JPS63172160A - Manufacturing device for electrophotographic sensitive body - Google Patents

Manufacturing device for electrophotographic sensitive body

Info

Publication number
JPS63172160A
JPS63172160A JP323087A JP323087A JPS63172160A JP S63172160 A JPS63172160 A JP S63172160A JP 323087 A JP323087 A JP 323087A JP 323087 A JP323087 A JP 323087A JP S63172160 A JPS63172160 A JP S63172160A
Authority
JP
Japan
Prior art keywords
coating liquid
coating
cylindrical conductive
film
gap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP323087A
Other languages
Japanese (ja)
Inventor
Naohisa Hinata
日南田 尚久
Kenichi Hara
健一 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP323087A priority Critical patent/JPS63172160A/en
Publication of JPS63172160A publication Critical patent/JPS63172160A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/05Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
    • G03G5/0525Coating methods

Abstract

PURPOSE:To reduce the amount of coating liquid to be used and to uniformize film thickness and film property by forming a photosensitive layer thin film with the coating liquid on the outside peripheral surface of a cylindrical conductive base body provided with a mechanism which relatively moves a supporting body and a coating jig in the perpendicular direction while relatively rotating them around the same axis. CONSTITUTION:A cylindrical conductive base body 1 is perpendicularly supported on a supporting body 13, and a coating jig 3 is arranged so as to form a gap 5 on the outside peripheral surface 2 of the base body 1, and a coating liquid 7 is sent from a coating liquid supply part 8 to a reception part 6 of the coating jig 3, and the coating liquid 7 is supplied to the gap 5 from the reception part 7, and a rotating and moving mechanism is operated to rotate and move the cylindrical conductive base body 1, thereby forming a photosensitive layer thin film 14 on the outside peripheral surface 2. Thus, the amount of used coating liquid is considerably reduced, and ultrasonic oscillation is applied to the coating liquid to form the photosensitive layer thin film whose film thickness and film property are more uniform.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は円筒状導電性基体上に感光層薄膜を形成して感
光体を製造する電子写真用感光体製造装置に係り、特に
塗布液の使用量を低減でき、かつ均一な膜厚、膜質の感
光層薄膜を形成し得る電子写真用感光体製造装置に関す
る。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to an electrophotographic photoreceptor manufacturing apparatus for manufacturing a photoreceptor by forming a thin photosensitive layer on a cylindrical conductive substrate, and particularly relates to The present invention relates to an electrophotographic photoreceptor manufacturing apparatus that can reduce the amount used and can form a thin photosensitive layer with uniform thickness and quality.

〔従来の技術〕[Conventional technology]

物体の表面に機能性膜に形成する手段として従来、塗布
手段が知られており、この代表的な方法としてはけ塗り
やスプレーガン塗装が挙げられ゛るこの塗装は膜厚10
8m以上の膜を得るには優れた方法である。
Conventionally, coating means have been known as a means of forming a functional film on the surface of an object, and representative methods include brush painting and spray gun painting.This coating has a film thickness of 10
This is an excellent method for obtaining a film of 8 m or more.

従来、機能性膜としては、例えば下地物体の色を隠蔽す
るための顔料を含有する塗膜や下地物体の水や気体によ
るさびを防止するための塗膜のように、所定の機能を果
たすために比較的厚い膜厚の場合が多く、その膜形成に
は塗装は非常に有効な手段であった。
Traditionally, functional films have been used to perform specific functions, such as coatings containing pigments to hide the color of the underlying object, and coatings to prevent the underlying object from rusting due to water or gas. In many cases, the film is relatively thick, and painting is an extremely effective means of forming such a film.

近年、磁気記録媒体と磁気ヘッドとの接触保護膜、電子
写真用感光体の怒光層、プリント基板のフランクス塗布
やIC基板へのレジスト塗布など、従来に比較してより
薄膜が要求され、がっ所定の機能を有する膜が必要とな
ってきた。
In recent years, thinner films have been required for applications such as contact protection films between magnetic recording media and magnetic heads, photoreceptor layers for electrophotographic photoreceptors, Franks coating for printed circuit boards, and resist coating for IC boards. Membranes with specific functions have become necessary.

この種の膜は基体上でその機能が均一であることが要求
されるが、より一層薄膜になっているため、従来は問題
にならなかったわずかな膜厚のばらつきがその機能の大
幅な低下を引き起こすことになる。そのため、従来のは
け塗りやスプレーガン塗装は適用できず、より均一な膜
厚を得ることの可能なスピンコード法やディ7ピング法
が用いられている。
This type of film is required to have uniform functionality on the substrate, but because it is becoming thinner, even slight variations in film thickness, which were not a problem in the past, can significantly reduce its functionality. This will cause Therefore, conventional brush coating and spray gun coating cannot be applied, and spin-coding and dipping methods are used, which can obtain a more uniform film thickness.

しかし、スピンコード法は高速回転の駆動系を必要とし
、塗膜を形成すべき気体表面の面積が広い場合とか、表
面の形状が複雑な場合には塗布が困難あるいは不可能と
なるので、ディッピング法が広く用いられてきた。
However, the spin code method requires a high-speed rotation drive system, and coating is difficult or impossible when the gas surface area on which the coating film is to be formed is large or the surface shape is complex. The law has been widely used.

ディッピング法は機能性材料を有機溶媒中に溶解あるい
は分散させ、場合によってはさらに粘着側、可塑剤など
を添加して塗布液として塗布液槽に充填し、その塗布液
中に基体を浸漬せしめ、次いで基体を引き上げて乾燥さ
せ、塗膜を形成する方法であって、簡便であり、しかも
塗布液の粘度、基体の塗布液からの引き上げ速度を調節
することにより比較的節単に薄膜を得ることができる。
In the dipping method, a functional material is dissolved or dispersed in an organic solvent, and in some cases, an adhesive agent, a plasticizer, etc. are added, and a coating solution is filled into a coating solution tank, and the substrate is immersed in the coating solution. This is a simple method in which the substrate is then pulled up and dried to form a coating film. Moreover, by adjusting the viscosity of the coating solution and the rate at which the substrate is lifted from the coating solution, a thin film can be obtained relatively easily. can.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、このディッピングによる塗布方法ははけ塗りや
スプレーガンによる方法と異なり、まず塗膜形成面上に
あらかじめ所望の塗布液量よりも余分に塗布し、その後
重力により規定の塗布液量まで減少させる過剰アプリケ
ーション系(後計量系)の塗布方法であるため、規定の
塗布液量以上の塗布液を必要とする。この余分の塗布液
量は塗布面積に比例して増大し、塗布面積が大きくなる
と大量の余分の塗布液を塗布液槽に充填しておくことが
必要であった。また、有機溶媒として例えば、テトラヒ
ドロフラン、ベンゼン、トルエン、メチルエチルケトン
、1.2ジクロルエタンなどの比較的沸点が低いものを
用いた場合、溶媒の蒸発により塗布液の粘度が変化し、
塗膜の膜厚が変わってくるが、分散系塗布液では均一な
分散塗布膜が得られなくなり、塗布液の充分な管理が必
要となる。また、塗布中の溶媒蒸発により塗布液に浸漬
後、引き上げる際、基体の下部になる程塗膜が厚くなる
が、このような上下の膜厚の不均一を補正するために基
体の上下を逆にして二度塗布することが必要となること
もしばしば起きている。
However, this dipping coating method is different from brushing or spray gun methods; first, an excess amount of coating liquid is applied on the surface where the coating film is to be formed in advance, and then the amount of coating liquid is reduced to the specified amount by gravity. Since this is an excessive application type (post-metering type) coating method, it requires a coating liquid in an amount greater than the specified amount. This amount of extra coating liquid increases in proportion to the coating area, and as the coating area increases, it is necessary to fill the coating liquid tank with a large amount of extra coating liquid. Furthermore, when using an organic solvent with a relatively low boiling point, such as tetrahydrofuran, benzene, toluene, methyl ethyl ketone, or 1.2 dichloroethane, the viscosity of the coating solution changes due to evaporation of the solvent.
Although the thickness of the coating film changes, a uniform dispersed coating film cannot be obtained with a dispersion coating solution, and sufficient control of the coating solution is required. Also, due to solvent evaporation during coating, when the substrate is immersed in the coating solution and then pulled up, the coating becomes thicker toward the bottom of the substrate. It often happens that it is necessary to apply two coats.

ディッピング法の場合、得られる塗膜の厚さは基体を塗
布液から引き上げる際の塗布液面に対する塗膜形成面の
相対速度に依存し、その速度が遅いほど塗膜は薄くなる
。特に基体の体積に比べて塗布液量がそれほど多くない
場合には、塗布液中に浸漬される部分の体積が異なる基
体を比べると、これらの基体を同一速度で引き上げても
、それぞれ塗膜形成面の液面に対する基体の速度は当然
ながら一定とはならないので、同じ膜厚の塗膜は得られ
ないことになる。このような場合、均一な膜厚の塗膜を
得るためには、基体の引き上げられる部分のそれぞれの
基体の体積に応じて引き上げ速度を制御するか、あるい
は基体の引き上げによる液面の低下速度が低下しないよ
うに補う塗布液補充機構を設けることが必要である。塗
布液量を基体の浸漬される部分の体積分より非常に多(
して液面変化を少なくし、その影響を防ぐことは簡便で
有効な方法であるが、必要以上に多量の塗布液を要し、
特に基体が大きい場合には実用的でない。また、薄膜を
得ようとして基体の引き上げ速度を遅くしても、基体の
塗布液に浸漬された部分の体積が液量に比べて相対的に
大きい場合には、引き上げ時の塗布液面の変動が大きく
なるので、塗布形成面の塗布液面に対する速度が速くな
り。
In the case of the dipping method, the thickness of the coating film obtained depends on the relative speed of the coating film forming surface with respect to the coating liquid surface when the substrate is pulled up from the coating solution, and the slower the speed, the thinner the coating film becomes. Especially when the amount of coating liquid is not that large compared to the volume of the substrate, when comparing substrates with different volumes of parts immersed in the coating liquid, it is found that even if these substrates are pulled up at the same speed, the coating film formation will be different for each substrate. Naturally, the speed of the substrate relative to the liquid level on the surface is not constant, so a coating film of the same thickness cannot be obtained. In such cases, in order to obtain a coating film with a uniform thickness, it is necessary to control the pulling speed according to the volume of each portion of the substrate to be lifted, or to control the rate at which the liquid level decreases due to lifting of the substrate. It is necessary to provide a coating liquid replenishment mechanism to compensate for the decrease. The amount of coating liquid is much larger than the volume of the part of the substrate to be immersed (
Although it is a simple and effective method to reduce liquid level changes and prevent their effects, it requires a larger amount of coating liquid than necessary;
This is not practical, especially when the substrate is large. In addition, even if the pulling speed of the substrate is slowed to obtain a thin film, if the volume of the part of the substrate immersed in the coating liquid is relatively large compared to the amount of liquid, fluctuations in the coating liquid level during pulling may occur. As this increases, the speed of the coating surface relative to the coating liquid level increases.

所要の厚さの薄膜が得られなくなる。所要の厚さの薄膜
を得るためにはさらに引き上げ速度を遅くするか、液量
を多くしなければならないという欠点があった。
A thin film of the required thickness cannot be obtained. There is a drawback that in order to obtain a thin film of the required thickness, the pulling speed must be further slowed down or the amount of liquid must be increased.

そこで、本発明の目的は塗布液の使用量を低減でき、か
つ均一な膜厚、膜質で円筒状導電性基板上に感光層を形
成し得る、前述の公知技術に存する欠点を排除した電子
写真用感光体製造装置を提供することにある。
SUMMARY OF THE INVENTION Therefore, an object of the present invention is to provide an electrophotographic method that eliminates the disadvantages of the above-mentioned known techniques, which can reduce the amount of coating liquid used, and form a photosensitive layer on a cylindrical conductive substrate with uniform film thickness and quality. An object of the present invention is to provide a photoreceptor manufacturing apparatus for use in photoreceptors.

〔問題点を解決するための手段〕[Means for solving problems]

前述の目的を達成するため、本発明によれば、円筒状導
電性基体を鉛直に支持する支持体と、この支持体によっ
て支持された円筒状導電性基体の外周面と対向する平行
面を有−し、この外周面と平行面との間に塗布液貯留用
間隙を形成するように前記外周面に取り巻いて配置され
たリング状の塗布治具と、前記支持体と前記塗布治具と
をこれらの同心を中心軸として相対的に回転させながら
鉛直方向に相対的に移動させる機構とを備えてなること
を特徴とする。
In order to achieve the above-mentioned object, according to the present invention, the present invention includes a support that vertically supports a cylindrical conductive substrate, and a parallel surface that faces the outer circumferential surface of the cylindrical conductive substrate supported by the support. - a ring-shaped coating jig disposed surrounding the outer circumferential surface so as to form a coating liquid storage gap between the outer circumferential surface and the parallel surface, the support body and the coating jig; It is characterized by comprising a mechanism for relatively moving these in the vertical direction while rotating them relatively about the concentric center axis.

以下、本発明を添付図面を用いて詳述する。第1図は本
発明にかかる装置の一興体例の概念的断面図であって、
円筒状導電性基体1を鉛直に支持する支持体13と、リ
ング状の塗布治具3と、前記支持体13と塗布治具3と
を相対的に回転させながら鉛直方向に移動させる回転移
動機構とを備えて構成される。
Hereinafter, the present invention will be explained in detail using the accompanying drawings. FIG. 1 is a conceptual cross-sectional view of an example of an integrated device according to the present invention,
A support 13 that supports the cylindrical conductive substrate 1 vertically, a ring-shaped coating jig 3, and a rotational movement mechanism that moves the support 13 and the coating jig 3 in the vertical direction while relatively rotating them. It is composed of:

支持体13はこれを円筒状導電性基体1の上端に嵌挿す
ることにより該円筒状導電性基体1を鉛直に支持する。
The support 13 vertically supports the cylindrical conductive base 1 by fitting it into the upper end of the cylindrical conductive base 1.

塗布治具3は導電性基体1の外周面2と対向する平行面
4を有し、この外周面2と平行面4との間に塗布液貯留
用間隙5を形成するように外周面2に取り巻いて配置さ
れる。この間隙5は所望の一定間隔Aで形成され、塗布
液貯留部5aとなる、なお、塗布治具3の上端部には後
述の塗布液供給部8より供給される塗布液7を受容し易
いようにくぼみ状の受容部6が形成され、この受容部6
に供給される塗布液7が間隙5である塗布液貯留部5a
に流入される。この間隙5は第1図に示されるように幅
A、高さBの上端ならびに下端が開放されたリング状の
間隙である。このような間隙5に塗布液7を貯留するた
めには塗布治具3の平行面4と塗布液7との間および外
周面2と塗布液7との間の剪断力を大きくし、かつ塗布
液7の表面張力を利用して間隙5の下端より塗布液7が
流失しないようにしなければならず、塗布液7の特性に
応じて間隙5の幅Aおよび高さBを適切に選ぶことが必
要である。一般的に使用される塗布液の場合、間隙5の
幅Aは0.05■1以上、1鰭以下、高さBは5鶴以上
、10cII以下であることが望ましい。
The coating jig 3 has a parallel surface 4 facing the outer circumferential surface 2 of the conductive substrate 1, and the outer circumferential surface 2 is so formed as to form a coating liquid storage gap 5 between the outer circumferential surface 2 and the parallel surface 4. placed around it. This gap 5 is formed at a desired constant interval A, and serves as a coating liquid reservoir 5a. Note that the upper end of the coating jig 3 easily receives a coating liquid 7 supplied from a coating liquid supply unit 8, which will be described later. A recessed receiving portion 6 is formed as shown in FIG.
The coating liquid 7 supplied to the gap 5 is the coating liquid reservoir 5a.
is flowing into the country. As shown in FIG. 1, this gap 5 is a ring-shaped gap with a width A and a height B open at its upper and lower ends. In order to store the coating liquid 7 in such a gap 5, the shear force between the parallel surface 4 of the coating jig 3 and the coating liquid 7 and between the outer circumferential surface 2 and the coating liquid 7 is increased, and The surface tension of the liquid 7 must be used to prevent the coating liquid 7 from flowing out from the lower end of the gap 5, and the width A and height B of the gap 5 must be appropriately selected according to the characteristics of the coating liquid 7. is necessary. In the case of commonly used coating liquids, it is desirable that the width A of the gap 5 is 0.05cm or more and 1 fin or less, and the height B of the gap 5 is 5cm or more and 10cII or less.

回転移動機構は図示されないが、円筒状導電性基体lを
この円筒の同心軸を軸として第1図の矢印のように回転
させる機構、ならびに円筒状導電性基体1を塗布治具と
の同心軸に沿って第1図の矢印に示す鉛直方向に引き上
げ、あるいは矢印とは反対方向に下降させる機構を備え
たものである。
Although the rotational movement mechanism is not shown, there is a mechanism for rotating the cylindrical conductive substrate 1 about the concentric axis of this cylinder as shown by the arrow in FIG. The device is equipped with a mechanism for raising it in the vertical direction shown by the arrow in FIG. 1 or lowering it in the opposite direction to the arrow.

鉛直方向への移動機構だけでは、円筒状導電性基体1と
塗布治具3とを完全に同心軸を一敗させて上下方向に移
動させることが困難であるため、塗膜の周方向に膜厚等
のばらつきが生じる可能性がある。そこで前記基体1と
塗布治具3とを相対的に回転させることにより塗膜の周
方向のばらつきをなくすことができる。この回転速度は
塗布液7の粘度および引き上げ速度により適宜に選択す
る。
Since it is difficult to move the cylindrical conductive substrate 1 and the coating jig 3 vertically with the concentric axis completely broken using only the vertical movement mechanism, the film is moved in the circumferential direction of the coating Variations in thickness, etc. may occur. Therefore, by rotating the substrate 1 and the coating jig 3 relative to each other, it is possible to eliminate variations in the coating film in the circumferential direction. This rotation speed is appropriately selected depending on the viscosity of the coating liquid 7 and the pulling speed.

なお、本発明はさらに、間隙5に塗布液7を供給する塗
布液供給部8を備えることもできる。この塗布液供給部
8は塗布液7の貯蔵槽9、塗布液7を塗布液貯留部5a
に供給するための供給管10、塗布液7の供給量を制御
するためのパルプ11、貯蔵されている塗布液7の粘度
変化を防ぐための気密蓋12から構成される。この塗布
液供給部8は本発明において必ずしも必要でないが、塗
布液貯留部5aの容積が小さく、貯蔵されている塗布液
量が少ないため、塗布作業中、外周面2に塗布されて減
少していく塗布液貯留5aの塗布液7を頻繁に補給しな
ければならないので、こめ様な塗布液供給部8をもうけ
ることが望ましい、さらに塗布液貯留5aは上下面が全
部大気に開放されているので、そこのある塗布液からは
溶媒が蒸発しやすく、液の粘度が変化するが、貯蔵槽9
内の塗布液は一定粘度に保たれており、そこから消費さ
れる分だけ常時塗布液を補給するようにすると、塗布時
点での塗布液の粘度の変化をなくすことになり、非常に
有効である。このような観点から塗布治具3の上端部の
受容部6の容積はなるべく小さい方が好ましく、できれ
ばこの受容部6は設けない方が良い。
Note that the present invention may further include a coating liquid supply section 8 that supplies the coating liquid 7 to the gap 5. The coating liquid supply section 8 stores the coating liquid 7 in a storage tank 9 and the coating liquid 7 in a coating liquid storage section 5a.
It is comprised of a supply pipe 10 for supplying the coating liquid 7, a pulp 11 for controlling the supply amount of the coating liquid 7, and an airtight lid 12 for preventing changes in the viscosity of the stored coating liquid 7. Although this coating liquid supply section 8 is not necessarily necessary in the present invention, since the volume of the coating liquid storage section 5a is small and the amount of stored coating liquid is small, during the coating operation, the coating liquid is applied to the outer peripheral surface 2 and reduced. Since it is necessary to frequently replenish the coating liquid 7 in the coating liquid storage 5a, it is desirable to provide a large coating liquid supply section 8.Furthermore, since the coating liquid storage 5a is entirely open to the atmosphere on its upper and lower surfaces, , the solvent tends to evaporate from the coating liquid there, and the viscosity of the liquid changes, but the storage tank 9
The coating liquid inside is kept at a constant viscosity, and if you constantly replenish the coating liquid as much as it is consumed, it will eliminate changes in the viscosity of the coating liquid at the time of application, which is very effective. be. From this point of view, it is preferable that the volume of the receiving part 6 at the upper end of the application jig 3 is as small as possible, and if possible, it is better not to provide this receiving part 6.

また、第1図では塗布液供給部8は一組示したが、特に
塗布装置が複雑な場合には複数組設けることもでき、こ
れによって前述のような塗布液の粘度変化を防ぐことが
できる。
In addition, although one set of coating liquid supply units 8 is shown in FIG. 1, multiple sets may be provided especially when the coating apparatus is complicated. This can prevent the viscosity change of the coating liquid as described above. .

〔作 用〕[For production]

上述の本発明装置は第1図に示されたように円筒状導電
性基体1を支持体13に鉛直に支持し、この基体lの外
周面2に、間隙5を形成するように塗布治具3を配置し
、この塗布治具3の受容部6に塗布液供給部8から塗布
液7を送液し、この塗布液7を受容部7から間隙5に供
給し、次いで回転移動機構を作動させて円筒状導電性基
体1を矢印のように回転しながら移動し、外周面2上に
感光層薄膜14を形成する。
As shown in FIG. 1, the apparatus of the present invention has a cylindrical conductive substrate 1 supported vertically on a support 13, and a coating jig is installed so as to form a gap 5 on the outer peripheral surface 2 of the substrate 1. 3, the coating liquid 7 is sent from the coating liquid supply part 8 to the receiving part 6 of this coating jig 3, this coating liquid 7 is supplied from the receiving part 7 to the gap 5, and then the rotation movement mechanism is operated. The cylindrical conductive substrate 1 is rotated and moved as shown by the arrow to form a photosensitive layer thin film 14 on the outer peripheral surface 2.

この感光N薄膜14の厚さは基体1と塗布治具3との相
対的な移動速度ならびに塗布液7の粘度により決定され
る。薄膜を得るためにはこの移動速度を遅くするか、塗
布液7の粘度を小さくすることが必要である。移動速度
を遅くすると成膜時間が長くなるので、あまり遅くする
ことは実用的でな(、しかも環境より影響を受ける機会
を多くなるので好ましくない。塗布液7の粘度を小さく
すると、塗布液貯留部5a(間隙5)の下の開口部より
塗布液7が流失しやすくなる。流失を防ぐためには間隙
5の幅Aを小さくし、高さBを大きくすることが必要と
なる。ところがAを小さくし、Bを大きくすると、基体
1または塗布治具3を外周面2上への塗膜形成のために
移動させるとき、機械の振動などにより基体1の外周面
2に打痕やひっかきによる傷がつくことがあるので、A
をあまり小さくすること、またBをあまり大きくするこ
とは特に感光体の基体では好ましくない。この傷を防ぐ
ために塗布治具3あるいは特に平行面4を柔軟な排水性
のポリマ一部材とすることが有効である。また、排水性
のポリマ一部材とすることにより塗布l&、7に対して
↑n水性となり、平行面4と塗布液7との剪断力が大き
くなり、Aを広くすることができるようになる。さらに
、これは治具の軽量化にもなっている。この撥水性の点
ではポリマーとしてテフロンに代表される含ふっ素ポリ
マーを用いることが望ましい。
The thickness of the photosensitive N thin film 14 is determined by the relative moving speed between the substrate 1 and the coating jig 3 and the viscosity of the coating liquid 7. In order to obtain a thin film, it is necessary to slow down this moving speed or to reduce the viscosity of the coating liquid 7. Slowing down the moving speed increases the film forming time, so it is not practical to slow it down too much (and it is also undesirable as it increases the chance of being affected by the environment.If the viscosity of the coating liquid 7 is reduced, the coating liquid will accumulate. The coating liquid 7 tends to flow away from the opening below the portion 5a (gap 5).In order to prevent this flow, it is necessary to reduce the width A and increase the height B of the gap 5.However, when A If B is made small and B is made large, when the substrate 1 or coating jig 3 is moved to form a coating film on the outer circumferential surface 2, the outer circumferential surface 2 of the substrate 1 will be damaged by dents or scratches due to machine vibrations, etc. may be added, so A
It is not preferable to make B too small or to make B too large, especially in the substrate of a photoreceptor. In order to prevent this damage, it is effective to make the coating jig 3 or especially the parallel surface 4 a flexible polymer material with drainage properties. Furthermore, by using a water-draining polymer member, the coating becomes ↑n aqueous with respect to the coating l&, 7, and the shearing force between the parallel surface 4 and the coating liquid 7 increases, making it possible to widen A. Furthermore, this also reduces the weight of the jig. In terms of water repellency, it is desirable to use a fluorine-containing polymer, such as Teflon, as the polymer.

しかし、塗布治具3をポリマーにすることは必ずしも必
要なことではなく、金属、例えばステンレス鋼であって
もよく、特に、幅Aを広くできるときには金属を用いて
何ら支障なく、平行面の表面を滑らかに加工しやすいと
いう利点もある。
However, it is not necessarily necessary to make the application jig 3 of polymer, and it may be made of metal, for example, stainless steel. In particular, when the width A can be made wide, metal can be used without any problem, and the surface of the parallel surface Another advantage is that it is easy to process smoothly.

〔実施例〕〔Example〕

大隻斑上 外径6cI11、長さ30c++のアルミニウム製円筒
状基体の鏡面加工の施された外周面上に下記の組成の塗
布液を塗布した。
A coating liquid having the following composition was applied onto the mirror-finished outer peripheral surface of an aluminum cylindrical substrate having an outer diameter of 6 cI11 and a length of 30 c++.

β型銅フタロシアニン       0.5gポリメチ
ルメタクリレート 樹脂  0.25gトルエン   
         30g第1図示の塗布装置を用い、
Aを0.1 ms、 Bを4c+1とし、円筒状導電性
基体1を9Orpmの速度で回転させながら40m/秒
の速度で引き上げ、塗布したところ、全長30cflI
にわたり0.2μm±20%の均一な膜厚の塗布膜が得
られ、使用した液量は従来のディッピング法の場合の1
%液量であった。この塗膜の形成された円筒状基体1の
外周面2上にさらに次の組成の塗布液7を塗布した。
β-type copper phthalocyanine 0.5g Polymethyl methacrylate resin 0.25g Toluene
30g using the coating device shown in the first diagram,
When A was set to 0.1 ms and B was set to 4c+1, the cylindrical conductive substrate 1 was pulled up at a speed of 40 m/sec while rotating at a speed of 9 Orpm, and the total length was 30 cflI.
A coating film with a uniform thickness of 0.2 μm ± 20% was obtained over the entire area, and the amount of liquid used was 1
% liquid volume. A coating liquid 7 having the following composition was further applied onto the outer circumferential surface 2 of the cylindrical substrate 1 on which the coating film was formed.

1−フェニル−3−(P−ジエチルアミノスチリル)−
り−(P−ジエチルアミノフェニル)=2−ピラゾリン
           ・・・0.3gポリメチルメタ
クリレート樹脂   ・・・0.2gテトラヒドロフラ
ン        ・・・5g第1図に示される塗布装
置を用い、AをQ、2am、Bを5csとし、円筒状導
電性基体1を15rpmの速度で回転させながら、51
■/秒の速度で引き上げ、塗布したところ、全長30c
mにわたり20μ±0.5μmのlll厚の均一な感光
N薄1!14が得られ、使用液量は従来のディッピング
法における量の0.1%液量であった。
1-phenyl-3-(P-diethylaminostyryl)-
Ri-(P-diethylaminophenyl)=2-pyrazoline...0.3g Polymethyl methacrylate resin...0.2g Tetrahydrofuran...5g Using the coating device shown in Figure 1, A to Q, 2am, B is 5 cs, and while rotating the cylindrical conductive substrate 1 at a speed of 15 rpm, 51
■When pulled up and applied at a speed of 30cm/second, the total length was 30cm.
A uniform photosensitive N-thin 1!14 film with a thickness of 20 μ±0.5 μm over m was obtained, and the amount of liquid used was 0.1% of the amount used in the conventional dipping method.

このようにして得られた感光体を電子写真用感光体とし
て用いたところ実用的に充分使用できるものであった。
When the thus obtained photoreceptor was used as an electrophotographic photoreceptor, it was found to be sufficiently usable for practical use.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、円筒状R電性基体の外周面と、これと
対向する塗布治具の平行面との間に形成される間隙を塗
布液貯留部として利用し、この間隙に塗布液を貯留させ
、次いで前記基体と塗布治具とを相対的に回転しつつ鉛
直方向に相対的に移動させて外周面上に塗膜を形成する
ようにしたから、従来のディッピング法の場合に、基体
を塗布液中に浸漬し、次いでこれを引き上げるとき、塗
布液の低下を防いで均一な塗膜を形成するために多量の
余分の塗布液を必要としていたが、本発明では使用する
塗布液の量を大幅に低減でき、しかも塗布液に超音波振
動を付加することにより、一層均一な膜厚、膜質の感光
層薄膜を形成できる。
According to the present invention, the gap formed between the outer circumferential surface of the cylindrical R-electroconductive substrate and the parallel surface of the coating jig opposing this is used as a coating liquid reservoir, and the coating liquid is poured into this gap. The substrate and coating jig are then relatively rotated and moved relative to each other in the vertical direction to form a coating film on the outer peripheral surface. When immersing a product in a coating solution and then pulling it out, a large amount of extra coating solution was required to prevent the coating solution from dropping and form a uniform coating film, but in the present invention, the amount of coating solution used is The amount of photosensitive layer can be significantly reduced, and by adding ultrasonic vibration to the coating liquid, a thin photosensitive layer with more uniform thickness and quality can be formed.

また、従来のディッピング法では基体を塗布液槽に浸漬
しつつ、次いで引き上げるという二方向の二工程を要し
たが、本発明では一方向に移動させるという一工程です
み、塗布工程が簡略化されるという利点も生じる。
Furthermore, while the conventional dipping method requires two steps in two directions, immersing the substrate in a coating liquid tank and then pulling it up, the present invention simplifies the coating process by requiring only one step of moving the substrate in one direction. There is also the advantage that

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明装置の一実施例を示した概念的断面図で
ある。 1・・・円筒状導電性基体、2・・・外周面、3・・・
塗布治具、4・・・平行面、5・・・間隙、5a・・・
塗布液貯留部、7・・・塗布液、8・・・塗布液供給部
、13・・・支持体、14・・・感光層薄膜
FIG. 1 is a conceptual sectional view showing an embodiment of the device of the present invention. 1... Cylindrical conductive substrate, 2... Outer peripheral surface, 3...
Application jig, 4...Parallel surface, 5...Gap, 5a...
Coating liquid storage section, 7... Coating liquid, 8... Coating liquid supply section, 13... Support, 14... Photosensitive layer thin film

Claims (3)

【特許請求の範囲】[Claims] (1)円筒状導電性基体を鉛直に支持する支持体と、こ
の支持体によって支持された円筒状導電性基体の外周面
と対向する平行面を有し、この外周面と平行面との間に
塗布液貯留用間隙を形成するように前記外周面に取り巻
いて配置されたリング状の塗布治具と、前記支持体と前
記塗布治具とをこれらの同心を中心軸として相対的に回
転させながら鉛直方向に相対的に移動させる機構とを備
えてなる円筒状導電性基体の外周面上に塗布液により感
光層薄膜を形成する電子写真用感光体製造装置。
(1) A support that supports the cylindrical conductive substrate vertically, and a parallel surface that faces the outer peripheral surface of the cylindrical conductive substrate supported by the support, and a space between the outer peripheral surface and the parallel surface. a ring-shaped coating jig disposed around the outer circumferential surface so as to form a gap for storing a coating liquid, and the support body and the coating jig are rotated relative to each other about their concentric central axes. 1. An electrophotographic photoreceptor manufacturing apparatus for forming a thin photoreceptor layer using a coating liquid on the outer circumferential surface of a cylindrical conductive substrate, which is provided with a mechanism for relatively moving the substrate in the vertical direction.
(2)特許請求の範囲第1項に記載の装置において、前
記塗布液貯留用間隙に塗布液を供給する塗布液供給部を
備えてなる電子写真用感光体製造装置。
(2) An electrophotographic photoreceptor manufacturing apparatus according to claim 1, comprising a coating liquid supply section that supplies a coating liquid to the coating liquid storage gap.
(3)特許請求の範囲第1項に記載の装置において、前
記塗布液貯留用間隙が所望の一定間隔で形成されてなる
電子写真用感光体製造装置。
(3) An electrophotographic photoreceptor manufacturing apparatus according to claim 1, wherein the coating liquid storage gaps are formed at desired constant intervals.
JP323087A 1987-01-12 1987-01-12 Manufacturing device for electrophotographic sensitive body Pending JPS63172160A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP323087A JPS63172160A (en) 1987-01-12 1987-01-12 Manufacturing device for electrophotographic sensitive body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP323087A JPS63172160A (en) 1987-01-12 1987-01-12 Manufacturing device for electrophotographic sensitive body

Publications (1)

Publication Number Publication Date
JPS63172160A true JPS63172160A (en) 1988-07-15

Family

ID=11551648

Family Applications (1)

Application Number Title Priority Date Filing Date
JP323087A Pending JPS63172160A (en) 1987-01-12 1987-01-12 Manufacturing device for electrophotographic sensitive body

Country Status (1)

Country Link
JP (1) JPS63172160A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7132125B2 (en) * 2001-09-17 2006-11-07 Xerox Corporation Processes for coating photoconductors

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029752A (en) * 1983-07-28 1985-02-15 Mita Ind Co Ltd Manufacture of organic photosensitive drum
JPS61178067A (en) * 1985-01-31 1986-08-09 Mita Ind Co Ltd Drum coating method
JPS6299754A (en) * 1985-10-28 1987-05-09 Daicel Chem Ind Ltd Continuous coating device for cylindrical object

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6029752A (en) * 1983-07-28 1985-02-15 Mita Ind Co Ltd Manufacture of organic photosensitive drum
JPS61178067A (en) * 1985-01-31 1986-08-09 Mita Ind Co Ltd Drum coating method
JPS6299754A (en) * 1985-10-28 1987-05-09 Daicel Chem Ind Ltd Continuous coating device for cylindrical object

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7132125B2 (en) * 2001-09-17 2006-11-07 Xerox Corporation Processes for coating photoconductors

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