JPS63173382U - - Google Patents
Info
- Publication number
- JPS63173382U JPS63173382U JP6719187U JP6719187U JPS63173382U JP S63173382 U JPS63173382 U JP S63173382U JP 6719187 U JP6719187 U JP 6719187U JP 6719187 U JP6719187 U JP 6719187U JP S63173382 U JPS63173382 U JP S63173382U
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- raw materials
- sieve screen
- sieve
- raw
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002994 raw material Substances 0.000 claims description 10
Landscapes
- Combined Means For Separation Of Solids (AREA)
- Disintegrating Or Milling (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6719187U JPS63173382U (th) | 1987-05-01 | 1987-05-01 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6719187U JPS63173382U (th) | 1987-05-01 | 1987-05-01 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63173382U true JPS63173382U (th) | 1988-11-10 |
Family
ID=30905875
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6719187U Pending JPS63173382U (th) | 1987-05-01 | 1987-05-01 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63173382U (th) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1987
- 1987-05-01 JP JP6719187U patent/JPS63173382U/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |