JPS63157443U - - Google Patents
Info
- Publication number
- JPS63157443U JPS63157443U JP4580087U JP4580087U JPS63157443U JP S63157443 U JPS63157443 U JP S63157443U JP 4580087 U JP4580087 U JP 4580087U JP 4580087 U JP4580087 U JP 4580087U JP S63157443 U JPS63157443 U JP S63157443U
- Authority
- JP
- Japan
- Prior art keywords
- reel
- wire
- plastic deformation
- wound
- upstream
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005452 bending Methods 0.000 claims description 6
- 238000011144 upstream manufacturing Methods 0.000 claims description 4
- 238000003466 welding Methods 0.000 claims 1
Landscapes
- Wire Processing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4580087U JPH043699Y2 (enrdf_load_stackoverflow) | 1987-03-30 | 1987-03-30 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4580087U JPH043699Y2 (enrdf_load_stackoverflow) | 1987-03-30 | 1987-03-30 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63157443U true JPS63157443U (enrdf_load_stackoverflow) | 1988-10-14 |
| JPH043699Y2 JPH043699Y2 (enrdf_load_stackoverflow) | 1992-02-05 |
Family
ID=30864867
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4580087U Expired JPH043699Y2 (enrdf_load_stackoverflow) | 1987-03-30 | 1987-03-30 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH043699Y2 (enrdf_load_stackoverflow) |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6858523B2 (en) | 2000-01-18 | 2005-02-22 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| US6878507B2 (en) | 1998-02-25 | 2005-04-12 | Micron Technology, Inc. | Semiconductor processing methods |
| US7067415B2 (en) | 1999-09-01 | 2006-06-27 | Micron Technology, Inc. | Low k interlevel dielectric layer fabrication methods |
| US7151054B2 (en) | 1998-09-03 | 2006-12-19 | Micron Technology, Inc. | Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| US7279118B2 (en) | 1998-12-23 | 2007-10-09 | Micron Technology, Inc. | Compositions of matter and barrier layer compositions |
| US7576400B1 (en) | 1998-09-03 | 2009-08-18 | Micron Technology, Inc. | Circuitry and gate stacks |
-
1987
- 1987-03-30 JP JP4580087U patent/JPH043699Y2/ja not_active Expired
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6878507B2 (en) | 1998-02-25 | 2005-04-12 | Micron Technology, Inc. | Semiconductor processing methods |
| US7626238B2 (en) | 1998-02-25 | 2009-12-01 | Micron Technology, Inc. | Semiconductor devices having antireflective material |
| US7151054B2 (en) | 1998-09-03 | 2006-12-19 | Micron Technology, Inc. | Semiconductor processing methods of forming and utilizing antireflective material layers, and methods of forming transistor gate stacks |
| US7576400B1 (en) | 1998-09-03 | 2009-08-18 | Micron Technology, Inc. | Circuitry and gate stacks |
| US7279118B2 (en) | 1998-12-23 | 2007-10-09 | Micron Technology, Inc. | Compositions of matter and barrier layer compositions |
| US7067415B2 (en) | 1999-09-01 | 2006-06-27 | Micron Technology, Inc. | Low k interlevel dielectric layer fabrication methods |
| US7078356B2 (en) | 1999-09-01 | 2006-07-18 | Micron Technology, Inc. | Low K interlevel dielectric layer fabrication methods |
| US7521354B2 (en) | 1999-09-01 | 2009-04-21 | Micron Technology, Inc. | Low k interlevel dielectric layer fabrication methods |
| US7078328B2 (en) | 2000-01-18 | 2006-07-18 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| US7435688B2 (en) | 2000-01-18 | 2008-10-14 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| US6858523B2 (en) | 2000-01-18 | 2005-02-22 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| US7045277B2 (en) | 2000-01-18 | 2006-05-16 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials, and structures comprising silicon nitride |
| US7638436B2 (en) | 2000-01-18 | 2009-12-29 | Micron Technology, Inc. | Semiconductor processing methods of transferring patterns from patterned photoresists to materials |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH043699Y2 (enrdf_load_stackoverflow) | 1992-02-05 |