JPS63218143A - Trace element analysis and equipment therefor - Google Patents
Trace element analysis and equipment thereforInfo
- Publication number
- JPS63218143A JPS63218143A JP62052410A JP5241087A JPS63218143A JP S63218143 A JPS63218143 A JP S63218143A JP 62052410 A JP62052410 A JP 62052410A JP 5241087 A JP5241087 A JP 5241087A JP S63218143 A JPS63218143 A JP S63218143A
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- discharge gas
- gas
- ions
- cooler
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004458 analytical method Methods 0.000 title claims abstract description 31
- 239000011573 trace mineral Substances 0.000 title claims abstract description 12
- 235000013619 trace mineral Nutrition 0.000 title claims abstract description 12
- 150000002500 ions Chemical class 0.000 claims abstract description 34
- 238000001816 cooling Methods 0.000 claims abstract description 9
- 239000012535 impurity Substances 0.000 claims description 16
- 238000001036 glow-discharge mass spectrometry Methods 0.000 claims description 4
- 238000001819 mass spectrum Methods 0.000 abstract description 8
- 238000004949 mass spectrometry Methods 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 44
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000001228 spectrum Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000003595 spectral effect Effects 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 3
- 235000011089 carbon dioxide Nutrition 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001793 charged compounds Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000013517 stratification Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は、たとえば半導体、金属、セラミックス等にお
ける微潰元素の分析の改良に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to improvements in the analysis of microscopic elements in, for example, semiconductors, metals, ceramics, and the like.
［従来技術］
微量元素分析、例えばグロー放電質量分析においては、
分析試料を電極とし、アルゴンガス等の放電用ガスによ
り低圧放電を発生さＵ、数百ｅＶのエネルギーで試料を
スパッタする。スパッタされた原子は放電領域内でイオ
ン化されろ。こうして得られたイオンを放電領域から引
出し、高分解能の質量分析計に導きイオンを検出し、質
量分析を行なう。このようなグロー放電質ｆ？に分析に
使用する分析装置の一例の概要を第２図に示す。第２図
において、質全分析装置は、成層用ガスポンベ１、グロ
一枚重を発生させろ放電室２、牧爪用ガス配管３、なら
びに質量分析計の構成要素である電磁石４、静１−［分
析器５及びイオン検出器６を存する。放４用ガスボンベ
から供給される放電用ガスとしては、例えば、高純度リ
ザーヂクレードのアルゴンガスが使用されるが、このよ
うな高純度アルゴンガスの不純物及び純度の一例を第１
表に示す。[Prior art] In trace element analysis, for example glow discharge mass spectrometry,
Using the analysis sample as an electrode, a low-pressure discharge is generated using a discharge gas such as argon gas, and the sample is sputtered with an energy of several hundred eV. The sputtered atoms become ionized within the discharge region. The ions thus obtained are extracted from the discharge region and introduced into a high-resolution mass spectrometer to detect the ions and perform mass spectrometry. Such glow discharge quality f? Fig. 2 shows an outline of an example of an analyzer used for the analysis. In FIG. 2, the total quality analyzer includes a gas pump for stratification 1, a discharge chamber 2 for generating a single layer of gas, a gas pipe for makizume 3, and an electromagnet 4, which is a component of the mass spectrometer, and a static 1-[ There is an analyzer 5 and an ion detector 6. As the discharge gas supplied from the discharge gas cylinder, for example, high purity reservoir grade argon gas is used.
Shown in the table.
第 １ 表
このように、高純度アルゴンガスでさえも不純物を含む
ので、微量元素分析を行う場合においては、以下のよう
な不都合が生じることかあった。Table 1 As described above, even high-purity argon gas contains impurities, so when performing trace element analysis, the following problems may occur.
グロー放電質量分析においては、分析試料からスパッタ
された原子のイオン以外に多量の放電用ガスイオン、残
留ガスイオン、放電にさらされる試料以外の周辺材料、
例えば、分析試料保持部に使用する絶縁治具のｒ） Ｔ
Ｉ？’ Ｅ （ポリテトラフルオ［ｌエヂレン）材料
からスパッタされた原子のイオン、さらにはこれらの複
合イオンが生成する。そして、これらイオンの質量スペ
クトルが対象とする質量スペクトルの近傍に妨害スペク
トルとして出現することがあるので、スペクトルの分離
が不能となったり、またたとえある程度の分離ができた
としても対象とする質量スペクトルが大きな妨害スペク
トルのすそに位置し、分析のバックグラウンドレベルを
上昇させるという、微量元素分析上致命的な問題が発生
する。In glow discharge mass spectrometry, in addition to the atomic ions sputtered from the analysis sample, a large amount of discharge gas ions, residual gas ions, surrounding materials other than the sample exposed to the discharge,
For example, r) T of the insulating jig used for the analysis sample holding part.
I? Ions of atoms sputtered from the E (polytetrafluoro[l-ethylene) material, as well as composite ions thereof, are generated. Since the mass spectra of these ions may appear as interference spectra near the target mass spectrum, it may become impossible to separate the spectra, or even if a certain degree of separation is possible, the target mass spectrum may appear as an interference spectrum. is located at the base of a large interference spectrum, raising the background level of analysis, which poses a fatal problem in trace element analysis.
第３図、第４図及び第５図は、従来のグロー放電質量分
析において得られた質量スペクトル例を示す図面である
。FIG. 3, FIG. 4, and FIG. 5 are drawings showing examples of mass spectra obtained in conventional glow discharge mass spectrometry.
第３図は、ＧａＡｓ中の微量Ｃｒの分析において、Ｃｒ
の質量スペクトルがＡｒＣのスペクトル妨害を受けてい
る状態を示す。対象とするＣｒの濃度レベルが低いほど
、見かけ上のＡｒＣのスペクトル妨害が大きくなること
は言うまでもない。Figure 3 shows the analysis of trace amounts of Cr in GaAs.
This shows that the mass spectrum of is subjected to spectral interference by ArC. It goes without saying that the lower the target Cr concentration level, the greater the apparent ArC spectral interference.
第４図は、ＧａＡｓ中の微量Ｓｉの分析において、Ｓｉ
の質量スペクトルかＣＯのスペクトル妨害を受けている
状態を示す。Figure 4 shows the analysis of trace amounts of Si in GaAs.
This shows that the mass spectrum of CO is affected by spectral interference of CO.
第５図は、ＧａＡｓ中の微Ｗｆｋ Ｆ ｅの分析におい
て、Ｆｃの質量スペクトルがＡｒＯのスペクトル妨害を
受けている状態を示す。FIG. 5 shows a state in which the mass spectrum of Fc is subjected to spectral interference by ArO in the analysis of fine Wfk Fe in GaAs.
このように、従来の微量元素分析においては、放電用ガ
スに不純物が含まれているので、この不純物か原因とな
って、スペクトルのパックグラウンドとなるイオンの生
成を生じさせるという問題があった。As described above, in conventional trace element analysis, since the discharge gas contains impurities, there is a problem in that these impurities cause the generation of ions that become a background in the spectrum.
［発明の目的コ
本発明の目的は、放電用ガス中の不純物が低減されてお
り、対象元素のスペクトルのバンクグラウンドとなるイ
オンの生成が低減されている微４１元素分析を提供４−
ることにある。[Objective of the Invention] The object of the present invention is to provide a fine 41 element analysis in which impurities in the discharge gas are reduced and the generation of ions that become the background of the spectrum of the target element is reduced.
There are many things.
Ｌ発明の構成］
上記問題は、放電用ガスを冷却して放電用ガス中の不純
物を低減した後、放電用ガスを放電室に導入し、枚重室
内で分析試料のイオン化を生じさせ、生成イオンを質量
分析計に導入し、イオン検出を行うことを特徴とする微
単元素分析法によって解決される。Structure of the Invention] The above problem is solved by introducing the discharge gas into the discharge chamber after cooling the discharge gas to reduce impurities in the discharge gas, causing ionization of the analysis sample in the stacking chamber, and generating This problem is solved by a micro-single-element analysis method that is characterized by introducing ions into a mass spectrometer and detecting the ions.
そのような分析法は、放電用ガス供給源、放電用ガスを
冷却する冷却器、放電室および質量分析計をｉする微量
元素分析装置であって、放電用ガス供給源と放電室とが
冷却器を介して放電用ガス配管により接続されているこ
とを特へとする微量元素分析装置によって行うことがで
きる。Such an analysis method involves a trace element analyzer that includes a discharge gas supply source, a cooler for cooling the discharge gas, a discharge chamber, and a mass spectrometer, in which the discharge gas supply source and the discharge chamber are cooled. This can be carried out using a trace element analyzer that is particularly connected to a discharge gas pipe through a gas analyzer.
放電用ガスの冷却温度は、−１０℃以下、好ましくは一
８０°Ｃ以下であれば充分な効果を与えるが、放電用ガ
スの凍結等の放電用ガスの゛放電室への供給に支１ぐの
生じない範囲で、できる限り低い温度であることか好ま
しい。放電用ガスの冷却は、例えば、放電用ガス供給源
と放１１室とを接続゛Ｐる改組用ガス配管を冷却器で冷
却４゛ることにより行える。冷却器と放電室との間の放
電用ガス配管長はできる限り短いことが好ましく、通常
、１１以下である。The cooling temperature of the discharge gas should be -10°C or lower, preferably -80°C or lower, to provide a sufficient effect, but it may be difficult to supply the discharge gas to the discharge chamber, such as freezing the discharge gas. It is preferable that the temperature be as low as possible without causing any damage. The discharge gas can be cooled, for example, by cooling the reconfigured gas pipe connecting the discharge gas supply source and the discharge chamber 11 with a cooler. The length of the discharge gas piping between the cooler and the discharge chamber is preferably as short as possible, and is usually 11 or less.
本発明において、放電ガス中の不純物及び放電用ガス配
管からの不純物が冷却によりトラップされるので、放電
室内への不純物混入が低減され、不純物による分析障害
は大幅に低減される。In the present invention, since impurities in the discharge gas and impurities from the discharge gas piping are trapped by cooling, contamination of impurities into the discharge chamber is reduced, and analysis interference due to impurities is significantly reduced.
［発明の好ましい態様］
第１図は、本発明の分析装置の一具体例の概要を示す図
である。この分析装置は、放電用ガスボンベｌと放電室
２の間に冷却器７を有し、更にバルブ８及び真空ポンプ
９を有する。冷却器７は、例えば、−８０℃までの冷凍
能力を有しており±５℃以内の変動で温度設定可能であ
る市販の冷却器であってよい。[Preferred Embodiment of the Invention] FIG. 1 is a diagram showing an outline of a specific example of the analyzer of the present invention. This analyzer has a cooler 7 between a discharge gas cylinder 1 and a discharge chamber 2, and further includes a valve 8 and a vacuum pump 9. The cooler 7 may be, for example, a commercially available cooler that has a refrigerating capacity up to -80°C and can set the temperature within ±5°C.
また、より簡便な冷却器としてデユワ−びんの中にアセ
トンとドライアイスを共存させる冷却器も使用可能であ
る。このような簡便な冷却器の温度は一７５℃程度であ
る。但し、長時間運転の場合に、適宜ドライアイスを補
給する必要がある。Furthermore, as a simpler cooler, it is also possible to use a cooler in which acetone and dry ice coexist in a dewar bottle. The temperature of such a simple cooler is about -75°C. However, when operating for a long time, it is necessary to replenish dry ice as appropriate.
この分析装置を運転させる場合に、バルブ８ａ、８ｃ及
び８ｄを開きバルブ８ｂを閉じた状態で、放電用ガスを
ボンベｌから供給し冷却器７により冷却して放電室２に
導入し、放電室内を放電用ガスで置換する。次いで、バ
ルブ８ｃを閉じバルブ８ｂを開き、予め運転しておいた
真空ポンプにより放電室内を減圧する。この後、グロー
放電によりイオン化を生じさせ、生成イオンを質ｍ分析
計に導入し、イオンを検出し、質量分析を行う。When operating this analyzer, with valves 8a, 8c, and 8d open and valve 8b closed, discharge gas is supplied from cylinder l, cooled by cooler 7, and introduced into discharge chamber 2. Replace with discharge gas. Next, the valve 8c is closed and the valve 8b is opened, and the pressure inside the discharge chamber is reduced by the vacuum pump that has been operated in advance. Thereafter, ionization is caused by glow discharge, and the generated ions are introduced into a mass spectrometer, where the ions are detected and subjected to mass spectrometry.
実施例１及び２ならびに比較例１
第１図に示すような分析装置を使用して、質量分析を行
った。グロー放電用ガスとしてはアルゴンガス（リサー
チグレード）、分析サンプルとしては高純度のＧａＡｓ
結晶を用いた。冷却器７として市販の冷却器を用い、設
定温度を一８０℃とした場合（実施例１）と、冷却器７
としてデユワ−びんの中にアセトンとドライアイスを共
存させたしのを用いた（冷却温度ニー６５〜−７０℃）
場合（実施例２）について、放電室２内で生成したイオ
ン強度を測定した。第２図の装置を使用する（冷却なし
）従来の分析法（比較例りによっても、同様にイオン強
度を測定した。結果を第２表に示す。Examples 1 and 2 and Comparative Example 1 Mass spectrometry was performed using an analyzer as shown in FIG. Argon gas (research grade) was used as the glow discharge gas, and high-purity GaAs was used as the analysis sample.
A crystal was used. When a commercially available cooler is used as the cooler 7 and the set temperature is -80°C (Example 1), and when the cooler 7
A dewar bottle containing acetone and dry ice was used (cooling temperature: 65 to -70°C).
In the case (Example 2), the intensity of ions generated in the discharge chamber 2 was measured. Ion intensities were similarly measured using the conventional analytical method (comparative example) using the apparatus shown in FIG. 2 (without cooling). The results are shown in Table 2.
第２表
第２表中、イオン種の欄の（）内の数字は分子量又は原
子量を原子単位で整数値として表したものである。また
、イオン強度はファラデー検出器で測定したイオンカウ
ント値に比例する値であり、それぞれのイオン種の測定
時間は等しくなるように換算しである。Table 2 In Table 2, the numbers in parentheses in the ion species column represent molecular weights or atomic weights as integer values in atomic units. Moreover, the ion intensity is a value proportional to the ion count value measured by a Faraday detector, and the measurement time of each ion species is converted to be equal.
第２表から、Ｈ，Ｏに関係する原子イオン及び分子イオ
ン強度が従来に比べて本発明では大幅に低減されている
ことが判る。From Table 2, it can be seen that the atomic and molecular ion intensities related to H and O are significantly reduced in the present invention compared to the conventional ones.
［発明の効果］ 本発明による効果は以下のとおりである。[Effect of the invention] The effects of the present invention are as follows.
（１）放電ガス中の不純物及び放電ガス供給源と放電用
ガス配管のジヨイント部や配管そのものからの不純物の
うち、冷却器でトラップできる成分を放電室前で除去で
きる。また、脱ガスに起因する不純物の放電領域への混
入が抑制できる。従って、放電室での有害な不純物イオ
ンの生成及び複合イオンの生成を大幅に低減できる。と
くにＨｚＯに起因する水素、酸素及び水素−酸素複合イ
オンならびにこれらのイオンと他のイオンとの複合イオ
ンの生成の低減効果は非常に大きい。(1) Among impurities in the discharge gas and impurities from the joint between the discharge gas supply source and the discharge gas piping, or from the piping itself, components that can be trapped by the cooler can be removed before the discharge chamber. In addition, it is possible to suppress impurities from entering the discharge region due to degassing. Therefore, the generation of harmful impurity ions and complex ions in the discharge chamber can be significantly reduced. In particular, the effect of reducing the production of hydrogen, oxygen, hydrogen-oxygen complex ions, and complex ions of these ions and other ions caused by HzO is very large.
（２）放電室内への微量水分の混入は、グロー放電時の
放電領域の温度を高める効果があるので、放電室内の各
種構成材料か加熱され、分析試料以外の構成材料からの
微量不純物のイオンか生成し、分析の障害となるスペク
トルの敗及び強度が増大する。しかし、本発明では、放
電室への微量水分の混入を大幅に低減できるため、この
ような問題が大幅に改善される。(2) Since trace amounts of moisture mixed into the discharge chamber have the effect of increasing the temperature of the discharge region during glow discharge, various constituent materials in the discharge chamber are heated, and trace impurity ions from constituent materials other than the analysis sample are generated. This increases the loss and intensity of the spectrum, which hinders the analysis. However, in the present invention, such problems can be greatly improved because the intrusion of trace amounts of moisture into the discharge chamber can be significantly reduced.
（３）放電用ガス供給源と放電室の間の放電用ガス配管
の中に高温保持のチタンや酸化銅さらにはモレキュラー
ンーブからなる純化器を設置することがあるが、使用時
間とともに純化器の純化機能か低下する。しかし、純化
器と放電ガス用供給源の間に本発明の如く冷却器を設置
することにより、純化器の機能低下を大幅に抑制するこ
とが可能となる。(3) A purifier made of titanium, copper oxide, or molecular tube that maintains high temperatures is sometimes installed in the discharge gas piping between the discharge gas supply source and the discharge chamber, but as time passes, the purifier The purification function of However, by installing a cooler as in the present invention between the purifier and the discharge gas supply source, it is possible to significantly suppress the functional deterioration of the purifier.
以上説明したように、本発明により放電室への放電用ガ
ス以外の不純物の混入を大幅低減することが１可能とな
り、＠項元素分析の際に大きな障害となるイオン種生成
を大幅低減でき、従来以上の微里元素分析か可能となる
。As explained above, the present invention makes it possible to significantly reduce the incorporation of impurities other than discharge gas into the discharge chamber, and to significantly reduce the generation of ionic species, which is a major hindrance during @-term elemental analysis. It becomes possible to perform even more microelement analysis than before.
本発明は、グロー放重質量分析において有用であり、特
に、半導体、金属、セラミック等の高純度材料中の微量
元素分υ〒に利用すると効果的である。The present invention is useful in glow mass spectrometry, and is particularly effective when used to analyze trace elements υ in high-purity materials such as semiconductors, metals, and ceramics.
第１図は、本発明のグロー放電質量分析装置の一例の概
要を示す図、
第２図は、従来のグロー放電質量分析装置の一例の概要
を示す図、及び
第３〜５図は従来のグロー放電性分析で得られた質重ス
ペクトル例を示す図面である。
１・・・放電用ガスボンベ、
２・・・放電室、
３・・・放電用ガス配管、
７・・冷却器。
特許出願人住友電気工業株式会社
代 理 人 弁理士 前出 葆 ほか２名第１図
第２１′Ｉ
第３図
第４ｒ２１
第５図１FIG. 1 is a diagram showing an overview of an example of a glow discharge mass spectrometer of the present invention, FIG. 2 is a diagram showing an overview of an example of a conventional glow discharge mass spectrometer, and FIGS. It is a drawing showing an example of a gravity spectrum obtained by glow discharge property analysis. 1... gas cylinder for discharge, 2... discharge chamber, 3... gas piping for discharge, 7... cooler. Patent Applicant Sumitomo Electric Industries, Ltd. Representative Patent Attorney Mr. Said and 2 others Figure 1 Figure 21'I Figure 3 Figure 4r21 Figure 5 1
Claims (1)
した後、放電用ガスを放電室に導入し、放電室内で分析
試料のイオン化を生じさせ、生成イオンを質量分析計に
導入し、イオン検出を行うことを特徴とする微量元素分
析法。 ２、グロー放電質量分析法である特許請求の範囲第１項
記載の分析法。 ３、放電用ガスの冷却を−１０℃以下の温度で行う特許
請求の範囲第１項又は第２項に記載の分析法。 ４、放電用ガス供給源、放電用ガスを冷却する冷却器、
放電室および質量分析計を有する微量元素分析装置であ
って、 放電用ガス供給源と放電室とが冷却器を介して放電用ガ
ス配管により接続されていることを特徴とする微量元素
分析装置。 ５、冷却器と放電室との間の放電用ガス配管の長さが１
ｍ以下である特許請求の範囲第４項記載の装置。[Claims] 1. After cooling the discharge gas to reduce impurities in the discharge gas, the discharge gas is introduced into the discharge chamber, and an analysis sample is ionized in the discharge chamber to generate ions. A trace element analysis method that is characterized by being introduced into a mass spectrometer to detect ions. 2. The analysis method according to claim 1, which is glow discharge mass spectrometry. 3. The analysis method according to claim 1 or 2, wherein the discharge gas is cooled at a temperature of -10°C or lower. 4, a discharge gas supply source, a cooler that cools the discharge gas,
1. A trace element analyzer having a discharge chamber and a mass spectrometer, wherein a discharge gas supply source and the discharge chamber are connected by a discharge gas piping via a cooler. 5. The length of the discharge gas piping between the cooler and the discharge chamber is 1
5. The device according to claim 4, which is less than or equal to m.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62052410A JPS63218143A (en) | 1987-03-06 | 1987-03-06 | Trace element analysis and equipment therefor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62052410A JPS63218143A (en) | 1987-03-06 | 1987-03-06 | Trace element analysis and equipment therefor |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63218143A true JPS63218143A (en) | 1988-09-12 |
Family
ID=12914015
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62052410A Pending JPS63218143A (en) | 1987-03-06 | 1987-03-06 | Trace element analysis and equipment therefor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63218143A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05174781A (en) * | 1991-12-25 | 1993-07-13 | Sharp Corp | Induction coupling plasma type mass-spectrographic device |
-
1987
- 1987-03-06 JP JP62052410A patent/JPS63218143A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05174781A (en) * | 1991-12-25 | 1993-07-13 | Sharp Corp | Induction coupling plasma type mass-spectrographic device |
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