JPS63277684A - Production of 7beta-aminothiazolylalkenoylamino-3-cephem-4-carboxylic acid - Google Patents
Production of 7beta-aminothiazolylalkenoylamino-3-cephem-4-carboxylic acidInfo
- Publication number
- JPS63277684A JPS63277684A JP62113155A JP11315587A JPS63277684A JP S63277684 A JPS63277684 A JP S63277684A JP 62113155 A JP62113155 A JP 62113155A JP 11315587 A JP11315587 A JP 11315587A JP S63277684 A JPS63277684 A JP S63277684A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- formula
- cephem
- carboxylic acid
- esters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 238000006243 chemical reaction Methods 0.000 claims abstract description 20
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims abstract description 16
- 125000001424 substituent group Chemical group 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 229930186147 Cephalosporin Natural products 0.000 claims abstract description 8
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229940124587 cephalosporin Drugs 0.000 claims abstract description 8
- 150000001780 cephalosporins Chemical class 0.000 claims abstract description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 abstract description 22
- 229910052736 halogen Inorganic materials 0.000 abstract description 7
- 150000002367 halogens Chemical class 0.000 abstract description 7
- 241000894006 Bacteria Species 0.000 abstract description 4
- NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 abstract description 4
- 230000000844 anti-bacterial effect Effects 0.000 abstract description 4
- -1 carboxylic acid compound Chemical class 0.000 description 116
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 27
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 21
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 19
- 125000004432 carbon atom Chemical group C* 0.000 description 18
- 239000000243 solution Substances 0.000 description 16
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 15
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 10
- 238000003756 stirring Methods 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 235000019439 ethyl acetate Nutrition 0.000 description 9
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 8
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 7
- 150000002148 esters Chemical class 0.000 description 7
- 239000002808 molecular sieve Substances 0.000 description 7
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 7
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000741 silica gel Substances 0.000 description 6
- 229910002027 silica gel Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 6
- 235000011054 acetic acid Nutrition 0.000 description 5
- 150000001412 amines Chemical class 0.000 description 5
- 238000004587 chromatography analysis Methods 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 229930194542 Keto Natural products 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 125000003342 alkenyl group Chemical group 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 150000002085 enols Chemical class 0.000 description 4
- 125000000468 ketone group Chemical group 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- 125000004414 alkyl thio group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- WASQWSOJHCZDFK-UHFFFAOYSA-N diketene Chemical compound C=C1CC(=O)O1 WASQWSOJHCZDFK-UHFFFAOYSA-N 0.000 description 3
- 239000002024 ethyl acetate extract Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
- 239000012442 inert solvent Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000002994 raw material Substances 0.000 description 3
- 235000017557 sodium bicarbonate Nutrition 0.000 description 3
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 3
- 239000011780 sodium chloride Substances 0.000 description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 2
- OISVCGZHLKNMSJ-UHFFFAOYSA-N 2,6-dimethylpyridine Chemical compound CC1=CC=CC(C)=N1 OISVCGZHLKNMSJ-UHFFFAOYSA-N 0.000 description 2
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 2
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000005108 alkenylthio group Chemical group 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- HOPRXXXSABQWAV-UHFFFAOYSA-N anhydrous collidine Natural products CC1=CC=NC(C)=C1C HOPRXXXSABQWAV-UHFFFAOYSA-N 0.000 description 2
- 239000003242 anti bacterial agent Substances 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000003710 aryl alkyl group Chemical group 0.000 description 2
- 150000007860 aryl ester derivatives Chemical class 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- WGQKYBSKWIADBV-UHFFFAOYSA-N benzylamine Chemical compound NCC1=CC=CC=C1 WGQKYBSKWIADBV-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- UTBIMNXEDGNJFE-UHFFFAOYSA-N collidine Natural products CC1=CC=C(C)C(C)=N1 UTBIMNXEDGNJFE-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000010908 decantation Methods 0.000 description 2
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 150000005826 halohydrocarbons Chemical class 0.000 description 2
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 2
- 239000012456 homogeneous solution Substances 0.000 description 2
- 125000003392 indanyl group Chemical group C1(CCC2=CC=CC=C12)* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 2
- QPJVMBTYPHYUOC-UHFFFAOYSA-N methyl benzoate Chemical compound COC(=O)C1=CC=CC=C1 QPJVMBTYPHYUOC-UHFFFAOYSA-N 0.000 description 2
- 125000004372 methylthioethyl group Chemical group [H]C([H])([H])SC([H])([H])C([H])([H])* 0.000 description 2
- LQNUZADURLCDLV-UHFFFAOYSA-N nitrobenzene Chemical compound [O-][N+](=O)C1=CC=CC=C1 LQNUZADURLCDLV-UHFFFAOYSA-N 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000005633 phthalidyl group Chemical group 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 238000000638 solvent extraction Methods 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- GFYHSKONPJXCDE-UHFFFAOYSA-N sym-collidine Natural products CC1=CN=C(C)C(C)=C1 GFYHSKONPJXCDE-UHFFFAOYSA-N 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 125000005023 xylyl group Chemical group 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- SNICXCGAKADSCV-JTQLQIEISA-N (-)-Nicotine Chemical compound CN1CCC[C@H]1C1=CC=CN=C1 SNICXCGAKADSCV-JTQLQIEISA-N 0.000 description 1
- FZENGILVLUJGJX-NSCUHMNNSA-N (E)-acetaldehyde oxime Chemical compound C\C=N\O FZENGILVLUJGJX-NSCUHMNNSA-N 0.000 description 1
- JHNRZXQVBKRYKN-VQHVLOKHSA-N (ne)-n-(1-phenylethylidene)hydroxylamine Chemical compound O\N=C(/C)C1=CC=CC=C1 JHNRZXQVBKRYKN-VQHVLOKHSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 description 1
- ZYVYEJXMYBUCMN-UHFFFAOYSA-N 1-methoxy-2-methylpropane Chemical compound COCC(C)C ZYVYEJXMYBUCMN-UHFFFAOYSA-N 0.000 description 1
- VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
- LBLYYCQCTBFVLH-UHFFFAOYSA-N 2-Methylbenzenesulfonic acid Chemical compound CC1=CC=CC=C1S(O)(=O)=O LBLYYCQCTBFVLH-UHFFFAOYSA-N 0.000 description 1
- CFMZSMGAMPBRBE-UHFFFAOYSA-N 2-hydroxyisoindole-1,3-dione Chemical compound C1=CC=C2C(=O)N(O)C(=O)C2=C1 CFMZSMGAMPBRBE-UHFFFAOYSA-N 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 208000035473 Communicable disease Diseases 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 238000006000 Knoevenagel condensation reaction Methods 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- NQTADLQHYWFPDB-UHFFFAOYSA-N N-Hydroxysuccinimide Chemical compound ON1C(=O)CCC1=O NQTADLQHYWFPDB-UHFFFAOYSA-N 0.000 description 1
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229930182555 Penicillin Natural products 0.000 description 1
- JGSARLDLIJGVTE-MBNYWOFBSA-N Penicillin G Chemical compound N([C@H]1[C@H]2SC([C@@H](N2C1=O)C(O)=O)(C)C)C(=O)CC1=CC=CC=C1 JGSARLDLIJGVTE-MBNYWOFBSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- XAKBSHICSHRJCL-UHFFFAOYSA-N [CH2]C(=O)C1=CC=CC=C1 Chemical group [CH2]C(=O)C1=CC=CC=C1 XAKBSHICSHRJCL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- PXAJQJMDEXJWFB-UHFFFAOYSA-N acetone oxime Chemical compound CC(C)=NO PXAJQJMDEXJWFB-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 125000005042 acyloxymethyl group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 241001148470 aerobic bacillus Species 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- 125000005205 alkoxycarbonyloxyalkyl group Chemical group 0.000 description 1
- 125000004849 alkoxymethyl group Chemical group 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000000304 alkynyl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000003957 anion exchange resin Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000005279 aryl sulfonyloxy group Chemical group 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000010533 azeotropic distillation Methods 0.000 description 1
- 230000001580 bacterial effect Effects 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- NDKBVBUGCNGSJJ-UHFFFAOYSA-M benzyltrimethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)CC1=CC=CC=C1 NDKBVBUGCNGSJJ-UHFFFAOYSA-M 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 150000001782 cephems Chemical group 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 239000007810 chemical reaction solvent Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- NKLCHDQGUHMCGL-UHFFFAOYSA-N cyclohexylidenemethanone Chemical group O=C=C1CCCCC1 NKLCHDQGUHMCGL-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 239000012024 dehydrating agents Substances 0.000 description 1
- 125000006182 dimethyl benzyl group Chemical group 0.000 description 1
- HPYNZHMRTTWQTB-UHFFFAOYSA-N dimethylpyridine Natural products CC1=CC=CN=C1C HPYNZHMRTTWQTB-UHFFFAOYSA-N 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- LJQKCYFTNDAAPC-UHFFFAOYSA-N ethanol;ethyl acetate Chemical compound CCO.CCOC(C)=O LJQKCYFTNDAAPC-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000005448 ethoxyethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])* 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000029142 excretion Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000004995 haloalkylthio group Chemical group 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 125000004970 halomethyl group Chemical group 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000004434 industrial solvent Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229940095102 methyl benzoate Drugs 0.000 description 1
- 125000006178 methyl benzyl group Chemical group 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229960002715 nicotine Drugs 0.000 description 1
- SNICXCGAKADSCV-UHFFFAOYSA-N nicotine Natural products CN1CCCC1C1=CC=CN=C1 SNICXCGAKADSCV-UHFFFAOYSA-N 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 125000006502 nitrobenzyl group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000007530 organic bases Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007911 parenteral administration Methods 0.000 description 1
- 229940049954 penicillin Drugs 0.000 description 1
- 239000000825 pharmaceutical preparation Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 125000001844 prenyl group Chemical group [H]C([*])([H])C([H])=C(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000002577 pseudohalo group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 125000003638 stannyl group Chemical group [H][Sn]([H])([H])* 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000000829 suppository Substances 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- ILMRJRBKQSSXGY-UHFFFAOYSA-N tert-butyl(dimethyl)silicon Chemical group C[Si](C)C(C)(C)C ILMRJRBKQSSXGY-UHFFFAOYSA-N 0.000 description 1
- 125000001412 tetrahydropyranyl group Chemical group 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000006000 trichloroethyl group Chemical group 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 241001148471 unidentified anaerobic bacterium Species 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/55—Design of synthesis routes, e.g. reducing the use of auxiliary or protecting groups
Landscapes
- Cephalosporin Compounds (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は式(I):
(式中、Roはアルキル基、R1は水素原子またはセフ
ァロスポリン化学における3位置換基、R″は水素原子
またはカルボキシ保護基を表わす)で示される7β−ア
ミノチアゾリルアルケノイルアミノ−3−セフェム−4
−カルボン酸化合物の製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to the formula (I): (wherein Ro is an alkyl group, R1 is a hydrogen atom or a substituent at the 3-position in cephalosporin chemistry, and R'' is a hydrogen atom or a carboxy protecting group. ) 7β-aminothiazolylalkenoylamino-3-cephem-4
- It relates to a method for producing a carboxylic acid compound.
式(I)で示されるアミノチアゾリルアルケノイルセフ
ァロスポリン類は、経口投与によりダラム陽性菌および
ダラム陰性閑に対して抗菌活性を示す有用な化合物であ
る(特開昭57−93982号、特開昭59−9308
6号)。Aminothiazolylalkenoyl cephalosporins represented by formula (I) are useful compounds that exhibit antibacterial activity against Durham-positive bacteria and Durham-negative bacteria when administered orally (Japanese Patent Application Laid-Open No. 57-93982, Japanese Patent Publication No. 59-9308
No. 6).
この文献記載の方法を追試したところ、前記式([)に
於いて、Roの配置に関するEとZ異性体がほぼ同量生
成し、工業的実施には不適当なことが確認された。本発
明の主生成物はZ異性体である。When the method described in this literature was repeated, it was confirmed that in the above formula ([), E and Z isomers related to the configuration of Ro were produced in almost equal amounts, making it unsuitable for industrial implementation. The main product of this invention is the Z isomer.
本発明者らは式(I)の化合物の有用性に鑑み、該化合
物の新規な製造方法を開発することを目的として研究を
重ねた結果、式(II)
:(式中、R1は水素原子またはセファロスポリン化学
における3位置換基、R8は水素原子またはカルボキシ
保護基、Halはハロゲン原子を表わす)で示される7
β−ハロアセトアミド−3−セフェム−4−カルボン酸
化合物を、式(I[f)R’CHO(I)
(式中、Roはアルキル基を表わす)
で示されるアルカノールおよびチオ尿素と反応させるこ
とにより効率良く製造できることを見出し、本発明を完
成するに至った。In view of the usefulness of the compound of formula (I), the present inventors conducted repeated research with the aim of developing a new method for producing the compound. or a 3-position substituent in cephalosporin chemistry, R8 is a hydrogen atom or a carboxy protecting group, Hal is a halogen atom)
Reacting a β-haloacetamido-3-cephem-4-carboxylic acid compound with an alkanol and thiourea of the formula (I[f)R'CHO(I) (wherein Ro represents an alkyl group). The present inventors have discovered that the present invention can be manufactured more efficiently.
アルキル基R0という用語は炭素数1〜8の直鎖または
分枝鎖状アルキル基を指す。The term alkyl group R0 refers to a straight or branched alkyl group having 1 to 8 carbon atoms.
アルキル基R0の具体例としてはメチル、エチル、プロ
ピル、イソプロピル、ブチル、イソブチル、第3級ブチ
ル、シクロプロピル、シクロブチル、ペンチル、イソペ
ンチル、ネオペンチル、第3級ペンチル、シクロペンチ
ル、メチルシクロペンチル、ヘキシル、メチルペンチル
、ジメチルブチル、シクロヘキシル、ヘプチル、メチル
ヘキシル、シクロヘプチル、メチルシクロヘキシル、ジ
メチルペンチル、ジメチルシクロペンチル、オクチルな
どを列挙できる。Specific examples of the alkyl group R0 are methyl, ethyl, propyl, isopropyl, butyl, isobutyl, tertiary butyl, cyclopropyl, cyclobutyl, pentyl, isopentyl, neopentyl, tertiary pentyl, cyclopentyl, methylcyclopentyl, hexyl, methylpentyl. , dimethylbutyl, cyclohexyl, heptyl, methylhexyl, cycloheptyl, methylcyclohexyl, dimethylpentyl, dimethylcyclopentyl, octyl, and the like.
セファロスポリン類の3位置換基R1の例としては、1
〜5Cアルカノイルオキシ、ハロゲン、1〜5Cアルコ
キシ、1〜5Cアルキルチオ、1〜5Cアルケニルチオ
、1〜5Cアルキル、1〜5Cアルケニル、異原子とし
て窒素、酸素または硫黄1〜4個を含む異項環チオ(特
に1〜5cアルキル、アルコキシ、置換メチルなどを有
していることもあるトリアゾリルチオ、テトラゾリルチ
オ、チアジアゾリルチオ、チアジアゾリルチオなど)、
置換メチルなど、セファ0スポリンの3位置換基として
知られている基を挙げることができる。ここに、置換メ
チルにおける置換基としては、ピリジニウム、置換ピリ
ジニウムなどのほか、前記ハロゲン、ヒドロキシ、1〜
5cアルコキシ、1〜5Cアシルオキシ、1〜5cアル
キルチオ、1〜5Cハロアルキルチオ、1〜5cシアノ
アルキルチオ、異項環チオなどが好ましい。前記置換ア
ルキルなどと結合する置換基としてはヒドロキシ、ハロ
ゲン、ジメチルアミノ、カルボキシ、カルバモイルなど
が有用である。Examples of the 3-position substituent R1 of cephalosporins include 1
-5C alkanoyloxy, halogen, 1-5C alkoxy, 1-5C alkylthio, 1-5C alkenylthio, 1-5C alkyl, 1-5C alkenyl, heterocyclic ring containing 1-4 nitrogen, oxygen or sulfur as a heteroatom thio (especially triazolylthio, tetrazolylthio, thiadiazolylthio, thiadiazolylthio, etc., which may have 1-5c alkyl, alkoxy, substituted methyl, etc.),
Mention may be made of groups known as substituents at the 3-position of Cephasporin, such as substituted methyl. Here, as substituents for substituted methyl, in addition to pyridinium, substituted pyridinium, etc., the above-mentioned halogen, hydroxy, 1-
Preferred are 5c alkoxy, 1-5C acyloxy, 1-5C alkylthio, 1-5C haloalkylthio, 1-5C cyanoalkylthio, heterocyclic thio, and the like. Hydroxy, halogen, dimethylamino, carboxy, carbamoyl, and the like are useful as the substituent that binds to the substituted alkyl.
前記のセファロスポリン化学における3位置換基R、I
の具体例としては水素、ハロゲン(弗素、塩素、臭素な
ど)、ヒドロキシ、アルコキシ(メトキシ、エトキシ、
プロピオニルオキシなど)、アルキルチオ(フルオロエ
チルチオ、トリフルオロエチルチオなど)、アルケニル
チオ(ビニルチオなど)、アシルオキシ(アセチルオキ
シ、プロピオニルオキシ、ベンゾイルオキシ、メタンス
ルホニルオキシなど)、アルキル(メチル、エチルなど
)、アルケニル(ビニル、シアノビニル、カルボキシビ
ニル、保護カルボキシビニル、トリフルオロビニルなど
)、アルキニル(エチニル、プロパルギルなど)、異項
環チオ(トリアゾリルチオ、メチルトリアゾリルチオ、
チアジアゾリルチオ、メチルチアジアゾリルチオ、テト
ラゾリルチオ、メヂルテトラゾリルヂオなど)、ハロメ
チル(フルオロメチル、りaロメチルなど)、とドaキ
シメヂル、アシルオキシメチル(アセトキシメチル、プ
ロピオニルオキシメチル、カルバモイルオキシメチル、
メチルカルバモイルオキシメチル、エチルヵルバモイル
オキシメチルなど)、アルコキシメチル(メトキシメチ
ル、イソプロポキシメチル、プロペニルチオメチル、フ
ルオロエトキシメチルなど)、アルキルチオメチル(メ
チルチオエチル、シアノメチルチオメチル、ジフルオロ
メチルチオメチルなど)、アルケニルチオメチル(ビニ
ルチオメチル、プロペニルチオメチルなど)、異項環チ
オメチル(トリアゾリルチオメチル、チアジアゾリルチ
オメチル、メチルテトラゾリルチオメチル、アミノチア
ジアゾリルチオメチル、保護アミノチアジアゾリルチオ
メチル、アミノメチルチアジアゾリルチオメチル、トリ
アゾリルチオメチル、メチルトリアゾリルチオメチル、
テトラゾリルチオメチル、メチルテトラゾリルチオメチ
ル、プロペニルテトラゾリルチオメチル、シアノエチル
テトラゾリルチオメチル、アミノエチルテトラゾリルチ
オメチル、スルホアミノエチルテトラゾリルチオメチル
、ジメチルアミノエチルメチルテトラゾリルチオメチル
、アミジノアミノエチルテトラゾリルチオメチル、ウレ
イドメチルテトラゾリルチオメチル、カルボキシメチル
テトラゾリルチオメチル、カルバモイルメチルテトラゾ
リルチオメチル、カルバモイルエチルテトラゾリルチオ
メチル、メチルカルバモイルメチルテトラゾリルチオメ
チル、ヒドロキシカルバモイルメチルテトラゾリルチオ
メチル、カルバモイルメチルカルバモイルメチルテトラ
ゾリルチオメチル、メトキシカルバモイルメチルテトラ
ゾリルチオメチル、ウレイド力ルポニルメヂルテトラゾ
リルチオメチル、ヒドロキシエチルウレイドメチルテト
ラゾリルチオメチル、スルホメチルテトラゾリルチオメ
チル1.ヒドロキシエチルテトラゾリルチオメチル、ク
ロロアセトキシエチルテトラゾリルチオメチル、テトラ
ヒドロピラニルオキシエチルテトラゾリルチオメチル、
ジヒドロキシプロピルテトラゾリルチオメチル、メトキ
シエチルテトラゾリルチオメチル、ヒドロキシピリジル
カルバモイルメチルテトラゾリルチオメチル、アミノヒ
ドロキシチアゾリルテトラゾリルチオメチル、保護カル
ボキシメチルテトラゾリルチオメチル、保護スルホメチ
ルテトラゾリルチオメチル、保護ヒドロキシエチルテト
ラゾリルチオメチル、インドリルチオメチル、トリアジ
ニルチオメチル、ヒドロキシオキソジヒドロトリアジニ
ルチオメチルなど)、異項環メチル(テトラゾリルメチ
ル、メチルテトラゾリルメチルなど)、ピリジニオメチ
ル(ピリジニオメチル、カルバモイルピリジニオメチル
、シクロペンタノピリジニオメチル、シクロヘキサノピ
リジニオメチル、メチルピリジニオメチル、ジエチルピ
リジニオメチルなど)、ハロアルキルチオメチル(フル
オロエチルチオメチル、トリフルオロエチルチオメチル
など)、シアノアルキルチオメチル(シアノメチルチオ
メチル、シアノエチルチオメチルなど)などを列挙でき
る。The 3-position substituent R, I in the above cephalosporin chemistry
Specific examples include hydrogen, halogen (fluorine, chlorine, bromine, etc.), hydroxy, alkoxy (methoxy, ethoxy,
propionyloxy, etc.), alkylthio (fluoroethylthio, trifluoroethylthio, etc.), alkenylthio (vinylthio, etc.), acyloxy (acetyloxy, propionyloxy, benzoyloxy, methanesulfonyloxy, etc.), alkyl (methyl, ethyl, etc.), Alkenyl (vinyl, cyanovinyl, carboxyvinyl, protected carboxyvinyl, trifluorovinyl, etc.), alkynyl (ethynyl, propargyl, etc.), heterocyclic thio (triazolylthio, methyltriazolylthio,
thiadiazolylthio, methylthiadiazolylthio, tetrazolylthio, medyltetrazolyldio, etc.), halomethyl (fluoromethyl, rialomethyl, etc.), and acyloxymethyl (acetoxymethyl, propionyloxymethyl, carbamoyl) oxymethyl,
methylcarbamoyloxymethyl, ethylcarbamoyloxymethyl, etc.), alkoxymethyl (methoxymethyl, isopropoxymethyl, propenylthiomethyl, fluoroethoxymethyl, etc.), alkylthiomethyl (methylthioethyl, cyanomethylthiomethyl, difluoromethylthiomethyl, etc.), Alkenylthiomethyl (vinylthiomethyl, propenylthiomethyl, etc.), heterocyclic thiomethyl (triazolylthiomethyl, thiadiazolylthiomethyl, methyltetrazolylthiomethyl, aminothiadiazolylthiomethyl, protected aminothiadiazolylthiomethyl) , aminomethylthiadiazolylthiomethyl, triazolylthiomethyl, methyltriazolylthiomethyl,
Tetrazolylthiomethyl, methyltetrazolylthiomethyl, propenyltetrazolylthiomethyl, cyanoethyltetrazolylthiomethyl, aminoethyltetrazolylthiomethyl, sulfaminoethyltetrazolylthiomethyl, dimethylaminoethylmethyltetrazolylthiomethyl, amidinoaminoethyl Tetrazolylthiomethyl, ureidomethyltetrazolylthiomethyl, carboxymethyltetrazolylthiomethyl, carbamoylmethyltetrazolylthiomethyl, carbamoylethyltetrazolylthiomethyl, methylcarbamoylmethyltetrazolylthiomethyl, hydroxycarbamoylmethyltetrazolylthiomethyl, carbamoyl Methylcarbamoylmethyltetrazolylthiomethyl, methoxycarbamoylmethyltetrazolylthiomethyl, ureidomethyltetrazolylthiomethyl, hydroxyethylureidomethyltetrazolylthiomethyl, sulfomethyltetrazolylthiomethyl1. Hydroxyethyltetrazolylthiomethyl, chloroacetoxyethyltetrazolylthiomethyl, tetrahydropyranyloxyethyltetrazolylthiomethyl,
Dihydroxypropyltetrazolylthiomethyl, methoxyethyltetrazolylthiomethyl, hydroxypyridylcarbamoylmethyltetrazolylthiomethyl, aminohydroxythiazolyltetrazolylthiomethyl, protected carboxymethyltetrazolylthiomethyl, protected sulfomethyltetrazolylthiomethyl, protected hydroxyethyltetrazolylthiomethyl, indolylthiomethyl, triazinylthiomethyl, hydroxyoxodihydrotriazinylthiomethyl, etc.), heterocyclic methyl (tetrazolylmethyl, methyltetrazolylmethyl, etc.), pyridiniomethyl (pyridiniomethyl, carbamoylpyri diiniomethyl, cyclopentanopyridiniomethyl, cyclohexanopyridiniomethyl, methylpyridiniomethyl, diethylpyridiniomethyl, etc.), haloalkylthiomethyl (fluoroethylthiomethyl, trifluoroethylthiomethyl, etc.), Examples include cyanoalkylthiomethyl (cyanomethylthiomethyl, cyanoethylthiomethyl, etc.).
カルボキシ保護基R2にはペニシリン、セファロスポリ
ンの化学の分野で分子中の他の部分に不都合な変化を起
こすことなく着脱可能のものとして知られている炭素数
1−19のカルボキシ保護基(反応用カルボキシ保護基
および医薬用カルボキシ保護基すなわち医薬用塩形成基
と薬理学的活性エステル形成基など)が含まれる。Carboxy-protecting group R2 is a carboxy-protecting group with 1 to 19 carbon atoms (reactive (eg, pharmaceutical salt-forming groups and pharmacologically active ester-forming groups).
代表例には、たとえば炭素数1〜8のアルキルエステル
(メチル、メトキシメチル、エチル、エトキシメチル、
ヨードエチル、プロピル、イソプロピル、エトキシエチ
ル、メチルチオエチル、メタンスルホニルエチル、ブチ
ル、イソブチル、トリクロロエチル、t−ブチルなどの
エステル)、炭素数2〜8のアルケニルエステル(ビニ
ル、プロペニル、アリル、プレニルエステルなど)、炭
素数7〜19のアラルキルエステル(ベンジル、メチル
ベンジル、ジメチルベンジル、メトキシベンジル、エト
キシベンジル、ニトロベンジル、アミノベンジル、ジフ
ェニルメチル、フェネチル、トリチル、ジ−t−ブチル
ヒドロキシベンジル、フタリジル、フェナシルエステル
など)、炭素数6〜12のアリールエステル(フェニル
、トリル、ジイソプロピルフェニル、キシリル、トリク
ロロフェニル、ペンタクロロフェニル、インダニルエス
テルなど)、炭素数1−12のN−ヒドロキシアミノ化
合物とのエステル(アセトンオキシム、アセトフェノン
オキシム、アセトアルドキシム、N−ヒドロキシこはく
酸イミド、N−ヒドロキシフタルイミドなどとのエステ
ル)、炭素数3〜12のシリルエステル(トリメチルシ
リル、t−ブチルジメチルシリル、ジメチルメトキシシ
リルエステルなど)、炭素数3〜12のスタニルエステ
ル(トリメチルスタニルエステルなど)などを構成する
保護基がある。この保護基部分はさらに各種置換分を有
していてもよい。Typical examples include alkyl esters having 1 to 8 carbon atoms (methyl, methoxymethyl, ethyl, ethoxymethyl,
esters of iodoethyl, propyl, isopropyl, ethoxyethyl, methylthioethyl, methanesulfonyl ethyl, butyl, isobutyl, trichloroethyl, t-butyl, etc.), alkenyl esters having 2 to 8 carbon atoms (vinyl, propenyl, allyl, prenyl esters, etc.) , aralkyl esters having 7 to 19 carbon atoms (benzyl, methylbenzyl, dimethylbenzyl, methoxybenzyl, ethoxybenzyl, nitrobenzyl, aminobenzyl, diphenylmethyl, phenethyl, trityl, di-t-butylhydroxybenzyl, phthalidyl, phenacyl ester) ), aryl esters having 6 to 12 carbon atoms (phenyl, tolyl, diisopropylphenyl, xylyl, trichlorophenyl, pentachlorophenyl, indanyl esters, etc.), esters with N-hydroxyamino compounds having 1 to 12 carbon atoms (acetone oxime , acetophenone oxime, acetaldoxime, N-hydroxysuccinimide, N-hydroxyphthalimide, etc.), silyl esters having 3 to 12 carbon atoms (trimethylsilyl, t-butyldimethylsilyl, dimethylmethoxysilyl ester, etc.), carbon There are protecting groups constituting stannyl esters (such as trimethylstannyl esters) having numbers 3 to 12. This protecting group moiety may further have various substituents.
このカルボキシ保護基は最終目的物までに除去するので
、保護の目的を達するものであれば、その構造は必ずし
も重要な意味はなく、広範囲な均等基(アミド、炭酸ま
たはカルボン酸との酸無水物など)も利用できる。Since this carboxy protecting group is removed before the final target product, its structure is not necessarily important as long as the purpose of protection is achieved, and a wide range of equivalent groups (amide, acid anhydride with carbonic acid or carboxylic acid, etc.) can also be used.
医薬用カルボキシ保護基R2には主に塩形成基と薬理学
的活性エステル形成基が含まれる。The pharmaceutical carboxy protecting group R2 mainly includes salt-forming groups and pharmacologically active ester-forming groups.
塩形成基R”のうち、ペニシリン、セファロスポリンの
分野で常用の、生理学的に受容しうるイオンとなりうる
周期律表第1〜■属、第2〜4周期に属する軽金属原子
(リチウム、ナトリウム、。Among the salt-forming groups R, light metal atoms (lithium, sodium, ,.
カリウム、マグネシウム、カルシウム、アルミニウムな
ど)は医薬用に適する。Potassium, magnesium, calcium, aluminum, etc.) are suitable for medicinal use.
炭素数1〜12のアルキルアミン(トリメチルアミン、
トリエチルアミン、メチルモルホリンなど)塩や炭素数
4〜9の芳香族塩基(ピリジン、コリジン、ピコリン、
キノリン、ジメチルアニリンなど)塩などを構成するペ
ニシリン、セファロスポリン化学で常用の塩形成基R″
は合成用、保存用などに適する。Alkylamine having 1 to 12 carbon atoms (trimethylamine,
triethylamine, methylmorpholine, etc.) and aromatic bases having 4 to 9 carbon atoms (pyridine, collidine, picoline,
A salt-forming group R″ commonly used in penicillin and cephalosporin chemistry that constitutes salts (quinoline, dimethylaniline, etc.)
is suitable for synthesis, preservation, etc.
薬理学的活性エステル形成基Rtは経口または非経口投
与で抗菌作用を示すエステルである。代表例には、いず
れも置換基を有していてもよく、炭素数2〜15の1=
酸素化置換アルキルエステル(直鎖、分枝、環状または
部分環状のアルカノイルオキシアルキルエステル(アセ
トキシメチル、アセトキシエチル、プロピオニルオキシ
メチル、ピバロイルオキシメチル、ピバロイルオキシエ
チル、シクロヘキサンアセトキシエチル、シクロヘキサ
ンカルボニルオキシシクロヘキシルメチルエステルなど
)、炭素数3〜15のアルコキシカルボニルオキシアル
キルエステル(エトキシカルボニルオキシエチル、イソ
プロポキシカルボニルオキシエチル、イソプロポキシカ
ルボニルオキシプロビル、t−ブトキシカルボニルオキ
シエチル、イソペンチルオキシカルボニルオキシプロピ
ル、シクロへキシルオキシカルボニルオキシエチル、シ
クロへキシルメトキシカルボニルオキシエチル、ボルニ
ルオキシカルボニルオキシイソプロビルエステルなど)
、炭素数2〜8のアルコキシアルキルエステル(メトキ
シメチルエステルなど)、炭素数4〜8の2−オキサシ
クロアルキルエステル(テトラヒドロピラニル、テトラ
ヒドロフラニルエステルなど)など)、炭素数8〜12
の置換アラルキルエステル(フェナシル、フタリジルエ
ステルなど)、炭素数6〜12のアリールエステル(フ
ェニル、キシリル、インダニルエステルなど)、炭素数
2〜12のアルケニルエステル(アリル、4−メチル−
2−オキソ−1,3−ジオキソリルメチルエステルなど
)などを構成する基がある。The pharmacologically active ester-forming group Rt is an ester that exhibits antibacterial activity upon oral or parenteral administration. Representative examples include 1= having 2 to 15 carbon atoms, each of which may have a substituent;
Oxygenated substituted alkyl esters (linear, branched, cyclic or partially cyclic alkanoyloxyalkyl esters (acetoxymethyl, acetoxyethyl, propionyloxymethyl, pivaloyloxymethyl, pivaloyloxyethyl, cyclohexaneacetoxyethyl, cyclohexanecarbonyl) oxycyclohexylmethyl ester, etc.), alkoxycarbonyloxyalkyl esters having 3 to 15 carbon atoms (ethoxycarbonyloxyethyl, isopropoxycarbonyloxyethyl, isopropoxycarbonyloxypropyl, t-butoxycarbonyloxyethyl, isopentyloxycarbonyloxypropyl) , cyclohexyloxycarbonyloxyethyl, cyclohexylmethoxycarbonyloxyethyl, bornyloxycarbonyloxyisopropyl ester, etc.)
, alkoxyalkyl esters having 2 to 8 carbon atoms (methoxymethyl ester, etc.), 2-oxacycloalkyl esters having 4 to 8 carbon atoms (tetrahydropyranyl, tetrahydrofuranyl ester, etc.), 8 to 12 carbon atoms
substituted aralkyl esters (phenacyl, phthalidyl esters, etc.), aryl esters having 6 to 12 carbon atoms (phenyl, xylyl, indanyl esters, etc.), alkenyl esters having 2 to 12 carbon atoms (allyl, 4-methyl-
2-oxo-1,3-dioxolylmethyl ester, etc.).
前記炭素数は置換基を含めたものとする。The number of carbon atoms includes substituents.
ハロゲンHalとしては、塩素、臭素、ヨウ素の他、ア
ルカンスルホニルオキシ、アリールスルホニルオキシな
どの所謂シュードハロゲンも均等な作用を示す基として
挙げることができる。As the halogen Hal, in addition to chlorine, bromine, and iodine, so-called pseudohalogens such as alkanesulfonyloxy and arylsulfonyloxy can also be mentioned as groups that exhibit equivalent effects.
式(1)で示される化合物は、次の反応式に従って製造
することができる。The compound represented by formula (1) can be produced according to the following reaction formula.
叉吃求
(式中、Ro、R’、R”およびHalは前記の定義に
従う)
本発明方法の出発物質である式(II)の化合物はアミ
ン(■)と4−ハロアセト酢酸の反応性誘導体から、当
業者既知の方法で製造される。例えば、アミン(I)に
、ジケテンとハロゲンから調製されるハロゲン化ハロア
セトアセチル(HalCH=COCHtCO11al)
を、第3級アミン、芳香族アミン(トリエチルアミン、
ジメチルアニリン、ピリジンなど)の存在下、不活性溶
媒(ハロ炭化水素など)中で一506C〜30℃の温度
で作用させればハロアセトアセトアミドセフェム化合物
(II)を得る。生成物は通常、溶媒抽出、洗浄、乾燥
、結晶化などにより単離できる。The compound of formula (II), which is the starting material for the process of the invention, is a reactive derivative of an amine (■) and 4-haloacetoacetic acid. For example, a haloacetoacetyl halide prepared from amine (I), diketene and a halogen (HalCH=COCHtCO11al)
, tertiary amine, aromatic amine (triethylamine,
When reacted in the presence of dimethylaniline, pyridine, etc.) in an inert solvent (halohydrocarbon, etc.) at a temperature of -506C to 30C, haloacetoacetamidocephem compound (II) is obtained. The product can typically be isolated by solvent extraction, washing, drying, crystallization, etc.
[縮合反応]
化合物(II)から化合物(1)を製造するには、クネ
ベナゲル(Knoevenagel)縮合反応を利用す
る。[Condensation Reaction] To produce compound (1) from compound (II), a Knoevenagel condensation reaction is used.
即ち、化合物(II)と式R’CHOで示されるアルカ
ナールまたはその反応性誘導体とを縮合触媒の存在下に
通常、不活性溶媒(アルコール、ピリジン、酢酸、ベン
ゼン、トルエン、キシレン、シクロヘキサン、ジオキサ
ン、テトラヒドロフラン、ハロ炭化水素など)中、−5
0℃〜110℃の温度で反応終結まで(例えば、0.5
〜24時間)攪拌すればハロアセチルアルケノイルアミ
ノセフェム化合物(II°)を製造できる。That is, compound (II) and an alkanal represented by the formula R'CHO or a reactive derivative thereof are usually condensed in an inert solvent (alcohol, pyridine, acetic acid, benzene, toluene, xylene, cyclohexane, dioxane, etc.) in the presence of a condensation catalyst. , tetrahydrofuran, halohydrocarbon, etc.), -5
at a temperature of 0°C to 110°C until the end of the reaction (for example, 0.5
24 hours), the haloacetylalkenoylaminocephem compound (II°) can be produced.
ここに縮合触媒としてはアンモニア、第1級アミン(メ
チルアミン、エチルアミン、ブチルアミン、アニリン、
ベンジルアミンなど)、第2級アミン(ジメチルアミン
、ジエチルアミン、ピペリジン、ピペラジン、モルホリ
ンなど)、第3級アミン(トリエチルアミン、トリ(2
−ヒドロキシエチル)アミン、トリトンBなど)、芳香
族アミン(ピリジン、ピコリン、ルチジン、ニコチンな
ど)、弱塩基性陰イオン交換樹脂(アンバーライトIR
−45、IR−4B、デュオライトA−4など)、水酸
化アルカリ金属その他の塩基およびその脂肪族または芳
香族カルボン酸塩(ギ酸、酢酸、フェニル酢酸、安息香
酸など)が用いられる他、酸(硫酸、酢酸、トルエンス
ルホン酸など)、アミノ酸(アラニン、グリシンなど)
、ルイス酸(塩化亜鉛、酢酸銅など)なども原料、生成
物が分解されない限り利用できる場合がある。Here, as a condensation catalyst, ammonia, primary amines (methylamine, ethylamine, butylamine, aniline,
benzylamine, etc.), secondary amines (dimethylamine, diethylamine, piperidine, piperazine, morpholine, etc.), tertiary amines (triethylamine, tri(2)
-hydroxyethyl)amine, Triton B, etc.), aromatic amines (pyridine, picoline, lutidine, nicotine, etc.), weakly basic anion exchange resins (Amberlite IR
-45, IR-4B, Duolite A-4, etc.), alkali metal hydroxides and other bases, and their aliphatic or aromatic carboxylates (formic acid, acetic acid, phenylacetic acid, benzoic acid, etc.), as well as acids (sulfuric acid, acetic acid, toluenesulfonic acid, etc.), amino acids (alanine, glycine, etc.)
, Lewis acids (zinc chloride, copper acetate, etc.) may also be used as long as the raw materials and products are not decomposed.
この反応は脱水剤(モレキュラーシーブなど)、脱水蒸
留、共沸蒸留など脱水条件下に実施するのが好ましい。This reaction is preferably carried out under dehydrating conditions such as using a dehydrating agent (such as a molecular sieve), dehydrating distillation, or azeotropic distillation.
生成する化合物(II゛)は単離し、または単離せずに
次段の反応に付すことができる。The resulting compound (II') can be isolated or subjected to the next reaction without isolation.
[チアゾール閉環反応]
生成する化合物(II゛)を不活性溶媒(エタノール、
アセトンなど)に溶かし、水冷下に攪拌しながらチオウ
レアまたはその反応性誘導体を加えて一1θ〜50℃で
数時間反応さける。反応混合物を溶媒抽出し、抽出液を
洗浄、乾燥した後、シリカゲル等によりクロマト精製し
、適当な溶媒から再結晶すると、所望の化合物(I)が
得られる。[Thiazole ring-closing reaction] The generated compound (II゛) is dissolved in an inert solvent (ethanol,
acetone, etc.), add thiourea or a reactive derivative thereof while stirring under water cooling, and react at -1θ to 50°C for several hours. The reaction mixture is subjected to solvent extraction, and the extract is washed, dried, purified by chromatography using silica gel, etc., and recrystallized from an appropriate solvent to obtain the desired compound (I).
前記各合成法は通常−30〜100℃、とくに−20〜
50℃の温度で10分間〜10時間かけて反応させるこ
とが多い。これらは溶媒中、要すれば無水条件下、実施
する。その他の常法はいずれも適用できる。Each of the above synthesis methods is usually carried out at -30 to 100°C, particularly -20 to 100°C.
The reaction is often carried out at a temperature of 50° C. for 10 minutes to 10 hours. These are carried out in a solvent, if necessary under anhydrous conditions. Any other conventional law may be applied.
反応溶媒としては、炭化水素(ペンタン、ヘキサン、オ
クタン、ベンゼン、トルエン、キンレンナト)、ハロゲ
ン化炭化水素(ジクロロメタン、クロロホルム、四塩化
炭素、ジクロロエタン、トリクロロエタン、クロロベン
ゼンなど)、エーテル(ジエチルエーテル、メチルイソ
ブチルエーテル、ジオキサン、テトラヒドロフランなど
)、ケトン(アセトン、メチルエチルケトン、シクロヘ
キサノンなど)、エステル(酢酸エチル、酢酸イソブチ
ル、安息香酸メチルなど)、ニトロ炭化水素にトロメタ
ン、ニトロベンゼンなど)、ニトリル(アセトニトリル
、ベンゾニトリルなど)、アミド(ホルムアミド、アセ
トアミド、ジメチルホルムアミド、ジメチルアセトアミ
ド、ヘキサメチルホスホロトリアミドなど)、スルホキ
シド(ジメチルスルホキシドなど)、カルボン酸(ギ酸
、酢酸、プロピオン酸など)、有機塩基(ジエチルアミ
ン、トリエチルアミン、ピリジン、ピコリン、コリジン
、キノリンなど)、アルコール(メタノール、エタノー
ル、プロパツール、ヘキサノール、オクタツール、ベン
ジルアルコールなど)、水、その他の系列に属する工業
用溶媒またはその混合物を例示できる。Reaction solvents include hydrocarbons (pentane, hexane, octane, benzene, toluene, quinlenate), halogenated hydrocarbons (dichloromethane, chloroform, carbon tetrachloride, dichloroethane, trichloroethane, chlorobenzene, etc.), ethers (diethyl ether, methyl isobutyl ether, etc.). , dioxane, tetrahydrofuran, etc.), ketones (acetone, methyl ethyl ketone, cyclohexanone, etc.), esters (ethyl acetate, isobutyl acetate, methyl benzoate, etc.), nitrohydrocarbons (tromethane, nitrobenzene, etc.), nitriles (acetonitrile, benzonitrile, etc.), Amides (formamide, acetamide, dimethylformamide, dimethylacetamide, hexamethylphosphorotriamide, etc.), sulfoxides (dimethylsulfoxide, etc.), carboxylic acids (formic acid, acetic acid, propionic acid, etc.), organic bases (diethylamine, triethylamine, pyridine, picoline, Examples include industrial solvents belonging to other series such as collidine, quinoline, etc.), alcohols (methanol, ethanol, propatool, hexanol, octatool, benzyl alcohol, etc.), water, and mixtures thereof.
目的とする生成物は反応液からきょう雑物(未反応原料
、副生成物、溶媒など)を常法(抽出、蒸発、洗浄、濃
縮、沈殿、濾過、乾燥など)により除去したのち、常用
の後処理法(吸着、溶離、蒸留、沈殿、析出、クロマト
グラフィーなど)によって処理すれば単離できる。The desired product is obtained by removing impurities (unreacted raw materials, by-products, solvents, etc.) from the reaction solution using conventional methods (extraction, evaporation, washing, concentration, precipitation, filtration, drying, etc.). It can be isolated by post-treatment (adsorption, elution, distillation, precipitation, precipitation, chromatography, etc.).
本発明の製造法は、アミン(IV)またはその反応性誘
導体に、対応するカルボン酸またはその反応性誘導体を
反応させることからなる従来法とは異なる新規な方法で
ある。本発明方法で得られる化合物(I)は、従来法に
より得られた化合物と同様に、種々の医薬製剤の調製に
そのまま用いることができる。The production method of the present invention is a novel method different from conventional methods, which consists of reacting the amine (IV) or its reactive derivative with the corresponding carboxylic acid or its reactive derivative. Compound (I) obtained by the method of the present invention can be used as it is in the preparation of various pharmaceutical preparations in the same way as compounds obtained by conventional methods.
化合物(I)は好気性および嫌気性の細菌に強い抗菌性
を示し、特に、ダラム陽性菌、陰性菌に対する抗菌力に
優れ、経口投与時の吸収性、排泄および分布に特徴を有
する。ヒトの感染症の予防および治療には、常法により
製剤化して通常、日用量0.1〜6g(注射)、0.5
〜5g(内服)、0.01〜100iy(外用・坐剤な
ど)を投与する。製剤化には各種添加剤、他種抗菌剤な
どを用いうる。Compound (I) exhibits strong antibacterial activity against aerobic and anaerobic bacteria, particularly against Durham-positive and -negative bacteria, and is characterized by its absorption, excretion, and distribution upon oral administration. For the prevention and treatment of human infectious diseases, the daily dose is usually 0.1 to 6 g (injection), 0.5 g, formulated by conventional methods.
Administer ~5g (orally), 0.01~100iy (externally, suppositories, etc.). Various additives, other types of antibacterial agents, etc. can be used for formulation.
また、他種抗菌剤の合成原料や細菌感受性試験用材とし
ても利用できる。It can also be used as a raw material for the synthesis of other antibacterial agents and as a material for bacterial susceptibility testing.
以下に実施例を挙げ、本発明をさらに詳しく説明する。The present invention will be explained in more detail with reference to Examples below.
尚、実施例中の反応式において、反応によって構造上変
化を受けないセフェム環は、一部省略して示されている
。In the reaction formulas in Examples, some cephem rings that undergo no structural changes due to the reaction are omitted.
実施例で用いた略語は次の意味を有する。Abbreviations used in the examples have the following meanings.
br=広幅
E t4N = トリエチルアミン
ph=フェニル
Ac0H=酢酸
EtCHO=プロピオンアルデヒド
EtOAc=酢酸エチル
EtOH−エタノール
POM−ピバロイルオキシメチル基
実施例1
1、ジケテン(2,46u(2,31mmol)の塩化
メチレン(121ff)溶液にBrt(1,53RI2
,29.8mmol)の塩化メチレン(6ffR)溶液
を一30℃にて10分間で滴下し、−30℃でさらに1
時間半攪拌して化合物(3)を調製する。NH1体(l
X4.649゜12mFlol)の塩化メチレン(60
mの溶液に、−50℃にてEbN(1,68m(、12
mmol)、次いで、先に調製した(3)の塩化メチレ
ン溶液を一度に加える。−40℃にて20分間攪拌した
後、水でりエンチし、EtOAcで抽出し、水洗後、5
%NaHCO3で洗浄し、水洗してNatSO4で乾燥
する。br = wide E t4N = triethylamine ph = phenyl Ac0H = acetic acid EtCHO = propionaldehyde EtOAc = ethyl acetate EtOH - ethanol POM - pivaloyloxymethyl group Example 1 1. Diketene (2,46 u (2,31 mmol) of methylene chloride (121ff) solution with Brt(1,53RI2
, 29.8 mmol) in methylene chloride (6ffR) was added dropwise at -30°C for 10 minutes, and then further heated at -30°C for 10 minutes.
Compound (3) is prepared by stirring for half an hour. NH1 body (l
methylene chloride (60
EbN (1,68 m(, 12
mmol), then add the previously prepared methylene chloride solution of (3) all at once. After stirring at -40°C for 20 minutes, it was quenched with water, extracted with EtOAc, and washed with water.
% NaHCO3, water and drying with NatSO4.
濃縮後、残渣をシリカゲルによりクロマト処理し、溶出
物を塩化メチレンから再結晶すると、(2)(2,59
9,40%)が白色の細かい結晶として得られる。mp
= 105〜I O9℃。After concentration, the residue was chromatographed on silica gel and the eluate was recrystallized from methylene chloride to give (2) (2,59
9.40%) are obtained as fine white crystals. mp
= 105~IO9℃.
NMR(CDC13−DMSO)δ、90MHz(CD
Clff−DMSO溶液中ではケト/エノール#2/1
混合物):1.20(s、9H)、3.49,3.61
(AI3q、 2 H,J = 18 Hz)、3.6
6(s、4/3H)、3.90(s、2/3H)、4.
24(s、4/3H)、4.7 3,4.9 3(AB
Q、2H,’J= 1 3Hz)、 5 。NMR (CDC13-DMSO) δ, 90MHz (CD
Clff-keto/enol #2/1 in DMSO solution
mixture): 1.20 (s, 9H), 3.49, 3.61
(AI3q, 2 H, J = 18 Hz), 3.6
6 (s, 4/3H), 3.90 (s, 2/3H), 4.
24 (s, 4/3H), 4.7 3, 4.9 3 (AB
Q, 2H,'J= 1 3Hz), 5.
06(d、IH,J=5Hz)、5.46(s、1/3
H)、5.69(dd、IH,J=5.8Hz)、5.
80,5.90(ABq、2H,J=5Hz)、6.2
5(brs、2H)、9.04(d、1/3H,J=8
H2)、9.10(d、2/3 H,J = 8 Hz
)。06 (d, IH, J=5Hz), 5.46 (s, 1/3
H), 5.69 (dd, IH, J=5.8Hz), 5.
80, 5.90 (ABq, 2H, J=5Hz), 6.2
5 (brs, 2H), 9.04 (d, 1/3H, J=8
H2), 9.10 (d, 2/3 H, J = 8 Hz
).
IR(ヌジョール)cm−’:3440,3290,1
765.1730,1695,1645゜2、化合物(
2X220x9,0.4mmol)のCH。IR (nujol) cm-': 3440, 3290, 1
765.1730,1695,1645°2, compound (
2 x 220 x 9, 0.4 mmol) of CH.
Cl2(6a+f2)懸濁液にEtCHO(115μQ
、1.6mmol)、Ac0H(19uQ、、0.33
mmol)、ピペリジン(16μL0.16mmol)
、次いで4Aモレキユラーシーブ(適当量)を加え、室
温で1時間15分攪拌する。数分で反応懸濁液は均一溶
液になる。EtCHO (115 μQ) was added to the Cl2 (6a+f2) suspension.
, 1.6 mmol), AcOH (19 uQ, , 0.33
mmol), piperidine (16 μL 0.16 mmol)
Then, add 4A molecular sieve (appropriate amount) and stir at room temperature for 1 hour and 15 minutes. The reaction suspension becomes a homogeneous solution within a few minutes.
水を加えて反応をクエンチし、デカンテーションしてモ
レキュラーシーブを除いた後、EtOACで抽出し、水
洗してNa、So4で乾燥する。溶媒留去後、残渣(2
35jIg)をEtOH4xQに溶かし、水冷下、チオ
ウレア(24λ9.0 、32 mmol)を加え3時
間攪拌する。反応液に水、EtOAc次いで5%NaH
CC)+を加える。EtOAc抽出分を水洗(3回)し
、Na、So、で乾燥した後、シリカゲルでクロマト処
理し、(5)を淡黄色の粉末として得ろ(87j!2、
(2)からの総収率38%)。The reaction is quenched by adding water, decanted to remove the molecular sieve, extracted with EtOAC, washed with water and dried over Na, So4. After evaporation of the solvent, the residue (2
35jIg) was dissolved in EtOH4xQ, and while cooling with water, thiourea (24λ9.0, 32 mmol) was added and stirred for 3 hours. Water, EtOAc and 5% NaH were added to the reaction solution.
Add CC)+. The EtOAc extract was washed with water (3 times), dried over Na, So, and then chromatographed on silica gel to obtain (5) as a pale yellow powder (87j!2,
(2) total yield of 38%).
実施例2
1、ジケテン(1,l 7rp、Q、 15mmol)
の塩化メチレン(6′IIQ)溶液にC1tの四塩化炭
素溶液(2,1611+mol/ mO,、6、7m(
1,14、5mmol)を−30℃にて4分間で滴下す
る。同温度にてさらに1時間半攪拌する。N H、体(
1)の塩酸塩(2、549,6mmol)の塩化メチレ
ン(30m0.)懸濁液に一30℃にてEhN(1,8
4xf2.13.2mmol)を加え、数分間攪拌し、
懸濁液が溶液になった時点で、先に調製した(7)の塩
化メチレン溶液を一度に加える。−30℃で1時間攪拌
した後、水でクエンチし、EtOAcで抽出した後、N
aCl HtO15%NaHCO3、NaC1−Ht
Oで洗浄し、NatSO,で乾燥する。残渣をクロマト
処理し、溶出物をEt’0ACCHzCItから再結晶
すると、(6Xl 、789.59%)が白色の細かい
結晶として得られる。Example 2 1, diketene (1,l 7rp, Q, 15mmol)
A solution of C1t in carbon tetrachloride (2,1611+mol/mO, 6,7m(
1, 14, 5 mmol) was added dropwise over 4 minutes at -30°C. Stir for an additional hour and a half at the same temperature. N H, body (
EhN (1,8
4xf2.13.2 mmol), stirred for several minutes,
When the suspension becomes a solution, add the previously prepared methylene chloride solution (7) all at once. After stirring at −30°C for 1 h, quenching with water and extraction with EtOAc followed by N
aCl HtO15%NaHCO3, NaCl-Ht
Wash with O and dry with NatSO. Chromatography of the residue and recrystallization of the eluate from Et'0ACCHzCIt gives (6Xl, 789.59%) as fine white crystals.
mp=98〜105℃。mp=98-105°C.
NMR(CDC1,−DMSO)δ、90MHz(DM
SO−CDC1,溶液中ではケト/エノール#2/l混
合物):1.22(s、9H)、3.47,3.59(
ABq、2H,J=I 9Hz)、3.63Gs、4/
3H)、4.0Q(s、2/3H)、4.34(s、4
/3H)、4.80,5.00(ABq、2H,J=1
4Hz)、5゜01(d、IH,J=5Hz)、5,4
7(s、1/3H。NMR (CDC1, -DMSO) δ, 90 MHz (DM
SO-CDC1, keto/enol #2/l mixture in solution): 1.22 (s, 9H), 3.47, 3.59 (
ABq, 2H, J=I 9Hz), 3.63Gs, 4/
3H), 4.0Q (s, 2/3H), 4.34 (s, 4
/3H), 4.80, 5.00 (ABq, 2H, J=1
4Hz), 5°01 (d, IH, J=5Hz), 5,4
7 (s, 1/3H.
H,+ラクタム)、5,83,5.91(ABQ、2H
。H, +lactam), 5,83,5.91 (ABQ, 2H
.
J=5Hz)、8.76(d、1/3H,J=81−1
z)、8.99(d、2/3H,J=8I−Iz)。J=5Hz), 8.76(d, 1/3H, J=81-1
z), 8.99 (d, 2/3H, J=8I-Iz).
IR(ヌジョール)cR−重:3450,3300,1
770.1740,1700,1655゜2、化合物(
60202mg、 0 、4 mmol)のCH。IR (Nujol) cR-heavy: 3450, 3300, 1
770.1740,1700,1655°2, compound (
60202 mg, 0,4 mmol) of CH.
C1t(6tg)懸濁液にEtCHO(114μ(1,
1,6mmol)、Ac0H(7μL0.12mmol
)、ピペリジン(8μC,0,08mmol)、次いで
4Aモレキュラー−シーブ(適当量)を加え、室温で1
時間半攪拌する。EtCHO (114 μ(1,
1.6 mmol), AcOH (7 μL 0.12 mmol
), piperidine (8 μC, 0.08 mmol) and then 4A molecular sieves (appropriate amount) were added and
Stir for half an hour.
数分で反応懸濁液は均一溶液になる。水を加え゛C反応
液をクエンチし、デカンテーションによりモレキュラー
シーブを除いた後、EtOAcで抽出し、水洗し、N
av S 04で乾燥する。溶媒留去後の残渣237R
gの内212mgをアセトン(4靜)に溶かし、Nal
(53m9,0.35mmol)を加え、室温で1時
間25分攪拌する。反応液を0℃に冷却し、チオウレア
(24mg、 0 、32 mmol)を加え、1時間
25分攪拌する。反応液に水、EtOAc、次いで5%
N a HCOsを加える。EtOAc抽出分を抽出口
、Na、So、で乾燥する。シリカゲルでクロマト処理
し、淡黄色の粉末として(5)を得る(63R9、(6
)からの総収率32%)。The reaction suspension becomes a homogeneous solution within a few minutes. The reaction solution was quenched by adding water, the molecular sieve was removed by decantation, and then extracted with EtOAc, washed with water, and N
Dry with av S 04. Residue 237R after solvent distillation
Dissolve 212mg of the
(53m9, 0.35mmol) was added and stirred at room temperature for 1 hour and 25 minutes. The reaction solution was cooled to 0°C, thiourea (24 mg, 0, 32 mmol) was added, and the mixture was stirred for 1 hour and 25 minutes. Water, EtOAc, and then 5%
Add NaHCOs. Dry the EtOAc extract with Na, So. Chromatography on silica gel gives (5) as a pale yellow powder (63R9, (6
) with a total yield of 32%).
実施例3
!、ジケテン(1、17xQ、 15mmol)の塩化
メチレン(6RQ)溶液にC1tの四塩化炭素溶液(2
,1611111101’/112.6 、7 畦、
14 、5 mmol)を−30℃にて3分間で滴下す
る。同温度にてさらに50分間攪拌する。NH,体(8
02、209,6mmol)の塩化メチレン(30xe
)懸濁液にEhN(1,0x12.7.2mmof)、
次いで先に調製した(7)の塩化メチレン溶液を一30
℃にて一度に加える。1時間攪拌した後、水でクエンチ
し、EtOAcで抽出した後、Nacl HxO15
%N aHCO3およびNaCl HzOで洗浄する
。NatSO,で乾燥し、濃縮した後、残渣をシリカゲ
ルでクロマト処理する。溶出物をCH,C12−ヘキサ
ンから再結晶すると(9X1゜459.50%)が白色
の細かい結晶として得られる。mp=144〜146℃
。Example 3! , a solution of C1t in carbon tetrachloride (2
,1611111101'/112.6 ,7 ridge,
14.5 mmol) was added dropwise over 3 minutes at -30°C. Stir for an additional 50 minutes at the same temperature. NH, body (8
02,209,6 mmol) of methylene chloride (30xe
) EhN (1,0x12.7.2 mmof) in suspension,
Next, add the methylene chloride solution of (7) prepared earlier to 30%
Add all at once at ℃. After stirring for 1 h, quenching with water and extracting with EtOAc, NaCl HxO15
Wash with %NaHCO3 and NaCl HzO. After drying over NatSO and concentration, the residue is chromatographed on silica gel. Recrystallization of the eluate from CH,C12-hexane gives (9X1°459.50%) as fine white crystals. mp=144~146℃
.
NMR(CD CI3)δ、90MH2(CDC1,溶
液中では、ケト/エノール=5/2の混合物):3.1
3〜3.63(ABXのAB、2H,JAB=19Hz
)、3.58(s、10/7H,CHzCONH(ケト
))、3.94 (s、4/7H,CICH,(エノー
ル))、4.17(s、I O/7H,CICH*(ケ
ト))、4.88(d、1f−1,J=5Hz)、5.
29(s、2/7H。NMR (CD CI3) δ, 90MH2 (CDC1, mixture of keto/enol = 5/2 in solution): 3.1
3 to 3.63 (ABX AB, 2H, JAB = 19Hz
), 3.58 (s, 10/7H, CHzCONH (keto)), 3.94 (s, 4/7H, CICH, (enol)), 4.17 (s, I O/7H, CICH * (keto) )), 4.88 (d, 1f-1, J=5Hz), 5.
29(s, 2/7H.
/7H,J=5,9H2)、5.91(dd、2/71
−1.J=5.9Hz)、6.53〜6.63(ABX
のX、IH)、6.95(s、IH)、7.2〜7.5
011.I OH)。/7H, J=5,9H2), 5.91(dd, 2/71
-1. J=5.9Hz), 6.53~6.63(ABX
X, IH), 6.95 (s, IH), 7.2-7.5
011. IOH).
I R(CHCl、)Cx−’:3410,3320.
1785.1725,1685,1640゜2、化合物
(9)(194m9,0.4mmol)のCH。IR(CHCl,)Cx-':3410,3320.
1785.1725,1685,1640°2, CH of compound (9) (194m9, 0.4mmol).
cly(2xQ)溶液にEtCHO(114μQ、 1
.6mm。EtCHO (114 μQ, 1
.. 6mm.
l)、Ac0H(7μC,0,12mmol)、ピペリ
ジン(8μg、0.08Illfllol)、次いで4
Aモレキユラーシーブ(適当量)を水冷下で加える。室
温で55分攪拌した後、水を加えて反応をクエンチし、
デカンテーションにて、モレキュラーシーブヲ除いた後
、EtOAcで抽出し、水洗後、5%NaHCO,およ
びNaCl HzOで洗浄し、Na、So、で乾燥す
る。l), AcOH (7 μC, 0.12 mmol), piperidine (8 μg, 0.08 Illflol), then 4
Add A molecular sieve (appropriate amount) under water cooling. After stirring at room temperature for 55 minutes, the reaction was quenched by adding water,
After removing the molecular sieve by decantation, it is extracted with EtOAc, washed with water, washed with 5% NaHCO, and NaCl HzO, and dried with Na, So.
溶媒留去後の残渣250xgをアセトン2m(に溶かし
、NaI (60319,0,411111101)を
加え、室温で1時間10分攪拌する。反応液を0℃に冷
却し、チオウレア(27D、 0 、36 mmol)
を加え、1時間30分攪拌する。反応液に水、EtOA
c次いで5%N a HCOsを加える。EtOAc抽
出分を抽出口3回)し、N at S O4で乾燥する
。シリカゲルでクロマト処理すると淡黄色の粉末として
(10)が得られる(54x9、(2)からの総収率2
5%)。250 x g of the residue after solvent distillation was dissolved in 2 m of acetone, NaI (60319,0,411111101) was added and stirred at room temperature for 1 hour and 10 minutes.The reaction solution was cooled to 0 °C, and thiourea (27D, 0, 36 mmol)
and stirred for 1 hour and 30 minutes. Water, EtOA in the reaction solution
c Then add 5% Na HCOs. The EtOAc extract was extracted 3 times) and dried over N at SO 4 . Chromatography on silica gel gives (10) as a pale yellow powder (54x9, total yield from (2) 2
5%).
NMR(CDCIs)δ、90MHz:1.05(t、
3H,J=8Hz)2.39(五重線、2H,J=8H
z)、3、じ〜3.72(ABXのAB、2H,JAB
=19H2)、4.99(d、IH,J=5Hz)、5
.38(brs、2H)、6.00(dd、I)(、J
=5.81(z)、6゜30(s、IH)、 6.4
2(t、IH,J=8H2)、 6゜58〜6.68(
ABXのX、IH)、6.96(s、IH)、7.2〜
7.6(m、10H)、8.16(d、IH。NMR (CDCIs) δ, 90MHz: 1.05 (t,
3H, J=8Hz) 2.39 (quintet, 2H, J=8H
z), 3, J~3.72 (ABX AB, 2H, JAB
= 19H2), 4.99 (d, IH, J = 5Hz), 5
.. 38 (brs, 2H), 6.00 (dd, I) (, J
=5.81(z), 6°30(s, IH), 6.4
2(t, IH, J=8H2), 6°58~6.68(
ABX's X, IH), 6.96 (s, IH), 7.2~
7.6 (m, 10H), 8.16 (d, IH.
J = 8 Hz)。J = 8 Hz).
Claims (1)
における3位置換基、R^2は水素原子またはカルボキ
シ保護基、Halはハロゲン原子を表わす)で示される
7β−ハロアセトアミド−3−セフェム−4−カルボン
酸を、式(III): R^0CHO(III) (式中、R^0はアルキル基を表わす) で示されるアルカナールおよびチオ尿素と反応させるこ
とを特徴とする式(1): ▲数式、化学式、表等があります▼( I ) (式中、R^0、R^1およびR^2は前記の定義に従
う)で示される7β−アミノチアゾリルアルケノイルア
ミノ−3−セフェム−4−カルボン酸化合物の製造方法
。[Claims] 1. Formula (II): ▲Mathematical formulas, chemical formulas, tables, etc.▼(II) (In the formula, R^1 is a hydrogen atom or a 3-position substituent in cephalosporin chemistry, R^2 7β-haloacetamido-3-cephem-4-carboxylic acid represented by the formula (III): R^0CHO(III) (wherein R^ 0 represents an alkyl group) Formula (1) characterized by reaction with alkanal and thiourea: ▲There are numerical formulas, chemical formulas, tables, etc.▼(I) A method for producing a 7β-aminothiazolylalkenoylamino-3-cephem-4-carboxylic acid compound shown in
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62113155A JPH082909B2 (en) | 1987-05-08 | 1987-05-08 | Process for producing 7β-aminothiazolyl alkenoylamino-3-cephem-4-carboxylic acid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62113155A JPH082909B2 (en) | 1987-05-08 | 1987-05-08 | Process for producing 7β-aminothiazolyl alkenoylamino-3-cephem-4-carboxylic acid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63277684A true JPS63277684A (en) | 1988-11-15 |
JPH082909B2 JPH082909B2 (en) | 1996-01-17 |
Family
ID=14604958
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62113155A Expired - Fee Related JPH082909B2 (en) | 1987-05-08 | 1987-05-08 | Process for producing 7β-aminothiazolyl alkenoylamino-3-cephem-4-carboxylic acid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH082909B2 (en) |
-
1987
- 1987-05-08 JP JP62113155A patent/JPH082909B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPH082909B2 (en) | 1996-01-17 |
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