JPS63222234A - Strain/stress measuring film - Google Patents
Strain/stress measuring filmInfo
- Publication number
- JPS63222234A JPS63222234A JP5601087A JP5601087A JPS63222234A JP S63222234 A JPS63222234 A JP S63222234A JP 5601087 A JP5601087 A JP 5601087A JP 5601087 A JP5601087 A JP 5601087A JP S63222234 A JPS63222234 A JP S63222234A
- Authority
- JP
- Japan
- Prior art keywords
- strain
- measured
- cracks
- stress
- ceramic membrane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 claims abstract description 16
- 239000010409 thin film Substances 0.000 claims description 12
- 239000010408 film Substances 0.000 claims description 7
- 238000005259 measurement Methods 0.000 claims description 4
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 239000012528 membrane Substances 0.000 abstract description 8
- 238000000034 method Methods 0.000 abstract description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 238000007733 ion plating Methods 0.000 abstract 1
- 238000007740 vapor deposition Methods 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 8
- 239000003795 chemical substances by application Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はひずみ・応力測定膜に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a strain/stress measurement membrane.
皮膜の割れにより被測定物に生ずるひずみ。 Distortion that occurs in the measured object due to cracks in the film.
応力を測定するものとしては「応力塗膜」と呼ばれる塗
料が知られている。A coating called a "stress coating" is known as a device for measuring stress.
この種の応力塗膜は非常に脆いので、このところで、こ
の割れの間隔又は単位長さ当りの本数は被測定物に加え
られたひずみ量に依存しているので、この本数を数える
ことにより、被測定物に生じたひずみを知ることができ
、また被測定物の応力−ひすみ特性が既知の場合には、
被測定物に生じた応力を知ることができるのである。This type of stressed coating film is very brittle, so the interval between cracks or the number of cracks per unit length depends on the amount of strain applied to the object to be measured, so by counting this number, If the strain occurring in the object to be measured can be known, and the stress-strain characteristics of the object to be measured are known,
It is possible to know the stress generated in the object to be measured.
しかしながら、この塗料膜は温度0℃〜100℃の範囲
しか用いることができず、高温となる被測定物例えば、
ボイラー、タービン等の部材には適用できないという欠
点がある。However, this paint film can only be used in the temperature range of 0°C to 100°C;
It has the disadvantage that it cannot be applied to components such as boilers and turbines.
本fl Bgはこのような事情に鑑みて提案されたもの
で、温度、湿度の広い範囲にわたって使用することので
きるひずみ・応力測定膜を提供することを目的とする。The present fl Bg was proposed in view of these circumstances, and its purpose is to provide a strain/stress measurement membrane that can be used over a wide range of temperature and humidity.
そのために本¥閉は、被測定物の表面に真空蒸着法によ
り形成され、ひずみによって発生する割れを計測するこ
とにより応力・ひずみを求めることのできるセラミック
ス薄膜よりなることを特徴とする。To this end, this product is characterized by being made of a ceramic thin film that is formed on the surface of the object to be measured by vacuum evaporation, and allows stress and strain to be determined by measuring cracks that occur due to strain.
このような構成によれば、セラミックス薄膜は非常に脆
(、「応力塗膜」と同様被測定物にひずみが生じた場合
には、そのひずみ量に応じた割れがひずみ方向に垂直に
発生する。With such a configuration, the ceramic thin film is extremely brittle (similar to "stress coatings", when a strain occurs on the object to be measured, cracks corresponding to the amount of strain will occur perpendicular to the direction of the strain). .
本発明の一実施例を図面について説明すると、第1囚は
被測定物にセラミックス薄膜をコーティングする要領を
示す平面図、第2図は第1図の要領でコーティングされ
た被測定物が引張力を受けている状態を示す平面図、第
3図は第2図のIII部を示す部分拡大図、第4図は第
3図の割れの数とひずみとの関係を示す線図である。To explain one embodiment of the present invention with reference to the drawings, the first figure is a plan view showing the procedure for coating an object to be measured with a ceramic thin film, and the second figure is a plan view showing the method of coating an object to be measured with a ceramic thin film in the manner shown in Fig. 1. FIG. 3 is a partially enlarged view of section III in FIG. 2, and FIG. 4 is a diagram showing the relationship between the number of cracks and strain in FIG. 3.
まず、第1図に示すように、被測定物1上にセラミック
ス薄膜(TjN、 Tic等)をイオンブレーティング
等の装置7によりコーティングする。First, as shown in FIG. 1, a ceramic thin film (TjN, Tic, etc.) is coated on the object to be measured 1 using an ion blating device 7 or the like.
表面にセラミックス薄膜2がコーティングされた被測定
物1に、第2図に示すように、外力が作用し、ひずみを
生ずると、セラミックス薄膜2の表面性状が変化する。As shown in FIG. 2, when an external force is applied to the object to be measured 1 whose surface is coated with the ceramic thin film 2 and a strain is generated, the surface properties of the ceramic thin film 2 change.
これを拡大鏡で数十倍〜100倍程度に拡大して観察す
ると、第3図に示すように、ひずみ方向に垂直に多数の
割れ3が見られる。When this is observed with a magnifying glass at a magnification of several tens to 100 times, a large number of cracks 3 can be seen perpendicular to the strain direction, as shown in FIG.
この割れの間隔または単位長さ当りの本数は、第4図に
示すように、被測定物1に生じたひずみと相関を持って
いるので、この割れの間隔又は単位長さ当りの本数を数
えることにより、被測定物1に生じたひずみ量を推定す
ることができる。The interval between these cracks or the number of cracks per unit length has a correlation with the strain that occurs in the object to be measured 1, as shown in Figure 4, so the interval between these cracks or the number of cracks per unit length is counted. By this, the amount of strain occurring in the object to be measured 1 can be estimated.
また、割れはひずみ方向に対して垂直な方向Jこ生ずる
ので、被測定物1に生じたひずみの方向も推定すること
ができる。Furthermore, since cracks occur in the direction J perpendicular to the direction of strain, the direction of strain occurring in the object to be measured 1 can also be estimated.
セラミックス薄膜は温度、湿度による影響を受は難いの
で、数百度℃までの高温及び又は100%までの多湿の
雰囲気でも、応力・ひずみを測定することができる。Ceramic thin films are not easily affected by temperature and humidity, so stress and strain can be measured even in high-temperature environments up to several hundred degrees Celsius and/or high-humidity environments up to 100%.
要するに本発明によれば、被測定物の表面に真空蒸着法
により形成され、ひずみ!こよって発生する割れを計測
することにより応力・ひずみを求めることのできるセラ
ミックス薄膜よりなることにより、温度、湿度の広い範
囲にわたって使用することのできるひずみl応力測定膜
を得るから、本発明は産業上極めて有益なものである。In short, according to the present invention, strain is formed on the surface of the object to be measured by vacuum evaporation. By using a ceramic thin film that can determine stress and strain by measuring the cracks that occur, a strain/stress measurement film that can be used over a wide range of temperature and humidity is obtained, and therefore the present invention has industrial applications. Above all, it is extremely useful.
第1図は本発明の一実施例のセラミックスコーティング
の要領を示す平面図、第2図は第1図の要領でコーティ
ングされた被測定物が引張力を受けている状態を示す平
面図、第3図は第2図の■部を示す部分拡大図、第4図
は第3図の割れの数とひずみとの関係を示す線図である
。
第5図は従来の応力塗膜によるわれの発生を示す平面図
である。
1・・被測定物、2・・セラミックス薄膜、3・・割れ
、4・・被測定物に生じたひずみ量、5・・セラミック
ス薄膜に生じた割れの単位長さ当りの本数又は割れ間隔
の逆数、6・・応力塗膜、7・・イオンブレーティング
等のコーティング装置
代理人 弁理士 塚 本 正 文
第1vA 第2図
第3図 第4図
第5図
ム
手続補正書
昭和62年g月3日
1 事件の表示
昭和62年特許願第56010 号
2 発明の名称
ひずみ・応力測定膜
3 補正をする者
事件との関係 出願人
郵便番号 100
住所 東京都千代田区丸の内二丁目S番1号名称
(620) 三菱重工業株式会社4 代理人
郵便番号 160
住所 東京都新宿区南元町5番地3号−5補正命令
の日付 昭和62年 5月26日7 補正の内
容FIG. 1 is a plan view showing the method of ceramic coating according to an embodiment of the present invention, FIG. FIG. 3 is a partially enlarged view showing the part ■ in FIG. 2, and FIG. 4 is a diagram showing the relationship between the number of cracks and strain in FIG. FIG. 5 is a plan view showing the occurrence of cracks in a conventional stress coating film. 1. Object to be measured, 2. Ceramic thin film, 3. Crack, 4. Amount of strain that occurred in the object to be measured, 5. Number of cracks per unit length or crack interval that occurred in the ceramic thin film. Reciprocal number, 6... Stress coating film, 7... Coating equipment agent for ion blating, etc. Patent attorney Masafumi Tsukamoto Part 1vA Figure 2 Figure 3 Figure 4 Figure 5 Procedural amendment document August 1986 3rd 1 Display of the case Patent Application No. 56010 of 1988 2 Name of the invention Strain/Stress Measuring Membrane 3 Person making the amendment Relationship to the case Applicant Postal code 100 Address No. 1 S, Marunouchi 2-chome, Chiyoda-ku, Tokyo Name (620) Mitsubishi Heavy Industries, Ltd. 4 Agent postal code 160 Address No. 3-5, 5-5 Minamimotomachi, Shinjuku-ku, Tokyo Date of amendment order May 26, 1988 7 Contents of amendment
Claims (1)
応力・ひずみを求めることのできるセラミックス薄膜よ
りなることを特徴とするひずみ・応力測定膜。[Claims] Strain/stress measurement characterized by comprising a ceramic thin film formed on the surface of an object to be measured by vacuum evaporation and capable of determining stress/strain by measuring cracks caused by strain. film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5601087A JPS63222234A (en) | 1987-03-11 | 1987-03-11 | Strain/stress measuring film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5601087A JPS63222234A (en) | 1987-03-11 | 1987-03-11 | Strain/stress measuring film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63222234A true JPS63222234A (en) | 1988-09-16 |
Family
ID=13015084
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5601087A Pending JPS63222234A (en) | 1987-03-11 | 1987-03-11 | Strain/stress measuring film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63222234A (en) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007033050A (en) * | 2005-07-22 | 2007-02-08 | Shimizu Corp | Strain sensor |
JP2012137193A (en) * | 2012-04-23 | 2012-07-19 | Mitsubishi Heavy Ind Ltd | Planetary roller type traction drive |
US8873028B2 (en) | 2010-08-26 | 2014-10-28 | Apple Inc. | Non-destructive stress profile determination in chemically tempered glass |
US8923693B2 (en) | 2010-07-30 | 2014-12-30 | Apple Inc. | Electronic device having selectively strengthened cover glass |
US8937689B2 (en) | 2009-03-02 | 2015-01-20 | Apple Inc. | Techniques for strengthening glass covers for portable electronic devices |
US9125298B2 (en) | 2012-01-25 | 2015-09-01 | Apple Inc. | Fused glass device housings |
US9128666B2 (en) | 2011-05-04 | 2015-09-08 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9213451B2 (en) | 2010-06-04 | 2015-12-15 | Apple Inc. | Thin glass for touch panel sensors and methods therefor |
US9405388B2 (en) | 2008-06-30 | 2016-08-02 | Apple Inc. | Full perimeter chemical strengthening of substrates |
US9439305B2 (en) | 2010-09-17 | 2016-09-06 | Apple Inc. | Glass enclosure |
US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
US9516149B2 (en) | 2011-09-29 | 2016-12-06 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US9615448B2 (en) | 2008-06-27 | 2017-04-04 | Apple Inc. | Method for fabricating thin sheets of glass |
US9725359B2 (en) | 2011-03-16 | 2017-08-08 | Apple Inc. | Electronic device having selectively strengthened glass |
US9778685B2 (en) | 2011-05-04 | 2017-10-03 | Apple Inc. | Housing for portable electronic device with reduced border region |
US9886062B2 (en) | 2014-02-28 | 2018-02-06 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
US9944554B2 (en) | 2011-09-15 | 2018-04-17 | Apple Inc. | Perforated mother sheet for partial edge chemical strengthening and method therefor |
US9946302B2 (en) | 2012-09-19 | 2018-04-17 | Apple Inc. | Exposed glass article with inner recessed area for portable electronic device housing |
US10018891B2 (en) | 2012-01-10 | 2018-07-10 | Apple Inc. | Integrated camera window |
US10133156B2 (en) | 2012-01-10 | 2018-11-20 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US10144669B2 (en) | 2011-11-21 | 2018-12-04 | Apple Inc. | Self-optimizing chemical strengthening bath for glass |
US10189743B2 (en) | 2010-08-18 | 2019-01-29 | Apple Inc. | Enhanced strengthening of glass |
-
1987
- 1987-03-11 JP JP5601087A patent/JPS63222234A/en active Pending
Cited By (50)
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---|---|---|---|---|
JP2007033050A (en) * | 2005-07-22 | 2007-02-08 | Shimizu Corp | Strain sensor |
US9615448B2 (en) | 2008-06-27 | 2017-04-04 | Apple Inc. | Method for fabricating thin sheets of glass |
US9405388B2 (en) | 2008-06-30 | 2016-08-02 | Apple Inc. | Full perimeter chemical strengthening of substrates |
US8937689B2 (en) | 2009-03-02 | 2015-01-20 | Apple Inc. | Techniques for strengthening glass covers for portable electronic devices |
US10185113B2 (en) | 2009-03-02 | 2019-01-22 | Apple Inc. | Techniques for strengthening glass covers for portable electronic devices |
US9213451B2 (en) | 2010-06-04 | 2015-12-15 | Apple Inc. | Thin glass for touch panel sensors and methods therefor |
US8923693B2 (en) | 2010-07-30 | 2014-12-30 | Apple Inc. | Electronic device having selectively strengthened cover glass |
US10189743B2 (en) | 2010-08-18 | 2019-01-29 | Apple Inc. | Enhanced strengthening of glass |
US8873028B2 (en) | 2010-08-26 | 2014-10-28 | Apple Inc. | Non-destructive stress profile determination in chemically tempered glass |
US9439305B2 (en) | 2010-09-17 | 2016-09-06 | Apple Inc. | Glass enclosure |
US10765020B2 (en) | 2010-09-17 | 2020-09-01 | Apple Inc. | Glass enclosure |
US10021798B2 (en) | 2010-09-17 | 2018-07-10 | Apple Inc. | Glass enclosure |
US10398043B2 (en) | 2010-09-17 | 2019-08-27 | Apple Inc. | Glass enclosure |
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US10676393B2 (en) | 2011-03-16 | 2020-06-09 | Apple Inc. | Electronic device having selectively strengthened glass |
US12043571B2 (en) | 2011-03-16 | 2024-07-23 | Apple Inc. | Electronic device having selectively strengthened glass |
US9725359B2 (en) | 2011-03-16 | 2017-08-08 | Apple Inc. | Electronic device having selectively strengthened glass |
US11518708B2 (en) | 2011-03-16 | 2022-12-06 | Apple Inc. | Electronic device having selectively strengthened glass |
US9513664B2 (en) | 2011-05-04 | 2016-12-06 | Apple Inc. | Housing for portable electronic device with reduced border region |
US10401904B2 (en) | 2011-05-04 | 2019-09-03 | Apple Inc. | Housing for portable electronic device with reduced border region |
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US9944554B2 (en) | 2011-09-15 | 2018-04-17 | Apple Inc. | Perforated mother sheet for partial edge chemical strengthening and method therefor |
US10574800B2 (en) | 2011-09-29 | 2020-02-25 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US9516149B2 (en) | 2011-09-29 | 2016-12-06 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US11368566B2 (en) | 2011-09-29 | 2022-06-21 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US10320959B2 (en) | 2011-09-29 | 2019-06-11 | Apple Inc. | Multi-layer transparent structures for electronic device housings |
US10144669B2 (en) | 2011-11-21 | 2018-12-04 | Apple Inc. | Self-optimizing chemical strengthening bath for glass |
US10018891B2 (en) | 2012-01-10 | 2018-07-10 | Apple Inc. | Integrated camera window |
US10133156B2 (en) | 2012-01-10 | 2018-11-20 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US10551722B2 (en) | 2012-01-10 | 2020-02-04 | Apple Inc. | Fused opaque and clear glass for camera or display window |
US11612975B2 (en) | 2012-01-25 | 2023-03-28 | Apple Inc. | Glass device housings |
US10512176B2 (en) | 2012-01-25 | 2019-12-17 | Apple Inc. | Glass device housings |
US12083649B2 (en) | 2012-01-25 | 2024-09-10 | Apple Inc. | Glass device housings |
US10842031B2 (en) | 2012-01-25 | 2020-11-17 | Apple Inc. | Glass device housings |
US11260489B2 (en) | 2012-01-25 | 2022-03-01 | Apple Inc. | Glass device housings |
US9125298B2 (en) | 2012-01-25 | 2015-09-01 | Apple Inc. | Fused glass device housings |
US10278294B2 (en) | 2012-01-25 | 2019-04-30 | Apple Inc. | Glass device housings |
US9756739B2 (en) | 2012-01-25 | 2017-09-05 | Apple Inc. | Glass device housing |
JP2012137193A (en) * | 2012-04-23 | 2012-07-19 | Mitsubishi Heavy Ind Ltd | Planetary roller type traction drive |
US9946302B2 (en) | 2012-09-19 | 2018-04-17 | Apple Inc. | Exposed glass article with inner recessed area for portable electronic device housing |
US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
US10579101B2 (en) | 2014-02-28 | 2020-03-03 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
US9886062B2 (en) | 2014-02-28 | 2018-02-06 | Apple Inc. | Exposed glass article with enhanced stiffness for portable electronic device housing |
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