM-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 125000001841 imino group Chemical group [H]N=* 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 239000004816 latex Substances 0.000 description 1
- 229920000126 latex Polymers 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- ZAKLKBFCSHJIRI-UHFFFAOYSA-N mucochloric acid Natural products OC1OC(=O)C(Cl)=C1Cl ZAKLKBFCSHJIRI-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- 229950005308 oxymethurea Drugs 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- XYFCBTPGUUZFHI-UHFFFAOYSA-O phosphonium Chemical compound [PH4+] XYFCBTPGUUZFHI-UHFFFAOYSA-O 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229940070891 pyridium Drugs 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- 235000017709 saponins Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229940080313 sodium starch Drugs 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 229940032147 starch Drugs 0.000 description 1
- 150000003431 steroids Chemical class 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000004964 sulfoalkyl group Chemical group 0.000 description 1
- 125000000565 sulfonamide group Chemical group 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003464 sulfur compounds Chemical class 0.000 description 1
- JJJPTTANZGDADF-UHFFFAOYSA-N thiadiazole-4-thiol Chemical class SC1=CSN=N1 JJJPTTANZGDADF-UHFFFAOYSA-N 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- 150000003852 triazoles Chemical class 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000004711 α-olefin Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/09—Noble metals or mercury; Salts or compounds thereof; Sulfur, selenium or tellurium, or compounds thereof, e.g. for chemical sensitising
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C2200/00—Details
- G03C2200/39—Laser exposure
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/16—X-ray, infrared, or ultraviolet ray processes
- G03C5/164—Infra-red processes
Abstract
Description
【発明の詳細な説明】
(A)産業上の利用分野
本発明は、赤外域が分光増感されたハロゲン化銀写真感
光材料に関するものである。DETAILED DESCRIPTION OF THE INVENTION (A) Field of Industrial Application The present invention relates to a silver halide photographic material that is spectrally sensitized in the infrared region.
(B)従来技術及びその問題点
近年の迅速な情報伝達システムの発達に伴って、ハロゲ
ン化銀写真感光材料は、益々高感度が要求されるように
なっている。例えは、電子計算機からアウトプットされ
た情報を直ちに文字または図形として陰極線管によシ表
示する高速度写真植字システム、新聞原稿を遠隔地へ速
やかに送るためのプレスファクシミリシステムなどであ
る。(B) Prior art and its problems With the recent development of rapid information transmission systems, silver halide photographic materials are increasingly required to have high sensitivity. Examples include high-speed phototypesetting systems that immediately display information output from a computer as characters or graphics on a cathode ray tube, and press facsimile systems that quickly send newspaper manuscripts to remote locations.
このような用途のハロゲン化銀写真感光材料に要求され
る特性としては、陰極線管(C几T)、ヘリウム−ネオ
ンガス等のレーザー、発光ダイオード(LED)などの
光源で1O−4秒以下の、いわゆる高照度短時間露光(
閃光露光という)に対して高感度であシ、さらに高コン
トラスト、高解像力などの特性が必要とされる。The characteristics required of silver halide photographic materials for such uses include a light source of 10-4 seconds or less using a light source such as a cathode ray tube (C-T), a laser such as helium-neon gas, or a light emitting diode (LED). So-called high-intensity short-time exposure (
It requires high sensitivity for flash exposure (referred to as flash exposure), as well as characteristics such as high contrast and high resolution.
ヘリウム−ネオン、アルゴンなどのレーザー光源をスキ
ャナ方式の光源として用いる方法は、高出力が得られる
が装置が大型で高価であること、消費電力効率が低い等
の欠点がある。これに対して半導体レーザーは、小屋で
安価、変調が容易、長寿命である等の利点を有している
。半導体レーザーには、Ga/As/P :Ga/At
/As : Ga/As : In/P : I n/
A @などの系の半導体が用いられ、このレーザー光の
波長は一般に700 nmより長波で、とくに750
nmよシ長波のものが多い。A method using a laser light source such as helium-neon or argon as a scanner type light source can provide high output, but has disadvantages such as large and expensive equipment and low power consumption efficiency. On the other hand, semiconductor lasers have advantages such as being inexpensive, easy to modulate, and long-life. For semiconductor lasers, Ga/As/P:Ga/At
/As: Ga/As: In/P: In/
A type of semiconductor such as A @ is used, and the wavelength of this laser light is generally longer than 700 nm, especially 750 nm.
There are many wavelengths in the nm range.
このため明るいセーフライトが使用できるので、取扱い
作業性が良くなるという利点も有している。Therefore, since a bright safelight can be used, it also has the advantage of improving handling workability.
しかしながら、赤外光用の感光材料は、一般に感度が充
分に高くない、保存性が悪い等の問題を有してお夛、こ
れまで種々の提案がされてきた。例えば、分光増感色素
の他に第二のある塊の特異的に選択された有機化合物を
加えることによシ分光感度が著しく上昇する、いわゆる
強色増感効果と呼ばれる技術の提案があシ、例えば米国
特許第2゜785.058号、同第3,695,888
号等に記載のトリアジン誘導体、米国特許第3.457
,078号に記載の電気陰性基を有するメルカプト化合
物、特開昭51−81613号に記載のベンゾトリアゾ
ール誘導体、特開昭59−191032号に記載の四級
塩、その他特開昭61−69063号、同昭61−27
884号、等々を参考にすることができる。しかし、こ
れらの強色増感技術は、増感が十分でない、カブリが増
加する、保存性を悪くする、等の不満足な結果を与える
ものが多いのが実情である。However, infrared light-sensitive materials generally have problems such as insufficient sensitivity and poor storage stability, and various proposals have been made to date. For example, a technique called the so-called supersensitization effect has been proposed, in which the spectral sensitivity is significantly increased by adding a second mass of specifically selected organic compounds to the spectral sensitizing dye. , for example, U.S. Patent Nos. 2,785,058 and 3,695,888
Triazine derivatives described in US Pat. No. 3,457, etc.
Mercapto compounds having an electronegative group as described in JP-A-51-81613, quaternary salts as described in JP-A-59-191032, and others in JP-A-61-69063. , 1986-27
No. 884, etc. can be referred to. However, the reality is that these supersensitization techniques often give unsatisfactory results such as insufficient sensitization, increased fog, and poor storage stability.
本発明者等は、このような問題のない半導体レーザー光
用のハロゲン化銀写真感光材料を鋭意研究し九結果、あ
る種の化合物がこの目的に極めて有効であることを見出
した。The present inventors have conducted extensive research into silver halide photographic materials for use with semiconductor laser light that are free from such problems and have found that certain compounds are extremely effective for this purpose.
(C)発明の目的
本発明の目的は、700nm、とくに750 nm以上
の半導体レーザーの如き赤外域の感度が高められたハロ
ゲン化銀写真感光材料を提供することである。(C) Purpose of the Invention The purpose of the present invention is to provide a silver halide photographic material having increased sensitivity in the infrared region such as a semiconductor laser of 700 nm, particularly 750 nm or more.
本発明の別の目的は、カブリ、保存性等に問題がなく、
赤外域の感度が高められたノ・ロゲン化銀写真感光材料
を提供することである。Another object of the present invention is to have no problems with fogging, storage stability, etc.
An object of the present invention is to provide a silver halogenide photographic material with enhanced sensitivity in the infrared region.
CD)発明の構成
本発明の上記目的は、70 G nm以上に極大分光感
度を有する増感色素で光学増感したハロゲン化銀乳剤層
を有する感光材料において、ハロゲン化銀乳剤の物理熟
成完了後の任意の時期に添加された下記一般式(1)で
表わされる化合物を含有することを特徴とするハロゲン
化銀写真感光材料によって達成された。CD) Structure of the Invention The above object of the present invention is to provide a light-sensitive material having a silver halide emulsion layer optically sensitized with a sensitizing dye having a maximum spectral sensitivity of 70 G nm or more, after the completion of physical ripening of the silver halide emulsion. This was achieved by a silver halide photographic material characterized by containing a compound represented by the following general formula (1) added at any time.
一般式(1)
(式中、几1及び几2は、それぞれ水素原子、アルキル
基、アリール基、アラルキル基、アルケニ。General formula (1) (wherein 几1 and 几2 are a hydrogen atom, an alkyl group, an aryl group, an aralkyl group, and an alkeni group, respectively.
ル基、アミノ基、アシルアミド基、スルホンアミド基を
表わし、R1及びR2の炭素数の和は3以上である。)
以下に本発明に用いられる一般式(1)の化合物の具体
例を示す。但し、一般式(i)のR1及びR2のみを示
している。represents a group, an amino group, an acylamido group, or a sulfonamide group, and the sum of the carbon numbers of R1 and R2 is 3 or more. ) Specific examples of the compound of general formula (1) used in the present invention are shown below. However, only R1 and R2 in general formula (i) are shown.
比較として用いた化合物を以下に示している。Compounds used for comparison are shown below.
(比較a) (比較b)
(比較C) (比較D)
本発明に用いられる一般式(1)の化合物は、ハロゲン
化銀乳剤の物理熟成が実質的に完了した後から塗布まで
の任意の時期に、1種もしくは2a[以上を添加するの
であるが、場合によっては塗布時に隣接する親水性コロ
イド層から拡散させてもよい。(Comparison a) (Comparison b) (Comparison C) (Comparison D) The compound of general formula (1) used in the present invention can be used at any time after the physical ripening of the silver halide emulsion is substantially completed until coating. At the same time, one kind or two or more of them are added, but in some cases, they may be diffused from the adjacent hydrophilic colloid layer during coating.
添加量は、ハロゲン化銀1モル当、95X10−’ミリ
モル〜5ミリ七ル、好ましくは1×10 ミリモル〜1
ミリモルの範囲である。添加に除しては、適当な溶媒、
たとえばメタノール、エタノール、グロバノール、アセ
トン、ジメチルホルムアミド等の溶液として添加するの
が有利である。The amount added is from 95 x 10 mmol to 5 mmol, preferably from 1 x 10 mmol to 1 mmol per mole of silver halide.
It is in the mmol range. For addition, a suitable solvent,
It is advantageous to add it as a solution, for example in methanol, ethanol, globanol, acetone, dimethylformamide, etc.
本発明に用いられる7 00 nmよ)長波長領域に極
大分光感度を有する増感色素は、例えば米国特許第2,
095,854号、同!2.095,856号、同第2
.955.939号、同第3,482.978号、同第
3,552,974号、同第3,573,921号、同
第3.582,344号、同第3,623,881号明
細書等に記載されたものであることが出来る。The sensitizing dye having maximum spectral sensitivity in the long wavelength region (700 nm) used in the present invention is disclosed in, for example, U.S. Pat.
No. 095,854, same! No. 2.095,856, same No. 2
.. No. 955.939, No. 3,482.978, No. 3,552,974, No. 3,573,921, No. 3.582,344, No. 3,623,881 It can be something written in a book, etc.
好ましくは、例えは次の一般式(1)〜(IV)で表わ
される色素が用いられる。Preferably, dyes represented by the following general formulas (1) to (IV) are used.
(以下余白)
感 ミ一般式(
1)〜(IV)に於て、zl及びzlは、各々同一でも
異なっていてもよく、それぞれ5員または6員含窒素複
素環を形成するのに必要な原子群を表わす。几1及びR
2は、各々同一でも異なっていてもよく、それぞれアル
キル基、アルケニル基を表わす。R5は、アルキル基、
アルケニル基、アリール基を表わす。几4〜R10は、
各々同一でも異なっていてもよく、それぞれ水素原子、
ハロゲン原子、アルキル基、アリール基、アルコキシ基
を表わす。但し、R6とR7あるいはR8とR9とは互
に連結して5員又は6員環を形成することもできる。R
11及びR12は、各々同一でも異なっていてもよく、
それぞれアルキル基、アリール基を表わし、R’1tと
R11とは互に連結して5員又は6員環を形成すること
もできる。Yは、硫黄原子、酸素原子、 N−Rng
(Rlgはアルキル基)を表わす。(Left below) Feeling general formula (
In 1) to (IV), zl and zl may be the same or different, and each represents an atomic group necessary to form a 5- or 6-membered nitrogen-containing heterocycle.几1 and R
2 may be the same or different, and each represents an alkyl group or an alkenyl group. R5 is an alkyl group,
Represents an alkenyl group or an aryl group.几4~R10 are
Each may be the same or different, and each hydrogen atom,
Represents a halogen atom, alkyl group, aryl group, or alkoxy group. However, R6 and R7 or R8 and R9 can also be linked to each other to form a 5- or 6-membered ring. R
11 and R12 may be the same or different,
Each represents an alkyl group or an aryl group, and R'1t and R11 can also be linked to each other to form a 5- or 6-membered ring. Y is a sulfur atom, an oxygen atom, N-Rng
(Rlg is an alkyl group).
Xは酸アニオンを表わす。L、m、n、p及びqはそれ
ぞれ1又は2を表わす。X represents an acid anion. L, m, n, p and q each represent 1 or 2.
zllびzlの具体例としては、チアゾール、ベンゾチ
アゾール、ナ7 ) C1,2−α〕チアゾール、ナ7
) (2,1−α〕チアゾール、ナフト[2,3−α
〕チアゾール、セレナゾール、ベンゾセレナゾール、ナ
フト[2,1−a〕セレナゾール、ナンド(1,2−α
〕セレナゾール、オキサゾール、ベンゾオキサゾール、
ナフト[1,2−a )オキサゾール、ナフ) [2,
1−α〕オキサゾール、ナツト〔2,3−α〕オキサゾ
ール、2−キノリン、4−キノリン、3.3−ジアルキ
ルインドレニン、イミダゾール、ベンズイミダゾール、
ナフ) [1,2−α〕イミダゾール、ピリジン等の含
窒素複素環を挙げることができる。これらの複素環は、
アルキル基(例えば、メチル、エチル、ブチル、トリフ
ルオロメチル等)、アリール基(例えば、フェニル、ト
リル等)、ヒドロキシ基、アルコキシ基(例えば、メト
キシ、エトキシ、ブトキシ吟)、カルボキシ基、アルコ
キシカルボニル基(例えば、メトキシカルボニル、エト
キシカルボニル等)、ハロゲン原子(例えば、フッ素、
塩素、臭素、沃素)、アラルキル基(例えば、ベンジル
、フェネチル等)、シアノ基、アルケニル基(例えば、
アリル等)、等の置換基を1または2以上有してもよい
。Specific examples of zll and zl include thiazole, benzothiazole, na7) C1,2-α]thiazole, na7
) (2,1-α]thiazole, naphtho[2,3-α
] Thiazole, selenazole, benzoselenazole, naphtho[2,1-a]selenazole, nand(1,2-α
] Selenazole, oxazole, benzoxazole,
Naphtho[1,2-a)oxazole, naphtho[2,
1-α]oxazole, nut[2,3-α]oxazole, 2-quinoline, 4-quinoline, 3,3-dialkylindolenine, imidazole, benzimidazole,
Examples include nitrogen-containing heterocycles such as naph) [1,2-α]imidazole and pyridine. These heterocycles are
Alkyl groups (e.g. methyl, ethyl, butyl, trifluoromethyl, etc.), aryl groups (e.g. phenyl, tolyl, etc.), hydroxy groups, alkoxy groups (e.g. methoxy, ethoxy, butoxy), carboxy groups, alkoxycarbonyl groups (e.g., methoxycarbonyl, ethoxycarbonyl, etc.), halogen atoms (e.g., fluorine,
chlorine, bromine, iodine), aralkyl groups (e.g. benzyl, phenethyl, etc.), cyano groups, alkenyl groups (e.g.
may have one or more substituents such as allyl), etc.
Rt、R2に於て、アルキル基としてはメチル、エチル
、プロピル、ブチル等の低級アルキル基、β−ヒドロキ
シエチル、γ−ヒドロキシグロビル等のヒドロキシアル
キル基、β−メトキシエチル、γ−メトキシプロピル等
のアルコキシアルキル基、β−アセトキシエチル、T−
アセトキシグロビル、β−ベンゾイルオキシエチル等の
アシルオキシアルキル基、カルボキシメチル、β−カル
ボキシエチル等のカルボキシアルキル基、メトキシカル
ボニルメチル、エトキシカルボニルメチル、β−エトキ
シカルボニルエチル等のアルコキシカルボニルアルキル
基、β−スルホエチル、γ−スルホプロピル、 −スル
ホブチル等のスルホアルキル基、ベンジル、フェネチル
、スルホベンジル等のアラルキル基等、アルケニル基と
してはアリル等が挙げられる。In Rt and R2, the alkyl group includes lower alkyl groups such as methyl, ethyl, propyl, butyl, hydroxyalkyl groups such as β-hydroxyethyl and γ-hydroxyglobil, β-methoxyethyl, γ-methoxypropyl, etc. alkoxyalkyl group, β-acetoxyethyl, T-
Acyloxyalkyl groups such as acetoxyglobil and β-benzoyloxyethyl, carboxyalkyl groups such as carboxymethyl and β-carboxyethyl, alkoxycarbonylalkyl groups such as methoxycarbonylmethyl, ethoxycarbonylmethyl and β-ethoxycarbonylethyl, β- Examples of the alkenyl group include sulfoalkyl groups such as sulfoethyl, γ-sulfopropyl and -sulfobutyl, aralkyl groups such as benzyl, phenethyl and sulfobenzyl, and allyl.
R5としては、上記R1、R2で述べたようなアルキル
基、アルケニル基ならびにフェニル、トリル、メトキシ
フェニル、クロロフェニル、ナフチル等のアリール基が
挙げられる。Examples of R5 include alkyl groups and alkenyl groups as described above for R1 and R2, and aryl groups such as phenyl, tolyl, methoxyphenyl, chlorophenyl, and naphthyl.
R4〜R1Gは、水素原子、ハロゲン原子(例えば塩素
、臭素、沃素、フッ素)、几1、R2で述べ次ようなア
ルキル基、アリール基あるいは几1、R2で述べたよう
なアルキルをもつアルコキシ基(すなわち0R1ft)
であシ、R6とR7あるいはR8と19とで形成される
5員または6負環は、低級アルキル基等で置換されてい
てもよい。几11及びR12は、R,、R2で述べたよ
うなアルキル基、アリール基を表わし、R11とR12
とは互に連結して5員又は6A環を形成することもでき
る。RIAはR1、几2で述べたようなアルキル基が挙
げられる。R4 to R1G are hydrogen atoms, halogen atoms (e.g. chlorine, bromine, iodine, fluorine), alkyl groups and aryl groups as described in 几1 and R2, or alkoxy groups having alkyl as described in 几1 and R2. (i.e. 0R1ft)
The 5-membered or 6-membered negative ring formed by R6 and R7 or R8 and 19 may be substituted with a lower alkyl group or the like.几11 and R12 represent an alkyl group or an aryl group as described for R, R2, and R11 and R12
can also be linked to each other to form a 5-membered or 6A ring. Examples of RIA include an alkyl group as described in R1 and 几2.
Xの酸アニオンとしては、メチル硫酸、エチル硫酸等の
アルキル硫酸イオン、チオシアン酸イオン、トルエンス
ルホン酸イオン、塩素、A素、沃素等の八ツ、ゲンイオ
ン、過塩素酸イオン等であり、色素がベタイン類似構造
をとる場合には存在しない。Examples of the acid anion of It does not exist when it has a betaine-like structure.
本発明に用いられる増感色素の具体例を以下に例示する
。Specific examples of the sensitizing dye used in the present invention are illustrated below.
O11 80゜ C2H5L:2H5 C2)15− ■ sos− C)1.舎505− ch、((防505− I−sos 逼 C2)15 ニー (30) so。O11 80° C2H5L:2H5 C2) 15- ■ sos- C)1. Building 505- ch, ((defense 505- I-sos 〼 C2) 15 knee (30) So.
Hs
ニ一
本発明に用いられる増感色素は、当業者に公知の方法で
合成することができる。ハロゲン化銀乳剤に添加する時
期は、乳剤を塗布するまでの任意の時期であることがで
き、前記一般式(1)の化合物を添加する前、後あるい
は同時でありてよい。Hs D. The sensitizing dye used in the present invention can be synthesized by methods known to those skilled in the art. The addition to the silver halide emulsion can be at any time before the emulsion is coated, and may be before, after, or simultaneously with the addition of the compound of general formula (1).
本発明に用いられる増感色素の添加量は、ハロゲン化銀
1モル当#)IXlo”モル〜lXl0弓モル、好まし
くは5X10”’モル〜5X10−’モルの範囲である
。The amount of the sensitizing dye used in the present invention is in the range of #) IXlo" mol to 1X10" mol, preferably from 5.times.10"' mol to 5.times.10" mol, per mol of silver halide.
増感色素は、直接に乳剤に分散することもでき、あるい
はメタノール、エタノール、ピリジン、メチルセロソル
ブ、アセトン、ジメチルホルムアミドなど(またはそれ
らの混合溶媒)の水混和性溶媒に溶解し、ある場合には
水にて希釈し、またある場合には水の中で溶解し、これ
らの溶液の形で乳剤へ添加することができる。この色素
溶液に超音波振動を用いることもできるし、米国特許第
3.469.987号、特公昭46−24185に記載
の方法でも添加しうる。さらには米国特許第2.912
.345号、同3,342,605号、同2,996,
287号、同3,425,835号などに記載の方法も
用いつる。Sensitizing dyes can be dispersed directly in the emulsion or dissolved in water-miscible solvents such as methanol, ethanol, pyridine, methylcellosolve, acetone, dimethylformamide, etc. (or mixtures thereof), and in some cases They can be diluted with water, or in some cases dissolved in water, and added to the emulsion in the form of these solutions. The dye solution can be added using ultrasonic vibration or by the method described in U.S. Pat. No. 3,469,987 and Japanese Patent Publication No. 46-24185. Furthermore, U.S. Patent No. 2.912
.. No. 345, No. 3,342,605, No. 2,996,
The methods described in Nos. 287 and 3,425,835 can also be used.
本発明に用いるハロゲン化銀乳剤は、公知の株々の方法
によって調製することができる。The silver halide emulsion used in the present invention can be prepared by any known method.
本発明に用いられるハロゲン化銀乳剤は、いわゆるシン
グルジェット方式あるいはダブルジェット方式といわれ
る混合法のいずれを用いて調製されてもよいが、好まし
くは後者を用いて調製された単分散乳剤を用いるのが良
b0また、本発明に用いられるハロゲン化銀結晶の晶癖
は、立方体、八面体、十四面体、平板状結晶のいずれで
もよい。The silver halide emulsion used in the present invention may be prepared using either the so-called single jet method or the double jet method, but it is preferable to use a monodisperse emulsion prepared using the latter method. Moreover, the crystal habit of the silver halide crystal used in the present invention may be cubic, octahedral, dodecahedral, or tabular.
本発明に用いられるハロゲン化銀のハロゲン組成は、塩
化銀、臭化銀、塩臭化銀あるいはこれらに沃化銀を含む
任意のものでありでよい。The halogen composition of the silver halide used in the present invention may be silver chloride, silver bromide, silver chlorobromide, or any of these including silver iodide.
ハロゲン化銀の沈澱もしくは物理熟成中には、ロジウム
、イリジウム等の金属を用いることもできる。Metals such as rhodium and iridium can also be used during precipitation or physical ripening of silver halide.
これらの乳剤は公知の方法によって化学熟成を施す事が
出来る。即ち米国特許第1,574,944号、同2,
278.947号、同2,410,689号、同3,1
89.458舟、同3,501,313号等に記載され
ているイオウ化合物又はイオウ化合物を含む増感域ゼラ
チンによシイオフ増感を施す事が出来る。又米国特許第
2.597,856号、同2.597.915号、同2
,399,083号等に記載されている金化合物による
金増感を施すことも出来る。These emulsions can be subjected to chemical ripening by known methods. That is, U.S. Patent No. 1,574,944;
278.947, 2,410,689, 3.1
89.458, No. 3,501,313, etc., or sensitized region gelatin containing a sulfur compound can be subjected to shear-off sensitization. Also, U.S. Patent No. 2.597,856, U.S. Patent No. 2.597.915, U.S. Pat.
It is also possible to perform gold sensitization using a gold compound as described in, for example, No. 399,083.
又、米国特許第2.51 s、a 9 s、:同2,5
21,925、同2,487,850、同2,694,
637号に記載の如く還元増感を施すことも出来る。そ
してこれらの増感法は単一でなく組合せて行う事も出来
る。Also, U.S. Patent No. 2.51 s, a 9 s,: 2.5
21,925, 2,487,850, 2,694,
Reduction sensitization can also be performed as described in No. 637. These sensitization methods can be used not only alone but also in combination.
本発明に用いられる写真乳剤は又、第4級アンモニウム
塩、チオエーテル化合物、ポリエチレンオキサイド訪導
体、ジケトン類などを用いて増感することも出来る。こ
れらの方法は米国特許第2゜708.162号、同3,
046,132号、同3,046.133号、同3,0
46,134号、同3,046,135号、英国特許第
939.357号等に記載されている。The photographic emulsion used in the present invention can also be sensitized using quaternary ammonium salts, thioether compounds, polyethylene oxide conductors, diketones, and the like. These methods are described in U.S. Pat.
No. 046,132, No. 3,046.133, No. 3,0
No. 46,134, No. 3,046,135, British Patent No. 939.357, etc.
本発明の写真感光材料には種々の親水性コロイドが用い
られ、写真乳剤用および/又は他の写真構成層用のベヒ
クルとして使用する親水性コロイドには例えばゼラチン
、コロイド性アルブミン、カゼイン、カルボキシメチル
セルローズ、ヒト四キシエチルセルローズ等のセルロー
スW導体、 寒天、アルギン酸ソーダ、澱粉訪導体など
の糖訪導体、合成親水性コロイド、例えばポリビニルア
ルコール、ポリヘービニルピロリドン、ポリアクリル酸
共重合体、ポリアクリルアミドまたはこれらの誘導体、
部分加水分解物等があげられる。必要に応じて、これら
のコロイドの二つ以上の相溶性混合物を使用する。この
中で最も一般的に用いられるのはゼラチンであるが、ゼ
ラチンは一部または全部を合成高分子物質で置きかえる
ことができるほか、いわゆるゼラチン酵導体すなわち分
子中に含まれる官能基としてのアミ7基、イミノ基、ヒ
ドロオキシ基、カルボキシル基をそれらと反応し得る基
を一個持った試薬で処理、改質したもの或は他の高分子
物質の分子鎖を結合させたグラフトポリマーで置き換え
て使用してもよい。Various hydrophilic colloids are used in the photographic material of the present invention, and hydrophilic colloids used as vehicles for photographic emulsions and/or other photographic constituent layers include gelatin, colloidal albumin, casein, carboxymethyl Cellulose W conductors such as cellulose and human tetraxyethylcellulose, sugar conductors such as agar, sodium alginate, and starch conductors, synthetic hydrophilic colloids such as polyvinyl alcohol, polyhevinylpyrrolidone, polyacrylic acid copolymers, and polyacrylamide. or derivatives thereof,
Examples include partial hydrolysates. If desired, compatible mixtures of two or more of these colloids are used. Among these, gelatin is the most commonly used, but gelatin can be partially or completely replaced with synthetic polymeric substances, and gelatin can also be replaced with so-called gelatin enzyme conductors, i.e., amino-7 as a functional group contained in the molecule. or imino groups, hydroxyl groups, and carboxyl groups treated or modified with a reagent having one group that can react with them, or by replacing them with graft polymers bonded with molecular chains of other polymeric substances. It's okay.
本発明の写真感光材料には、写真乳剤層その他の親水性
コロイド層に無機または有機の硬膜剤を含有してよい。The photographic material of the present invention may contain an inorganic or organic hardener in the photographic emulsion layer or other hydrophilic colloid layer.
例えばクロム塩(クロム明ばん、酢酸クロムなど)、ア
ルデヒド類(ホルムアルデヒド、グリオキサール、ゲル
タールアルデヒドなど)、N−メチロール化合物(ジメ
チロール尿素、メチロールジメチルヒダントインなど)
、ジオキサン誘導体(2,3−ジヒドロキシジオキサン
など)活性ビニル化合物(1,3,5−)リアクリロイ
ル−へキサヒドロ−8−)リアジン、1.3−ビニルス
ルホニル−2−グロパノールナト)、活性ハロゲン化合
物(2,4−ジクロル−6−ヒドロキシ−8−トリアジ
ンl”)、ムコハロゲン[1(ムコクロル酸、ムコフェ
ノキシクロル酸など)、などを単独または組合わせて用
いることができる。For example, chromium salts (chromium alum, chromium acetate, etc.), aldehydes (formaldehyde, glyoxal, geltaraldehyde, etc.), N-methylol compounds (dimethylol urea, methylol dimethylhydantoin, etc.)
, dioxane derivatives (2,3-dihydroxydioxane, etc.), active vinyl compounds (1,3,5-)lyacryloyl-hexahydro-8-)riazine, 1,3-vinylsulfonyl-2-glopanolnato), active halogen compounds ( 2,4-dichloro-6-hydroxy-8-triazine 1"), mucohalogen [1 (mucochloric acid, mucophenoxychloroic acid, etc.), etc.] can be used alone or in combination.
本発明の感光材料の写真乳剤層または他の親水性コロイ
ド層には塗布助剤、帯電防止、スベリ性改良、乳化分散
、接着防止など種々の目的で種々の界面活性剤を含んで
もよい。The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention may contain various surfactants for various purposes such as coating aids, antistatic properties, improving slipperiness, emulsification dispersion, and preventing adhesion.
たとえばサポニン(ステロイド系)、アルキレンオキサ
イド誘導体(例えばポリエチレングリコール、ポリエチ
レングリコール/ポリプロピレングリコール縮合物、ポ
リエチレングリコールアルキルエーテル類またはポリエ
チレングリコールアルキルアリールエーテル類、ポリエ
チレングリコールエステル類、ポリエチレングリコール
ソルビタンエステル類、ポ!Jアルキレングリコールア
ルキルアミンまたはアミド類、シリコーンのポリエチレ
ンオキサイド付加物類)、グリシドール誘導体(たとえ
ばアルケニルコハク酸ポリグリセリド、アルギルソエノ
ールポリグリセリド)、多価アル;−ルの脂肪酸エステ
ル類、糖のアルキルエステル類などの非イオン性界面活
性剤、アルキルカルボン酸塩、アルキルスルフォン酸塩
、アルキルベンゼンスルフォン酸塩、アルキルナフタレ
ンスルフォン酸塩、アルキル硫酸エステル類、アルキル
リン酸エステル類、N−アシル−N−アルキルタウリン
類、スルホコハク酸エステル類、スルホアルキルポリオ
キシエチレンアルキルフェニルエーテル類、ポリオキシ
エチレンアルキルリン酸エステル類などのような、カル
ボキシ基、スルホ基、ホスホ基、硫酸エステル基、燐酸
エステル基等の酸性基を含むアニオン界面活性剤;アミ
ノ酸類、アミノアルキルスルホン酸類、アミノアルキル
硫酸または燐酸エステル類、アルキルベタイン類、アミ
ンオキシド類などの両性界面活性剤:アルキルアミン塩
類、脂肪族あるいは芳香族第4級アンモニウム塩類、ピ
リジウム、イミダゾリウムなどの複素環第4級アンモニ
ウム塩類、および脂肪族または複素環を含むホスホニウ
ムまたはスルホニウム塩類などのカチオン界面活性剤を
用いることができる。又、ラテックスポリマー等を添加
してゼラチン膜の物性を改質したシ、シリカ、デンプン
粉や、コロイダルシリカ、ガラス粉などを添加して膜面
をマット化したシすることもできる。For example, saponins (steroids), alkylene oxide derivatives (such as polyethylene glycol, polyethylene glycol/polypropylene glycol condensates, polyethylene glycol alkyl ethers or polyethylene glycol alkyl aryl ethers, polyethylene glycol esters, polyethylene glycol sorbitan esters, Po!J alkylene glycol alkyl amines or amides, polyethylene oxide adducts of silicone), glycidol derivatives (e.g. alkenylsuccinic acid polyglycerides, argylsenols polyglycerides), fatty acid esters of polyvalent alkyls, alkyl esters of sugars. Nonionic surfactants such as alkyl carboxylates, alkyl sulfonates, alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl phosphates, N-acyl-N-alkyl taurines , sulfosuccinates, sulfoalkylpolyoxyethylene alkylphenyl ethers, polyoxyethylene alkyl phosphates, etc., with acidic groups such as carboxy groups, sulfo groups, phospho groups, sulfate ester groups, and phosphate ester groups. Containing anionic surfactants; amphoteric surfactants such as amino acids, aminoalkyl sulfonic acids, aminoalkyl sulfates or phosphates, alkyl betaines, and amine oxides: alkylamine salts, aliphatic or aromatic quaternary ammonium salts Cationic surfactants such as heterocyclic quaternary ammonium salts such as , pyridium, imidazolium, and phosphonium or sulfonium salts containing aliphatic or heterocycles can be used. It is also possible to add latex polymer or the like to modify the physical properties of the gelatin film, silica, starch powder, colloidal silica, glass powder, etc. to make the film surface matte.
本発明の感光材料の写真乳剤層又は他の親水性コロイド
層には、感光材料の製造工程、保存中あるいは写真処理
中のカブリを防止し、あるいは写真性能を安定化させる
目的で、前記一般式(1)の化合物以外の種々の化合物
を含有させることができる。すなわちアゾール類たとえ
ばベンゾチアゾリウム塩、ニトロインダゾール類、トリ
アゾール類、ベンゾトリアゾール類、ベンズイミダゾー
ル類(特にニトロ−またはハロゲン置換体):ヘテロ環
メルカプト化合物類、たとえばメルカプトチアゾール類
、メルカプトベンゾチアゾール類、メルカプトベンズイ
ミダゾール類、メルカプトチアジアゾール類、メルカプ
トテトラゾール類(411Fに1−フェニル−5−メル
カプトテトラゾール)、メルカグトビリミジン類:カル
ボキシル基やスルホン基などの水溶性基を有する上記の
へテロ環メルカプト化合物類:チオケト化合物、たとえ
ばオキサゾリンチオン:アザインデン類、たとえばテト
ラアザインデン類(特に4−ヒドロキシ置換(1,3,
3a、7 )テトラアザインデン類):ベンゼンチオス
ルホン酸類:ベンゼンスルフイン酸:などのようなカブ
リ防止剤または安定剤として知られた多くの化合物を加
えることができる。The photographic emulsion layer or other hydrophilic colloid layer of the light-sensitive material of the present invention contains the general formula described above for the purpose of preventing fog during the manufacturing process, storage or photographic processing of the light-sensitive material, or stabilizing the photographic performance. Various compounds other than the compound (1) can be contained. Azoles such as benzothiazolium salts, nitroindazoles, triazoles, benzotriazoles, benzimidazoles (especially nitro- or halogen substituted); heterocyclic mercapto compounds such as mercaptothiazoles, mercaptobenzothiazoles, Mercaptobenzimidazoles, mercaptothiadiazoles, mercaptotetrazoles (1-phenyl-5-mercaptotetrazole at 411F), mercaptovirimidines: the above heterocyclic mercapto compounds having a water-soluble group such as a carboxyl group or a sulfone group thioketo compounds, such as oxazolinthione: azaindenes, such as tetraazaindenes, especially 4-hydroxy-substituted (1,3,
Many compounds known as antifoggants or stabilizers can be added, such as (3a, 7) tetraazaindenes): benzenethiosulfonic acids: benzenesulfinic acid: etc.
本発明の感光材料は、前記以外の種々の化合物、例えば
帯電防止剤、紫外線吸収剤、可塑剤、現像主薬、ハレー
シ曹ン防止染料、蛍光染料、現像促進剤、カプラー等を
使用することができる。The light-sensitive material of the present invention may contain various compounds other than those mentioned above, such as antistatic agents, ultraviolet absorbers, plasticizers, developing agents, carbon dioxide inhibitor dyes, fluorescent dyes, development accelerators, couplers, etc. .
本発明の写真感光材料においては、通常写真感光材料の
支持体として用いられるものがすべて用いられる。例え
ばセルロースナイトレートフィルム、セルロースアセテ
ートフィルム、セルロースアセテートブチレートフィル
ム、セルロースアセテートグロピオネートフィルム、ポ
リスチレン7゜イルム、ポリエチレンテレフタレートフ
イルム、ポリカーボネートフィルム、その他これらの積
層物、紙などがある。バライタ又はα−オレフィンポリ
マー、特にポリエチレン、ポリプロピレンなど炭素原子
2〜lOのa−オレフィンのポリ!−を塗布またはラミ
ネートした紙、特公昭47−19068号に示されてい
るような表面を粗面化することによって、他の高分子物
質との密着性を嵐化し、且つ印刷適性をあげたプラスチ
ックフィルム等の支持体なども好適である。In the photographic light-sensitive material of the present invention, any support that is normally used as a support for photographic light-sensitive materials can be used. Examples include cellulose nitrate film, cellulose acetate film, cellulose acetate butyrate film, cellulose acetate glopionate film, polystyrene 7° film, polyethylene terephthalate film, polycarbonate film, laminates thereof, and paper. Baryta or α-olefin polymers, especially polyolefins of 2 to 10 carbon atoms such as polyethylene and polypropylene! Paper coated or laminated with Supports such as films are also suitable.
又、本発明の親水性コロイド層の塗布方法としては、エ
アードクター、ブレード;−ト、スクイズコート、エア
ーナイフコート、リバースロールコート、キャスト;−
ト、エクストルージ璽ンコート等の方法が用いられる。Further, the coating method for the hydrophilic colloid layer of the present invention includes air doctor, blade coating, squeeze coating, air knife coating, reverse roll coating, and casting.
Methods such as coating, extrusion coating, etc. are used.
そして塗布量は1〜15μm、より好ましくは2〜10
μmとすることが好ましい。The coating amount is 1 to 15 μm, more preferably 2 to 10 μm.
It is preferable to set it to μm.
本発明の感光材料は、半導体レーザー用の黒白写真感光
材料、銀錯塩拡散転写法を利用した平版印刷版などく有
用であるが、その他の用途にも使用することができる。The light-sensitive material of the present invention is useful as a black-and-white photographic light-sensitive material for semiconductor lasers and a lithographic printing plate using a silver complex diffusion transfer method, but it can also be used for other purposes.
(E)実施例
実施例1
atのコントロールダブルジェット法によシ、平均粒径
約0.23μmの塩臭化銀(臭化銀10モルl乳剤を調
製し、沈澱、水洗再溶解した後、ゼラチン対鉄を0.6
対1.0に合わせ、硫黄+金増感した。終了後、増感色
素として例示色素(1のをハロゲン化銀1モル当夛lX
l0°4モル添加し、硬膜剤と界面活性剤を加えた。こ
の乳剤を10等分し、第1表に示す化合物をハロゲン化
銀1モル当fi5XlO°1モル添加して仕上〕乳剤と
じ九。(E) Examples Example 1 Silver chlorobromide (10 mol of silver bromide emulsion) with an average grain size of about 0.23 μm was prepared by the controlled double jet method of AT, and after precipitation, washing with water and redissolving, Gelatin to iron 0.6
Sulfur + gold sensitization was performed to match the ratio of 1.0 to 1.0. After finishing, add 1 mole of silver halide to 1 x exemplified dye (1) as a sensitizing dye.
10° 4 mol was added, and a hardener and a surfactant were added. This emulsion was divided into 10 equal parts and finished by adding 1 mol of the compound shown in Table 1 per 1 mol of silver halide.] The emulsion was finished.
これらの乳剤を保護層(ゼラチン1υ賃)と共にポリエ
ステルフィルム上に銀6 f/lriとなるように重層
塗布して試料を作製した。A sample was prepared by coating these emulsions together with a protective layer (gelatin 1υ) on a polyester film in a layered manner so that silver was 6 f/lri.
これらの試料を780 nmの干渉フィルターを通じて
10“5秒間のセンシトメトリー露光を施こし、PQ現
像液で現像し、定着、水洗、乾燥して特性を求めた。These samples were sensitometrically exposed for 10"5 seconds through a 780 nm interference filter, developed with PQ developer, fixed, washed with water, dried and characterized.
結果を第1表に示す。感度は、試料1を100とする相
対値で示している。The results are shown in Table 1. Sensitivity is shown as a relative value with Sample 1 as 100.
第1表
実施例2
実施例1に於て、ハロゲン化銀乳剤を沃化銀2モルチの
沃臭化銀乳剤を同様にして作製し、例示化合物を2×1
0”1モル添加する以外は全く同様に行った結果を第2
表に示す。Table 1 Example 2 In Example 1, a silver iodobromide emulsion containing 2 mol of silver iodide was prepared in the same manner as in Example 1, and the exemplified compound was
The second result was obtained in the same manner except that 1 mole of 0" was added.
Shown in the table.
第2表
実施例3
増感色素を例示色素(25)に代える以外は実施例1に
従って行ない、下記第3表の結果を得た。Table 2 Example 3 Example 1 was followed except that the sensitizing dye was replaced with Exemplified Dye (25), and the results shown in Table 3 below were obtained.
、第3表
実施例4
例示色素(25)の代シに例示色素(15)、(23)
又は(28)を用いる以外は実施例3と同様に行った。, Table 3 Example 4 Exemplary dyes (15) and (23) in place of Exemplary dye (25)
The same procedure as in Example 3 was performed except that (28) was used.
実施例3と同様な結果が得られた。Similar results to Example 3 were obtained.
(F)発明の効果
本発明によれば、700nm、とくに750 nm以上
の赤外域に極大分光感度を有する増感色素の感度を特定
のメルカプト化合物により上昇させることが出来、また
カブリを減少させることも出来るので、牛導体レーザー
用に適した高感度のハロゲン化銀写真感光材料を得るこ
とが出来る。(F) Effects of the Invention According to the present invention, the sensitivity of a sensitizing dye having maximum spectral sensitivity in the infrared region of 700 nm, particularly 750 nm or more can be increased by a specific mercapto compound, and fog can be reduced. Therefore, it is possible to obtain a highly sensitive silver halide photographic material suitable for use in conductor lasers.
手続?mm自書自発) 昭和62年 8月17日procedure? mm self-written) August 17, 1986
Claims (1)
で光学増感したハロゲン化銀乳剤層を有する感光材料に
おいて、ハロゲン化銀乳剤の物理熟成完了後の任意の時
期に添加された下記一般式( I )で表わされる化合物
を含有することを特徴とするハロゲン化銀写真感光材料
。 一般式( I ) ▲数式、化学式、表等があります▼ (式中、R_1及びR_2は、それぞれ水素原子、アル
キル基、アリール基、アラルキル基、アミノ基、アシル
アミド基、スルホンアミド基を表わし、R_1及びR_
2の炭素数の和は3以上である。)(1) In a light-sensitive material having a silver halide emulsion layer optically sensitized with a sensitizing dye having maximum spectral sensitivity at 700 nm or more, the following general formula is added at any time after the completion of physical ripening of the silver halide emulsion. A silver halide photographic material containing a compound represented by (I). General formula (I) ▲ Numerical formulas, chemical formulas, tables, etc. and R_
The sum of the carbon numbers of 2 is 3 or more. )
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12942087A JPS63292125A (en) | 1987-05-25 | 1987-05-25 | Silver halide photographic sensitive material |
US07/181,008 US4910129A (en) | 1987-04-17 | 1988-04-13 | Silver halide photographic light sensitive material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12942087A JPS63292125A (en) | 1987-05-25 | 1987-05-25 | Silver halide photographic sensitive material |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63292125A true JPS63292125A (en) | 1988-11-29 |
Family
ID=15009072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12942087A Pending JPS63292125A (en) | 1987-04-17 | 1987-05-25 | Silver halide photographic sensitive material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63292125A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03156443A (en) * | 1989-11-15 | 1991-07-04 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPH03202849A (en) * | 1989-12-28 | 1991-09-04 | Konica Corp | Silver halide photographic sensitive material for laser light source |
-
1987
- 1987-05-25 JP JP12942087A patent/JPS63292125A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03156443A (en) * | 1989-11-15 | 1991-07-04 | Fuji Photo Film Co Ltd | Silver halide photographic sensitive material |
JPH03202849A (en) * | 1989-12-28 | 1991-09-04 | Konica Corp | Silver halide photographic sensitive material for laser light source |
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