JPS63288921A - Production of silica glass - Google Patents
Production of silica glassInfo
- Publication number
- JPS63288921A JPS63288921A JP12275387A JP12275387A JPS63288921A JP S63288921 A JPS63288921 A JP S63288921A JP 12275387 A JP12275387 A JP 12275387A JP 12275387 A JP12275387 A JP 12275387A JP S63288921 A JPS63288921 A JP S63288921A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- formamide
- solvent
- silica glass
- sol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 claims abstract description 42
- 239000002904 solvent Substances 0.000 claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 238000001035 drying Methods 0.000 claims abstract description 14
- 239000000203 mixture Substances 0.000 claims abstract description 10
- -1 silicon alkoxide Chemical class 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 9
- 239000010703 silicon Substances 0.000 claims abstract description 9
- 230000007062 hydrolysis Effects 0.000 claims abstract description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 4
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 3
- 239000003960 organic solvent Substances 0.000 claims description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 abstract description 18
- 238000003980 solgel method Methods 0.000 abstract description 8
- 238000005336 cracking Methods 0.000 abstract description 3
- CRNJBCMSTRNIOX-UHFFFAOYSA-N methanolate silicon(4+) Chemical compound [Si+4].[O-]C.[O-]C.[O-]C.[O-]C CRNJBCMSTRNIOX-UHFFFAOYSA-N 0.000 abstract description 2
- 238000005245 sintering Methods 0.000 abstract description 2
- 239000000499 gel Substances 0.000 description 34
- 239000000243 solution Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000001879 gelation Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 2
- 229920006362 Teflon® Polymers 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 238000004031 devitrification Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- OEYIOHPDSNJKLS-UHFFFAOYSA-N choline Chemical compound C[N+](C)(C)CCO OEYIOHPDSNJKLS-UHFFFAOYSA-N 0.000 description 1
- 229960001231 choline Drugs 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000003349 gelling agent Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000012015 optical character recognition Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Silicon Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は光学用、半導体工業用、電子工業用、理化学用
等に使用されるシリカガラスの製造法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a method for producing silica glass used for optics, semiconductor industry, electronic industry, physics and chemistry, etc.
(従来の技術)
近年、シリカガラスの新たな製造法として注目をあびて
いるのが、ゾル−ゲル法である。(Prior Art) In recent years, the sol-gel method has been attracting attention as a new method for producing silica glass.
ゾル−ゲル法によるシリカガラスの製造法は次の通りで
ある。The method for producing silica glass using the sol-gel method is as follows.
一般式St (OR) a (但しRはアルキル基を表
す)で示されるシリコンアルコキシド及び/又はその重
縮合物、例えば (RO)ssi(O3i(OR))n
O5i(OR)s(n=o〜8)に水(あらかじめ触媒
として酸、アルカリを加えておいてもよい)を加え、加
水分解しシリカヒドロゾルとする。この時、シリコンア
ルコキシドと水とが均一な系となる様に溶媒として適当
なアルコールを加えてもよい、このシリカゾル溶液を静
置、昇温、ゲル化剤添加等によりゲル化させる。その後
、ゲルを乾燥することによりシリカゲルとする。この乾
燥ゲルを適当な雰囲気中で焼結することによりシリカガ
ラスを得る。Silicon alkoxide and/or its polycondensate represented by the general formula St (OR) a (where R represents an alkyl group), such as (RO)ssi(O3i(OR))n
Water (an acid or alkali may be added as a catalyst in advance) is added to O5i(OR)s (n=o~8) and hydrolyzed to obtain a silica hydrosol. At this time, an appropriate alcohol may be added as a solvent so that the silicon alkoxide and water form a uniform system.The silica sol solution is allowed to stand still, heated, or gelled by adding a gelling agent. Thereafter, the gel is dried to obtain silica gel. Silica glass is obtained by sintering this dried gel in a suitable atmosphere.
このゾル−ゲル法には以下の特長がある。This sol-gel method has the following features.
(1) 5iC14等を原料とする火炎加水分解等によ
り生成するスートを焼結してガラス化する従来の気相化
学蒸着法よりも低温で製造できるため、省エネルギーで
低コスト化できる。(1) Since it can be produced at a lower temperature than the conventional vapor phase chemical vapor deposition method in which the soot produced by flame hydrolysis or the like using 5iC14 as a raw material is sintered and vitrified, it can save energy and reduce costs.
(2)原料として液体状態で使用可能のため、精製が容
品に行え高純度化できる。(2) Since it can be used as a raw material in a liquid state, it can be purified into a container to achieve high purity.
(3)温室で液相混合できるため、他成分と混合した場
合も均質なガラスができる。(3) Since it can be mixed in a liquid phase in a greenhouse, homogeneous glass can be produced even when mixed with other components.
(発明が解決しようとする問題点)
このように種々の特長をもつゾル−ゲル法によるシリカ
ガラスの製造にもまだ未解決の問題が残されている。(Problems to be Solved by the Invention) There are still unresolved problems in the production of silica glass by the sol-gel method, which has various advantages as described above.
特にゲルを乾燥する過程でゲルにクランクや割れが発生
し易く、モノリシックな大形の乾燥ゲルを歩留りよく製
造することが困難であるという問題がある。クランクや
割れの発生する原因の一つにゲル乾燥時に水やアルコー
ル等の蒸発に伴いゲル中に応力が発生し、この応力がゲ
ルの強度より大きいとゲルはクランクや割れが発生する
と考えられている。In particular, there is a problem in that the gel tends to crack or crack during the process of drying the gel, making it difficult to produce a monolithic large-sized dried gel with a good yield. One of the causes of cracks and cracks is that stress is generated in the gel as water, alcohol, etc. evaporate during gel drying, and if this stress is greater than the strength of the gel, it is thought that the gel will crack or crack. There is.
この対策として、容器の開孔率を下げ、水やアルコール
等の蒸発速度を制御する方法がとられているが不充分で
ある。ゲル化、乾燥収縮過程でのクラックや割れはゲル
の内部構造と乾燥条件に負うところが大きい。As a countermeasure to this problem, methods have been taken to lower the porosity of the container and control the evaporation rate of water, alcohol, etc., but these methods are insufficient. Cracks and splits during the gelation and drying shrinkage processes are largely due to the internal structure of the gel and the drying conditions.
一方、シリケートガラスをゾル−ゲル法で作製する際に
、ゾル調整時に溶媒としてホルムアミドを用いることで
ゲルの強度を上げることが出来ると報告されている(M
aterial Re5earcb 5ocietyS
ys+posia Proceedings Vol、
32p71〜77 (1984) )。On the other hand, it has been reported that when producing silicate glass by the sol-gel method, the strength of the gel can be increased by using formamide as a solvent during sol preparation (M
material Re5earcb 5ocityS
ys+posia Proceedings Vol.
32p71-77 (1984)).
しかしながら、このようにシリカガラスの系にホルムア
ミドを溶媒として用いた場合は乾燥中に残存するホルム
アミドのために大きな応力が発生し、ゲルは割れてしま
うことが確認された。However, it was confirmed that when formamide is used as a solvent in a silica glass system, a large stress is generated due to the formamide remaining during drying, and the gel breaks.
本発明は、クランクや割れの発生しないケイ酸塩ガラス
の製造法を提供するものである。The present invention provides a method for producing silicate glass that does not cause cracking or cracking.
(問題点を解決するための手段)
本発明は、ゲル乾燥中、水やアルコール等の蒸発に伴っ
て発生する応力がクランクや割れの一因となるものと考
え、このような大きな応力の発生を回避するために溶媒
としてホルムアミドを用いてゾルを作製し、ゲル化させ
ることでゲルの強度を高めたのち、ゲル中のホルムアミ
ドを他の有機溶媒と水の混合溶液と置換させることで大
きな応力の発生が回避できることを見い出したことに基
づきなされたものである。(Means for Solving the Problems) The present invention considers that stress generated due to evaporation of water, alcohol, etc. during gel drying is a cause of cracks and cracks, and the present invention is designed to prevent the occurrence of such large stress. In order to avoid this, we created a sol using formamide as a solvent and increased the strength of the gel by gelling it, and then replaced the formamide in the gel with a mixed solution of other organic solvents and water to avoid large stress. This was done based on the discovery that the occurrence of this can be avoided.
本発明に用いるシリコンアルコキシドはシリコンアルコ
キシド単量体のみでなく重縮合物を用いてもよい0例え
ば、(CHsO) ssI (O3i (OCRs)
t)nO5i(OCTo)i (n −0〜8 )を挙
げることができる。As the silicon alkoxide used in the present invention, not only silicon alkoxide monomers but also polycondensates may be used. For example, (CHsO) ssI (O3i (OCRs)
t) nO5i(OCTo)i (n −0 to 8 ).
これらは一種でも複数でも使用可能である。アルキル基
としては、メチル基、エチル基、プロピル基等が好まし
い。One or more of these can be used. As the alkyl group, a methyl group, an ethyl group, a propyl group, etc. are preferable.
加水分解のために加える水は予め触媒として塩酸、硝酸
などの鉱酸、ギ酸、酢酸などの有機酸、また塩基として
アンモニアばかりでなくエチレンジアミンなどの有機塩
基を加えておいて、も良い。To the water added for hydrolysis, mineral acids such as hydrochloric acid and nitric acid, organic acids such as formic acid and acetic acid as catalysts, and not only ammonia but also organic bases such as ethylenediamine as bases may be added in advance.
溶媒として加えるホルムアミドと有機溶剤の混合液の有
機溶剤はシリコンアルコキシド、水と相溶性のあるもの
が好ましい0例えばアルコール類、ケトン類などを挙げ
ることができる。これらは一種でも複数でも使用可能で
ある。シリコンアルコキシドと溶媒及び水とは生成する
ゾルを出来るだけ均一なものとするためにスター子など
を用いてよく混合する。また超音波を照射してもよい、
ゾル調整時にシリカの微粒子を加えても良い。The organic solvent in the mixture of formamide and organic solvent added as a solvent is preferably one that is compatible with silicon alkoxide and water; for example, alcohols, ketones, etc. can be mentioned. One or more of these can be used. The silicon alkoxide, solvent, and water are thoroughly mixed using a starrer or the like in order to make the resulting sol as uniform as possible. Ultrasonic waves may also be irradiated.
Fine silica particles may be added when preparing the sol.
生成したゾル溶液は手早く他の容器に移してゲル化させ
る。ゲル化時には生成したゲルからのアルコールなどの
溶媒の発散を防ぐために容器を密封することが好ましく
、またゲル化時の温度は0℃以上が好ましい。The generated sol solution is quickly transferred to another container and allowed to gel. During gelation, it is preferable to seal the container in order to prevent solvents such as alcohol from escaping from the generated gel, and the temperature during gelation is preferably 0° C. or higher.
次にこのゲルをホルムアミドを含まない有機溶剤と水の
混合液に浸漬して、ゲル中のホルムアミドをこれらの混
合液と置換する。この有機溶剤と水の混合液は水との相
溶性があるものが好ましい。Next, this gel is immersed in a mixture of a formamide-free organic solvent and water to replace the formamide in the gel with this mixture. This mixture of organic solvent and water is preferably compatible with water.
例えばアルコール頻/水、ケトン類/水などを挙げるこ
とができる。これらの有機溶剤は一種でも複数でも使用
可能である。Examples include alcohol/water and ketones/water. These organic solvents can be used alone or in combination.
ホルムアミドを充分に置換した後、置換溶媒を除去して
、穴のある蓋に変え、適当な雰囲気下で乾燥し、収縮固
化させて乾燥ゲルとする。乾燥時の温度は温室以上であ
ることが好ましい。その後ゾル−ゲル法で一般に用いら
れる条件で焼結する。After the formamide has been sufficiently replaced, the replacement solvent is removed, the lid is replaced with a hole, and the lid is dried under an appropriate atmosphere to shrink and solidify to form a dry gel. The temperature during drying is preferably at least a greenhouse temperature. Thereafter, it is sintered under conditions commonly used in the sol-gel method.
実施例1
シリコンテトラメトキシドC5i (OCH3) 4)
19.2−1とエタノール22.7mlとホルムアミ
ド22.7mlをよく攪拌混合する。この溶液に0.0
1 mol/ Itのアンモニア水9.1mlを加え充
分に混合してシリカゾルを得た。得られたゾルを直径9
0鶴のテフロンをコーティングしたガラスシャーレに深
さ8龍まで入れ密封して室温でゲル化した。ゲル化した
後、エタノールと水が容量比で1:1の溶液中にゲルを
1日浸漬し、ホルムアミドとの溶媒置換を行った。この
後、置換溶媒を除去した後、穴のある蓋に代えて60℃
で10日間乾燥後、120℃で1日乾燥してクランクや
割れのない乾燥ゲルを得た。この乾燥ゲルを焼成炉中1
150℃で加熱してクラックや発泡などシリカガラスを
得た。Example 1 Silicon tetramethoxide C5i (OCH3) 4)
19. Mix 2-1, 22.7 ml of ethanol, and 22.7 ml of formamide with thorough stirring. 0.0 in this solution
9.1 ml of 1 mol/It aqueous ammonia was added and thoroughly mixed to obtain a silica sol. The resulting sol has a diameter of 9
The mixture was placed in a Teflon-coated glass petri dish to a depth of 8, sealed, and allowed to gel at room temperature. After gelatinization, the gel was immersed for one day in a solution of ethanol and water in a volume ratio of 1:1 to perform solvent replacement with formamide. After this, after removing the displacement solvent, replace it with a lid with a hole at 60°C.
After drying for 10 days at 120° C., a dry gel without cracks or cracks was obtained. This dry gel is placed in a baking oven.
It was heated at 150°C to obtain silica glass with cracks and foam.
このシリカガラスには、失透や気泡はなく品質の高いも
のである。また、分析の結果、このシリカガラスは市販
のシリカガラスとその特性が一致した。This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
比較例
ゲル中のホルムアミドとの溶媒置換をしなかったこと以
外は実施例1と同様の操作を行い、乾燥ゲルを作製した
ところ乾燥中にクラックや割れが発生し、モノリシック
な乾燥ゲルを得ることができなかった。Comparative Example When a dry gel was prepared by performing the same operation as in Example 1 except that the solvent was not replaced with formamide in the gel, cracks and cracks occurred during drying, and a monolithic dry gel was obtained. I couldn't do it.
実施例2
シリコンアルコキシドの重縮合物
(CI(so)ssi(O5i(OCHs)z)nO5
i(QC)Is)3(n −3を中心にもつもの)22
.7ml、エタノール24.3m+1とホルムアミド2
4.3mlを加えよく撹拌混合した。Example 2 Polycondensate of silicon alkoxide (CI(so)ssi(O5i(OCHs)z)nO5
i(QC)Is)3 (with n −3 at the center) 22
.. 7ml, ethanol 24.3m+1 and formamide 2
4.3 ml was added and stirred and mixed well.
この溶液に0.01請of/j!のコリン水溶液を加え
充分に混合してシリカゾルを得た。このゾルを直径90
fiのテフロンをコーティングしたガラスシャーレに深
さ8鶴まで入れ密封し温室でゲル化した。ゲル化した後
、エタノールと水が容量比で1=1の溶液中にゲルを1
日浸漬し、ホルムアミドとの溶媒置換を行った。この後
、置換溶媒を除去した後、穴のある蓋に代えて60℃で
10日間乾燥後、120℃で1日乾燥してクランクや割
れのない乾燥ゲルを得た。この乾燥ゲルを焼成炉中11
50℃で加熱してクラックや発泡などのないシリカガラ
スを得た。This solution costs 0.01/j! A choline aqueous solution was added and thoroughly mixed to obtain a silica sol. This sol has a diameter of 90
The mixture was placed in a glass Petri dish coated with fi Teflon to a depth of 8 mm, sealed, and allowed to gel in a greenhouse. After gelation, add 1 part of the gel to a solution of ethanol and water in a volume ratio of 1=1.
The sample was soaked for 1 day, and the solvent was replaced with formamide. Thereafter, after removing the replacement solvent, the gel was dried at 60° C. for 10 days and then at 120° C. for 1 day in place of a lid with holes to obtain a dry gel without any cracks or cracks. This dry gel was placed in a baking oven for 11 minutes.
Silica glass without cracks or foaming was obtained by heating at 50°C.
このシリカガラスには、失透や気泡はなく品質の高いも
のである。また、分析の結果、このシリカガラスは市販
のシリカガラスとその特性が一致した。This silica glass has no devitrification or bubbles and is of high quality. Further, as a result of analysis, the properties of this silica glass matched those of commercially available silica glass.
また、置換溶媒としてエタノール/水辺外の例えばl−
プロパツール/水の系でもこれらの効果が見い出せた。In addition, as a substitution solvent, ethanol/for example l-
These effects were also found in the propatool/water system.
(発明の効果)
本発明によれば乾燥中ゲルの割れにつながるホルムアミ
ドを置換することで、クランクや割れのないモノリシッ
クな乾燥ゲルを作製できる。(Effects of the Invention) According to the present invention, a monolithic dry gel without cranks or cracks can be produced by replacing formamide, which causes cracks in the gel during drying.
また、従来のゾル−ゲル法よりも得られたガラス中の水
分を極めて少なくできる。Furthermore, the amount of water in the glass obtained can be significantly reduced compared to the conventional sol-gel method.
Claims (1)
ルとし、放置してゲル化し、乾燥後焼結するシリカガラ
スの製造法に於て、加水分解する際に溶媒としてホルム
アミドを含む有機溶媒を用い、乾燥前のゲルをホルムア
ミドを含まない有機溶媒と水との混合液に浸漬後乾燥す
ることを特徴とするシリカガラスの製造法。1. In the manufacturing method of silica glass, in which silicon alkoxide is hydrolyzed to form silica hydrosol, left to gel, and sintered after drying, an organic solvent containing formamide is used as a solvent during hydrolysis, and before drying. A method for producing silica glass characterized by immersing a gel in a mixture of a formamide-free organic solvent and water and then drying the gel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12275387A JPS63288921A (en) | 1987-05-20 | 1987-05-20 | Production of silica glass |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12275387A JPS63288921A (en) | 1987-05-20 | 1987-05-20 | Production of silica glass |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63288921A true JPS63288921A (en) | 1988-11-25 |
Family
ID=14843755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12275387A Pending JPS63288921A (en) | 1987-05-20 | 1987-05-20 | Production of silica glass |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63288921A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0345519A (en) * | 1989-07-13 | 1991-02-27 | Toyo Ink Mfg Co Ltd | Production of glass from liquid phase |
KR100337703B1 (en) * | 1999-09-17 | 2002-05-22 | 윤종용 | Composition for making silica glass with sol-gel process |
-
1987
- 1987-05-20 JP JP12275387A patent/JPS63288921A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0345519A (en) * | 1989-07-13 | 1991-02-27 | Toyo Ink Mfg Co Ltd | Production of glass from liquid phase |
KR100337703B1 (en) * | 1999-09-17 | 2002-05-22 | 윤종용 | Composition for making silica glass with sol-gel process |
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