JPS63162702A - Resin for optics - Google Patents
Resin for opticsInfo
- Publication number
- JPS63162702A JPS63162702A JP30868486A JP30868486A JPS63162702A JP S63162702 A JPS63162702 A JP S63162702A JP 30868486 A JP30868486 A JP 30868486A JP 30868486 A JP30868486 A JP 30868486A JP S63162702 A JPS63162702 A JP S63162702A
- Authority
- JP
- Japan
- Prior art keywords
- group
- resin
- substituted
- formula
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000011347 resin Substances 0.000 title claims abstract description 37
- 229920005989 resin Polymers 0.000 title claims abstract description 37
- 230000003287 optical effect Effects 0.000 claims abstract description 27
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 6
- -1 (substituted) phenyl Chemical group 0.000 claims abstract description 5
- 150000001733 carboxylic acid esters Chemical group 0.000 claims abstract 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 125000002947 alkylene group Chemical group 0.000 claims description 4
- 125000003368 amide group Chemical group 0.000 claims description 4
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000002560 nitrile group Chemical group 0.000 claims description 4
- 125000005843 halogen group Chemical group 0.000 claims description 3
- 239000000126 substance Substances 0.000 claims description 2
- 238000005979 thermal decomposition reaction Methods 0.000 abstract description 16
- 239000012986 chain transfer agent Substances 0.000 abstract description 7
- 239000000178 monomer Substances 0.000 abstract description 3
- 150000001408 amides Chemical class 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000002825 nitriles Chemical class 0.000 abstract 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 12
- 230000014759 maintenance of location Effects 0.000 description 12
- 238000010438 heat treatment Methods 0.000 description 9
- 229920000642 polymer Polymers 0.000 description 7
- 229910052757 nitrogen Inorganic materials 0.000 description 6
- 238000001746 injection moulding Methods 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000006116 polymerization reaction Methods 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- DHBXNPKRAUYBTH-UHFFFAOYSA-N 1,1-ethanedithiol Chemical compound CC(S)S DHBXNPKRAUYBTH-UHFFFAOYSA-N 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- 125000003262 carboxylic acid ester group Chemical group [H]C([H])([*:2])OC(=O)C([H])([H])[*:1] 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 125000004185 ester group Chemical group 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- OWHSTLLOZWTNTQ-UHFFFAOYSA-N 2-ethylhexyl 2-sulfanylacetate Chemical compound CCCCC(CC)COC(=O)CS OWHSTLLOZWTNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000004198 2-fluorophenyl group Chemical group [H]C1=C([H])C(F)=C(*)C([H])=C1[H] 0.000 description 1
- KSNKQSPJFRQSEI-UHFFFAOYSA-N 3,3,3-trifluoropropanoic acid Chemical group OC(=O)CC(F)(F)F KSNKQSPJFRQSEI-UHFFFAOYSA-N 0.000 description 1
- 125000001255 4-fluorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1F 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical group CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical group CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- IYABWNGZIDDRAK-UHFFFAOYSA-N allene Chemical group C=C=C IYABWNGZIDDRAK-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical group C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 1
- ALPIESLRVWNLAX-UHFFFAOYSA-N hexane-1,1-dithiol Chemical compound CCCCCC(S)S ALPIESLRVWNLAX-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 125000004492 methyl ester group Chemical group 0.000 description 1
- SNVLJLYUUXKWOJ-UHFFFAOYSA-N methylidenecarbene Chemical compound C=[C] SNVLJLYUUXKWOJ-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 230000004580 weight loss Effects 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
Description
【発明の詳細な説明】
〈産業上の利用分野〉
本発明は光学用樹脂、詳しくは重合体の機械物性、光学
特性や溶融流動特性に優れ、溶融成型加工時の耐熱分解
性に優れた光学用樹脂に関する。[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to optical resins, specifically, optical resins that have excellent mechanical properties, optical properties, and melt flow characteristics of polymers, and have excellent thermal decomposition resistance during melt molding processing. Regarding resin for use.
〈従来の技術〉
一般にポリメタクリル酸メチルやポリスチレンに代表さ
れるラジカル重合性光学用樹脂は、透明性に優れている
他に、軽量で加工性および大量生産性に優れている点か
ら近年光ファイバ、光学ディスク、光学レンズ等への需
要が拡大しつつある。<Prior art> Radically polymerizable optical resins, typically represented by polymethyl methacrylate and polystyrene, have been used in optical fibers in recent years due to their excellent transparency, light weight, and excellent processability and mass productivity. Demand for optical discs, optical lenses, etc. is increasing.
これらのラジカル重合性光学用樹脂のＩＩＪ Ｎ方法と
しては、溶液重合もしくは塊状重合にて樹脂を得た後溶
融割出成型する方法が一般的である。The IIJN method for producing these radically polymerizable optical resins is generally to obtain the resin by solution polymerization or bulk polymerization and then melt index molding.
しかし、従来の光学用樹脂では溶融射出成型時の加熱重
量保持率に代表される耐熱分解性が十分でない。そのた
め成型品の機械強度や透光性等の物性値の十分なものが
１ｑられず、更には、割出成型機シリンダ及び金型に熱
分解物が堆積しやすいため、成型品の加工寸法、精度も
劣るという問題があった。However, conventional optical resins do not have sufficient thermal decomposition resistance, typified by heating weight retention during melt injection molding. As a result, the molded product does not have sufficient physical properties such as mechanical strength and translucency, and furthermore, pyrolysis products tend to accumulate on the index molding machine cylinder and mold, so the processing dimensions of the molded product, There was also the problem of poor accuracy.
これらの改善としては非２置換型ビニル七ノマどの凡手
合法が提案されているが、その際には、機械強度や熱変
型温度の低下が問題となる。更には、重合過程中に連鎖
移動定数の大きい物質を共存させ、停止反応時のポリマ
分子末端二重結合を減少させる方法も提案されているが
、ポリマ分子末端の二重結合の減少だけでは十分に高い
耐熱分解性は得られない。To improve these, common techniques such as non-disubstituted vinyl hexanomers have been proposed, but in this case, problems arise such as a decrease in mechanical strength and thermal deformation temperature. Furthermore, a method has been proposed in which a substance with a large chain transfer constant coexists during the polymerization process to reduce the double bonds at the end of the polymer molecule during the termination reaction, but it is not enough to reduce the double bonds at the end of the polymer molecule. High heat decomposition resistance cannot be obtained.
〈発明が解決しようとする問題点〉
本発明者らはかかる従来の状況に鑑み、溶融射出成型時
の加熱重量保持率に代表される耐熱分解性の優れた光学
用樹脂を開発するべく鋭意検討した結末、本発明におり
るラジカル重合性光学用樹脂の熱分解はポリマ分子末端
からの七ツマ解離により進行し、その際にはポリマ末端
分子の原子間結合解離エネルギーを高める構造体を導入
することによって耐熱分解性を著しく向上させ得ること
を児いだし本発明に至った。<Problems to be Solved by the Invention> In view of the conventional situation, the present inventors have conducted intensive studies to develop an optical resin that has excellent thermal decomposition resistance as represented by heating weight retention during melt injection molding. As a result, thermal decomposition of the radically polymerizable optical resin according to the present invention proceeds by dissociation from the terminal end of the polymer molecule, and at this time, a structure is introduced that increases the dissociation energy between the atoms of the terminal molecule of the polymer. The inventors have discovered that the thermal decomposition resistance can be significantly improved by doing this, and have thus arrived at the present invention.
本発明の目的はかかる従来品の欠点である溶融射出成型
時の加熱重量保持率に代表される耐熱分解性を向上させ
たラジカル重合性光学用樹脂を提供するにある。The object of the present invention is to provide a radically polymerizable optical resin that has improved thermal decomposition resistance, typified by heating weight retention during melt injection molding, which is a disadvantage of conventional products.
く問題点を解決するための手段〉 本発明は次の構成を有する。Means to solve problems〉 The present invention has the following configuration.
下記（Ｉ）式で表わされる構造単位を０．０７〜２重量
％含有することを特徴とする光学用樹脂。An optical resin characterized by containing 0.07 to 2% by weight of a structural unit represented by the following formula (I).
Ｙ Ｙ
（（■）式中 Ｒは炭素数１から１８までの第１級、第
２級、第３級アルキレン基を、Ｘは水素原子、ハロゲン
原子、メチル基のいずれかを、Ｙは炭素数１から１８ま
でのカルボン酸エステル基もしくはハロゲン置換力゛ル
ボン酸エステル基、フェニル基もしくは置換フェニル基
、ニトリル基、アミド基もしくはＮ＠換アミド基のいず
れかをそれぞれ表わす）
以下本発明の構成を詳しく説明する。Y Y ((■) In the formula, R is a primary, secondary, or tertiary alkylene group having 1 to 18 carbon atoms, X is a hydrogen atom, a halogen atom, or a methyl group, and Y is a carbon The structure of the present invention is as follows will be explained in detail.
本発明において光学用樹脂とは、ポリメタクリル酸メチ
ル、ポリスチレン等に代表されるラジカル活性種によっ
て重合成長反応を進行させるビニル付加重合体であり、
かつ光ファイバ、光ディスクに代表される光の透過また
は反射によって機能を発現する樹脂を意味する。In the present invention, the optical resin is a vinyl addition polymer that undergoes a polymerization growth reaction using radically active species, such as polymethyl methacrylate and polystyrene.
It also means a resin that functions by transmitting or reflecting light, such as in optical fibers and optical disks.
本発明における光学用樹脂は下記（Ｉ）式の構造単位を
有する。The optical resin in the present invention has a structural unit of the following formula (I).
（１）式において、Ｒは炭素数１から１８までの第１級
、第２級、第３級アルキレン基を表わし、具体例として
メチレン基、エチレン基、プロピレン基を例示すること
ができるが特に限定されるものではない。In formula (1), R represents a primary, secondary, or tertiary alkylene group having 1 to 18 carbon atoms, and specific examples include methylene, ethylene, and propylene groups, but in particular It is not limited.
又、Ｘは水素原子、ハロゲン原子、メチル基のいずれか
を表わし、水素原子、フッ素原子、メチル基が好適でお
るが、特に限定されない。Further, X represents any one of a hydrogen atom, a halogen atom, and a methyl group, and is not particularly limited, although a hydrogen atom, a fluorine atom, and a methyl group are preferable.
更にＹは炭素数１から１８までのカルボン酸エステル基
もしくはハロゲン置換カルボン酸エステル基、フェニル
基もしくは置換フェニル基、ニトリル基、アミド基もし
くはＮ置換アミド基のいずれかを表わし、具体例として
カルボン酸メチルエステル基、カルボン酸シクロヘキシ
ルエステルカルボン酸ノルマルボルニルエステル
ン酸トリフルオロエチルエステル基、カルボン酸テトラ
フルオロプロピルエステル基、フェニル基、オルソメチ
ルフェニル基、オルソフルオロフェニル基、パラメチル
フェニル基、パラフルオロフェニル基、パラクロロフェ
ニル基、ニトリル基、アミド基、Ｎジメチルアミド基、
Ｎジフェニルアミド基等を挙げることができ、中でもカ
ルボン酸メチル基、カルボン酸トリフルオロエチル基、
フェニル基が好適である。Further, Y represents a carboxylic acid ester group having 1 to 18 carbon atoms or a halogen-substituted carboxylic acid ester group, a phenyl group or a substituted phenyl group, a nitrile group, an amide group, or an N-substituted amide group. Methyl ester group, carboxylic acid cyclohexyl ester carboxylic acid n-bornyl ester acid trifluoroethyl ester group, carboxylic acid tetrafluoropropyl ester group, phenyl group, orthomethylphenyl group, orthofluorophenyl group, paramethylphenyl group, parafluoro Phenyl group, parachlorophenyl group, nitrile group, amide group, N dimethylamide group,
Examples include N diphenylamide group, among which methyl carboxylate group, trifluoroethyl carboxylate group,
A phenyl group is preferred.
本発明において前記（Ｉ）式で表わされる構造単位は光
学用樹脂中０．０７〜２重量％含有される。前記（Ｉ）
式で表わされる構造単位が０．０７重量％未満の時には
溶融射出成型時の該樹脂の溶融流動性が悪くなると共に
加熱重量保持率に代表される耐熱分解性の向上はあまり
望めない。又２重量％を上廻った際には耐熱分解性は向
上するものの該樹脂を溶融射出成型した後の成型品の機
械強度が劣ってくる。In the present invention, the structural unit represented by formula (I) is contained in the optical resin in an amount of 0.07 to 2% by weight. Said (I)
If the content of the structural unit represented by the formula is less than 0.07% by weight, the melt flowability of the resin during melt injection molding will be poor, and no significant improvement in thermal decomposition resistance as typified by heating weight retention can be expected. If the amount exceeds 2% by weight, the thermal decomposition resistance will improve, but the mechanical strength of the molded product after melt injection molding the resin will deteriorate.
これにより、（Ｉ＞式で表わされる構造単位は該光学用
樹脂に対して０．０７〜２重量％、更に好ましくは０．
１５〜０．７重量％が好適である。Thereby, the structural unit represented by the formula (I> is 0.07 to 2% by weight, more preferably 0.07 to 2% by weight, based on the optical resin.
15 to 0.7% by weight is preferred.
本発明の光学用樹脂の製造方法については特に限定はな
く常法によって製造できる。すなわち、下記（ｎ）式の
ラジカル重合性上ツマを下記（ＩＩＩ）式の連鎖移動剤
共存下に重合反応させることによって製造することがで
きる。The method for producing the optical resin of the present invention is not particularly limited and can be produced by any conventional method. That is, it can be produced by polymerizing a radically polymerizable polymer of the following formula (n) in the presence of a chain transfer agent of the following formula (III).
ＣＨ２＝Ｃ・・・・・・（ＩＩ）
（（■）式中 Ｘは水素原子、ハロゲン原子、メチル基
のいずれかを、Ｙはカルボン酸エステル基もしくはハロ
ゲン置換カルボン酸エステル基、フェニル基もしくは置
換フェニル基、ニトリル基、アミド基もしくはＮ置換ア
ミド基のいずれかをそれぞれ表わす）
Ｈ３−Ｒ−３Ｈ・・・・・・（ＩＩＩ）（（■）式中
Ｒは炭素数１から１８までの第１級、第２級、第３級ア
ルキレン基を表わす）以下実施例をもって本発明の効果
を更に詳しく述べる。CH2=C...(II) ((■) In the formula, each represents a substituted phenyl group, a nitrile group, an amide group, or an N-substituted amide group)
(R represents a primary, secondary, or tertiary alkylene group having 1 to 18 carbon atoms) The effects of the present invention will be described in more detail with reference to Examples below.
〈実施例〉
実施例１
メタクリル酸メチルを酸素含有量が０．１ｐｌ）ｍ以下
である窒素にてバブル処理した後、ラジカル開始剤とし
て２．２′アゾビスオクタン１．５×１０’ ｍｏｌ
／フィードメタクリル酸メチル１ｍｏｌと、連鎖移動剤
としてジメルカプトエタン１．９ｘ １Ｑ−３ｍｏｌ
／フィードメタクリル酸メチル１ｍｏｌとを混合させて
、重合温度１３５℃の完全混合反応域に連続供給した。<Examples> Example 1 After bubbling methyl methacrylate with nitrogen having an oxygen content of 0.1 pl) m or less, 1.5 x 10' mol of 2.2' azobisoctane was added as a radical initiator.
/feed methyl methacrylate 1 mol and dimercaptoethane 1.9x 1Q-3 mol as chain transfer agent
/feed methyl methacrylate (1 mol) and continuously supplied to a complete mixing reaction zone at a polymerization temperature of 135°C.
反応域での滞留時間を３．５時間として重合実施した俊
、脱モノマ型押し出し機にて未反応上ツマを除去し、光
学用樹脂を得た。ｊｑられた樹脂を分析したところ残存
モノマ率０．１２％、重量平均分子量９００００で、（
Ｉ＞式にて表わされる構造単位の樹脂中に含有される比
率は、０．３２４重量％であった。更に引き続き該光学
用樹脂を２６０℃の一定温度下で空気中又は窒素中で１
２０分間放置しその間の重量保持率の時間推移を調べた
ところ、第１表に示すとおり窒素中では１２０分間全く
重量減少が認られず極めて耐熱分解性の優れたものでめ
った。Polymerization was carried out with a residence time in the reaction zone of 3.5 hours, and unreacted particles were removed using a monomer removal type extruder to obtain an optical resin. Analysis of the jqed resin revealed that the residual monomer rate was 0.12% and the weight average molecular weight was 90,000.
The ratio of the structural unit represented by the formula I> contained in the resin was 0.324% by weight. Furthermore, the optical resin was heated for 1 hour in air or nitrogen at a constant temperature of 260°C.
When the product was allowed to stand for 20 minutes and the change in weight retention over time was investigated, as shown in Table 1, no weight loss was observed for 120 minutes in nitrogen, indicating that it had excellent heat decomposition resistance.
実施例２
連鎖移動剤としてジメルカプトヘキサンを用いた以外は
実施例１と全く同様の方法により光学用樹脂を製造する
と共に加熱１１保持率の時間推移を調べた。第１表に示
すとおり窒素中、空気中においても、はとんど熱分解の
認められないものであった。Example 2 An optical resin was produced in exactly the same manner as in Example 1 except that dimercaptohexane was used as a chain transfer agent, and the time course of the heating 11 retention rate was investigated. As shown in Table 1, almost no thermal decomposition was observed in nitrogen or air.
比較例１
連鎖移動剤をチオグリコール酸２エチルヘキシルとした
以外は実施例１と全く同様の方法により、光学用樹脂を
得た。得られた樹脂中の残存上ツマ率は０．１１％、重
量平均分子量は８５０００であった。更に実施例１と同
様の方法により該樹脂の空気中、窒素中での加熱重量保
持率を調べたところ、第１表のとおり、空気中３０分に
て約半量が分解するものであった。Comparative Example 1 An optical resin was obtained in the same manner as in Example 1 except that the chain transfer agent was 2-ethylhexyl thioglycolate. The residual residual content in the resulting resin was 0.11%, and the weight average molecular weight was 85,000. Furthermore, when the heating weight retention rate of the resin in air and nitrogen was examined in the same manner as in Example 1, as shown in Table 1, about half of the resin was decomposed in 30 minutes in air.
比較例２
連鎖移動剤としてノルマルドデシルメルカプタンを使用
した以外は実施例１と全く同様の方法により光学用樹脂
を製造し、後実施例１と同様の方法による加熱減量保持
率の時間推移を調べた。窒素中においては９４．１％の
重量保持率と耐熱分解性はほぼ良好なものの空気中にお
ける重量保持率は７７．３％とかなり熱分解の進んだも
のであった。Comparative Example 2 An optical resin was produced in exactly the same manner as in Example 1 except that n-dodecyl mercaptan was used as a chain transfer agent, and then the change in heating loss retention rate over time was investigated in the same manner as in Example 1. . Although the weight retention rate in nitrogen was 94.1% and the thermal decomposition resistance was almost good, the weight retention rate in air was 77.3%, indicating that thermal decomposition had progressed considerably.
比較例３
連鎖移動剤としてのジメルカプトエタンを２、５Ｘ １
０−’ｍｏｌ ／フィート）１り’）’））Ｌｆｍメチ
ル１ｍ０Ｉとした以外は、実施例１と同様の方法により
光学用樹脂を製造した。得られた樹脂の残存上ツマ率０
．３５％、重量平均分子１５５００００、（Ｉ＞式で表
わされる構造単位の該樹脂中において含有される比率は
０．０５３重量％でめった。Comparative Example 3 Dimercaptoethane as a chain transfer agent was 2.5X 1
An optical resin was produced in the same manner as in Example 1, except that 1 m0I of Lfm methyl was used. Residual slug rate of the obtained resin is 0
．． 35%, the weight average molecular weight was 1,550,000, and the proportion of the structural unit represented by the formula (I>) in the resin was 0.053% by weight.
加熱重量保持率の時間推移は第１表に示すとおり、空気
中にて２０．８％とほとんど耐熱分解性のないものであ
った。As shown in Table 1, the heating weight retention rate over time was 20.8% in air, showing almost no heat decomposition resistance.
〈発明の効果〉
本発明の光学用樹脂の効果をまとめると次の通りである
。<Effects of the Invention> The effects of the optical resin of the present invention are summarized as follows.
■削出成型時の加熱重量保持率に代表される耐熱分解性
は、極めて優れている。■Thermal decomposition resistance, represented by heating weight retention during extrusion molding, is extremely excellent.
■耐熱分解性に優れているため、熱分解物の生成がほと
んどなく成型品の透明性や機械強度に優れると共にシリ
ンダや金型も繰り返し使用できる。■Because it has excellent thermal decomposition resistance, it produces almost no thermal decomposition products, resulting in molded products with excellent transparency and mechanical strength, and cylinders and molds can be used repeatedly.
■金型等に熱分解生成物がほとんど堆積しないため、加
工寸法精度に優れる。■Excellent machining dimensional accuracy as almost no thermal decomposition products accumulate on the mold, etc.
Claims (1)
〜２重量％含有することを特徴とする光学用樹脂。 ▲数式、化学式、表等があります▼・・・ （ I ） （（ I ）式中Ｒは炭素数１から１８までの第１級、第
２級、第３級アルキレン基を、Ｘは水素原子、ハロゲン
原子、メチル基のいずれかを、Ｙは炭素数１から１８ま
でのカルボン酸エステル基、もしくはハロゲン置換カル
ボン酸エステル基、フェニル基もしくは置換フェニル基
、ニトリル基、アミド基もしくはＮ置換アミド基のいず
れかをそれぞれ表わす）(1) The structural unit represented by the following formula (I) is 0.07
An optical resin characterized by containing ~2% by weight. ▲There are mathematical formulas, chemical formulas, tables, etc.▼... (I) ((I) In the formula, R is a primary, secondary, or tertiary alkylene group having 1 to 18 carbon atoms, and X is a hydrogen atom. , a halogen atom, or a methyl group, Y is a carboxylic ester group having 1 to 18 carbon atoms, or a halogen-substituted carboxylic ester group, a phenyl group or a substituted phenyl group, a nitrile group, an amide group, or an N-substituted amide group )
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30868486A JPS63162702A (en) | 1986-12-26 | 1986-12-26 | Resin for optics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30868486A JPS63162702A (en) | 1986-12-26 | 1986-12-26 | Resin for optics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63162702A true JPS63162702A (en) | 1988-07-06 |
Family
ID=17984039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30868486A Pending JPS63162702A (en) | 1986-12-26 | 1986-12-26 | Resin for optics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63162702A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013161266A1 (en) * | 2012-04-27 | 2013-10-31 | 株式会社クラレ | (meth) acrylic resin composition |
| JPWO2019093385A1 (en) * | 2017-11-09 | 2020-11-19 | 株式会社クラレ | Methacrylic copolymer and its molded product |
-
1986
- 1986-12-26 JP JP30868486A patent/JPS63162702A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013161266A1 (en) * | 2012-04-27 | 2013-10-31 | 株式会社クラレ | (meth) acrylic resin composition |
| JPWO2013161266A1 (en) * | 2012-04-27 | 2015-12-21 | 株式会社クラレ | (Meth) acrylic resin composition |
| JPWO2019093385A1 (en) * | 2017-11-09 | 2020-11-19 | 株式会社クラレ | Methacrylic copolymer and its molded product |
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