JPS63269446A - 電子ビーム装置 - Google Patents

電子ビーム装置

Info

Publication number
JPS63269446A
JPS63269446A JP10303287A JP10303287A JPS63269446A JP S63269446 A JPS63269446 A JP S63269446A JP 10303287 A JP10303287 A JP 10303287A JP 10303287 A JP10303287 A JP 10303287A JP S63269446 A JPS63269446 A JP S63269446A
Authority
JP
Japan
Prior art keywords
charged beam
sources
charged
source
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10303287A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0574181B2 (enrdf_load_stackoverflow
Inventor
Masahiko Okunuki
昌彦 奥貫
Isamu Shimoda
下田　勇
Mamoru Miyawaki
守 宮脇
Takeo Tsukamoto
健夫 塚本
Akira Suzuki
彰 鈴木
Tetsuya Kaneko
哲也 金子
Toshihiko Takeda
俊彦 武田
Mitsuaki Seki
関　光明
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10303287A priority Critical patent/JPS63269446A/ja
Publication of JPS63269446A publication Critical patent/JPS63269446A/ja
Publication of JPH0574181B2 publication Critical patent/JPH0574181B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
JP10303287A 1987-04-28 1987-04-28 電子ビーム装置 Granted JPS63269446A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10303287A JPS63269446A (ja) 1987-04-28 1987-04-28 電子ビーム装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10303287A JPS63269446A (ja) 1987-04-28 1987-04-28 電子ビーム装置

Publications (2)

Publication Number Publication Date
JPS63269446A true JPS63269446A (ja) 1988-11-07
JPH0574181B2 JPH0574181B2 (enrdf_load_stackoverflow) 1993-10-15

Family

ID=14343317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10303287A Granted JPS63269446A (ja) 1987-04-28 1987-04-28 電子ビーム装置

Country Status (1)

Country Link
JP (1) JPS63269446A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5430292A (en) * 1991-06-10 1995-07-04 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus
US5557105A (en) * 1991-06-10 1996-09-17 Fujitsu Limited Pattern inspection apparatus and electron beam apparatus

Also Published As

Publication number Publication date
JPH0574181B2 (enrdf_load_stackoverflow) 1993-10-15

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