JPS632071A - Electrophotographic sensitive body - Google Patents
Electrophotographic sensitive bodyInfo
- Publication number
- JPS632071A JPS632071A JP4102286A JP4102286A JPS632071A JP S632071 A JPS632071 A JP S632071A JP 4102286 A JP4102286 A JP 4102286A JP 4102286 A JP4102286 A JP 4102286A JP S632071 A JPS632071 A JP S632071A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- photoconductive
- org
- protective layer
- resin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical group O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 34
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 32
- 239000011241 protective layer Substances 0.000 claims abstract description 23
- -1 methylol groups Chemical group 0.000 claims abstract description 20
- 229920000877 Melamine resin Polymers 0.000 claims abstract description 11
- 108091008695 photoreceptors Proteins 0.000 claims description 27
- 229920005989 resin Polymers 0.000 claims description 25
- 239000011347 resin Substances 0.000 claims description 25
- 229920002313 fluoropolymer Polymers 0.000 claims description 10
- 239000004811 fluoropolymer Substances 0.000 claims description 10
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 claims description 9
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 57
- 239000000126 substance Substances 0.000 abstract description 16
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 abstract description 14
- 229910052731 fluorine Inorganic materials 0.000 abstract description 14
- 239000011737 fluorine Substances 0.000 abstract description 14
- 239000011230 binding agent Substances 0.000 abstract description 12
- 229920000642 polymer Polymers 0.000 abstract description 8
- 239000002131 composite material Substances 0.000 abstract description 5
- 239000000049 pigment Substances 0.000 abstract description 4
- 150000007974 melamines Chemical class 0.000 abstract description 3
- 238000010030 laminating Methods 0.000 abstract description 2
- 150000001875 compounds Chemical class 0.000 description 22
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical group OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 10
- 235000019256 formaldehyde Nutrition 0.000 description 10
- 239000000178 monomer Substances 0.000 description 10
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
- 239000012860 organic pigment Substances 0.000 description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 8
- 229920001577 copolymer Polymers 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 239000002904 solvent Substances 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000003960 organic solvent Substances 0.000 description 5
- JMHCCAYJTTWMCX-QWPJCUCISA-M sodium;(2s)-2-amino-3-[4-(4-hydroxy-3,5-diiodophenoxy)-3,5-diiodophenyl]propanoate;pentahydrate Chemical compound O.O.O.O.O.[Na+].IC1=CC(C[C@H](N)C([O-])=O)=CC(I)=C1OC1=CC(I)=C(O)C(I)=C1 JMHCCAYJTTWMCX-QWPJCUCISA-M 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 150000002978 peroxides Chemical class 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical group CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000012937 correction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229920000578 graft copolymer Polymers 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 3
- 229920001225 polyester resin Polymers 0.000 description 3
- 239000004645 polyester resin Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 239000008096 xylene Substances 0.000 description 3
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 3
- DXBHBZVCASKNBY-UHFFFAOYSA-N 1,2-Benz(a)anthracene Chemical compound C1=CC=C2C3=CC4=CC=CC=C4C=C3C=CC2=C1 DXBHBZVCASKNBY-UHFFFAOYSA-N 0.000 description 2
- QNLZIZAQLLYXTC-UHFFFAOYSA-N 1,2-dimethylnaphthalene Chemical compound C1=CC=CC2=C(C)C(C)=CC=C21 QNLZIZAQLLYXTC-UHFFFAOYSA-N 0.000 description 2
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N 1-ethenoxybutane Chemical compound CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 2
- TURIHPLQSRVWHU-UHFFFAOYSA-N 2-phenylnaphthalene Chemical compound C1=CC=CC=C1C1=CC=C(C=CC=C2)C2=C1 TURIHPLQSRVWHU-UHFFFAOYSA-N 0.000 description 2
- UJOBWOGCFQCDNV-UHFFFAOYSA-N 9H-carbazole Chemical compound C1=CC=C2C3=CC=CC=C3NC2=C1 UJOBWOGCFQCDNV-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 238000007259 addition reaction Methods 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 239000007810 chemical reaction solvent Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 2
- WDECIBYCCFPHNR-UHFFFAOYSA-N chrysene Chemical compound C1=CC=CC2=CC=C3C4=CC=CC=C4C=CC3=C21 WDECIBYCCFPHNR-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- 238000006266 etherification reaction Methods 0.000 description 2
- YLQWCDOCJODRMT-UHFFFAOYSA-N fluoren-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3C2=C1 YLQWCDOCJODRMT-UHFFFAOYSA-N 0.000 description 2
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 2
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
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- 238000005259 measurement Methods 0.000 description 2
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- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 125000000466 oxiranyl group Chemical group 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
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- 239000002685 polymerization catalyst Substances 0.000 description 2
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- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
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- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- SKYXLDSRLNRAPS-UHFFFAOYSA-N 1,2,4-trifluoro-5-methoxybenzene Chemical compound COC1=CC(F)=C(F)C=C1F SKYXLDSRLNRAPS-UHFFFAOYSA-N 0.000 description 1
- HYGLETVERPVXOS-UHFFFAOYSA-N 1-bromopyrene Chemical compound C1=C2C(Br)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 HYGLETVERPVXOS-UHFFFAOYSA-N 0.000 description 1
- YAOJJEJGPZRYJF-UHFFFAOYSA-N 1-ethenoxyhexane Chemical compound CCCCCCOC=C YAOJJEJGPZRYJF-UHFFFAOYSA-N 0.000 description 1
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
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- NJRHMGPRPPEGQL-UHFFFAOYSA-N 2-hydroxybutyl prop-2-enoate Chemical compound CCC(O)COC(=O)C=C NJRHMGPRPPEGQL-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- KLLLJCACIRKBDT-UHFFFAOYSA-N 2-phenyl-1H-indole Chemical compound N1C2=CC=CC=C2C=C1C1=CC=CC=C1 KLLLJCACIRKBDT-UHFFFAOYSA-N 0.000 description 1
- CCIRWPQIFNLNMJ-UHFFFAOYSA-N 2-phenylpyrene Chemical compound C1=CC=CC=C1C1=CC2=CC=C(C=CC=C3C=C4)C3=C2C4=C1 CCIRWPQIFNLNMJ-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 1
- OJXVWULQHYTXRF-UHFFFAOYSA-N 3-ethenoxypropan-1-ol Chemical compound OCCCOC=C OJXVWULQHYTXRF-UHFFFAOYSA-N 0.000 description 1
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- IAWRFMPNMXEJCK-UHFFFAOYSA-N 3-phenyl-9h-carbazole Chemical compound C1=CC=CC=C1C1=CC=C(NC=2C3=CC=CC=2)C3=C1 IAWRFMPNMXEJCK-UHFFFAOYSA-N 0.000 description 1
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- HMBNQNDUEFFFNZ-UHFFFAOYSA-N 4-ethenoxybutan-1-ol Chemical compound OCCCCOC=C HMBNQNDUEFFFNZ-UHFFFAOYSA-N 0.000 description 1
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
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- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
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- CNCOEDDPFOAUMB-UHFFFAOYSA-N N-Methylolacrylamide Chemical compound OCNC(=O)C=C CNCOEDDPFOAUMB-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- NRCMAYZCPIVABH-UHFFFAOYSA-N Quinacridone Chemical class N1C2=CC=CC=C2C(=O)C2=C1C=C1C(=O)C3=CC=CC=C3NC1=C2 NRCMAYZCPIVABH-UHFFFAOYSA-N 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- GAUZCKBSTZFWCT-UHFFFAOYSA-N azoxybenzene Chemical compound C=1C=CC=CC=1[N+]([O-])=NC1=CC=CC=C1 GAUZCKBSTZFWCT-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 125000000000 cycloalkoxy group Chemical group 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- LSXWFXONGKSEMY-UHFFFAOYSA-N di-tert-butyl peroxide Chemical compound CC(C)(C)OOC(C)(C)C LSXWFXONGKSEMY-UHFFFAOYSA-N 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000007720 emulsion polymerization reaction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- 238000004817 gas chromatography Methods 0.000 description 1
- 238000005227 gel permeation chromatography Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010559 graft polymerization reaction Methods 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- 150000008282 halocarbons Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 238000004811 liquid chromatography Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- DCUFMVPCXCSVNP-UHFFFAOYSA-N methacrylic anhydride Chemical compound CC(=C)C(=O)OC(=O)C(C)=C DCUFMVPCXCSVNP-UHFFFAOYSA-N 0.000 description 1
- 125000001434 methanylylidene group Chemical group [H]C#[*] 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- KKFHAJHLJHVUDM-UHFFFAOYSA-N n-vinylcarbazole Chemical compound C1=CC=C2N(C=C)C3=CC=CC=C3C2=C1 KKFHAJHLJHVUDM-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical compound C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- 150000007978 oxazole derivatives Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001470 polyketone Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- ARJOQCYCJMAIFR-UHFFFAOYSA-N prop-2-enoyl prop-2-enoate Chemical compound C=CC(=O)OC(=O)C=C ARJOQCYCJMAIFR-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- DNXIASIHZYFFRO-UHFFFAOYSA-N pyrazoline Chemical compound C1CN=NC1 DNXIASIHZYFFRO-UHFFFAOYSA-N 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000012086 standard solution Substances 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- VOBWLFNYOWWARN-UHFFFAOYSA-N thiophen-3-one Chemical compound O=C1CSC=C1 VOBWLFNYOWWARN-UHFFFAOYSA-N 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14717—Macromolecular material obtained by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14726—Halogenated polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
- G03G5/147—Cover layers
- G03G5/14708—Cover layers comprising organic material
- G03G5/14713—Macromolecular material
- G03G5/14747—Macromolecular material obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- G03G5/14769—Other polycondensates comprising nitrogen atoms with or without oxygen atoms in the main chain
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
Description
【発明の詳細な説明】
(童業上の利用分野)
本発明は、電子写真特性及び耐久性に優れた電子写真感
光体に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Use in Childcare) The present invention relates to an electrophotographic photoreceptor having excellent electrophotographic properties and durability.
(従来の技術)
従来、光導電性物質を感光材料として利用する電子写真
感光体においてはセレン、酸化亜鉛、酸化チタン、硫化
カドミウムなどの無機系光導電性物質が主に用いられて
きた。(Prior Art) Conventionally, inorganic photoconductive substances such as selenium, zinc oxide, titanium oxide, and cadmium sulfide have been mainly used in electrophotographic photoreceptors that utilize photoconductive substances as photosensitive materials.
しかし、これらは−般に毒性が強いものが多く廃棄する
方法にも問題がある。However, most of these are highly toxic, and there are problems in the way they are disposed of.
一方、有機光導電性化合物を使用する感光体は無機系光
導電性物質を使用する場合に比べ一般だ毒性が弱く更に
、透明性、可とう性、軽量性、我f平滑性1価格などの
点において有利であることから最近、広く研究されてき
ている。その中でも。On the other hand, photoreceptors using organic photoconductive compounds are generally less toxic than those using inorganic photoconductive substances, and also have advantages such as transparency, flexibility, light weight, and smoothness. Recently, it has been widely studied because of its advantages in several respects. Among them.
電荷の発生機能と輸送機能を分離した複合型感光体は、
従来有機光導電性化合物を使用した感光体の、大きな欠
点であった感度を大幅に向上させることができるため、
近年、急速な進歩を遂げつつある。A composite photoreceptor that separates charge generation and transport functions is
The sensitivity, which was a major drawback of conventional photoreceptors using organic photoconductive compounds, can be greatly improved.
Rapid progress has been made in recent years.
しかしながらこれらの有機光導電性化合物を使用した感
光体を例えば、カールソン法による電子写真装置に適用
するなどして帯電露光を繰シ返して使用する際1通常、
感光体表面にわずかに付着残存しているトナーをブレー
ドやブラシ等を用いてクリーニング(除去)する必要が
ある。このクリーニングの工程を繰り返すことにより、
感光体の表面は摩耗し、損傷を受け、その結果、転写画
像が不鮮明になり、場合によっては電荷輸送層や電荷発
生層の剥離を起こし、感光体の寿命が著しく短くなる。However, when a photoreceptor using these organic photoconductive compounds is applied to an electrophotographic device based on the Carlson method, and is repeatedly subjected to charging and exposure, 1.
It is necessary to clean (remove) a small amount of toner remaining on the surface of the photoreceptor using a blade, brush, or the like. By repeating this cleaning process,
The surface of the photoreceptor is worn and damaged, resulting in blurred transferred images and, in some cases, delamination of the charge transport layer and charge generation layer, significantly shortening the life of the photoreceptor.
このような問題点から感光体には。Due to these problems, photoreceptors are
強固な耐久性が要求されている。Strong durability is required.
耐久性を向上させるため、特開昭52−76928号公
報、特開昭54−17732号公報などで開示されてい
るように表面に保護層を設けることが提案されている。In order to improve durability, it has been proposed to provide a protective layer on the surface, as disclosed in Japanese Patent Laid-Open No. 52-76928, Japanese Patent Laid-Open No. 54-17732, and the like.
(発明が解決しようとする問題点)
上記の公報に開示されるような従来の保護層では、耐摩
耗性の効果も十分でなく、また、電子写真特性における
残留電位の増加や感度の低下を招きやすいという欠点が
あり、電子写真特性を損わない耐摩耗性の高い保護層の
開発が望まれている。(Problems to be Solved by the Invention) The conventional protective layer as disclosed in the above-mentioned publication does not have a sufficient abrasion resistance effect, and also causes an increase in residual potential and a decrease in sensitivity in electrophotographic characteristics. Therefore, it is desired to develop a protective layer with high abrasion resistance that does not impair electrophotographic properties.
従って0本発明は、有機光導電性化合物を使用する場合
にも、電子写真特性及び耐久性に優れた電子写真感光体
を提供するものである。Therefore, the present invention provides an electrophotographic photoreceptor with excellent electrophotographic properties and durability even when an organic photoconductive compound is used.
C問題点を解決するための手段)
本発明は1表面に保護層を有する電子写真感光体におい
て、該保護層が。Means for Solving Problem C) The present invention provides an electrophotographic photoreceptor having a protective layer on one surface, the protective layer comprising:
(a) 水酸基含有フッ素重合体
並びに
(b) 数平均分子量が1,500以下で、メラミン
核1個当りに結合ホルムアルデヒド数が2〜4個及ヒメ
チロール基数が1〜2個であるブチルエーテル化メラミ
ン・ホルムアルデヒド樹脂の硬化皮膜を含有してなる電
子写真感光体に関する。(a) Hydroxyl group-containing fluoropolymer; and (b) butyl etherified melamine having a number average molecular weight of 1,500 or less and having 2 to 4 formaldehyde and 1 to 2 hismethylol groups per melamine nucleus. The present invention relates to an electrophotographic photoreceptor containing a cured film of formaldehyde resin.
本発明に係る電子写真感光体は、導電層、光導電層及び
保護層を順次積層して得ることができる。The electrophotographic photoreceptor according to the present invention can be obtained by sequentially laminating a conductive layer, a photoconductive layer, and a protective layer.
本発明において、光導電層は、有機光導電性化合物を含
む層であり、有機光導電性化合物の皮膜。In the present invention, the photoconductive layer is a layer containing an organic photoconductive compound, and is a film of the organic photoconductive compound.
有機光導電性化合物と結合剤を含む皮膜、電荷発生層及
び電荷輸送層からなる複合型皮膜等がある。There are coatings containing an organic photoconductive compound and a binder, composite coatings consisting of a charge generation layer and a charge transport layer, and the like.
上記有機光導電性化合物としては公知のものが使用でき
る。また、有機光導電性化合物としては電荷を発生する
有機顔料と電荷輸送性物質を併用するのが好ましい。な
お、上記電荷発生層には電荷を発生する有機顔料が含ま
れ、電荷輸送層には電荷輸送性物質が含まれる。Known organic photoconductive compounds can be used as the organic photoconductive compound. Further, as the organic photoconductive compound, it is preferable to use an organic pigment that generates a charge and a charge transporting substance in combination. Note that the charge generation layer contains an organic pigment that generates charges, and the charge transport layer contains a charge transporting substance.
電荷を発生する有機顔料としては、アゾキシベンゼン系
、ジスアゾ系、トリスアゾ系、ベンズイミダゾール系、
多環キノン系、インジゴイド系。Organic pigments that generate charges include azoxybenzene, disazo, trisazo, benzimidazole,
Polycyclic quinone type, indigoid type.
キナクリドン系、ペリレン系、メチン系、α型。Quinacridone series, perylene series, methine series, alpha type.
β型、γ型、δ型、ε型、χ型等の各種結晶構造を有す
る無金属タイプ又は金属タイプのフタロシアニン系など
の電荷を発生することが知られている顔料が使用できる
。これらの顔料は1例えば。Pigments known to generate charges, such as metal-free or metallic phthalocyanine-based pigments, having various crystal structures such as β-type, γ-type, δ-type, ε-type, and χ-type can be used. These pigments are one example.
特開昭47−37453号公報、特開昭47−3754
4号公報、特開昭47−18543号公報、特開昭47
−18544号公報、特開昭48−43942号公報、
特開昭48−70538号公報、特開昭49−1231
号公報、特開昭49−105536号公報1%開昭50
−75214号公報、特開昭53−44028号公報、
特開昭54−17732号公報などに開示されている。JP-A-47-37453, JP-A-47-3754
Publication No. 4, JP-A-47-18543, JP-A-47
-18544 publication, JP-A-48-43942 publication,
JP-A-48-70538, JP-A-49-1231
Publication No. 1987-105536 1%
-75214 publication, JP-A-53-44028 publication,
It is disclosed in Japanese Patent Application Laid-Open No. 17732/1983.
特に、長波長(800nm付近)にまで感度を有する点
で特開昭58−182640号公報及びヨーロッパ特許
公開筒92.255号公報などに開示されているτ、τ
′、η及びη′型型金金属フタロシアニン好適である。In particular, τ and τ are disclosed in JP-A-58-182640 and European Patent Publication No. 92.255 in that they are sensitive to long wavelengths (near 800 nm).
', η and η' type gold metal phthalocyanines are preferred.
このようなもののほか、光照射により電荷担体を発生す
る有機顔料はいずれも使用可能である。In addition to these, any organic pigment that generates charge carriers upon irradiation with light can be used.
電荷輸送性物質としては高分子化合物のものではポ17
N−ビニルカルバゾール、ハロゲン化ポリ−N−ビ
ニルカルバゾール、ポリビニルピレン。Among the charge-transporting substances, polymer compounds include poly-17.
N-vinylcarbazole, halogenated poly-N-vinylcarbazole, polyvinylpyrene.
ポリビニルインドロキノキサリン、ポリビニルベンゾチ
オフェン、ポリビニルアントラセン、ポリビニルアクリ
ジン、ポリビニルピラゾリン等が。Polyvinylindoquinoxaline, polyvinylbenzothiophene, polyvinylanthracene, polyvinylacridine, polyvinylpyrazoline, etc.
低分子化合物のものではフルオレノン、フルオレン、z
7−シニトロー9−フルオレノン、4H−インデノ(1
,2,6)チオフェン−4−オン、3.7−シニトロー
ジペンゾチオフエンー5−オキサイド、1−ブロムピレ
ン、2−フェニルピレン、カルバゾール、3−フェニル
カルバゾール、2−フェニルインドール、2−フェニル
ナフタレン、オキサジアゾール、1−フェニル−3−(
4−ジエチルアミノスチリル)−5−14−ジエチルア
ミノスチリル)−5−(4−ジエチルアミノフェニル)
ピラゾリン、2−(p−ジメチルアミノフェニル)4−
(p−ジエチルアミノフェニル)−5−(o−クロルフ
ェニル)−1,3−オキナゾール、イミダゾール、クリ
セン、テトラフェン、アクリデン、トリフェニルアミン
、これらの誘導体等がある。Among low-molecular compounds, fluorenone, fluorene, z
7-sinitro 9-fluorenone, 4H-indeno(1
, 2,6) Thiophen-4-one, 3,7-sinitrodipenzothiophene-5-oxide, 1-bromopyrene, 2-phenylpyrene, carbazole, 3-phenylcarbazole, 2-phenylindole, 2-phenyl naphthalene, oxadiazole, 1-phenyl-3-(
4-diethylaminostyryl)-5-14-diethylaminostyryl)-5-(4-diethylaminophenyl)
Pyrazoline, 2-(p-dimethylaminophenyl)4-
Examples include (p-diethylaminophenyl)-5-(o-chlorophenyl)-1,3-oquinazole, imidazole, chrysene, tetraphene, acridene, triphenylamine, and derivatives thereof.
電荷を発生する有機顔料と電荷輸送性物質を混合して使
用する場合は、後者/前者が重量比で10/1〜2/1
の割合で配合するのが好ましい。When using a mixture of an organic pigment that generates a charge and a charge transporting substance, the weight ratio of the latter/former is 10/1 to 2/1.
It is preferable to mix them in the following proportions.
このとき、1!荷輸送性物質が高分子化合物のものであ
れば、結合剤を使用しなくてもよいが、この場合でも又
は電荷輸送性物質が低分子化合物の場合でも、結合剤を
これらの化合物全量に対し−C500重量%以下で使用
するのが好ましい。また。At this time, 1! If the charge-transporting substance is a high-molecular compound, there is no need to use a binder, but even in this case or even if the charge-transporting substance is a low-molecular compound, the binder must be added to the total amount of these compounds. -C is preferably used in an amount of 500% by weight or less. Also.
電荷輸送性物質として低分子化合物を夏用する場合は、
結合剤を30重量壬以上使用するのが好ましい。結合剤
を使用する場合、さらに、可塑剤。When using a low-molecular compound as a charge transport material in the summer,
Preferably, the binder is used in an amount of 30 kg or more by weight. In addition, if a binder is used, a plasticizer.
流動性付与剤、ピンホール抑制剤等の添加剤を必要に応
じて添加することができる。Additives such as fluidity imparting agents and pinhole inhibitors can be added as necessary.
結合剤としては、シリコーン樹脂、ポリアミド樹脂、ポ
リウレタン樹脂、ポリエステル樹脂、エポキシ樹脂、ポ
リケトン樹脂、ポリカーボネート樹脂、ポリスチレン樹
脂、ポリメタクリル酸メチル樹脂、ポリアクリルアミド
樹脂等が挙げられる。Examples of the binder include silicone resin, polyamide resin, polyurethane resin, polyester resin, epoxy resin, polyketone resin, polycarbonate resin, polystyrene resin, polymethyl methacrylate resin, and polyacrylamide resin.
また、熱及び/又は光によって架橋される熱硬化型樹脂
及び光硬化型樹脂も使用できる。Furthermore, thermosetting resins and photocuring resins that are crosslinked by heat and/or light can also be used.
いずれにしても絶縁性で通常の状態で皮膜を形成しうる
樹脂、並びに熱及び/又は光によって硬化し、皮膜を形
成する樹脂であれば特に制限はない。可塑剤としては、
ハロゲン化パラフィン、ジメチルナフタリン、ジブチル
フタレート等が挙げられる。流動性付与剤としては、モ
ダフロー(モンサンドケミカル社製)、アクロナール4
F (パスフ社製)等が挙げられ、ピンホール抑制剤
としては、ベンゾイン、ジメチルフタレート等が挙げら
れる。これらは適宜2択して使用され、その量も適宜決
定されればよい。In any case, there are no particular limitations as long as the resin is insulative and can form a film under normal conditions, and the resin can be cured by heat and/or light to form a film. As a plasticizer,
Examples include halogenated paraffin, dimethylnaphthalene, dibutyl phthalate, and the like. As fluidity imparting agents, Modaflow (manufactured by Monsando Chemical Co., Ltd.), Acronal 4
Examples of the pinhole inhibitor include benzoin and dimethyl phthalate. Two of these may be used as appropriate, and the amount thereof may be determined appropriately.
電荷発生層及び電荷輸送層からなる複合型の光導電層を
形成する場合、電荷発生層中には、前記しまた電荷を発
生する有機顔料が含有させられ、前記結合剤を該有機顔
料に対して500重量%以下の量で含有させてもよく、
また、前記した添加剤を該有機顔料に対して、5重量%
以下で添加してもよい。また、11!荷輸送層には、前
記した電荷輸送性物質が含有させられ、前記結合剤を該
電荷輸送性物質に対して500重量%以下で含有させて
もよい。電荷輸送性・物質が低分子量化合物の場合は、
結合剤を該化合物に対して50重量%以上含有させるの
が好ましい。電荷輸送層には、前記した添加剤を電荷輸
送性物質に対して5重量%以下で含有させてもよい。When forming a composite photoconductive layer consisting of a charge generation layer and a charge transport layer, the charge generation layer also contains the above-mentioned organic pigment that generates charges, and the binder is applied to the organic pigment. may be contained in an amount of 500% by weight or less,
In addition, the above-mentioned additives are added in an amount of 5% by weight based on the organic pigment.
It may be added below. Also, 11! The charge transporting layer may contain the charge transporting substance described above, and the binder may be contained in an amount of 500% by weight or less based on the charge transporting substance. Charge transport property/If the substance is a low molecular weight compound,
It is preferable that the binder is contained in an amount of 50% by weight or more based on the compound. The charge transporting layer may contain the above-mentioned additives in an amount of 5% by weight or less based on the charge transporting substance.
保護層の材料として用いられる水酸基含有フッ素重合体
とは9分子中に水酸基及びフッ素を有する重合体であっ
て、水酸基は9重合体の水酸基価が5〜100になるよ
うに分子中に存在するのが好ましく、特に水酸基価が8
〜70になるようにするのが好ましい。水酸基価が小さ
すぎるとブチルエーテル化メラミン・ホルムアルデヒド
樹脂トの架橋密度が上がらず、保護層の耐摩耗性が向上
しに<<、大きすぎるとブチルエーテル化メラミン・ホ
ルムアルデヒド樹脂との相溶性が劣る。The hydroxyl group-containing fluoropolymer used as a material for the protective layer is a polymer having hydroxyl groups and fluorine in 9 molecules, and the hydroxyl groups are present in the molecules so that the hydroxyl value of the 9 polymer is 5 to 100. It is preferable that the hydroxyl value is 8.
It is preferable to set it to 70. If the hydroxyl value is too small, the crosslinking density of the butyl etherified melamine/formaldehyde resin will not increase and the abrasion resistance of the protective layer will not improve. If the hydroxyl value is too large, the compatibility with the butyl etherified melamine/formaldehyde resin will be poor.
上記水酸基含有フッ素重合体は、クロロトリフルオロエ
チレン、トリフルオロエチレン、fドラフルオロエチレ
ン等のフルオロエチレンとエチルビニルエーテル、プロ
ピルビニルエーテル、ブチルビニルエーテル、ヘキシル
ビニルエーテル等のアルキルビニルエーテル(これはフ
ッ素置換されていてもよい)若しくはシクロヘキシルビ
ニルエーテル等のシクロアルキルビニルエーテル(これ
はフッ素置換されていてもよい)及びヒドロキシエチル
ビニルエーテル、ヒドロキシプロピルビニルエーテル、
ヒドロキシブチルビニルエーテル等のヒドロキシアルキ
ルビニルエーテルを共重合させること罠よって得ること
ができ、他にカルボキシエチルビニルエーテル等のカル
ボキシアルキルビニルエーテル、エチレン、フロピレン
、インブチレン、塩化ビニル、塩化ビニリデン、酢酸ビ
ニル、n−酪酸ビニル、メチルメタクリレート、メタク
リル酸、アクリル酸等を共重合成分として含んでいても
よい。The above-mentioned hydroxyl group-containing fluoropolymer includes fluoroethylene such as chlorotrifluoroethylene, trifluoroethylene, f-dorafluoroethylene, and alkyl vinyl ether such as ethyl vinyl ether, propyl vinyl ether, butyl vinyl ether, hexyl vinyl ether (even if it is fluorine-substituted). or cycloalkyl vinyl ethers such as cyclohexyl vinyl ether (which may be fluorine-substituted) and hydroxyethyl vinyl ether, hydroxypropyl vinyl ether,
It can be obtained by copolymerizing hydroxyalkyl vinyl ethers such as hydroxybutyl vinyl ether, and also carboxyalkyl vinyl ethers such as carboxyethyl vinyl ether, ethylene, flopylene, imbutylene, vinyl chloride, vinylidene chloride, vinyl acetate, n-butyric acid. It may contain vinyl, methyl methacrylate, methacrylic acid, acrylic acid, etc. as a copolymer component.
フルオロオレフィンは、前記成分の総量中。Fluoroolefins are in the total amount of the above components.
30〜70モルチ含むのが好ましい。It is preferable to contain 30 to 70 molti.
また、前記アルキルビニルエーテル及びシクロアルキル
ビニルエーテルは、前記成分の総量中。Further, the alkyl vinyl ether and cycloalkyl vinyl ether are included in the total amount of the components.
あわせて5〜60モル係になるように使用するのが好ま
しい。これらが少なすぎると有機溶剤に溶解しにくくな
り9層の形成が行ないにくくなる。It is preferable to use them in a total amount of 5 to 60 moles. If these are too small, it becomes difficult to dissolve in organic solvents, making it difficult to form nine layers.
他の共重合成分は、前記成分のit中30モル係以下で
使用するのが好ましい。The other copolymerization components are preferably used in an amount of 30 molar or less based on the amount of the components.
本発明のフッ素重合体夕は1重分平均分子量が5.00
0〜150,000(液体クロマトグラフィーにおける
標準ポリスチレン換算)であるのが好ましい。分子量が
小さすぎると皮膜が弱くなり。The fluoropolymer of the present invention has a single weight average molecular weight of 5.00.
It is preferably 0 to 150,000 (in terms of standard polystyrene in liquid chromatography). If the molecular weight is too small, the film will be weak.
大きすぎると溶剤に溶解したときに粘度が高くなり9層
の形成が行ないにくくなる。If it is too large, the viscosity increases when dissolved in a solvent, making it difficult to form nine layers.
本発明の水酸基含有フッ素重合体は0次のものも包含さ
れる。The hydroxyl group-containing fluoropolymer of the present invention also includes zero-order ones.
すなわち1反応性の炭素−炭素二重結合を樹脂るグラフ
ト共重合体であって、水酸基を有するものも1本発明の
水酸基含有フッ素重合体に包含される。That is, a graft copolymer having monoreactive carbon-carbon double bonds and having a hydroxyl group is also included in the hydroxyl group-containing fluoropolymer of the present invention.
該フッ素含有樹脂は、該樹脂1oog当り9反応性の炭
素−炭素二重結合を0.001〜0.025モル、好ま
しくは0.003〜0.015モル有する。The fluorine-containing resin has 0.001 to 0.025 mol, preferably 0.003 to 0.015 mol, of 9 reactive carbon-carbon double bonds per 100 g of the resin.
0.001モル未満では、(B)成分と共に重合させる
際、グラフト重合が困難になり、0.025モルを越え
ると重合の際、ゲル化が起こり易くなる。また、該フッ
素含有樹脂は、アルコキシ基またはシクロアルキルオキ
シ基を有する。これによプ、キシレン、トルエン、酢酸
ブチル、メチルイソブチルケトン等の有機溶剤に可溶と
することができる。If it is less than 0.001 mol, graft polymerization becomes difficult when polymerizing with component (B), and if it exceeds 0.025 mol, gelation tends to occur during polymerization. Further, the fluorine-containing resin has an alkoxy group or a cycloalkyloxy group. This makes it possible to make it soluble in organic solvents such as soap, xylene, toluene, butyl acetate, and methyl isobutyl ketone.
さらに、フッ素を含有することにより1本発明により得
られるグラフト共重合体を使用した保護層の耐久性が向
上する。Furthermore, by containing fluorine, the durability of the protective layer using the graft copolymer obtained according to the present invention is improved.
上記フッ素含有樹脂としては0分子量が約1.000〜
200,000であるものが好ましく。The above fluorine-containing resin has a zero molecular weight of about 1.000 to
200,000 is preferred.
特に約10,000〜100.000のものが好ましい
。分子量が低過ぎると耐久性が低下する傾向にあり、高
過ぎるとフッ素含有樹脂の存在下にエチレン性不飽和単
量体を重合させる際、ゲル化しやすくなる傾向がある。Particularly preferred is about 10,000 to 100,000. If the molecular weight is too low, durability tends to decrease, and if it is too high, gelation tends to occur when the ethylenically unsaturated monomer is polymerized in the presence of a fluorine-containing resin.
囚成分であるフッ素含有樹脂は、水酸基を有する下記共
重合体ta+に無水マレイン酸、アクリル酸。The fluorine-containing resin which is the carrier component is the following copolymer TA+ having a hydroxyl group, maleic anhydride, and acrylic acid.
メタクリル酸、無水アクリル酸、無水メタクリル酸、こ
れらの酸クロライド等のα、β−不飽和カルボン酸また
はその水酸基と反応性の誘導体を反応させて得ることが
できる。It can be obtained by reacting an α,β-unsaturated carboxylic acid such as methacrylic acid, acrylic anhydride, methacrylic anhydride, or their acid chloride, or a reactive derivative thereof with a hydroxyl group.
この場合、α、β−不飽和カルボン酸またはその水酸基
と反応性の誘導体は9水酸基を有する共重合体(a)i
oogに対して0.001〜0.025%ル反応させら
れる。In this case, the α,β-unsaturated carboxylic acid or its hydroxyl group-reactive derivative is a copolymer (a)i having 9 hydroxyl groups.
It is reacted with 0.001 to 0.025% to oog.
共重合体(alは、前記した水酸基含有フッ素重合体と
同様のものであり1分子中に水酸基及びフッ素を有する
重合体であって、水酸基は9重合体の水酸基が0.57
〜100になるように分子中に存在するのが好ましく、
特に水酸基価が3〜70になるようにするのが好ましい
。水酸基価が小さすぎると二重結合を充分に導入できな
い。また、水酸基価が大きすぎると有機溶剤への溶解性
が限られやすくなる。Copolymer (al is the same as the hydroxyl group-containing fluoropolymer described above, and is a polymer having a hydroxyl group and fluorine in one molecule, and the hydroxyl group of the 9 polymer is 0.57
It is preferable that there are 100 to 100 in the molecule,
In particular, it is preferable to adjust the hydroxyl value to 3 to 70. If the hydroxyl value is too small, sufficient double bonds cannot be introduced. Moreover, if the hydroxyl value is too large, the solubility in organic solvents tends to be limited.
共重合体+8)は、具体的には、前記した水酸基含有フ
ッ素重合体と同様に、フルオロオレフィン。Copolymer +8) is specifically a fluoroolefin like the hydroxyl group-containing fluoropolymer described above.
アルキルビニルエーテル若L<はシクロアルキルビニル
エーテル及ヒヒドロキシアルキルビニルエーテルを共重
合させて得ることができ、他に共重合成分を含有してい
てもよい。これらの成分及び使用量は、@記した場合と
同様であるが、ヒドロキシアルキルビニルエーテルは、
共X 合体(a)ノ水酸基価が0.57〜100Kな
るように使用されるのが好ましく、特に3〜70になる
ように使用されるのが好ましい。The alkyl vinyl ether can be obtained by copolymerizing cycloalkyl vinyl ether and hydroxyalkyl vinyl ether, and may contain other copolymerized components. These ingredients and amounts used are the same as in the case @, but hydroxyalkyl vinyl ether is
Co-X Coalescence (a) It is preferably used so that the hydroxyl value is 0.57 to 100K, particularly preferably 3 to 70.
前記エチレン性不飽和単量体としては、メチルアクリレ
ート、エチルアクリレート、ブチルアクリレート、イソ
プロピルアクリレート、2−エチルへキシルアクリレー
ト等のアル≧ルアクリレート、同様のアルキルメタクリ
レート、スチレン若シくハビニルトルエン、α−メチル
スチレン、りロロスチレン等ノ置換スチレン、アクリロ
ニトリル、メタクリロニトリル、塩化ビニル、酢酸ビニ
ル、マレイン酸ジアルキルエステルを使用することがで
き、さらに、2−ヒドロキシエチルアクリレート、2−
ヒドロキシプロピルアクリレート。Examples of the ethylenically unsaturated monomer include alkyl acrylates such as methyl acrylate, ethyl acrylate, butyl acrylate, isopropyl acrylate, and 2-ethylhexyl acrylate, similar alkyl methacrylates, styrene or havinyltoluene, α -Substituted styrenes such as methylstyrene and lyrostyrene, acrylonitrile, methacrylonitrile, vinyl chloride, vinyl acetate, maleic acid dialkyl esters can be used, and furthermore, 2-hydroxyethyl acrylate, 2-
Hydroxypropyl acrylate.
2−ヒドロキシブチルアクリノート等のヒドロキシアル
キルアクリンート、同様のヒドロキシアルキルメタクリ
レート、グリセリン、トリメチロールプロパン等の多価
アルコールのモノアクリレートまたはモノメタクリレー
ト、N−メチロールアクリルアミド、N−メチロールメ
タクリルアミドなどの水酸基を有するエチレン性不飽和
単量体を用いることができる。また、必要に応じアクリ
ルアミド、メタクリルアミド等の不飽和アミド、グリシ
ジルメタクリレート、グリシジルアクリレート等のオキ
シラン基を有する不飽和単量体、アクリル酸、メタクリ
ル酸、マレイン酸モノアルキルエステル等のα、β−不
飽和カルボン酸を用いることができる。不飽和アミドお
よびオキシラン基を含有する不飽和単量体は多すぎると
塗膜の耐水性が低下したり0反応溶媒が限定されたりす
る傾向が生じるため、前記フッ素含有樹脂及びエチレン
性不飽和単量体の総量に対して30重量%以下で使用す
るのが好ましく、α、β−不飽和カルボン酸は多すぎる
と塗膜の耐水性が低下する傾向があるため、10重量%
以下で使用するのが好ましい。Hydroxy alkyl acrylates such as 2-hydroxybutyl acrylate, similar hydroxyalkyl methacrylates, monoacrylates or monomethacrylates of polyhydric alcohols such as glycerin and trimethylolpropane, N-methylol acrylamide, N-methylol methacrylamide, etc. Ethylenically unsaturated monomers having the following properties can be used. If necessary, unsaturated amides such as acrylamide and methacrylamide, unsaturated monomers having an oxirane group such as glycidyl methacrylate and glycidyl acrylate, and α,β-unsaturated monomers such as acrylic acid, methacrylic acid, and maleic acid monoalkyl esters Saturated carboxylic acids can be used. If the amount of unsaturated monomers containing unsaturated amide and oxirane groups is too large, the water resistance of the coating film tends to decrease or the amount of reaction solvent is limited. It is preferable to use the amount of α,β-unsaturated carboxylic acid in an amount of 30% by weight or less based on the total amount of carboxylic acids.
Preferably used below.
また、水酸基を有するエチレン性不飽和単量体は、得ら
れるグラフト共重合体の水酸基価が5〜100になるよ
うに、特に、8〜70になるように、適宜使用される。Further, the ethylenically unsaturated monomer having a hydroxyl group is appropriately used so that the hydroxyl value of the resulting graft copolymer is from 5 to 100, particularly from 8 to 70.
前記フッ素含有樹脂とエチレン性不飽和単量体は、前者
/後者が9重量比で、50150〜99,510.5の
範囲で使用されるのが好ましい。この比が50150以
上であることにより、耐久性、特に長期使用時の耐久性
に優れる。また、有機溶剤の溶解性の点から、上記重量
比が99.510.5以下が好ましい。上記重量比は、
特に60/40〜9515が好ましい。The fluorine-containing resin and the ethylenically unsaturated monomer are preferably used in a weight ratio of 9 to 99,510.5. When this ratio is 50150 or more, durability, especially durability during long-term use, is excellent. Further, from the viewpoint of solubility of the organic solvent, the above weight ratio is preferably 99.510.5 or less. The above weight ratio is
Particularly preferred is 60/40 to 9515.
前記フッ素含有樹脂の存在下でのエチレン性不飽和単量
体の重合は、必要に応じてトルエン、キシレン、メチル
イノブチルケトン、酢酸ブチル。The polymerization of the ethylenically unsaturated monomer in the presence of the fluorine-containing resin can be carried out using toluene, xylene, methylinobutyl ketone, butyl acetate, if necessary.
酢酸エチル、酢酸上ロソルブ、ブチルセロソルブ。Ethyl acetate, acetic acid superrosolve, butyl cellosolve.
1−ブタノール、2−ブタノール、1−プロパノール。1-butanol, 2-butanol, 1-propanol.
2−プロパツール等の有機溶剤を反応溶媒とし9重合触
媒として、過酸化ぺ/ジイル。ジターシャリーブチルパ
ーオキサイド、クメンハイドロパーオキナイド等の過酸
化物、アゾビスイソブチロニトリル等のアゾビス系化合
物を用い、50〜200°Cで1〜10時間加熱反応さ
せることにより行なうことができる。反応は、窒素ガス
等の不活性ガスの雰囲気または気流下知行なうのが好ま
しく1重合触媒としてはグラフト化率をよくする点で過
酸化物が好ましく、残存モノマーを少なくするためには
、過酸化物とアゾビス系化合物を併用するのが好ましい
。重合は、このように塊状重合および溶液重合だけでな
く、必要に応じ懇濁重谷、乳化重合等により行なうこと
ができる。9. Pe/diyl peroxide as a polymerization catalyst using an organic solvent such as 2-propatol as a reaction solvent. This can be carried out by heating the reaction at 50 to 200°C for 1 to 10 hours using peroxides such as ditertiary butyl peroxide and cumene hydroperoxide, and azobis compounds such as azobisisobutyronitrile. . The reaction is preferably carried out in an atmosphere of an inert gas such as nitrogen gas or under a stream of air.As a single polymerization catalyst, peroxide is preferable in order to improve the grafting rate.In order to reduce the amount of residual monomer, peroxide is preferable. It is preferable to use the compound and the azobis compound together. Polymerization can be carried out not only by bulk polymerization and solution polymerization as described above, but also by condensation polymerization, emulsion polymerization, etc., if necessary.
本発明において用いられるブチルエーテル化メラミン・
ホルムアルデヒド樹脂の数平均分子量は1.500以下
であり、数平均分子量が1.500を越えると反応性が
低下する。また該樹脂はメラミン核1個当り結合ホルム
アルデヒドを2〜4個有する。4個を越えると反応性が
低下し、2個未満では該樹脂の貯蔵安定性が悪くなり、
硬化塗膜がもろくなる。更に該樹脂はメラミン核1個あ
たりメチロール基を1〜2個有するものである。メチロ
ール基の数が2個を越えると該樹脂の貯蔵安定性が劣り
、硬化塗膜がもろくなる。また、1個未満では反応性が
劣る。Butyl etherified melamine used in the present invention
The number average molecular weight of the formaldehyde resin is 1.500 or less, and if the number average molecular weight exceeds 1.500, the reactivity decreases. The resin also has 2 to 4 bound formaldehydes per melamine core. If the number exceeds 4, the reactivity decreases, and if the number is less than 2, the storage stability of the resin deteriorates.
The cured coating becomes brittle. Furthermore, the resin has 1 to 2 methylol groups per melamine nucleus. If the number of methylol groups exceeds 2, the storage stability of the resin will be poor and the cured coating will become brittle. Moreover, if it is less than one, the reactivity is poor.
このようなブチルエーテル化メラミン・ホルムアルデヒ
ド樹脂は、メラミンをブタノールに溶解し、これてホル
ムアルデヒドを滴下することによって付加反応及びブチ
ルエーテル化反応を行なう方法、或いはメラミン及びホ
ルムアルデヒドをブタノールに溶解させ、この溶液を加
熱して付加反応及びブチルエーテル化反応を行なう方法
によって製造できる。これらの方法において反応は硝酸
。Such butyl etherified melamine/formaldehyde resin can be produced by dissolving melamine in butanol and adding formaldehyde dropwise thereto to perform an addition reaction and butyl etherification reaction, or by dissolving melamine and formaldehyde in butanol and heating the solution. It can be produced by a method of carrying out an addition reaction and a butyl etherification reaction. In these methods the reaction is nitric acid.
塩酸、硫酸、燐酸、p−)ルエンスルホン酸等の酸性触
媒を添加し、酸性下、好ましくはpH3〜6で行なうの
が好ましく9反応源度はブタノールの還流温度、好まし
くは約90〜100℃であるのが好ましい。本発明にお
いては、メラミン1モルに対してブタノール4〜5モル
及びホルムアルデヒド3〜7モルを使用して、前記の反
応を実施するのが好ましい。It is preferable to add an acidic catalyst such as hydrochloric acid, sulfuric acid, phosphoric acid, or p-)luenesulfonic acid, and carry out the reaction under acidic conditions, preferably at pH 3 to 6.9 The reaction temperature is the reflux temperature of butanol, preferably about 90 to 100°C. It is preferable that In the present invention, it is preferred to carry out the reaction using 4 to 5 moles of butanol and 3 to 7 moles of formaldehyde per mole of melamine.
本発明における保護層は、前記水酸基含有フッ素重合体
及び前記ブチルエーテル化メラミン・ホルムアルデヒド
樹脂の硬化皮膜からなるが、前記水酸基含有フッ素重合
体と前記ブチルエーテル化メラミン・ホルムアルデヒド
樹脂は、前者/後者が重量比で1/7〜1/15になる
ように配合し。The protective layer in the present invention is composed of a cured film of the hydroxyl group-containing fluoropolymer and the butyl etherified melamine/formaldehyde resin. Mix it so that it becomes 1/7 to 1/15.
加熱硬化させて得るのが好ましい。この場合、加熱温度
は、90〜140°Cが好ましい。また、f化に際し、
触媒として、塩酸、 p−1−ルエンスルホン酸等を存
在させてもよい。この触媒は、上記重合体及び樹脂の総
量に対して1重量幅以下で使用するのが好ましい。It is preferably obtained by heating and curing. In this case, the heating temperature is preferably 90 to 140°C. Also, when converting to f,
Hydrochloric acid, p-1-luenesulfonic acid, etc. may be present as a catalyst. This catalyst is preferably used in an amount of 1 weight or less based on the total amount of the polymer and resin.
本発明の保護層には、シリコーン樹脂、ポリメタクリル
酸メチル樹脂、エポキシ樹脂、ポリカーボネート樹脂、
ポリエステル樹脂、ポリスチレン樹脂等を結合剤として
併用することができるが。The protective layer of the present invention includes silicone resin, polymethyl methacrylate resin, epoxy resin, polycarbonate resin,
Polyester resin, polystyrene resin, etc. can be used in combination as a binder.
これらは、結合剤総量に対して50重量%以下が好まし
い。これらの使用量が多くなるとフッ素含有共重合体を
使用することによる効果が低下する。These are preferably 50% by weight or less based on the total amount of the binder. As the amount of these used increases, the effect of using the fluorine-containing copolymer decreases.
保護層には、光導電層に用いられる前記の各種添加剤を
適宜選択して含有させることができ、その添加量も適宜
決定することができる。The protective layer can contain the various additives used in the photoconductive layer by appropriately selecting them, and the amount of the additives can also be determined as appropriate.
本発明において導電層とは、導電処理した紙又はプラス
チックフィルム、アルミニウムのような金属箔を積層し
たプラスチックフィルム、金属板等の導電体である。In the present invention, the conductive layer is a conductive material such as paper or plastic film subjected to conductivity treatment, a plastic film laminated with metal foil such as aluminum, or a metal plate.
本発明の電子写真感光体は、導電層の上に有機光導電層
を形成し、その上に保護層を形成したものである。光導
電層の厚さは5〜50μが好ましい。光導電層として電
荷発生層及び電荷輸送層の複合型を使用する場合、電荷
発生層は好ましくは0.001〜10 μm 、特に好
ましくは0.2〜5μmの厚さにする。O,OO1μm
未満では、′1!荷発生層を均一に形成するのが困難に
なり、10μmを越えると、電子写真特性が低下する傾
向にある。The electrophotographic photoreceptor of the present invention has an organic photoconductive layer formed on a conductive layer, and a protective layer formed thereon. The thickness of the photoconductive layer is preferably 5 to 50 microns. If a composite type of charge generation layer and charge transport layer is used as photoconductive layer, the thickness of the charge generation layer is preferably from 0.001 to 10 .mu.m, particularly preferably from 0.2 to 5 .mu.m. O,OO1μm
Less than '1! It becomes difficult to uniformly form the charge generation layer, and if the thickness exceeds 10 μm, the electrophotographic properties tend to deteriorate.
電荷輸送層の厚さは好ましくは5〜50μm、特に好ま
しくは8〜20μmである。5μm未満の厚さでは、初
期電位が低くなり、50μmを越えると、感度が低下す
る傾向がある。The thickness of the charge transport layer is preferably 5 to 50 μm, particularly preferably 8 to 20 μm. When the thickness is less than 5 μm, the initial potential tends to be low, and when it exceeds 50 μm, the sensitivity tends to decrease.
保護層の厚さは好ましくは0.01〜10μm。The thickness of the protective layer is preferably 0.01 to 10 μm.
特に好ましくは0.1〜5μmである。0,01μm朱
満ては、保護層としての効果が少なく、耐久性が劣り、
5μmを越えると、感度が劣り、残留電位が増大する傾
向にある。Particularly preferably, it is 0.1 to 5 μm. 0.01 μm vermilion is less effective as a protective layer and has poor durability.
If it exceeds 5 μm, the sensitivity tends to be poor and the residual potential tends to increase.
導電層上に、光導電層を形成するには、有機光導電性化
合物を導電層に蒸着する方法、有機光導電性化合物及び
その他の成分をアセトン、メチルエチルケトン等のケト
ン系溶剤、テトラヒドロフラン等のエーテル系溶剤、ト
ルエン、キシレン等の芳香族系溶剤、塩化メチレン、四
塩化炭素等のハロゲン化炭化水素系溶剤、メタノール、
エタノール、グロパノール等のアルコール系溶剤に均一
に溶解又は分散させて導電層上に塗布シ2.乾燥する方
法などがある。電荷発生層及び電荷輸送層を形成する場
合も同様に行なうことができるが、この場合、電荷発生
層と電荷輸送層は、どちらを上層としてもよく、電荷発
生層を二層の電荷輸送層ではさむようにしてもよい。In order to form a photoconductive layer on the conductive layer, the organic photoconductive compound and other components are vapor-deposited on the conductive layer, and the organic photoconductive compound and other components are mixed with acetone, a ketone solvent such as methyl ethyl ketone, or an ether such as tetrahydrofuran. solvents, aromatic solvents such as toluene and xylene, halogenated hydrocarbon solvents such as methylene chloride and carbon tetrachloride, methanol,
2. Uniformly dissolve or disperse in an alcoholic solvent such as ethanol or glopanol and apply on the conductive layer. There are several methods of drying. The same method can be used to form a charge generation layer and a charge transport layer, but in this case, either the charge generation layer or the charge transport layer may be the upper layer, and the charge generation layer may be a two-layer charge transport layer. You can also make it colder.
保護層の形成は、光導電層の形成における塗布・乾燥す
る方法と同様にすればよい。The protective layer may be formed in the same manner as the coating and drying method used in forming the photoconductive layer.
本発明に係る電子写真感光体は、更に、導電層のすぐ上
に薄い接着層又はバリア層を有していてもよい。The electrophotographic photoreceptor according to the present invention may further have a thin adhesive layer or barrier layer immediately above the conductive layer.
(実施例) 以下の例中に用いる各材料を次に列記する。(Example) Each material used in the examples below is listed below.
()内は略称及び〔〕は商品名会社を示す。The abbreviation in parentheses and the product name and company in parentheses.
(1)電荷を発生する有機顔料
フタロシアニン系二τ型無金属フタロシアニン(H2P
C)
(2)電荷輸送性物質
オキサゾール誘導体:2−(p−ジメチルアミノフェニ
ル)−4−(p
−ジメチルアミノフェニ
ル) −5−(o−クロル
フェニル)−1,3−オキ
サゾール(OXZ’)
(3)結合剤
0ポリエステル樹脂:ハイロン200
(V−200)
〔東洋紡績■〕
Oシリコーンフェス: KR−255
(KR255)
〔信越化学工業■〕
Oフッ素含有共重合体:ルミフロンLP−100(LF
loo)
〔旭硝子■〕
これは0重量平均分子量20,000〜25,000゜
水酸基価52.酸価Oでクロロ) IJフルオロエチレ
ン、ヒドロキシアルキルビニルエーテル及びアルキルビ
ニルエーテルの共重合体であり、クロロトリフルオロエ
チレンを約50モルチ含み、キシ→
ロンとメチルイソブチルケトンの混合溶剤に固拒分50
重量係で溶解されている。(1) Organic pigment phthalocyanine type diτ metal-free phthalocyanine (H2P) that generates electric charge.
C) (2) Charge transport substance oxazole derivative: 2-(p-dimethylaminophenyl)-4-(p-dimethylaminophenyl)-5-(o-chlorophenyl)-1,3-oxazole (OXZ') (3) Binder-free polyester resin: Hylon 200 (V-200) [Toyobo ■] O silicone face: KR-255 (KR255) [Shin-Etsu Chemical ■] O fluorine-containing copolymer: Lumiflon LP-100 (LF
loo) [Asahi Glass■] This has a zero weight average molecular weight of 20,000 to 25,000° and a hydroxyl value of 52. IJ is a copolymer of fluoroethylene, hydroxyalkyl vinyl ether, and alkyl vinyl ether (chlorotrifluoroethylene with an acid value of O), and contains about 50 mole of chlorotrifluoroethylene, and has a solid content of 50 mole in a mixed solvent of xyl and methyl isobutyl ketone.
It is melted at the weight station.
oルミフ0:/LF−400
(LF400)
〔旭硝子■〕
これは、LFlooと同様であるが1重量平均分子量が
so、ooo〜70,000.水酸基価47及び酸価5
である。o Lumif 0:/LF-400 (LF400) [Asahi Glass ■] This is similar to LFloo, but the weight average molecular weight is so, ooo ~ 70,000. Hydroxyl value 47 and acid value 5
It is.
Oブチルエーテル化メラミン・ホルムアルデヒド樹脂:
(BMF)
(BMFの合成)
攪拌機、還流冷却器、温度計を装導したフラスコ中にメ
ラミン126g、n−ブタノール4449、及び61チ
硝酸水溶液0.29を入れ、100’CK昇温した後、
パラホルムアルデヒド169gを30分間に6回に分け
て等間隔で添加し、その後還流温度で30分間反応させ
、水分を除去し。O-butyl etherified melamine/formaldehyde resin:
(BMF) (Synthesis of BMF) 126 g of melamine, 4449 n-butanol, and 0.29 nitric acid aqueous solution were placed in a flask equipped with a stirrer, a reflux condenser, and a thermometer, and the temperature was raised to 100'CK.
169 g of paraformaldehyde was added in 6 portions over 30 minutes at equal intervals, and then reacted at reflux temperature for 30 minutes to remove water.
加熱残分が50チてなるように脱溶剤を行なった。The solvent was removed so that only 50% of the residue remained after heating.
得、られた樹脂の粘度は、ガードナー(25℃)でBで
あった。B M Fのメラミン樹脂1佃当たりの結合ホ
ルムアルデヒド数、ブチルエーテル基数及びメチロール
基数並びだ数平均分子量を下記の表1に示す。The resulting resin had a viscosity of B according to Gardner (25°C). The number of formaldehyde bound, the number of butyl ether groups, the number of methylol groups, and the number average molecular weight per stick of melamine resin of BMF are shown in Table 1 below.
但し、結合ホルムアルデヒド数は、仕込み量と亜硫酸ソ
ーダ法による未反応ホルムアルデヒド量の測定により求
め、ブチルエーテル基数はブタノールの仕込み量と内部
標準液として5ec−ブチルアルコールを使用したガス
クロマトグラフィーによる未反応ブタノールの測定によ
シ求め、メチロール基は、上記ブチルエーテル基数とN
M Rスペクトルから求めた。また、数平均分子量は
、ゲルパーミェーションクロマトグラフィーによシ標準
ポリスチレンの検量線を利用して行なった。However, the number of bound formaldehyde is determined by measuring the amount of unreacted formaldehyde using the charged amount and the sodium sulfite method, and the number of butyl ether groups is determined by measuring the amount of butanol charged and the amount of unreacted butanol by gas chromatography using 5ec-butyl alcohol as an internal standard solution. The methylol group was determined by measurement, and the number of butyl ether groups and N
It was determined from the MR spectrum. Further, the number average molecular weight was determined by gel permeation chromatography using a standard polystyrene calibration curve.
表1
比較例
HzPc 2−Og、 KR2552,、Og及びメタ
ノール809の混合液をボールミル(日本化学陶業製3
寸ボットミル)を用いて8時間混練した。Table 1 Comparative Example A mixed solution of HzPc 2-Og, KR2552, Og and methanol 809 was milled in a ball mill (Nihon Kagaku Togyo 3).
The mixture was kneaded for 8 hours using a small-sized bot mill.
この分散液をアルミニウム板(導電層)の上にアプリケ
ータで塗工し、100℃で1時間乾燥して厚さ約1μm
の電荷発生層を形成した。次に。This dispersion was applied onto an aluminum plate (conductive layer) using an applicator and dried at 100°C for 1 hour to a thickness of approximately 1 μm.
A charge generation layer was formed. next.
oxzxog及びバイロン200 1ogをテトラヒド
ロフランsog*完全に溶解させた。oxzxog and 1 og of Byron 200 were completely dissolved in tetrahydrofuran sog*.
この溶液をアプリケータにより前記の電荷発生層の上に
塗工し、90°Cで20分乾燥して厚さ15μmの電荷
輸送層を形成し、保護層のない電子写真感光体を作成し
た。This solution was applied onto the charge generation layer using an applicator and dried at 90° C. for 20 minutes to form a charge transport layer with a thickness of 15 μm, thereby producing an electrophotographic photoreceptor without a protective layer.
実施例1〜4
前記の比較例と同様に、導電層上に電荷発生層及び電荷
輸送層を形成した。次にLF−100とBMFの混合割
合が、前者/後者の固形分重量比で1/7又は1/15
.LP−400とB M Fの混合割合が前者/後者の
固形分重量比で1/7又は1/15で固形分が5〜20
重量%になるように、t−ブタノールで希釈し、得られ
た溶液をアプリケータによりにI記の電荷輸送層上テ孕
工し。Examples 1 to 4 A charge generation layer and a charge transport layer were formed on a conductive layer in the same manner as in the above comparative example. Next, the mixing ratio of LF-100 and BMF is 1/7 or 1/15 in solid weight ratio of the former/latter.
.. The mixing ratio of LP-400 and BMF is 1/7 or 1/15 in the former/latter solid content weight ratio, and the solid content is 5 to 20.
The resulting solution was diluted with t-butanol so as to give a weight percent concentration, and the resulting solution was applied onto the charge transport layer described in Section I using an applicator.
120°Cで1時間加熱して硬化させ1表2に示す厚さ
の保護層を有する電子写真感光体を得た。得られた電子
写真感光体の電子写真特性を静電記録試験装置(川口電
機製5P−428)を用いて測定した。結果を表2に示
す。The mixture was cured by heating at 120° C. for 1 hour to obtain an electrophotographic photoreceptor having a protective layer having a thickness shown in Table 1. The electrophotographic properties of the obtained electrophotographic photoreceptor were measured using an electrostatic recording tester (5P-428 manufactured by Kawaguchi Electric). The results are shown in Table 2.
なお9表中の初期電位’¥o(V’)は、ダイナミック
測定で一5KVのコロナを10秒間放電したときの帯電
電位を示し、暗減衰(Vk)は、その後暗所において3
0秒間放置したときの電位(V2O)から電位が半分に
なるまでの光量値を示す。まだ。In addition, the initial potential '\o (V') in Table 9 indicates the charging potential when a -5KV corona is discharged for 10 seconds in dynamic measurement, and the dark decay (Vk) indicates the charge potential after 30 seconds in the dark.
It shows the light amount value from the potential (V2O) when left for 0 seconds until the potential becomes half. still.
800 nmの分光感度(S800)は、ハロゲンラン
プを光源とし、モノクロメータ−をAして800 nm
の単色光に分光した光を照射し、照射後の電位が半分に
なるまでに要した時間t(s)を求め、こnに照射光の
エネルギー(mW/m’) を乗じ、逆数をとって求め
たものである。The spectral sensitivity at 800 nm (S800) is 800 nm using a halogen lamp as the light source and a monochromator at A.
Irradiate the monochromatic light with the spectral light, find the time t (s) required for the potential after irradiation to be halved, multiply this by the energy of the irradiated light (mW/m'), and take the reciprocal. This is what I asked for.
更に摩擦試験機(スガ試験機製)を用いて電子写真感光
体の表面をガーゼで摺動し、ガーゼの繊維跡が感光体表
面に目視で確認できた回数を耐摩耗性として表1に示す
。Furthermore, using a friction tester (manufactured by Suga Test Instruments), the surface of the electrophotographic photoreceptor was rubbed with gauze, and the number of times fiber traces of the gauze were visually confirmed on the surface of the photoreceptor is shown in Table 1 as the abrasion resistance.
(発明の効果)
本発明に係る電子写真感光体は優れた電子写真特性を示
し、暗減衰も良好で高感度である。特に。(Effects of the Invention) The electrophotographic photoreceptor according to the present invention exhibits excellent electrophotographic properties, good dark decay, and high sensitivity. especially.
場合により800 nmの分光感度が高いことから。In some cases, it has high spectral sensitivity at 800 nm.
近赤外領域に発振波長を持つダイオードレーザ−を搭載
したLBPKも適用可能である。また1本発明の電子写
真感光体の耐摩耗性は著しく高い。An LBPK equipped with a diode laser having an oscillation wavelength in the near-infrared region is also applicable. Furthermore, the abrasion resistance of the electrophotographic photoreceptor of the present invention is extremely high.
このように9本発明になる電子写真感光体は、電子写真
特性及び耐久性の高い電子写真感光体である。As described above, the electrophotographic photoreceptor according to the present invention has high electrophotographic properties and durability.
・11.::j、’ 手続補正書(方式) 昭和 62年7 月14 日 昭和61年特許願第41022号 λ発明の名称 電子写真感光体 3、補正をする者 4、代 理 人 昭和62年6月30日(発送臼) 6、補正の対象 ゛ 明細書の発明の詳細な説明の欄 7、補正の内容・11. ::j,’ Procedural amendment (formality) July 14, 1982 1986 Patent Application No. 41022 λInvention name electrophotographic photoreceptor 3. Person who makes corrections 4. Deputy manager June 30, 1986 (Shipping mortar) 6. Subject of correction ゛ Detailed description of the invention in the specification 7. Contents of correction
Claims (1)
保護層が、 (a)水酸基含有フッ素重合体 及び (b)数平均分子量が1,500以下で、メラミン核1
個当りに結合ホルムアルデヒド数が2〜4個及びメチロ
ール基数が1〜2個であるブチルエーテル化メラミン・
ホルムアルデヒド樹脂 の硬化皮膜を含有してなる電子写真感光体。[Scope of Claims] 1. An electrophotographic photoreceptor having a protective layer on the surface, the protective layer comprising (a) a hydroxyl group-containing fluoropolymer and (b) a number average molecular weight of 1,500 or less, with melamine nuclei 1
Butyl etherified melamine with 2 to 4 formaldehyde bonds and 1 to 2 methylol groups per unit.
An electrophotographic photoreceptor containing a cured film of formaldehyde resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4102286A JPS632071A (en) | 1986-02-26 | 1986-02-26 | Electrophotographic sensitive body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4102286A JPS632071A (en) | 1986-02-26 | 1986-02-26 | Electrophotographic sensitive body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS632071A true JPS632071A (en) | 1988-01-07 |
Family
ID=12596769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4102286A Pending JPS632071A (en) | 1986-02-26 | 1986-02-26 | Electrophotographic sensitive body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS632071A (en) |
-
1986
- 1986-02-26 JP JP4102286A patent/JPS632071A/en active Pending
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