JPS63270739A - Production of graft copolymer - Google Patents
Production of graft copolymerInfo
- Publication number
- JPS63270739A JPS63270739A JP8754588A JP8754588A JPS63270739A JP S63270739 A JPS63270739 A JP S63270739A JP 8754588 A JP8754588 A JP 8754588A JP 8754588 A JP8754588 A JP 8754588A JP S63270739 A JPS63270739 A JP S63270739A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- group
- copolymer
- reaction
- graft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000578 graft copolymer Polymers 0.000 title claims abstract description 32
- 238000004519 manufacturing process Methods 0.000 title claims description 18
- 239000003513 alkali Substances 0.000 claims abstract description 16
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229920006163 vinyl copolymer Polymers 0.000 claims abstract description 16
- -1 ether sulfone Chemical class 0.000 claims abstract description 15
- 125000000524 functional group Chemical group 0.000 claims abstract description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 8
- 239000002253 acid Substances 0.000 claims abstract description 5
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims abstract description 5
- 125000004970 halomethyl group Chemical group 0.000 claims abstract description 4
- 239000003495 polar organic solvent Substances 0.000 claims abstract description 4
- 229920000412 polyarylene Polymers 0.000 claims abstract description 4
- 125000002128 sulfonyl halide group Chemical group 0.000 claims abstract description 4
- 229920000642 polymer Polymers 0.000 claims description 39
- 229920002554 vinyl polymer Polymers 0.000 claims description 26
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 22
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 125000004018 acid anhydride group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 abstract description 54
- 229920001577 copolymer Polymers 0.000 abstract description 31
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 abstract description 16
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 abstract description 11
- 229930185605 Bisphenol Natural products 0.000 abstract description 9
- ISWSIDIOOBJBQZ-UHFFFAOYSA-M phenolate Chemical compound [O-]C1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-M 0.000 abstract description 6
- 229940031826 phenolate Drugs 0.000 abstract description 6
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 abstract description 4
- 150000004820 halides Chemical class 0.000 abstract description 3
- 150000001875 compounds Chemical class 0.000 abstract description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 46
- 239000000203 mixture Substances 0.000 description 31
- 238000006243 chemical reaction Methods 0.000 description 30
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 29
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 28
- 238000000034 method Methods 0.000 description 24
- 238000006116 polymerization reaction Methods 0.000 description 21
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 13
- 239000002904 solvent Substances 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 239000000178 monomer Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 8
- 239000011541 reaction mixture Substances 0.000 description 8
- 238000002156 mixing Methods 0.000 description 7
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 6
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 239000003708 ampul Substances 0.000 description 4
- 238000007334 copolymerization reaction Methods 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 4
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 4
- NCTHNHPAQAVBEB-WGCWOXMQSA-M sodium ferulate Chemical compound [Na+].COC1=CC(\C=C\C([O-])=O)=CC=C1O NCTHNHPAQAVBEB-WGCWOXMQSA-M 0.000 description 4
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 4
- ZRZHXNCATOYMJH-UHFFFAOYSA-N 1-(chloromethyl)-4-ethenylbenzene Chemical compound ClCC1=CC=C(C=C)C=C1 ZRZHXNCATOYMJH-UHFFFAOYSA-N 0.000 description 3
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 125000003710 aryl alkyl group Chemical group 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000006482 condensation reaction Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000004821 distillation Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 3
- 239000002798 polar solvent Substances 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 3
- 238000001291 vacuum drying Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 2
- OQYYLPLRBBDFLA-UHFFFAOYSA-N 3-(3-hydroxyphenyl)sulfonylphenol Chemical compound OC1=CC=CC(S(=O)(=O)C=2C=C(O)C=CC=2)=C1 OQYYLPLRBBDFLA-UHFFFAOYSA-N 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- 241000220317 Rosa Species 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 125000005362 aryl sulfone group Chemical group 0.000 description 2
- 229940067597 azelate Drugs 0.000 description 2
- VEFXTGTZJOWDOF-UHFFFAOYSA-N benzene;hydrate Chemical compound O.C1=CC=CC=C1 VEFXTGTZJOWDOF-UHFFFAOYSA-N 0.000 description 2
- 150000001555 benzenes Chemical class 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 125000004218 chloromethyl group Chemical group [H]C([H])(Cl)* 0.000 description 2
- 230000001112 coagulating effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000004088 foaming agent Substances 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- VHRYZQNGTZXDNX-UHFFFAOYSA-N methacryloyl chloride Chemical compound CC(=C)C(Cl)=O VHRYZQNGTZXDNX-UHFFFAOYSA-N 0.000 description 2
- 239000006082 mold release agent Substances 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 125000000018 nitroso group Chemical group N(=O)* 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 235000019198 oils Nutrition 0.000 description 2
- 150000004707 phenolate Chemical class 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- MIYFPRPQXKJXCC-WGCWOXMQSA-M potassium;(e)-3-(4-hydroxy-3-methoxyphenyl)prop-2-enoate Chemical compound [K+].COC1=CC(\C=C\C([O-])=O)=CC=C1O MIYFPRPQXKJXCC-WGCWOXMQSA-M 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 239000012744 reinforcing agent Substances 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 150000003457 sulfones Chemical class 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N tetraphosphorus decaoxide Chemical compound O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- BTQUGGRCBVUYCM-UHFFFAOYSA-N (2-butylphenyl) dihydrogen phosphite Chemical compound CCCCC1=CC=CC=C1OP(O)O BTQUGGRCBVUYCM-UHFFFAOYSA-N 0.000 description 1
- RJUIDDKTATZJFE-NSCUHMNNSA-N (e)-but-2-enoyl chloride Chemical compound C\C=C\C(Cl)=O RJUIDDKTATZJFE-NSCUHMNNSA-N 0.000 description 1
- KEQGZUUPPQEDPF-UHFFFAOYSA-N 1,3-dichloro-5,5-dimethylimidazolidine-2,4-dione Chemical compound CC1(C)N(Cl)C(=O)N(Cl)C1=O KEQGZUUPPQEDPF-UHFFFAOYSA-N 0.000 description 1
- VTPQLJUADNBKRM-UHFFFAOYSA-N 1-(bromomethyl)-4-ethenylbenzene Chemical compound BrCC1=CC=C(C=C)C=C1 VTPQLJUADNBKRM-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- IBRQUKZZBXZOBA-UHFFFAOYSA-N 1-chloro-3-(3-chlorophenyl)sulfonylbenzene Chemical compound ClC1=CC=CC(S(=O)(=O)C=2C=C(Cl)C=CC=2)=C1 IBRQUKZZBXZOBA-UHFFFAOYSA-N 0.000 description 1
- KTZVZZJJVJQZHV-UHFFFAOYSA-N 1-chloro-4-ethenylbenzene Chemical compound ClC1=CC=C(C=C)C=C1 KTZVZZJJVJQZHV-UHFFFAOYSA-N 0.000 description 1
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 description 1
- PLVUIVUKKJTSDM-UHFFFAOYSA-N 1-fluoro-4-(4-fluorophenyl)sulfonylbenzene Chemical compound C1=CC(F)=CC=C1S(=O)(=O)C1=CC=C(F)C=C1 PLVUIVUKKJTSDM-UHFFFAOYSA-N 0.000 description 1
- MQCPOLNSJCWPGT-UHFFFAOYSA-N 2,2'-Bisphenol F Chemical compound OC1=CC=CC=C1CC1=CC=CC=C1O MQCPOLNSJCWPGT-UHFFFAOYSA-N 0.000 description 1
- YAJYJWXEWKRTPO-UHFFFAOYSA-N 2,3,3,4,4,5-hexamethylhexane-2-thiol Chemical compound CC(C)C(C)(C)C(C)(C)C(C)(C)S YAJYJWXEWKRTPO-UHFFFAOYSA-N 0.000 description 1
- VXHYVVAUHMGCEX-UHFFFAOYSA-N 2-(2-hydroxyphenoxy)phenol Chemical class OC1=CC=CC=C1OC1=CC=CC=C1O VXHYVVAUHMGCEX-UHFFFAOYSA-N 0.000 description 1
- QUWAJPZDCZDTJS-UHFFFAOYSA-N 2-(2-hydroxyphenyl)sulfonylphenol Chemical compound OC1=CC=CC=C1S(=O)(=O)C1=CC=CC=C1O QUWAJPZDCZDTJS-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical group CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- OWRKXOZFTROHSH-UHFFFAOYSA-N 2-ethenyl-1,3-dimethylbenzene Chemical compound CC1=CC=CC(C)=C1C=C OWRKXOZFTROHSH-UHFFFAOYSA-N 0.000 description 1
- ZDULHUHNYHJYKA-UHFFFAOYSA-N 2-propan-2-ylsulfonylpropane Chemical compound CC(C)S(=O)(=O)C(C)C ZDULHUHNYHJYKA-UHFFFAOYSA-N 0.000 description 1
- PFANXOISJYKQRP-UHFFFAOYSA-N 2-tert-butyl-4-[1-(5-tert-butyl-4-hydroxy-2-methylphenyl)butyl]-5-methylphenol Chemical compound C=1C(C(C)(C)C)=C(O)C=C(C)C=1C(CCC)C1=CC(C(C)(C)C)=C(O)C=C1C PFANXOISJYKQRP-UHFFFAOYSA-N 0.000 description 1
- RKSBPFMNOJWYSB-UHFFFAOYSA-N 3,3-Bis(4-hydroxyphenyl)pentane Chemical compound C=1C=C(O)C=CC=1C(CC)(CC)C1=CC=C(O)C=C1 RKSBPFMNOJWYSB-UHFFFAOYSA-N 0.000 description 1
- IWTYTFSSTWXZFU-UHFFFAOYSA-N 3-chloroprop-1-enylbenzene Chemical compound ClCC=CC1=CC=CC=C1 IWTYTFSSTWXZFU-UHFFFAOYSA-N 0.000 description 1
- AYLMSJBHAJHAMB-UHFFFAOYSA-N 4-(2,4-dihydroxyphenyl)sulfonylbenzene-1,3-diol Chemical compound OC1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1O AYLMSJBHAJHAMB-UHFFFAOYSA-N 0.000 description 1
- HAXZAKSZTJVNIS-UHFFFAOYSA-N 4-(4-hydroxynaphthalen-1-yl)oxynaphthalen-1-ol Chemical compound C12=CC=CC=C2C(O)=CC=C1OC1=CC=C(O)C2=CC=CC=C12 HAXZAKSZTJVNIS-UHFFFAOYSA-N 0.000 description 1
- ACEMPBSQAVZNEJ-UHFFFAOYSA-N 4-[(4-hydroxy-3-methoxy-2,6-dimethylphenyl)methyl]-2-methoxy-3,5-dimethylphenol Chemical compound C1=C(O)C(OC)=C(C)C(CC=2C(=C(OC)C(O)=CC=2C)C)=C1C ACEMPBSQAVZNEJ-UHFFFAOYSA-N 0.000 description 1
- RSSGMIIGVQRGDS-UHFFFAOYSA-N 4-[(4-hydroxyphenyl)-phenylmethyl]phenol Chemical compound C1=CC(O)=CC=C1C(C=1C=CC(O)=CC=1)C1=CC=CC=C1 RSSGMIIGVQRGDS-UHFFFAOYSA-N 0.000 description 1
- LCYRQNBSGYQLKY-UHFFFAOYSA-N 4-[2-(4-hydroxynaphthalen-1-yl)propan-2-yl]naphthalen-1-ol Chemical compound C1=CC=C2C(C(C)(C=3C4=CC=CC=C4C(O)=CC=3)C)=CC=C(O)C2=C1 LCYRQNBSGYQLKY-UHFFFAOYSA-N 0.000 description 1
- WCUDAIJOADOKAW-UHFFFAOYSA-N 4-[2-(4-hydroxyphenyl)pentan-2-yl]phenol Chemical compound C=1C=C(O)C=CC=1C(C)(CCC)C1=CC=C(O)C=C1 WCUDAIJOADOKAW-UHFFFAOYSA-N 0.000 description 1
- VHEKFTULOYIMSU-UHFFFAOYSA-N 4-ethenylbenzenesulfonyl chloride Chemical compound ClS(=O)(=O)C1=CC=C(C=C)C=C1 VHEKFTULOYIMSU-UHFFFAOYSA-N 0.000 description 1
- DGZXVEAMYQEFHB-UHFFFAOYSA-N 4-ethenylbenzoyl chloride Chemical compound ClC(=O)C1=CC=C(C=C)C=C1 DGZXVEAMYQEFHB-UHFFFAOYSA-N 0.000 description 1
- 125000004203 4-hydroxyphenyl group Chemical group [H]OC1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ADRNSOYXKABLGT-UHFFFAOYSA-N 8-methylnonyl diphenyl phosphite Chemical compound C=1C=CC=CC=1OP(OCCCCCCCC(C)C)OC1=CC=CC=C1 ADRNSOYXKABLGT-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229920002126 Acrylic acid copolymer Polymers 0.000 description 1
- 229920005497 Acrypet® Polymers 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- 239000004156 Azodicarbonamide Substances 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 238000012695 Interfacial polymerization Methods 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- ZWXPDGCFMMFNRW-UHFFFAOYSA-N N-methylcaprolactam Chemical compound CN1CCCCCC1=O ZWXPDGCFMMFNRW-UHFFFAOYSA-N 0.000 description 1
- 239000004677 Nylon Substances 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 150000008065 acid anhydrides Chemical class 0.000 description 1
- 150000008360 acrylonitriles Chemical class 0.000 description 1
- HFBMWMNUJJDEQZ-UHFFFAOYSA-N acryloyl chloride Chemical compound ClC(=O)C=C HFBMWMNUJJDEQZ-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 229910000288 alkali metal carbonate Inorganic materials 0.000 description 1
- 150000008041 alkali metal carbonates Chemical class 0.000 description 1
- 229910000102 alkali metal hydride Inorganic materials 0.000 description 1
- 150000008046 alkali metal hydrides Chemical class 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 description 1
- XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 150000001535 azelaic acid derivatives Chemical class 0.000 description 1
- XOZUGNYVDXMRKW-AATRIKPKSA-N azodicarbonamide Chemical compound NC(=O)\N=N\C(N)=O XOZUGNYVDXMRKW-AATRIKPKSA-N 0.000 description 1
- 235000019399 azodicarbonamide Nutrition 0.000 description 1
- VJRITMATACIYAF-UHFFFAOYSA-N benzenesulfonohydrazide Chemical compound NNS(=O)(=O)C1=CC=CC=C1 VJRITMATACIYAF-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- HRQGCQVOJVTVLU-UHFFFAOYSA-N bis(chloromethyl) ether Chemical compound ClCOCCl HRQGCQVOJVTVLU-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 150000001733 carboxylic acid esters Chemical class 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- XTHPWXDJESJLNJ-UHFFFAOYSA-N chlorosulfonic acid Substances OS(Cl)(=O)=O XTHPWXDJESJLNJ-UHFFFAOYSA-N 0.000 description 1
- 239000004927 clay Substances 0.000 description 1
- 229910052570 clay Inorganic materials 0.000 description 1
- 230000015271 coagulation Effects 0.000 description 1
- 238000005345 coagulation Methods 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- VVOLVFOSOPJKED-UHFFFAOYSA-N copper phthalocyanine Chemical compound [Cu].N=1C2=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC=1C1=CC=CC=C12 VVOLVFOSOPJKED-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 150000003983 crown ethers Chemical class 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- PFBWBEXCUGKYKO-UHFFFAOYSA-N ethene;n-octadecyloctadecan-1-amine Chemical compound C=C.CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC PFBWBEXCUGKYKO-UHFFFAOYSA-N 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000003951 lactams Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002480 mineral oil Substances 0.000 description 1
- 235000010446 mineral oil Nutrition 0.000 description 1
- 229910000403 monosodium phosphate Inorganic materials 0.000 description 1
- 235000019799 monosodium phosphate Nutrition 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- WIBFFTLQMKKBLZ-SEYXRHQNSA-N n-butyl oleate Chemical compound CCCCCCCC\C=C/CCCCCCCC(=O)OCCCC WIBFFTLQMKKBLZ-SEYXRHQNSA-N 0.000 description 1
- NWZZFAQUBMRYNU-UHFFFAOYSA-N n-octadecylnonadec-18-en-1-amine Chemical compound CCCCCCCCCCCCCCCCCCNCCCCCCCCCCCCCCCCCC=C NWZZFAQUBMRYNU-UHFFFAOYSA-N 0.000 description 1
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002888 oleic acid derivatives Chemical class 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- UMPKMCDVBZFQOK-UHFFFAOYSA-N potassium;iron(3+);oxygen(2-) Chemical group [O-2].[O-2].[K+].[Fe+3] UMPKMCDVBZFQOK-UHFFFAOYSA-N 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 229960003857 proglumide Drugs 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 230000005070 ripening Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- AJPJDKMHJJGVTQ-UHFFFAOYSA-M sodium dihydrogen phosphate Chemical compound [Na+].OP(O)([O-])=O AJPJDKMHJJGVTQ-UHFFFAOYSA-M 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- 150000003458 sulfonic acid derivatives Chemical class 0.000 description 1
- YBBRCQOCSYXUOC-UHFFFAOYSA-N sulfuryl dichloride Chemical group ClS(Cl)(=O)=O YBBRCQOCSYXUOC-UHFFFAOYSA-N 0.000 description 1
- 238000010557 suspension polymerization reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- ISXOBTBCNRIIQO-UHFFFAOYSA-N tetrahydrothiophene 1-oxide Chemical compound O=S1CCCC1 ISXOBTBCNRIIQO-UHFFFAOYSA-N 0.000 description 1
- 239000012815 thermoplastic material Substances 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
Abstract
Description
【発明の詳細な説明】
本発明はポリアリーレンエーテルスルホン(以下、芳香
族ポリスルホンと略称する)とビニル重合体からなるグ
ラフト共重合体の製造方法に関するものである。さらに
詳しくは、耐熱性、機械的特性および良流動性が均衡に
優れたプラスチック素材を提供することを目的としたも
のである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a graft copolymer comprising polyarylene ether sulfone (hereinafter abbreviated as aromatic polysulfone) and a vinyl polymer. More specifically, the purpose of the present invention is to provide a plastic material that is well-balanced in heat resistance, mechanical properties, and good fluidity.
芳香族ポリスルホンは耐熱性、機械特性、電気特性など
に優れた熱可塑性材料であり、これらの緒特性のゆえに
エンジニアリングプラスチックとして電気・電子部品、
航空機部品、自動車部品、衛生食品機器部品などに一部
活用されている。しかし、芳香族ポリスルホンはまだま
だ高価な材料であり、しかも成形流動性が必ずしも十分
でないために、経済性を要求される1部品類に本格採用
されるにはいなっていない。Aromatic polysulfone is a thermoplastic material with excellent heat resistance, mechanical properties, and electrical properties.Because of these properties, it is used as an engineering plastic for electrical and electronic parts,
It is partially used in aircraft parts, automobile parts, sanitary food equipment parts, etc. However, aromatic polysulfone is still an expensive material and, moreover, does not necessarily have sufficient molding fluidity, so it has not been adopted on a full scale for single parts that require economic efficiency.
そのため、芳香族ポリスルホンを他の安価、かつ流動性
の良好な汎用熱可塑性樹脂類、たとえば、ビニル重合体
とブレンドする方法が種々提案されている(たとえば、
特公昭46−37896号公報、特公昭46−3790
5号公報、特公昭47=31095号公報、特開昭47
−5581号公報、特開昭49−128048号公報な
ど)、シかし、これら芳香族ポリスルポンとビニル重合
体との配合物は、単純溶融ブレンドを前提としたもので
あって、完全な海−島分離構造を形成しており、特にビ
ニル重合体が海成分を構成する組成物(ビニル重合体部
分が量的に優勢となる配合物)においては、芳香族ポリ
スルホンの有する優れた耐熱特性がはと、んと生かされ
ていない、たとえば、芳香族ポリスルホニ/ (tJc
c社製”tJdel P−1,700″)とASvI
4脂(スチレン/アクリロニトリル76/24重量比共
重合体)とを押出機で単純溶融ブレンドした場合に得ら
れる組成物のBSS熟熱変形温度イギリス規格B527
82−102C)i、t20/80fi量混合比で10
8℃、40/60重量混合比で120℃程度にしかなら
ない、この値は芳香族ポリスルホン(” U de I
P 1+ 700 ” )のBSS熟熱変形温度
185℃よびAs(スチレン/アクリロニトリル76/
24重量比共重合体)樹脂のBSS熟熱変形温度102
℃加成性から算出される値に比べて格段に低く不満足な
ものである。Therefore, various methods have been proposed for blending aromatic polysulfone with other general-purpose thermoplastic resins that are inexpensive and have good fluidity, such as vinyl polymers (for example,
Special Publication No. 46-37896, Special Publication No. 46-3790
Publication No. 5, Japanese Patent Publication No. 31095, Japanese Patent Publication No. 1973
However, these blends of aromatic polysulfone and vinyl polymer are based on the premise of simple melt blending; It forms an island-separated structure, and the excellent heat resistance properties of aromatic polysulfone are particularly important in compositions in which vinyl polymer constitutes the sea component (compounds in which the vinyl polymer portion is quantitatively predominant). For example, aromatic polysulfony/(tJc
"tJdel P-1,700" manufactured by c company) and ASvI
4 fat (styrene/acrylonitrile 76/24 weight ratio copolymer) BSS ripening temperature of the composition obtained by simple melt blending in an extruder British Standard B527
82-102C) i, t20/80fi quantity mixing ratio is 10
At 8°C and a 40/60 weight mixing ratio, the temperature is only about 120°C. This value is higher than aromatic polysulfone ("
BSS aging temperature of 185℃ and As (styrene/acrylonitrile 76/
24 weight ratio copolymer) BSS aging temperature of resin 102
This value is much lower than the value calculated from °C additivity and is unsatisfactory.
また、芳香族ポリスルホンにビニル単量体をグラフト共
重合させることを目的として単純な芳香族ポリスルホン
の存在下にビニル単量体を重合させる方法も提案されて
きた。たとえば、ガ香族ポリスルホンー塩化ビニル系共
重合体の製造方法(特公昭46−21216号公報)、
芳香族ポリスルホン−ビニルモノマー類系共重合体の製
造方法(特公昭47−23665号公報)などである。Furthermore, a method has been proposed in which a vinyl monomer is polymerized in the presence of a simple aromatic polysulfone for the purpose of graft copolymerizing a vinyl monomer onto an aromatic polysulfone. For example, a method for producing aromatic polysulfone-vinyl chloride copolymer (Japanese Patent Publication No. 46-21216),
Examples include a method for producing an aromatic polysulfone-vinyl monomer copolymer (Japanese Patent Publication No. 47-23665).
しかしながら、これらの方法においては、ビニル単量体
そのものがフェノール基またはアルカリフェノレート基
と反応することのできる官能基を有しないため、効果的
にグラフト反応を行なわせることが困難である。すなわ
ち、特公昭47−23665号公報記載の方法ではグラ
フト率が低すぎ、また、特公昭46−21216号公報
記載の方法では、特に塩化ビニル以外のビニル単量体を
グラフト重合させる場合、効果的にグラフト反応するこ
とが困難である。However, in these methods, it is difficult to carry out the graft reaction effectively because the vinyl monomer itself does not have a functional group that can react with a phenol group or an alkali phenolate group. That is, the method described in Japanese Patent Publication No. 47-23665 has a too low grafting rate, and the method described in Japanese Patent Publication No. 46-21216 is not effective, especially when graft polymerizing vinyl monomers other than vinyl chloride. It is difficult to carry out a graft reaction.
そこで、本発明者らは芳香族ポリスルホンとビニル重合
体とをより効果的にグラフトさせ、耐熱性、機械的特性
および良流動性が均衡に優れたグラフト共重合体を得る
方法について鋭意検討した結果、ビニル重合体のll1
I鎖に特定のグラフト活性点を導入し、これを用いて高
分子グラフト反応を行なうことにより、上記目的が極め
て効果的に達成できることを見出し、本発明に到達した
。Therefore, the present inventors conducted intensive studies on a method for more effectively grafting aromatic polysulfone and vinyl polymer to obtain a graft copolymer with an excellent balance of heat resistance, mechanical properties, and good fluidity. , vinyl polymer ll1
The inventors have discovered that the above object can be achieved very effectively by introducing a specific grafting active site into the I chain and using this to perform a polymer grafting reaction, and have thus arrived at the present invention.
すなわち本発明は、l!I鎖に0.05〜30重量%の
酸ハライド基、酸無水物基、グリシジル基、ハロメチル
基およびスルホニルハライド基から選ばれた官能基をI
!または2種以上有する活性ビニル重合体または共重合
体(A)と末端にフェノール性水酸基またはアルカリフ
ェノレート基を有する芳香族ポリスルホン(B)を極性
有機溶媒中で反応させることを特徴とするグラフト共重
合体の製造方法を提供するものである。That is, the present invention provides l! 0.05 to 30% by weight of a functional group selected from an acid halide group, an acid anhydride group, a glycidyl group, a halomethyl group, and a sulfonyl halide group in the I chain.
! Alternatively, a graft copolymer characterized by reacting an activated vinyl polymer or copolymer (A) having two or more types with an aromatic polysulfone (B) having a phenolic hydroxyl group or an alkali phenolate group at the terminal in a polar organic solvent. A method for producing a polymer is provided.
本発明においては、使用するビニル重合体または共重合
体に予め、上記特定の活性点を導入しておくことにより
、グラフト共重合反応を効率的に進行させることができ
、目的とする特性を満足したグラフト共重合体を得るこ
とができる。しかして、以下においては便宜上、上記活
性点を導入したビニル重合体または共重合体を活性ビニ
ル(共)重合体と呼称する。In the present invention, by introducing the above-mentioned specific active sites into the vinyl polymer or copolymer used in advance, the graft copolymerization reaction can proceed efficiently and the desired properties can be achieved. A graft copolymer can be obtained. Therefore, hereinafter, for convenience, the vinyl polymer or copolymer into which the above-mentioned active sites have been introduced will be referred to as an activated vinyl (co)polymer.
本発明のグラフト共重合反応は活性ビニル(共)重合体
の活性基と芳香族ポリスルホンの末端(フェノール性水
酸基またはアルカリフェノレート基)とを反応させる方
法によって効率的に進行し、得られるグラフト共重合体
は目的とする特性を備えている。そこで以下においては
便宜上、本発明の反応を高分子グラフト反応と呼称する
。The graft copolymerization reaction of the present invention proceeds efficiently by a method of reacting the active group of the activated vinyl (co)polymer with the terminal end (phenolic hydroxyl group or alkali phenolate group) of the aromatic polysulfone, and the resulting graft copolymerization reaction The polymer has the desired properties. Therefore, hereinafter, for convenience, the reaction of the present invention will be referred to as a polymer graft reaction.
本発明の高分子グラフト反応に供される芳香族ポリスル
ホンとは、アルカリフェノレート基と電子吸引性スルホ
ン基で活性化された芳香族ハロゲン基とを非10トン性
極性溶媒中で縮合反応させることにより得られる形式の
重合体であり、アリーレン結合(芳香族結合)、エーテ
ル結合およびスルホン結合の王者を必須の結合単位とす
る線状重合体である。具体的には(1)ビスフェノール
類のアルカリフェノレートと分子内にスルホン結合を持
った芳香族ジハロゲン化物とを縮合反応する方法あるい
は(2)分子内にスルホン結合を持った芳香族ハロフェ
ノールのアルカリフェノレートを自己縮合反応させる方
法のいずれかによる重合で得られる重合体である。The aromatic polysulfone to be subjected to the polymer grafting reaction of the present invention is obtained by subjecting an alkali phenolate group and an aromatic halogen group activated with an electron-withdrawing sulfone group to a condensation reaction in a non-10-ton polar solvent. It is a linear polymer in which the essential bonding units are arylene bonds (aromatic bonds), ether bonds, and sulfone bonds. Specifically, (1) a method in which an alkali phenolate of bisphenols is subjected to a condensation reaction with an aromatic dihalide having a sulfone bond in the molecule, or (2) an alkali of an aromatic halophenol having a sulfone bond in the molecule. It is a polymer obtained by polymerizing phenolate by any of the methods of subjecting it to a self-condensation reaction.
上記(1)法で用いるビスフェノール類の例としては、
たとえば、ヒドロキノン、レゾルシン、ビス−(ヒドロ
キシフェニル)アルカン、たとえば、2.2−ビス−(
4−ヒドロキシフェニル)プロパン、214−一ジヒド
ロキシジフェニルメタン、ビス−(4−ヒドロキシフェ
ニル)メタン、ビス−(2−ヒドロキシフェニル)メタ
ン、ビス−(4−ヒドロキシ−2,6−シメチルー3−
メトキシフェニル)メタン、1.1−ビス−(4−ヒド
ロキシフェニル)エタン、1.2−ビス−(4−しドロ
キシフェニル)エタン、1.1=ビス−(4−ヒドロキ
シ−2−クロルフェニル)エタン、2.2−ビス−(4
−ヒドロキシナフチル)プロパン、2.2−ビス−(4
−ヒドロキシフェニル)ペンタン、3.3−ビス−(4
−ヒドロキシフェニル)ペンタン、2.2−ビス−(4
−ヒドロキシフェニル)へブタン、ビス−(4−ヒドロ
キシフェニル)フェニルメタン、バラ−α、α−−ビス
(4−ヒト0キシフエニル)−バラ−ジイソプロピルベ
ンゼンなど;ジ(ヒドロキシフェニル)エーテル、たと
えば、ビス−(4−ヒドロキシフェニル)エーテル、4
、3−−14.2−−12.2−−1213゛−ジヒド
ロキシジフェニルエーテル、4,4゛−ジヒドロキシ−
2,6−シメチルジフエニルエーテル、ビス−(4−ヒ
ドロキシナフチル)エーテルなどニジ(ヒドロキシフェ
ニル)スルホン、たとえば、ビス−(4−ヒドロキシフ
ェニル)スルホン、ビス−(3−ヒドロキシフェニル)
スルホン、2,4−−ジヒドロキシフェニルスルホン、
ビス−(3−ヒドロキシフェニル)スルホン、2.4−
一ジヒドロキシジフェニルスルホンなど、さらに3核以
上のフェニル核を有するこれらの類似物が挙げられる。Examples of bisphenols used in method (1) above include:
For example, hydroquinone, resorcinol, bis-(hydroxyphenyl) alkanes, e.g. 2,2-bis-(
4-hydroxyphenyl)propane, 214-monodihydroxydiphenylmethane, bis-(4-hydroxyphenyl)methane, bis-(2-hydroxyphenyl)methane, bis-(4-hydroxy-2,6-dimethyl-3-
methoxyphenyl)methane, 1.1-bis-(4-hydroxyphenyl)ethane, 1.2-bis-(4-hydroxyphenyl)ethane, 1.1=bis-(4-hydroxy-2-chlorophenyl) ) ethane, 2,2-bis-(4
-hydroxynaphthyl)propane, 2,2-bis-(4
-hydroxyphenyl)pentane, 3,3-bis-(4
-hydroxyphenyl)pentane, 2,2-bis-(4
-hydroxyphenyl)hebutane, bis-(4-hydroxyphenyl)phenylmethane, bara-α, α-bis(4-hydroxyphenyl)-bara-diisopropylbenzene, etc.; di(hydroxyphenyl)ethers, e.g. -(4-hydroxyphenyl)ether, 4
, 3--14.2--12.2--1213'-dihydroxydiphenyl ether, 4,4'-dihydroxy-
2,6-dimethyldiphenyl ether, bis-(4-hydroxynaphthyl) ether, etc. di(hydroxyphenyl) sulfone, e.g. bis-(4-hydroxyphenyl) sulfone, bis-(3-hydroxyphenyl)
sulfone, 2,4-dihydroxyphenyl sulfone,
Bis-(3-hydroxyphenyl)sulfone, 2.4-
Further examples thereof include analogs thereof having three or more phenyl nuclei, such as monodihydroxydiphenyl sulfone.
これらのビスフェノール類のベンゼン核に01〜C9の
アルキル基、06〜CI8の芳香族基あるいはアラルキ
ル基、01〜CI2のエーテル基などの不活性置換基を
導入したものも用いることができる。これらのビスフェ
ノール類は1種または2N以上の混合物で用いられる。These bisphenols having inert substituents introduced into the benzene nucleus such as alkyl groups of 01 to C9, aromatic or aralkyl groups of 06 to CI8, and ether groups of 01 to CI2 can also be used. These bisphenols may be used alone or in a mixture of 2N or more.
また、上記(1)法で用いる芳香族ジハロゲン化物とし
ては、たとえば、4,4゛−ジクロルジフェニルスルホ
ン、4.4−一ジフルオロジフェニルスルホン、4,4
′−ジブロムジフェニルスルホン、4.4”−ショート
ジフェニルスルホン、2.4゛−ジクロルジフェニルス
ルホン、2.4−一ジブロムジフェニルスルホン、2.
4−−ジフルオロジフェニルスルホン、2,4°−ショ
ートジフェニルスルホンあるいは下式に示されるものな
どが挙げられる(ここでXは、ハロゲン、すなわち、フ
ッ素、塩素、臭素またはヨウ素を示す)。Further, the aromatic dihalides used in the above method (1) include, for example, 4,4'-dichlorodiphenylsulfone, 4,4-difluorodiphenylsulfone, 4,4'-dichlorodiphenylsulfone,
'-Dibromidiphenylsulfone, 4.4''-short diphenylsulfone, 2.4''-dichlorodiphenylsulfone, 2.4-1 dibromidiphenylsulfone, 2.
Examples include 4-difluorodiphenylsulfone, 2,4°-short diphenylsulfone, and those shown in the following formula (where X represents halogen, that is, fluorine, chlorine, bromine or iodine).
これらのベンゼン核にC1〜c9のアルキル基、06〜
C1δの芳香族基またはアラルキル基、01〜CI2の
エーテル基などの不活性基あるいはハロゲン基、ニトロ
基、アルキルスルホン基、アリールスルホン基、ニトロ
ソ基のごとき電子吸引性の活性化基を導入したものも使
用できる。C1-c9 alkyl group, 06-
Those into which an aromatic group or aralkyl group of C1δ, an inert group such as an ether group of 01 to CI2, or an electron-withdrawing activating group such as a halogen group, a nitro group, an alkylsulfone group, an arylsulfone group, or a nitroso group are introduced. can also be used.
これらの芳香族ジハロゲン化物は1種あるいは2種以上
の混合物で使用される。These aromatic dihalides may be used alone or in a mixture of two or more.
一方、上記(2)法で用いられる分子内にスルホン結合
を有する芳香族ハロフェノールとしては、たとえば、下
式のようなものが挙げられる(ここでXは、ハロゲン、
すなわち、フッ素、塩素、臭素またはヨウ素を示す)。On the other hand, examples of aromatic halophenols having a sulfone bond in the molecule used in the above method (2) include those shown in the following formula (where X is halogen,
i.e. fluorine, chlorine, bromine or iodine).
これらのベンゼン核に01〜C9のアルキル基、06〜
C18の芳香族基またはアラルキル基、01〜CI2の
エーテル基などの置換基を導入したものも使用でき、ま
た、ハロゲン基が結合しているベンゼン核にニトロ基、
アルキルスルホン基、アリールスルホン基、ニトロソ基
、ハロゲン基のごとき電子吸引性の活性止置vA基を導
入したものも有効である。これらのハロフェノール類は
前もって合成されたものを使用に供することも可能であ
るが、重合反応系中であらかじめジハロゲン化物とアル
カリ金属水酸化物とを反応させることにより調製したへ
ロフェノールのアルカリフェノレートを使用することも
可能である。これらのへロフェノールは単独でまたは2
種以上の混合であるいはまた前述のビスフェノール類/
ジハロゲン化物との混合物で用いられる。These benzene nuclei have 01-C9 alkyl groups, 06-
Substituents such as a C18 aromatic group or aralkyl group, or a 01 to CI2 ether group can also be used, and a nitro group or a nitro group to the benzene nucleus to which a halogen group is bonded
Those into which an electron-withdrawing active stationary vA group such as an alkylsulfone group, an arylsulfone group, a nitroso group, or a halogen group is introduced are also effective. Although it is possible to use these halophenols that have been synthesized in advance, alkaline phenols of halophenols prepared by reacting dihalides and alkali metal hydroxides in advance in the polymerization reaction system can be used. It is also possible to use rates. These herrophenols alone or in combination
A mixture of more than one species or the above bisphenols/
Used in mixtures with dihalides.
上記ビスフェノール顕または芳香族ハロフェノールのア
ルカリフェノレートとしては、ナトリウムフェルレート
およびカリウムフェルレートが経済的なことおよび取扱
いが容易なことなどから好ましいが、他のアルカリフェ
ノレートも使用可能である。アルカリフェノレートは前
もって合成されたものを使用に洪することも可能である
が、重合反応系中であらかじめ芳香族性水酸基とアルカ
リ金属水酸化物、炭酸アルカリ金属、アルカリ金属、ア
ルカリ金属水素化物などとを反応させることによって調
製することも可能である。As the alkali phenolate of the bisphenol-containing or aromatic halophenol, sodium ferulate and potassium ferulate are preferred because they are economical and easy to handle, but other alkali phenolates can also be used. Alkali phenolates can be synthesized in advance, but aromatic hydroxyl groups and alkali metal hydroxides, alkali metal carbonates, alkali metals, alkali metal hydrides, etc. can be used in advance in the polymerization reaction system. It can also be prepared by reacting with.
上記構成成分からなる芳香族ポリスルホンの重合は一般
には溶融中無水条件で、100℃以上の温度で行なわれ
る。特殊な場合としてクラウンエーテルなどの相間移動
溶媒を用いた場合は低温の界面重合でも芳香族ポリネル
ホン重合物が得られることもある0重合溶媒として好適
な非プロトン性極性溶媒の例としては、ジメチルスルホ
キシド、ジエチルスルホキシド、テトラヒドロチオフェ
ン−1−モノオキシドなどのスルホキシド類、ジメチル
スルホン、ジエチルスルホン、ジイソプロピルスルホン
、スルホランなどのスルホン類、ジメチルホルムアミド
、ジメチルアセトアミドなどのN−アルキルアミド類、
N−メチルピロリドン、N−メチルカプロラクタムなど
のN置換ラクタム類、アセトフェノンなどのケトン類、
ジフェニルエーテルなどのエーテル類などが挙げられる
。Polymerization of the aromatic polysulfone consisting of the above components is generally carried out under anhydrous conditions during melting at a temperature of 100° C. or higher. In special cases, when a phase transfer solvent such as crown ether is used, an aromatic polynelphone polymer may be obtained even by low-temperature interfacial polymerization.0 An example of an aprotic polar solvent suitable as a polymerization solvent is dimethyl sulfoxide. , sulfoxides such as diethyl sulfoxide and tetrahydrothiophene-1-monooxide, sulfones such as dimethylsulfone, diethylsulfone, diisopropylsulfone, and sulfolane, N-alkylamides such as dimethylformamide and dimethylacetamide,
N-substituted lactams such as N-methylpyrrolidone and N-methylcaprolactam, ketones such as acetophenone,
Examples include ethers such as diphenyl ether.
このようにして得られる芳香族ポリスルホンの代表的な
例として次のような構造式からなるものが挙げられる。Representative examples of aromatic polysulfones obtained in this manner include those having the following structural formula.
H3
これらの芳香族ポリスルホンの重合条件は、たとえば、
特公昭42−7799号公報、特公昭47−617号公
報などにさらに詳細に開示されている。H3 The polymerization conditions for these aromatic polysulfones are, for example,
Further details are disclosed in Japanese Patent Publication No. 42-7799, Japanese Patent Publication No. 47-617, etc.
なお、これら芳香族ポリスルホンにおいて、これを上記
高分子グラフト反応に適用する場合には、重合体末端に
フェノール性水酸基またはアルカリフェノレート基を有
することが必要であり、このような末端を有する芳香族
ポリスルホンは前述の重合終了後、何ら末端を封鎖する
操作を行なわないかあるいは重合終了後、単に酸を添加
して中和するなどの方法により得ることができる。In addition, when these aromatic polysulfones are applied to the polymer grafting reaction mentioned above, it is necessary to have a phenolic hydroxyl group or an alkali phenolate group at the polymer end. Polysulfone can be obtained by a method such as not performing any terminal blocking operation after the completion of the above-mentioned polymerization, or by simply adding an acid to neutralize it after the completion of the polymerization.
本発明で用いる側鎖に酸ハライド基、酸無水物基、グリ
シジル基、ハロメチル基およびスルホニルハライド基か
ら選ばれた官能基を有する活性ビニル(共)重合体は、
α、β不飽和カルボン酸塩化物、その酸無水物、グリシ
ジルエステル、たとえば、アクリル酸クロリド、メタク
リル酸クロリド、クロトン酸クロリド、p−ビニルベン
ゾイルクロリド、無水マレイン酸、イタ;lン酸無水物
、シトラコン敢然水物、アクリル酸グリシジル、メタク
リル酸グリシジルあるいはアリルクロリド、アリルプロ
ミド、アリルイオダイド、アリルグリシジルエーテル、
p =クロルメチルスチレン、p−ブロムメチルスチレ
ン、p−クロルスルホニルスチレンなどの官能性ビニル
単量体類の1種または2種以上を(共)重合することに
よって製造することができる。また、活性ビニル(共)
重合体は予め準備した非活性のビニル(共)重合体の側
鎖に、高分子反応によって目的のグラフト活性基を導入
するという方法により製造することもできる。The activated vinyl (co)polymer having a functional group selected from an acid halide group, an acid anhydride group, a glycidyl group, a halomethyl group, and a sulfonyl halide group in the side chain used in the present invention is
α, β unsaturated carboxylic acid chlorides, their acid anhydrides, glycidyl esters, such as acrylic acid chloride, methacrylic acid chloride, crotonic acid chloride, p-vinylbenzoyl chloride, maleic anhydride, phosphoric anhydride, Citracon dandan water, glycidyl acrylate, glycidyl methacrylate or allyl chloride, allyl promide, allyl iodide, allyl glycidyl ether,
It can be produced by (co)polymerizing one or more functional vinyl monomers such as p = chloromethylstyrene, p-bromomethylstyrene, and p-chlorosulfonylstyrene. In addition, activated vinyl (co)
The polymer can also be produced by a method in which a desired graft active group is introduced into the side chain of a previously prepared inactive vinyl (co)polymer by polymer reaction.
このような方法例としては、たとえば、アクリル酸(共
)重合体をチオニルクロリドと反応せしめて酸クロリド
基を導入する方法、スチレン(共)重合体をクロルメチ
ルエーテルと反応せしめてクロルメチル基を導入する方
法、スチレン(共)重合体をクロルスルホン酸と反応せ
しめてスルホニルクロリド基を導入する方法などが挙げ
られる。Examples of such methods include, for example, reacting an acrylic acid (co)polymer with thionyl chloride to introduce acid chloride groups, and reacting a styrene (co)polymer with chloromethyl ether to introduce chloromethyl groups. Examples include a method of reacting a styrene (co)polymer with chlorosulfonic acid to introduce a sulfonyl chloride group.
本発明においては、活性ビニル(共)重合体分子中の活
性点(グラフト反応性官能基)の量がグラフト共重合体
の生成効果を左右する。In the present invention, the amount of active sites (graft-reactive functional groups) in the activated vinyl (co)polymer molecule influences the production effect of the graft copolymer.
活性ビニル(共)重合体中にグラフト活性の高い活性点
の数が多すぎる場合には芳香族ポリスルホンとのグラフ
ト反応中に副反応としての架橋反応が起こり、ゲル化し
て不溶、不融の重合体を生成する傾向が強くなる。この
傾向を低減させるためには、活性ビニル(共)重合体製
造時にフェノール性水酸基もしくはアルカリフェノレー
ト基に対して不活性なビニル単量体類を希釈共重合させ
ることが有効であり、ゲル化傾向を明確に回避するなめ
には活性点(グラフト反応性官能基)の量を活性官能基
量として塩3下にすることが必要である。また、本発明
効果を発現させるためには、活性点訳活性官能基量とし
て0.05重量%以上、官能性ビニル単量水の共重合組
成として0.1モル%以上の範囲である。If there are too many active sites with high grafting activity in the activated vinyl (co)polymer, a crosslinking reaction will occur as a side reaction during the grafting reaction with aromatic polysulfone, resulting in gelation and formation of insoluble and infusible polymers. The tendency to generate coalescence becomes stronger. In order to reduce this tendency, it is effective to dilute and copolymerize vinyl monomers that are inactive with respect to phenolic hydroxyl groups or alkali phenolate groups during the production of activated vinyl (co)polymers. In order to clearly avoid this tendency, it is necessary to set the amount of active sites (graft-reactive functional groups) to less than 3 salts as the amount of active functional groups. Further, in order to exhibit the effects of the present invention, the content of the active functional group should be 0.05% by weight or more, and the copolymerization composition of functional vinyl monomer water should be 0.1% by mole or more.
すなわち、活性点は、活性官能基量として0゜05〜3
0重量%、官能性ビニル単量体の共重合組成として0.
01モル%〜50モル%である。That is, the active site has an active functional group amount of 0°05 to 3
0% by weight, 0.0% as copolymer composition of functional vinyl monomer.
01 mol% to 50 mol%.
高分子反応にて活性基を導入する場合にも活性点の好ま
しい量は同様に#J限される。When introducing active groups in a polymer reaction, the preferable amount of active sites is similarly limited to #J.
上述の活性点量制御を目的として希釈共重合させること
のできる不活性ビニル単量体類としては、たとえば、ス
チレン、α−メチルスチレン、2.6−シメチルスチレ
ン、p−クロルスチレン、ビニルトルエンなどのアルゲ
ニル芳香族化合物、アクリロニトリル、メタクリロニト
リルなどのアクリロニトリル系化合物、01〜C18の
アルキル基成分よりなるメタクリル酸アルキルエステル
、01〜CI8のアルキル基成分よりなるアクリル酸ア
ルキルエステルなどのα、β不飽和カルボン酸エステル
、ブタジェン、イソグレン、クロログレンなどのジエン
化合物などを挙げることができる。これらは1種または
2種以上の混合物で使用することができる。Inert vinyl monomers that can be diluted and copolymerized for the purpose of controlling the amount of active sites mentioned above include, for example, styrene, α-methylstyrene, 2,6-dimethylstyrene, p-chlorostyrene, and vinyltoluene. α, β such as argenyl aromatic compounds such as acrylonitrile, acrylonitrile compounds such as methacrylonitrile, methacrylic acid alkyl esters consisting of alkyl group components of 01 to C18, acrylic acid alkyl esters consisting of alkyl group components of 01 to CI8, etc. Examples include unsaturated carboxylic acid esters, diene compounds such as butadiene, isogrene, and chlorogrene. These can be used alone or in a mixture of two or more.
本発明のグラフト反応は上記したごとく、高分子グラフ
ト反応により実施することができる。As described above, the graft reaction of the present invention can be carried out by polymer graft reaction.
高分子グラフト反応を実施するにあたっては、反応系に
おいて活性ビニル(共)重合体類および芳香族ポリスル
ホン(もしくはその重合途中の前駆体)の両者が溶解も
しくは膨潤している必要がある。このような溶媒として
芳香族ポリスルホンの重合溶媒として通常用いられるジ
メチルスルホキシドなどのスルホキシド系溶媒、ジメチ
ルスルホン、スルホランなどのスルホ、ン系溶媒、ジメ
チルホルムアミド、ジメチルアセトアミド、N−メチル
ピロリドンなどのN ff fAアミド系溶媒などに代
表される非プロトン系極性溶媒および芳香族ポリスルホ
ンの重合用溶媒の他に、塩化メチレン、クロロホルム、
テトラクロルエタンなどの脂肪族ハロゲン化炭化水素系
溶媒、クロルベンゼンなどの芳香族ハロゲン化炭化水素
系溶媒、テトラヒドロフラン、ジフェニルエーテル、ジ
ブチルエーテルなどのエーテル系溶媒、アセトンフェノ
ン、ベンゾフェノン、シクロヘキサノンなどのゲトン系
溶媒などから選択することができる。In carrying out a polymer graft reaction, it is necessary that both the active vinyl (co)polymer and the aromatic polysulfone (or its precursor during polymerization) be dissolved or swollen in the reaction system. Examples of such solvents include sulfoxide-based solvents such as dimethyl sulfoxide, which are commonly used as polymerization solvents for aromatic polysulfone, sulfonate-based solvents such as dimethylsulfone and sulfolane, and N ff fA such as dimethylformamide, dimethylacetamide, and N-methylpyrrolidone. In addition to aprotic polar solvents such as amide solvents and polymerization solvents for aromatic polysulfone, methylene chloride, chloroform,
Aliphatic halogenated hydrocarbon solvents such as tetrachloroethane, aromatic halogenated hydrocarbon solvents such as chlorobenzene, ether solvents such as tetrahydrofuran, diphenyl ether, and dibutyl ether, and getone solvents such as acetonephenone, benzophenone, and cyclohexanone. You can choose from.
本発明の高分子グラフト反応は、末端にフェノール性水
酸基またはアルカリフェノレート基を有する芳香族ポリ
スルポンと活性ビニル重合体との両者を溶液状または溶
媒に膨潤した状態で混和、撹拌下に室温〜200℃(好
ましくは50〜1・60℃)で反応させることによって
行なわれる。In the polymer grafting reaction of the present invention, an aromatic polysulfone having a phenolic hydroxyl group or an alkali phenolate group at the end and an activated vinyl polymer are mixed together in a solution state or in a swollen state in a solvent, and the mixture is stirred at room temperature to 200 ml. It is carried out by reacting at ℃ (preferably 50 to 1.60℃).
本発明のグラフト反応における芳香族ポリスルホン部分
と活性ビニル(共)重合体類の使用割合は、あらゆる範
囲で実施可能であるが、特に芳香族ポリスルホン部分1
〜99重量部、好ましくは5〜80重量部に対して、活
性ビニル(共)重合体1〜99重量部、好ましくは20
〜95重量部の割合が実用的である。The ratio of the aromatic polysulfone moiety and the activated vinyl (co)polymer used in the graft reaction of the present invention can be carried out within any range, but in particular, the aromatic polysulfone moiety 1
~99 parts by weight, preferably 5 to 80 parts by weight, and 1 to 99 parts by weight, preferably 20 parts by weight of activated vinyl (co)polymer.
A proportion of ~95 parts by weight is practical.
本発明のグラフト反応により得られる生成物は目的とす
るグラフト共重合体100%で構成されることはまれで
あり、反応にあずからない芳香族ポリスルホンおよび活
性ビニル重合体それぞれの単独重合体をも含んだグラフ
ト共重合体組成物として得られる。The product obtained by the graft reaction of the present invention is rarely composed of 100% of the target graft copolymer, and may also contain the respective homopolymers of aromatic polysulfone and activated vinyl polymer that do not participate in the reaction. It is obtained as a graft copolymer composition containing.
また、本発明で得られるグラフト共重合体(組成物)に
さらに同種あるいは異種のビニル重合体類および芳香族
ポリスルホン類を追加配合して実用に供することもでき
る。この場合も本発明で得られるグラフト共重合体が相
溶性付与剤として働き、良好な均一ブレンド性を示す組
成物が得られる。Further, the graft copolymer (composition) obtained in the present invention can be further blended with vinyl polymers of the same or different kind and aromatic polysulfones for practical use. In this case as well, the graft copolymer obtained by the present invention acts as a compatibility imparting agent, and a composition exhibiting good uniform blendability can be obtained.
本発明で得られるグラフト共重合体は芳香族ポリスルホ
ンとビニル重合体との単なるブレンド物に比べて耐熱性
が向上するばかりでなく、さらに組成物構成成分間の相
溶性が向上し、その結果成形品の表面平滑性も改善され
、夢なるブレンド物の場合見られた層状剥離傾向も減少
する。また、芳香族ポリスルホン類そのもの・に比べる
と流動性が大巾によくなり、溶融成形性が改善される。The graft copolymer obtained by the present invention not only has improved heat resistance compared to a simple blend of aromatic polysulfone and vinyl polymer, but also has improved compatibility between the constituent components of the composition, resulting in moldability. The surface smoothness of the product is also improved and the delamination tendency seen in the case of dream blends is also reduced. Furthermore, the fluidity is much better than that of aromatic polysulfones themselves, and the melt moldability is improved.
本発明の方法により得られるグラフト共重合体は、さら
に必要に応じて他の縮合系重合体、たとえば、ポリカー
ボネート、ナイロン、ポリエステルなどと混合使用する
こともできる。また、必要に応じて顔料、補強剤、充填
剤、酸化防止剤、各種安定剤、可塑剤、滑剤または離型
剤などの各種添加剤を補助的に添加することもできる。The graft copolymer obtained by the method of the present invention can be further mixed with other condensation polymers such as polycarbonate, nylon, polyester, etc., if necessary. Furthermore, various additives such as pigments, reinforcing agents, fillers, antioxidants, various stabilizers, plasticizers, lubricants, or mold release agents may be added as auxiliaries, if necessary.
また、発泡剤を配合して発泡材料を形成することもでき
る。Moreover, a foaming material can also be formed by blending a foaming agent.
上記添加剤として、具体的には、たとえば、酸化チタン
、カーボンブラック、カドミウム赤、住友化学■社製シ
アニンブルーHBなどの顔料、ガラス繊維、炭素繊維、
アスベストなどの補強剤、炭酸カルシウム、クレー、タ
ルク、セルロース粉、シリカなどの充填剤、3,5−ジ
ーtert−4−ヒドロキシトルエン、4.4−一プチ
リデンビスー(6−tert−ブチル−m−クレゾール
)などのヒンダードフェノール系酸化防止剤、ジフェニ
ルモノイソデシルホスファイト、ラウリル−tert−
ブチルフェニルホスファイトなどのホスファイト系安定
剤、ステアリン酸金属塩などの有機金属塩系安定剤、ジ
オクチルフタレート、ジメチルフタレートなどのフタル
酸誘導体、ジー(2−エチルへキシルアゼレート)、ジ
イソオクチルアゼレートなどのアゼライン酸誘導体、ブ
チルオレートなどのオレイン酸誘導体、ベンゼンスルホ
ンブチルアミドなどのスルホン酸誘導体などで代表され
る可塑剤、シリコーン系離型剤、エチレンビスステアリ
ルアミド、メチレンビスステアリルアミド、オクチルア
ルコール、セチルアルコール、植物油、(たとえば、用
研ファインケミカル社製に一3WAX)、鉱物油(たと
えば、日本サンオイル社製サンセン−250)などの滑
剤、重炭酸ナトリウム、N、N゛−ジニトロソペンタメ
チレンテトラミン、アゾジカルボンアミド、ベンゼンス
ルボニルヒドラジドなどの発泡剤が挙げられる。Examples of the above-mentioned additives include pigments such as titanium oxide, carbon black, cadmium red, and cyanine blue HB manufactured by Sumitomo Chemical Co., Ltd., glass fibers, carbon fibers,
Reinforcing agents such as asbestos, fillers such as calcium carbonate, clay, talc, cellulose powder, silica, 3,5-di-tert-4-hydroxytoluene, 4,4-butylidene bis(6-tert-butyl-m-cresol) ), hindered phenolic antioxidants such as diphenyl monoisodecyl phosphite, lauryl-tert-
Phosphite stabilizers such as butylphenyl phosphite, organometallic salt stabilizers such as metal stearate, phthalic acid derivatives such as dioctyl phthalate and dimethyl phthalate, di(2-ethylhexyl azelate), diisooctyl Plasticizers such as azelaic acid derivatives such as azelate, oleic acid derivatives such as butyl oleate, sulfonic acid derivatives such as benzenesulfone butyramide, silicone mold release agents, ethylene bis stearyl amide, methylene bis stearyl amide, octyl Lubricants such as alcohol, cetyl alcohol, vegetable oil (for example, 13 WAX manufactured by Yoken Fine Chemical Co., Ltd.), mineral oil (for example, Sansen-250 manufactured by Nippon Sun Oil Co., Ltd.), sodium bicarbonate, N,N-dinitrosopenta. Foaming agents such as methylenetetramine, azodicarbonamide, and benzenesulfonyl hydrazide may be mentioned.
本発明で得られるグラフト重合体は優れた物理的、機械
的、化学的、電気的、熱的性質を有しており、多くの用
途に活用することができる。The graft polymer obtained by the present invention has excellent physical, mechanical, chemical, electrical, and thermal properties, and can be used for many purposes.
たとえば、自動車部品、電気・電子機器部品、給配水機
器部品、事務機部品、侃空機部品、特殊機械部品などに
有用である。For example, it is useful for automobile parts, electric/electronic equipment parts, water supply and distribution equipment parts, office machine parts, air/aircraft parts, special machine parts, etc.
以下、実施例を挙げて本発明をさらに詳述する。Hereinafter, the present invention will be further explained in detail by giving Examples.
なお、本実施例に示す%および部の値は特にことわらな
いかぎりそれぞれ重量%および1fL量部を意味する。Note that the values of % and parts shown in this example mean % by weight and parts by 1 fL, respectively, unless otherwise specified.
〈実施例〉
実施例1
(1)P−クロルメチルスチレン共重合体の製造撹拌機
、温度計、還流冷却管および窒素ガス導入管を備えた内
容積500m1のフラスコ中に、アクリロニトリル48
ir(0,906モル)、スチレン144゜8g(1,
392モル)、P−クロルメチルスチレン7.2g(0
,047モル)、アゾビスイソブチロニトリル0.74
g、水400g、メタクリル酸メチル/アクリルアミド
(20/80)共重合体の部分ケン化物0.2g、リン
酸二水素ナトリウム0.1gおよびt−ドデシルメルカ
プタン0.48gを仕込んで撹拌し、窒素ガスを流しな
がら、70℃で2時間、続いて90℃で1時間保持して
懸濁重合を行なった。<Examples> Example 1 (1) Production of P-chloromethylstyrene copolymer In a flask with an internal volume of 500 m1 equipped with a stirrer, a thermometer, a reflux condenser, and a nitrogen gas introduction tube, 48% of acrylonitrile was added.
ir (0,906 mol), styrene 144°8g (1,
392 mol), P-chloromethylstyrene 7.2 g (0
,047 mol), azobisisobutyronitrile 0.74
g, 400 g of water, 0.2 g of partially saponified methyl methacrylate/acrylamide (20/80) copolymer, 0.1 g of sodium dihydrogen phosphate, and 0.48 g of t-dodecylmercaptan were charged, stirred, and heated with nitrogen gas. Suspension polymerization was carried out at 70° C. for 2 hours and then at 90° C. for 1 hour while flowing.
次の得られた粒状重合体を遠心分離機で脱水したのち、
水で十分に洗浄し、真空乾燥機にて70℃で18時間乾
燥したところ、淡黄色のアクリロニトリル/スチレン/
P−クロルメチルスチレン共重合体が184g(収率9
2%)得られた。After dehydrating the obtained granular polymer using a centrifuge,
After thoroughly washing with water and drying in a vacuum dryer at 70°C for 18 hours, a pale yellow acrylonitrile/styrene/
184g of P-chloromethylstyrene copolymer (yield: 9
2%) was obtained.
このクロルメチルスチレン共重合体中の塩素含量をJI
SK−5580に準拠して定量したところ0.24ミリ
モル/g−ポリマーであり、初期仕込みどおり、P−ク
ロルメチルスチレン単位が約2モル%共重合されている
ことを確認した。The chlorine content in this chloromethylstyrene copolymer is determined by JI
A quantitative determination according to SK-5580 revealed that the amount was 0.24 mmol/g-polymer, confirming that about 2 mol % of P-chloromethylstyrene units were copolymerized as initially charged.
(2)末端にナトリウムフェルレート基を有する芳香族
ポリスルホンの製造
撹拌機、温度計、ガス導入管および留去管を備えた30
0m1フラスコにジメチルスルホキシド50g、クロル
ベンゼン133g、ビスフェノールA22.8g(0,
10モル)および4,4゛−ジクロルジフェニルスルホ
ン28゜7g(0,10モル)を仕込み、直ちに窒素で
置換し、以後反応操作中、窒素を少量流し・続けた。こ
の反応溶液を75℃まで加熱したのち、50%濃度の水
酸化ナトリウム水溶?r!16、Og(0,20モル)
を加え、次いで120℃まで加熱すると水/クロルベン
ゼン共沸混合物が系から留出しはじめた。共沸混合物の
留出を継続すると徐々に内湯が上昇し、140℃になる
と系中の水がほとんど完全に除去され、ビスフェノール
の2・ナトリウム塩が析出した9次に約20分にわたっ
て温度を徐々C′:l約170℃まで上昇させ、過剰の
クロルベンゼンを留出除去した。この時点でビスフェノ
ールAの2・ナトリウム塩は溶解して反応系が均一にな
るとともに、重合反応がかなり進行した。反応物の温度
を速やかに150〜160℃まで低下させ、この温度で
1時1間撹拌して重合反応を行なわせた。その後、反応
混合物をクロルベンゼン200gで希釈してからr紙を
セットしたブフナーロートで吸引濾過して副生塩化ナト
リウムおよび少量のゲル分を除去した。P液を5倍量の
メタノール中に投入して凝固させることにより重合体を
分離し、70℃で16時間真空乾燥したところ、末端に
ナトリウムフェルレート基を有する芳香族ポリスルホン
が42.Or(収率95%)得られた。(2) Production of aromatic polysulfone having a sodium ferulate group at the end
In a 0ml flask, 50g of dimethyl sulfoxide, 133g of chlorobenzene, 22.8g of bisphenol A (0,
10 mol) and 28.7 g (0.10 mol) of 4,4'-dichlorodiphenylsulfone were charged, the atmosphere was immediately replaced with nitrogen, and a small amount of nitrogen was continued to flow during the reaction operation. After heating this reaction solution to 75°C, a 50% sodium hydroxide aqueous solution was prepared. r! 16, Og (0.20 mol)
was added and then heated to 120° C., and a water/chlorobenzene azeotrope began to distill from the system. As the distillation of the azeotrope continued, the internal hot water gradually rose, and when it reached 140°C, the water in the system was almost completely removed, and the di-sodium salt of bisphenol precipitated.9 Then, the temperature was gradually lowered over about 20 minutes. C':l The temperature was raised to about 170°C, and excess chlorobenzene was distilled off. At this point, the di-sodium salt of bisphenol A was dissolved, the reaction system became homogeneous, and the polymerization reaction progressed considerably. The temperature of the reactant was quickly lowered to 150-160°C, and the mixture was stirred at this temperature for 1 hour and 1 hour to carry out the polymerization reaction. Thereafter, the reaction mixture was diluted with 200 g of chlorobenzene and suction filtered using a Buchner funnel equipped with r paper to remove by-product sodium chloride and a small amount of gel. The polymer was separated by pouring the P solution into 5 times the amount of methanol and coagulating it, and vacuum-drying it at 70°C for 16 hours. As a result, an aromatic polysulfone having a sodium ferulate group at the terminal was obtained. Or (yield 95%) was obtained.
(3)グラフト重合体の製造
上記(2)で得られた末端にナトリウムフェルレート基
を有する芳香族ポリスルポン15g、クロルベンゼン1
00CCを撹拌機、温度計、冷却管を有するフラスコに
仕込み完全溶解させた0次に上記(1)で得られたアク
リロニトリル/スチレン/p−クロルメチルスチレン共
重合体(以後、P−クロルメチルスチレン共重合体と略
称する)35gのクロルベンゼン溶液200gを撹拌し
ながら添加し、120℃で2時間反応させた。(3) Production of graft polymer 15 g of the aromatic polysulfone having a sodium ferulate group at the end obtained in (2) above, 1 chlorobenzene
00CC was charged into a flask equipped with a stirrer, a thermometer, and a cooling tube and completely dissolved. Next, the acrylonitrile/styrene/p-chloromethylstyrene copolymer obtained in (1) above (hereinafter referred to as P-chloromethylstyrene) 200 g of a solution of 35 g of chlorobenzene (abbreviated as copolymer) was added with stirring, and the mixture was reacted at 120° C. for 2 hours.
その後、反応混合物を21のメタノール中に投入して凝
固させることにより重合体を分離し、メタノールで十分
に洗浄したのち、70℃で16時間真空乾燥しなところ
p−クロルスチレン共重合体/芳香族ポリスルホン(=
70/30仕込比)グラフト共重合体組成物が定量的に
得られた。Thereafter, the reaction mixture was poured into 21 methanol and coagulated to separate the polymer, thoroughly washed with methanol, and then vacuum dried at 70°C for 16 hours. Group polysulfone (=
A graft copolymer composition (70/30 charging ratio) was quantitatively obtained.
このようにして得られたグラフト共重合体1.0gを1
00 [+11のアセトンに入れ、還流温度条件下で3
時間抽出を行なったところ、抽出残渣は39gであった
。この残渣はポリスルホンおよびグラフト化p−クロル
メチルスチレン共重合体に対応する。このことからポリ
スルホン幹に対するP−クロルメチルスチルシン共重合
体のグラフト率
を計算すると30%であった。1.0 g of the graft copolymer thus obtained was
00 [+11] in acetone under reflux temperature conditions.
When time extraction was performed, the amount of extraction residue was 39 g. This residue corresponds to polysulfone and grafted p-chloromethylstyrene copolymer. From this, the grafting ratio of the P-chloromethylstilcin copolymer to the polysulfone backbone was calculated to be 30%.
また、このグラフト共重合体を温度250℃、圧力40
hg/−の条件下で圧縮成形して、BS法軟化点(イギ
リス規格B52782−102C)を測定しなところ1
29℃であった。なお、上記と同一の重合処方による芳
香族ポリスルホンのBS法軟化点は185℃、また、上
記(1)で製造したアクリロニトリル/スチレン/p−
クロルメチルスチレン共重合体のBS法軟化点は102
℃であるので、本実施例で製造したグラフト重合体のB
S法軟化点実測値は幹ポリスルホンおよび枝アクリロニ
トリル/スチレン/P−クロルメチルスチレン共重合体
のそれぞれのBS法軟化点の値から加成性の原理を用い
て理論的に算出される1ifi(185X0.3+10
2X0.7=126.9℃)を上まわっており、本実施
例のグラフト共重合体が優れた耐熱性を有していること
が明らかである。In addition, this graft copolymer was prepared at a temperature of 250°C and a pressure of 40°C.
Compression molding under hg/- conditions and measurement of BS method softening point (British standard B52782-102C) 1
The temperature was 29°C. The BS method softening point of the aromatic polysulfone made from the same polymerization recipe as above is 185°C, and the acrylonitrile/styrene/p-
The BS method softening point of chloromethylstyrene copolymer is 102
℃, B of the graft polymer produced in this example
The measured value of the S method softening point is 1ifi (185 .3+10
2×0.7=126.9° C.), and it is clear that the graft copolymer of this example has excellent heat resistance.
比較参考例1
実施例1(3)のグラフト重合体の製造においてアクリ
ロニトリル/スチレン/p−クロルメチルスチレン共重
合体35gの代わりにスチレン/アクリロニトリル(7
6/24)共重合体35gを使用する以外はすべて同様
の反応操作および後処理を行なって重合体組成物を得た
。Comparative Reference Example 1 In the production of the graft polymer of Example 1 (3), styrene/acrylonitrile (7 g) was used instead of 35 g of acrylonitrile/styrene/p-chloromethylstyrene copolymer.
6/24) A polymer composition was obtained by performing the same reaction operation and post-treatment except that 35 g of the copolymer was used.
続いて、この重合体組成物のグラフト率を実施例1と同
様の方法で測定したところ0.6%という小さな値であ
った。この結果より、グラフト率の高い重合体を得るた
めにはビニル重合体にクロルメチル基のような活性基が
存在することが重要であることがわかる。Subsequently, when the grafting rate of this polymer composition was measured in the same manner as in Example 1, it was found to be a small value of 0.6%. This result shows that it is important for the vinyl polymer to have an active group such as a chloromethyl group in order to obtain a polymer with a high grafting rate.
また、この重合体組成物についてBS法軟化点を測定し
たところ110°Cであり、実施例1に比べて相当に耐
熱性の劣るものであった。Furthermore, when the softening point of this polymer composition was measured by the BS method, it was 110°C, which was considerably inferior to Example 1 in heat resistance.
実施例2
(1)メタクリル酸クロリド共重合体の製造メタクリル
酸メチル24.4 g (0,244モル)、メタクリ
ル酸クロリド0.94g(0,009モル)およびアゾ
ビスイソブチロニトリル0.09gを均一溶解し、20
+mφのガラス製アンプルに封入した。このアンプルを
オイルバスに入れ、70°Cにて3時間、その後90℃
にて2時間保持して重合を行なったところ無色のメタク
リル酸メチル/メタクリル酸クロリド(97部3モル比
)共重合体が得られた。この重合体を粉砕したのち、真
空乾燥機にて70℃で14時間乾燥した。Example 2 (1) Production of methacrylic acid chloride copolymer Methyl methacrylate 24.4 g (0,244 mol), methacrylic acid chloride 0.94 g (0,009 mol) and azobisisobutyronitrile 0.09 g Uniformly dissolve 20
It was sealed in a +mφ glass ampoule. Place this ampoule in an oil bath at 70°C for 3 hours, then at 90°C.
When polymerization was carried out by holding the mixture for 2 hours, a colorless methyl methacrylate/methacrylic acid chloride (97 parts, 3 molar ratio) copolymer was obtained. After pulverizing this polymer, it was dried in a vacuum dryer at 70°C for 14 hours.
(2)グラフト重合体の製造
実施例1(2)と同様の重合で得られた末端にナトリウ
ムフェルレート基を有する芳香族ポリスルホン15g5
クロルベンゼン70・CCを撹拌機、温度計、冷却管を
有する200ccフラスコに仕込み完全溶解さぜな。(2) Production of graft polymer 15g5 of aromatic polysulfone having a sodium ferrate group at the terminal obtained by polymerization similar to Example 1 (2)
Charge 70.CC of chlorobenzene into a 200cc flask equipped with a stirrer, thermometer, and condenser and dissolve completely.
次に上記(1)で得られたメタクリル酸メチル/メタク
リル酸クロリド(97部3モル比)共重合体15gのク
ロルベンゼン溶液100gを撹拌しながら添加し、50
〜70℃で1時間反応させた。Next, 100 g of a chlorobenzene solution of 15 g of the methyl methacrylate/methacrylic acid chloride (97 parts, 3 molar ratio) copolymer obtained in (1) above was added with stirring,
The reaction was carried out at ~70°C for 1 hour.
その後、反応混合物を11のメタノール中に投入して凝
固させることにより重合体を分離し、温水で十分洗浄し
たのち、70’Cで16時間真空乾燥したところ、メタ
クリル酸メチル共重合体/芳香族ポリスルホン系グラフ
ト共重合体組成物が定量的にに得られた。Thereafter, the reaction mixture was poured into 11 methanol and coagulated to separate the polymer, washed thoroughly with warm water, and vacuum dried at 70'C for 16 hours. A polysulfone-based graft copolymer composition was quantitatively obtained.
次にこのようにして得られたグラフト共重合体のグラフ
ト率を実施例1と同様の方法で測定したところ25%で
あった。また、この重合体のBS法軟化点を測定したと
ころ141°Cという耐熱性の優れたものであった。Next, the graft ratio of the graft copolymer thus obtained was measured in the same manner as in Example 1, and was found to be 25%. Furthermore, when the softening point of this polymer was measured by the BS method, it was found to have excellent heat resistance of 141°C.
比較参考例2
重合終了時に末端停止剤として無水酢酸6g(0,05
8モル)を添加する以外、すべて実施例1(2)と同様
の重合操作および後処理操作を行なって末端を封鎖した
粉末状芳香族ポリスルホンを製造した。Comparative Reference Example 2 At the end of polymerization, 6 g of acetic anhydride (0.05 g
A terminal-capped powdery aromatic polysulfone was produced by performing the same polymerization and post-treatment operations as in Example 1 (2), except that 8 mol) was added.
次にこの末端封鎖芳香族ポリスルホン50部および別に
準備した粒状メタクリル酸メチル重合体く三菱レーヨン
・(a)’社製″アクリペット”)50部をトライブレ
ンド後、ブラベンダープラストグラフ押出機に3回通し
て溶融ブレンドを行なった(処理温度260〜280℃
1、スクリュー回転数25 rpn)、このようにして
得られた溶融ブレンド物ベレットについてBS法軟化点
を測定したところ107℃であり、実施例2に比べて格
段に耐熱性の劣るものであった。Next, 50 parts of this end-blocked aromatic polysulfone and 50 parts of a separately prepared granular methyl methacrylate polymer (Mitsubishi Rayon (A) 'Acrypet') were tri-blended and placed in a Brabender Plastograph extruder for 30 minutes. Melt blending was performed by circulating the mixture (processing temperature: 260-280°C.
1, screw rotation speed 25 rpn). When the BS method softening point of the thus obtained melt blend pellet was measured, it was 107°C, which was significantly inferior in heat resistance compared to Example 2. .
実施例2の結果と比較参考例2の結果を比較すると、グ
ラフト重合体組成物が単なる溶融ブレンド体に比べて耐
熱性の点でははるかに優れていることがわかる。Comparing the results of Example 2 and Comparative Reference Example 2, it can be seen that the graft polymer composition is far superior in heat resistance to a simple melt blend.
実施例3
(1)無水マレイン酸共重合体の製造
撹拌機、温度計および還流冷却管を備えた11フラスコ
中に無水マレイン酸5g(0,051モル)、メタクリ
ル酸メチル95+r(0゜95モル)、アゾビスイソブ
チロニトリル1gおよびメチルエチルケトンIftを仕
込み、撹拌下75℃に加熱し5時間重合を続けた。Example 3 (1) Preparation of maleic anhydride copolymer In a 11 flask equipped with a stirrer, a thermometer and a reflux condenser, 5 g (0,051 mol) of maleic anhydride and 95+r methyl methacrylate (0°95 mol) were added. ), 1 g of azobisisobutyronitrile, and methyl ethyl ketone Ift were charged, and the mixture was heated to 75° C. with stirring and polymerization was continued for 5 hours.
次に、この反応混合物を激しく撹拌している多量の石油
エーテル中に投入して凝固させることにより重合体を分
離し、70℃で16時間真空乾燥したところ無水マレイ
ン酸/メタクリル酸メチル共重合体85g(収率85%
)を得た。Next, this reaction mixture was poured into a large amount of petroleum ether that was being stirred vigorously, and the polymer was coagulated to separate the polymer. After vacuum drying at 70°C for 16 hours, a maleic anhydride/methyl methacrylate copolymer was obtained. 85g (yield 85%
) was obtained.
(2)末端アルカリフェノレート芳香族ポリスルホンの
製造
撹拌機、還流冷却器、温度計、窒素導入管を備えたフラ
スコに4.4−一ジクロルジフェニルスルホン14.3
6g(0,05モル)、50%水酸化カリウム水溶液1
1.2g<0.10モル)およびスルホラン100m1
を仕込み、撹拌上窒素ガスを流しながら140°Cで3
時間反応させたのち、キシレンを15の1添加し、還流
冷却管を留出管と取り替え、さらに3時間反応させるこ
とにより系中の水を共沸除去した。次にキシレンを留出
し反応器の温度を240℃に設定し、7時間重合反応を
行なわせた。生成物を100°Cまで放冷したのち、反
応混合物をグラスフィルターを経由して激しく撹拌して
いる水中に投入し、分散、凝固させることにより重合体
を分離した0次に水洗、遠心分離により重合体を回収し
、110℃で2時間熱風乾燥したのち、120℃で16
時間真空乾燥したところ、末端にカリウムフェルレート
基を有する芳香族ポリスルホンが11g(収率95%)
得られた。(2) Production of aromatic polysulfone with terminal alkali phenolate In a flask equipped with a stirrer, reflux condenser, thermometer, and nitrogen inlet tube, 4.4-1 dichlorodiphenyl sulfone 14.3
6 g (0.05 mol), 50% potassium hydroxide aqueous solution 1
1.2 g < 0.10 mol) and 100 ml of sulfolane
and stirred and heated at 140°C under nitrogen gas for 3 minutes.
After reacting for an hour, 1/15 xylene was added, the reflux condenser was replaced with a distillation pipe, and the reaction was continued for an additional 3 hours to azeotropically remove water in the system. Next, xylene was distilled off, the temperature of the reactor was set at 240°C, and a polymerization reaction was carried out for 7 hours. After the product was allowed to cool to 100°C, the reaction mixture was poured into vigorously stirring water through a glass filter, and the polymer was separated by dispersion and coagulation.Then, the polymer was separated by washing with water and centrifugation. The polymer was collected and dried with hot air at 110°C for 2 hours, and then dried at 120°C for 16 hours.
After vacuum drying for hours, 11 g of aromatic polysulfone with potassium ferulate groups at the end (yield 95%) was obtained.
Obtained.
(3)グラフト重合体の製造
上記(2)で得られた末端にカリウムフェルレート基を
有する芳香族ポリスルホン10gおよびクロルベンゼン
50m1を撹拌機、温度計および冷却管を備えたフラス
コに仕込み完全溶解させた。次に上記(1)で得られた
無水マレイン酸/メタクリル酸メチル共重合体10gの
クロルベンゼン溶液60rを撹拌しながら添加し、70
〜100℃で1時間反応させた。(3) Production of graft polymer 10 g of the aromatic polysulfone having terminal potassium ferrate groups obtained in (2) above and 50 ml of chlorobenzene were placed in a flask equipped with a stirrer, a thermometer, and a cooling tube, and completely dissolved. Ta. Next, 60 r of a chlorobenzene solution containing 10 g of the maleic anhydride/methyl methacrylate copolymer obtained in (1) above was added with stirring, and 70
The reaction was carried out at ~100°C for 1 hour.
その後反応混合物を11のメタノール中に投入して凝固
させることにより重合体を分離し、温水で十分洗浄した
のち、70℃で16時間真空乾燥したところ、メタクリ
ル酸メチル共重合体/芳香族ポリスルホン系グラフト共
重合体組成物が定量的に得られた。Thereafter, the reaction mixture was poured into methanol (No. 11) and coagulated to separate the polymer, washed thoroughly with warm water, and vacuum dried at 70°C for 16 hours. A graft copolymer composition was obtained quantitatively.
次に得られたグラフト共重合体のグラフト率を実施例1
と同様の方法で測定したところ42%であった。Next, the grafting ratio of the obtained graft copolymer was determined in Example 1.
When measured in the same manner as above, it was 42%.
実施例4
(1)アリルグリシジルエーテル共重合体の製造スチレ
ン23g<0.221モル)、アクリロニトリル6ir
(0,113モル)、アリルグリシジルエーテルIg(
0,009モル)およびアゾビスイソブチロニトリル0
.09gを均一溶解し、20鴎φガラス製アンプルに封
入した。このアンプルをオイルバスに入れ、70゛Cに
て3時間、その後90℃にて2時間保持して重合を行な
ったところ無色のスチレン/アクリロニトリル/アリル
グリシジル上゛−チル共重合体が得られた。この重合体
を粉砕したのち、真空乾燥機にて70℃で14時間乾燥
した
(2)グラフト共重合体の製造
撹拌機、温度計、ガス導入管および留去管を備えた50
0の■フラスコにジメチルスルホキシド50t、クロル
ベンゼン133g、ビスフェノールA22.8g(0,
10モル)および4.4”−ジクロルジフェニルスルホ
ン28゜7g(0,10モル)を仕込み、直ちに窒素で
置換し、以後反応操作中、窒素を少量流し続けた。この
反応溶液を75℃まで加熱したのち、50%濃度の水酸
化ナトリウム水溶液、16.0g(0,20モル)を加
え、次いで120°Cまで加熱すると水/クロルベンゼ
ン共沸混合物が系から留出しはじめた。共沸混合物の留
出を継続すると徐々に内温が上昇し、140℃になると
系中の水がほとんど完全に除去され、ビスフェノールの
2・ナトリウム塩が析出した0次に約20分にわたって
温度を徐々に約170℃まで上昇させ、過剰のクロルベ
ンゼンを留出除去した。この時点でビスフェノールAの
2・ナトリウム塩は溶解して反応系が均一になるととも
に、重合反応がかなり進行した0反応物の温度を速やか
に150〜160℃まで低下させ、この温度で1時間撹
拌して重合反応を行なわせた0重合終了後、反応混合物
の温度を120℃まで低下し、上記(1)で製造したス
チレン/アクリロニトリル/アリルグリシジルエーテル
共重合体18゜9gのジメチルスルホキシド溶液120
gを添加して(ポリスルホン2アリルグリシジルエーテ
ル共重合体=70/30の仕込比)、150〜160℃
の温度で約1時間撹拌してグラフト反応を行なわせた。Example 4 (1) Production of allyl glycidyl ether copolymer Styrene 23g < 0.221 mol), acrylonitrile 6ir
(0,113 mol), allyl glycidyl ether Ig (
0,009 mol) and azobisisobutyronitrile 0
.. 09 g was uniformly dissolved and sealed in a 20 mm diameter glass ampoule. This ampoule was placed in an oil bath and polymerized by holding it at 70°C for 3 hours and then at 90°C for 2 hours to obtain a colorless styrene/acrylonitrile/allyl glycidyl epi-tyl copolymer. . After pulverizing this polymer, it was dried in a vacuum dryer at 70°C for 14 hours. (2) Production of graft copolymer
50 tons of dimethyl sulfoxide, 133 g of chlorobenzene, and 22.8 g of bisphenol A (0,
10 mol) and 28.7 g (0.10 mol) of 4.4"-dichlorodiphenylsulfone were charged, and the atmosphere was immediately replaced with nitrogen. From then on, a small amount of nitrogen was continued to flow during the reaction operation. The reaction solution was heated to 75°C. After heating, 16.0 g (0.20 mol) of a 50% strength aqueous sodium hydroxide solution was added and then heated to 120°C, and a water/chlorobenzene azeotrope began to distill out of the system.Azeotrope As the distillation continued, the internal temperature gradually rose, and when it reached 140°C, the water in the system was almost completely removed, and the di-sodium salt of bisphenol precipitated. The temperature was raised to 170°C, and excess chlorobenzene was distilled off. At this point, the di-sodium salt of bisphenol A was dissolved and the reaction system became homogeneous, and the temperature of the reactant, in which the polymerization reaction had progressed considerably, was lowered. After the polymerization was completed, the temperature of the reaction mixture was lowered to 120°C, and the styrene/acrylonitrile produced in (1) above was heated. /Allyl glycidyl ether copolymer 18.9g dimethyl sulfoxide solution 120
g (polysulfone 2 allyl glycidyl ether copolymer = 70/30 charging ratio), 150-160°C
The graft reaction was carried out by stirring at a temperature of about 1 hour.
その後、反応混合物をクロルベンゼン200gで希釈し
てから濾紙をセットしたブフナーロートで吸引沢過して
副生塩化ナトリウムおよび少量のゲル分を除去した。炉
液を5倍量のメタノール中に投入して凝固させることに
より重合体を分離し、70℃で16時間真空乾燥したと
ころ、ポリスルホン/アリルグリシジルエーテル共重合
体系グラフト共重合体が56.8g(収率90.0%)
得られた。Thereafter, the reaction mixture was diluted with 200 g of chlorobenzene and suction filtered using a Buchner funnel equipped with a filter paper to remove by-product sodium chloride and a small amount of gel. The polymer was separated by pouring the furnace solution into 5 times the amount of methanol and coagulating it, and vacuum-dried it at 70°C for 16 hours. As a result, 56.8 g of the polysulfone/allyl glycidyl ether copolymer-based graft copolymer was obtained ( yield 90.0%)
Obtained.
得られたグラフト共重合体について実施例1と同様にし
て、幹ポリスルホンに対するスチレン/アクリロニトリ
ル/アリルグリシジルエーテル共重合体のグラフト率を
測定したところ15.6%であった。Regarding the obtained graft copolymer, the grafting ratio of the styrene/acrylonitrile/allyl glycidyl ether copolymer to the main polysulfone was measured in the same manner as in Example 1, and it was found to be 15.6%.
Claims (1)
基、グリシジル基、ハロメチル基およびスルホニルハラ
イド基から選ばれた官能基を1種または2種以上有する
活性ビニル重合体または共重合体(A)と末端にフェノ
ール性水酸基またはアルカリフェノレート基を有するポ
リアリーレンエーテルスルホン(B)を極性有機溶媒中
で反応させることを特徴とするグラフト共重合体の製造
方法。An activated vinyl polymer or copolymer having 0.05 to 30% by weight of one or more functional groups selected from acid halide groups, acid anhydride groups, glycidyl groups, halomethyl groups, and sulfonyl halide groups in the side chain. A method for producing a graft copolymer, which comprises reacting a polymer (A) with a polyarylene ether sulfone (B) having a phenolic hydroxyl group or an alkali phenolate group at its terminal in a polar organic solvent.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8754588A JPS63270739A (en) | 1988-04-08 | 1988-04-08 | Production of graft copolymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8754588A JPS63270739A (en) | 1988-04-08 | 1988-04-08 | Production of graft copolymer |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2565479A Division JPS55118926A (en) | 1979-03-07 | 1979-03-07 | Production of graft copolymer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63270739A true JPS63270739A (en) | 1988-11-08 |
JPS6411661B2 JPS6411661B2 (en) | 1989-02-27 |
Family
ID=13917954
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8754588A Granted JPS63270739A (en) | 1988-04-08 | 1988-04-08 | Production of graft copolymer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63270739A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5612425A (en) * | 1991-03-30 | 1997-03-18 | Basf Aktiengesellschaft | Molding compositions based on modified polyaryl ethers |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0441238U (en) * | 1990-08-03 | 1992-04-08 |
-
1988
- 1988-04-08 JP JP8754588A patent/JPS63270739A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5612425A (en) * | 1991-03-30 | 1997-03-18 | Basf Aktiengesellschaft | Molding compositions based on modified polyaryl ethers |
Also Published As
Publication number | Publication date |
---|---|
JPS6411661B2 (en) | 1989-02-27 |
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