JPS6319746A - 表面解析装置 - Google Patents
表面解析装置Info
- Publication number
- JPS6319746A JPS6319746A JP61164299A JP16429986A JPS6319746A JP S6319746 A JPS6319746 A JP S6319746A JP 61164299 A JP61164299 A JP 61164299A JP 16429986 A JP16429986 A JP 16429986A JP S6319746 A JPS6319746 A JP S6319746A
- Authority
- JP
- Japan
- Prior art keywords
- magnet
- sample
- scattered
- scattered beam
- deflecting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005211 surface analysis Methods 0.000 title claims abstract description 13
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 36
- 230000000704 physical effect Effects 0.000 claims description 3
- 238000001228 spectrum Methods 0.000 abstract description 14
- 238000005259 measurement Methods 0.000 abstract description 8
- 230000005855 radiation Effects 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 description 9
- 230000001133 acceleration Effects 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 239000007787 solid Substances 0.000 description 6
- 239000010410 layer Substances 0.000 description 5
- 230000004907 flux Effects 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 238000010183 spectrum analysis Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61164299A JPS6319746A (ja) | 1986-07-12 | 1986-07-12 | 表面解析装置 |
| US07/070,252 US4829179A (en) | 1986-07-12 | 1987-07-06 | Surface analyzer |
| DE8787110018T DE3781963T2 (de) | 1986-07-12 | 1987-07-10 | Oberflaechenanalysegeraet. |
| EP87110018A EP0253336B1 (en) | 1986-07-12 | 1987-07-10 | Surface analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61164299A JPS6319746A (ja) | 1986-07-12 | 1986-07-12 | 表面解析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6319746A true JPS6319746A (ja) | 1988-01-27 |
| JPH0520855B2 JPH0520855B2 (enrdf_load_stackoverflow) | 1993-03-22 |
Family
ID=15790478
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61164299A Granted JPS6319746A (ja) | 1986-07-12 | 1986-07-12 | 表面解析装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6319746A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007513460A (ja) * | 2003-09-05 | 2007-05-24 | カール・ツァイス・エスエムティー・アーゲー | 粒子光学システム及び装置、並びに、かかるシステム及び装置用の粒子光学部品 |
-
1986
- 1986-07-12 JP JP61164299A patent/JPS6319746A/ja active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007513460A (ja) * | 2003-09-05 | 2007-05-24 | カール・ツァイス・エスエムティー・アーゲー | 粒子光学システム及び装置、並びに、かかるシステム及び装置用の粒子光学部品 |
| JP4794444B2 (ja) * | 2003-09-05 | 2011-10-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 粒子光学システム及び装置、並びに、かかるシステム及び装置用の粒子光学部品 |
| US8097847B2 (en) | 2003-09-05 | 2012-01-17 | Carl Ziess Smt Ag | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| US8637834B2 (en) | 2003-09-05 | 2014-01-28 | Carl Zeiss Microscopy Gmbh | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| US9224576B2 (en) | 2003-09-05 | 2015-12-29 | Carl Zeiss Microscopy Gmbh | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| US9673024B2 (en) | 2003-09-05 | 2017-06-06 | Applied Materials Israel, Ltd. | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
| US10504681B2 (en) | 2003-09-05 | 2019-12-10 | Carl Zeiss Microscopy Gmbh | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0520855B2 (enrdf_load_stackoverflow) | 1993-03-22 |
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