JPS63259074A - Electron beam vapor source device - Google Patents
Electron beam vapor source deviceInfo
- Publication number
- JPS63259074A JPS63259074A JP9203987A JP9203987A JPS63259074A JP S63259074 A JPS63259074 A JP S63259074A JP 9203987 A JP9203987 A JP 9203987A JP 9203987 A JP9203987 A JP 9203987A JP S63259074 A JPS63259074 A JP S63259074A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- electron beam
- evaporation
- magnetic field
- magnetic pole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 29
- 230000005284 excitation Effects 0.000 claims abstract description 19
- 238000005566 electron beam evaporation Methods 0.000 claims 1
- 238000001704 evaporation Methods 0.000 abstract description 17
- 230000008020 evaporation Effects 0.000 abstract description 17
- 239000000463 material Substances 0.000 abstract description 12
- 239000010409 thin film Substances 0.000 abstract description 4
- 239000010408 film Substances 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- NNJPGOLRFBJNIW-HNNXBMFYSA-N (-)-demecolcine Chemical compound C1=C(OC)C(=O)C=C2[C@@H](NC)CCC3=CC(OC)=C(OC)C(OC)=C3C2=C1 NNJPGOLRFBJNIW-HNNXBMFYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明はるつぼ内の物質を電子銃の出力電子ビームによ
り照射して加熱蒸発させる主として真空蒸着用の蒸発源
装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an evaporation source device mainly for vacuum evaporation, in which a substance in a crucible is irradiated with an output electron beam of an electron gun to heat and evaporate it.
（従来の技術）
従来、この種の蒸発源装置として、例えば第１図に見ら
れるように、励磁体ａの左右の磁極板す、ｂ間に、るつ
ぼＣとその前号下側の電子銃ｄとを設け、該電子銃ｄの
出力電子ビームｅを両磁極板す、ｂ間の磁場の作用によ
υ彎曲させてるつぼＣ内にその前側上面から導くように
し、さらに該るつぼＣ内の物質ｆに全体的な加熱を与え
るために、該出力電子ビームｅの通路に沿って左右１対
に補助励磁コイルｇ１ ｇ？：設け、これらのコイルｇ
−１ｇｅ交互に逆方向に励磁して該出力電子ビームｅに
左右交互の偏向を生じさせるようにしたものが知られて
いる（特公昭５１−６０２５号公報ン。(Prior Art) Conventionally, as shown in FIG. 1, for example, as shown in FIG. d, and the output electron beam e of the electron gun d is guided from the front upper surface of the crucible C, which is curved υ by the action of the magnetic field between the two magnetic pole plates b. In order to provide overall heating to the material f, a pair of auxiliary excitation coils g1 g? are placed on the left and right along the path of the output electron beam e. :Provide these coils
-1ge is alternately excited in opposite directions to cause the output electron beam e to be deflected alternately left and right (Japanese Patent Publication No. 51-6025).
（発明が解決しようとする問題点）
前記のものは、励磁体ａの電流値を変化させれば、出力
電子ビームｅはるつぼＣ内を前後に移動し、これと同時
に補助励磁コイルｇｓ ｇを交互に励磁すると出力電
子ビームｅはるつぼＣ内を左右に移動させ得、るつぼＣ
内の物質ｆの光面に広く電子ビームｅを照射することが
出来るが、出力電子ビームｅはるつぼＣの側方へ収束し
勝ちであり、該物質ｆが加熱により液相を生じない昇華
物の場合、物質ｆには第２図示のように出力電子ビーム
ｅの軌跡に沿って表面から側方へ彎曲した蒸発跡りの穴
が形成される不都合がある。このような彎曲した横穴が
発生すると、るつぼＣから発生する物質ｆの蒸気が不均
一になり、その結果るつぼ上方の基板（図示してない）
に形成される薄膜の膜厚分布が不均一になり、膜厚分布
の再現性が悪くなる問題が生ずる。。(Problems to be Solved by the Invention) In the above method, if the current value of the excitation body a is changed, the output electron beam e moves back and forth within the crucible C, and at the same time, the auxiliary excitation coil gs When alternately excited, the output electron beam e can be moved from side to side within the crucible C,
Although the electron beam e can be widely irradiated onto the optical surface of the material f in the crucible, the output electron beam e tends to converge to the side of the crucible C. In this case, there is a problem in that the material f has holes formed as evaporation traces that curve laterally from the surface along the locus of the output electron beam e, as shown in the second diagram. When such a curved side hole occurs, the vapor of the substance f generated from the crucible C becomes uneven, and as a result, the substrate above the crucible (not shown)
A problem arises in that the thickness distribution of the thin film formed becomes non-uniform and the reproducibility of the film thickness distribution deteriorates. .
本発明は蒸発源のるつぼ内に彎曲した穴を生ずることに
よる問題を解決することを目的とするものである。The present invention aims to solve the problems caused by curved holes in the crucible of the evaporation source.
（問題点を解決するための手段）
本発明では、励磁コイルその他の励磁体の両外側の左右
１対の磁極板間に、るつぼとその前方下側の電子銃とを
設け、該電子銃の出力電子ビームを両磁極板間の磁界の
作用によシ彎曲させてるつぼ内にその前面上側から導か
せるようにしたものに於て、該るつぼの下方に、前記磁
極板による磁界と逆方向の磁界を発生する永久磁石等の
制御磁石を設けて該るつぼ内の出力電子ビームの彎曲率
を緩和するようにして前記問題点を解決するようにした
。(Means for Solving the Problems) In the present invention, a crucible and an electron gun on the lower front side of the crucible are provided between a pair of left and right magnetic pole plates on both sides of an excitation coil or other excitation body, and In a crucible in which the output electron beam is guided from the upper front side of the crucible by the action of the magnetic field between the two magnetic pole plates, a magnetic field produced by the magnetic pole plates is placed below the crucible in the opposite direction. The above problem is solved by providing a control magnet such as a permanent magnet that generates a magnetic field to reduce the curvature of the output electron beam within the crucible.
（作用）
真空中に蒸発源製蓋を設置し、電子銃を作動させると、
これより出力する電子ビームは励磁体の磁極板間の磁界
の作用によりるつぼ内へ導かれ、るつぼ内に収められた
物質が蒸発する。(Function) When the evaporation source lid is installed in a vacuum and the electron gun is activated,
The electron beam outputted from this is guided into the crucible by the action of the magnetic field between the magnetic pole plates of the excitation body, and the material contained in the crucible is evaporated.
該物質が例えばＯｒ等の昇華物である場合、出力電子ビ
ームが照射された点の物質が昇華蒸発し、そこに蒸発跡
の穴が形成されるが、該るつぼの下方に設けた制御磁石
がるつぼ内に於ける磁極板による磁界の強さを減少させ
るような逆方向の磁界を発生するために出力電子ビーム
のるつぼ内の曲率が緩和され、出力電子ビームは物質の
表面から下面へと拡散して物質を照射するようになるの
でその蒸発跡は竪穴形となり、穴の奥部から途中で乱さ
れることなく直上へ蒸発させ得、上方の基板に均一な膜
厚分布の薄膜を再現性良く形成することが出来る。When the substance is a sublimated substance such as Or, the substance at the point irradiated with the output electron beam sublimates and evaporates, forming a hole as an evaporation trace. The curvature within the crucible of the output electron beam is relaxed to create a magnetic field in the opposite direction that reduces the strength of the magnetic field due to the magnetic pole plates within the crucible, causing the output electron beam to spread from the surface of the material to the bottom surface. Since the material is irradiated with the material, the evaporation trace becomes a pit shape, and the evaporation can be evaporated from the deep part of the hole directly above without being disturbed on the way, making it possible to reproducibly create a thin film with a uniform thickness distribution on the substrate above. It can be formed well.
（実施例）
本発明の実施例を図面に基づき説明すると、ＷＪ３図及
び第４図に於て、符号（１）は励磁コイル或は永久磁石
から成る励磁体、（２）（２）は該励磁体（１）の両外
側に前後方向に設けられ該励磁体（１）によりＮ極とＳ
極とに励磁される１対の磁極板、（３）は蒸発物質（４
）を収容して該磁極板（２） （２）間に設けられたる
つぼ、（５）は該るつぼ（３）の前号下側に設けられた
電子銃を示し、該電子銃（５）からの出力電子ビーム（
６）ｔｌ−両磁極板（２） （２）の磁界の作用により
彎曲させてるつぼ（３）内へその前方上側から導き、蒸
発物質（４）の加熱蒸発が行なわれる。こうした構成は
従来のものと同様であり、該励磁体（１）をコイルとし
たときにこれへの電流値を変化させれば出力電子ビーム
（６）ヲるつぼ（３）の前後に移動させ得、更に該ビー
ム（６）の通路に沿って左右１対の補助励磁コイル（７
）を設けてこれを交互に励磁すれば該ビーム（６）ヲる
つぼ（３）の左右に移動させることが出来ることも従来
のものと変わりがない。(Example) An example of the present invention will be described based on the drawings. In Figures WJ3 and 4, the code (1) is an excitation body consisting of an excitation coil or a permanent magnet, and (2) (2) is an excitation body consisting of an excitation coil or a permanent magnet. The excitation body (1) is provided in the front and back direction on both outside sides of the excitation body (1), and the N pole and S pole are connected by the excitation body (1).
A pair of magnetic pole plates (3) are excited by the pole and the evaporated material (4
), and (5) indicates an electron gun installed on the lower side of the crucible (3), and the electron gun (5) The output electron beam from (
6) tl-Both magnetic pole plates (2) The evaporated substance (4) is heated and evaporated by being led into the curved crucible (3) from the upper front side by the action of the magnetic field of (2). This configuration is the same as the conventional one, and when the exciting body (1) is a coil, the output electron beam (6) can be moved back and forth in the crucible (3) by changing the current value to it. , furthermore, a pair of left and right auxiliary excitation coils (7) are installed along the path of the beam (6).
) is provided and alternately excited, the beam (6) can be moved to the left and right of the crucible (3), which is no different from the conventional method.
しかし乍ら以上の構成では出力電子ビーム（６）はるつ
ぼ（３）の上面から側方への軌跡を描き、その内部の蒸
発物質（４）が昇華物である場合、蒸発の進行に伴ない
蒸発物質（４）に横穴が形成される不都合があるが、本
発明に於ては、第４図に見られるように、るつぼ（３）
の下方に磁極板（２） （２）による磁界の方向と逆方
向の磁界を発生する電磁石又は永久磁石からなる制御磁
石（８）ヲ設けてるつぼ（３）内の磁界を減少させ、出
力電子ビーム（６）の彎曲率を緩和してるつぼ（３）の
上面から下面へ直進するようにした。これにより昇華物
の蒸発物質（４）に蒸発の進行で形成される穴はるつぼ
（３）の上下方向となシ、穴の奥部から直上へ途中で流
れが乱されることなく蒸発出来、その上方の基板に均一
な膜厚分布で薄膜を形成しその再現性も曳好となし得る
。However, in the above configuration, the output electron beam (6) traces a trajectory from the upper surface of the crucible (3) to the side, and if the evaporated substance (4) inside is a sublimated substance, it follows the progress of evaporation. Although there is an inconvenience that a side hole is formed in the evaporated material (4), in the present invention, as shown in FIG. 4, the crucible (3)
A control magnet (8) consisting of an electromagnet or a permanent magnet that generates a magnetic field in the opposite direction to that of the magnetic pole plate (2) (2) is installed below the magnetic pole plate (2) to reduce the magnetic field in the crucible (3) and The curvature of the beam (6) was relaxed to allow it to travel straight from the upper surface to the lower surface of the crucible (3). As a result, the hole formed in the evaporated substance (4) of the sublimate as the evaporation progresses is in the vertical direction of the crucible (3), and the flow can be evaporated from the deep part of the hole directly above without being disturbed on the way. A thin film is formed on the substrate above it with a uniform thickness distribution, and its reproducibility is also excellent.
（発明の効果）
以上のように本発明では、電子銃の出力電子ビームを磁
極板の磁界によりるつぼへと導くようにした蒸発源に於
て、該るつぼの下方に該励磁板の磁界を減少させる制御
磁石を設けて該るつぼ内の出力電子ビームの彎曲率を緩
和するようにしたので、昇華物の蒸発物質の蒸発に際し
てその蒸発跡が彎曲した横穴となる不都合を解消出来、
蒸着により形成される膜厚の分布を均一化し再現性も向
上させ得る等の効果がある。(Effects of the Invention) As described above, in the present invention, in the evaporation source in which the output electron beam of the electron gun is guided to the crucible by the magnetic field of the magnetic pole plate, the magnetic field of the excitation plate is reduced below the crucible. Since a control magnet is provided to reduce the curvature of the output electron beam in the crucible, it is possible to eliminate the inconvenience that the evaporation trace becomes a curved horizontal hole when the evaporated substance of the sublimate evaporates.
This has the effect of making the distribution of film thickness formed by vapor deposition uniform and improving reproducibility.
第１図は従来例の斜視図、第２図は従来例の断面図、第
３図は本考案の実施例の断面図、第４図は第３図の■−
■線断面図である。Fig. 1 is a perspective view of the conventional example, Fig. 2 is a sectional view of the conventional example, Fig. 3 is a sectional view of the embodiment of the present invention, and Fig. 4 is the -
■It is a line sectional view.
Claims (1)
間に、るつぼとその前方下側の電子銃とを設け、該電子
銃の出力電子ビームを両磁極板間の磁界の作用により彎
曲させてるつぼ内にその前面上側から導かせるようにし
たものに於て、該るつぼの下方に、前記磁極板による磁
界と逆方向の磁界を発生する永久磁石等の制御磁石を設
けて該るつぼ内の出力電子ビームの彎曲率を緩和したこ
とを特徴とする電子ビーム蒸発源装置。A crucible and an electron gun on the lower front side of the crucible are provided between a pair of left and right magnetic pole plates on both sides of the excitation coil or other excitation body, and the output electron beam of the electron gun is curved by the action of the magnetic field between the two magnetic pole plates. A control magnet such as a permanent magnet that generates a magnetic field in the opposite direction to the magnetic field produced by the magnetic pole plate is installed below the crucible to guide the magnetic field into the crucible from the upper front side of the crucible. An electron beam evaporation source device characterized in that the curvature of the output electron beam is relaxed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092039A JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092039A JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63259074A true JPS63259074A (en) | 1988-10-26 |
| JP2591950B2 JP2591950B2 (en) | 1997-03-19 |
Family
ID=14043388
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62092039A Expired - Fee Related JP2591950B2 (en) | 1987-04-16 | 1987-04-16 | Electron beam evaporation source device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2591950B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008035587A1 (en) * | 2006-09-22 | 2008-03-27 | Ulvac, Inc. | Vacuum processing system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61194172A (en) * | 1985-02-21 | 1986-08-28 | Sumitomo Electric Ind Ltd | Electron beam heater for vapor deposition device |
-
1987
- 1987-04-16 JP JP62092039A patent/JP2591950B2/en not_active Expired - Fee Related
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61194172A (en) * | 1985-02-21 | 1986-08-28 | Sumitomo Electric Ind Ltd | Electron beam heater for vapor deposition device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008035587A1 (en) * | 2006-09-22 | 2008-03-27 | Ulvac, Inc. | Vacuum processing system |
| KR101158357B1 (en) | 2006-09-22 | 2012-06-25 | 가부시키가이샤 알박 | Vacuum processing system |
| JP4977143B2 (en) * | 2006-09-22 | 2012-07-18 | 株式会社アルバック | Vacuum processing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2591950B2 (en) | 1997-03-19 |
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