JPS63222234A - Strain/stress measuring film - Google Patents

Strain/stress measuring film

Info

Publication number
JPS63222234A
JPS63222234A JP5601087A JP5601087A JPS63222234A JP S63222234 A JPS63222234 A JP S63222234A JP 5601087 A JP5601087 A JP 5601087A JP 5601087 A JP5601087 A JP 5601087A JP S63222234 A JPS63222234 A JP S63222234A
Authority
JP
Japan
Prior art keywords
strain
measured
cracks
stress
ceramic membrane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5601087A
Other languages
Japanese (ja)
Inventor
Tetsuyoshi Wada
哲義 和田
Ryosuke Murai
亮介 村井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP5601087A priority Critical patent/JPS63222234A/en
Publication of JPS63222234A publication Critical patent/JPS63222234A/en
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To measure strain/stress under temp. and humidity covering a wide range, by forming a ceramic membrane to the surface of an object to be measured using a vacuum vapor deposition method and measuring the cracks generated in said membrane. CONSTITUTION:A ceramic membrane (TiN, TiC or the like) is coated to an object 1 to be measured by an apparatus 7 such as an ion plating apparatus. When external force acts on the object 1 to be measured having the ceramic membrane coated to the surface thereof and strain is generated, a large number of cracks are generated in the ceramic membrane. By counting the intervals between the cracks or the number of said cracks per unit length, the quantity of the strain in the object 1 to be measured is evaluated.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はひずみ・応力測定膜に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a strain/stress measurement membrane.

〔従来の技術〕[Conventional technology]

皮膜の割れにより被測定物に生ずるひずみ。 Distortion that occurs in the measured object due to cracks in the film.

応力を測定するものとしては「応力塗膜」と呼ばれる塗
料が知られている。
A coating called a "stress coating" is known as a device for measuring stress.

この種の応力塗膜は非常に脆いので、このところで、こ
の割れの間隔又は単位長さ当りの本数は被測定物に加え
られたひずみ量に依存しているので、この本数を数える
ことにより、被測定物に生じたひずみを知ることができ
、また被測定物の応力−ひすみ特性が既知の場合には、
被測定物に生じた応力を知ることができるのである。
This type of stressed coating film is very brittle, so the interval between cracks or the number of cracks per unit length depends on the amount of strain applied to the object to be measured, so by counting this number, If the strain occurring in the object to be measured can be known, and the stress-strain characteristics of the object to be measured are known,
It is possible to know the stress generated in the object to be measured.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかしながら、この塗料膜は温度0℃〜100℃の範囲
しか用いることができず、高温となる被測定物例えば、
ボイラー、タービン等の部材には適用できないという欠
点がある。
However, this paint film can only be used in the temperature range of 0°C to 100°C;
It has the disadvantage that it cannot be applied to components such as boilers and turbines.

本fl Bgはこのような事情に鑑みて提案されたもの
で、温度、湿度の広い範囲にわたって使用することので
きるひずみ・応力測定膜を提供することを目的とする。
The present fl Bg was proposed in view of these circumstances, and its purpose is to provide a strain/stress measurement membrane that can be used over a wide range of temperature and humidity.

〔問題点を解決するための手段〕[Means for solving problems]

そのために本¥閉は、被測定物の表面に真空蒸着法によ
り形成され、ひずみによって発生する割れを計測するこ
とにより応力・ひずみを求めることのできるセラミック
ス薄膜よりなることを特徴とする。
To this end, this product is characterized by being made of a ceramic thin film that is formed on the surface of the object to be measured by vacuum evaporation, and allows stress and strain to be determined by measuring cracks that occur due to strain.

〔作 用〕[For production]

このような構成によれば、セラミックス薄膜は非常に脆
(、「応力塗膜」と同様被測定物にひずみが生じた場合
には、そのひずみ量に応じた割れがひずみ方向に垂直に
発生する。
With such a configuration, the ceramic thin film is extremely brittle (similar to "stress coatings", when a strain occurs on the object to be measured, cracks corresponding to the amount of strain will occur perpendicular to the direction of the strain). .

〔実施例〕〔Example〕

本発明の一実施例を図面について説明すると、第1囚は
被測定物にセラミックス薄膜をコーティングする要領を
示す平面図、第2図は第1図の要領でコーティングされ
た被測定物が引張力を受けている状態を示す平面図、第
3図は第2図のIII部を示す部分拡大図、第4図は第
3図の割れの数とひずみとの関係を示す線図である。
To explain one embodiment of the present invention with reference to the drawings, the first figure is a plan view showing the procedure for coating an object to be measured with a ceramic thin film, and the second figure is a plan view showing the method of coating an object to be measured with a ceramic thin film in the manner shown in Fig. 1. FIG. 3 is a partially enlarged view of section III in FIG. 2, and FIG. 4 is a diagram showing the relationship between the number of cracks and strain in FIG. 3.

まず、第1図に示すように、被測定物1上にセラミック
ス薄膜(TjN、 Tic等)をイオンブレーティング
等の装置7によりコーティングする。
First, as shown in FIG. 1, a ceramic thin film (TjN, Tic, etc.) is coated on the object to be measured 1 using an ion blating device 7 or the like.

表面にセラミックス薄膜2がコーティングされた被測定
物1に、第2図に示すように、外力が作用し、ひずみを
生ずると、セラミックス薄膜2の表面性状が変化する。
As shown in FIG. 2, when an external force is applied to the object to be measured 1 whose surface is coated with the ceramic thin film 2 and a strain is generated, the surface properties of the ceramic thin film 2 change.

これを拡大鏡で数十倍〜100倍程度に拡大して観察す
ると、第3図に示すように、ひずみ方向に垂直に多数の
割れ3が見られる。
When this is observed with a magnifying glass at a magnification of several tens to 100 times, a large number of cracks 3 can be seen perpendicular to the strain direction, as shown in FIG.

この割れの間隔または単位長さ当りの本数は、第4図に
示すように、被測定物1に生じたひずみと相関を持って
いるので、この割れの間隔又は単位長さ当りの本数を数
えることにより、被測定物1に生じたひずみ量を推定す
ることができる。
The interval between these cracks or the number of cracks per unit length has a correlation with the strain that occurs in the object to be measured 1, as shown in Figure 4, so the interval between these cracks or the number of cracks per unit length is counted. By this, the amount of strain occurring in the object to be measured 1 can be estimated.

また、割れはひずみ方向に対して垂直な方向Jこ生ずる
ので、被測定物1に生じたひずみの方向も推定すること
ができる。
Furthermore, since cracks occur in the direction J perpendicular to the direction of strain, the direction of strain occurring in the object to be measured 1 can also be estimated.

〔蒐町の効果〕[Effects of Mamachi]

セラミックス薄膜は温度、湿度による影響を受は難いの
で、数百度℃までの高温及び又は100%までの多湿の
雰囲気でも、応力・ひずみを測定することができる。
Ceramic thin films are not easily affected by temperature and humidity, so stress and strain can be measured even in high-temperature environments up to several hundred degrees Celsius and/or high-humidity environments up to 100%.

要するに本発明によれば、被測定物の表面に真空蒸着法
により形成され、ひずみ!こよって発生する割れを計測
することにより応力・ひずみを求めることのできるセラ
ミックス薄膜よりなることにより、温度、湿度の広い範
囲にわたって使用することのできるひずみl応力測定膜
を得るから、本発明は産業上極めて有益なものである。
In short, according to the present invention, strain is formed on the surface of the object to be measured by vacuum evaporation. By using a ceramic thin film that can determine stress and strain by measuring the cracks that occur, a strain/stress measurement film that can be used over a wide range of temperature and humidity is obtained, and therefore the present invention has industrial applications. Above all, it is extremely useful.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例のセラミックスコーティング
の要領を示す平面図、第2図は第1図の要領でコーティ
ングされた被測定物が引張力を受けている状態を示す平
面図、第3図は第2図の■部を示す部分拡大図、第4図
は第3図の割れの数とひずみとの関係を示す線図である
。 第5図は従来の応力塗膜によるわれの発生を示す平面図
である。 1・・被測定物、2・・セラミックス薄膜、3・・割れ
、4・・被測定物に生じたひずみ量、5・・セラミック
ス薄膜に生じた割れの単位長さ当りの本数又は割れ間隔
の逆数、6・・応力塗膜、7・・イオンブレーティング
等のコーティング装置 代理人 弁理士 塚 本 正 文 第1vA     第2図 第3図    第4図 第5図 ム 手続補正書 昭和62年g月3日 1 事件の表示 昭和62年特許願第56010  号 2 発明の名称 ひずみ・応力測定膜 3 補正をする者 事件との関係 出願人 郵便番号   100 住所    東京都千代田区丸の内二丁目S番1号名称
   (620)  三菱重工業株式会社4 代理人 郵便番号   160 住所   東京都新宿区南元町5番地3号−5補正命令
の日付     昭和62年 5月26日7 補正の内
FIG. 1 is a plan view showing the method of ceramic coating according to an embodiment of the present invention, FIG. FIG. 3 is a partially enlarged view showing the part ■ in FIG. 2, and FIG. 4 is a diagram showing the relationship between the number of cracks and strain in FIG. FIG. 5 is a plan view showing the occurrence of cracks in a conventional stress coating film. 1. Object to be measured, 2. Ceramic thin film, 3. Crack, 4. Amount of strain that occurred in the object to be measured, 5. Number of cracks per unit length or crack interval that occurred in the ceramic thin film. Reciprocal number, 6... Stress coating film, 7... Coating equipment agent for ion blating, etc. Patent attorney Masafumi Tsukamoto Part 1vA Figure 2 Figure 3 Figure 4 Figure 5 Procedural amendment document August 1986 3rd 1 Display of the case Patent Application No. 56010 of 1988 2 Name of the invention Strain/Stress Measuring Membrane 3 Person making the amendment Relationship to the case Applicant Postal code 100 Address No. 1 S, Marunouchi 2-chome, Chiyoda-ku, Tokyo Name (620) Mitsubishi Heavy Industries, Ltd. 4 Agent postal code 160 Address No. 3-5, 5-5 Minamimotomachi, Shinjuku-ku, Tokyo Date of amendment order May 26, 1988 7 Contents of amendment

Claims (1)

【特許請求の範囲】 被測定物の表面に真空蒸着法により形成さ れ、ひずみによって発生する割れを計測することにより
応力・ひずみを求めることのできるセラミックス薄膜よ
りなることを特徴とするひずみ・応力測定膜。
[Claims] Strain/stress measurement characterized by comprising a ceramic thin film formed on the surface of an object to be measured by vacuum evaporation and capable of determining stress/strain by measuring cracks caused by strain. film.
JP5601087A 1987-03-11 1987-03-11 Strain/stress measuring film Pending JPS63222234A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5601087A JPS63222234A (en) 1987-03-11 1987-03-11 Strain/stress measuring film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5601087A JPS63222234A (en) 1987-03-11 1987-03-11 Strain/stress measuring film

Publications (1)

Publication Number Publication Date
JPS63222234A true JPS63222234A (en) 1988-09-16

Family

ID=13015084

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5601087A Pending JPS63222234A (en) 1987-03-11 1987-03-11 Strain/stress measuring film

Country Status (1)

Country Link
JP (1) JPS63222234A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033050A (en) * 2005-07-22 2007-02-08 Shimizu Corp Strain sensor
JP2012137193A (en) * 2012-04-23 2012-07-19 Mitsubishi Heavy Ind Ltd Planetary roller type traction drive
US8873028B2 (en) 2010-08-26 2014-10-28 Apple Inc. Non-destructive stress profile determination in chemically tempered glass
US8923693B2 (en) 2010-07-30 2014-12-30 Apple Inc. Electronic device having selectively strengthened cover glass
US8937689B2 (en) 2009-03-02 2015-01-20 Apple Inc. Techniques for strengthening glass covers for portable electronic devices
US9125298B2 (en) 2012-01-25 2015-09-01 Apple Inc. Fused glass device housings
US9128666B2 (en) 2011-05-04 2015-09-08 Apple Inc. Housing for portable electronic device with reduced border region
US9213451B2 (en) 2010-06-04 2015-12-15 Apple Inc. Thin glass for touch panel sensors and methods therefor
US9405388B2 (en) 2008-06-30 2016-08-02 Apple Inc. Full perimeter chemical strengthening of substrates
US9439305B2 (en) 2010-09-17 2016-09-06 Apple Inc. Glass enclosure
US9459661B2 (en) 2013-06-19 2016-10-04 Apple Inc. Camouflaged openings in electronic device housings
US9516149B2 (en) 2011-09-29 2016-12-06 Apple Inc. Multi-layer transparent structures for electronic device housings
US9615448B2 (en) 2008-06-27 2017-04-04 Apple Inc. Method for fabricating thin sheets of glass
US9725359B2 (en) 2011-03-16 2017-08-08 Apple Inc. Electronic device having selectively strengthened glass
US9778685B2 (en) 2011-05-04 2017-10-03 Apple Inc. Housing for portable electronic device with reduced border region
US9886062B2 (en) 2014-02-28 2018-02-06 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
US9944554B2 (en) 2011-09-15 2018-04-17 Apple Inc. Perforated mother sheet for partial edge chemical strengthening and method therefor
US9946302B2 (en) 2012-09-19 2018-04-17 Apple Inc. Exposed glass article with inner recessed area for portable electronic device housing
US10018891B2 (en) 2012-01-10 2018-07-10 Apple Inc. Integrated camera window
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
US10144669B2 (en) 2011-11-21 2018-12-04 Apple Inc. Self-optimizing chemical strengthening bath for glass
US10189743B2 (en) 2010-08-18 2019-01-29 Apple Inc. Enhanced strengthening of glass

Cited By (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007033050A (en) * 2005-07-22 2007-02-08 Shimizu Corp Strain sensor
US9615448B2 (en) 2008-06-27 2017-04-04 Apple Inc. Method for fabricating thin sheets of glass
US9405388B2 (en) 2008-06-30 2016-08-02 Apple Inc. Full perimeter chemical strengthening of substrates
US8937689B2 (en) 2009-03-02 2015-01-20 Apple Inc. Techniques for strengthening glass covers for portable electronic devices
US10185113B2 (en) 2009-03-02 2019-01-22 Apple Inc. Techniques for strengthening glass covers for portable electronic devices
US9213451B2 (en) 2010-06-04 2015-12-15 Apple Inc. Thin glass for touch panel sensors and methods therefor
US8923693B2 (en) 2010-07-30 2014-12-30 Apple Inc. Electronic device having selectively strengthened cover glass
US10189743B2 (en) 2010-08-18 2019-01-29 Apple Inc. Enhanced strengthening of glass
US8873028B2 (en) 2010-08-26 2014-10-28 Apple Inc. Non-destructive stress profile determination in chemically tempered glass
US9439305B2 (en) 2010-09-17 2016-09-06 Apple Inc. Glass enclosure
US10765020B2 (en) 2010-09-17 2020-09-01 Apple Inc. Glass enclosure
US10021798B2 (en) 2010-09-17 2018-07-10 Apple Inc. Glass enclosure
US10398043B2 (en) 2010-09-17 2019-08-27 Apple Inc. Glass enclosure
US11785729B2 (en) 2010-09-17 2023-10-10 Apple Inc. Glass enclosure
US10676393B2 (en) 2011-03-16 2020-06-09 Apple Inc. Electronic device having selectively strengthened glass
US12043571B2 (en) 2011-03-16 2024-07-23 Apple Inc. Electronic device having selectively strengthened glass
US9725359B2 (en) 2011-03-16 2017-08-08 Apple Inc. Electronic device having selectively strengthened glass
US11518708B2 (en) 2011-03-16 2022-12-06 Apple Inc. Electronic device having selectively strengthened glass
US9513664B2 (en) 2011-05-04 2016-12-06 Apple Inc. Housing for portable electronic device with reduced border region
US10401904B2 (en) 2011-05-04 2019-09-03 Apple Inc. Housing for portable electronic device with reduced border region
US12079032B2 (en) 2011-05-04 2024-09-03 Apple Inc. Housing for portable electronic device with reduced border region
US11681326B2 (en) 2011-05-04 2023-06-20 Apple Inc. Housing for portable electronic device with reduced border region
US9128666B2 (en) 2011-05-04 2015-09-08 Apple Inc. Housing for portable electronic device with reduced border region
US10983557B2 (en) 2011-05-04 2021-04-20 Apple Inc. Housing for portable electronic device with reduced border region
US9778685B2 (en) 2011-05-04 2017-10-03 Apple Inc. Housing for portable electronic device with reduced border region
US10761563B2 (en) 2011-05-04 2020-09-01 Apple Inc. Housing for portable electronic device with reduced border region
US10656674B2 (en) 2011-05-04 2020-05-19 Apple Inc. Housing for portable electronic device with reduced border region
US9944554B2 (en) 2011-09-15 2018-04-17 Apple Inc. Perforated mother sheet for partial edge chemical strengthening and method therefor
US10574800B2 (en) 2011-09-29 2020-02-25 Apple Inc. Multi-layer transparent structures for electronic device housings
US9516149B2 (en) 2011-09-29 2016-12-06 Apple Inc. Multi-layer transparent structures for electronic device housings
US11368566B2 (en) 2011-09-29 2022-06-21 Apple Inc. Multi-layer transparent structures for electronic device housings
US10320959B2 (en) 2011-09-29 2019-06-11 Apple Inc. Multi-layer transparent structures for electronic device housings
US10144669B2 (en) 2011-11-21 2018-12-04 Apple Inc. Self-optimizing chemical strengthening bath for glass
US10018891B2 (en) 2012-01-10 2018-07-10 Apple Inc. Integrated camera window
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
US10551722B2 (en) 2012-01-10 2020-02-04 Apple Inc. Fused opaque and clear glass for camera or display window
US11612975B2 (en) 2012-01-25 2023-03-28 Apple Inc. Glass device housings
US10512176B2 (en) 2012-01-25 2019-12-17 Apple Inc. Glass device housings
US12083649B2 (en) 2012-01-25 2024-09-10 Apple Inc. Glass device housings
US10842031B2 (en) 2012-01-25 2020-11-17 Apple Inc. Glass device housings
US11260489B2 (en) 2012-01-25 2022-03-01 Apple Inc. Glass device housings
US9125298B2 (en) 2012-01-25 2015-09-01 Apple Inc. Fused glass device housings
US10278294B2 (en) 2012-01-25 2019-04-30 Apple Inc. Glass device housings
US9756739B2 (en) 2012-01-25 2017-09-05 Apple Inc. Glass device housing
JP2012137193A (en) * 2012-04-23 2012-07-19 Mitsubishi Heavy Ind Ltd Planetary roller type traction drive
US9946302B2 (en) 2012-09-19 2018-04-17 Apple Inc. Exposed glass article with inner recessed area for portable electronic device housing
US9459661B2 (en) 2013-06-19 2016-10-04 Apple Inc. Camouflaged openings in electronic device housings
US10579101B2 (en) 2014-02-28 2020-03-03 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
US9886062B2 (en) 2014-02-28 2018-02-06 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing
US10496135B2 (en) 2014-02-28 2019-12-03 Apple Inc. Exposed glass article with enhanced stiffness for portable electronic device housing

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