JPS63269347A - Production of optical recording medium - Google Patents
Production of optical recording mediumInfo
- Publication number
- JPS63269347A JPS63269347A JP10368387A JP10368387A JPS63269347A JP S63269347 A JPS63269347 A JP S63269347A JP 10368387 A JP10368387 A JP 10368387A JP 10368387 A JP10368387 A JP 10368387A JP S63269347 A JPS63269347 A JP S63269347A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- optical recording
- photopolymer
- recording medium
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 12
- 238000004519 manufacturing process Methods 0.000 title claims description 4
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 238000000034 method Methods 0.000 claims abstract description 15
- 239000012298 atmosphere Substances 0.000 claims abstract description 11
- 238000000465 moulding Methods 0.000 claims abstract description 5
- 239000011261 inert gas Substances 0.000 claims description 7
- 239000007788 liquid Substances 0.000 abstract description 17
- 239000011347 resin Substances 0.000 abstract description 8
- 229920005989 resin Polymers 0.000 abstract description 8
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 abstract description 6
- 239000011521 glass Substances 0.000 abstract description 6
- 239000000178 monomer Substances 0.000 abstract description 4
- 229910052786 argon Inorganic materials 0.000 abstract description 3
- 229910052759 nickel Inorganic materials 0.000 abstract description 3
- 230000003647 oxidation Effects 0.000 abstract description 3
- 238000007254 oxidation reaction Methods 0.000 abstract description 3
- 239000006087 Silane Coupling Agent Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 abstract description 2
- 238000004381 surface treatment Methods 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 238000012856 packing Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 11
- 238000007796 conventional method Methods 0.000 description 6
- 238000001723 curing Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000004417 polycarbonate Substances 0.000 description 4
- 229920000515 polycarbonate Polymers 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 229910002546 FeCo Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- 235000017166 Bambusa arundinacea Nutrition 0.000 description 1
- 235000017491 Bambusa tulda Nutrition 0.000 description 1
- 241001330002 Bambuseae Species 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 241000343203 Lidia Species 0.000 description 1
- 235000015334 Phyllostachys viridis Nutrition 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000011425 bamboo Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、レーザー光を用いて、情報の書き込み、読み
出しを行なう光記録媒体の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method of manufacturing an optical recording medium in which information is written and read using laser light.
JOlJRNAL OF RADIATIONCU
RING JANUARY 1084で、A、J、
M、VAN DEN IIROEK等が従来の7オ
トボリマーを用いた基板成型方法(2P法)について述
べている。大気中で、スタンバ上にフォトポリマーを塗
布し、円形基μを径方向に均一に湾曲させた吠態で、紫
外線硬化#!#鮨に接触させ、気泡が入らないよう、ス
タンバと基板ノ間に樹脂を充1ハする方法である。又、
AUDIOENGINEERING 5oCIETY
1084 0CTOnER8−11NEW YO
Rl(で松下電器産業が発表している。大気中において
スタンバセンターホール近傍から、紫外線硬化樹脂を、
スタンバと基板の間に充填する方法である。JOlJRNAL OF RADIATIONCU
In RING JANUARY 1084, A, J,
M., VAN DEN IIROEK et al. describe a conventional substrate molding method (2P method) using 7 otobolimer. In the atmosphere, photopolymer is applied on the stanbar, the circular base μ is uniformly curved in the radial direction, and UV curing #! #This is a method in which resin is placed in contact with the sushi and filled between the stand bar and the substrate to prevent air bubbles from entering. or,
AUDIO ENGINEERING 5oCIETY
1084 0CTOnER8-11NEW YO
Matsushita Electric Industrial Co., Ltd. has announced this in Rl.
This is a method of filling the gap between the stand bar and the substrate.
(発明が解決しようとする問題点〕
従来の技術では大気中に於て、スタンバと基板の間に紫
外線硬化樹脂(2P液)を充填する為、充in した2
P液中への気泡の混入を完全に防止する事は不可能であ
った。しかも、2P液中への気泡混入は、硬化膜バース
トエラーの原因となったリ、スタンバへの2P硬化物の
固aにより、スタンパ信号の複製時劣化の原因となって
いた。又、2P液を充填した後、紫外線を照射させて硬
化させる際、大気中充填では、基板と2P液の界面、ス
タンバと2P液の界面、及び液中の酸素分子の除去が困
難であった。酸素分子の存在下では、2P液の硬化反応
不足の為、2P液中のモノマーが未反応の形で存在する
ことから、2P法を用いた2i板で、光磁気ディスク等
の光記録媒体を作製した場合、記録材料(TbFeCo
、TbGdFeCo、NdDyFeCo等)の酸化を進
行させていた。(Problem to be solved by the invention) In the conventional technology, ultraviolet curing resin (2P liquid) is filled between the standber and the substrate in the atmosphere.
It was impossible to completely prevent air bubbles from entering the P liquid. Moreover, the inclusion of air bubbles in the 2P liquid caused burst errors in the cured film, and the solidity of the 2P cured product on the standber caused deterioration of the stamper signal during duplication. In addition, when irradiating the 2P liquid and curing it with ultraviolet rays, it was difficult to remove the interface between the substrate and the 2P liquid, the interface between the standber and the 2P liquid, and the oxygen molecules in the liquid when filling in the atmosphere. . In the presence of oxygen molecules, the curing reaction of the 2P liquid is insufficient, and the monomers in the 2P liquid exist in an unreacted form. When fabricated, recording material (TbFeCo
, TbGdFeCo, NdDyFeCo, etc.).
そこで本発明は、このような問題点を解決するものでそ
の目的とするところは、2P硬化樹脂への気泡の混入を
防止し、且つ2P液硬化樹脂の反応性を高める事で、未
反応モノマーの存在を低減し、光記録媒体の耐酸化性を
向上することにある。Therefore, the present invention is intended to solve these problems.The purpose of the present invention is to prevent air bubbles from being mixed into the 2P liquid curing resin, and to increase the reactivity of the 2P liquid curing resin, thereby removing unreacted monomers. The objective is to reduce the presence of oxidation and improve the oxidation resistance of optical recording media.
本発明は、フォトポリマーを用いて、スタンバの凹凸、
即ち、プリフォーマット部、及びプリグルーブ部を写し
取る基板成型方法(2P法)に於て、スタンバと透明基
板間にフォトポリマーを充Jiする操作を、不活性ガス
雰囲気中で行なうことを特徴とする。The present invention uses a photopolymer to improve the unevenness of the stand bar.
That is, in a substrate molding method (2P method) in which a preformat part and a pregroove part are copied, the operation of filling a photopolymer between a standber and a transparent substrate is performed in an inert gas atmosphere. .
〔実施例1〕
第1図に本発明に基づく光紀録媒体用レプリカの断面図
を示す。[Example 1] FIG. 1 shows a cross-sectional view of a replica for optical record media based on the present invention.
■はガラス基板、2はシランカフプリング剤層(ここで
はγ−メタクリロキシプロピルートリメトキシシランを
用いた)、3は2P法で形成されたプリグルーブ部(配
合内容はTIIFA:テトラヒドロフルフリルアクリレ
−)80ff[n%、TMPTA:)リメチロールプロ
バ/トリアクリレートIEiffKffi%、イルガキ
ュア651:チバガイギー社製光重合開始剤dffl量
%)である。2 is a glass substrate, 2 is a silane cuff pulling agent layer (γ-methacryloxypropyltrimethoxysilane is used here), and 3 is a pregroove portion formed by the 2P method (the composition is TIIFA: tetrahydrofurfuryl acrylic). 80ff [n%, TMPTA:) limethylolproba/triacrylate IEiffKffi%, Irgacure 651: Ciba Geigy photopolymerization initiator dffl amount%).
第2図は本発明で使用する貼り合せ装置の概略を示す構
成図である。FIG. 2 is a configuration diagram showing an outline of a bonding apparatus used in the present invention.
4はニッケルスタンバで、例えばピッチl、6μm1溝
中0.8μm、溝深さ600人、厚み0・3mmの化様
である。4 is a nickel stump bar, for example, pitch 1, 0.8 μm in 6 μm groove, groove depth 600 mm, thickness 0.3 mm.
5はフラット基板で、前述の如く表面処理を施したガラ
ス基板である。5 is a flat substrate, which is a glass substrate subjected to surface treatment as described above.
6はディスペンスノズルで、2P液をニッケルスタンバ
上に滴下する。6 is a dispensing nozzle that drops the 2P liquid onto the nickel stanbar.
7は基板支持アームで、2P液が滴下された後フラ2)
基板の支持をはずす。7 is the substrate support arm, and after the 2P liquid is dropped, it is held 2)
Remove support from the board.
8は支持台で、下部のモーターと接続しており全体が回
転する。8 is the support stand, which is connected to the motor at the bottom and rotates the whole thing.
装置内はガスフローが可能な構造となっており、アルゴ
ン、窒素、ヘリウム等の不活性ガス雰囲気を形成できる
。The inside of the device is structured to allow gas flow, and an inert gas atmosphere such as argon, nitrogen, helium, etc. can be created.
該2P液は、波長365nm、強度50mw/cm”の
紫外線を10秒照射し、硬化させる。The 2P liquid is cured by irradiating it with ultraviolet light having a wavelength of 365 nm and an intensity of 50 mw/cm'' for 10 seconds.
第3図に作製したvi竹貼り合せディスクの断面図を示
す。ここで、11はガラス基板、12はシランカップリ
ング剤層、13は2Pレプリ力層、14は、保護層(!
!化ラうミ二ウつ窒化シリコン複合層)、15は、Tb
FeCo層、16は、2P接む層、17は、フラットガ
ラス基板である。FIG. 3 shows a cross-sectional view of the vi bamboo laminated disk produced. Here, 11 is a glass substrate, 12 is a silane coupling agent layer, 13 is a 2P repliability layer, and 14 is a protective layer (!
! 15 is Tb
The FeCo layer 16 is a 2P contact layer, and 17 is a flat glass substrate.
不活性ガスはいずれの場合も気泡は兄られなかった。No bubbles were formed with the inert gas in either case.
従来法により、大気中で製作した前記光磁気記録媒体で
、本発明により、不活性ガス雰囲気中で製作した光磁気
記録媒体とを60°C×90%Rtlの恒温恒湿槽に入
れて、耐候性の試験を行なった結果、本発明による光磁
気記録媒体は従来法に比較し、約2倍の耐久性が得られ
た。The magneto-optical recording medium produced in the atmosphere by the conventional method and the magneto-optical recording medium produced in an inert gas atmosphere according to the present invention are placed in a constant temperature and humidity chamber at 60°C x 90% RTL, As a result of a weather resistance test, the magneto-optical recording medium according to the present invention had about twice the durability as compared to the conventional method.
〔実施例2〕
第4図に別の密廿貼り合せディスクの断面図を示す。こ
こで21はポリカーボネート基板、22は2Pレプリ力
層、23は保護層(窒化シリコン層)、24はNdDy
FeCo層、25は2P接着層、26はフラットポリカ
ーボネート基板である。[Example 2] FIG. 4 shows a sectional view of another closely bonded disk. Here, 21 is a polycarbonate substrate, 22 is a 2P repulsion layer, 23 is a protective layer (silicon nitride layer), and 24 is NdDy.
A FeCo layer, 25 a 2P adhesive layer, and 26 a flat polycarbonate substrate.
ポリカーボネート基板21を実施例1と同様の貼り合せ
装置にセットし、ニラクルスタンバの溝形状を、2N)
液で転写硬化させる。The polycarbonate substrate 21 was set in the same bonding device as in Example 1, and the groove shape of the Nirakuru stambar was adjusted to 2N).
Transfer and cure with liquid.
使用不活性ガスとしてアルゴン、窒素、フ1/オフ (
CF、)を使用したが、いずれの場合も気泡の発生は皆
無であった。The inert gases used are argon, nitrogen, and F1/Off (
CF, ) was used, but no bubbles were generated in any case.
かかる光記録媒体と、従来法による光記録媒体を60°
C×90%R11の恒温恒湿槽に入れ、耐候性試験を行
なった。その結果を第5図に示す。Such an optical recording medium and an optical recording medium according to a conventional method are separated at 60°.
It was placed in a constant temperature and humidity chamber of C x 90% R11, and a weather resistance test was conducted. The results are shown in FIG.
ここで31.32は従来法の場合、33.34は本発明
に1λづく場合である。Here, 31.32 is for the conventional method, and 33.34 is for the present invention with 1λ added.
耐候性はn、E、R,<ビットエラーレート)の時間変
化をチェックしたが、従来法に比較し本発明の場合は約
2倍の耐久性が得られた。Weather resistance was checked by checking the change in n, E, R, <bit error rate) over time, and it was found that the present invention had approximately twice the durability compared to the conventional method.
なお実施例では、2Pレプリ力層として、Tl11?Δ
/ T M I’ T Aを使用した場合を例にあげた
がLI D I) A (ヘキザンジオールジアクリレ
ート)、NPGDA(ネオベクチルグリコールジアクリ
レート)の場合にも同様の結果が得られており、又光重
合CI始剤についてもイルガキュラ65!の他イルガキ
ュア907の場合にも同様の結果が得られた。又、サブ
ストレートについても、ガラス、ポリカーボネート以外
に、エポキシ、PMMAlAPO等、光透過性を有する
基板は同発明と同様の効果が得られた。In addition, in the example, Tl11? is used as the 2P repliability layer. Δ
/ TMI'TA was used as an example, but similar results were obtained with LIDIA (hexanediol diacrylate) and NPGDA (neobectyl glycol diacrylate). , Irgacula 65! is also used as a photopolymerization CI initiator. Similar results were obtained with Irgacure 907. Regarding the substrate, in addition to glass and polycarbonate, substrates having light transmittance such as epoxy and PMMAAlAPO were used to obtain the same effect as in the same invention.
更に、記録媒体として光磁気配L1層を使用する場合を
例にあげて説明したが、相変化型、打機色素記録層を使
用する他の光記録媒体にも適用可能である。Furthermore, although the case where the magneto-optical distribution L1 layer is used as an example is explained as a recording medium, it is also applicable to other optical recording media using a phase-change type or perforation dye recording layer.
以上詳述した如く、本発明によれば、フォトポリマーを
用いて、スタンバの凹凸部、即ちプリフォーマット部、
及びプリグルーブ部を写し取る基板成型方法(2P法)
に於て、スタンバと透明基板間にフォトポリマーを充填
する操作を、不活性ガス雰囲気中で行なうことにより、
2P硬化樹脂への気泡の混入を防止でき、気泡混入に帰
因するバーストエラーをなくす事が可11ヒとなった。As described in detail above, according to the present invention, by using a photopolymer, the uneven portions of the standber, that is, the preformat portion,
And a substrate molding method that copies the pre-groove part (2P method)
By filling the photopolymer between the standber and the transparent substrate in an inert gas atmosphere,
It was possible to prevent air bubbles from entering the 2P cured resin, and it was possible to eliminate burst errors caused by air bubbles.
しかも2P硬化樹脂の反応性を高める事ができ、未反応
モノマーの存在を低減する事が可11ヒとな、た結果、
光記録媒体の耐候性を大幅に改良することができた。Moreover, the reactivity of the 2P cured resin can be increased, and the presence of unreacted monomers can be reduced.
We were able to significantly improve the weather resistance of optical recording media.
第1図は本発明に基づく光紀録媒体用レプリカの断面図
。
第2図は本発明で使用する貼り合せ装置の概略を示す構
成図。
第3図は本発明で作製した密行貼り合せディスクの断面
図。
第4図は本発明で作製した別の密行貼り合せディスクの
断面図。
第5図は従来法と本発明に基づく光記録媒体の耐候性試
験の結果を示す図である。
以 上
出願人 セイコーエプソン株式会社
ろ 2Pノ脩
第2 図
第 S 図FIG. 1 is a sectional view of a replica for optical record media according to the present invention. FIG. 2 is a block diagram schematically showing a bonding apparatus used in the present invention. FIG. 3 is a cross-sectional view of a closely laminated disk produced according to the present invention. FIG. 4 is a cross-sectional view of another closely laminated disk produced according to the present invention. FIG. 5 is a diagram showing the results of weather resistance tests of optical recording media based on the conventional method and the present invention. Applicant Seiko Epson Co., Ltd. 2P No. 2 Figure S
Claims (1)
フォーマット部、及びプリグルーブ部を写し取る基板成
型方法(2P法)に於て、スタンパと透明基板間にフォ
トポリマーを充填する操作を、不活性ガス雰囲気中で行
なうことを特徴とする光記録媒体の製造方法。In a substrate molding method (2P method) that uses a photopolymer to copy the irregularities of a stamper, that is, the preformat part and the pregroove part, the operation of filling the space between the stamper and the transparent substrate with the photopolymer is performed in an inert gas atmosphere. 1. A method for manufacturing an optical recording medium, characterized in that the manufacturing method is carried out inside.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10368387A JPS63269347A (en) | 1987-04-27 | 1987-04-27 | Production of optical recording medium |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10368387A JPS63269347A (en) | 1987-04-27 | 1987-04-27 | Production of optical recording medium |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63269347A true JPS63269347A (en) | 1988-11-07 |
Family
ID=14360582
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10368387A Pending JPS63269347A (en) | 1987-04-27 | 1987-04-27 | Production of optical recording medium |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63269347A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7018674B2 (en) * | 2001-03-02 | 2006-03-28 | Omron, Corporation | Manufacturing methods and apparatuses of an optical device and a reflection plate provided with a resin thin film having a micro-asperity pattern |
-
1987
- 1987-04-27 JP JP10368387A patent/JPS63269347A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7018674B2 (en) * | 2001-03-02 | 2006-03-28 | Omron, Corporation | Manufacturing methods and apparatuses of an optical device and a reflection plate provided with a resin thin film having a micro-asperity pattern |
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