JPS63218757A - Heat-resistant film - Google Patents
Heat-resistant filmInfo
- Publication number
- JPS63218757A JPS63218757A JP5144087A JP5144087A JPS63218757A JP S63218757 A JPS63218757 A JP S63218757A JP 5144087 A JP5144087 A JP 5144087A JP 5144087 A JP5144087 A JP 5144087A JP S63218757 A JPS63218757 A JP S63218757A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- maleimide
- film
- heat
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229920005989 resin Polymers 0.000 claims abstract description 31
- 239000011347 resin Substances 0.000 claims abstract description 31
- -1 alkylene terephthalate Chemical compound 0.000 claims abstract description 19
- 229920001225 polyester resin Polymers 0.000 claims abstract description 15
- 239000004645 polyester resin Substances 0.000 claims abstract description 15
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229920006395 saturated elastomer Polymers 0.000 claims abstract description 13
- 239000007795 chemical reaction product Substances 0.000 claims abstract description 8
- 239000003822 epoxy resin Substances 0.000 abstract description 13
- 229920000647 polyepoxide Polymers 0.000 abstract description 13
- 229920003192 poly(bis maleimide) Polymers 0.000 abstract description 12
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 abstract description 11
- 239000002904 solvent Substances 0.000 abstract description 9
- 239000003054 catalyst Substances 0.000 abstract description 4
- 229920000642 polymer Polymers 0.000 abstract description 3
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 abstract description 2
- MMINFSMURORWKH-UHFFFAOYSA-N 3,6-dioxabicyclo[6.2.2]dodeca-1(10),8,11-triene-2,7-dione Chemical group O=C1OCCOC(=O)C2=CC=C1C=C2 MMINFSMURORWKH-UHFFFAOYSA-N 0.000 abstract description 2
- 239000007787 solid Substances 0.000 abstract description 2
- 150000003923 2,5-pyrrolediones Chemical class 0.000 abstract 1
- 150000004985 diamines Chemical class 0.000 abstract 1
- 239000010408 film Substances 0.000 description 20
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 19
- 238000001723 curing Methods 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 11
- 238000005476 soldering Methods 0.000 description 10
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 239000002253 acid Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 229920000728 polyester Polymers 0.000 description 7
- 229920006267 polyester film Polymers 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 239000011342 resin composition Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000047 product Substances 0.000 description 5
- KKEYFWRCBNTPAC-UHFFFAOYSA-N terephthalic acid group Chemical group C(C1=CC=C(C(=O)O)C=C1)(=O)O KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000012787 coverlay film Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 239000004745 nonwoven fabric Substances 0.000 description 4
- 229920003002 synthetic resin Polymers 0.000 description 4
- 239000000057 synthetic resin Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 150000002148 esters Chemical class 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002759 woven fabric Substances 0.000 description 3
- MQXNNWDXHFBFEB-UHFFFAOYSA-N 2,2-bis(2-hydroxyphenyl)propane Chemical compound C=1C=CC=C(O)C=1C(C)(C)C1=CC=CC=C1O MQXNNWDXHFBFEB-UHFFFAOYSA-N 0.000 description 2
- GUUVPOWQJOLRAS-UHFFFAOYSA-N Diphenyl disulfide Chemical compound C=1C=CC=CC=1SSC1=CC=CC=C1 GUUVPOWQJOLRAS-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- 238000010292 electrical insulation Methods 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 125000005462 imide group Chemical group 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical group OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 150000002978 peroxides Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000000454 talc Substances 0.000 description 2
- 229910052623 talc Inorganic materials 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 2
- QWQFVUQPHUKAMY-UHFFFAOYSA-N 1,2-diphenyl-2-propoxyethanone Chemical compound C=1C=CC=CC=1C(OCCC)C(=O)C1=CC=CC=C1 QWQFVUQPHUKAMY-UHFFFAOYSA-N 0.000 description 1
- FKASFBLJDCHBNZ-UHFFFAOYSA-N 1,3,4-oxadiazole Chemical compound C1=NN=CO1 FKASFBLJDCHBNZ-UHFFFAOYSA-N 0.000 description 1
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- UICXTANXZJJIBC-UHFFFAOYSA-N 1-(1-hydroperoxycyclohexyl)peroxycyclohexan-1-ol Chemical compound C1CCCCC1(O)OOC1(OO)CCCCC1 UICXTANXZJJIBC-UHFFFAOYSA-N 0.000 description 1
- PUKLCKVOVCZYKF-UHFFFAOYSA-N 1-[2-(2,5-dioxopyrrol-1-yl)ethyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCN1C(=O)C=CC1=O PUKLCKVOVCZYKF-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- AQGZJQNZNONGKY-UHFFFAOYSA-N 1-[4-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=C(N2C(C=CC2=O)=O)C=C1 AQGZJQNZNONGKY-UHFFFAOYSA-N 0.000 description 1
- PYVHLZLQVWXBDZ-UHFFFAOYSA-N 1-[6-(2,5-dioxopyrrol-1-yl)hexyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CCCCCCN1C(=O)C=CC1=O PYVHLZLQVWXBDZ-UHFFFAOYSA-N 0.000 description 1
- BOCJQSFSGAZAPQ-UHFFFAOYSA-N 1-chloroanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2Cl BOCJQSFSGAZAPQ-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- SJEBAWHUJDUKQK-UHFFFAOYSA-N 2-ethylanthraquinone Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC=C3C(=O)C2=C1 SJEBAWHUJDUKQK-UHFFFAOYSA-N 0.000 description 1
- DIVXVZXROTWKIH-UHFFFAOYSA-N 2-hydroxy-1,2-diphenylpropan-1-one Chemical compound C=1C=CC=CC=1C(O)(C)C(=O)C1=CC=CC=C1 DIVXVZXROTWKIH-UHFFFAOYSA-N 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- KQIKKETXZQDHGE-FOCLMDBBSA-N 4,4'-diaminoazobenzene Chemical compound C1=CC(N)=CC=C1\N=N\C1=CC=C(N)C=C1 KQIKKETXZQDHGE-FOCLMDBBSA-N 0.000 description 1
- DLYLVPHSKJVGLG-UHFFFAOYSA-N 4-(cyclohexylmethyl)cyclohexane-1,1-diamine Chemical compound C1CC(N)(N)CCC1CC1CCCCC1 DLYLVPHSKJVGLG-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- XECVXFWNYNXCBN-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylmethyl]aniline Chemical compound C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)C1=CC=CC=C1 XECVXFWNYNXCBN-UHFFFAOYSA-N 0.000 description 1
- CGNWKZGNJFCAMM-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphanyl]aniline Chemical compound C1=CC(N)=CC=C1P(C=1C=CC(N)=CC=1)C1=CC=CC=C1 CGNWKZGNJFCAMM-UHFFFAOYSA-N 0.000 description 1
- XVTPFYDGLFDXHH-UHFFFAOYSA-N 4-[(4-aminophenyl)-phosphanylmethyl]aniline Chemical compound C1=CC(N)=CC=C1C(P)C1=CC=C(N)C=C1 XVTPFYDGLFDXHH-UHFFFAOYSA-N 0.000 description 1
- GPXUPINUTNRGMB-UHFFFAOYSA-N 4-[2-[3-[4-(4-aminophenyl)-1,3-thiazol-2-yl]phenyl]-1,3-thiazol-4-yl]aniline Chemical compound C1=CC(N)=CC=C1C1=CSC(C=2C=C(C=CC=2)C=2SC=C(N=2)C=2C=CC(N)=CC=2)=N1 GPXUPINUTNRGMB-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- UGVRJVHOJNYEHR-UHFFFAOYSA-N 4-chlorobenzophenone Chemical compound C1=CC(Cl)=CC=C1C(=O)C1=CC=CC=C1 UGVRJVHOJNYEHR-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- RZVHIXYEVGDQDX-UHFFFAOYSA-N 9,10-anthraquinone Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C(=O)C2=C1 RZVHIXYEVGDQDX-UHFFFAOYSA-N 0.000 description 1
- 229940076442 9,10-anthraquinone Drugs 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- 239000005997 Calcium carbide Substances 0.000 description 1
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 229930194542 Keto Natural products 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical group CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- BDEOXDSSZJCZPE-UHFFFAOYSA-N [1,3]thiazolo[4,5-d][1,3]thiazole Chemical compound N1=CSC2=C1N=CS2 BDEOXDSSZJCZPE-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- ISKQADXMHQSTHK-UHFFFAOYSA-N [4-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=C(CN)C=C1 ISKQADXMHQSTHK-UHFFFAOYSA-N 0.000 description 1
- BEUGBYXJXMVRFO-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-phenylmethanone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=CC=C1 BEUGBYXJXMVRFO-UHFFFAOYSA-N 0.000 description 1
- BQHZBCPRRFCFNZ-UHFFFAOYSA-N [Au].CC(=O)CC(C)=O Chemical compound [Au].CC(=O)CC(C)=O BQHZBCPRRFCFNZ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- HFACYLZERDEVSX-UHFFFAOYSA-N benzidine Chemical compound C1=CC(N)=CC=C1C1=CC=C(N)C=C1 HFACYLZERDEVSX-UHFFFAOYSA-N 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- FPCJKVGGYOAWIZ-UHFFFAOYSA-N butan-1-ol;titanium Chemical compound [Ti].CCCCO.CCCCO.CCCCO.CCCCO FPCJKVGGYOAWIZ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- QNZRVYCYEMYQMD-UHFFFAOYSA-N copper;pentane-2,4-dione Chemical compound [Cu].CC(=O)CC(C)=O QNZRVYCYEMYQMD-UHFFFAOYSA-N 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- XJOBOFWTZOKMOH-UHFFFAOYSA-N decanoyl decaneperoxoate Chemical compound CCCCCCCCCC(=O)OOC(=O)CCCCCCCCC XJOBOFWTZOKMOH-UHFFFAOYSA-N 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- YQGOJNYOYNNSMM-UHFFFAOYSA-N eosin Chemical compound [Na+].OC(=O)C1=CC=CC=C1C1=C2C=C(Br)C(=O)C(Br)=C2OC2=C(Br)C(O)=C(Br)C=C21 YQGOJNYOYNNSMM-UHFFFAOYSA-N 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- GNBHRKFJIUUOQI-UHFFFAOYSA-N fluorescein Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 GNBHRKFJIUUOQI-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 235000011194 food seasoning agent Nutrition 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 125000003827 glycol group Chemical group 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- 239000012210 heat-resistant fiber Substances 0.000 description 1
- 229910001385 heavy metal Inorganic materials 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 150000002440 hydroxy compounds Chemical class 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000011256 inorganic filler Substances 0.000 description 1
- DLAPQHBZCAAVPQ-UHFFFAOYSA-N iron;pentane-2,4-dione Chemical compound [Fe].CC(=O)CC(C)=O DLAPQHBZCAAVPQ-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- CXKWCBBOMKCUKX-UHFFFAOYSA-M methylene blue Chemical compound [Cl-].C1=CC(N(C)C)=CC2=[S+]C3=CC(N(C)C)=CC=C3N=C21 CXKWCBBOMKCUKX-UHFFFAOYSA-M 0.000 description 1
- 229960000907 methylthioninium chloride Drugs 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QBYNWJVTTUAPCT-UHFFFAOYSA-N n,n'-bis(2-chlorophenyl)methanediamine Chemical compound ClC1=CC=CC=C1NCNC1=CC=CC=C1Cl QBYNWJVTTUAPCT-UHFFFAOYSA-N 0.000 description 1
- GEMHFKXPOCTAIP-UHFFFAOYSA-N n,n-dimethyl-n'-phenylcarbamimidoyl chloride Chemical compound CN(C)C(Cl)=NC1=CC=CC=C1 GEMHFKXPOCTAIP-UHFFFAOYSA-N 0.000 description 1
- KYTZHLUVELPASH-UHFFFAOYSA-N naphthalene-1,2-dicarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC=C21 KYTZHLUVELPASH-UHFFFAOYSA-N 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000012766 organic filler Substances 0.000 description 1
- AFEQENGXSMURHA-UHFFFAOYSA-N oxiran-2-ylmethanamine Chemical compound NCC1CO1 AFEQENGXSMURHA-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical group OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- GGFBICGBDXVAGX-UHFFFAOYSA-N propylaluminum Chemical compound [Al].[CH2]CC GGFBICGBDXVAGX-UHFFFAOYSA-N 0.000 description 1
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical group OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- CLZWAWBPWVRRGI-UHFFFAOYSA-N tert-butyl 2-[2-[2-[2-[bis[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]amino]-5-bromophenoxy]ethoxy]-4-methyl-n-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethyl]anilino]acetate Chemical compound CC1=CC=C(N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)C(OCCOC=2C(=CC=C(Br)C=2)N(CC(=O)OC(C)(C)C)CC(=O)OC(C)(C)C)=C1 CLZWAWBPWVRRGI-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 229960002447 thiram Drugs 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 125000005590 trimellitic acid group Chemical group 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0313—Organic insulating material
- H05K1/032—Organic insulating material consisting of one material
- H05K1/0346—Organic insulating material consisting of one material containing N
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、耐熱性フィルムに関するものであり、更に具
体的には、フレキシブルプリント回路板に用いるに適し
た自己支持性のある耐熱性の改良されたフィルムに関す
る。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to heat resistant films, and more particularly to improved heat resistant self-supporting films suitable for use in flexible printed circuit boards. Regarding the film that was made.
(従来の技術)
近年、所謂フレキシブルプリント回路板が、エンクトロ
二クス分野で広く用いられ、機器の小型化、軽量化に貢
献している。フレキシブルプリント回路板は、合成樹脂
フィルム基板に銅箔を接着積層して、銅張積層シートと
し、との銅箔面にスクリーン印刷又はフォトレジスト法
により回路パターンを形成し、次いで湿式エツチング法
で銅箔の不要部分を除去して、銅回路を形成せしめたも
のである。これに用いる合成樹脂フィルムとしては、ポ
リエステルフィルム、ポリイミドフィルム、ガラスクロ
ス強化エポキシ樹脂シート、アラミツドペーパーなどが
、その電気絶縁性、耐熱性、耐薬品性、機械適性質など
の点から重用されている。(Prior Art) In recent years, so-called flexible printed circuit boards have been widely used in the electronics field, contributing to the miniaturization and weight reduction of equipment. Flexible printed circuit boards are produced by adhesively laminating copper foil onto a synthetic resin film substrate to form a copper-clad laminate sheet, forming a circuit pattern on the surface of the copper foil by screen printing or photoresist, and then etching the copper by wet etching. A copper circuit is formed by removing unnecessary parts of the foil. Synthetic resin films used for this purpose include polyester films, polyimide films, glass cloth-reinforced epoxy resin sheets, and aramid paper, which are important because of their electrical insulation, heat resistance, chemical resistance, and mechanical suitability. There is.
しかし、例えばフレキシブルプリント回路板用の基板フ
ィルム、カバーレイフィルムとして使用する場合は26
0℃以上の半田浴および350℃以上の手半田や熱圧替
に耐えなければならないが、現在用いられているポリエ
ステルフィルムは安価であるがこのような半田耐熱性は
ない。However, when used as a substrate film or coverlay film for flexible printed circuit boards, for example, 26
It must withstand soldering baths at 0° C. or higher, manual soldering at 350° C. or higher, and heat-pressure changes.Currently used polyester films, although inexpensive, do not have such soldering heat resistance.
(発明が解決しようとする問題点)
本発明は、ポリエステル成分を基本とし、かつ従来のポ
リエステルフィルムにはないフレキシブルプリント回路
板用に用いるに適した260℃以上の半田浴、350℃
以上の手半田や熱圧着に耐えうる耐熱性フィルムを提供
しようとするものである。(Problems to be Solved by the Invention) The present invention provides a solder bath at 260°C or higher, which is based on a polyester component, and which is suitable for use in flexible printed circuit boards, which is not found in conventional polyester films.
The present invention aims to provide a heat-resistant film that can withstand the above-described manual soldering and thermocompression bonding.
(問題点を解決するための手段)
本発明者らは、従来のポリエステルフィルムの持つ上記
した問題点を解決すべく鋭意研究を重ねた結果、高度な
耐熱性即ち、260℃以上の半田浴、350℃以上の手
半田や熱圧看に耐えつるフレキシブルプリント回路板用
やカバーレイフィルム用に用いるに適した自己支持性の
耐熱性フィルムを見い出し、本発明に到達した。即ち、
本発明はアルキレンテレフタレート繰返し単位を少なく
とも20モル%含存する飽和ポリエステル樹脂(a)、
マレイミド樹脂及び/又はマレイミド変性樹脂(b)と
を、各々全樹脂組成物に対して(a)85〜40重11
%、(b)15〜60Tn量%を含有する反応生成物か
ら成ることを特徴とする耐熱性フィルムである。(Means for Solving the Problems) As a result of intensive research to solve the above-mentioned problems of conventional polyester films, the present inventors have found that they have a high degree of heat resistance, that is, a solder bath of 260° C. or higher; The present invention has been achieved by discovering a self-supporting heat-resistant film suitable for use in flexible printed circuit boards and coverlay films that can withstand manual soldering and heat pressure at temperatures of 350° C. or higher. That is,
The present invention provides a saturated polyester resin (a) containing at least 20 mol% of alkylene terephthalate repeating units,
Maleimide resin and/or maleimide modified resin (b) and (a) 85 to 40 weight 11 to the total resin composition, respectively.
%, (b) a reaction product containing 15 to 60 Tn amount %.
本発明に用いられるアルキレンテレフタレート繰返し単
位をポリマーに対して少くとも20モル%含存する飽和
ポリエステル樹脂とは、酸成分を合it1.oモルとグ
リコール成分を合計1.0モルから成る飽和ポリエステ
ル樹脂(1モル)中のアルキレンテレフタレート繰返し
単位の割合をiル%で示した時、30モル%以上になる
様な飽和ポリエステル樹脂のことである。具体的に示せ
ばテレフタル酸単位0.6モル、インフタル酸単位0.
4モル、エチレングリコール単位0.7モル、ネオペン
チルグリコール単位0,3モルから成るポリエステルの
アルキレンテレフタレート単位は、0.8X0.7+0
.6X0.3−0.8となり60モル%ということに“
なる。The saturated polyester resin containing at least 20 mol % of alkylene terephthalate repeating units based on the polymer used in the present invention means that the acid component is 1. A saturated polyester resin in which the proportion of alkylene terephthalate repeating units in a saturated polyester resin (1 mole) consisting of a total of 1.0 mole and a glycol component is 30 mole% or more when expressed in il%. It is. Specifically, 0.6 mol of terephthalic acid units, 0.6 mol of inphthalic acid units.
The alkylene terephthalate units of a polyester consisting of 4 moles, 0.7 moles of ethylene glycol units, and 0.3 moles of neopentyl glycol units are 0.8X0.7+0
.. 6X0.3-0.8, which means 60 mol%.
Become.
本発明のポリエステルを形成するテレフタル酸以外の酸
成分は例えば、イソフタル酸、フタル酸、ナフタレンジ
カルボン酸などの芳香族ジカルボン酸、コハク酸、アジ
ピン酸、アゼライン酸、セパチン酸、ドデカンジオ/酸
、ダイマー酸などの脂肪族ジカルボン酸がある。本発明
のポリエステルを形成するアルキレ/グリコールをグリ
コールの形で示せばエチレングリコール、トリメチレン
グリコール、テトラメチレングリコール、ヘキサメチレ
ングリコール、ネオペンチルグリコールなどがあり、ジ
エチレングリコール、トリエチレングリコール、2.2
−ビス(ヒドロキシフェニル)プロパンのエチレングリ
コールエーテルなどのエーテル結合を含むグリコールも
アルキレングリコールとして含ませる。Acid components other than terephthalic acid that form the polyester of the present invention include, for example, isophthalic acid, phthalic acid, aromatic dicarboxylic acids such as naphthalene dicarboxylic acid, succinic acid, adipic acid, azelaic acid, cepatic acid, dodecanedio/acid, and dimer acid. There are aliphatic dicarboxylic acids such as In the form of glycol, the alkylene/glycol forming the polyester of the present invention includes ethylene glycol, trimethylene glycol, tetramethylene glycol, hexamethylene glycol, neopentyl glycol, diethylene glycol, triethylene glycol, 2.2
- Glycols containing an ether bond, such as ethylene glycol ether of bis(hydroxyphenyl)propane, are also included as alkylene glycols.
本発明のポリエステルを形成するアルキレングリコール
以外のヒドロキシ化合物を示せば、ハイドロキノン、レ
ゾルシン、2−2ビス(ヒドロキシフェニル)プロパン
などを挙げることができる。又、本発明に用いられる飽
和ポリエステル樹脂中には、トリメリット酸単位、ピロ
メリット酸単位、トリメチロールプロパン単位、ペンタ
エリスリトール単位などの多官能単位が含まれていても
よい。Hydroxy compounds other than alkylene glycol that form the polyester of the present invention include hydroquinone, resorcinol, 2-2 bis(hydroxyphenyl)propane, and the like. Further, the saturated polyester resin used in the present invention may contain polyfunctional units such as trimellitic acid units, pyromellitic acid units, trimethylolpropane units, and pentaerythritol units.
本発明に用いられるポリエステルはアルキレンテレフタ
レート繰返し単位を少なくとも20モル%以上、好まし
くは30モル%以上含存する飽和ポリエステル樹脂であ
る。特に好ましくはアルキレンテレフタレート単位は、
エチレンテレフタレート単位である。アルキレンテレフ
タレート単位が20モル%未膚では、硬化度の接着剤層
の耐溶剤性が悪く不都合である。本発明のポリエステル
樹脂の開存粘度はフェノール/1,1.2−テトラクロ
ルエタン−60/40(ffI量比)の混合溶液として
、30℃で0.2〜1 、5 dl/g、好ましくは0
.4〜0.7dl/gである。二種以上のポリエステル
樹脂を混合して使用することは本発明の好ましい歯様の
一つである。The polyester used in the present invention is a saturated polyester resin containing at least 20 mol% or more, preferably 30 mol% or more of alkylene terephthalate repeating units. Particularly preferably the alkylene terephthalate units are
It is an ethylene terephthalate unit. If the alkylene terephthalate unit is less than 20 mol%, the cured adhesive layer will have poor solvent resistance, which is disadvantageous. The opening viscosity of the polyester resin of the present invention is preferably 0.2 to 1.5 dl/g at 30°C as a mixed solution of phenol/1,1.2-tetrachloroethane-60/40 (ffI ratio). is 0
.. It is 4 to 0.7 dl/g. The use of a mixture of two or more types of polyester resins is one of the preferred embodiments of the present invention.
本発明に用いられるマレイミド樹脂とは、ビスマレイミ
ド類とジアミン化合物との反応物であり、該ビスマレイ
ミド類としては、N、N’−エチレンビスマレイミド、
N、N’−ヘキサメチレンビスマレイミド、N、N’−
m−フェニレンビスマレイミド、N、N’−p−フェニ
レンビスマレイミド、N、N’−4,4’−ジフェニル
メタンビスマレイミド、N、N’−4,4’−ジフェニ
ルエーテルビスマレイミド、N、N’−4,4’−ジフ
ェニルスル7オンビスマレイミド、N、N’−4,4’
−ジシクロヘキシルメタンビスマレイミド、N、N’−
α。The maleimide resin used in the present invention is a reaction product of bismaleimides and a diamine compound, and examples of the bismaleimides include N,N'-ethylene bismaleimide,
N,N'-hexamethylene bismaleimide, N,N'-
m-phenylene bismaleimide, N,N'-p-phenylene bismaleimide, N,N'-4,4'-diphenylmethane bismaleimide, N,N'-4,4'-diphenyl ether bismaleimide, N,N'- 4,4'-diphenylsul7one bismaleimide, N,N'-4,4'
-dicyclohexylmethane bismaleimide, N, N'-
α.
α’−4,4’−ジメチレンシクロヘキサンビスマレイ
ミド、N、N’−m−メタキシレンビスマレイミド、N
、N’−4,4’−ジフェニルシクロヘキサンビスマレ
イミドなどがあり、該ジアミン化合物としては、4.4
’−ジアミノジシクロヘキシルメタン、1.4−ジアミ
ノシクロヘキサン、2.6−ジアミツピリジン、m−フ
ェニレンジアミン、p−7エニレンジアミ7.4.4’
−ジアミノジフェニルメタン、2.2’−ビス(4−ア
ミノフェニル)フロパン、ベンジジン、4.4′−ジア
ミノフェニルオキシド、4.4’−ジアミノジフェニル
スルホン、ビス(4−アミノフェニル)メチルホスフィ
/オキシド、ビス(4−アミノフェニル)フェニルホス
フィンオキシト、ビス(4−7ミノフエニル)メチルア
ミン、1.5−ジアミノナフタレン、m−キシリレンジ
アミン、1.1−ビス(p−アミノフェニル)フラグ7
、p−キシリレンジアミン、ヘキサメチレンジアミン、
e、e’−ジアミン−2,2′−クビリジン、4.4’
−ジアミノベンゾフェノン、4.4’−ジアミノアゾベ
ンゼン、ビス(4−アミノフェニル)フェニルメタン、
1.1−ビス(4−7ミノフエニル)シクロヘキサン、
1.l−ビス(4−アミノ−8−メチルフェニル)シク
ロヘキサン、2.5−(m−アミノフェニル)−1,3
,4−オキサジアゾール、2.5−ビス(p−アミノフ
ェニル)−1,3,4−オキサジアゾール、2.5−ビ
ス(m−アミノフェニル)チアゾロ(4,5−d)チア
ゾール、5.5′−ジ(m−アミノフェニル)−(2,
2’)−ビス(1,3,4−オキサジアゾル)、4.4
’−ジアミノジフェニルエーテル、4.4’−ビス(p
−アミノフェ二ル)−2,2’−ジチアゾール、m−ビ
ス(4−p−アミノフェニル−2−チアゾリル)ベンゼ
ン、4.4’−ジアミノベンズアニリド、4.4’−ジ
アミノフェニルベンゾエート、N、N′−ビス(4−7
ミノベンジル)−p−フェニレンジアミン、4.4’−
メチレンビス(2−クロロアニリン)などがある。α'-4,4'-dimethylenecyclohexane bismaleimide, N, N'-m-methaxylene bismaleimide, N
, N'-4,4'-diphenylcyclohexane bismaleimide, etc., and examples of the diamine compound include 4.4
'-Diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diamitupyridine, m-phenylenediamine, p-7enylenediamine 7.4.4'
-diaminodiphenylmethane, 2,2'-bis(4-aminophenyl)furopane, benzidine, 4,4'-diaminophenyl oxide, 4,4'-diaminodiphenylsulfone, bis(4-aminophenyl)methylphosphine/oxide, bis (4-aminophenyl)phenylphosphine oxyto, bis(4-7minophenyl)methylamine, 1.5-diaminonaphthalene, m-xylylenediamine, 1.1-bis(p-aminophenyl) flag 7
, p-xylylene diamine, hexamethylene diamine,
e, e'-diamine-2,2'-cuviridine, 4.4'
-diaminobenzophenone, 4,4'-diaminoazobenzene, bis(4-aminophenyl)phenylmethane,
1.1-bis(4-7minophenyl)cyclohexane,
1. l-bis(4-amino-8-methylphenyl)cyclohexane, 2,5-(m-aminophenyl)-1,3
, 4-oxadiazole, 2.5-bis(p-aminophenyl)-1,3,4-oxadiazole, 2.5-bis(m-aminophenyl)thiazolo(4,5-d)thiazole, 5.5'-di(m-aminophenyl)-(2,
2')-bis(1,3,4-oxadiazole), 4.4
'-Diaminodiphenyl ether, 4,4'-bis(p
-aminophenyl)-2,2'-dithiazole, m-bis(4-p-aminophenyl-2-thiazolyl)benzene, 4,4'-diaminobenzanilide, 4,4'-diaminophenylbenzoate, N, N'-bis(4-7
minobenzyl)-p-phenylenediamine, 4.4'-
Examples include methylenebis(2-chloroaniline).
又、本発明でいうマレイミド変性樹脂とは、ビスマレイ
ミド類とトリアジン樹脂の2成分を主成分とする分子内
にイミド基を存する高耐熱性付加重金形熱硬化性樹脂、
あるいはビスマレイミド類ニエボキシ化合物を組み合せ
た熱硬化性樹脂である。該樹脂の具体的例としては、B
Tレジン(三菱瓦斯化学株式会社商品名)、イミダロイ
ル(東芝ケミカル株式会社商品名)などが挙げられる。In addition, the maleimide-modified resin as used in the present invention refers to a highly heat-resistant addition heavy metal type thermosetting resin containing an imide group in the molecule, which is mainly composed of two components: bismaleimide and triazine resin.
Alternatively, it is a thermosetting resin in which a bismaleimide nieboxyl compound is combined. Specific examples of the resin include B
Examples include T-resin (trade name of Mitsubishi Gas Chemical Co., Ltd.) and imidaloyl (trade name of Toshiba Chemical Co., Ltd.).
本発明の飽和ポリエステル樹脂(a)、マレイミド樹脂
及び/又はマレイミド変性樹11M(b)の混合重量比
は、全樹脂組成物に対して(a)85〜40重量%、(
b)15〜60重量%である。飽和ポリエステル樹脂(
a)が85重量%より多いと耐熱性が低下し好ましくな
い。一方、40重量%より多くないと皮膜が硬(なり可
撓性が低下し好ましくない。マレイミド樹脂及び又はマ
レイミド変性樹脂(b)が60重量%より多いと耐熱性
は向上するが皮膜が硬くなり可撓性が低下し好ましくな
い、一方、15111ffi%より少ないと耐熱性が低
下し好ましくない。The mixing weight ratio of the saturated polyester resin (a), maleimide resin and/or maleimide modified resin 11M (b) of the present invention is 85 to 40% by weight of (a) to the total resin composition, (
b) 15-60% by weight. Saturated polyester resin (
When a) is more than 85% by weight, heat resistance decreases, which is not preferable. On the other hand, if the amount is less than 40% by weight, the film becomes hard (and flexibility decreases, which is undesirable). If the amount of maleimide resin and/or maleimide-modified resin (b) is more than 60% by weight, heat resistance improves, but the film becomes hard. Flexibility decreases, which is undesirable. On the other hand, if it is less than 15111ffi%, heat resistance decreases, which is undesirable.
本発明において、その成分中に硬化剤としてエポキシ樹
脂及び又は同変性樹脂を添加してもよい。In the present invention, an epoxy resin and/or the same modified resin may be added as a curing agent to the components.
本発明におけるエポキシ樹脂は、分子内に少なくとも2
個以上のエポキシ基を作するエポキシ樹脂であればどん
なエポキシ樹脂でも用いられるが、好適な例としてビス
7′エノール型エポキシ樹脂及びそのハロゲノ化物、ノ
ボラック型エポキシ樹脂などのグリシジルエーテル型、
あるいは芳香族型エポキシ樹脂、環吠脂肪族型エポキシ
樹脂などのエステル型、あるいはグリシジルエステル型
、さらにはグリシジルアミン型などのものがある。とり
わけ好適なものはビスフェノールA型およびノボラック
型エポキシ樹脂などが挙げられる。The epoxy resin in the present invention has at least two
Any epoxy resin can be used as long as it forms 3 or more epoxy groups, but suitable examples include bis7'enol type epoxy resin and its halogenated product, glycidyl ether type such as novolac type epoxy resin,
Alternatively, there are ester types such as aromatic epoxy resins and cycloaliphatic epoxy resins, glycidyl ester types, and glycidyl amine types. Particularly preferred are bisphenol A type and novolac type epoxy resins.
又、エポキシ変性樹脂とは、エポキシ環と反応する化合
物をあらかじめエポキシ樹脂と反応すせた物であり、代
表例としてエポキシ樹脂とフェノール樹脂との反応物、
エポキシ樹脂とアミン化合物との反応物、エポキシ樹脂
とアクリル酸との反応物などがある。In addition, epoxy modified resin is a compound that reacts with an epoxy resin in advance with a compound that reacts with an epoxy ring, and typical examples include a reaction product of an epoxy resin and a phenol resin,
There are reaction products of epoxy resin and amine compound, reaction products of epoxy resin and acrylic acid, etc.
本発明において、飽和ポリエステル樹脂とマレイミド樹
脂及又はマレイミド変性樹脂との硬化は、加熱により硬
化することに加え、紫外線照射および電子線照射でも充
分に硬化し、その硬化物は耐熱性(耐半田性)、耐薬品
性、電気絶縁性などの性能に優れているという特徴を存
し、これらが「俟ってプリント回路板用に適した耐熱性
フィルムとしての要求性能を滴定するのにあずか−でい
る。In the present invention, the saturated polyester resin and maleimide resin or maleimide-modified resin are cured not only by heating but also by ultraviolet irradiation and electron beam irradiation, and the cured product has heat resistance (solder resistance). ), has excellent properties such as chemical resistance, and electrical insulation properties, and these characteristics are useful in determining the required performance as a heat-resistant film suitable for printed circuit boards. There is.
本発明において、加熱により硬化する場合、その硬化反
応を促進させるために、硬化触媒を添加してもよい、硬
化触媒としては、トリエチレンジアミン、N、N’−ジ
メチルベンジルアミン、N−メチルモリホリン、トリー
nブチルアミン、N。In the present invention, when curing by heating, a curing catalyst may be added to promote the curing reaction. Examples of the curing catalyst include triethylenediamine, N,N'-dimethylbenzylamine, and N-methylmorpholine. , tri-n-butylamine, N.
N 、N ’、N ’−テトラメチルブタンジアミンな
どの第3級アミン類、2−メチルイミダゾール、2−ア
ンデシルイミダゾール、2−7エ二ルイミダゾール、2
−エチル4−メチルイミダゾールなどのイミダゾール類
、0′機金属塩類であるオクチル酸亜鉛、オクチル酸ス
ズなどのオクチル酸亜鉛、ナフテン酸コバルトなどのナ
フテン酸金属地、アセチルアセトン鉄、アセチルアセト
ン銅などのアセチルアセトン金刷塩、ステアリン酸金属
塩、ブチルチタネート、プロピルアルミニウムなど、更
に四塩化物、ジクミルパーオキサイド、過酸化べ/ノイ
ル、t−ブチルヒドロパーオキサイド、シクロヘキサノ
ンパーオキサイド、デカノイルパーオキサイド、ジイン
プロピルパーオキシジカーボネートなどの打機過酸化物
、鉄、亜鉛などの金属粉が挙げられ、単独又は2種以上
併用して使用することもできる。Tertiary amines such as N,N',N'-tetramethylbutanediamine, 2-methylimidazole, 2-andecylimidazole, 2-7 enylimidazole, 2
- Imidazoles such as ethyl 4-methylimidazole, 0' metal salts such as zinc octylate, zinc octylate such as tin octylate, metal naphthenates such as cobalt naphthenate, acetylacetone gold such as iron acetylacetone and copper acetylacetone. Printing salt, metal stearate, butyl titanate, propyl aluminum, etc., as well as tetrachloride, dicumyl peroxide, be/noyl peroxide, t-butyl hydroperoxide, cyclohexanone peroxide, decanoyl peroxide, diimpropyl peroxide, etc. Examples include peroxide peroxide such as oxydicarbonate, and metal powders such as iron and zinc, which may be used alone or in combination of two or more.
本発明の樹脂組成物は溶剤で稀釈した形で、合成樹脂フ
ィルム(又はシート)や金li!I箔上にコートされる
。飽和ポリエステル樹脂(&)、マレイミド樹脂及び又
はマレイミド変性樹脂(b)からなる樹脂固形分の合計
量が5〜aoim%になる様に溶媒で稀釈する。The resin composition of the present invention can be used in a synthetic resin film (or sheet) or gold li! diluted with a solvent. Coated on I foil. It is diluted with a solvent so that the total amount of resin solids consisting of saturated polyester resin (&), maleimide resin and/or maleimide modified resin (b) becomes 5 to aoim%.
本発明に用いられる溶媒はメチルエチルケトン、メチル
インブチルケトン、シクロヘキサンなどのケトン類、酢
酸エチル、酢酸ブチルなどのエステル類、トルエン、キ
シレンなどのエステル類、トルエン、キシレンなどの炭
化水素類、塩化メチレン、1,1.1−)リクロルエタ
ンなどのハロゲン化炭化水素類、ジオキサン、テトラヒ
ドロフランなどのエーテル類、ニトロエタン、ニトロメ
タンなどのニトロ化炭化水素類、その他、セロソルブア
セテートなどのエーテルエステル類が用いられるが、特
に限定しない。これらの溶剤は一種又二種以上を使用す
ることができる。合成樹脂フィルム(又はトシート)や
金属道上へのコーティングは通常のディップ、スプレー
、グラビアコーティング、ロールコーティングなどを適
用することができる。コート厚みは、通常1〜200μ
m1好ましくは10〜100μmで、コーティング御莞
燥し、溶媒を除去するが、莞燥温度は室温〜160℃、
好ましくは50〜120℃、時間は数秒〜15分、好ま
しくは10〜60秒である。Solvents used in the present invention include ketones such as methyl ethyl ketone, methyl imbutyl ketone, and cyclohexane, esters such as ethyl acetate and butyl acetate, esters such as toluene and xylene, hydrocarbons such as toluene and xylene, methylene chloride, 1,1.1-) Halogenated hydrocarbons such as lychloroethane, ethers such as dioxane and tetrahydrofuran, nitrated hydrocarbons such as nitroethane and nitromethane, and ether esters such as cellosolve acetate are used, but in particular Not limited. These solvents can be used alone or in combination of two or more. Coating on the synthetic resin film (or sheet) or metal track can be done by conventional dip, spray, gravure coating, roll coating, etc. Coat thickness is usually 1-200μ
m1 is preferably 10 to 100 μm, the coating is dried and the solvent is removed, and the drying temperature is room temperature to 160 ° C.
Preferably the temperature is 50 to 120°C, and the time is several seconds to 15 minutes, preferably 10 to 60 seconds.
乾燥後、室温〜50℃、30〜90%R1+で、シーズ
ンユング後、硬化反応を行うのが好ましいが、限定され
る訳ではない。硬化条件は、120〜160℃で数秒〜
数分、好ましくは30秒〜1分であり、更に50〜16
0℃で、ポストキュアーを行うことも出来る。屹燥硬化
条件は、使用する溶媒、共存する水の量、硬化触媒、被
着材の種類などによって適宜選択すればよい。After drying, a curing reaction is preferably carried out at room temperature to 50° C. and 30 to 90% R1+ after seasoning, but is not limited thereto. Curing conditions are 120-160℃ for a few seconds.
Several minutes, preferably 30 seconds to 1 minute, and more preferably 50 to 16 minutes
Post-curing can also be performed at 0°C. Drying and curing conditions may be appropriately selected depending on the solvent used, the amount of coexisting water, the curing catalyst, the type of adherend, etc.
又、光照射はそれ自体公知の方法で行うことが出来、光
源として、例えば高圧水銀灯、低圧水銀灯、キセノンラ
ンプ、太陽光線などを使用と、通常その波長が200〜
400nmの紫外I!(特に好ましくは310〜400
nm)が好ましいが、他の電磁波も同様に利用出来る。In addition, the light irradiation can be performed by a method known per se. When using a high-pressure mercury lamp, a low-pressure mercury lamp, a xenon lamp, sunlight, etc. as a light source, the wavelength is usually 200~200 nm.
400nm ultraviolet I! (Particularly preferably 310 to 400
nm) is preferred, but other electromagnetic waves can be used as well.
本発明の光照射の条件即ち照射時間、照射雰囲気などに
ついては、特に制限はない。照射強度は通常約10〜2
.000w/s/、好ましくは500〜1,000w
/ dであり、照射時間は製品として要求される物性に
より、0.1秒から30分間で適当に決めることか出来
る。酸素雰囲気下でも、その程、本発明の架橋及び/又
は高分子量化反応は阻害されていない。照射効率から云
えば照射前の成形物のガラス移転m度以上、融点以下の
温度で実施することが好ましい。There are no particular limitations on the conditions for light irradiation in the present invention, ie, the irradiation time, irradiation atmosphere, etc. Irradiation intensity is usually about 10-2
.. 000w/s/, preferably 500-1,000w
/d, and the irradiation time can be appropriately determined from 0.1 seconds to 30 minutes depending on the physical properties required for the product. Even under an oxygen atmosphere, the crosslinking and/or polymerization reactions of the present invention are not inhibited to that extent. In terms of irradiation efficiency, it is preferable to conduct the irradiation at a temperature that is at least m degrees and below the melting point of the glass transition of the molded product before irradiation.
その他の硬化方法として電子線照射方法がある、電子線
照射k Hとしては、エレクトロカーテン方式およびエ
レクトロスキャンニング方式、照射雰囲気として空気中
および不活性ガス中が使用されているが、いずれもそれ
に限定されるものではない、照射条件としては、加速電
圧100〜750KVで好ましくは150〜300KV
、照射amは0 、I KV〜500 Mradで好ま
しくは2〜2004radである。Other curing methods include electron beam irradiation, and electron beam irradiation methods include the electrocurtain method and electroscanning method, and the irradiation atmosphere used is air or inert gas, but these methods are limited to these methods. The irradiation conditions are an acceleration voltage of 100 to 750 KV, preferably 150 to 300 KV.
, the irradiation am is 0, I KV to 500 Mrad, preferably 2 to 2004 rad.
本発明において、紫外線照射により硬化する場合、その
光重合反応を促進させるために、光開始剤を添加するこ
とができる。具体的例としては、ベンジルジメチルケタ
ールなどのケタール類、ベンゾインメチルエーテル、ベ
ンゾインエチルエーテル、ベンゾイン−1−プロピルエ
ーテル、ベンゾイン、α−メチルベンゾインなどのベン
ゾイン[,9,10−アントラキノン、1−クロルアン
トラキノン、2−クロルアントラキノ/、2−エチルア
ントラキノンなどのアントラキノ7類、ベンゾフェノン
、p−クロルベンゾフェノン、p−ジメチルアミノベン
ゾフェノンなどのべ/ゾフエノ7類、1−フェニル−2
−ヒドロキシ−2−メチル−1−プロピオン、1−(4
−イソプロピルフェニル)−2−ヒドロキシ−2−メチ
ル−1−プロピオンなどのプロピオ7エ/7類、ジベ/
シスベロアなどのスベロン類、ジフェニルジスルフィド
、テトラメチルチウラムジスルフィド、チオキサ7トン
などの含イオウ化合物、メチレンブルー、エオシン、フ
ルオレセインなどの色素類などがあげられ、単独または
2社以上併用して使用される。In the present invention, when curing by ultraviolet irradiation, a photoinitiator can be added to accelerate the photopolymerization reaction. Specific examples include ketals such as benzyl dimethyl ketal, benzoin methyl ether, benzoin ethyl ether, benzoin-1-propyl ether, benzoin, benzoin such as α-methylbenzoin, 9,10-anthraquinone, 1-chloroanthraquinone, etc. , 2-chloroanthraquino/, 7 anthraquinos such as 2-ethylanthraquinone, 7 be/zophenones such as benzophenone, p-chlorobenzophenone, p-dimethylaminobenzophenone, 1-phenyl-2
-Hydroxy-2-methyl-1-propion, 1-(4
-isopropylphenyl)-2-hydroxy-2-methyl-1-propion, etc.
Examples include suberones such as cisvelor, sulfur-containing compounds such as diphenyl disulfide, tetramethylthiuram disulfide, and thioxa 7ton, and pigments such as methylene blue, eosin, and fluorescein, and these may be used alone or in combination of two or more companies.
なお、樹脂組成物中には、本発明の性能を損わない範囲
内で、滑剤(シリカ、タルク、シリコーンなど)、接着
促進剤、難燃剤(ハロゲン化合物、リン化合物、水酸化
アルミニウム、三酸化アンチモン等)、安定剤(酸化防
止剤、紫外線吸収剤、重合禁止剤等) 、1111M剤
(シリコーン系、弗素系、無機系)、メッキ活性化剤、
その他無機、を機充填剤(タルク、酸化チタン、gB素
素子ポリマー微粒子顔料、染料、炭化カルシウムなど)
を添加してもよい。The resin composition may contain lubricants (silica, talc, silicone, etc.), adhesion promoters, flame retardants (halogen compounds, phosphorus compounds, aluminum hydroxide, trioxide, etc.) within a range that does not impair the performance of the present invention. antimony, etc.), stabilizers (antioxidants, ultraviolet absorbers, polymerization inhibitors, etc.), 1111M agents (silicone-based, fluorine-based, inorganic-based), plating activators,
Other inorganic and organic fillers (talc, titanium oxide, gB element polymer fine particle pigments, dyes, calcium carbide, etc.)
may be added.
更に、本発明の樹脂組成物を、織布又は不織布に含浸し
、屹燥させた後硬化させた織布又は不織布は、耐熱性に
優れ、寸法変化率の低いフレキシブルプリント回路板用
耐熱シートとして利用することができる。ここで用いら
れる耐熱性織布又は不織布は耐熱性繊維編織物、不織布
又は紙を使用する。ガラスクロス、カーボン繊維、芳香
族ポリアミド繊維、セルロースペーパー、カラスベーパ
ーなどから製造された補強材が使用され、これらの厚さ
としては10μ〜1 airsであり、好ましくは20
〜100μ、特に好ましくは30〜60μである。Furthermore, a woven or nonwoven fabric obtained by impregnating the resin composition of the present invention into a woven or nonwoven fabric, drying it, and then curing it can be used as a heat-resistant sheet for flexible printed circuit boards that has excellent heat resistance and a low dimensional change rate. can be used. The heat-resistant woven fabric or non-woven fabric used here is a heat-resistant fiber knitted fabric, non-woven fabric, or paper. A reinforcing material made of glass cloth, carbon fiber, aromatic polyamide fiber, cellulose paper, glass vapor, etc. is used, and the thickness of these materials is 10 μm to 1 airs, preferably 20 μm.
-100μ, particularly preferably 30-60μ.
(作 用)
本発明の耐熱性フィルムは、ポリエステルl Ml成分
を基本としているが、その成分中にイミド基を育する高
耐熱性成分が存在するために、従来のポリエステルフィ
ルムにはない高度な耐熱性を発揮するのである。(Function) The heat-resistant film of the present invention is based on a polyester lMl component, but because it contains a highly heat-resistant component that grows imide groups, it has a high degree of sophistication that conventional polyester films do not have. It exhibits heat resistance.
その上、可撓性に優れているため、高度な耐熱性を要求
されるフレキシブル回路板用やカバーレイフィルム用の
耐熱フィルムに好適な材料となりうるのである。Moreover, since it has excellent flexibility, it can be a suitable material for heat-resistant films for flexible circuit boards and coverlay films that require a high degree of heat resistance.
(実施例)
本発明を更に具体的に説明するため以下に実施例をあげ
るが、勿論、本発明はこれらの実施例によって何ら限定
されるものではない。なお、実施例及び比較例例中に部
とあるのは′重量部を意味する。(Examples) In order to explain the present invention more specifically, Examples are given below, but of course the present invention is not limited to these Examples in any way. In the Examples and Comparative Examples, parts refer to parts by weight.
表−1、表−2に示したように、実施例1〜4、比較例
1〜3の樹脂組成物、それぞれ50重量%溶液(但し、
溶媒としてメチルエチルケト// )ルzン=40/
60 (injl比) ) ヲ、100μm厚味のポリ
エステルフィルム上に、就燥後の塗布厚が20〜30μ
mになる様にワイヤーバーでコートした。次いで100
℃×5分間乾燥・硬化させ、相当するフィルムをポリエ
ステルフィルムから剥し、更にこのフィルムを130℃
で10時時間開ポストキュアーを行なった。得られたフ
ィルムについて各種の試験を行なった。As shown in Table-1 and Table-2, the resin compositions of Examples 1 to 4 and Comparative Examples 1 to 3 were each 50% by weight solution (however,
Methyl ethyl keto// as solvent = 40/
60 (injl ratio)) On a 100 μm thick polyester film, the coating thickness after drying is 20 to 30 μm.
It was coated with a wire bar so that it became m. then 100
After drying and curing for 5 minutes at ℃, the corresponding film was peeled off from the polyester film, and this film was further heated at 130℃.
We held a post-cure session at 10am. Various tests were conducted on the obtained film.
その結果を表−3に示す。The results are shown in Table-3.
表−3より、比較例では耐半田ゴテ性あるいは耐折性に
優れたものはないが、本発明のものはこれら全てに優れ
ていることがわかる。From Table 3, it can be seen that none of the comparative examples had excellent soldering iron resistance or folding durability, but the products of the present invention were excellent in all of these.
表 −1
京l) 三菱瓦斯化学社BT3109(ビスマレイミF
・トリ7ジンフレンド樹脂)本2) 東部化成社 エボ
トートYDl1400(ビスフェノールAm臭素化エポ
キシ樹IIり京3)四国化成社 キュy′)−に、
、 Z(イミタリール化合物)表 −2
1) 略号は次の酸又はグリコールの残基を示す。Table 1) Mitsubishi Gas Chemical Company BT3109 (Bismaleimi F
・Tori 7 Jin Friend Resin) Book 2) Tobu Kasei Co., Ltd. Evototo YDl1400 (Bisphenol Am Brominated Epoxy Tree II Rikyo 3) Shikoku Kasei Co., Ltd.
, Z (Imitaryl Compound) Table-2 1) Abbreviations indicate the following acid or glycol residues.
T:テレフタル酸 ■:イソフクル酸
C:セバチン酸 E:エチレングリコールN:ネオベ
ンチルグリコール
2 開存粘度:フェノール/1,1,2.2−テトラク
ロルエタン=f30/40 (重n比)中30℃で測定
表 −3
(注)1)JIS C6481により260℃X20
秒でテスト。T: Terephthalic acid ■: Isofucric acid C: Sebacic acid E: Ethylene glycol N: Neobentyl glycol 2 Patent viscosity: Phenol/1,1,2.2-tetrachloroethane = f30/40 (weight n ratio) Measurement table at 30℃ -3 (Note) 1) 260℃X20 according to JIS C6481
Test in seconds.
異常のないものを01何らかの外観変化を生じたものを
×とした。Those with no abnormality were rated 0, and those with some change in appearance were rated x.
2コテ先面積82.7■−1(接触面はフラットで、楕
円形の半田ゴテを用い、350℃×10秒間軽(接触さ
せ、異常のないものを01フイルムが溶融したものをX
とした。2 Soldering iron tip area 82.7■-1 (contact surface is flat, use an oval soldering iron, lightly contact at 350°C for 10 seconds, and if there is no abnormality, melt the 01 film)
And so.
3)JIS 8115 MIT法、R=0.381
、荷重500gでテスト。1000回以上を01以下を
Xとした。3) JIS 8115 MIT method, R=0.381
, tested with a load of 500g. 1000 times or more is 01 or less is X.
(発明の効果)
本発明によれば、260℃異常の半田浴、350℃異常
の手半田や熱圧着に耐えつるフレキシブルプリント回路
板やカバーレイフィルムとして用いるに適した耐熱性フ
ィルムを提供できる。(Effects of the Invention) According to the present invention, it is possible to provide a heat-resistant film suitable for use as a flexible printed circuit board or a coverlay film that can withstand a soldering bath at an abnormal temperature of 260° C., manual soldering at an abnormal temperature of 350° C., and thermocompression bonding.
Claims (1)
モル%含有する飽和ポリエステル樹脂(a)マレイミド
樹脂及び/又はマレイミド変性樹脂(b)とを、各々全
樹脂組成物に対して(a)85〜40重量%、(b)1
5〜60重量%含有する反応生成物から成ることを特徴
とする耐熱性フィルム。At least 20 alkylene terephthalate repeating units
Saturated polyester resin containing (a) maleimide resin and/or maleimide-modified resin (b) in mol%, respectively (a) 85 to 40% by weight, (b) 1
A heat-resistant film comprising a reaction product containing 5 to 60% by weight.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5144087A JPS63218757A (en) | 1987-03-05 | 1987-03-05 | Heat-resistant film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5144087A JPS63218757A (en) | 1987-03-05 | 1987-03-05 | Heat-resistant film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63218757A true JPS63218757A (en) | 1988-09-12 |
Family
ID=12886986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5144087A Pending JPS63218757A (en) | 1987-03-05 | 1987-03-05 | Heat-resistant film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63218757A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0497282A2 (en) * | 1991-01-31 | 1992-08-05 | Unitika Ltd. | Light-weight polyester film and process for its production |
-
1987
- 1987-03-05 JP JP5144087A patent/JPS63218757A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0497282A2 (en) * | 1991-01-31 | 1992-08-05 | Unitika Ltd. | Light-weight polyester film and process for its production |
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