JPS63229875A - Excimer laser device - Google Patents
Excimer laser deviceInfo
- Publication number
- JPS63229875A JPS63229875A JP6492487A JP6492487A JPS63229875A JP S63229875 A JPS63229875 A JP S63229875A JP 6492487 A JP6492487 A JP 6492487A JP 6492487 A JP6492487 A JP 6492487A JP S63229875 A JPS63229875 A JP S63229875A
- Authority
- JP
- Japan
- Prior art keywords
- laser
- laser beam
- oscillation
- stage
- mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000010355 oscillation Effects 0.000 claims abstract description 20
- 230000003321 amplification Effects 0.000 claims abstract description 11
- 238000003199 nucleic acid amplification method Methods 0.000 claims abstract description 11
- 230000003287 optical effect Effects 0.000 claims abstract description 6
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 abstract description 8
- 238000010891 electric arc Methods 0.000 abstract description 4
- 230000001360 synchronised effect Effects 0.000 abstract description 4
- 238000000034 method Methods 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野） 本発明はエキシマレーザ装置に関するものである。[Detailed description of the invention] [Industrial application field] The present invention relates to an excimer laser device.
ＫｒＦなどの気体をレーザ物質として用いるエキシマレ
ーザ装置においては、第５図に示すように、発振段のレ
ーザ管１と増幅段のレーザ管２を設け、発振段の放電電
極３ａと３ｂとの間に）（ｒＦなどの気体を図示の矢印
方向に環流させながら放？１１１３ａと３ｂ間のアーク
放電によってレーザ光を誘起し、そのレーザ光をリアミ
ラー５．フロントミラー６、およびエタロン４などの光
学共振素子で共振させ、ミラー７．８によってその光路
を曲げてｍ＠段のレーザｆ！２内に導き、放電電極９ａ
、９ｂとの間のアーク放電によって発振段からのレーザ
光を増幅し、ミラー１０とリアミラー１１とによって共
振させて外部に出力するように構成したものがある。In an excimer laser device that uses a gas such as KrF as a laser substance, as shown in FIG. 2) (While circulating gas such as rF in the direction of the arrow shown in the figure, a laser beam is induced by an arc discharge between the radiator 1113a and 3b, and the laser beam is transmitted to the optical resonance of the rear mirror 5, front mirror 6, etalon 4, etc.) The element resonates, and the optical path is bent by the mirror 7.8 and guided into the m@stage laser f!2, and the discharge electrode 9a
, 9b, the laser beam from the oscillation stage is amplified by arc discharge, and the laser beam is resonated by the mirror 10 and rear mirror 11 and output to the outside.
この構成は大きなパワーを持つレーザ光を必要とする時
に多用されるもので、注入同期法と呼ばれている。This configuration is often used when a laser beam with high power is required, and is called injection locking.
この注入同期法を利用したエキシマレーザ装置としては
、第５図の構成の他に、第６図に示すように発振段の放
電電極３ｂと増幅段の放電電極９ａとを共通化し、第５
図に示したのと同様にしてレーザ発振を行うように構成
したものもある。As an excimer laser device using this injection locking method, in addition to the configuration shown in FIG. 5, as shown in FIG.
Some devices are configured to perform laser oscillation in the same manner as shown in the figure.
なお、第６図に示す構成においても第５図の構成と同様
に発振段と増幅段の気体は別々に環流するように構成さ
れている。Note that in the configuration shown in FIG. 6 as well, the gases in the oscillation stage and the amplification stage are configured to circulate separately, similar to the configuration in FIG.
ところが、第５図および第６図の構成では、発振段と増
幅段のレーザ発振を放電電極３ａ、３ｂと９ａ、９ｂの
２つの放電回路中で行うため、２つのレーザ管を必要と
する他、発振段と増幅段での発振に同期関係を持たゼな
ければならず、その制御回路が複雑になるという問題が
ある。However, in the configurations shown in FIGS. 5 and 6, since the laser oscillations in the oscillation stage and the amplification stage are performed in two discharge circuits of the discharge electrodes 3a, 3b and 9a, 9b, two laser tubes are required. However, there is a problem in that the oscillations in the oscillation stage and the amplification stage must be synchronized, which makes the control circuit complicated.
本発明の目的は、簡単な構成でパワーの大きいレーザ光
を取出すことができるエキシマレーザ装置を提供するこ
とにある。SUMMARY OF THE INVENTION An object of the present invention is to provide an excimer laser device that has a simple configuration and can extract a high-power laser beam.
本発明は、発振段と増幅段のレーザ発振を同一レーザ管
内の同一放電回路中で行うように光学バ振素子を配置し
たものである。In the present invention, optical vibration elements are arranged so that the laser oscillations of the oscillation stage and the amplification stage are performed in the same discharge circuit within the same laser tube.
発振段と増幅段に共通の放電電極によって発振段のレー
ザ発振が開始され、その出力がミラーなどの光学共振素
子によって増幅段に導かれ、ここで増幅されて出力され
る。Laser oscillation in the oscillation stage is started by a discharge electrode common to the oscillation stage and the amplification stage, and its output is guided to the amplification stage by an optical resonant element such as a mirror, where it is amplified and output.
〔実施例］
第１図は本発明の第１の実施例を示す断面構成図であり
、レーザ管の内部には敢雷電ｆｆ１９ａと９ｂが対向配
置され、これら電極間にはＫｒＦなどの気体が環流され
ている。[Embodiment] FIG. 1 is a cross-sectional configuration diagram showing a first embodiment of the present invention. Inside the laser tube, a pair of thunderbolts ff19a and 9b are arranged facing each other, and a gas such as KrF is placed between these electrodes. It is circulating.
２つの放電電極９ａ、９ｂのうち９ｂに近いレーザ管の
端部にはエタロン４とミラー５．１０が一直線状に配置
され、これらエタロン４およびミラー５，１０によって
発振段のレーザ光を発振させるように構成されている。An etalon 4 and a mirror 5.10 are arranged in a straight line at the end of the laser tube near 9b of the two discharge electrodes 9a and 9b, and the etalon 4 and mirrors 5 and 10 oscillate the laser beam of the oscillation stage. It is configured as follows.
ここで、ミラー１０はその中心軸が傾斜して取付けられ
ており、ミラー５．１０とエタロン４で発振さゼたレー
ザ光を増幅段の球面ミラー１３に入射し、この球面ミラ
ー１３とフロントミラー１４との間で増幅させるように
構成されている。Here, the mirror 10 is installed with its central axis inclined, and the laser beam oscillated by the mirror 5.10 and the etalon 4 is incident on the spherical mirror 13 of the amplification stage, and the spherical mirror 13 and the front mirror 14.
この構成においては、放電電極９ａと９ｂのアーク放電
によって誘起したレーザ光をエタロン４゜ミラー５，１
０によって共振させることにより、この共振によって発
生されたレーザ光は球面ミラー１３とフロントミラー１
４によって増幅されて出力される。In this configuration, the laser beam induced by the arc discharge of the discharge electrodes 9a and 9b is transmitted to the etalon 4° mirrors 5 and 1.
0, the laser beam generated by this resonance is transmitted to the spherical mirror 13 and the front mirror 1.
4 and output.
すなわち、同一の放電回路中で発振段と増幅段のレーザ
発振を行うことができる。この結果、レーザ管は１個の
みでよくなり、また同期制御も行う必要がなくなる。ま
た、同一放電回路中を２つのレーザ光が通過するので、
放Ｍ領域を有効に活用することができる。That is, laser oscillation can be performed in the oscillation stage and the amplification stage in the same discharge circuit. As a result, only one laser tube is required, and there is no need for synchronous control. Also, since two laser beams pass through the same discharge circuit,
The emission area can be effectively utilized.
この場合、第２図の第２の実施例の構成に示すように、
プロアポンプ１：６を有する補機１５を設け、レーザ管
内の気体をプロアポンプ１６によって配管１７を介して
矢印方向に強制環流させるようにし、かつ放電電極９ａ
にその気体流を通過させる多数のスリット（図示せず）
を設けるようにしてもよい。In this case, as shown in the configuration of the second embodiment in FIG.
An auxiliary machine 15 having a proa pump 1:6 is provided so that the gas in the laser tube is forced to circulate in the direction of the arrow through the pipe 17 by the proa pump 16, and the discharge electrode 9a
a number of slits (not shown) that allow the gas flow to pass through the
may be provided.
第３図は本光明の第３の実施例を示す断面構成図であり
、発振段のレーザ光の光路Ｘおよび発振段から増幅段へ
の入射光路Ｙ、さらに増幅段の光路Ｚが第３図（ｂ）に
示す第３図（ａ）のＡ−Ａ断面図に示すように別々の光
路となるように、ミラー５および１０．エタロン４２球
面ミラー１３を配置したものである。FIG. 3 is a cross-sectional configuration diagram showing a third embodiment of the present invention. Mirrors 5 and 10. An etalon 42 and a spherical mirror 13 are arranged.
この構成においても第１図の実施例と同様な効果を得る
ことができたうえ、放電電極９ａと、９ｂ′間のギャッ
プをさらに小さくすることができる。In this configuration as well, the same effects as in the embodiment shown in FIG. 1 can be obtained, and the gap between the discharge electrodes 9a and 9b' can be further reduced.
また、第４図の第４の実施例の構成に示すように気体の
強制環流を行なわせる補ＩＦ１１５を組合せることもで
きる。Furthermore, as shown in the configuration of the fourth embodiment shown in FIG. 4, an auxiliary IF 115 for forced gas circulation may be combined.
（発明の効果〕
以上のように本発明によれば、１つのレーザ管のみの簡
単な構成で、かつ同期制御を行うことなくパワーの大き
いレーザ光を取出すことができる。(Effects of the Invention) As described above, according to the present invention, a high-power laser beam can be extracted with a simple configuration of only one laser tube and without performing synchronous control.
第１図は本発明の第１の実施例を示す断面構成図、第２
図〜第４図は第２〜第４の実施例を示す断面構成図、第
５図は従来の１キシマレーザ装置の第１の例を示す断面
構成図、第６図は従来の１キシマレーザ装置の第２の例
を示す断面構成図である。
１．２・・・レーザ管、４・・・エタロン、５，１０・
・・ミラー、９ａ、９ｂ・・・放電電極、１３・・・球
面ミラ−１１４９９，フロントミラー、１５・・・補■
、１６・°゛ブロアポンプ
第１図・
ｆベ
ロ
第２図FIG. 1 is a cross-sectional configuration diagram showing the first embodiment of the present invention, and FIG.
4 are cross-sectional configuration diagrams showing second to fourth embodiments, FIG. 5 is a cross-sectional configuration diagram showing a first example of a conventional 1-ximer laser device, and FIG. 6 is a sectional configuration diagram of a conventional 1-ximer laser device. FIG. 7 is a cross-sectional configuration diagram showing a second example. 1.2...Laser tube, 4...Etalon, 5,10.
...Mirror, 9a, 9b...Discharge electrode, 13...Spherical mirror 11499, front mirror, 15...Supplementary ■
, 16・°゛Blower pump Fig. 1・F tongue Fig. 2
Claims (1)
振されたレーザ光を増幅段で増幅して出力するエキシマ
レーザ装置において、 発振段と増幅段のレーザ発振を同一レーザ管内の同一放
電回路中で行うように光学共振素子を配置して成るエキ
シマレーザ装置。[Scope of Claims] An excimer laser device having two laser tubes, an oscillation stage and an amplification stage, in which a laser beam oscillated by the oscillation stage is amplified and outputted by the amplification stage, comprising: An excimer laser device in which optical resonant elements are arranged so that oscillation occurs in the same discharge circuit within the same laser tube.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62064924A JP2673510B2 (en) | 1987-03-19 | 1987-03-19 | Excimer laser device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62064924A JP2673510B2 (en) | 1987-03-19 | 1987-03-19 | Excimer laser device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63229875A true JPS63229875A (en) | 1988-09-26 |
| JP2673510B2 JP2673510B2 (en) | 1997-11-05 |
Family
ID=13272076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62064924A Expired - Lifetime JP2673510B2 (en) | 1987-03-19 | 1987-03-19 | Excimer laser device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2673510B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010021518A (en) * | 2008-06-12 | 2010-01-28 | Komatsu Ltd | Slab type laser apparatus |
| JP5657139B2 (en) * | 2011-12-07 | 2015-01-21 | 三菱電機株式会社 | CO2 laser device and CO2 laser processing device |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6181685A (en) * | 1984-09-28 | 1986-04-25 | Mitsubishi Electric Corp | Laser apparatus |
| JPS61284981A (en) * | 1985-06-06 | 1986-12-15 | レーザー コーポレーション オブ アメリカ | Gas laser unit having thermally stable optical mount base |
-
1987
- 1987-03-19 JP JP62064924A patent/JP2673510B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6181685A (en) * | 1984-09-28 | 1986-04-25 | Mitsubishi Electric Corp | Laser apparatus |
| JPS61284981A (en) * | 1985-06-06 | 1986-12-15 | レーザー コーポレーション オブ アメリカ | Gas laser unit having thermally stable optical mount base |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010021518A (en) * | 2008-06-12 | 2010-01-28 | Komatsu Ltd | Slab type laser apparatus |
| JP5657139B2 (en) * | 2011-12-07 | 2015-01-21 | 三菱電機株式会社 | CO2 laser device and CO2 laser processing device |
| US9059567B2 (en) | 2011-12-07 | 2015-06-16 | Mitsubishi Electric Corporation | CO2 laser device and CO2 laser processing device |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2673510B2 (en) | 1997-11-05 |
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