JPS63279000A - Aromatic hydrocarbon solvent - Google Patents
Aromatic hydrocarbon solventInfo
- Publication number
- JPS63279000A JPS63279000A JP11537887A JP11537887A JPS63279000A JP S63279000 A JPS63279000 A JP S63279000A JP 11537887 A JP11537887 A JP 11537887A JP 11537887 A JP11537887 A JP 11537887A JP S63279000 A JPS63279000 A JP S63279000A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- aromatic hydrocarbon
- hydrocarbon solvent
- freon
- arom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002904 solvent Substances 0.000 title claims abstract description 35
- 150000004945 aromatic hydrocarbons Chemical class 0.000 title claims description 19
- 239000003208 petroleum Substances 0.000 claims abstract description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract 2
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 claims description 7
- 125000003118 aryl group Chemical group 0.000 claims 1
- 238000005238 degreasing Methods 0.000 abstract description 7
- 238000004140 cleaning Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 238000010276 construction Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 230000009970 fire resistant effect Effects 0.000 abstract description 2
- 239000004215 Carbon black (E152) Substances 0.000 abstract 2
- 229930195733 hydrocarbon Natural products 0.000 abstract 2
- 150000002430 hydrocarbons Chemical class 0.000 abstract 2
- 230000008034 disappearance Effects 0.000 abstract 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000003063 flame retardant Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- CYRMSUTZVYGINF-UHFFFAOYSA-N trichlorofluoromethane Chemical compound FC(Cl)(Cl)Cl CYRMSUTZVYGINF-UHFFFAOYSA-N 0.000 description 3
- 230000001988 toxicity Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- 241000428199 Mustelinae Species 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 229950011008 tetrachloroethylene Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Landscapes
- Detergent Compositions (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、例えば半導体製造プロセスに用いられる芳
香族炭化水素系溶剤の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to improvements in aromatic hydrocarbon solvents used, for example, in semiconductor manufacturing processes.
従来、半導体製造プロセス等に用いられる主な溶剤とし
てトリクロロエチレンがある０例えば製造プロセスとし
てウェハの脱脂並びに洗浄などがあり、最近その有害性
が論じられるようになり、使用を見合わせる傾向にある
。そのため、トリクロロエチレン並びに類似の特徴を有
するトリクロロエタンやテトラクロロエチレンに替わる
代替溶剤の検討が成されている０例えば、その一つとし
て芳香族炭化水素系溶剤がある。Conventionally, trichlorethylene has been the main solvent used in semiconductor manufacturing processes, etc. For example, trichlorethylene has been used in manufacturing processes such as wafer degreasing and cleaning, but recently its harmfulness has been discussed, and there is a tendency to refrain from using it. Therefore, studies are being conducted on alternative solvents to replace trichlorethylene, trichloroethane, and tetrachlorethylene having similar characteristics. For example, aromatic hydrocarbon solvents are one such solvent.
その特性としては、まず有害性を観てみると衆知のよう
に有機溶剤予防規則によれば＃Ｉ８種該当品であり毒性
に関しても特に問題視はされていない。As for its characteristics, first of all, if we look at its toxicity, it falls under class #I8 according to the Organic Solvent Prevention Regulations, as is well known, and there are no particular concerns regarding its toxicity.
次に脱脂及び洗浄力については、第２図に示すように図
中、人で示すトリクロロエチレンと図中Ｂで示す芳香族
炭化水素系溶剤は同等の性能を有している。Next, as for degreasing and cleaning power, as shown in FIG. 2, trichlorethylene (indicated by human) and aromatic hydrocarbon solvent (indicated by B in the figure) have equivalent performance.
次に、トリクロロエチレンは衆知のように不燃性溶剤で
あるが、この種の芳香族炭化水素系溶剤は、消防法危険
物第４種第２石油類に属し引火点４４〜４９℃となって
いる。但しこの引火点はＪＩ８に２２６５ に定める
々ンスキーマルテンス密閉式引火点試験機（以下、ＰＭ
法と略記する。）による。Next, as is well known, trichlorethylene is a nonflammable solvent, but this type of aromatic hydrocarbon solvent belongs to the Fire Service Act, Class 4, Class 2 Petroleum, and has a flash point of 44-49°C. . However, this flash point is determined by the Junsky Martens closed flash point tester (hereinafter referred to as PM) specified in JI8 2265.
Abbreviated as law. )by.
従来の芳香族炭化水素系溶剤は、トリクロロエチレン等
の脱脂力及び洗浄力を有し、かつ有害性に問題がないが
引火点が４４〜４９℃と低く、実際の製造ラインに用い
るシこは、脱脂及び洗浄装置を防爆構造しかつ耐火材料
で構造しなければならず装置が大型化かつ高価となる問
題点がある。Conventional aromatic hydrocarbon solvents, such as trichlorethylene, have degreasing and cleaning power and are harmless, but their flash point is low at 44-49°C, and the solvent used in actual production lines is The degreasing and cleaning equipment must be constructed of explosion-proof construction and fireproof material, which poses a problem in that the equipment becomes large and expensive.
この発明は上記のような問題を解消するためになされた
もので芳香族炭化水素系溶剤を難燃化でき、脱脂装置な
どを防爆構造かつ耐火材料る用いる必要がなくなり、装
置を安価に構成することが出来る芳香族炭化水素系溶剤
を得ることを目的とする。This invention was made in order to solve the above-mentioned problems. It can make aromatic hydrocarbon solvents flame retardant, eliminates the need to use explosion-proof construction and fire-resistant materials for degreasing equipment, etc., and makes the equipment inexpensive. The purpose is to obtain an aromatic hydrocarbon solvent that can be used as an aromatic hydrocarbon solvent.
この発明に係る芳香族炭化水素溶剤は、この芳香族炭化
水素系溶剤にフロン１１ｇを６〜２０ωも％添加したも
のである。The aromatic hydrocarbon solvent according to the present invention is obtained by adding 11 g of Freon to the aromatic hydrocarbon solvent in an amount of 6 to 20 ω.
この発明における芳香族炭化水素系溶剤は、５〜２０ｗ
ｔ％添加されたフロン１１３により溶剤が難燃化される
。The aromatic hydrocarbon solvent in this invention is 5 to 20w
The solvent is rendered flame retardant by the addition of t% of Freon 113.
以下、この発明の一実施例を第１図、第１表で説明する
。An embodiment of the present invention will be described below with reference to FIG. 1 and Table 1.
まず、芳香族炭化水素系溶剤にフロン１１Ｂを５〜２０
ｗｔ％添加する。First, add 5 to 20% Freon 11B to the aromatic hydrocarbon solvent.
Add wt%.
これにより、ＰＭ法による測定結果では第１表に示すよ
うになる。即ち、フロン未添加の場合、引火点が４９℃
でみるのに対し、フロン１１３を５ｗｔ％ｌＯｗｔ％、
２０ｗｔ％添加すると、いずれにおいても引火点が存在
しない、これは、フロン１１３の蒸気圧が芳香族炭化水
素系溶剤よりも高く、かつ、その蒸気密度が空気よりも
重たいために、フロン１１８を添加した溶剤の液面上が
フロン１１３の蒸気相を形成することにより、不燃性と
なるため、火気を近づけてもフロン１１８の蒸気相によ
って消火されることになる。As a result, the measurement results by the PM method are as shown in Table 1. In other words, without the addition of CFCs, the flash point is 49°C.
In contrast, Freon 113 is 5wt%lOwt%,
When 20 wt% is added, there is no flash point in either case. This is because the vapor pressure of Freon 113 is higher than that of aromatic hydrocarbon solvents, and its vapor density is heavier than air. By forming a vapor phase of Freon 113 on the liquid surface of the solvent, it becomes nonflammable, so even if a flame is brought close, it will be extinguished by the vapor phase of Freon 118.
これらを第１表のＪＩＳＫに示されるクリーブランド式
開放型引火点測定法を用いた場合、引火点は、未添加の
場合に比べ２０〜７０℃上昇し、難燃化の特性も同時に
示す。When these are measured using the Cleveland open type flash point measurement method shown in JISK in Table 1, the flash point increases by 20 to 70°C compared to the case without addition, and also exhibits flame retardant properties.
（℃）
（注）・ペンスキーマルテンス法はＪＩＳＫ２２６５に
よる。(℃) (Note) - Pensky Martens method is based on JISK2265.
・クリーブランド法はＪＩＳＫ ２ｇ７４による。-Cleveland method is based on JISK 2g74.
次に、第１図により、フロン１１８ 濃度が６０１５未
満についての着火温度について示す。Next, FIG. 1 shows the ignition temperature when the Freon 118 concentration is less than 6015.
フロン１１Ｂ添加濃度が５ｗｔ％以下になると着火温度
が低下するのでフロン１１３添加濃度は６〜２０ω亀％
の範囲が望しい。If the concentration of Freon 11B added is less than 5wt%, the ignition temperature will decrease, so the concentration of Freon 113 added should be 6 to 20ω%.
A range of is desirable.
なお、上記実施例では、芳香族炭化水素系溶剤について
示したが、他の芳香族炭化水素系溶剤のうち汎用されて
いるトルエンやキシレンにおいても同様の効果を秦する
他、イソパラフィン系溶剤やノルマルパラフィン系溶剤
で炭素数８〜１２においても同様の効果を秦する。In the above example, the aromatic hydrocarbon solvent was shown, but the same effect can be obtained with toluene and xylene, which are widely used among other aromatic hydrocarbon solvents, as well as isoparaffinic solvents and normal A similar effect can be obtained with paraffinic solvents having 8 to 12 carbon atoms.
以上のように、この発明によれば、芳香族炭化水素系溶
剤中にフロン１１３を添加することにより、引火点が消
失し、火災に対する安全性が高まる効果がある。As described above, according to the present invention, by adding Freon 113 to the aromatic hydrocarbon solvent, the flash point disappears and the fire safety is improved.
第１図はこの発明においてフロン１１Ｂの添加率と着火
温度との関係を示すグラフ、第２図は、従来の溶剤の脱
脂及び洗浄力を示すグラフである。FIG. 1 is a graph showing the relationship between the addition rate of Freon 11B and the ignition temperature in the present invention, and FIG. 2 is a graph showing the degreasing and cleaning power of conventional solvents.
Claims (1)
香族炭化水素系溶剤において、フロン１１３を５〜２０
ｗｔ％を添加したことを特徴とする芳香族炭化水素系溶
剤。In aromatic hydrocarbon solvents consisting of aromatic components with carbon chains of 8 to 9 among petroleum fractions, 5 to 20% of Freon 113 is added.
An aromatic hydrocarbon solvent characterized by adding wt%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11537887A JPS63279000A (en) | 1987-05-12 | 1987-05-12 | Aromatic hydrocarbon solvent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11537887A JPS63279000A (en) | 1987-05-12 | 1987-05-12 | Aromatic hydrocarbon solvent |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63279000A true JPS63279000A (en) | 1988-11-16 |
Family
ID=14661046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11537887A Pending JPS63279000A (en) | 1987-05-12 | 1987-05-12 | Aromatic hydrocarbon solvent |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63279000A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0394082A (en) * | 1989-06-12 | 1991-04-18 | Kao Corp | Detergent composition |
| JP2002097494A (en) * | 2000-09-22 | 2002-04-02 | Japan Energy Corp | Detergent for chemical plant and its cleaning method |
-
1987
- 1987-05-12 JP JP11537887A patent/JPS63279000A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0394082A (en) * | 1989-06-12 | 1991-04-18 | Kao Corp | Detergent composition |
| JP2002097494A (en) * | 2000-09-22 | 2002-04-02 | Japan Energy Corp | Detergent for chemical plant and its cleaning method |
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