JPS63205609A - Heat ray reflection film - Google Patents
Heat ray reflection filmInfo
- Publication number
- JPS63205609A JPS63205609A JP3884187A JP3884187A JPS63205609A JP S63205609 A JPS63205609 A JP S63205609A JP 3884187 A JP3884187 A JP 3884187A JP 3884187 A JP3884187 A JP 3884187A JP S63205609 A JPS63205609 A JP S63205609A
- Authority
- JP
- Japan
- Prior art keywords
- film
- layer
- heat ray
- alnx
- thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 238000002834 transmittance Methods 0.000 abstract description 14
- 239000011521 glass Substances 0.000 abstract description 3
- 229920003023 plastic Polymers 0.000 abstract description 2
- 239000004033 plastic Substances 0.000 abstract description 2
- 239000002985 plastic film Substances 0.000 abstract description 2
- 229920006255 plastic film Polymers 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 81
- 238000000034 method Methods 0.000 description 17
- -1 Polyethylene terephthalate Polymers 0.000 description 12
- 239000008188 pellet Substances 0.000 description 12
- 229920000139 polyethylene terephthalate Polymers 0.000 description 12
- 239000005020 polyethylene terephthalate Substances 0.000 description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 238000004378 air conditioning Methods 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 208000028659 discharge Diseases 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009684 ion beam mixing Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、太陽光線中に含まれる熱線を効率よく反射し
、かつ可視光線の透過率が良好で、しかも耐久性に優れ
た熱線反射膜に関するものであり。Detailed Description of the Invention (Field of Industrial Application) The present invention provides a heat ray reflective film that efficiently reflects heat rays contained in sunlight, has good visible light transmittance, and has excellent durability. It is related to.
さらに１面発熱体としても応用可能である。Furthermore, it can be applied as a one-sided heating element.
（従来の技術）
熱線反射膜は、建物、自動車窓等の熱線の透過による内
部温度の上昇を防止し、空調の効率を上げる目的で、ガ
ラスまたはフィルム上に形成され。(Prior Art) A heat ray reflective film is formed on glass or film for the purpose of preventing an increase in internal temperature due to the transmission of heat rays through buildings, automobile windows, etc., and increasing the efficiency of air conditioning.
使用されている。It is used.
従来の熱線反射膜は、第１層および第３層としてＴｉＯ
２，ＩＴＯ，ＺｎＳ膜等の酸化物、硫化物が提案されて
いる（特開昭５１−６６８４１号）。Conventional heat ray reflective films use TiO as the first and third layers.
2. Oxides and sulfides such as ITO and ZnS films have been proposed (Japanese Patent Laid-Open No. 66841/1984).
しかしながら、第１層および第３層がＴ ｉ Ｏｚまた
はＩＴＯ膜等の酸化物では、光、酸素等の励起により第
２層のＡｇ原子が酸化、もしくは第１層および第３層の
Ｔｉ０ｚ膜またはＩＴＯ膜ヘマイグレーションが起こり
、可視光線の透過率が低下する。However, when the first and third layers are oxides such as TiOz or ITO films, the Ag atoms in the second layer are oxidized by excitation of light, oxygen, etc., or the TiOz films or ITO films of the first and third layers are ITO film hemigration occurs and visible light transmittance decreases.
また、このような問題は、ＺｎＳ膜においては熱線の反
射効果が失われる等、実用上問題となっている。Moreover, such a problem poses a practical problem in that the ZnS film loses its heat ray reflection effect.
したがって２本発明の目的は、太陽光線中に含まれる熱
線を効率よく反射し、かつ可視光線の透過率が良好で、
しかも耐久性に優れた熱線反射膜を提供することにある
。Therefore, two objects of the present invention are to efficiently reflect heat rays contained in sunlight, and have good visible light transmittance;
Moreover, it is an object of the present invention to provide a heat ray reflective film with excellent durability.
（問題点を解決するための手段）
本発明者らは、上記のごとき問題を解決し、太陽光線中
に含まれる熱線を効率よく反射し、かつ可視光線の透過
率が良好で、しかも耐久性に優れた熱線反射膜について
鋭意研究の結果、第１層および第３ＮとしてＡｊｉ！Ｎ
ｘの窒化膜を設けることにより本発明の目的が達成しう
ろことを見出し。(Means for Solving the Problems) The present inventors have solved the above-mentioned problems, and have achieved a structure that efficiently reflects heat rays contained in sunlight, has good visible light transmittance, and is durable. As a result of intensive research on heat ray reflective films with excellent properties, Aji! N
It was discovered that the object of the present invention could be achieved by providing a nitride film of x.
本発明に到達した。We have arrived at the present invention.
すなわち１本発明は、透明基体上に、該透明基体面から
数えて第１層としてＡ／！Ｎｘ膜を、第２層としてＡｇ
膜を、第３層としてＡｊ！Ｎｘ膜を有する多層膜であり
、ＡｌＮｘ膜のＸが０．４以上。That is, one aspect of the present invention is to form A/! on a transparent substrate as the first layer counted from the surface of the transparent substrate. Nx film as the second layer
Aj! film as the third layer! It is a multilayer film having an Nx film, and the X of the AlNx film is 0.4 or more.
１以下、第１層および第３層のＡｆｆＮｘ膜の厚さが１
００Å〜５０００人であり、第２層のＡｇ膜の厚さが３
０Å〜３００人であることを特徴とする熱線反射膜を要
旨とするものである。1 or less, the thickness of the first and third layer AffNx films is 1
00 Å to 5000 Å, and the thickness of the second layer Ag film is 3
The gist of the present invention is a heat ray reflective film characterized by a thickness of 0 Å to 300 Å.
本発明の透明基体としては、ガラス板、プラスチック板
、プラスチックフィルム等の透明基体があげられる。Examples of the transparent substrate of the present invention include transparent substrates such as glass plates, plastic plates, and plastic films.
本発明の熱線反射膜は、このような透明基体に第１Ｎお
よび第３層として厚さ１００Å〜５０００人のＡｌＮｘ
膜、第２層として厚さ３０Å〜３００人のＡｇ膜を順次
成膜してなる多層膜を設けることにより得られる。The heat ray reflective film of the present invention has a thickness of 100 Å to 5,000 AlNx as the first and third layers on such a transparent substrate
This can be obtained by providing a multilayer film formed by sequentially forming Ag films of 30 Å to 300 thicknesses as the second layer.
第１層および第３層のＡｊ２Ｎｘ膜は、イオンブレーテ
ィング法、スパッタリング法等の真空薄膜形成法により
形成することができるが、薄膜の付着強度、成膜速度等
の点から、高周波による。またはホローカソードガンを
用いたイオンブレーティング法や、プラズマ発生装置を
用いたイオンビームミキシング法、シートプラズマ法等
が望ましい。Ａｊ２Ｎｘ膜の膜厚は、１００Å〜５００
０人。The Aj2Nx films of the first layer and the third layer can be formed by a vacuum thin film forming method such as an ion blasting method or a sputtering method, but from the viewpoint of thin film adhesion strength, film forming speed, etc., high frequency is used. Alternatively, an ion brating method using a hollow cathode gun, an ion beam mixing method using a plasma generator, a sheet plasma method, etc. are preferable. The thickness of the Aj2Nx film is 100 Å to 500 Å.
0 people.
好ましくは２００Å〜１０００人である。膜厚が１００
人未満では透過率が十分でなく、５０００人を超える場
合は経済性の面で実用的でない。また、Ｘは真空薄膜形
成法および薄膜形成条件により変化するものであるが、
Ｘ＜０．４では十分な可視光の透過性が得られず、好ま
しくない。Preferably it is 200 Å to 1000 people. Film thickness is 100
If the number of people is less than 5,000, the transmittance is insufficient, and if the number of people is more than 5,000, it is not practical from an economic standpoint. In addition, although X varies depending on the vacuum thin film forming method and thin film forming conditions,
When X<0.4, sufficient visible light transmittance cannot be obtained, which is not preferable.
第２層のＡｇ膜は、真空蒸着法、イオンブレーティング
法、スパッタリング法等のような通常の真空薄膜形成法
により形成することができるが。The second layer Ag film can be formed by a normal vacuum thin film forming method such as a vacuum evaporation method, an ion blating method, a sputtering method, or the like.
薄膜の付着強度等の点から、アルゴンプラズマ中でＡｇ
を蒸発させてＡｇ膜を堆積させるイオンブレーティング
法が望ましい。Ａｇ膜の膜厚は３０Å〜３００人である
。膜厚が３０人未満では熱線の反射効果が十分でなく、
３００人を超える場合は十分な可視光の透過性が得られ
ない。From the point of view of thin film adhesion strength, etc., Ag in argon plasma is
It is desirable to use an ion blating method in which the Ag film is deposited by evaporating the Ag film. The thickness of the Ag film is 30 Å to 300 Å. If the film thickness is less than 30, the heat ray reflection effect will not be sufficient,
If there are more than 300 people, sufficient visible light transparency cannot be obtained.
また、付着力向上のために、アンカー処理剤の塗布、フ
ィルム表面の放電処理または化学処理等も同時に行うこ
とが可能である。また、必要に応じて、この膜上に保護
コーティングを施すこともできる。Furthermore, in order to improve adhesion, it is possible to simultaneously apply an anchor treatment agent and perform discharge treatment or chemical treatment on the film surface. A protective coating can also be applied on this membrane, if desired.
（実施例）
次に、実施例をあげて本発明をさらに具体的に説明する
。(Example) Next, the present invention will be described in more detail with reference to Examples.
実施例１
ポリエチレンテレフタレートフィルムとＡｌおよびＡｇ
ペレットを各所定の位置にセットした真空装置内を、
Ｉ Ｘ １０−’Ｔｏｒｒまで排気した後、窒素ガス
をＩ Ｘ １０−’Ｔｏｒｒ導入し、高周波プラズマ（
１３，５６ＭＨｚ、 ３００ Ｗ）を発生させ、電子
銃によりＡｆペレットを加熱蒸発させてＡＩを窒素プラ
ズマ下で反応させ、３人／Ｓの成膜速度で第１層のＡ／
Ｎｘ膜を膜厚３００人で作成した。Example 1 Polyethylene terephthalate film and Al and Ag
Inside the vacuum device with pellets set in each predetermined position,
After exhausting to I x 10-' Torr, nitrogen gas was introduced to I x 10-' Torr, and high-frequency plasma (
13.56 MHz, 300 W), the Af pellets were heated and evaporated using an electron gun, and the AI was reacted under nitrogen plasma.
An Nx film was created with a thickness of 300.
室温まで冷却の後、Ａｒガスを２ Ｘ １０−’Ｔｏｒ
ｒ導入し、高周波プラズマ（１３，５６Ｍｌｌｚ、
５０ Ｗ）を発生させ、電子銃によりＡｇペレットを加
熱仄発させて、５人／Ｓの成膜速度で第２層のＡｇ膜を
膜厚１５０人で形成した。After cooling to room temperature, Ar gas was heated to 2 × 10-'Tor.
high frequency plasma (13,56 Mllz,
50 W) and heated and ignited the Ag pellets with an electron gun to form a second layer of Ag film with a film thickness of 150 mm at a film formation rate of 5 mm/S.
次に、第１ＮのＡ６Ｎｘ膜形成方法と同様な方法で第３
ＮのＡｊ２Ｎｘ膜を膜厚３００人で形成し。Next, a third film is formed using the same method as the first N film forming method.
An Aj2Nx film of N was formed with a thickness of 300 nm.
熱線反射膜をポリエチレンテレフタレートフィルム上に
形成した。ＡｌＮｘ１ｌｌのＸは、Ｘ線光電子分光装置
の測定により０．５であった。A heat ray reflective film was formed on a polyethylene terephthalate film. X of 111 AlN was 0.5 as measured by an X-ray photoelectron spectrometer.
このようにして得られた本発明の熱線反射膜を形成した
ポリエチレンテレフタレートフィルムを。The thus obtained polyethylene terephthalate film on which the heat ray reflective film of the present invention was formed.
分光光度計（Ｕ−３４００，日立製）により、可視光の
透過率（５５０ｎｍ）および熱線の反射率（１５００ｎ
ｍ）を測定した。また、耐久性を評価するために、ＪＩ
Ｓ−Ｌ−０８２４規格の耐光試験機を用いて１０００時
間露光後の可視光の透過率（５５０ｎｍ）および熱線の
反射率（１５００ｎｍ）を分光光度計（Ｕ−３４００，
日立製）により測定した。Visible light transmittance (550 nm) and heat ray reflectance (1500 nm) were measured using a spectrophotometer (U-3400, manufactured by Hitachi).
m) was measured. In addition, in order to evaluate durability, JI
After 1000 hours of exposure, visible light transmittance (550 nm) and heat ray reflectance (1500 nm) were measured using a spectrophotometer (U-3400,
(manufactured by Hitachi).
得られた結果を第１表に示す。The results obtained are shown in Table 1.
比較例１
ポリエチレンテレフタレートフィルムとＡｌおよびＡｇ
ベレットを各所定の位置にセットした真空装置内を、
Ｉ Ｘ １０−’Ｔｏｒｒまで排気した後、窒素ガス
をＩ Ｘ １０−’Ｔｏｒｒ導入し、高周波プラズマ（
１３，５６ＭＨｚ、５０Ｗ）を発生させ、電子銃により
Ａｌベレットを加熱蒸発させて／ｌを窒素プラズマ下で
反応させ、１０人／Ｓの成膜速度で第１層のＡｌＮｘ膜
を膜厚３００人で作成した。Comparative Example 1 Polyethylene terephthalate film and Al and Ag
Inside the vacuum device with the pellets set at each predetermined position,
After exhausting to I x 10-' Torr, nitrogen gas was introduced to I x 10-' Torr, and high-frequency plasma (
13.56 MHz, 50 W), heated and evaporated the Al pellet with an electron gun, and reacted /l under nitrogen plasma to form the first layer of AlNx film at a film-forming rate of 10 people/S to a thickness of 300 people. Created with.
室温まで冷却の後、Ａｒガスを２ Ｘ １０−’Ｔｏｒ
ｒ導入し、高周波プラズマ（１３，５６ＭＨｚ、 ３
００ Ｗ）を発生させ、電子銃によりＡｇベレットを加
熱蒸発させて、５人／Ｓの成膜速度で第２層のＡｇ膜を
膜厚１５０人で形成した。After cooling to room temperature, Ar gas was heated to 2 × 10-'Tor.
high frequency plasma (13,56MHz, 3
00 W) and heated and evaporated the Ag pellet with an electron gun to form a second layer of Ag film with a thickness of 150 mm at a film formation rate of 5 mm/S.
第１ＮのＡ＃Ｎｘ膜形成方法と同様な方法で第３ＮのＡ
ｊ２Ｎｘ膜を膜厚３００人で形成し、熱線反射膜をポリ
エチレンテレフタレートフィルム上に形成した。Ａｊ２
Ｎｘ膜のＸは、Ｘ線光電子分光装置の測定により０．３
であった。A of the 3N is formed using the same method as the 1N A#Nx film formation method.
A j2Nx film was formed to a thickness of 300 mm, and a heat ray reflective film was formed on a polyethylene terephthalate film. Aj2
The X of the Nx film is 0.3 as measured by an X-ray photoelectron spectrometer.
Met.
このようにして得られた本発明の熱線反射膜を形成した
ポリエチレンテレフタレートフィルムを。The thus obtained polyethylene terephthalate film on which the heat ray reflective film of the present invention was formed.
実施例１と同様な方法で可視光の透過率、熱線の反射率
を評価した。Visible light transmittance and heat ray reflectance were evaluated in the same manner as in Example 1.
比較例２
ポリエチレンテレフタレートフィルムとＴｉおよびＡｇ
ペレットを各所定の位置にセットした真空装置内を、
Ｉ Ｘ １０−’Ｔｏｒｒまで排気した後、酸素ガス
を４ Ｘ １０−’Ｔｏｒｒｉ人し、高周波プラズマ（
１３，５６ＭＨｚ、５０Ｗ）を発生させ、電子銃により
Ｔｉベレットを加熱蒸発させてＴｉを酸素プラズマ下で
反応させ、３人／Ｓの成膜速度で第１層のＴｉ０ｚ膜を
膜厚３００人で作成した。Comparative Example 2 Polyethylene terephthalate film and Ti and Ag
Inside the vacuum device with pellets set in each predetermined position,
After evacuating to I X 10-' Torr, oxygen gas was pumped up to 4 X 10-' Torr, and high-frequency plasma (
13.56MHz, 50W), heated and evaporated the Ti pellet with an electron gun, reacted Ti under oxygen plasma, and formed the first Ti0z film with a film thickness of 300 people at a deposition rate of 3 people/S. Created.
室温まで冷却の後、Ａｒガスを２ Ｘ １０−’Ｔｏｒ
ｒ導入し、高周波プラズマ（１３，５６ＭＨｚ、 ５
０ Ｗ）を発生させ、電子銃によりＡｇベレットを加熱
１発させて、５人／Ｓの成膜速度で第２層のＡｇ膜を膜
厚１５０人で形成した。After cooling to room temperature, Ar gas was heated to 2 × 10-'Tor.
high frequency plasma (13,56MHz, 5
0 W) and heated the Ag pellet once with an electron gun to form a second layer of Ag film with a thickness of 150 mm at a film formation rate of 5 mm/S.
次に、第１層のＴｉ０ｚ膜形成方法と同様な方法で第３
１のＴ ｉ Ｏｚ膜を膜厚３００人で形成し、熱線反射
膜をポリエチレンテレフタレートフィルム上に形成した
。Next, a third Ti0z film was formed using the same method as the first layer TiOz film formation method.
A TiOz film of No. 1 was formed to a thickness of 300 mm, and a heat ray reflective film was formed on a polyethylene terephthalate film.
このようにして得られた本発明の熱線反射膜を形成した
ポリエチレンテレフタレートフィルムを。The thus obtained polyethylene terephthalate film on which the heat ray reflective film of the present invention was formed.
実施例１と同様な方法で可視光の透過率、熱線の反射率
および耐久性を評価した。Visible light transmittance, heat ray reflectance, and durability were evaluated in the same manner as in Example 1.
比較例３
ポリエチレンテレフタレートフィルムとＺｎＳおよびＡ
ｇペレットを各所定の位置にセットした真空装置内を、
Ｉ Ｘ １０−ｓＴｏｒｒまで排気した後。Comparative Example 3 Polyethylene terephthalate film and ZnS and A
Inside the vacuum device with g pellets set at each predetermined position,
After pumping down to I x 10-sTorr.
ＡｒガスをＩ Ｘ １０−’Ｔｏｒｒ導入し、高周波プ
ラズマ（１３，５６ＭＨｚ、 ５０Ｗ）を発生させ、
電子銃によりＺｎＳベレットを加熱蒸発させてＺｎＳを
Ａｒプラズマ下で反応させ、３人／Ｓの成膜速度で第１
ＮのＺｎＳ膜を膜厚３００人で作成した。Introducing Ar gas at I x 10-' Torr and generating high-frequency plasma (13.56 MHz, 50 W).
The ZnS pellet was heated and evaporated using an electron gun, and the ZnS was reacted under Ar plasma, and the first film was formed at a deposition rate of 3 persons/s.
A ZnS film of N was created with a thickness of 300.
室温まで冷却の後、Ａｒガスを２ Ｘ １０−’Ｔｏｒ
ｒ導入し、高周波プラズマ（１３，５６ＭＨｚ、 ５
０ Ｗ）を発生させ、電子銃によりＡｇベレットを加熱
蒸発させて、５人／Ｓの成膜速度で第２層のＡｇ膜を膜
厚１５０人で形成した。After cooling to room temperature, Ar gas was heated to 2 × 10-'Tor.
high frequency plasma (13,56MHz, 5
0 W) was generated, and the Ag pellet was heated and evaporated with an electron gun to form a second layer of Ag film with a thickness of 150 mm at a film formation rate of 5 mm/S.
次に、第１ＨのＺｎＳ膜形成方法と同様な方法で第３層
のＺｎＳ膜を膜厚３００人で形成し、熱線反射膜をポリ
エチレンテレフタレートフィルム上に形成した。Next, a third layer of ZnS film was formed to a thickness of 300 mm using the same method as the ZnS film forming method of 1H, and a heat ray reflective film was formed on the polyethylene terephthalate film.
このようにして得られた本発明の熱線反射膜を形成した
ポリエチレンテレフタレートフィルムを。The thus obtained polyethylene terephthalate film on which the heat ray reflective film of the present invention was formed.
実施例１と同様な方法で可視光の透過率、熱線の反射率
および耐久性を評価した。Visible light transmittance, heat ray reflectance, and durability were evaluated in the same manner as in Example 1.
（発明の効果）
本発明の熱線反射膜は、太陽光線に含まれる熱線を効率
よく反射し、かつ可視光線の透過率が良好で、しかも耐
久性が優れたものである。したがって、建物、自動車窓
用等の材料として広く用いることができる。(Effects of the Invention) The heat ray reflective film of the present invention efficiently reflects heat rays contained in sunlight, has good visible light transmittance, and has excellent durability. Therefore, it can be widely used as a material for buildings, automobile windows, etc.
Claims (3)
してＡｌＮｘ膜を、第２層としてＡｇ膜を、第３層とし
てＡｌＮｘ膜を有する多層膜であることを特徴とする熱
線反射膜。(1) Heat ray reflection characterized by being a multilayer film having an AlNx film as a first layer, an Ag film as a second layer, and an AlNx film as a third layer counted from the surface of the transparent substrate on a transparent substrate. film.
を特徴とする特許請求の範囲第１項記載の熱線反射膜。(2) The heat ray reflective film according to claim 1, wherein X of the AlNx film is 0.4 or more and 1 or less.
Å〜５０００Åであり、第２層のＡｇ膜の厚さが３０Å
〜３００Åであることを特徴とする特許請求の範囲第１
項記載の熱線反射膜。(3) The thickness of the first and third layer AlNx films is 100
The thickness of the second layer Ag film is 30 Å.
Claim 1 characterized in that it is ~300 Å
The heat ray reflective film described in Section 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3884187A JPS63205609A (en) | 1987-02-20 | 1987-02-20 | Heat ray reflection film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3884187A JPS63205609A (en) | 1987-02-20 | 1987-02-20 | Heat ray reflection film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63205609A true JPS63205609A (en) | 1988-08-25 |
Family
ID=12536426
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3884187A Pending JPS63205609A (en) | 1987-02-20 | 1987-02-20 | Heat ray reflection film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63205609A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63141901U (en) * | 1987-03-09 | 1988-09-19 | ||
| JPH01310302A (en) * | 1988-06-09 | 1989-12-14 | Nitto Denko Corp | Spectral filter |
| JP2001523358A (en) * | 1998-03-03 | 2001-11-20 | サン−ゴバン ビトラージュ | Transparent substrate provided with laminate reflecting heat radiation |
| WO2014021325A1 (en) * | 2012-07-31 | 2014-02-06 | 株式会社京都薄膜応用技術研究所 | Transparent conductive film and method for producing same |
-
1987
- 1987-02-20 JP JP3884187A patent/JPS63205609A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63141901U (en) * | 1987-03-09 | 1988-09-19 | ||
| JPH01310302A (en) * | 1988-06-09 | 1989-12-14 | Nitto Denko Corp | Spectral filter |
| JP2001523358A (en) * | 1998-03-03 | 2001-11-20 | サン−ゴバン ビトラージュ | Transparent substrate provided with laminate reflecting heat radiation |
| WO2014021325A1 (en) * | 2012-07-31 | 2014-02-06 | 株式会社京都薄膜応用技術研究所 | Transparent conductive film and method for producing same |
| JP2014028986A (en) * | 2012-07-31 | 2014-02-13 | Soichi Ogawa | Transparent conductive film, and manufacturing method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4861669A (en) | Sputtered titanium oxynitride films | |
| US5563734A (en) | Durable low-emissivity solar control thin film coating | |
| US6333084B1 (en) | Double-sided reflector films | |
| US4900633A (en) | High performance multilayer coatings | |
| EP0456487A2 (en) | Interference filters | |
| JPH02160641A (en) | Heat ray reflecting glass | |
| EP1380553A1 (en) | Glazing panel | |
| JP2007533856A5 (en) | ||
| JPH01273001A (en) | Antireflection film of optical parts made of synthetic resin | |
| JPS63205609A (en) | Heat ray reflection film | |
| JPS63238260A (en) | Formation of heat ray reflecting film | |
| CN1117175C (en) | Process for coating on glass to simulate low-radiation film and able to be thermally treated | |
| JPH01279202A (en) | Reflecting body | |
| JP2811885B2 (en) | Heat shielding glass | |
| JPH01279201A (en) | Reflecting body | |
| JPH02102036A (en) | Article covered with optical film | |
| JPH01299028A (en) | Heat ray reflecting film | |
| JPH0764598B2 (en) | Infrared blocking glass | |
| JPS61124902A (en) | Formation of heat ray reflecting film | |
| JP3266625B2 (en) | Manufacturing method of ultraviolet shielding film | |
| Ohsaki et al. | Bendable and temperable solar control glass | |
| JPH04243935A (en) | Low electric wave-reflecting and thermal ray-reflecting glass and production thereof | |
| JP3438555B2 (en) | Highly transparent silicon oxide deposited film | |
| EP4350027A1 (en) | Composite film manufacturing method and organic/inorganic hybrid film manufacturing method | |
| JPH02113201A (en) | Article coated with optical multilayered film |