JPS63288078A - Oscillator for excimer laser - Google Patents

Oscillator for excimer laser

Info

Publication number
JPS63288078A
JPS63288078A JP12313187A JP12313187A JPS63288078A JP S63288078 A JPS63288078 A JP S63288078A JP 12313187 A JP12313187 A JP 12313187A JP 12313187 A JP12313187 A JP 12313187A JP S63288078 A JPS63288078 A JP S63288078A
Authority
JP
Japan
Prior art keywords
excimer laser
main discharge
capacitors
discharge
pulse shaping
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12313187A
Other languages
Japanese (ja)
Inventor
Keisuke Sasaki
敬介 佐々木
Masakatsu Sugii
杉井 正克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP12313187A priority Critical patent/JPS63288078A/en
Publication of JPS63288078A publication Critical patent/JPS63288078A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To oscillate an excimer laser at long pulses with high efficiency by composing a secondary side capacitor for a discharge excitation circuit of a plurality of pulse shaping capacitors mutually connected in parallel. CONSTITUTION:When a primary side capacitor C1 is charged by negative high voltage-HV and a trigger Tr is applied to a high-voltage switch SW and the switch SW is closed, high voltage is applied to a main discharge electrode 2 while all pulse shaping capacitors C2p, C2p... for secondary side capacitors C2, C2 are charged simultaneously. Consequently, high voltage is applied to pre-ionization electrodes 3 and discharge is generated, and ultraviolet rays are generated. An excimer laser medium is pre-ionized by the ultraviolet rays, thus generating main discharge in a main discharge section 21. The excimer laser medium is excited by the main discharge, and an excimer laser is oscillated. The secondary side capacitors C2 are composed of pulse shaping circuits having characteristics close to a distributed constant circuit by the four pulse shaping capacitors C2p, C2p..., thus changing the oscillation of the excimer laser into long pulses.

Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、エキシマ−レーザーを長パルス1つ高効率で
発振させる装置に関する。
DETAILED DESCRIPTION OF THE INVENTION <Field of Industrial Application> The present invention relates to a device for oscillating an excimer laser with high efficiency in one long pulse.

〈従来の技術〉 Xec l笠の気体をレーザー媒質とする紫外域の高出
力レーザーであるエキシマ−レーザーは、短パルス発振
である為に車色性が低く、例えば同位体分離用励起光源
や半導体加工に利用するには不都合てあった。よってエ
キシマ−レーザーの発振の長パルス化が種々試みられて
いる。
<Prior art> Excimer lasers, which are high-output lasers in the ultraviolet region that use gas as a laser medium, have short pulse oscillations and therefore have low car coloring, and are used, for example, as excitation light sources for isotope separation or semiconductors. It was inconvenient to use for processing. Therefore, various attempts have been made to increase the length of the excimer laser oscillation pulse.

放電励起方式のエキシマ−レーザーの発振を長パルス化
、即ち発振時間を長くする為には励起放電の時間を長く
すればよいが、長パルス化すると一般に発振の効率が低
下してしまう。
In order to make the oscillation of a discharge-excited excimer laser into a longer pulse, that is, to lengthen the oscillation time, it is sufficient to lengthen the excitation discharge time, but if the pulse is made longer, the oscillation efficiency generally decreases.

そこで従来、効率を低下させずに励起放電の時間を長く
する為に、第3図の構成図に示す様な発振袋こが用いら
れている。即ちこの発振装置は、Xec l hgのエ
キシマ−レーザー媒質を封入したレーザー管lの内部に
主放電電極2と、その主放電電極2の上下に対を為す予
備電離電極3.3を設けるとともに、これらの主放電電
極2及び予備電離電極3.3に放電励起回路EXを接続
して成るものである、この放電励起回路EXは、主放電
電極2のカソード電極KEに[された−次側コンデンサ
ーC3を正の高電圧+IIVで充電して高電圧スイッチ
S+aを閉じることにより、−次側コンデンサーC1か
ら二次側コンデンサーC2,C、へ容量を移行させて予
備電離電極3.3で予備電離を行わせるとともに、主放
電電極2で主放電を起こさせるものである。これにより
エキシマ−レーザー媒質を励起してレーザーを発振させ
る。
Therefore, conventionally, in order to lengthen the excitation discharge time without reducing the efficiency, an oscillating tube as shown in the block diagram of FIG. 3 has been used. That is, this oscillation device is provided with a main discharge electrode 2 and a pair of pre-ionization electrodes 3.3 above and below the main discharge electrode 2 inside a laser tube l which encloses an excimer laser medium of Xecl hg. A discharge excitation circuit EX is connected to the main discharge electrode 2 and the preliminary ionization electrode 3.3. By charging C3 with a positive high voltage +IIV and closing the high voltage switch S+a, the capacitance is transferred from the negative side capacitor C1 to the secondary side capacitors C2, C, and preionization is performed at the preionization electrode 3.3. At the same time, the main discharge is caused to occur at the main discharge electrode 2. This excites the excimer laser medium to oscillate a laser.

そして上記発振装置では、主放電電極2のアノード′−
[極AEに直列に付加コイルLaを接続し、その付加コ
イルLaのインダクタンスにより主放電の持続時間を延
ばしてレーザーの発振時間を長く、即ち長パルス化して
いる。
In the above oscillation device, the anode '- of the main discharge electrode 2 is
[An additional coil La is connected in series with the pole AE, and the inductance of the additional coil La extends the duration of the main discharge to lengthen the laser oscillation time, that is, to make the pulse longer.

〈発明が解決しようとする問題点〉 しかし上述の如く付加コイルLaを設けた従来の発皺装
置では、充分な長パルス化が達成できず、又XeF、K
rFといったフッ素系のエキシマ−レーザー媒質に対し
ては主放電を起こすことができない、即ちレーザーを発
振し得ない等の問題があった。
<Problems to be solved by the invention> However, as mentioned above, with the conventional wrinkle generating device provided with the additional coil La, it is not possible to achieve a sufficiently long pulse, and
For fluorine-based excimer laser media such as rF, there is a problem that a main discharge cannot be caused, that is, a laser cannot be oscillated.

く問題点を解決するための手段〉 本発明は上記問題点を解決すべく提案されたエキシマ−
レーザーの発振装置で、放電励起回路の二次側コンデン
サーを、互いに並列に接続された複数のパルス整形コン
デンサーにより構成したことを特徴とするものである。
Means for Solving the Problems> The present invention is an excimer proposed to solve the above problems.
This laser oscillation device is characterized in that the secondary capacitor of the discharge excitation circuit is composed of a plurality of pulse shaping capacitors connected in parallel with each other.

く作用〉 上記構成により、予備型gI電極での放電の持続時間が
長くなる。よって予備電離とともに主放電の持続時間が
延長されて、エキシマ−レーザーの発振が長パルス化さ
れるとともに高効率化される。
Effects> The above configuration increases the duration of discharge at the preliminary gI electrode. Therefore, the duration of the main discharge is extended as well as the pre-ionization, and the oscillation of the excimer laser becomes a longer pulse and becomes more efficient.

(実施例〉 以下、図面に基づいて本発明の詳細な説明する。尚、従
来例と相違ない構成部品については同一の番号及び符号
を用いる。
(Example) Hereinafter, the present invention will be described in detail based on the drawings.The same numbers and symbols will be used for components that are the same as in the conventional example.

第1図は、本発明に係るエキシマ−レーザーの発振装り
を説明する構成図で、図中のレーザー管lは縦断面概略
図で示しである。
FIG. 1 is a block diagram illustrating an oscillation device for an excimer laser according to the present invention, and a laser tube 1 in the figure is shown in a schematic vertical cross-sectional view.

図て示す様にこの発振装置は、エキシマ−レーザー媒質
例えばXec lを封入したレーザー管lと、高電圧型
[(図示せず)に接続された放電励起回路ECとより構
成されている。レーザー管lの内部には棒状のアノード
電極^Eとカソード電極にEとを水平に対向させて成る
主放電電極2と、その主放電電極2の上下に対を為す予
備電離電極3.3が設けられている。主放電部ai2の
アノード電極AEとカソード電極KEの間に形成される
主放電部21の大きさは1例えば輻Q、6cm 、高さ
2620■、長さ60c■である。又予備電離電極3は
、レーザー管lの上下に取着された単ビン31と、上記
カソード電極KEに接続された共通ビンコ2とによりピ
ンギャップPGを形成するもので、後述の予備電離を主
放電部21で均一に行うべく主放電電極2に沿って等間
隔に複数1例えば13対設けられている。そしてレーザ
ー管lの前後両端は、溶融石英のブリュースター窓(図
示せず)により閉じられている。
As shown in the figure, this oscillation device is composed of a laser tube l filled with an excimer laser medium such as XeCl, and a discharge excitation circuit EC connected to a high voltage type (not shown). Inside the laser tube l, there are a main discharge electrode 2 consisting of a rod-shaped anode electrode ^E and a cathode electrode E horizontally opposed to each other, and a pair of preliminary ionization electrodes 3.3 above and below the main discharge electrode 2. It is provided. The size of the main discharge part 21 formed between the anode electrode AE and the cathode electrode KE of the main discharge part ai2 is, for example, a radius Q of 6 cm, a height of 2620 mm, and a length of 60 cm. The pre-ionization electrode 3 forms a pin gap PG with a single pin 31 attached above and below the laser tube l and a common pin 2 connected to the cathode electrode KE, and is mainly used for pre-ionization, which will be described later. A plurality of pairs, for example 13 pairs, are provided at equal intervals along the main discharge electrode 2 so that discharge can be performed uniformly in the discharge section 21. Both front and rear ends of the laser tube 1 are closed with fused silica Brewster windows (not shown).

一方、放電励起回路ECは上記各予備″’;is電極3
毎に設けられ、夫々の放電励起回路ECは第1図の如き
構成を有する。即ち、−次側コンデンサーCIの一端は
、抵抗R0を介して高電圧電源に接続されるとともにサ
イラトロン等の高電圧スイウチSWを介して接地されて
いる。又−次側コンデンサーC1の他端は、主放電電極
2のアノード電極AEに接続されるとともに高抵抗R2
を介して接地されている。主放電電極2のカソード電極
KEは接地されている。
On the other hand, the discharge excitation circuit EC is connected to each of the above-mentioned spare electrodes 3
Each discharge excitation circuit EC has a configuration as shown in FIG. That is, one end of the negative side capacitor CI is connected to a high voltage power supply via a resistor R0, and is also grounded via a high voltage switch SW such as a thyratron. Further, the other end of the next-side capacitor C1 is connected to the anode electrode AE of the main discharge electrode 2, and has a high resistance R2.
is grounded through. The cathode electrode KE of the main discharge electrode 2 is grounded.

そして−次側コンデンサーC1と上下の予備電離電極3
,3は、夫々同一容量の二次側コンデンサーC*、 C
2で接続されている。更に各々の二次側コンデンサー0
2は、互いに並列に接続された複数、例えば四個のパル
ス整形コンデンサーc2p、c、p・・・により、分布
定数回路に近い特性を有すべく構成されている。これら
パルス整形コンデンサーC29,c2p−・・から成る
回路をパルス整形回路と呼ぶ。又二次側コンデンサーC
2の容量、即ち四個のパルス整形コンデンサーC2p、
Czp・・・の合成容贋は、−次側コンデンサーC,の
容量とほぼ等しい。
And - next side capacitor C1 and upper and lower pre-ionization electrodes 3
, 3 are secondary capacitors C*, C with the same capacity, respectively.
Connected by 2. Furthermore, each secondary side capacitor 0
2 is configured to have characteristics close to a distributed constant circuit by a plurality of, for example, four, pulse shaping capacitors c2p, c, p, . . . connected in parallel with each other. A circuit consisting of these pulse shaping capacitors C29, c2p-, etc. is called a pulse shaping circuit. Also, secondary side capacitor C
2 capacitance, i.e. four pulse shaping capacitors C2p,
The combined capacitance of Czp... is approximately equal to the capacitance of the negative side capacitor C.

」二足構成により、−次側コンデンサーC,を負の高電
圧−11Vで充電し、高電圧スイッチSWにトリガーT
rをかけて閉じると、主成’it電極2に高電圧がかか
るとともに二次側コンデンサーC2,C2へ電荷か移行
して二次側コンデンサーC2,C2の全てのパルス整形
コンデンサーc2p、 C2p・・・が同時に充電され
る。即ち二次側コンデンサーC2から二次側コンデンサ
ーC2,C2へ容量が移行する。
With the two-leg configuration, the negative side capacitor C is charged with a negative high voltage of -11V, and the trigger T is applied to the high voltage switch SW.
When r is applied and closed, a high voltage is applied to the main electrode 2, and the charge is transferred to the secondary capacitors C2, C2, and all the pulse shaping capacitors c2p, C2p, etc. of the secondary capacitors C2, C2 are connected.・are charged at the same time. That is, the capacitance is transferred from the secondary capacitor C2 to the secondary capacitors C2, C2.

すると予備電離電極3に高電圧がかかって放電が起こり
、その放電により紫外線が発生する。そしてエキシマ−
レーザー媒質がこの紫外線によって千@ −,11され
ることにより、主放電部21において1ミ放′眠が起こ
る。この主放電によってエキシマ−レーザー媒質は励起
され、エキシマ−レーザーが発振される。
Then, a high voltage is applied to the pre-ionization electrode 3, causing a discharge, and the discharge generates ultraviolet rays. and excimer
As the laser medium is heated by this ultraviolet ray, a 1-hour sleep occurs in the main discharge section 21. This main discharge excites the excimer laser medium and oscillates an excimer laser.

」ニ述の発振過程は、高電圧スイッチSWの開閉により
断続的に繰返され、従ってエキシマ−レーザーはパルス
状に発振される。
The above-mentioned oscillation process is intermittently repeated by opening and closing the high voltage switch SW, so that the excimer laser is oscillated in a pulsed manner.

上記発振過程において、二次側コンデンサー02か四個
のパルス整形コンデンサーC2p。
In the above oscillation process, the secondary capacitor 02 or the four pulse shaping capacitors C2p.

C2p・・・により分布定数回路に近い特性を有するパ
ルス整形回路で構成されている為に、四個のパルス整形
コンデンサーC29,C29・・・からの放電が同時で
はなく、予備型a電極3側から順に少しずつずれて起こ
り、結果として予備電離電極3での放電の持続時間が長
くなる。よって予備電離とともに主放電の持続時間が延
長されて、エキシマ−レーザーの発振が長パルス化され
る。しかもパルス整形コンデンサーC21)、 C2p
”・から成るパルス整形回路は特性インピーダンスが低
い為に、レーザー負荷とのインピーダンス整合か良く、
高い効率で発振させ得る。
Since it is composed of a pulse shaping circuit that has characteristics similar to a distributed constant circuit due to C2p..., the discharge from the four pulse shaping capacitors C29, C29... is not simultaneous, but on the preliminary type a electrode 3 side. The discharge occurs with a slight shift in order from 1 to 3, and as a result, the duration of the discharge at the pre-ionization electrode 3 becomes longer. Therefore, the duration of the main discharge is extended along with pre-ionization, and the oscillation of the excimer laser is made into a long pulse. Moreover, pulse shaping capacitor C21), C2p
Since the pulse shaping circuit consisting of
It can oscillate with high efficiency.

上記構成の発振装置により、Xec lを媒質とするエ
キシマ−レーザーを、効率2%、パルス幅68nsec
 (半値全幅)で発振させることが可能であった。
The oscillation device with the above configuration generates an excimer laser using Xecl as a medium with an efficiency of 2% and a pulse width of 68 nsec.
It was possible to oscillate at (full width at half maximum).

又第2図の構成図で示す様に、予備電離電極3に接続さ
れたパルス整形コンデンサーCzl)。
Further, as shown in the configuration diagram of FIG. 2, a pulse shaping capacitor Czl) is connected to the preionization electrode 3.

cap・・・の、予備電離電極3側から一段目と二段目
との間にパルス整形コイルtpを挿入することにより、
f@電離の持続時間をより長く、即ち発振のパルスをよ
り長くすることができる。この構成によりパルス@90
nsec(半値全幅)で発振させることか可1に、であ
った。
By inserting a pulse shaping coil tp between the first stage and the second stage from the pre-ionization electrode 3 side of the cap...
The duration of f@ionization can be made longer, ie the pulse of oscillation can be made longer. With this configuration, pulse @90
It was possible to oscillate at nsec (full width at half maximum).

更に、二次側コンデンサーC2を構成するパルス整形コ
ンデンサーC2p、C2p・・・の数を増すことにより
、発振をさらに長パルス化することが可能である。しか
も本発明の発振装置では、フッ素系のエキシマ−レーザ
ー媒質に対しても発振させることかできる。
Furthermore, by increasing the number of pulse shaping capacitors C2p, C2p, . . . that constitute the secondary side capacitor C2, it is possible to make the oscillation into a longer pulse. Furthermore, the oscillation device of the present invention can oscillate even in a fluorine-based excimer laser medium.

〈発明の効果〉 以上述べた様に本発明の発振装置によれば、エキシマ−
レーザーを長パルス且つ高効率で発振させることができ
、しかもエキシマ−レーザー媒質の種類が限定されない
、よってエキシマ−レーザーを同位体分離用励起光源や
半導体加工に利用することを可能とする等、その応用範
囲拡大に大きく貢献する。
<Effects of the Invention> As described above, according to the oscillation device of the present invention, the excimer
Lasers can be oscillated with long pulses and with high efficiency, and the type of excimer laser medium is not limited. Therefore, excimer lasers can be used as excitation light sources for isotope separation and semiconductor processing, etc. This will greatly contribute to expanding the range of applications.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は1本発明に係るエキシマ−レーザーの発振装置
を説明する構成図、 第2図は1発振袋この他の実施例を説明する構成図、 第3図は、従来の発振装置を説明する構成図である。 l・・・レーザー管、  2・・・主放電電極。 3・・・T−愉電離電極、  EC・・・放電励起回路
。 Ct・・・−次側コンデンサー。 C2・・・二次側コンデンサー。 C2p−・・パルス整形コンデンサー。 特許出願人     佐 々 木 敬 介堀之内 保 代理人       弁理士 船橘國則第1図 第2図
Fig. 1 is a block diagram explaining an excimer laser oscillation device according to the present invention, Fig. 2 is a block diagram explaining another embodiment of the excimer laser oscillation device according to the present invention, and Fig. 3 is a block diagram explaining a conventional oscillation device. FIG. l... Laser tube, 2... Main discharge electrode. 3...T-ionization electrode, EC...discharge excitation circuit. Ct...-Next side capacitor. C2...Secondary side capacitor. C2p--Pulse shaping capacitor. Patent Applicant Kei Sasaki Yasushi Sukehorinouchi Agent Patent Attorney Kuninori Funatachibana Figure 1 Figure 2

Claims (1)

【特許請求の範囲】[Claims] エキシマーレーザー媒質を封入した内部に主放電電極と
予備電離電極とを設けたレーザー管と、充電された一次
側コンデンサーから二次側コンデンサーへ容量を移行さ
せて前記予備電離電極で予備電離を行わせると共に前記
主放電電極で主放電を起こさせる放電励起回路とより構
成されるエキシマーレーザーの発振装置において、前記
放電励起回路の二次側コンデンサーを、互いに並列に接
続された複数のパルス整形コンデンサーにより構成した
ことを特徴とするエキシマーレーザーの発振装置。
A laser tube is provided with a main discharge electrode and a pre-ionization electrode inside which encloses an excimer laser medium, and the capacitance is transferred from a charged primary capacitor to a secondary capacitor, and pre-ionization is performed at the pre-ionization electrode. In an excimer laser oscillation device comprising a discharge excitation circuit that causes a main discharge at the main discharge electrode, a secondary capacitor of the discharge excitation circuit is constituted by a plurality of pulse shaping capacitors connected in parallel with each other. An excimer laser oscillation device characterized by:
JP12313187A 1987-05-20 1987-05-20 Oscillator for excimer laser Pending JPS63288078A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12313187A JPS63288078A (en) 1987-05-20 1987-05-20 Oscillator for excimer laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12313187A JPS63288078A (en) 1987-05-20 1987-05-20 Oscillator for excimer laser

Publications (1)

Publication Number Publication Date
JPS63288078A true JPS63288078A (en) 1988-11-25

Family

ID=14852950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12313187A Pending JPS63288078A (en) 1987-05-20 1987-05-20 Oscillator for excimer laser

Country Status (1)

Country Link
JP (1) JPS63288078A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61216373A (en) * 1985-03-22 1986-09-26 Hitachi Ltd Pulse laser apparatus
JPS61240690A (en) * 1985-04-18 1986-10-25 Toshiba Corp Gas laser oscillator

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61216373A (en) * 1985-03-22 1986-09-26 Hitachi Ltd Pulse laser apparatus
JPS61240690A (en) * 1985-04-18 1986-10-25 Toshiba Corp Gas laser oscillator

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