JPS63265169A - Reaction-tube washing apparatus - Google Patents

Reaction-tube washing apparatus

Info

Publication number
JPS63265169A
JPS63265169A JP9864687A JP9864687A JPS63265169A JP S63265169 A JPS63265169 A JP S63265169A JP 9864687 A JP9864687 A JP 9864687A JP 9864687 A JP9864687 A JP 9864687A JP S63265169 A JPS63265169 A JP S63265169A
Authority
JP
Japan
Prior art keywords
water
reaction tube
cleaning
washing
injecting ports
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9864687A
Other languages
Japanese (ja)
Inventor
Hideo Oya
大屋 英郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP9864687A priority Critical patent/JPS63265169A/en
Publication of JPS63265169A publication Critical patent/JPS63265169A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To enhance washing force with physical force and dissolving power of water and to suppress the deposition of contamination on the bottom surface of a reaction tube, by forming spiral belts of water on the wall surface of the reaction tube. CONSTITUTION:A washing nozzle 10 has four injecting ports 12 in a cross shape in the slanted lower direction from the side surface and a sucking port 13 at the tip end. This arrangement is similar to the vanes of a windmill when it is viewed from the upper side. Washing water, which is discharged through the injecting ports 12, flows on the side wall of the reaction tube 2 in a spiral pattern. The water is sucked through the sucking port 13 at the bottom surface, and water streams are formed. The entire wall surface of the reaction tube 2 is uniformly washed by the four spiral belts of washing water from the four injecting ports 12. Washing is performed by utilizing the water streams, which are yielded by the relationship between the positions of the washing-water injecting ports and the sucking port.

Description

【発明の詳細な説明】 [発明の目的] (産業上の利用分野) 本発明は、血清、尿等の液体試料を試薬と反応させ、そ
の反応液の吸光度を自動的に測定し、その吸光度により
濃度を演算表示する検体検査装置に適用される反応管洗
浄装置に関する。
[Detailed Description of the Invention] [Objective of the Invention] (Industrial Application Field) The present invention involves reacting a liquid sample such as serum or urine with a reagent, automatically measuring the absorbance of the reaction solution, and measuring the absorbance. The present invention relates to a reaction tube cleaning device applied to a sample testing device that calculates and displays concentrations.

(従来の技術) 従来の検体検査装置においては、第5図に示すように反
応管を洗浄する場合、洗浄水吐出ノズル1を反応管2に
さし込み、洗浄水を吹き出し口から吹き出し、反応管2
に洗浄水を満たした後、別の吸引ノズル4にて、洗浄水
をその吸引口5から吸引していた。しかしながら、上記
方法では、未だ洗浄用効果が不十分な場合が生じるため
に、より効果のある洗浄法の確立が望まれている。
(Prior art) In a conventional specimen testing apparatus, when cleaning a reaction tube as shown in FIG. tube 2
After filling with cleaning water, another suction nozzle 4 sucked the cleaning water through its suction port 5. However, the above-mentioned methods still have insufficient cleaning effects in some cases, so it is desired to establish a more effective cleaning method.

(発明が解決しようとする問題点) このような、反応管に洗浄水を満たし、それを吸引する
ことにより、反応管を洗浄するという洗浄装置では、洗
浄の効果を高めるためには、洗浄回数を増やすなどの諸
方法があるが、洗浄時間やその機構が複雑となり製造コ
スト高の問題などを解決する必要がある。
(Problems to be Solved by the Invention) In such a cleaning device that cleans the reaction tube by filling the reaction tube with cleaning water and suctioning it, in order to increase the cleaning effect, it is necessary to increase the number of times of cleaning. There are various methods, such as increasing the amount of water, but it is necessary to solve problems such as the cleaning time and the complexity of the mechanism, resulting in high manufacturing costs.

[発明の構成] (問題点を解決するための手段) 本発明は、以上のような時間などの制限を満足しつつ、
洗浄の効果を高めることのできる反応管洗浄装置を提供
することにある。上記目的を達成するために、洗浄ノズ
ルに、洗浄液吹き出し部と吸引部を設け、反応管内壁を
一様に通った洗浄水が、反応管の底で吸引されるという
、反応管内部でのスムーズな水の流れを作りだすことに
より効果的な洗浄を達成する。
[Structure of the invention] (Means for solving the problem) The present invention satisfies the above-mentioned limitations such as time, etc.
An object of the present invention is to provide a reaction tube cleaning device that can enhance the cleaning effect. In order to achieve the above objective, the cleaning nozzle is equipped with a cleaning liquid blowout part and a suction part, so that the cleaning water that has uniformly passed through the inner wall of the reaction tube is sucked in at the bottom of the reaction tube, so that it can flow smoothly inside the reaction tube. Achieve effective cleaning by creating a flow of water.

(作用) 洗浄ノズルに設けられた吹き出し口から吹き出された洗
浄水が反応管の壁面をらせん状に流れ、その後反応管底
部に流れ落ちてきた洗浄水は洗浄ノズルに別に設けられ
た吸引口から吸引されるものである。このような洗浄水
の流れを形成することによって、反応管内壁全面が一様
に、洗浄水によって洗われることとなる。
(Function) The cleaning water blown out from the outlet provided in the cleaning nozzle spirals down the wall of the reaction tube, and then the cleaning water that flows down to the bottom of the reaction tube is sucked through the suction port provided separately in the cleaning nozzle. It is something that will be done. By forming such a flow of washing water, the entire inner wall of the reaction tube is uniformly washed with the washing water.

(実施例) 次に本発明の一実施例について説明する。(Example) Next, one embodiment of the present invention will be described.

第1図は、本発明の反応管洗浄ノズルの一実施例の構成
を示す。洗浄ノズル10は、側面から斜下方に十字に4
つの吹き出し口12および先端に吸引口13を有してい
る。その配置は、上から見ると風ぐるまの羽根のそれに
似たものである。
FIG. 1 shows the structure of an embodiment of the reaction tube cleaning nozzle of the present invention. The cleaning nozzle 10 is arranged in a cross pattern diagonally downward from the side.
It has two blow-off ports 12 and a suction port 13 at the tip. Its arrangement, when viewed from above, resembles that of a pinwheel's wings.

第2図は、本発明の反応管洗浄ノズルを用いた場合の洗
浄状態を構成的に示した図である。吹き出し口12より
吹き出した洗浄水は、反応管2の壁面をらせん状に流れ
ていき、その底面で吸引口13より吸われるという、水
の流れを形成する。
FIG. 2 is a diagram structurally showing a cleaning state when using the reaction tube cleaning nozzle of the present invention. Washing water blown out from the outlet 12 spirals along the wall of the reaction tube 2 and is sucked from the suction port 13 at the bottom, forming a water flow.

4カ所の吹き出し口12からの4本のらせん状の洗浄水
の帯により、反応管2の壁面全体が一様に洗い流される
。このような洗浄水の吹き出し口の位置と吸引口との位
置の関係から発生される水の流れを利用して洗浄をおこ
なうものである。
The entire wall surface of the reaction tube 2 is uniformly washed away by four spiral bands of washing water from the four outlets 12. Cleaning is performed using the flow of water generated from the relationship between the position of the cleaning water outlet and the suction port.

第3図は、本発明の反応管洗浄ノズルの他の実施例の構
成を示す。第2図のものとの違いは、突起状の水吹き出
し部14から、水の吹き出す力によって、吹き出し部を
構成している部分15が回転するスプリンクラ−状構造
を有する。
FIG. 3 shows the structure of another embodiment of the reaction tube cleaning nozzle of the present invention. The difference from the one in FIG. 2 is that it has a sprinkler-like structure in which a portion 15 constituting the water jetting portion rotates due to the force of water jetting out from the protruding water jetting portion 14.

第4図は、第3図に示す反応管洗浄ノズルを用いた場合
の洗浄状態を模式図的に示した図である。
FIG. 4 is a diagram schematically showing a cleaning state when the reaction tube cleaning nozzle shown in FIG. 3 is used.

第4図に示す洗浄ノズルによれば回転吹き出し部15を
有することにより無数の洗浄水の帯が反応管2内壁を流
れることになる。この無数の洗浄水の帯により洗浄効果
を更に高めることができるものである。
According to the cleaning nozzle shown in FIG. 4, countless bands of cleaning water flow on the inner wall of the reaction tube 2 due to the rotating blow-off section 15. The cleaning effect can be further enhanced by this countless bands of cleaning water.

[発明の効果] 以上、詳述したように、本発明によれば、反応管壁面に
らせん状の水の帯を作ることにより、物理的力と水の溶
解力による洗浄力を高め、吸引部による水のすみやかな
吸引の結果、水の沸溜がなくなり、流れが確保でき、反
応管底面への汚れの沈着をも抑えることができ、洗浄効
果も高まる。
[Effects of the Invention] As described in detail above, according to the present invention, by creating a spiral band of water on the wall surface of the reaction tube, the cleaning power due to physical force and the dissolving power of water is increased, and the suction part As a result of the rapid suction of water, there is no boiling of water, ensuring a steady flow, suppressing the deposition of dirt on the bottom of the reaction tube, and increasing the cleaning effect.

しかも、洗浄に伴なうコンタミネーションをすみやかな
吸引の結果、改善される。
Furthermore, contamination caused by cleaning can be quickly suctioned out, which improves the contamination.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明による反応管洗浄ノズルの主要構成を
示した図、第2図は、第1図に示された本発明による反
応管洗浄ノズルの機能を示した図であり、吹出し口から
の洗浄液の吐出及び吸引口における洗浄水の吸引状態を
模式的に示した図、第3図は、本発明による反応管洗浄
ノズルの他の実施例の構成を示した図、第4図は、第3
図に示した反応管洗浄ノズルによる洗浄水゛の流れを模
式的に示し図、及び第5図は、従来の反応管洗浄ノズル
の構成を示した図である。 10・・・洗浄ノズル本体 12.14・・・洗浄液吹き出し口 13・・・洗浄液吸引口 15・・・洗浄液吹き出回転体
FIG. 1 is a diagram showing the main structure of the reaction tube cleaning nozzle according to the present invention, and FIG. 2 is a diagram showing the functions of the reaction tube cleaning nozzle according to the present invention shown in FIG. FIG. 3 is a diagram schematically showing the discharge of cleaning liquid from the inlet and the suction state of cleaning water at the suction port. FIG. 3 is a diagram showing the configuration of another embodiment of the reaction tube cleaning nozzle according to the present invention. FIG. , 3rd
FIG. 5 schematically shows the flow of cleaning water through the reaction tube cleaning nozzle shown in the figure, and FIG. 5 is a diagram showing the configuration of a conventional reaction tube cleaning nozzle. 10...Cleaning nozzle body 12.14...Cleaning liquid blowout port 13...Cleaning liquid suction port 15...Cleaning liquid blowout rotating body

Claims (1)

【特許請求の範囲】[Claims] 反応管を洗浄するために、反応管内に進退移動可能に保
持されたノズル本体と、所定の駆動源に接続され、洗浄
液を吐出するための開口部と、そのノズル本体先端近傍
に吸引部とを設けたことを特徴とする反応管洗浄装置。
In order to clean the reaction tube, a nozzle body is movably held in the reaction tube, an opening connected to a predetermined drive source for discharging cleaning liquid, and a suction part near the tip of the nozzle body. A reaction tube cleaning device characterized in that:
JP9864687A 1987-04-23 1987-04-23 Reaction-tube washing apparatus Pending JPS63265169A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9864687A JPS63265169A (en) 1987-04-23 1987-04-23 Reaction-tube washing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9864687A JPS63265169A (en) 1987-04-23 1987-04-23 Reaction-tube washing apparatus

Publications (1)

Publication Number Publication Date
JPS63265169A true JPS63265169A (en) 1988-11-01

Family

ID=14225268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9864687A Pending JPS63265169A (en) 1987-04-23 1987-04-23 Reaction-tube washing apparatus

Country Status (1)

Country Link
JP (1) JPS63265169A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011191216A (en) * 2010-03-15 2011-09-29 Toshiba Corp Automatic analyzer

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011191216A (en) * 2010-03-15 2011-09-29 Toshiba Corp Automatic analyzer

Similar Documents

Publication Publication Date Title
WO2014112591A1 (en) Automatic analysis device
TWI517225B (en) Liquid treatment device and liquid treatment method
JP3556043B2 (en) Substrate drying equipment
EP0131449A2 (en) Automatic mask washing apparatus
JP2003203891A (en) Substrate processing unit
TW201001593A (en) Substrate treatment apparatus
CN105934676B (en) Automatic analysing apparatus
KR20180011732A (en) Substrate treating apparatus
CN107346755A (en) Thin wafer cleaning device and cleaning method of the wafer scale with TSV through hole
KR101060686B1 (en) Substrate cleaning device with improved cleaning efficiency
JP6045840B2 (en) Substrate processing equipment
CN209496829U (en) Wafer cleaning device
JPH1041269A (en) Substrate treating apparatus
JPS63265169A (en) Reaction-tube washing apparatus
JP7432579B2 (en) Disc filter and how it works
CN106072700B (en) A kind of horizontal swirling helical cleaning machine
JPH04105065A (en) Cup washing device
TWI644736B (en) Substrate processing apparatus
CN105057297B (en) Sampling needle washer
JP2002329705A (en) Spin treatment unit
JP3948963B2 (en) Spin processing equipment
JP2004122095A (en) Cleaning apparatus
KR101651782B1 (en) Wet bacuum cleaner
CN208379251U (en) Clothes washing device
JP2003059810A (en) Chemical treatment device