JPS63252347A - Electrostatic lens - Google Patents

Electrostatic lens

Info

Publication number
JPS63252347A
JPS63252347A JP62087555A JP8755587A JPS63252347A JP S63252347 A JPS63252347 A JP S63252347A JP 62087555 A JP62087555 A JP 62087555A JP 8755587 A JP8755587 A JP 8755587A JP S63252347 A JPS63252347 A JP S63252347A
Authority
JP
Japan
Prior art keywords
electrode
lens
electrodes
electrostatic lens
electric field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62087555A
Other languages
Japanese (ja)
Inventor
Yoshihiro Tamura
田村 好宏
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Anelva Corp
Original Assignee
Anelva Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Anelva Corp filed Critical Anelva Corp
Priority to JP62087555A priority Critical patent/JPS63252347A/en
Publication of JPS63252347A publication Critical patent/JPS63252347A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To suppress effects of an external electric field and to obtain an electrostatic lens which is excellent in its optical characteristics by disposing electrodes serially on a matter surface side and/or an image surface side and next making at least two of these electrodes equipotential to each other. CONSTITUTION:A lens is composed by dependent disposal of five parallel electrodes, that is, a first electrode 11 to a fifth electrode 15, which respectively have apertures in axis symmetry to an optical axis 1. Two of the first electrode 11 and the second electrode 12, which are disposed serially on an object surface side, and two of the fourth electrode 14 and the fifth electrode 15, which are disposed serially on an image surface side, are made equipotential (earth potential) to each other. A lens voltage is applied to the third electrode 13 by a power source 6. When charged beams 5 incident on an optical axis 1 pass through the apertures of the respective electrodes 12 to 14, they receive lens actions. When the voltage applied to the third electrode 13 is controlled, the lens actions can be regulated, and deterioration in optical characteristics can be prevented without disturbance of an external electric field and also effects of the external electric field can be suppressed.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、荷電ビームの集束に用いる静電レンズに関す
るものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an electrostatic lens used for focusing a charged beam.

(従来の技術) 従来の静電レンズの代表的なものにユニポテンシャルレ
ンズ(別名、アインツエルレンズ)と呼ばれているもの
がある。
(Prior Art) A typical conventional electrostatic lens is a unipotential lens (also known as an Einzel lens).

第4図はユニポテンシャルレンズの概略構成の断面を示
したものである。
FIG. 4 shows a cross section of a schematic configuration of a unipotential lens.

当該レンズは、光軸1に対して軸対称の開孔部を有する
3枚の平行した電極、即ち第1電極2)第2電極3、第
3電極4の従属配列によって構成され、光軸1上で入射
する荷電ビーム5は、前述各電極2,3.4の開孔部を
通過する際にレンズ作用を受ける。
The lens is constituted by a subordinate arrangement of three parallel electrodes having apertures that are axially symmetrical with respect to the optical axis 1, namely a first electrode 2, a second electrode 3, and a third electrode 4. The charged beam 5 incident above is subjected to a lens action when passing through the apertures of the respective electrodes 2, 3.4.

第1電極2と第3電極4は同電位、通例は接地電位に保
たれ、第2電極3に電R6より印加する電圧を制御する
ことでレンズ作用を調節することが出来る。
The first electrode 2 and the third electrode 4 are kept at the same potential, usually the ground potential, and the lens action can be adjusted by controlling the voltage applied to the second electrode 3 from the voltage R6.

ところで荷電ビームを試料に照射して加工等を行なう荷
電ビーム装置では、荷電ビームの集束を行なう前述ユニ
ポテンシャルレンズをはじめとする静電レンズの他、ビ
ーム偏向を行なう偏向器、ビームの遮断、通過を制御す
るビームブランキング装置等が必要不可欠な要素となる
By the way, in a charged beam device that performs processing by irradiating a charged beam onto a sample, in addition to electrostatic lenses such as the aforementioned unipotential lens that focuses the charged beam, a deflector that deflects the beam, and a beam blocking and passing device are used. A beam blanking device and other devices that control this are essential elements.

しかして、当該ユニポテンシャルレンズを前述荷電ビー
ム装置に搭載するに当り、第1電極2より第3電極4に
至るユニポテンシャルレンズ内部に形成される電界は、
第1電極2および第3電極4の開孔部を経て外部にしみ
出し、当該ユニポテンシャルレンズ外部の電界に影響を
与えるとともに、反対にユニポテンシャルレンズの内部
に形成される電界が外部の電界の影響を受は易いという
問題が生じる。
When the unipotential lens is mounted on the charged beam device, the electric field formed inside the unipotential lens from the first electrode 2 to the third electrode 4 is as follows.
It leaks out through the openings of the first electrode 2 and the third electrode 4, affecting the electric field outside the unipotential lens, and conversely, the electric field formed inside the unipotential lens increases the external electric field. The problem arises that it is easy to be influenced.

即ち、当該ユニポテンシャルレンズの近傍に更に別の静
電レンズや静電型の偏向器が設置されている場合、これ
らの形成する電界が当該ユニポテンシャルレンズからし
み出した電界の影響を受けて乱れ、光学特性あるいは偏
向特性を劣化させて荷電ビームの品質を低下させるとい
う問題があり、更に反対に、別の静電レンズあるいは偏
向器が形成する電界が、当該ユニポテンシャルレンズ内
部の電界に影響を与え、その電界を乱し光学特性を劣化
させるという問題がある。
In other words, if another electrostatic lens or electrostatic deflector is installed near the unipotential lens, the electric field formed by these lenses will be disturbed by the electric field seeping out from the unipotential lens. However, there is a problem in that the quality of the charged beam is reduced by deteriorating the optical properties or deflection properties.Furthermore, on the contrary, the electric field formed by another electrostatic lens or deflector affects the electric field inside the unipotential lens. There is a problem in that the electric field is disturbed and the optical characteristics are deteriorated.

それではこれらの問題を解決するには、各静電レンズ、
偏向器等を互いに十分に距離を置いて設置すればよいの
であるが、それては、荷電ビームの光路長が長くなり、
却って、外乱の影響や荷電ビーム自体が有する空間電荷
の影響を受けやすくなり、さらに、集束用の静電レンズ
は、長い光路長に見合う焦点距離の長いレンズが要求さ
れ光学特性にも悪影響を及ぼし、結果的に荷電ビームの
品質の低下を招くという問題は避けられない。
So to solve these problems, each electrostatic lens,
It would be possible to install the deflectors etc. at a sufficient distance from each other, but this would increase the optical path length of the charged beam.
On the contrary, it becomes more susceptible to the effects of disturbances and the space charge of the charged beam itself.Furthermore, the electrostatic lens for focusing requires a lens with a long focal length commensurate with the long optical path length, which adversely affects the optical properties. As a result, the problem of degrading the quality of the charged beam is unavoidable.

(発明の目的) 本発明は、上記の問題を解決し、光学特性の秀れた静電
レンズを提供することを目的とする。
(Objective of the Invention) An object of the present invention is to solve the above problems and provide an electrostatic lens with excellent optical properties.

(問題点を解決する為の手段) 本願第1の発明は、軸対称の開孔部を有する複数の電極
を該軸を共通にして従属配列して構成される静電レンズ
において、物面側および像面側あるいはそのどちらか一
方に置かれたの連続する電極の少なくとも2枚を同電位
とすることで前記目的を達成したものである。
(Means for Solving the Problems) The first invention of the present application is an electrostatic lens constructed by arranging a plurality of electrodes having axially symmetrical apertures in a subordinate arrangement with the axis in common. The above object is achieved by setting at least two consecutive electrodes placed on the image plane side or either side to the same potential.

本願第2の発明は、軸対称の開孔部を有する複数の電極
を、該軸を共通として従属配列して構成される静電レン
ズにおいて、もっとも外側に配置される物面側および像
面側あるいはどちらか一方の電極の、開孔部の内側をく
り抜いて前後に2つの開孔を有する形状とすることで前
記目的を達成したものである。
The second invention of the present application provides an electrostatic lens configured by arranging a plurality of electrodes having axially symmetrical apertures in a subordinate arrangement with the axis in common, the object plane side and the image plane side disposed on the outermost side. Alternatively, the above object can be achieved by hollowing out the inside of the aperture of one of the electrodes to form a shape having two apertures at the front and rear.

(実施例) 第1図は本願第1の発明の実施例であり、当該レンズは
光軸1に対して軸対称の開孔部を有する5枚の平行した
電極、即ち第1電極11、第2電極12)第3電極13
、第4電極14、第5電極の従属配列によって構成され
ている。
(Example) FIG. 1 shows an example of the first invention of the present application, and the lens has five parallel electrodes having apertures axially symmetrical with respect to the optical axis 1. 2nd electrode 12) 3rd electrode 13
, the fourth electrode 14, and the fifth electrode.

ここで物面側の連続する2枚の第1電極11と第2電極
12)さらに像面側の連続する2枚の第4電極14と第
5電極15はそれぞれ同電位であり本実施例では接地電
位である。
Here, the two consecutive first electrodes 11 and second electrodes 12 on the object side) and the two consecutive fourth electrodes 14 and fifth electrodes 15 on the image side are at the same potential, and in this embodiment, It is ground potential.

また第371E極13にはレンズ電圧が電源6により印
加される。
Further, a lens voltage is applied to the 371st E pole 13 by the power source 6.

本実施例の構成では第2電極12)第3電極13、第4
電極14に着目すれば、動作原理は従来の第4図に示す
ユニポテンシャルレンズと同等であり、光軸1上で入射
する荷電ビーム5は各電極12.13.14の開孔部を
通過する際にレンズ作用を受け、第3電極13に印加す
る電圧を制御することでレンズ作用を調整することがで
きる。
In the configuration of this embodiment, the second electrode 12), the third electrode 13, and the fourth
Focusing on the electrodes 14, the operating principle is equivalent to the conventional unipotential lens shown in FIG. 4, and the charged beam 5 incident on the optical axis 1 passes through the apertures of each electrode 12, 13, and 14. The lens effect can be adjusted by controlling the voltage applied to the third electrode 13.

ところで本願の発明者は、第1電極11と第2電極12
の間の空間は、接地電位で囲まれた空間と殆んど等価で
あり、外部電界の影響を少なからず遮断すると共に、第
2電極12から第3電極13を経て第4電極に亙り形成
される電界を外部に対して少なからず遮断せしめること
を実験により見いだしており、以上により当該静電レン
ズ内部に形成される電界は外部の電界に乱されることが
少なく、その結果、光学特性の劣化を抑えると共に、外
部の電界に対する、当該静電レンズ内部の電界の影響を
も抑えることが出来る。
By the way, the inventor of the present application has discovered that the first electrode 11 and the second electrode 12
The space between the two electrodes is almost equivalent to a space surrounded by a ground potential, which blocks the influence of external electric fields to some extent, and is formed from the second electrode 12 through the third electrode 13 to the fourth electrode. Through experiments, we have found that the electric field generated inside the electrostatic lens is blocked to a considerable extent from the outside, and as a result, the electric field formed inside the electrostatic lens is less likely to be disturbed by the external electric field, and as a result, the optical characteristics deteriorate. In addition, it is possible to suppress the influence of the electric field inside the electrostatic lens on the external electric field.

さらに第1電極11の開孔部が、第2電極12の開孔部
に比へて小さいときの方が前述の効果がより大きいこと
も見いだしている。
Furthermore, it has been found that the above-mentioned effect is greater when the opening of the first electrode 11 is smaller than the opening of the second electrode 12.

第4電極14、第5電極15の効゛果についても同様で
あるので説明はここでは省略する。
The effects of the fourth electrode 14 and the fifth electrode 15 are also similar, so their explanation will be omitted here.

第2図は本願箱2の発明の実施例であり、当該レンズは
光軸に対して軸対称の開孔部を有する3枚の平行した電
極、即ち、第1電極21、第2電極22)第3電極23
の従属配列によって構成されている。
FIG. 2 shows an embodiment of the invention in Box 2, in which the lens has three parallel electrodes having apertures that are axially symmetrical with respect to the optical axis (i.e., a first electrode 21 and a second electrode 22). Third electrode 23
It is composed of dependent arrays of .

ここで外側の第1電極21、第3電極23は開孔部の内
側をくり抜いた、前後に2つの開孔を備える形状となっ
ている。
Here, the first electrode 21 and the third electrode 23 on the outside have a shape in which the inside of the opening is hollowed out and has two openings at the front and back.

第1電極21と第3電極23は同電位、ここでは接地電
位であり、第2電極22にレンズ電圧が電源6により印
加される。
The first electrode 21 and the third electrode 23 are at the same potential, here the ground potential, and a lens voltage is applied to the second electrode 22 by the power source 6.

当該レンズも動作原理は従来の第4図に示すユニポテン
シャルレンズと同等であり、本願箱1の発明と同様の効
果を第1電極21および第3電極23の開孔部の内部を
くり抜いた形状で得ようとするものである。
The operating principle of this lens is the same as that of the conventional unipotential lens shown in FIG. This is what you are trying to obtain.

本願箱2の発明の効果は、本願箱1の発明のそれとほぼ
同様であるのでここでは説明を省略する。
The effects of the invention in Box 2 of the present application are almost the same as those of the invention of Box 1 of the present application, so a description thereof will be omitted here.

また、開孔部の内部をくり抜いた形状では、外部の開孔
部が内部の開孔部に比べて小さいときの方がより発明の
効果が大きいことも判明している。
It has also been found that in a shape in which the inside of the opening is hollowed out, the effect of the invention is greater when the outside opening is smaller than the inside opening.

なお、電極開孔部の内側をくり抜いた形状を一体で製作
するに難しい場合は、第3図に示す如く2つの部分に分
けて製作し、その後接合してもよい。
Incidentally, if it is difficult to manufacture the electrode hole in a hollow shape in one piece, it may be manufactured in two parts as shown in FIG. 3, and then they may be joined together.

本発明の実施例ではユニポテンシャルレンズの動作原理
が成立する静電レンズについて説明を行なっているが、
実施例に限定されることなく軸対称の開孔部を有する電
極を複数枚従属配列して構成される静電レンズの総てに
適用しても同様の効果を得ることが出来る。
In the embodiments of the present invention, an electrostatic lens in which the operating principle of a unipotential lens is established is explained.
The present invention is not limited to the embodiments, and the same effect can be obtained even if the present invention is applied to any electrostatic lens constructed by arranging a plurality of electrodes having axially symmetrical openings in a subordinate arrangement.

また、本発明の別の効果として、静電レンズの内部をレ
ンズ外部に対して差動排気したい場合あるいは静電レン
ズを介して物面側と像面側を差動排気したい場合゛、本
願箱1の発明の外側の電極の開孔部を差動排気用の紋り
孔として利用することで実現可能であり、本願箱2の発
明においても外側の開孔を差動排気用の紋り孔として利
用することで実現可能という特徴も有する。
In addition, as another effect of the present invention, when it is desired to differentially pump the inside of an electrostatic lens with respect to the outside of the lens, or when it is desired to differentially pump the object side and image side through the electrostatic lens, This can be realized by using the opening of the outer electrode in the invention of Item 1 as a perforated hole for differential exhaust, and also in the invention of Box 2, the outer opening can be used as a perforated hole for differential exhaust. It also has the feature that it can be realized by using it as

(発明の効果) 本発明によれば、光学特性に優れ且つ差動排気も可能な
静電レンズが提供できる。
(Effects of the Invention) According to the present invention, an electrostatic lens that has excellent optical properties and is capable of differential pumping can be provided.

【図面の簡単な説明】[Brief explanation of drawings]

第1図、は本願箱1の発明の実施例の概要断面図。 第2図2本願第2の発明の実施例の概要断面図。 第3図は別の実施例の第1電極部の断面図。 第4図は従来の静電レンズ(ユニポテンシャルレンズ)
の概略構成の断面図。 1・・・荷電ビーム光軸、 2.11.21・・・第1電極    3,13゜23
第2電極、 4.13.23・・・第3電極、  5・・・荷電ビー
ム。 6・・・電源。
FIG. 1 is a schematic sectional view of an embodiment of the invention in Box 1 of the present application. FIG. 2 is a schematic sectional view of an embodiment of the second invention of the present application. FIG. 3 is a sectional view of the first electrode part of another embodiment. Figure 4 shows a conventional electrostatic lens (unipotential lens)
FIG. 1... Charged beam optical axis, 2.11.21... First electrode 3,13°23
2nd electrode, 4.13.23...Third electrode, 5...Charged beam. 6...Power supply.

Claims (4)

【特許請求の範囲】[Claims] (1)軸対称の開孔部を有する複数の電極を、該軸を共
通にして従属配列して構成される静電レンズにおいて、
物面側および像面側あるいはそのどちらか一方に置かれ
た連続する電極の少なくとも2枚が同電位に構成されて
いることを特徴とする静電レンズ。
(1) In an electrostatic lens configured by arranging a plurality of electrodes having axially symmetrical openings in a subordinate arrangement with the axis in common,
An electrostatic lens characterized in that at least two consecutive electrodes placed on the object side and/or the image side are configured to have the same potential.
(2)特許請求の範囲第1項に記載された静電レンズに
おいて、同電位とされる該少なくとも2枚の連続する電
極の開孔部の穴径は、当該静電レンズの中心から外側に
向かうにつれて小さく構成されていることを特徴とする
静電レンズ
(2) In the electrostatic lens described in claim 1, the hole diameter of the aperture of the at least two consecutive electrodes, which are at the same potential, extends outward from the center of the electrostatic lens. An electrostatic lens that is characterized by becoming smaller as it approaches.
(3)軸対称の開孔部を有する複数の電極を、該軸を共
通にして従属配列して構成される静電レンズにおいて、
もっとも外側に配置される物面側および像面側あるいは
どちらか一方の電極は、該電極の開孔部の内側をくり抜
いて前後に2つの開孔を備えた形状であることを特徴と
する静電レンズ。
(3) In an electrostatic lens configured by arranging a plurality of electrodes having axially symmetrical openings in a subordinate arrangement with the axis in common,
The electrode on the object surface side and the image surface side, or either one of the electrodes disposed on the outermost side, has a shape in which the inside of the aperture of the electrode is hollowed out and two apertures are provided at the front and rear. electric lens.
(4)特許請求の範囲第3項に記載された静電レンズに
おいて、開孔部の内側をくり抜いた形状の該電極の外側
の開孔の穴径が内側の開孔の穴径よりも小さいことを特
徴とする静電レンズ。
(4) In the electrostatic lens described in claim 3, the hole diameter of the outer hole of the electrode is smaller than the hole diameter of the inner hole. An electrostatic lens characterized by:
JP62087555A 1987-04-09 1987-04-09 Electrostatic lens Pending JPS63252347A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62087555A JPS63252347A (en) 1987-04-09 1987-04-09 Electrostatic lens

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62087555A JPS63252347A (en) 1987-04-09 1987-04-09 Electrostatic lens

Publications (1)

Publication Number Publication Date
JPS63252347A true JPS63252347A (en) 1988-10-19

Family

ID=13918234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62087555A Pending JPS63252347A (en) 1987-04-09 1987-04-09 Electrostatic lens

Country Status (1)

Country Link
JP (1) JPS63252347A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0452969A2 (en) 1990-04-19 1991-10-23 Hitachi, Ltd. Charged particle beam apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0452969A2 (en) 1990-04-19 1991-10-23 Hitachi, Ltd. Charged particle beam apparatus
US5187371A (en) * 1990-04-19 1993-02-16 Hitachi, Ltd. Charged particle beam apparatus

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