JPS63170384A - 7alpha-substituted cephalosporin compound - Google Patents
7alpha-substituted cephalosporin compoundInfo
- Publication number
- JPS63170384A JPS63170384A JP58987A JP58987A JPS63170384A JP S63170384 A JPS63170384 A JP S63170384A JP 58987 A JP58987 A JP 58987A JP 58987 A JP58987 A JP 58987A JP S63170384 A JPS63170384 A JP S63170384A
- Authority
- JP
- Japan
- Prior art keywords
- cephem
- thiomethyl
- methyl
- tetrazol
- carboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 cephalosporin compound Chemical class 0.000 title abstract description 16
- 229930186147 Cephalosporin Natural products 0.000 title description 2
- 229940124587 cephalosporin Drugs 0.000 title description 2
- 150000002148 esters Chemical class 0.000 claims abstract description 16
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract 2
- 125000003118 aryl group Chemical group 0.000 claims abstract 2
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 42
- 239000000126 substance Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 5
- FWMUJAIKEJWSSY-UHFFFAOYSA-N sulfur dichloride Chemical compound ClSCl FWMUJAIKEJWSSY-UHFFFAOYSA-N 0.000 claims description 3
- SNBUBQHDYVFSQF-HIFRSBDPSA-N cefmetazole Chemical compound S([C@@H]1[C@@](C(N1C=1C(O)=O)=O)(NC(=O)CSCC#N)OC)CC=1CSC1=NN=NN1C SNBUBQHDYVFSQF-HIFRSBDPSA-N 0.000 abstract description 4
- 229960003585 cefmetazole Drugs 0.000 abstract description 4
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000463 material Substances 0.000 abstract 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 57
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 42
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- 239000013078 crystal Substances 0.000 description 9
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 239000000047 product Substances 0.000 description 6
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 5
- RSGBMGFQNOGIPC-UHFFFAOYSA-N (4-methylphenyl) thiohypochlorite Chemical compound CC1=CC=C(SCl)C=C1 RSGBMGFQNOGIPC-UHFFFAOYSA-N 0.000 description 4
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- 239000000284 extract Substances 0.000 description 4
- 229910001385 heavy metal Inorganic materials 0.000 description 4
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 4
- 235000019341 magnesium sulphate Nutrition 0.000 description 4
- 238000010898 silica gel chromatography Methods 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 3
- 229910052794 bromium Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- ZPWVASYFFYYZEW-UHFFFAOYSA-L dipotassium hydrogen phosphate Chemical compound [K+].[K+].OP([O-])([O-])=O ZPWVASYFFYYZEW-UHFFFAOYSA-L 0.000 description 3
- DDCYYCUMAFYDDU-UHFFFAOYSA-N methyl thiohypochlorite Chemical compound CSCl DDCYYCUMAFYDDU-UHFFFAOYSA-N 0.000 description 3
- JWUKZUIGOJBEPC-UHFFFAOYSA-N phenyl thiohypochlorite Chemical compound ClSC1=CC=CC=C1 JWUKZUIGOJBEPC-UHFFFAOYSA-N 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- 101150041968 CDC13 gene Proteins 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N DMSO Substances CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- XBPCUCUWBYBCDP-UHFFFAOYSA-N Dicyclohexylamine Chemical compound C1CCCCC1NC1CCCCC1 XBPCUCUWBYBCDP-UHFFFAOYSA-N 0.000 description 2
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 2
- 238000004440 column chromatography Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- 150000003949 imides Chemical class 0.000 description 2
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 2
- 238000006198 methoxylation reaction Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 2
- 125000006239 protecting group Chemical group 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000004299 tetrazol-5-yl group Chemical group [H]N1N=NC(*)=N1 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- ASGIQPRGHDBJBR-XCGJVMPOSA-N (6r)-4-[(1-methyltetrazol-5-yl)sulfanylmethyl]-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound CN1N=NN=C1SCC1C=C(C(O)=O)N2C(=O)C[C@H]2S1 ASGIQPRGHDBJBR-XCGJVMPOSA-N 0.000 description 1
- IKWLIQXIPRUIDU-ZCFIWIBFSA-N (6r)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylic acid Chemical compound OC(=O)C1=CCS[C@@H]2CC(=O)N12 IKWLIQXIPRUIDU-ZCFIWIBFSA-N 0.000 description 1
- 125000006283 4-chlorobenzyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1Cl)C([H])([H])* 0.000 description 1
- 239000005973 Carvone Substances 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- WAVQOKDKPHYRDY-GOSISDBHSA-N benzhydryl (6r)-8-oxo-5-thia-1-azabicyclo[4.2.0]oct-2-ene-2-carboxylate Chemical compound C([C@H]1SCC=2)C(=O)N1C=2C(=O)OC(C=1C=CC=CC=1)C1=CC=CC=C1 WAVQOKDKPHYRDY-GOSISDBHSA-N 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 238000010531 catalytic reduction reaction Methods 0.000 description 1
- 238000004040 coloring Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 101150024031 dio3 gene Proteins 0.000 description 1
- ZZVUWRFHKOJYTH-UHFFFAOYSA-N diphenhydramine Chemical group C=1C=CC=CC=1C(OCCN(C)C)C1=CC=CC=C1 ZZVUWRFHKOJYTH-UHFFFAOYSA-N 0.000 description 1
- 125000005982 diphenylmethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000004372 methylthioethyl group Chemical group [H]C([H])([H])SC([H])([H])C([H])([H])* 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- CHKVPAROMQMJNQ-UHFFFAOYSA-M potassium bisulfate Chemical compound [K+].OS([O-])(=O)=O CHKVPAROMQMJNQ-UHFFFAOYSA-M 0.000 description 1
- 229910000343 potassium bisulfate Inorganic materials 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- KOODSCBKXPPKHE-UHFFFAOYSA-N propanethioic s-acid Chemical compound CCC(S)=O KOODSCBKXPPKHE-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005185 salting out Methods 0.000 description 1
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 125000002221 trityl group Chemical group [H]C1=C([H])C([H])=C([H])C([H])=C1C([*])(C1=C(C(=C(C(=C1[H])[H])[H])[H])[H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、セフメタゾールの新規製造方法、そのための
有用な中間体及びその製造方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a new method for producing cefmetazole, a useful intermediate therefor, and a method for producing the same.
−従来、セファロスポリン化合物の7α置換基をメトキ
シ基へ変換する方法としては、塩素又は臭素及びメタノ
ールを用いろ方法(特開昭49−42689号)、タリ
ウム、ビスマス、鉛等の重金属とメタノールを用いる方
法(特開昭50−52084号)、N−ハロゲノカルボ
ン酸イミド又はN−ハロゲノカルボン酸アミドとメタノ
ールを用いる方法(特開昭53−79892号)が知ら
れている。- Conventionally, methods for converting the 7α substituent of a cephalosporin compound into a methoxy group include a method using chlorine or bromine and methanol (Japanese Patent Application Laid-Open No. 49-42689), a method using heavy metals such as thallium, bismuth, lead, etc., and methanol. A method using N-halogenocarboxylic acid imide or N-halogenocarboxylic acid amide and methanol (Japanese Patent Application Laid-Open No. 53-79892) is known.
試薬として塩素又は臭素及びメタノールを用いる方法て
は、塩素や臭素が腐蝕性、刺戟性や毒性が強く、取り扱
いが容易でないことと、反応の安定性を保つためには反
応温度を一80°ないし一25°Cという強冷下て行イ
つなければならず、工業的規模での実施は設備に多額の
費用を要する。In methods using chlorine or bromine and methanol as reagents, chlorine and bromine are highly corrosive, irritating, and toxic, making them difficult to handle, and in order to maintain reaction stability, the reaction temperature must be kept at 180° or above. The process must be carried out under strong cooling at -25°C, and implementation on an industrial scale requires a large amount of equipment.
試薬としてタリウム、ビスマス、鉛等の重金属とメタノ
ールを用いる方法では、環境汚染の恐れのある重金属を
用いなければならないことと、7α位への選択性が悪く
、分離精製の困難な7β−メトキン体かかなりの量副生
じてしまう。The method using methanol and heavy metals such as thallium, bismuth, and lead as reagents requires the use of heavy metals that may pollute the environment, and has poor selectivity to the 7α position, making it difficult to separate and purify the 7β-methquine. However, a considerable amount of side effects are generated.
活性化剤としてN−ハロゲノカルボン酸イミド又はN−
ハロゲノカルボン酸アミドとメタノールを用いる方法で
は、前記重金属とメタノールを用いる方法よりは7α位
への選択性は良いが、この選択性はある程度温度に依存
しており、厳密な温度管理のもとに反応を行わないと収
率の低下をきたす。又、反応中にンリカゲルカラムクロ
マトでも脱色不可能な着色をきたす。N-halogenocarboxylic acid imide or N-
The method using halogenocarboxylic acid amide and methanol has better selectivity to the 7α position than the method using heavy metals and methanol, but this selectivity is dependent on temperature to some extent and must be carried out under strict temperature control. If the reaction is not carried out, the yield will be reduced. Furthermore, during the reaction, coloring occurs that cannot be removed even with licage gel column chromatography.
本発明のメトキシ化は、厳密な温度管理下でなくと乙7
α位への選択性が非常に優れ、環境汚染などの可能性の
ある試薬を使うこともなく、又、特別な設備や工場を必
要とすることもなく、高収率でのメトキシ化を提供ずろ
ことにある。The methoxylation of the present invention must be carried out under strict temperature control.
It has excellent selectivity to the α-position, and provides methoxylation in high yields without using reagents that may pollute the environment, and without requiring special equipment or factories. It's right there.
上記技術状況に鑑み、本発明者らは種々検討を加え、本
発明の出発物質である7α−置換−7−アミノ−3−(
I−メチル−114−テトラゾール−5−イル)チオメ
チル−3−セフェム−4−カルボン酸又はその塩、もし
くはそのエステルの合成時に用いたスルフェニルクロリ
ド類を試薬として用いることにより、本発明を完成さけ
るに至った。In view of the above-mentioned technical situation, the present inventors conducted various studies, and the starting material of the present invention, 7α-substituted-7-amino-3-(
The present invention is accomplished by using as a reagent the sulfenyl chlorides used in the synthesis of I-methyl-114-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid, its salt, or its ester. reached.
本発明は、一般式
(式中、Rは置換又は非置換のアリール基、低級アルキ
ル基を意味する。)
で表わされる7α−置換−7−アミノ−3−(I−メヂ
ルーIH−テトラゾールー5−イル)チオメチル−3−
セフェム−4−カルボン酸又はその塩、もしくはそのエ
ステルにシアノメチルチオ酢酸又はその反応性誘導体を
反応させて、一般式
(式中、Rは前記と同じ意味を有する。)て表わされろ
7α−置換−7−ツアノメチルチオアセチルアミへ3−
(l−メチル川I」−テトラゾール−5−イル)チオメ
チル−3−セフェム−4−カルボン酸又はその塩、もし
くはそのエステルを得、この化合物をスルフェニルクロ
リド及びメタノールと反応させて、セフメタゾール又は
その塩、もしくはそのエステルの製造方法に関するしの
である。The present invention provides 7α-substituted-7-amino-3-(I-medy-IH-tetrazole-5- yl)thiomethyl-3-
Cephem-4-carboxylic acid, a salt thereof, or an ester thereof is reacted with cyanomethylthioacetic acid or a reactive derivative thereof to obtain a compound represented by the general formula (wherein R has the same meaning as above), 7α-substituted- 3- to 7-tuanomethylthioacetylamide
(l-methyl-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid or a salt thereof, or an ester thereof is obtained, and this compound is reacted with sulfenyl chloride and methanol to obtain cefmetazole or its This article relates to a method for producing salts or esters thereof.
本発明の目的物である7α−置換−7−ジアツメチルチ
オアセチルアミノー3−(1−メチル−IH−テトラゾ
ール−5−イル)チオメチル−3−セフェム−4−カル
ボン酸又はその塩、もしくはそのエステルはいずれも新
規化合物である。7α-substituted-7-diazmethylthioacetylamino-3-(1-methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid or a salt thereof, which is the object of the present invention. All esters are new compounds.
本発明で用いるスルフェニルクロリドとしては、本発明
の出発物質である7α−置換−7−アミ/−3−(1−
メチル−1旧テトラゾール−5−イル)チオメチル−3
−セフェム−4−カルボン酸又はその塩、もしくはその
エステルの合成時に用いたメタンスルフェニルクロリド
、フェニルスルフェニルクロリド、p−トリルスルフェ
ニルクロリド等が好ましく、特にp−トリルスルフェニ
ルクロリドが最も適している。The sulfenyl chloride used in the present invention includes 7α-substituted-7-ami/-3-(1-
Methyl-1 (formerly tetrazol-5-yl)thiomethyl-3
Methanesulfenyl chloride, phenylsulfenyl chloride, p-tolylsulfenyl chloride, etc. used in the synthesis of -cephem-4-carboxylic acid, its salt, or its ester are preferred, and p-tolylsulfenyl chloride is particularly suitable. There is.
本発明で出発物質に用いる塩としては、普通に用いられ
る塩基性物質が用いる溶媒との関係で選択して利用出来
、カルボキノ保護基としては一般に用いられるエステル
型保護基が普通に使用出来るが、保護物質のその後の反
応条件によって反応中に切断されない基が好ましい。例
えば、接触還元によって除去出来る基としてはベンジル
基、フェナシル基、p−クロロベンジル基、p−ニトロ
ベンノル基、0−シアノベンジル基の如きペンノル基類
及びピコリル基を、酸処理で除去し得る基としては、ジ
フェニルメチル基の他t−ブチル基、トリチル基、トリ
メチルベンジル括、ペンタメチルベンジル基などを、又
、アルカリ処理で除去し得る基としてはメチル基、β−
メチルチオエチル基、フタルイミドメチル基、ノクロベ
ンチル基など、又、加水分解で除去しうるしのとしてト
リメチルノリル基などの置換シリル基を主として用いる
ことかできる。As the salt used as the starting material in the present invention, commonly used basic substances can be selected depending on the solvent used, and as the carboquino protecting group, commonly used ester type protecting groups can be used. Groups that are not cleaved during the reaction by the subsequent reaction conditions of the protecting substance are preferred. For example, as groups that can be removed by catalytic reduction, pennol groups such as benzyl group, phenacyl group, p-chlorobenzyl group, p-nitrobenol group, and 0-cyanobenzyl group, and picolyl group can be removed by acid treatment. In addition to diphenylmethyl group, t-butyl group, trityl group, trimethylbenzyl group, pentamethylbenzyl group, etc., and groups that can be removed by alkali treatment include methyl group, β-
A methylthioethyl group, a phthalimidomethyl group, a noclobentyl group, etc., and a substituted silyl group such as a trimethylnoryl group, which can be removed by hydrolysis, can be mainly used.
次に、実施例により本発明を更に詳細に説明する。本発
明は、これによって何ら限定されるものではない。Next, the present invention will be explained in more detail with reference to Examples. The present invention is not limited to this in any way.
実施例1
ノアツメチルチオ酢酸0.98g及びピリノン0.59
gを塩化メチレン2mlに加え、更に水冷下、オキン塩
化リン0.68m1を加え15分間攪拌しfこ。この溶
液を、7−アミノ−7α−フェニルチオ−3−(l−メ
チル−I H−テトラブール−5−イル)チオメチル−
3−セフェム−4−カルボン酸ベンズヒドリルエステル
3.01g1塩化メチレンloml、及びN、N−ジェ
ヂルアニリン2.43m1の溶液に滴下し、水冷下1時
間20分攪拌した。反応終了後、反応液を濃縮し、酢酸
エチル及び水で分液した。水層を更に酢酸エチルで分液
し、最初の酢酸エチル層と合わせ3%硫酸水素カリウム
水溶液で2回、5%リン酸水素二カリウム水溶液で4回
、飽和食塩水で順次洗浄後、硫酸マグネシウム乾燥した
。ろ過濃縮後、ノリカゲル力ラムクロマトにて精製し、
7−ジアツメチルチオアセチルアミノー7α−フェニル
チオ−3−(1−メチル−11−1−テトラゾール−5
−イル)チオメチル−3,セフェム−4−カルボン酸ベ
ンズヒドリルエステルの淡黄色結晶3.34gを得た。Example 1 Noatu methylthioacetic acid 0.98g and pyrinone 0.59g
g was added to 2 ml of methylene chloride, and under water cooling, 0.68 ml of phosphorus chloride was added and stirred for 15 minutes. This solution was mixed with 7-amino-7α-phenylthio-3-(l-methyl-I H-tetrabul-5-yl)thiomethyl-
The mixture was added dropwise to a solution of 3.01 g of 3-cephem-4-carboxylic acid benzhydryl ester and 1 loml of methylene chloride and 2.43 ml of N,N-jedylaniline, and stirred for 1 hour and 20 minutes under water cooling. After the reaction was completed, the reaction solution was concentrated and separated between ethyl acetate and water. The aqueous layer was further separated with ethyl acetate, combined with the first ethyl acetate layer, washed twice with a 3% aqueous potassium hydrogen sulfate solution, four times with a 5% aqueous dipotassium hydrogen phosphate solution, and saturated brine, and then washed with magnesium sulfate. Dry. After filtration and concentration, purification using Norica gel column chromatography,
7-Diazmethylthioacetylamino-7α-phenylthio-3-(1-methyl-11-1-tetrazole-5
3.34 g of pale yellow crystals of benzhydryl)thiomethyl-3,cephem-4-carboxylic acid ester were obtained.
IR(KBr): 1780.1720.1680.
1380cm”
NMRδ(CDC13): 3.23.3.35(dd
S J=17Hz12H)、3.31(s、2)i)、
3.67(s、21−D、3.81(813ト■)、
4 24 、 4.4 2(dd、 J =
1 3Hz、2H)、4.98(sSIf−D、6
.94(s、IH)、6.95(s、l)[)、 7
.2 〜7.6(m、 l 51()実施例2
実施例1の方法において、7−アミノづα−フェニルチ
オ−3(1メチル−IH−テトラゾール−5−イル)チ
オメチル−3−セフェム−4−カルボン酸ベンズヒドリ
ルエステルの代りに、7−アミだ7 a−(−4−メチ
ルフェニル)チオ−3−(l−メチル−IH−テトラゾ
ール−5−イル)チオメチル−3−セフェム−4−カル
ボン酸ベンズヒドリルエステルを用い、他は同様の操作
を行い、7−シアノメチルチオアセチルアミ/−7α−
(4−メチルフェニル)ヂオー3〜(l−メチル−目4
−テトラゾールー5−イル)チオメチル−3−セフェム
−4−プJルポン酸ヘンズヒドリルエステルの淡黄色結
晶3.28gを得た。IR(KBr): 1780.1720.1680.
1380cm” NMRδ (CDC13): 3.23.3.35 (dd
S J=17Hz12H), 3.31(s,2)i),
3.67 (s, 21-D, 3.81 (813 t■),
4 24 , 4.4 2 (dd, J =
1 3Hz, 2H), 4.98 (sSIf-D, 6
.. 94 (s, IH), 6.95 (s, l) [), 7
.. 2 to 7.6 (m, l 51 ()) Example 2 In the method of Example 1, 7-aminodα-phenylthio-3(1methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4 - instead of carboxylic acid benzhydryl ester, 7-amida7a-(-4-methylphenyl)thio-3-(l-methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-carvone Using acid benzhydryl ester and performing the same procedure, 7-cyanomethylthioacetylamide/-7α-
(4-methylphenyl)dio3~(l-methyl-4)
3.28 g of pale yellow crystals of henzhydryl ester of -tetrazol-5-yl)thiomethyl-3-cephem-4-pJ luponate were obtained.
IR(KBr): I 780.1720,168O
S 1380cm−’NMRδ(CDC13): 2
.33(s、3H)、3.23.3.35(dd、 、
J = 17 Hz、 2 H)、3.31(s、2
H)、3.67(s。IR(KBr): I 780.1720,168O
S 1380cm-'NMRδ (CDC13): 2
.. 33 (s, 3H), 3.23.3.35 (dd, ,
J = 17 Hz, 2 H), 3.31 (s, 2
H), 3.67 (s.
2■D、3.81(s、3H)、424.4.42(a
d、 、、r =13 Hz、 2 H)、4.9
8(s、LH)、6.94(s、IH)、7.0〜7.
6(m、l 4H)
実在例3
7−ツアノメチルヂオアセチルアミ/−7α−(−1−
メチルフェニル)ヂオー3−(l−メチル−L H−テ
トラゾール−5−イル)チオメチル−3−セフェム−・
1−カルボン酸ベンズヒドリルエステル365mgを塩
化メチレン1ml及びニトロメタン1mlに溶解後、水
冷下、アニソール170mg及び塩化アルミニウム+0
0mg含有ニドコメタン1mlを加え、同温度で1時間
攪拌した。次いて、酢酸エチル9Tll及びINN塩酸
7m合加え30分攪拌後、酢酸エチル層をとり、IN塩
酸及び水で洗浄し、lO%リン酸水素二カリウム水溶液
100m1で2回抽出した。抽出液を合わせ、IN塩酸
にて1)Hlとし、酢酸エチル抽出、水洗、硫酸マグネ
シウム乾燥、ろ過a6後、塩化メチレンで結晶化させ、
7−シアツメチルチオアセヂルアミノー7α−(4−メ
チルフェニル)チオ−3−(l−メチル−1)1−テト
ラゾール−5−イル)ヂオメヂルー3−セフェムー4−
カルボン酸222mgを得た。2■D, 3.81 (s, 3H), 424.4.42 (a
d, ,, r = 13 Hz, 2 H), 4.9
8 (s, LH), 6.94 (s, IH), 7.0-7.
6(m,l 4H) Real example 3 7-tuanomethyldioacetylamide/-7α-(-1-
methylphenyl)di-3-(l-methyl-L H-tetrazol-5-yl)thiomethyl-3-cephem-・
After dissolving 365 mg of 1-carboxylic acid benzhydryl ester in 1 ml of methylene chloride and 1 ml of nitromethane, 170 mg of anisole and aluminum chloride +0 were added under water cooling.
1 ml of nidokomethane containing 0 mg was added and stirred at the same temperature for 1 hour. Next, 9 Tll of ethyl acetate and 7 m of INN hydrochloric acid were added, and the mixture was stirred for 30 minutes. The ethyl acetate layer was taken, washed with IN hydrochloric acid and water, and extracted twice with 100 ml of 1O% dipotassium hydrogen phosphate aqueous solution. The extracts were combined and diluted with 1) H1 with IN hydrochloric acid, extracted with ethyl acetate, washed with water, dried with magnesium sulfate, filtered with A6, and crystallized with methylene chloride.
7-cyazmethylthioacedylamino7α-(4-methylphenyl)thio-3-(l-methyl-1)1-tetrazol-5-yl)diomedyru-3-cephemu4-
222 mg of carboxylic acid was obtained.
m、p ・ 83〜86℃
IR(KBr): 3440.1780.1720、
I b 80αm−’NMRδ (d、−DMSO)
: 2.3 3(s、3 ト■)、 3.
40(s、2H)、3.45(d、 J = 17
Hz、 l H)、3.60(d、J=171(z、
l I−()、3.72(s、2H)、3.92(
s、3H)、4.23(dS J=13Hz、IH)1
.1.38(d、J=13Hz、IH)、5.12(s
、 I H)、7 、20 (d、 J = 91
1z。m, p ・83-86℃ IR (KBr): 3440.1780.1720,
I b 80αm-'NMRδ (d, -DMSO)
: 2.3 3(s, 3 ト■), 3.
40 (s, 2H), 3.45 (d, J = 17
Hz, lH), 3.60(d, J=171(z,
l I-(), 3.72(s, 2H), 3.92(
s, 3H), 4.23 (dS J=13Hz, IH) 1
.. 1.38 (d, J=13Hz, IH), 5.12 (s
, I H), 7, 20 (d, J = 91
1z.
2H)、 7.4 0d、 J=9Hz、
2 ト1)実施例4
C113
7−ツアノメチルチオアセチルアミノー7α−(,1−
メチルフェニ1し)チオ−3−(1−メチル−I Ll
−テトラゾール−5−イル)千丁メチル、3−セフェム
−4−カルボン酸ベンズヒドリルエステル109mgを
メタノール1ml及び塩化メチレン0.5mlに溶解後
、水冷下、フェニルスルフェニルクロリド26mgの塩
化メチレン溶液(塩化メチレン0.5mlに溶解)を加
え1時間攪拌した。濃縮後、シリカゲルカラムクロマト
にて精製し、7−シアンメチルチオアセチルアミノ−7
α−メトキン−3−(1−メチル−I H−テトラゾー
ル−5−イル)チオメチル−3−セフェム−4−カルボ
ン酸ベンズヒドリルエステルの無色結晶80mgを得た
。2H), 7.4 0d, J=9Hz,
2 1) Example 4 C113 7-tuanomethylthioacetylamino-7α-(,1-
Methylphenyl 1)thio-3-(1-methyl-I Ll
After dissolving 109 mg of benzhydryl ester of 3-cephem-4-carboxylic acid (tetrazol-5-yl) in 1 ml of methanol and 0.5 ml of methylene chloride, a solution of 26 mg of phenylsulfenyl chloride in methylene chloride (methylene chloride (dissolved in 0.5 ml) and stirred for 1 hour. After concentration, it was purified using silica gel column chromatography to obtain 7-cyanmethylthioacetylamino-7.
80 mg of colorless crystals of α-methquin-3-(1-methyl-I H-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid benzhydryl ester were obtained.
I R(KBr) : 2275.1780.1720
.1680cm−’NMRδ(CDCl2): 3.4
7(s、2H)、3.54(s、2H)、3.58(s
、3H)、3.65(s、2H)、3.85(s、3H
)、4.2B、4.48(dd、 J=14Hz、2l
−I)、5 、09 (s。IR(KBr): 2275.1780.1720
.. 1680cm-'NMRδ(CDCl2): 3.4
7 (s, 2H), 3.54 (s, 2H), 3.58 (s
, 3H), 3.65 (s, 2H), 3.85 (s, 3H)
), 4.2B, 4.48 (dd, J=14Hz, 2l
-I), 5, 09 (s.
IH)、6.93(s、 I I()、7.2〜7.
6(m、I OH)実施例5
(4)−−→(6)
7−ジアツメチルチオアセチルアミノー7α−(4−メ
チルフェニル)チオ−3−(l−メチル−IH−テトラ
ゾール−5−イル)チオメチル−3−セフェム−4−カ
ルボン酸ベンズヒドリルエステル109mgをメタノー
ル1ml及び塩化メチレン0.5mlに溶解後、水冷下
、メタンスルフェニルクロリド19mgの塩化メチレン
溶液(塩化メチレン0,5mlに溶解)を加え1.5時
間攪拌した。更に、メタンスルフェニルクロリド25m
gの塩化メチレン溶液(塩化メチレン0.5mlに溶解
)を加え、30分間攪拌した。−晩冷蔵庫に放置後、濃
縮、シリカゲルカラムクロマトにて精製し、7−ジアツ
メチルチオアセチルアミノー7α−メトキン−3−(1
−メチル−114−テトラゾール−5−イル)チオメチ
ル−3−セフェム−4−カルボン酸ベンズヒドリルエス
テルの無色結晶71mgを得た。この生成物は、実施例
4の生成物と同一のIRSNMRスペクトル値を示し1
こ。IH), 6.93(s, II(), 7.2-7.
6(m,IOH) Example 5 (4)--→(6) 7-Diazmethylthioacetylamino-7α-(4-methylphenyl)thio-3-(l-methyl-IH-tetrazole-5- After dissolving 109 mg of benzhydryl thiomethyl-3-cephem-4-carboxylic acid in 1 ml of methanol and 0.5 ml of methylene chloride, a solution of 19 mg of methanesulfenyl chloride in methylene chloride (dissolved in 0.5 ml of methylene chloride) was prepared under water cooling. was added and stirred for 1.5 hours. Furthermore, methanesulfenyl chloride 25m
g of methylene chloride solution (dissolved in 0.5 ml of methylene chloride) was added and stirred for 30 minutes. - After leaving in the refrigerator overnight, it was concentrated and purified by silica gel column chromatography.
-Methyl-114-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid benzhydryl ester (71 mg) was obtained. This product showed the same IRS NMR spectral values as the product of Example 4 and 1
child.
実施例6
(2)−−→(6)
7−ジアツメチルチオアセチルアミノー7α−フェニル
チオ−3−(1メチル−IH−テトラゾール−5−イル
)チオメチル−3−セフェム−4−カルボン酸ベンズヒ
ドリルエステル358mgをメタノール3ml及び塩化
メチレン2mlに溶解後、水冷下、p−t−リルスルフ
ェニルクロリド119mgの塩化メチレン溶液(塩化メ
チレン2mlに溶解)を加え1時間攪拌した。次いでプ
ロピレンオキサイド1mlを加えしばらく攪拌後、濃縮
、シリカゲルカラムクロマトにて精製し、7−ジアツメ
チルチオアセチルアミノー7α−メトキシ−3−(l−
メチル−I l−1−テトラゾール−5−イル)チオメ
チル−3−セフェム−4−カルボン酸ベンズヒドリルエ
ステルの無色結晶293mgを得た。この生成物は、実
施例4の生成物と同一のIRSNMRスペクトル値を示
した。Example 6 (2)--→(6) 7-diazmethylthioacetylamino-7α-phenylthio-3-(1methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid benzhydride After dissolving 358 mg of polyester in 3 ml of methanol and 2 ml of methylene chloride, a methylene chloride solution of 119 mg of pt-lylsulfenyl chloride (dissolved in 2 ml of methylene chloride) was added under water cooling, and the mixture was stirred for 1 hour. Next, 1 ml of propylene oxide was added and after stirring for a while, it was concentrated and purified by silica gel column chromatography to give 7-diazmethylthioacetylamino-7α-methoxy-3-(l-
293 mg of colorless crystals of methyl-I l-1-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid benzhydryl ester were obtained. This product showed the same IRS NMR spectral values as the product of Example 4.
実施例7
(2)−−→(6)
実施例6の方法において、p−トリルスルフェニルクロ
リド+19111gの代りに、フェニルスルフェニルク
ロリド87mgを用い、他は同様の操作を行い、7−シ
アンメチルチオアセチルアミノ−7α−メトキシ−3−
(l−メチル−IH−テトラゾール−5−イル)チオメ
チル−3−セフェム−4−カルボン酸ベンズヒドリルエ
ステルの無色結晶307mgを得た。この生成物は、実
施例4の生成物と同一のrR,NMRスペクトル値を示
した。Example 7 (2)--→(6) In the method of Example 6, 87 mg of phenylsulfenyl chloride was used instead of p-tolylsulfenyl chloride + 19111 g, and the other operations were the same, and 7-cyanmethylthio Acetylamino-7α-methoxy-3-
307 mg of colorless crystals of (l-methyl-IH-tetrazol-5-yl)thiomethyl-3-cephem-4-carboxylic acid benzhydryl ester were obtained. This product showed the same rR, NMR spectral values as the product of Example 4.
実施例8
CH3
7−シアンメチルチオアセチルアミノ〜7α−メチルチ
オ−3−(1メチル−IM−テトラゾール−5−イル)
チオメチル−3−セフェム−4−カルボン酸ベンズヒド
リルエステル262mgをメタノール2ml及び塩化メ
チレン1mlに溶解後、水冷下、p〜トリルスルフェニ
ルクロリド78mgの塩化メチレン溶液(塩化メチレン
1mlに溶解)を加え1時間攪拌した。次いて、プロピ
レンオキサイド0.5mlを加えしばらく攪拌後、濃縮
、シリカゲルカラムクロマトにて精製し、7−シアンメ
チルチオアセチルアミノ−7α−メトキシ−3〜(l−
メチル−IH−テトラゾール−5−イル)チオメチル−
3−セフェム−4−プJルボン酸ベンズヒドリルエステ
ルの無色結晶254mgを得た。Example 8 CH3 7-cyanmethylthioacetylamino-7α-methylthio-3-(1 methyl-IM-tetrazol-5-yl)
After dissolving 262 mg of thiomethyl-3-cephem-4-carboxylic acid benzhydryl ester in 2 ml of methanol and 1 ml of methylene chloride, a methylene chloride solution of 78 mg of p~tolylsulfenyl chloride (dissolved in 1 ml of methylene chloride) was added under water cooling for 1 hour. Stirred. Next, 0.5 ml of propylene oxide was added and after stirring for a while, it was concentrated and purified by silica gel column chromatography.
Methyl-IH-tetrazol-5-yl)thiomethyl-
254 mg of colorless crystals of 3-cephem-4-pJ carboxylic acid benzhydryl ester were obtained.
実施例9
CHs
7−シアノメチルチオアセヂルアミノー7α−(4−メ
チルフェニル)チオ−3−(l−メチル〜1)T−テト
ラゾール−5−イル)チオメチル−3−セフェム−4−
カルボン酸1.126gをアセトニトリル10m1に溶
解後、BSAo、5mlを加え、水冷下1時間攪拌した
。次いで水冷下、p−トリルスルフェニルクロリド50
7mgのアセトニトリル溶液(アセトニトリル2mlに
溶解)を加えた。この溶液を、水冷下ジシクロヘキシル
アミン1.08g含有メタノール溶液20m1に15分
間かけて加え、同温度で1時間攪拌した。減圧下溶媒留
去後、酢酸エチル20m1及び水20m1を加え、6N
塩酸にて1)Hl、5とし、塩析するまで塩化ナトリウ
ムを加え、30分間攪拌後、析出沈殿をろ別した。Example 9 CHs 7-cyanomethylthioacedylamino-7α-(4-methylphenyl)thio-3-(l-methyl-1)T-tetrazol-5-yl)thiomethyl-3-cephem-4-
After dissolving 1.126 g of carboxylic acid in 10 ml of acetonitrile, 5 ml of BSAo was added and stirred for 1 hour under water cooling. Then, under water cooling, p-tolylsulfenyl chloride 50
7 mg of acetonitrile solution (dissolved in 2 ml of acetonitrile) was added. This solution was added over 15 minutes to 20 ml of a methanol solution containing 1.08 g of dicyclohexylamine under water cooling, and stirred at the same temperature for 1 hour. After distilling off the solvent under reduced pressure, 20 ml of ethyl acetate and 20 ml of water were added, and 6N
1) H1 was adjusted to 5 with hydrochloric acid, sodium chloride was added until salting out, and after stirring for 30 minutes, the precipitate was filtered off.
酢酸エチル層を分離し、再度酢酸エチルで2回抽出した
。抽出液を合わせ、飽和食塩水洗、硫酸マグネシウム乾
燥、ろ過、濃縮後、アセトニトリル4mlに溶解し、ジ
シクロヘキシルアミン0.3gを加え、−夜冷蔵庫に放
置した。析出結晶をろ取、アセトニトリル、イソプロピ
ルエーテルで順次洗浄し、7−ジアツメチルチオアセチ
ルアミノー7α−メトキン−3−(1−メチル−IH−
テトラゾール−5−イル)チオメチル−3−セフェム−
4−カルボン酸ジンクロヘキンルアミン塩の無色結晶0
.89gを得た。The ethyl acetate layer was separated and extracted twice with ethyl acetate again. The extracts were combined, washed with saturated saline, dried over magnesium sulfate, filtered and concentrated, then dissolved in 4 ml of acetonitrile, 0.3 g of dicyclohexylamine was added, and the mixture was left in the refrigerator overnight. The precipitated crystals were collected by filtration and washed successively with acetonitrile and isopropyl ether to give 7-diazmethylthioacetylamino-7α-methquin-3-(1-methyl-IH-
Tetrazol-5-yl)thiomethyl-3-cephem-
Colorless crystals of 4-carboxylic acid dichlorohequinylamine salt 0
.. 89g was obtained.
m、p、 ・ 152℃
IR(KBr) 二 1770 、 l 685、1
6 0 0cm−’NMRδ(da−DMSO):
l 、0〜2.0(m、20H)、3.05(ml
2トI)、 3.25(d、 J=18Hz、 I
H)、 3.40(s。m, p, 152℃ IR (KBr) 2 1770, l 685, 1
600cm-'NMRδ(da-DMSO):
l, 0-2.0 (m, 20H), 3.05 (ml
2tI), 3.25(d, J=18Hz, I
H), 3.40 (s.
3H)、3.48(S、2H)、3.60(dl J=
18Hz、IH)3.75(s、2■])、3.92(
s、3H)、4.30(s、2H)、4.98(s、I
I()、9.00(bs、 L H)、9.50(s
、IH)参煮例
CR3
7−シアノメチルチオアセチルアミノー7α−メトキシ
−3−(1−メチルーIH−テトラゾールー5−イル)
チオメチル−3−セフェム−4−カルボン酸ヘンズヒド
リルエステル0.32g及びアニソール0.17gを塩
化メヂレン2mlに溶解後、水冷攪拌下、塩化アルミニ
ウムのニトロメタン溶液にトロメタン1mlに溶解)を
滴下し、同温度で30分間攪拌した。次いで室温下、酢
酸エチル9ml及びIN塩酸6mlを加えて攪拌し、不
溶物が完全に溶解後、酢酸エチル層をとり、水洗し、l
O%リン酸水素二カリウム水溶液で2回抽出した。抽出
液を合わせ、酢酸エチル洗浄、6N塩酸にて1)Hlと
し、塩化ナトリウムで塩析後、酢酸エチル抽出、飽和食
塩水洗、硫酸マグネシウム乾燥、ろ過少、酢酸エチルを
留去、残渣にトルエンを加え留去し、セフメタゾールの
無色結晶210mgを得た。3H), 3.48 (S, 2H), 3.60 (dl J=
18Hz, IH) 3.75 (s, 2 ■]), 3.92 (
s, 3H), 4.30 (s, 2H), 4.98 (s, I
I (), 9.00 (bs, L H), 9.50 (s
, IH) Sanni Example CR3 7-cyanomethylthioacetylamino-7α-methoxy-3-(1-methyl-IH-tetrazol-5-yl)
After dissolving 0.32 g of thiomethyl-3-cephem-4-carboxylic acid henzhydryl ester and 0.17 g of anisole in 2 ml of methylene chloride, a solution of aluminum chloride (dissolved in 1 ml of tromethane) was added dropwise to a nitromethane solution of aluminum chloride with stirring under water cooling, and the mixture was heated at the same temperature. The mixture was stirred for 30 minutes. Next, at room temperature, 9 ml of ethyl acetate and 6 ml of IN hydrochloric acid were added and stirred. After the insoluble matter was completely dissolved, the ethyl acetate layer was taken, washed with water, and
Extracted twice with 0% dipotassium hydrogen phosphate aqueous solution. Combine the extracts, wash with ethyl acetate, make 1) H1 with 6N hydrochloric acid, salt out with sodium chloride, extract with ethyl acetate, wash with saturated brine, dry magnesium sulfate, filter, remove ethyl acetate, and add toluene to the residue. The residue was added and distilled off to obtain 210 mg of colorless crystals of cefmetazole.
Claims (1)
ル基を意味する。) で表わされる化合物又はその塩、もしくはそのエステル
(2)一般式 ▲数式、化学式、表等があります▼ (式中、Rは前記と同じ意味を有する。) で表わされる化合物又はその塩、もしくはそのエステル
にシアノメチルチオ酢酸又はその反応性誘導体を反応さ
せることを特徴とする、一般式 ▲数式、化学式、表等があります▼ (式中、Rは前記と同じ意味を有する。) で表わされる化合物又はその塩、もしくはそのエステル
の製造方法 (3)一般式 ▲数式、化学式、表等があります▼ (式中、Rは前記と同じ意味を有する。) で表わされる化合物又はその塩、もしくはそのエステル
をスルフェニルクロリド及びメタノールと反応させるこ
とを特徴とする、式 ▲数式、化学式、表等があります▼ で表わされる化合物又はその塩、もしくはそのエステル
の製造方法[Claims] (1) A compound or a salt thereof represented by the general formula ▲ Numerical formula, chemical formula, table, etc. ▼ (In the formula, R means a substituted or unsubstituted aryl group or lower alkyl group.) or its ester (2) General formula ▲ There are mathematical formulas, chemical formulas, tables, etc. There are general formulas ▲mathematical formulas, chemical formulas, tables, etc.▼ (in the formula, R has the same meaning as above), or a salt thereof, or an ester thereof, which is characterized by reacting reactive derivatives. Manufacturing method (3) Reacting a compound represented by the general formula ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ (In the formula, R has the same meaning as above.) or a salt thereof, or an ester thereof, with sulfenyl chloride and methanol. A method for producing a compound, a salt thereof, or an ester thereof, represented by the formula ▲There are mathematical formulas, chemical formulas, tables, etc.▼, which is characterized by the following:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58987A JPS63170384A (en) | 1987-01-07 | 1987-01-07 | 7alpha-substituted cephalosporin compound |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58987A JPS63170384A (en) | 1987-01-07 | 1987-01-07 | 7alpha-substituted cephalosporin compound |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63170384A true JPS63170384A (en) | 1988-07-14 |
Family
ID=11477914
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58987A Pending JPS63170384A (en) | 1987-01-07 | 1987-01-07 | 7alpha-substituted cephalosporin compound |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63170384A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007161047A (en) * | 2005-12-13 | 2007-06-28 | Mazda Motor Corp | Mounting structure for vehicular resin panel member and mounting method |
JP2008162413A (en) * | 2006-12-28 | 2008-07-17 | Mitsubishi Motors Corp | Resin fender mounting structure |
CN102875577A (en) * | 2011-07-14 | 2013-01-16 | 山东睿鹰先锋制药有限公司 | Cefminox impurity D and preparation method thereof |
-
1987
- 1987-01-07 JP JP58987A patent/JPS63170384A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007161047A (en) * | 2005-12-13 | 2007-06-28 | Mazda Motor Corp | Mounting structure for vehicular resin panel member and mounting method |
JP2008162413A (en) * | 2006-12-28 | 2008-07-17 | Mitsubishi Motors Corp | Resin fender mounting structure |
CN102875577A (en) * | 2011-07-14 | 2013-01-16 | 山东睿鹰先锋制药有限公司 | Cefminox impurity D and preparation method thereof |
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