JPS63197950A - Developing process method for photosensitive planographic printing plate - Google Patents

Developing process method for photosensitive planographic printing plate

Info

Publication number
JPS63197950A
JPS63197950A JP3104387A JP3104387A JPS63197950A JP S63197950 A JPS63197950 A JP S63197950A JP 3104387 A JP3104387 A JP 3104387A JP 3104387 A JP3104387 A JP 3104387A JP S63197950 A JPS63197950 A JP S63197950A
Authority
JP
Japan
Prior art keywords
plate
developer
developing
roller
slit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3104387A
Other languages
Japanese (ja)
Inventor
Mieji Nakano
中野 巳恵治
Minoru Kiyono
清野 実
Masabumi Uehara
正文 上原
Akira Nogami
野上 彰
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP3104387A priority Critical patent/JPS63197950A/en
Publication of JPS63197950A publication Critical patent/JPS63197950A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means
    • G03F7/3042Imagewise removal using liquid means from printing plates transported horizontally through the processing stations

Abstract

PURPOSE:To permit a uniform and stable developing process with a smaller amt. of a developing soln. by supplying the unused developing soln. onto a photosensitive planographic printing plate (PS plate) from a slit, conveying the plate upward by using an inclining roller and passing the plate further through a developing tank by using a guide roller. CONSTITUTION:The substantially unused developing soln. is supplied from a slit constituted of two sheets of plate materials at the bottom end of a developing soln. supplying member 7 onto the PS plate 2 in the case of automatically conveying the PS plate 2 and subjecting the same to the developing process. The PS plate is conveyed upward by using the inclining roller 4 and is further passed through the developing tank 11 by using the guide roller 12. The slit formed of two sheets of the plate materials of the developing soln. supplying member 7 is preferably so constructed as to be adjusted to the slit spacing corresponding to the outflow rate of the developing soln. from the developing soln. supplying member 6. The uniformity in development is thereby improved and the developability particularly at the front end part and both side parts is improved in a method for develop the PS plate with a small amt. of the developing soln.

Description

【発明の詳細な説明】[Detailed description of the invention]

【産業上の利用分野1 本発明は感光性平版印刷版(以下、PS版という)の現
像処理方法およびそれに用いられる装置に関し、更に詳
しくは、PS版の1ffi毎に未使用の現像液を供給し
て現像する自動現像機に適するPS版の現像方法および
それに用いられる装置に関する。 【従来の技術1 露光済みのPS版を多数枚処理する場合には自動現像機
を用いることが一般的である。 自動現像機において露光済みのPS版を処理する場合に
は、PS版を水平搬送しながら現像液をスプレー状に吹
付けて現像処理する方法や、多量の現像液を収容した現
像処理槽にPS版を湾曲させて搬送しながら浸漬させて
現像処理する方法が行なわれでいる。こうした処理方法
においては、いづれもPS版を1版処理するのに多量の
現像液を準備する必要がある。また、現像液を経済的に
利用するために循環再使用しており、その間、処理によ
る現像液劣化に加えて空気中からの炭酸がスの吸収によ
る現像液劣化が起こり、しばしば劣化した現像液を交換
しなければならず、現像作業の管理が非常に面倒である
。 上記の欠点を改善する目的で、PS版を多量の循環再使
用する現像液で処理する場合、補充液を補充して現像処
理を安定に保つ方法が知られてお’) 、#[昭50−
144502号、同55−115039号、同58−9
5349号等に開示されている。こうした補充方法に必
要があり、また、補充の精度の問題とPS版間の品種差
による補充のふれは解決できなかった。 またその上に補充装置を必要とし、補充装置自体が高価
であるばかりか、補充装置の調整、整備等の必要もある
。 こうした補充方式の煩わしさを除き、現像液の節約を目
的とした処理装置が特開昭55−32044号に記載さ
れている。これは自動現像機内の感光材料移送路に接近
して現像液拡散板を備え、28版面上に施した現像液を
延伸するものであるが、この装置を用いてPS版を少量
の現像液で処理する方法には、搬送するPS版が必ずし
も水平とはいかずに多少上下に歪んでいるtこめ、現像
液量が不均一となり易く、現像むらを生じ易く、処理さ
れるPS版と現像液拡散板との間隙を調節するのに手間
がかかるという欠点があり、特に少量の現像液を28版
面に直接滴下した場合、滴下部と非滴下部に現像速度差
が生じ、現像拡散板を通過した後もこの差が残り、現像
むらとなり、印刷版として好ましくないものが得られる
ことがある。 我々はかかる欠点を改良し、少量の現像液を用いて現像
処理を安定に行い得るPS版の現像方法および装置を開
発し特願昭61−82900号として既に出願した。し
かしながら、少量の現像液を用いて現像処理する技術に
は、PS版の先端部および両サイド部に現像液の不足に
よると推測される現像不良が発生する問題があることを
我々は見出井した。 r発明が解決しようとする問題点】 前記のように少量の現像液でPS版を現像する方法にお
いては、28服の先端部および両サイド部に現像不良に
よる残膜が残る問題がある。すなわち本発明の目的は、
少量の現像液でPS版を現像する方法において安定でか
つ均一な方法を提供することである。
[Industrial Application Field 1] The present invention relates to a method for developing a photosensitive lithographic printing plate (hereinafter referred to as a "PS plate") and an apparatus used therein. The present invention relates to a method for developing a PS plate suitable for an automatic developing machine, and an apparatus used therefor. [Prior Art 1] When processing a large number of exposed PS plates, an automatic developing machine is generally used. When processing an exposed PS plate in an automatic developing machine, there are two methods: developing by spraying a developer while horizontally transporting the PS plate, or placing the PS plate in a developing tank containing a large amount of developer. A method of developing the plate by immersing it while conveying the plate in a curved manner has been used. In all of these processing methods, it is necessary to prepare a large amount of developer to process one PS plate. In addition, in order to use the developer economically, it is recycled and reused, and during this process, in addition to deterioration of the developer due to processing, deterioration of the developer occurs due to the absorption of carbon dioxide from the air. It is very troublesome to manage the developing process. In order to improve the above-mentioned drawbacks, there is a known method to keep the development process stable by replenishing a replenisher when a PS plate is processed with a large amount of circulating and reused developer. −
No. 144502, No. 55-115039, No. 58-9
No. 5349, etc. Such a replenishment method was necessary, and the problem of replenishment accuracy and replenishment fluctuations due to product differences between PS plates could not be solved. In addition, a replenishment device is required, and not only is the replenishment device itself expensive, but it also requires adjustment and maintenance of the replenishment device. JP-A-55-32044 discloses a processing apparatus which eliminates the troublesome replenishment method and saves developer. This device is equipped with a developer diffusion plate close to the photosensitive material transfer path in an automatic processor, and stretches the developer applied on the 28-plate surface. The processing method is difficult because the PS plate being transported is not necessarily horizontal and is slightly distorted up and down, and the amount of developer tends to be uneven, which tends to cause uneven development. It has the disadvantage that it takes time to adjust the gap between the plate and the plate, and especially when a small amount of developer is dropped directly onto the 28 plate surface, there is a difference in development speed between the dripping part and the non-dropping part, and the developing solution passes through the development diffusion plate. This difference may remain even after printing, resulting in uneven development and resulting in an undesirable printing plate. We have improved this drawback and developed a PS plate development method and apparatus that can stably perform development using a small amount of developer, and have already filed an application as Japanese Patent Application No. 82900/1982. However, we have found that the technique of developing using a small amount of developer has a problem in that poor development occurs at the leading edge and both sides of the PS plate, which is presumed to be due to a lack of developer. . [Problems to be Solved by the Invention] As described above, in the method of developing a PS plate using a small amount of developer, there is a problem in that a residual film remains on the leading edge and both sides of the 28-plate due to poor development. That is, the purpose of the present invention is to
It is an object of the present invention to provide a stable and uniform method for developing a PS plate using a small amount of developer.

【問題点を解決するための手段】[Means to solve the problem]

本発明の上記目的は、自動現像機を用いて感光性平版印
刷版を自動的に搬送して現像処理を行う方法において、
実質的に未使用の現像液を2枚の板材により構成された
スリッ°トより感光性平版印刷板上に供給し、傾斜ロー
ラを用いで上向きに搬送を行い、更にガイドローラを用
いて現像槽を通過させることを特徴とする感光性平版印
刷版の現像処理方法によって達成することができる。 以下図面に示す実施態様に基づいて本発明の詳細な説明
する。 第1図は本発明を実施するための装置の例を示す側断面
図である。 第1図において、1は搬送ローラ討で25版2をニップ
し搬送をおこなうもの、3は押さえローラで25版2の
搬送位置を適正に保つためのものである。4は傾斜ロー
ラで、現像液が供給された25版2が搬送方向に向かっ
て上昇してゆく方向に搬送されるように設ける。5は現
像液タンクで、その中の現像液はポンプ5aにより現像
液供給バイブロへ送られる。7は現像液供給部材で、2
枚の板材により形成されるスリットをその下端に有し、
現像液供給バイブロから流下した現像液はこのスリット
を通って25版2に供給される。25版2が現像液供給
部材7の下端を通過しでいないときは現像液供給部材7
の下端即ち上記スリットの下端は現像部ローラ8に接触
しており、現像液供給部材7の下端と現像部ローラ8と
で作られる搬送方向と直交する水平方向(以下、「中手
方向」という)の四部、および搬送されているPS版が
この位置にある時は現像液供給部材7の下端と25版2
との接触部にできる中手方向の凹部に現像液の液溜まり
9が形成されるようにする。上記各ローラは、PS版裏
面がその先端部および後端部を除き現像部ローラに接触
しないように設けることが好ましい。 搬送される25版2は、まず現像液供給部材7と現像部
ローラ8とで形成される上記四部の液溜まり9にその先
端部が入る。25版2の先端部が現像液供給部材7と現
像部ローラ8とで形成される中手方向の四部にできた現
像液潜まり9を通過した後は25版2と現像液供給部材
7とによって形成される中手方向の四部に現像液溜まり
9が形成される。これらの現像液溜まり9が25版2の
版面上に存在することにより、PS版の縁部特に先端部
の現上昇する方向へ搬送する手段としては、傾斜した案
内板の上を摺動させるような手段もあるが、この場合、
該案内板でPS版の裏面がこすられて筋状の傷を生じ、
この傷が深い場合は表面の形状にも影響を与えて印刷に
おいて良好な網点再現が得られない欠点、および上記現
像液溜まりを形成するに際して、現像液がPS版の裏面
に溜まり、支持体のアルミ板が侵されて溶出し、ゲル化
してPS版に付着して汚れを生ずる欠点があるが、これ
1こ対して上記のように搬送手段として搬送ローラを用
いることにより、PS版裏面の傷の発生が実用上間mな
いレベルに改良され、またPS版裏面の現像液による侵
されも改良される。 現像液供給部材7の上記2枚の板材により形成されるス
リットは現像液供給バイブロからの現像液流出量に応じ
たスリット間隙に調節される構造にするのが好ましく、
現像液の供給量は28版ll112当たり50〜500
m1が好ましい。 上記板材としては例えばポリエステル、ポリ塩化ビニル
、ポリプロピレン、ポリエチレン、ポリスチレンのよう
なプラスチックのシート、ステンレス鋼のような金属、
ゴム等のシートを用いることができる。 上記スリット間隙の調節は上記2枚の板材の少なくとも
1つが可撓性のあるものであれば現像液供給バイブロか
らの現像液量出量に応じて自動的になされるので装置が
簡易なものとなる。 上記スリットの好ましい実施態様として、その下端部が
スリットを形成する2枚の板材が各々搬送面に平行な方
向でかつ搬送方向に直交する方向に少なくとも可撓性を
有する部分を有し、25版面上の位置において、搬送方
向から見て出口側の板材が入口側の板材より先端(下端
)が短い (好ましくは3〜10mm) !!!様が挙
げられる。 搬送方向l2向かって上昇する搬送方向の水平面となす
角度θは1°〜45°の範囲、特に3°〜10゜の範囲
が好ましい。搬送方向へ上昇してゆく搬送長さは1〜4
0cmの範囲、特に3〜10CI11の範囲が好ましく
、搬送時間は0.5〜20秒、特に2〜10秒の範囲が
好ましい。 現像液供給部材7は現像液を中手方向に互って一様に2
3版上に供給でき、かつ上記のように現像液溜まりを形
成できるものであることが有利である。現像液溜まりは
別の手段、例えば中手方向に互るa−ラ等を設け、これ
らにより現像部ローラ8等の表面や傾斜して搬送される
28版2の表面を流下する現像液を阻止して形成させて
もよい、また、現像部クーラ8はローラでなくてもよく
、例えば半円筒状の板材でもよい。 搬送方向へ上昇する搬送過程で現像された28版2は更
に現像液に浸漬される。この浸漬は現像槽11およびガ
イドローラ12により行うことができる。 現像液槽11には現像液供給部材7がら供給する現像液
と同じ組成の現像液を入れておき、その補充はPS版に
より持ち込まれる現像液によるもので十分である。しか
し、別に未使用の現像液を補充してもよい。現像槽11
中の現像液量は搬送中1m当たり0.3〜31が好まし
く、現像液に浸漬する搬送長さは3〜15cm程度が適
当である。 現像槽11を通過した28版2はブラシローラ13でこ
すられ、スクイズロー214で現像液がスクイズされて
現像を終わる。 このような態様において、28版2の版面上に現像液供
給部材7により現像液が供給されてから現像液槽11内
の現像液に浸漬するまでの時間t1、現像液W111内
の現像液に浸漬されている時間t2、および現像液槽1
1内の現像液から出で現像液が除去されるまでの時間t
3は下記の範囲が好ましい。(現像温度25℃の場合) tl : 5〜10秒、t2: 5〜10秒、t、:1
〜4秒現像温度は10〜40℃の範囲が適当である。 次に、第1図に示す装置の動作について補足する。28
版2が装置の入口から挿入されると、28版検出スイッ
チ (図示せず)により搬送ローラ対1等の搬送装置、
ブラシローラ13、スクイズローラ14等が回転し、P
S版を搬送する。また、28版検出スイッチによりポン
プ5aが作動し、所定時間、所定量の現像液を現像液供
給バイブロへ送る。現像液供給バイブロから流出した現
像液は現像液供給部材7をNII威する2枚の板材の内
側を流下し、その下端部のスリット部分で中手方向に連
続した液膜となす28版2の版面上に供給される。Ps
版2が誤スリット部分を通過していない時は該スリット
部分から流出した現像液が前記のように液溜まり9を形
成する。 第2図は本発明を実施するための装置の要部の別の実施
態様を示す側断面図である。 第2図に示す装置は、第1図の傾斜ローラ4、現像部ロ
ー28の代わりにそれぞれ複数の傾斜ローラ4a、4b
および曲面板8aを用いた例である。 16は串ローラである。 本発明の現像処理方法においで、現像促進操作を加える
ことができる。現像促進操作には、現像促進する物理的
、化学的、電気的、R械的なとすべでの手段を利用する
ことができる。 また本発明の方法を適用する自動現像機は本発明に係る
現像処理工程の他に必要ならば現像処理工程後、現像停
止処理工程(停止処理液は使い捨て方式や循環使用の方
式を含む)、不感脂化処理工程の各々個々の処理工程、
現像停止処理工程とそれに引続く不感脂化処理工程、現
像処理工程と不感層化処理とを組合せた処理工程、或い
は現像停止処理工程と不感脂化処理工程とを組合せた例
えば特開昭54−8002号記載の処理工程等を含んで
いてもよい。 本発明の方法に用いられる28版には、光照射によって
溶解性の変化する感光層が支持体上に塗布されているも
の、および電子写真方式等によって画像様レゾスト層を
設は得る溶解性層が支持体上に設けられているものが含
まれる。 上記の感光性層は必須成分として感光性物質を含んでお
り、感光性物質の代表的なものとしては、例えば感光性
ジアゾ化合物、感光性アジド化合物、エチレン性不飽和
二重結合を有する化合物、酸触媒で重合を起こすエポキ
シ化合物、酸で分解するシリルエーテルポリマーやC−
0−C−基を有する化合物と光陵発生屑との組合せ等が
挙げられる。 感光性ノアゾ化合物としては、露光によりアルカリ可溶
性に変化するポジ型のものとして。−キノンジアジド化
合物、露光により溶解性が減少するネが型のものとして
芳香族ジアゾニウム塩等が挙げられる。 本発明の方法に用いるネ〃型PS版の現像液には例えば
特開昭51−77401号、同51−80228号、同
53−44202号および同55−52054号中に記
載されているようなアニオン界面活性剤、水に対する溶
解度が常温において10重量%以下である有機溶媒、ア
ルカリ剤、水および必要により汚れ防止剤からなる水溶
液が含まれる。 本発明の方法に用いるボッ型23版の現像液にはアルカ
リ金属水酸化物、珪酸アルカリ金属塩、りん酸アルカリ
金属塩またはアルミン酸アルカリ金属塩、水および必要
に応じて界面活性剤や他の添加剤からなるpH12以上
の強アルカリ水溶液が含まれる。具体的には特開昭48
−15535号、同53−82324号、54−620
04号、同52−127338号、同53−96307
号、同50−144502号、同55−22759号、
同55−25100号、同55−95946号、同55
−115039号、同56−142528号、同50−
51324号に記載されている珪酸ナトリウムまたは珪
%カリウムからなる現像液をあげることができる。 また、特開昭60−130741号等に記載等のネ〃型
PS版とポジ型PS版の兼用現像液も用いることができ
る。 〔実施例〕 以下、本発明の具体的な実施例を示す。 実施例1 第1図に示す態様の装造を用い、スリットを形成する板
材としては、上側(出口側)の板材に厚さ75μ論、長
さ (搬送方向に直交する方向) 900II1m、幅
50mgm、また下側(入口側)の板材には厚さ175
μ11長さ900mm、幅55amのそれぞれ長方形の
ポリエチレンテレフタレートのシートを用いた。 ロー?8にはゴム製を用い、β=20°、ローラ8の直
径は80mmとする。全現像部搬送長さを4ooIIl
lとし、現像液槽11は現像液供給部材7がら供給する
現像液と同じ組成のものを入れ、1版毎に現像液供給部
材7より28版に供給された現像液が流入し、槽内に過
剰となった現像液は廃液となる様な構造とし、現像液温
を25℃、前記t1、t2および1コをそれぞれ8秒、
8秒および4秒、合計20秒とした。 ps版はSMP−N  (KE品名、ポジ型ps版、小
西六写真工業(株)S!りの1003auaX 800
mmサイズを用い、現像液は下記組成のものを用いた。 (現像液) ケイ酸ナトリウム(JIS規格3号)20g水酸化ナト
リウム           5gペレックスNDL(
化工アトラス(株)!!!! )  0.5g水   
                        9
75g現像液供給量は上記PS版1版当す160+ai
’とし、100版を連続して処理し、得られた版のうち
、1板目と100版目をオフセット印刷した結果、PS
版の先端部及び両サイド部に現像不良による汚れのない
良好な印刷物が得られた。 比較例1 前記実施例1と同様なPS版および現像液を泪い、第3
図に示す装置を用いて現像を行った。現像液を現像液供
給バイブロのノズルからPS版上に滴下させ、プラスチ
ックシートの拡散板17により現像液滴はPS版上に押
し広げられ現像され、案内板18上を搬送され現像が終
了する。 現像液滴下位置からスクイズローラ′N43までの距離
すなわち現像ゾーン1400mm、現像時間20秒、現
像液量1坂当だ’) 160+aNで現像処理を行なっ
たところ、現像液はPS服面上に均一に押し拡げられた
が、100版を連続して処理した結果、現像むらの多い
性能不安定な版しか得られなかった。また版の先端部お
よび両サイド部に残膜があり、得られた版を実施例1と
同一の条件で印刷を行なったところ該残膜部に汚れが発
生した。 〔発明の効果〕 本発明により、少量の現像液でPS版を現像する方法に
おいて現像均一性が向上し特に先端部及び両サイド部の
現像性が改良された、PS版の現像処理力法を提供する
ことが出来だ。
The above object of the present invention is to provide a method for automatically conveying and developing a photosensitive lithographic printing plate using an automatic developing machine.
Substantially unused developer is supplied onto the photosensitive lithographic printing plate through a slit made up of two plate materials, conveyed upward using inclined rollers, and further transferred to the developing tank using guide rollers. This can be achieved by a method for developing a photosensitive lithographic printing plate, which is characterized by passing through the lithographic printing plate. The present invention will be described in detail below based on embodiments shown in the drawings. FIG. 1 is a side sectional view showing an example of an apparatus for carrying out the present invention. In FIG. 1, reference numeral 1 denotes a conveyor roller for nipping and conveying the 25-plate 2, and 3 a holding roller for keeping the 25-plate 2 in an appropriate conveyance position. Reference numeral 4 denotes an inclined roller, which is provided so that the 25 plate 2 supplied with developer is conveyed in an upward direction toward the conveyance direction. Reference numeral 5 denotes a developer tank, and the developer therein is sent to a developer supplying vibro by a pump 5a. 7 is a developer supply member;
It has a slit formed by a sheet of plate material at its lower end,
The developer flowing down from the developer supply vibro is supplied to the 25 plate 2 through this slit. 25 When the plate 2 has not passed the lower end of the developer supply member 7, the developer supply member 7
The lower end of the slit, that is, the lower end of the slit, is in contact with the developing roller 8, and the lower end of the slit is in contact with the developing roller 8 in the horizontal direction (hereinafter referred to as the "medial direction") perpendicular to the conveyance direction formed by the lower end of the developer supplying member 7 and the developing roller 8. ), and when the PS plate being transported is in this position, the lower end of the developer supply member 7 and the 25th plate 2.
A developer pool 9 is formed in a concave portion in the metacarpal direction that is formed at the contact portion with the developer. It is preferable that each of the above-mentioned rollers is provided so that the back surface of the PS plate does not come into contact with the developing roller except for its leading and trailing ends. The tip of the 25 plate 2 being conveyed first enters the four liquid pools 9 formed by the developer supply member 7 and the developing roller 8 . After the tip of the 25 plate 2 passes through the developer recesses 9 formed at the four parts in the medial direction formed by the developer supply member 7 and the developer roller 8, the 25 plate 2 and the developer supply member 7 are separated. Developing solution reservoirs 9 are formed in the four portions in the metacarpal direction formed by. Because these developer pools 9 exist on the plate surface of the 25 plate 2, the means for transporting the edges of the PS plate in the upward direction, especially the leading edge, is to slide on an inclined guide plate. There are other methods, but in this case,
The back side of the PS plate was rubbed by the guide plate, causing streak-like scratches.
If this scratch is deep, it will affect the shape of the surface, making it difficult to obtain good halftone dot reproduction in printing.In addition, when forming the developer pool, the developer will accumulate on the back side of the PS plate, and the support The disadvantage is that the aluminum plate is corroded and eluted, gels, and adheres to the PS plate, causing stains.However, by using the conveyance roller as the conveyance means as described above, the back side of the PS plate can be easily removed. The occurrence of scratches is improved to a level that is practically impractical, and the attack of the back surface of the PS plate by the developer is also improved. It is preferable that the slit formed by the two plates of the developer supply member 7 has a structure in which the slit gap is adjusted according to the amount of developer flowing out from the developer supply vibro.
The amount of developer supplied is 50 to 500 per 28 plates 112
m1 is preferred. Examples of the above-mentioned plate materials include sheets of plastics such as polyester, polyvinyl chloride, polypropylene, polyethylene, and polystyrene, metals such as stainless steel,
A sheet of rubber or the like can be used. If at least one of the two plates is flexible, the slit gap can be adjusted automatically according to the amount of developer coming out from the developer supply vibro, so the device can be simplified. Become. In a preferred embodiment of the slit, the two plates whose lower ends form the slit each have a portion having flexibility at least in a direction parallel to the conveying surface and perpendicular to the conveying direction, and In the above position, the tip (lower end) of the plate on the outlet side is shorter (preferably 3 to 10 mm) than the plate on the inlet side when viewed from the conveyance direction! ! ! Examples include: The angle θ between the transport direction and the horizontal plane rising toward the transport direction l2 is preferably in the range of 1° to 45°, particularly in the range of 3° to 10°. The conveyance length rising in the conveyance direction is 1 to 4.
A range of 0 cm, particularly a range of 3 to 10 CI11 is preferred, and a transport time of 0.5 to 20 seconds, particularly a range of 2 to 10 seconds is preferred. The developer supply member 7 distributes the developer evenly in two directions in the medial direction.
It is advantageous that the developer can be supplied onto three plates and can form a developer pool as described above. For the developer reservoir, another means is provided, for example, a-ra arranged opposite each other in the direction of the center, and these prevent the developer from flowing down the surface of the developer roller 8, etc., or the surface of the 28 plate 2 that is conveyed at an angle. Further, the developing section cooler 8 does not need to be a roller, and may be formed of a semi-cylindrical plate, for example. The developed 28 plate 2 is further immersed in the developer during the conveyance process of moving upward in the conveyance direction. This immersion can be performed using the developing tank 11 and the guide roller 12. The developer tank 11 is filled with a developer having the same composition as the developer supplied from the developer supply member 7, and it is sufficient to replenish the developer using the developer brought in by the PS plate. However, an unused developer may be replenished separately. Developer tank 11
The amount of developing solution inside is preferably 0.3 to 31 cm per meter during transportation, and the length of transportation immersed in the developer is preferably about 3 to 15 cm. The 28 plate 2 that has passed through the developer tank 11 is rubbed by the brush roller 13, and the developer is squeezed by the squeeze row 214 to complete the development. In such an embodiment, during the time t1 from when the developer is supplied onto the plate surface of the 28 plate 2 by the developer supply member 7 until it is immersed in the developer in the developer tank 11, the developer in the developer W111 is Immersed time t2 and developer tank 1
Time t until the developer is removed from the developer in 1
3 is preferably in the following range. (When developing temperature is 25°C) tl: 5 to 10 seconds, t2: 5 to 10 seconds, t: 1
-4 seconds The development temperature is suitably in the range of 10 to 40°C. Next, the operation of the apparatus shown in FIG. 1 will be supplemented. 28
When plate 2 is inserted from the entrance of the device, a plate detection switch 28 (not shown) causes the conveyor roller pair 1, etc.
The brush roller 13, squeeze roller 14, etc. rotate, and P
Transport the S plate. Further, the pump 5a is activated by the 28-plate detection switch, and a predetermined amount of developer is sent to the developer supply vibro for a predetermined period of time. The developer flowing out from the developer supply vibro flows down the inside of the two plate materials that cover the developer supply member 7, and forms a continuous liquid film in the medial direction at the slit at the lower end of the plate 2. Supplied on the plate. Ps
When the plate 2 has not passed through the erroneous slit portion, the developer flowing out from the slit portion forms the liquid pool 9 as described above. FIG. 2 is a side sectional view showing another embodiment of the main parts of the apparatus for carrying out the present invention. The apparatus shown in FIG. 2 has a plurality of inclined rollers 4a and 4b, respectively, instead of the inclined roller 4 and developing section row 28 of FIG.
This is an example using a curved plate 8a. 16 is a skewer roller. In the development processing method of the present invention, a development promotion operation can be added. For the development promotion operation, any physical, chemical, electrical, or R-mechanical means for promoting development can be used. Furthermore, in addition to the development process according to the present invention, an automatic developing machine to which the method of the present invention is applied may include, if necessary, a development stop process after the development process (the stop process solution includes a disposable method or a cyclic use method). Each individual treatment step of the desensitization treatment step,
A development stop treatment step followed by a desensitization treatment step, a treatment step that combines a development treatment step and a desensitization treatment, or a combination of a development stop treatment step and a desensitization treatment step, for example, JP-A-1988- It may also include the treatment steps described in No. 8002. The 28 plates used in the method of the present invention include those in which a photosensitive layer whose solubility changes upon irradiation with light is coated on a support, and a soluble layer in which an image-like resist layer can be formed by electrophotography or the like. is provided on a support. The above photosensitive layer contains a photosensitive substance as an essential component, and typical examples of the photosensitive substance include a photosensitive diazo compound, a photosensitive azide compound, a compound having an ethylenically unsaturated double bond, Epoxy compounds that polymerize with acid catalysts, silyl ether polymers and C-
Examples include a combination of a compound having an 0-C- group and photoresin-generated waste. As a photosensitive noazo compound, it is a positive type that becomes alkali-soluble upon exposure to light. - Quinonediazide compounds, and aromatic diazonium salts are examples of compounds whose solubility decreases upon exposure to light. The developing solution for the black type PS plate used in the method of the present invention includes, for example, those described in JP-A-51-77401, JP-A-51-80228, JP-A-53-44202 and JP-A-55-52054. It includes an aqueous solution consisting of an anionic surfactant, an organic solvent having a solubility in water of 10% by weight or less at room temperature, an alkaline agent, water, and, if necessary, an antifouling agent. The developer for the Bott type 23 plate used in the method of the present invention contains an alkali metal hydroxide, an alkali metal silicate, an alkali metal phosphate or an alkali metal aluminate, water and, if necessary, a surfactant and other additives. A strong alkaline aqueous solution containing additives and having a pH of 12 or more is included. Specifically, Japanese Patent Application Publication No. 1973
-15535, 53-82324, 54-620
No. 04, No. 52-127338, No. 53-96307
No. 50-144502, No. 55-22759,
No. 55-25100, No. 55-95946, No. 55
-115039, 56-142528, 50-
A developing solution consisting of sodium silicate or potassium silicate described in No. 51324 can be mentioned. Further, a developer for both a negative-type PS plate and a positive-type PS plate, such as that described in JP-A No. 60-130741, can also be used. [Example] Specific examples of the present invention will be shown below. Example 1 Using the arrangement shown in Fig. 1, the upper (outlet side) plate material used to form the slit had a thickness of 75 μm, a length (perpendicular to the conveying direction) of 900 II 1 m, and a width of 50 mg m. , and the lower (inlet side) board has a thickness of 175 mm.
A rectangular polyethylene terephthalate sheet having a length of 900 mm and a width of 55 am was used. Low? The roller 8 is made of rubber, β=20°, and the diameter of the roller 8 is 80 mm. The transport length of the entire developing section is 4ooIIl.
1, the developer tank 11 contains a developer with the same composition as the developer supplied from the developer supply member 7, and the developer supplied to the 28th plate from the developer supply member 7 for each plate flows into the tank. The structure is such that the excess developer is discarded, the developer temperature is set to 25°C, and the above t1, t2 and 1 time are each held for 8 seconds.
8 seconds and 4 seconds, totaling 20 seconds. The PS version is SMP-N (KE product name, positive PS version, Konishiroku Photo Industry Co., Ltd. S! Rino 1003auaX 800
mm size was used, and a developer having the following composition was used. (Developer) Sodium silicate (JIS standard No. 3) 20g Sodium hydroxide 5g Pellex NDL (
Kako Atlas Co., Ltd.! ! ! ! ) 0.5g water
9
The amount of 75g developer supplied is 160+ai for one PS plate above.
', and as a result of processing 100 plates continuously and offset printing the 1st plate and 100th plate among the obtained plates, PS
A good printed matter was obtained with no stains due to poor development at the leading edge and both sides of the plate. Comparative Example 1 Using the same PS plate and developer as in Example 1, the third
Development was performed using the apparatus shown in the figure. The developer is dripped onto the PS plate from the nozzle of the developer supply vibro, the developer droplets are spread on the PS plate by the plastic sheet diffusion plate 17 for development, and are conveyed on the guide plate 18 to complete the development. The distance from the developer dripping position to squeeze roller 'N43 (development zone 1400mm, development time 20 seconds, developer amount 1 slope) When the development process was performed at 160+aN, the developer was uniformly distributed on the surface of the PS cloth. However, after processing 100 plates in succession, only plates with unstable performance and uneven development were obtained. Further, there was a residual film on the leading edge and both sides of the plate, and when the obtained plate was printed under the same conditions as in Example 1, stains occurred in the residual film area. [Effects of the Invention] The present invention provides a PS plate development processing power method in which the development uniformity is improved in a method of developing a PS plate with a small amount of developer, and the developability of the leading edge and both sides is particularly improved. I can provide it.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図および第2図は本発明の一実施態様を示す現像装
置の側断面図、fjS3図は比較に用いた現像装置の斜
視図である。 1・・・搬送ローラ対  2・・・PS版3・・・押さ
えローラ  4.4a、4b・・・傾斜ローラ5・・・
現像液タンク  5a・・・現像液供給ポンプ6・・・
現像液供給パイプ 7・・・現像液供給部材 8・・・現像部ローラ8a・
・・曲面板     9・・・現像液溜まり11・・・
現像槽     12・・・ガイドローラ13・・・ブ
ラシローラ  14・・・スクイズローラ15・・・m
WLタンク   16・・・串ローラ17・・・拡散板
     18・・・案内板出願人   小西六写真工
業株式会社 第1図 ら
1 and 2 are side sectional views of a developing device showing one embodiment of the present invention, and FIG. fjS3 is a perspective view of a developing device used for comparison. 1... Conveyance roller pair 2... PS plate 3... Holding roller 4.4a, 4b... Inclined roller 5...
Developer tank 5a...Developer supply pump 6...
Developer supply pipe 7...Developer supply member 8...Development section roller 8a.
...Curved plate 9...Developer reservoir 11...
Developer tank 12...Guide roller 13...Brush roller 14...Squeeze roller 15...m
WL tank 16... Skewer roller 17... Diffusion plate 18... Guide plate applicant Konishiroku Photo Industry Co., Ltd. Figure 1 et al.

Claims (1)

【特許請求の範囲】[Claims] 自動現像機を用いて、感光性平版印刷版を自動的に搬送
して現像処理を行う方法において、実質的に未使用の現
像液を2枚の板材により構成されたスリットより感光性
平版印刷版上に供給し、傾斜ローラを用いて、上向きに
搬送を行い、更にガイドローラを用いて現像槽を通過さ
せることを特徴とする感光性平版印刷版の現像処理方法
In a method in which a photosensitive lithographic printing plate is automatically conveyed and developed using an automatic developing machine, a substantially unused developer is passed through a slit made up of two plates into a photosensitive lithographic printing plate. 1. A method for developing a photosensitive lithographic printing plate, comprising supplying the plate upwardly, transporting the plate upwardly using an inclined roller, and further passing the developing tank using a guide roller.
JP3104387A 1987-02-12 1987-02-12 Developing process method for photosensitive planographic printing plate Pending JPS63197950A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3104387A JPS63197950A (en) 1987-02-12 1987-02-12 Developing process method for photosensitive planographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3104387A JPS63197950A (en) 1987-02-12 1987-02-12 Developing process method for photosensitive planographic printing plate

Publications (1)

Publication Number Publication Date
JPS63197950A true JPS63197950A (en) 1988-08-16

Family

ID=12320454

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3104387A Pending JPS63197950A (en) 1987-02-12 1987-02-12 Developing process method for photosensitive planographic printing plate

Country Status (1)

Country Link
JP (1) JPS63197950A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS622254A (en) * 1985-06-27 1987-01-08 Fuji Photo Film Co Ltd Method for developing photosensitive material
JPS62257171A (en) * 1986-04-30 1987-11-09 Konika Corp Method and device for developing photosensitive lithographic plate improving development property

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS622254A (en) * 1985-06-27 1987-01-08 Fuji Photo Film Co Ltd Method for developing photosensitive material
JPS62257171A (en) * 1986-04-30 1987-11-09 Konika Corp Method and device for developing photosensitive lithographic plate improving development property

Similar Documents

Publication Publication Date Title
US5089839A (en) Method of processing pre-sensitized lithographic printing plate and apparatus therefor
JPH0560585B2 (en)
JP2619253B2 (en) Development method of photosensitive lithographic printing plate
JPS63197950A (en) Developing process method for photosensitive planographic printing plate
JPS634236A (en) Method for developing process of photosensitive lithographic printing plate which is improved in stability of development or the like
JPS62257171A (en) Method and device for developing photosensitive lithographic plate improving development property
JPS63202750A (en) Method for developing process of photosensitive planographic printing plate
JPS63132241A (en) Method for developing photosensitive lithographic printing plate having improved uniformity of development
JPS63167364A (en) Photosensitive lithographic plate developing method improving uniformity of development
JPS62237455A (en) Method and device for development processing of photosensitive lithographic printing plate for improving uniformity of development
JPH01150141A (en) Development processing device for photosensitive planographic printing plate
JPH0778632B2 (en) Development processing method of non-silver salt light-sensitive material capable of improving development uniformity
JPS63261263A (en) Method for developing photosensitive material capable of stably and uniformly developing
JPS63282740A (en) Method for developing photosensitive material for printing
JPH01200257A (en) Method and device for development processing of photosensitive planographic printing plate
JPS63100460A (en) Method for processing photosensitive material improved in stability or the like of development processing and automatic developing machine
JPH0199053A (en) Method and device for development processing of non-silver salt photosensitive material which is improved in stability of development processing or the like
JPS6371855A (en) Method and device for developing photosensitive lithography printing plate
JPS62278555A (en) Developing method for photosensitive lithographic printing plate to improve film remaining
JPH0327046A (en) Method and device for processing photosensitive planographic printing plate
JPS6388554A (en) Developing process method for phtosensitive lithographic printing plate
JPH01100550A (en) Method for development processing of non-silver photosensitive material with which stable and uniform development is possible
JP3013110B2 (en) Processing method and processing apparatus for photosensitive lithographic printing plate
JPH0577068B2 (en)
JPS63282741A (en) Method for developing photosensitive material for printing