JPS63184943A - Production of optical recording medium - Google Patents

Production of optical recording medium

Info

Publication number
JPS63184943A
JPS63184943A JP1755687A JP1755687A JPS63184943A JP S63184943 A JPS63184943 A JP S63184943A JP 1755687 A JP1755687 A JP 1755687A JP 1755687 A JP1755687 A JP 1755687A JP S63184943 A JPS63184943 A JP S63184943A
Authority
JP
Japan
Prior art keywords
substrate
recording medium
optical recording
medium
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1755687A
Other languages
Japanese (ja)
Inventor
Nobuhiko Kano
宣彦 加納
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP1755687A priority Critical patent/JPS63184943A/en
Publication of JPS63184943A publication Critical patent/JPS63184943A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To decrease the influence of double refractions that diagonal incident laser light receives from a substrate by subjecting one or both of the light transmittable substrates constituting a medium to one or plural times of heat treatments at the temp. near the glass transition point of the substrate material or above said temp. CONSTITUTION:One or both of the light transmittable substrates constituting the medium of the optical recording medium are annealed at the temp. near (+ or -10 deg.C) the glass transition point of the substrate material or above. The difference in the refractive index in the perpendicular direction of the substrates is thereby decreased and the influence (substrate noise) of the double refractions that the diagonal incident laser light on the substrates receives from the substrates is minimized; in addition, the CNR value exhibits the stable value without having a change in the CNR value in this annealing even after a long- term weatherability test.

Description

【発明の詳細な説明】 〔産業上の利用分野) 本発明は、レーザー光を用いて、読み出し、古き込み可
能な光記録媒体に関し、CD−ROM、DRAW、E−
DRAWに利用できる。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an optical recording medium that can be read and aged using laser light, and relates to a CD-ROM, DRAW, E-
Can be used for DRAW.

〔従来の技術〕[Conventional technology]

従来光学的手法を用いて情報を記録再生する光記録媒体
の光透過性基板は、射出成型により金型41シ度80℃
〜120℃の軟融で成型されていた。
Conventionally, the light-transmissive substrate of an optical recording medium for recording and reproducing information using an optical method is produced by injection molding at a temperature of 41°C and 80°C in a mold.
It was molded by soft melting at ~120°C.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

従来の射出成型により成型した光透過性基板では、1に
仮の面内方向の屈折率差(光学異方性)の値をかなり小
さくする事はできた。しかし基板の垂l′f方向の屈折
率差の値は大きかった。情報読み出し用光ピツクアップ
では、対物レンズにより光は光透過性基板を通して情報
記O膜上に焦点を桔ぶ為、光は基板中を種々の角度をも
って進む事となる。上記の事により、垂直方向の屈折率
差の値が大きいと、基板に対して斜入射する先に対して
光強度にゆらぎを与える原因となっている。光磁気特性
を用いた媒体に於ては、信号検出器に入る光量の絶対値
が小さい為、CNRのノイズを数デシベル押し上げる府
内となっている。本発明は上記の基板垂直方向の屈折率
差を小さくシ、基板に斜入射したレーザー光が基板上り
受ける複屈折の影響を軽微なものとし、光記録媒体のC
NRのノイズを低下させる事によるCNRの向上を目的
としている。
In a light-transmitting substrate molded by conventional injection molding, it was possible to significantly reduce the value of the tentative in-plane refractive index difference (optical anisotropy). However, the value of the refractive index difference in the vertical l'f direction of the substrate was large. In an optical pickup for reading information, the objective lens passes the light through the light-transmitting substrate and focuses it on the information recording film, so the light travels through the substrate at various angles. As a result of the above, if the value of the refractive index difference in the vertical direction is large, it causes fluctuations in the light intensity toward the point where the light is obliquely incident on the substrate. In a medium using magneto-optical characteristics, the absolute value of the amount of light entering the signal detector is small, which tends to push up the CNR noise by several decibels. The present invention reduces the refractive index difference in the vertical direction of the substrate, minimizes the influence of birefringence that the laser beam obliquely incident on the substrate receives as it moves up the substrate, and
The purpose is to improve CNR by reducing NR noise.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の光記録媒体の製造方法は、光学的手法を用いて
情報を記録再生する光記録媒体に於て、媒体を(?4成
する光透過性基板の一方又は両方が基板材r1のガラス
転換点の近傍(±10°C)、もしくはそれ以上の温度
で、一度、又は複数回熱処理されている事を特徴として
いる。
The method for manufacturing an optical recording medium of the present invention is to produce an optical recording medium in which information is recorded and reproduced using an optical method, in which one or both of the light-transmitting substrates forming the medium (?4) are glass substrate material r1. It is characterized by being heat-treated once or multiple times at a temperature near the turning point (±10°C) or higher.

〔実施例1〕 第1図(a)に本発明の基板アニールを施こして製作し
た光記録媒体の構造断面図を示す。6は貼り合せ面側に
情報記0層部をもつ1.2−n厚のポリ力しボネート基
板である。5はラジカル反応系の紫外線硬化接着剤であ
る。第1図(b)に詳細な媒体構造を示す。1は溝付ポ
リカーボネート基板であり、トラックピッチ1.6μm
1溝z?j、さ650人、溝中0.6μmである。2は
窒化シリコン、窒化アルミニウムの複合膜で厚さは80
0人である。3は光磁気記録媒体のNdDyFeCoT
iで厚さ400人である。4は窒化シリコン、窒化アニ
ミニウムの複合膜で厚さは1500人である。ポリカー
ボネート基板lは情報記録局部形成前に表−1の条件で
アニールされたものを用いた。本試験に用いたポリカー
ボネートは帝人化!戊製のパンライトA I) −55
03である。八D−5503のガラス転移点Tgは13
5°Cである。回転数90ORPM、記録周波数I M
 II z 。
[Example 1] FIG. 1(a) shows a cross-sectional view of the structure of an optical recording medium manufactured by subjecting the substrate to annealing according to the present invention. Reference numeral 6 denotes a 1.2-n thick polybonate substrate having an information recording layer 0 portion on the bonding surface side. 5 is a radical reaction type ultraviolet curing adhesive. FIG. 1(b) shows the detailed structure of the medium. 1 is a grooved polycarbonate substrate with a track pitch of 1.6 μm.
1 groove z? j, 650 people, 0.6 μm in the groove. 2 is a composite film of silicon nitride and aluminum nitride with a thickness of 80 mm.
There are 0 people. 3 is magneto-optical recording medium NdDyFeCoT
i is 400 people thick. 4 is a composite film of silicon nitride and animinium nitride and has a thickness of 1,500 mm. The polycarbonate substrate 1 was annealed under the conditions shown in Table 1 before forming the information recording area. The polycarbonate used in this test was made by Teijin! Panlight A I) -55 made by Boru
It is 03. The glass transition point Tg of HachiD-5503 is 13
It is 5°C. Rotation speed 90ORPM, recording frequency IM
IIz.

バンド中30 K II zでカー効果を用いて反射で
測定したC N Rを表−1に示す。結果はガラス転移
点よりも高い温度でアニールした基板の方がCNRの値
は良かった。ポリカーボネートのガラス転移点より高い
温度条件でCNRは53〜54dllであった。一方ガ
ラス転移点以下120°CのアニールではCNRは51
.5d13であった。160℃10分、180°C5分
、180°CIO分アニールは基板トラック溝が消えて
しまった。その後温度60”C1温度90%で1000
時間耐久試験を行なったが、CNRについて変化は見ら
れなかった。
Table 1 shows C N R measured by reflection using the Kerr effect at 30 K II z in the band. The results showed that the CNR value was better for the substrate annealed at a temperature higher than the glass transition point. The CNR was 53 to 54 dll under a temperature condition higher than the glass transition point of polycarbonate. On the other hand, when annealing at 120°C below the glass transition temperature, the CNR is 51.
.. It was 5d13. After annealing at 160°C for 10 minutes, 180°C for 5 minutes, and 180°CIO, the substrate track grooves disappeared. Then temperature 60" C1 temperature 90% 1000
A time durability test was conducted, but no change was observed in CNR.

表−1、ノ)(仮アニール条件 と光記録媒体のCNIセ 〔実施例2〕 第2CEICa)に本発明の基板アニールを施こして製
作した光記録媒体の構造断面図を示す。1Gは貼り合せ
面側に情報記録層部をもつ1.2.、厚のポリカーボネ
ート基板である。15はラジカル反応系の紫外線硬化接
着剤である。17は県さ1.2@■の表面平滑ポリカー
ボネート基板である。第2図(b)に詳細な媒体構造を
示ず。11は溝付ポリカーボネート基板であり、トラッ
クピッチ1.6μm1溝JWさ650人、溝中0.8μ
mである。12は酸化シリコン(Sin)で厚さ100
0人である。13は光磁気記録媒体のNdDyFeCo
Tiで厚さ400λである。4は酸化シリコン(S i
 O)で厚さ1000人である。
Table 1 shows a cross-sectional view of the structure of an optical recording medium manufactured by applying the substrate annealing of the present invention to (temporary annealing conditions and CNI section of optical recording medium [Example 2] 2nd CEICa). 1G has an information recording layer portion on the bonding surface side 1.2. , thick polycarbonate substrate. 15 is a radical reaction type ultraviolet curing adhesive. 17 is a smooth surface polycarbonate substrate with a diameter of 1.2@■. The detailed medium structure is not shown in FIG. 2(b). 11 is a polycarbonate substrate with grooves, track pitch 1.6 μm 1 groove JW 650 people, groove inside 0.8 μm
It is m. 12 is silicon oxide (Sin) with a thickness of 100
There are 0 people. 13 is the magneto-optical recording medium NdDyFeCo
It is made of Ti and has a thickness of 400λ. 4 is silicon oxide (S i
O) and has a thickness of 1000 people.

ポリカーボネート基板11.17は情vI!記録層部形
成前に表−2の条件でアニールされたものを用いた。本
試験に用いたポリカーボネートは実施例1とII1様に
奇人化成製パンライ)AD−5503を用いた。回転数
900RPM1紀録周波数IMII z sバント中3
0KIIzでファラデー効果を用いて、レーザー透過光
で測定したCNRを表−2に示す。結果はガラス転移点
よりも高い温度でアニールした基板の方がCNRは良好
であった。
Polycarbonate board 11.17 is a passion vI! Those used were annealed under the conditions shown in Table 2 before forming the recording layer section. The polycarbonate used in this test was Panrai) AD-5503 manufactured by Kijin Kasei Co., Ltd. as in Examples 1 and II1. Rotation speed 900 RPM 1 record frequency IMII z s bunt medium 3
Table 2 shows the CNR measured by laser transmitted light using the Faraday effect at 0KIIz. The results showed that the CNR was better for the substrate annealed at a temperature higher than the glass transition point.

表−2、基板アニール条件 と完配t″に媒体のCNR 〔実施例3〕 第3図(a)に本発明の基板アニールを施こして’A作
した光記録媒体の(1が造断面図を示す。28は貼り合
せ面側に情報記録層部をもつ1.2□厚のポリカーボネ
ート基板仮である。25はラジhル反応系の紫外線硬化
後j′を剤である。29は1.2讃■厚の平滑ポリカー
ボネート基板である。第2図(b)に詳細な媒体構造を
示す。21は溝イ、1ポリカーボネート基板であり、ト
ラックピッチ1.6μm1溝深さ600人、溝中0.6
μmである。
Table 2: Substrate annealing conditions and CNR of the medium at complete distribution t'' [Example 3] Figure 3(a) shows the optical recording medium 'A' produced by subjecting the substrate annealing of the present invention (1 is the structured cross section. The figure is shown. 28 is a temporary polycarbonate substrate of 1.2□ thickness with an information recording layer portion on the bonding surface side. 25 is a j' agent after UV curing of a radial reaction system. 29 is 1 It is a smooth polycarbonate substrate with a thickness of .2 cm. Figure 2 (b) shows the detailed media structure. 21 is a polycarbonate substrate with a groove of 1.6 μm, a groove depth of 600 mm, and a groove depth of 600 mm. 0.6
It is μm.

22は窒化シリコン、窒化アルミニウムの複合膜で1ゾ
さは1000人である。23は磁気記録媒体のN d 
D y F c Co F eで厚さ400人である。
22 is a composite film of silicon nitride and aluminum nitride, and its size is 1,000 people. 23 is the N d of the magnetic recording medium
It is D y F c Co F e and has a thickness of 400 people.

24は窒化シリコン、窒(1?アルミニウムの複合膜で
、県さは1000人である026は窒化シリコン、窒化
アルミニウムの複合膜で1000人厚である。ポリカー
ボネート基板2i27は情報記録局部形成前に表−3の
条件でアニールされたものを用いた。本試験に用いたポ
リカーボネートは実施例1と同様に奇人化成製パンライ
)AD−5503を用いた。回転数00 ORP M 
、記録周波I M II zでバンド中30 K II
 zでファラデー効果を用いて、レーザー透過量で測定
したCNRを表−3に示ず。結果は、ガラス転移点より
も高い温度でアニールした基板の方がCNRの1f1は
良好であった。
24 is a composite film of silicon nitride and nitride (1?aluminum) with a thickness of 1000 mm. 026 is a composite film of silicon nitride and aluminum nitride with a thickness of 1000 mm. Polycarbonate substrate 2i 27 is exposed before forming the information recording area. The polycarbonate used in this test was Panrai) AD-5503 manufactured by Kijin Kasei Co., Ltd., as in Example 1. Rotation speed 00 ORP M
, 30 K II in the band at recording frequency I M II z
Table 3 shows the CNR measured by the amount of laser transmission using the Faraday effect at z. The results showed that the CNR of 1f1 was better for the substrate annealed at a temperature higher than the glass transition point.

表−3、基板アニール条件 と光記録媒体のCNR 尚本発明は、実施例に示す密行貼り合せ構造のみならず
、エアーサンドイッヂ(1カ造の光記録媒体にも適用す
る事が可能である。記録媒体としては、光磁気記録媒体
NdDyFeCoTiを実施例で示したが、T b F
 c CO% G d T b F c 、、 ?F全
ての光磁気記録媒体に適用するツ■ができる。又相差態
形記録媒体についても適用可能である。
Table 3: Substrate annealing conditions and CNR of optical recording medium The present invention can be applied not only to the closely laminated structure shown in the embodiment, but also to an air sandwich (one-piece optical recording medium). As the recording medium, a magneto-optical recording medium NdDyFeCoTi was shown in the example, but T b F
c CO% G d T b F c ,, ? F) Can be applied to all magneto-optical recording media. It is also applicable to phase difference type recording media.

〔発明の効果〕〔Effect of the invention〕

光記録媒体の媒体を構成する光透過性基板の一方もしく
は両方が基板材料のガラス転移点の近傍もしくはそれ以
上の温度でアニールされる事により、基板垂直方向の屈
折率差を小さくシ、基板に斜入QJ L、たレーザー光
が基板より受ける複屈折の影響(基板ノイズ)を極力小
さくする事ができた。アニール効果としては、アニール
なし°品よりも4〜5d13.120°Cアニール品と
比較して2〜3dL3CNRを改善する事ができた。又
、本発明によるアニールでは長期耐候性試験の後もCN
Rの値に変化はなく安定したC N Rのl1ilを示
していた。
By annealing one or both of the optically transparent substrates constituting the optical recording medium at a temperature close to or higher than the glass transition point of the substrate material, the difference in refractive index in the direction perpendicular to the substrates can be reduced and The effect of birefringence (substrate noise) on the angled laser beam from the substrate can be minimized as much as possible. As for the annealing effect, it was possible to improve the CNR by 2 to 3 dL3CNR compared to the product annealed at 120°C and 4 to 5d13 compared to the product without annealing. Furthermore, in the annealing according to the present invention, even after a long-term weathering test, CN
There was no change in the R value, indicating stable C N R l1il.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)は、本発明の光記録媒体の構造断面図 第1図(b)は、第1図(a)の詳細槽12図第2図(
a)は、本発明の完配ti媒体の構造断面図 第2図(b)は、第2図(a)の詳細溝造図第3m1(
a)は、本発明の完配LA媒体の構造断面図 第3図(b)は、第3図(a)の詳細構造図以」二 出願人 セイコーエプソン株式会社 代理人 弁理士 最 上  務 他1名慄1図(b) /l!J3珈ト)
FIG. 1(a) is a cross-sectional view of the structure of the optical recording medium of the present invention. FIG. 1(b) is a detailed view of the tank 12 in FIG. 1(a).
a) is a structural sectional view of the fully distributed Ti medium of the present invention. FIG. 2(b) is a detailed groove structure diagram of FIG.
a) is a cross-sectional view of the structure of the complete LA medium of the present invention; FIG. 3(b) is a detailed structural view of FIG. 1 Horror 1 Figure (b) /l! J3 koto)

Claims (1)

【特許請求の範囲】[Claims] 光学的手法を用いて情報を記録再生する光記録媒体の製
造方法において、媒体の構成する光透過性基板の一方又
は両方が基板材料のガラス転移点の近傍(±10℃)、
もしくはそれ以上温度で一度又は複数回熱処理されてい
る事を特徴とする光記録媒体の製造方法。
In a method of manufacturing an optical recording medium for recording and reproducing information using an optical method, one or both of the light-transmitting substrates constituting the medium are near the glass transition point of the substrate material (±10 ° C.),
A method for producing an optical recording medium, characterized in that the medium is heat-treated once or multiple times at a temperature higher than or equal to that temperature.
JP1755687A 1987-01-28 1987-01-28 Production of optical recording medium Pending JPS63184943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1755687A JPS63184943A (en) 1987-01-28 1987-01-28 Production of optical recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1755687A JPS63184943A (en) 1987-01-28 1987-01-28 Production of optical recording medium

Publications (1)

Publication Number Publication Date
JPS63184943A true JPS63184943A (en) 1988-07-30

Family

ID=11947189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1755687A Pending JPS63184943A (en) 1987-01-28 1987-01-28 Production of optical recording medium

Country Status (1)

Country Link
JP (1) JPS63184943A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276897A2 (en) * 1987-01-30 1988-08-03 Canon Kabushiki Kaisha Process for producing substrate for optical disk by annealing substrate with gradient double refraction distribution
JPS63220439A (en) * 1987-03-09 1988-09-13 Fujitsu Ltd Production of magneto-optical disk
JPH01159846A (en) * 1987-12-17 1989-06-22 Fujitsu Ltd Production of magneto-optical disk
JPH02101655A (en) * 1988-10-06 1990-04-13 Fuji Photo Film Co Ltd Production of magneto-optical recording medium
WO2004105014A1 (en) * 2003-05-23 2004-12-02 Fujitsu Limited Magneto-optical recording medium, manufacturing method thereof, and magneto-optical recording device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0276897A2 (en) * 1987-01-30 1988-08-03 Canon Kabushiki Kaisha Process for producing substrate for optical disk by annealing substrate with gradient double refraction distribution
JPS63220439A (en) * 1987-03-09 1988-09-13 Fujitsu Ltd Production of magneto-optical disk
JPH01159846A (en) * 1987-12-17 1989-06-22 Fujitsu Ltd Production of magneto-optical disk
JPH02101655A (en) * 1988-10-06 1990-04-13 Fuji Photo Film Co Ltd Production of magneto-optical recording medium
WO2004105014A1 (en) * 2003-05-23 2004-12-02 Fujitsu Limited Magneto-optical recording medium, manufacturing method thereof, and magneto-optical recording device

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