JPS63173244A - Manufacture of information recording master disk - Google Patents

Abstract

PURPOSE:To increase the positional accuracy of a pattern by exposing with a high energy beam, while applying a tracking by a recessed part formed by a resist applied onto a recessed pattern, thereafter, forming anew resist pattern by a development, and subsequently, bringing the exposed surface of a base material to etching. CONSTITUTION:A resist 1 is applied onto a base material 4, and subsequently, it is exposed by a high energy beam and brought to a development processing, by which the fine pattern of the resist 1 is formed. Thereafter, it is brought to an etching processing, the pattern is formed on the base material 4 itself, and subsequently, the resist 1is peeled off from the base material 4 by a peeling liquid, and thereafter, with respect to this base material 4, the same process as the foregoing is executed. In that case, at the time of exposure, the position accuracy is produced by executing an exposure, while applying a tracking by using a resist surface pattern on a base material pattern formed by a first etching or the pattern of the surface of the base material, as a guiding groove. In such a way, an information recording master disk having a pattern to which groove depth is different is obtd.

Description

[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing an information recording master disc.

[Conventional technology] Conventionally, information recording master discs (stampers) such as video discs, etc.
was typically formed as shown in FIG. That is, a glass plate 2 coated with photoresist 1a (see Fig.
a)) A laser beam is used to record an uneven shape corresponding to information signals, etc. to form a prototype.b) From this prototype, master 3a (C) and mother 3b (d) are successively reproduced by electrolytic plating or electroless plating. Then, the electroforming mold 3c was completed by performing another duplication by plating.

There is also a method in which a photoresist is directly coated on a substrate, a pattern is formed there using a laser beam, and then the outer surface of the substrate is etched.

[Problem that the invention attempts to solve] The former method had the following drawbacks.

(1) Resist coating unevenness affects the groove depth of the pattern of the finished product.

(2) Highly accurate transferability is required in each process.

(3) Plating requires a long time.

(4) Durability is limited because the mold is plated.

In the latter method, (5) etching can only be performed once to produce grooves with a constant depth.

(6) If patterning and etching are performed twice, the pattern position accuracy will deteriorate.

The object of the present invention is to provide a method for manufacturing an information recording master disc that not only eliminates these drawbacks, particularly the drawback (6), but also reduces manufacturing costs.

[Means for Solving the Problems] The first invention that achieves the above object is (a) forming a resist pattern by exposing a resist coated on a base material to a high energy beam and then developing it. Next, etching the exposed surface of the substrate to form a concave pattern; (b) peeling off the resist and applying new resist to the surface of the substrate; and (C) etching the top of the concave pattern. After exposure with a high-energy beam while tracking in the recesses formed by the resist coated on the substrate, the resist is developed to form a new resist pattern. This is a method for manufacturing an information recording master disc, which includes the steps of forming different patterns and then peeling off the resist. The second invention is based on the method (b) and the following of the above method: ``After exposure with a high-energy beam while tracking with a concave pattern, development is performed to form a new resist pattern, and then the exposed surface of the base material is This is a manufacturing method that replaces the step of etching the resist to form a pattern with a groove depth different from that of the pattern, and then peeling off the resist. Naturally, patterns with various groove depths can be formed by appropriately repeating the process according to the present invention.

Hereinafter, each embodiment of the present invention will be described based on the drawings. FIG. 1 is a process diagram showing the first rice of the present invention. In this embodiment, first, the resist 1 is placed on the base material 4.
As the base material 4 for coating (a), a base material with mold durability can be used. An example! -L TesUs, KN, W
e, TiN, 5i02, At 203.

There are positive type and negative type photoresists, which are representative of the resist 1, and both can be used in the present invention, but the negative type is used in the wood embodiment.

Next, a fine pattern of the resist 1 is formed by exposing and developing with a high energy beam (for example, a laser beam) (b). After that, this base material on which the fine pattern is provided is subjected to an etching process, and the base material is etched. A pattern is formed on the material 4 itself (C).

Etching methods include dry etching and wet etching. As a dry etching method, for example, when the base material 4 is TiN and the resist 1 is a positive resist (for example, Hoechst AZ1370), RIE (reactive etching) using a reactive gas CF4 can be typically used. By this method, etching of the base material 4 and the resist 1 proceed at the same etch rate.

On the other hand, as a wet etching method, for example, when the base material 4 is TiN and the resist 1 is an alkali-soluble one, such as a positive type resist, a method using an acidic etching solution such as HF can be typically adopted. This method gives good results. When using other materials for the base material 4 and the resist 1, an appropriate method may be adopted.

Next, the resist) l is removed from the base material 4 using a stripping solution d), and then the above (a) to (d) are applied to the base material 4.
) is carried out ((e) to (gL), in which case, during exposure, the resist surface pattern on the base material pattern formed by the first etching or the pattern on the base material surface is formed into a guide groove. Positional accuracy is achieved by exposing while tracking. In other words,
As shown in FIG. 1(e), due to the unevenness formed in the first etching, an uneven pattern is also generated on the surface of the resist 1' provided by the second coating. For example, by using a leNe laser, the base material 4 is moved in the left and right direction while detecting the unevenness of the base material 4 to achieve positional accuracy, and at the same time, for example,
Perform a second exposure with the r laser.

In this way, an information recording master having patterns with different groove depths can be obtained.

A second embodiment of the present invention is shown in FIG.

In this method, after the first groove formation ((a) to (C)), the already formed groove is used as a tracking groove without removing the resist 1.

A second exposure for groove formation is performed. After that, a second groove is formed by developing (d) and then etching (e).In this case, dry etching is better than wet etching in the first etching due to the condition of the resist, sensitivity, etc. Good results can be obtained because there are few changes. Finally, the resist is peeled off (f).

In addition to the effects described below, such a method has the following advantages: only one resist application is required, and tracking accuracy is particularly improved.

[Effects of the Invention] According to the present invention as explained above, - Manufacturing time is short because no plating process is required. - Highly durable materials can be selected, so the finished product can be manufactured using plating. It is more durable than a mold, can form patterns with two or more groove depths, has high positional accuracy, and is highly durable, resulting in lower mold costs per product. It also costs less.

[Brief explanation of the drawing]

Fig. 1 is a process diagram of an embodiment of the first invention, Fig. 2 is a process diagram of an embodiment of the second invention, and Fig. 3 is a second exposure of the embodiment shown in Fig. 1. FIG. 4 is a diagram showing the manufacturing process of a conventional information recording master disk in detail. 1 Resist 1a: Photoresist 2 Glass base material 3a, 3b, 3c: Plating mold 4: Base material Patent applicant Canon Co., Ltd. Agent Tadashi Wakabayashi Figure 1

Claims (1)

[Claims] 1) A resist pattern is formed by exposing a resist coated on a substrate to a high-energy beam and then developing it;
a step of etching the exposed surface of the base material to form a concave pattern; a step of peeling off the resist and applying a new resist to the surface of the base material; and a concavity formed by the resist applied on the concave pattern. After exposure with a high-energy beam while tracking, a new resist pattern is formed by development, and then the exposed surface of the substrate is etched to form a pattern with a groove depth different from the previous pattern, and then the resist is removed. 1. A method for manufacturing an information recording master disc, comprising a step of peeling. 2) A resist pattern is formed by exposing and developing the resist coated on the base material with a high energy beam, and then
The process involves etching the exposed surface of the substrate to form a concave pattern, exposing it to a high-energy beam while tracking the concave pattern, developing it to form a new resist pattern, and then etching the exposed surface of the substrate. A method of manufacturing an information recording master comprising the steps of etching to form a pattern having a groove depth different from the pattern, and then peeling off the resist.