JPS6314163A - Electrophotographic sensitive body and its production - Google Patents

Electrophotographic sensitive body and its production

Info

Publication number
JPS6314163A
JPS6314163A JP15920986A JP15920986A JPS6314163A JP S6314163 A JPS6314163 A JP S6314163A JP 15920986 A JP15920986 A JP 15920986A JP 15920986 A JP15920986 A JP 15920986A JP S6314163 A JPS6314163 A JP S6314163A
Authority
JP
Japan
Prior art keywords
selenium
tungsten
atomic
alloy
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15920986A
Other languages
Japanese (ja)
Other versions
JPH073596B2 (en
Inventor
Hideki Kino
喜納 秀樹
Kiyoshi Nakato
中藤 清
Akiro Matsuzawa
松沢 昭郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP15920986A priority Critical patent/JPH073596B2/en
Publication of JPS6314163A publication Critical patent/JPS6314163A/en
Publication of JPH073596B2 publication Critical patent/JPH073596B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08207Selenium-based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Abstract

PURPOSE:To prevent the scumming of an image by specifying the doping of oxygen and tungsten to an electric charge transfer layer. CONSTITUTION:The oxide of the tungsten is simultaneously evaporated to dope the oxygen at 50X10<-6>-200X10<-6>atom% and the tungsten at 15X10<-6>-110X10<-6>atom% into the electric charge transfer layer at the time of evaporating selenium or selenium alloy and forming the charge transfer layer on a conductive substrate 1 in a vacuum vessel, The cylindrical conductive substrate 1 consisting of an aluminum alloy is disposed rotatably in an arrow direction in the vacuum vessel and a vapor deposition boat 2 in which a selenium-tellurium alloy 4 is packed is installed below said substrate. A flash vapor deposition boat 5 is juxtaposed in proximity to the boat 2 and the boat 5 is heated by direct energization thereof. The accumulation of a residual poten tial is thereby decreased and the good image which is free from the scumming is stably obtd.

Description

【発明の詳細な説明】 〔発明の属する技術分野〕 本発明は非晶質セレンまたは非晶質セレン合金を光導電
性材料として用いる電子写真用感光体およびその製造方
法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of the Invention] The present invention relates to an electrophotographic photoreceptor using amorphous selenium or an amorphous selenium alloy as a photoconductive material, and a method for manufacturing the same.

〔従来技術とその問題点〕[Prior art and its problems]

電子写真装置の像形成部材として用いられる電子写真用
感光体(以下、単に感光体とも称する)の性能としては
、電荷を受容する能力が高(て暗所において充分高い所
要電位に帯電でき、かつ、暗時には電荷の漏れが少なく
て電荷減衰速度が小さくて帯電位を保持することができ
ること、光が照射されたときには表面の帯電電荷が速や
かに放電して帯電位が減衰し、残留電位が充分少ないこ
と、帯電・露光を連続して繰り返して行ったとき疲労が
無視できる程小さく、暗減衰の増加や残留電位の蓄積が
少ないことなどが求められる。
The performance of an electrophotographic photoreceptor (hereinafter also simply referred to as a photoreceptor) used as an image forming member of an electrophotographic device is that it has a high ability to accept electric charge (can be charged to a sufficiently high required potential in a dark place, and , when it is dark, there is little charge leakage and the charge decay rate is low, and the charged potential can be maintained; when light is irradiated, the surface charge is rapidly discharged, the charged potential is attenuated, and the residual potential is sufficient. It is required that fatigue is negligible when charging and exposure are repeated continuously, and that increase in dark decay and accumulation of residual potential are small.

このような要望を満足させるために、最近機能分離型感
光体が注目されてきている。これは、主として暗所での
帯電と露光時のキマリア輸送に寄与するキャリア輸送層
と、主として露光時キャリア発生に寄与するキャリア発
生層とを積層してなる感光体であって、このように機能
分離した各層についてその機能に応じた最適設計を追求
することにより、一つの層にこれらの機能を持たせる単
層型の感光体よりも特性の優れた感光体が得られること
になる。
In order to satisfy such demands, functionally separated photoreceptors have recently been attracting attention. This photoreceptor is composed of a layered carrier transport layer that mainly contributes to charging in the dark and chimal transport during exposure, and a carrier generation layer that mainly contributes to carrier generation during exposure. By pursuing the optimal design of each separated layer according to its function, a photoreceptor with better characteristics than a single-layer photoreceptor in which one layer has these functions can be obtained.

セレン系材料を光導電性材料として利用する感光体にお
いても機能分離型が開発され、例えばアルミニウム合金
からなる基体上に非晶質セレンまたは非晶質セレン−テ
ルル合金からなるキャリア輸送層と非晶質セレン−テル
ル合金または非晶質セレン−テルル−ひ素合金からなる
キャリア発生層を有する感光体が知られている。しかし
ながら、このような感光体で連続繰り返し像形成を行う
と第3図に示すように残留電位の蓄積が生じ、その結果
、画像上に地汚れが発生し、現在までのところ、残留電
位の蓄積の少ない満足すべき感光体は得られていない。
A functionally separated type photoreceptor using a selenium-based material as a photoconductive material has also been developed, for example, a carrier transport layer made of amorphous selenium or an amorphous selenium-tellurium alloy and an amorphous Photoreceptors are known that have a carrier generation layer made of a crystalline selenium-tellurium alloy or an amorphous selenium-tellurium-arsenic alloy. However, when images are continuously and repeatedly formed on such a photoreceptor, residual potential accumulates as shown in Figure 3, resulting in background smudges on the image. A satisfactory photoreceptor with a small amount of

〔発明の目的〕[Purpose of the invention]

本発明は上述の点に鑑みてなされたものであって、連続
繰り返し像形成を行っても残留電位の蓄積が少なく、画
像上地汚れが少ない感光体およびその製造方法を提供す
ることを目的とする。
The present invention has been made in view of the above-mentioned points, and an object of the present invention is to provide a photoreceptor and a method for manufacturing the same, in which residual potential accumulates less even when images are formed repeatedly, and the image surface is less smeared. do.

〔発明の要点〕[Key points of the invention]

本発明の目的は、真空槽内でセレンまたはセレン合金を
蒸発させて導電性基体上に電荷輸送層を形成するときに
、タングステンの酸化物を同時に蒸発させて電荷輸送層
中に酸素を50X10−6原子%〜200 ×10−6
原子%、タングステンを15 ×10−6原子%〜11
0 ×10−6原子%ドープさせることによって達成さ
れる。
An object of the present invention is to evaporate selenium or a selenium alloy in a vacuum chamber to form a charge transport layer on a conductive substrate, and simultaneously evaporate tungsten oxide to add 50×10 − 6 atomic% ~ 200 × 10-6
atomic%, tungsten from 15 × 10-6 atomic% to 11
This is achieved by doping 0 x 10-6 atomic %.

〔発明の実施例〕[Embodiments of the invention]

以下、本発明の実施例について説明する。 Examples of the present invention will be described below.

第1図は、本発明による感光体の製造の際の電荷輸送層
の蒸着方法を示す説明図であって、真空槽(図示はされ
てない)の中にアルミニウム合金からなる円筒状導電性
基体1が矢印方向に回転可能に配置され、その下方にセ
レン−テルル合金4の充填された蒸着ボート2が設萱さ
れ、蒸着ボート2に近接してフラッシュ蒸着ボート5が
並設されている。フラッシュ蒸着ボート5はボートに直
接通電し加熱される方式である。真空槽内を圧力I X
 10−’Torrの真空とし、基体lを温度65℃に
保持して回転させながら、加熱ヒータ3により蒸着ボー
ト2を約300℃に加熱し、テルルを5.5重量%含有
するセレン−テルル合金4を蒸発させる。
FIG. 1 is an explanatory diagram showing a method of depositing a charge transport layer during the production of a photoreceptor according to the present invention, in which a cylindrical conductive substrate made of an aluminum alloy is placed in a vacuum chamber (not shown). A vapor deposition boat 2 filled with a selenium-tellurium alloy 4 is installed below the vapor deposition boat 1, and a flash vapor deposition boat 5 is arranged in parallel with the vapor deposition boat 2. The flash vapor deposition boat 5 is heated by directly applying electricity to the boat. Pressure inside the vacuum chamber I
With a vacuum of 10-' Torr, the deposition boat 2 is heated to about 300°C by the heater 3 while rotating while maintaining the substrate l at a temperature of 65°C, and a selenium-tellurium alloy containing 5.5% by weight of tellurium is heated. Evaporate 4.

同時にフラッシュ蒸着ボート5に通電してその温度を1
000℃以上に上げ、タングステン酸化物110゜微粉
末(図では便宜上粒状で示しである)を少量ずつ供給し
てフラッシュ蒸発させ、その蒸気をセレン−テルル蒸気
と共に基体1上に共蒸着して約1μm7分の成膜速度で
膜厚的60μmの電荷輸送層を形成した。、’10.の
量はセレン−テルル合金量に対して比率で500重量p
pn供給した。このようにして形成された電荷輸送層中
の酸素とタングステンの含有量を放射化分析で調べたと
ころ、酸素が100 ×10−6原子%、タングステン
が40X10−6原子%ドープされていた。次にこの電
荷輸送層の上に非晶質セレン−テルル−ひ素合金からな
り膜厚5μmの電荷発生層を形成して感光体とした。
At the same time, the flash vapor deposition boat 5 is energized to lower its temperature to 1.
000°C or above, tungsten oxide 110° fine powder (shown in granular form in the figure for convenience) is supplied little by little, flash evaporated, and the vapor is co-evaporated onto the substrate 1 together with selenium-tellurium vapor to form approximately A charge transport layer having a thickness of 60 μm was formed at a film formation rate of 1 μm/7 minutes. , '10. The amount is 500 p by weight relative to the amount of selenium-tellurium alloy.
pn was supplied. When the content of oxygen and tungsten in the charge transport layer thus formed was examined by activation analysis, it was found that oxygen was doped at 100 x 10-6 atomic % and tungsten was doped at 40 x 10-6 atomic %. Next, a charge generation layer made of an amorphous selenium-tellurium-arsenic alloy and having a thickness of 5 μm was formed on this charge transport layer to prepare a photoreceptor.

この実施例の感光体について連続繰り返し像形成を行っ
てそのときの感光体の残留電位を調べた。
Image formation was performed continuously and repeatedly on the photoreceptor of this example, and the residual potential of the photoreceptor at that time was examined.

その結果を第2図に示す。第2図に見られる通り残留電
位は非常に小さく最初10V程度であり、しかもその後
の増加は極僅少で、しかも最初の数回の繰り返しのうち
に約20Vで飽和し、その後250回まで残留電位の蓄
積は見られない。また、画像上地汚れは認められなかっ
た。
The results are shown in FIG. As can be seen in Figure 2, the residual potential is very small, about 10 V at first, and the increase thereafter is extremely small.Furthermore, it saturates at about 20 V within the first few repetitions, and the residual potential remains until 250 repetitions. No accumulation is observed. Further, no staining on the image was observed.

比較のために、電荷輸送層の形成にあたって110、の
フラッシュ蒸着のみを行わず、他は実施例と同様にして
感光体を作製し、この比較例の感光体について連続繰り
返し像形成を行って残留電位を調べたところ、初期値的
30Vと大きく、その後50回で80 V 、 100
回で100■と増加し、250回で約130■と大幅な
蓄積が見られ、画像上地汚れが発生した。本実施例にお
ける110.の共蒸着が極めて有効であることが判る。
For comparison, a photoreceptor was prepared in the same manner as in the example except that only the flash vapor deposition of step 110 was not performed in forming the charge transport layer. When I checked the potential, the initial value was 30V, which was large, and after 50 times it increased to 80V and 100V.
The amount increased to 100 sq. after 250 times, and a significant accumulation of approximately 130 sq. 110 in this example. It turns out that co-evaporation of is extremely effective.

連続繰り返し像形成したときの残留電位の飽和値は電荷
輸送中の酸素の含有量に左右される。酸素含有量が少な
いと飽和値が大きく、多いと小さくなる。そのときタン
グステンが共存することが大切で、タングステンが共存
することにより酸素が非晶質セレンまたは非晶質セレン
−テルル合金中に均一に安定してドープされることにな
り安定した特性の感光体が得られる。電荷輸送中の酸素
量が50 XIQ−6原子%程度、タングステン量が1
5XlO−6原子%程度のとき、残留電位の飽和値は8
0■程度で、より少なくなると飽和値が大きくなり過ぎ
画像上地汚れが実用上問題となる。また、酸素量が20
0 X 10−6原子%程度、タングステン量が110
 ×10−6原子%程度になると飽和値はIOV程度で
画像上地汚れの発生は認められないが、反面、暗減衰が
大きくなってきて、これらの含有量がさらに多(なると
帯電量が低くなり帯電の減衰も大きくなって実用上問題
となってくる。
The saturation value of the residual potential when images are formed repeatedly is dependent on the content of oxygen during charge transport. If the oxygen content is low, the saturation value will be large; if the oxygen content is high, the saturation value will be small. At this time, it is important that tungsten coexists.By coexisting tungsten, oxygen is doped uniformly and stably into amorphous selenium or amorphous selenium-tellurium alloy, resulting in a photoreceptor with stable characteristics. is obtained. The amount of oxygen during charge transport is approximately 50 XIQ-6 atomic%, and the amount of tungsten is 1
When the concentration is about 5XlO-6 atomic%, the saturation value of the residual potential is 8
If it is about 0.0 cm, the saturation value becomes too large and staining on the image surface becomes a practical problem. Also, the amount of oxygen is 20
0 x 10-6 atomic%, tungsten content is 110
When it becomes about ×10-6 atomic%, the saturation value is about IOV and no staining on the image is observed, but on the other hand, the dark attenuation becomes large and the content of these becomes even higher (as the amount of charge decreases). As a result, the attenuation of charging becomes large, which becomes a practical problem.

このように電荷輸送層中に適量の酸素とタングステンが
ドープされると感光体の残留電位の蓄積が少なくなる理
由はまだ充分解明されてはいないが、酸素がドープされ
ることにより正孔のトラップ準位が浅くなり、また、正
孔トラップの密度も低減されるためと推定される。
The reason why the accumulation of residual potential in the photoreceptor decreases when an appropriate amount of oxygen and tungsten are doped into the charge transport layer is not yet fully understood, but doping with oxygen causes trapping of holes. This is presumed to be because the level becomes shallow and the density of hole traps is also reduced.

本実施例においてはドーピング材料として賀0゜を用い
たがwO□や−4011も同様に有効に用いることが可
能である。
In this embodiment, 0° was used as the doping material, but wO□ or -4011 can be used equally effectively.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、真空槽内でセレンまたはセレン合金を
蒸発させて導電性基体上に電荷輸送層を形成するときに
、タングステン酸化物を同時に蒸発させて、電荷発生層
中に酸素を50X10−6原子%〜200 X 10−
6原子%、タングステンを15X10−6原子%〜ll
0XIO−6原子%ドープさせる。このようにして製造
された電子写真用感光体は、連続繰り返し像形成を行っ
ても残留電位の蓄積が少なく、地汚れのない良好な画像
を安定して提供することが可能である。
According to the present invention, when selenium or selenium alloy is evaporated in a vacuum chamber to form a charge transport layer on a conductive substrate, tungsten oxide is simultaneously evaporated to provide 50×10 − of oxygen in the charge generation layer. 6 atom% ~ 200 x 10-
6 atomic%, tungsten 15X10-6 atomic%~ll
Doped with 0XIO-6 atomic percent. The electrophotographic photoreceptor manufactured in this manner has little accumulation of residual potential even after continuous and repeated image formation, and is capable of stably providing good images without background smudge.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の電荷輸送層の蒸着の一実施例の説明図
、第2図は一実施例の感光体の残留電位の蓄積を示す線
図、第3図は従来例の感光体の残留電位の蓄積を示す線
図である。 1 導電性基体、2 蒸着ボート、3−1.加熱ヒータ
、4−  セレン合金、5−フラフシ二蒸着ボート、6
−タングステン酸化物。 纂1図 gz  図
FIG. 1 is an explanatory diagram of one embodiment of vapor deposition of a charge transport layer of the present invention, FIG. 2 is a diagram showing the accumulation of residual potential in a photoreceptor of one embodiment, and FIG. 3 is a diagram of a conventional photoreceptor. FIG. 3 is a diagram showing the accumulation of residual potential. 1 conductive substrate, 2 vapor deposition boat, 3-1. Heater, 4- Selenium alloy, 5- Fluffy double vapor deposition boat, 6
-Tungsten oxide. Figure 1 gz

Claims (1)

【特許請求の範囲】 1)導電性基体上に非晶質セレンまたは非晶質セレン合
金からなる電荷輸送層と非晶質セレン合金からなる電荷
発生層とを有する電子写真用感光体において、前記電荷
輸送層に酸素が50×10^−^6原子%〜200×1
0^−^6原子%、タングステンが15×10^−^6
原子%〜110×10^−^6原子%ドープされている
ことを特徴とする電子写真用感光体。 2)真空槽内でセレンまたはセレン−テルル合金を蒸発
源より蒸発させて導電性基体上に電荷輸送層を形成する
ときに、タングステンの酸化物を同時に蒸発させて前記
電荷輸送層中に酸素を50×10^−^6原子%〜20
0×10^−^6原子%、タングステンを15×10^
−^6原子%〜110×10^−^6原子%ドープさせ
ることを特徴とする電子写真用感光体の製造方法。 3)特許請求の範囲第2項記載の製造方法において、タ
ングステンの酸化物がWO_2であることを特徴とする
電子写真用感光体の製造方法。 4)特許請求の範囲第2項記載の製造方法において、タ
ングステンの酸化物がWO_3であることを特徴とする
電子写真用感光体の製造方法。 5)特許請求の範囲第2項記載の製造方法において、タ
ングステンの酸化物がW_4O_1_1であることを特
徴とする電子写真用感光体の製造方法。
[Scope of Claims] 1) An electrophotographic photoreceptor having a charge transport layer made of amorphous selenium or an amorphous selenium alloy and a charge generation layer made of an amorphous selenium alloy on a conductive substrate, comprising: Oxygen in the charge transport layer is 50×10^-^6 atomic% to 200×1
0^-^6 atomic%, tungsten is 15 x 10^-^6
An electrophotographic photoreceptor characterized in that it is doped in an amount of 110×10^-^6 atomic %. 2) When selenium or selenium-tellurium alloy is evaporated from an evaporation source in a vacuum chamber to form a charge transport layer on a conductive substrate, tungsten oxide is simultaneously evaporated to introduce oxygen into the charge transport layer. 50×10^-^6 atomic%~20
0x10^-^6 atomic%, 15x10^ of tungsten
A method for producing an electrophotographic photoreceptor, characterized in that it is doped with -6 atomic % to 110 x 10 6 atomic %. 3) A method for manufacturing an electrophotographic photoreceptor according to claim 2, wherein the tungsten oxide is WO_2. 4) A method for manufacturing an electrophotographic photoreceptor according to claim 2, wherein the tungsten oxide is WO_3. 5) A method for manufacturing an electrophotographic photoreceptor according to claim 2, wherein the tungsten oxide is W_4O_1_1.
JP15920986A 1986-07-07 1986-07-07 Electrophotographic photoreceptor and method for manufacturing the same Expired - Fee Related JPH073596B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15920986A JPH073596B2 (en) 1986-07-07 1986-07-07 Electrophotographic photoreceptor and method for manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15920986A JPH073596B2 (en) 1986-07-07 1986-07-07 Electrophotographic photoreceptor and method for manufacturing the same

Publications (2)

Publication Number Publication Date
JPS6314163A true JPS6314163A (en) 1988-01-21
JPH073596B2 JPH073596B2 (en) 1995-01-18

Family

ID=15688704

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15920986A Expired - Fee Related JPH073596B2 (en) 1986-07-07 1986-07-07 Electrophotographic photoreceptor and method for manufacturing the same

Country Status (1)

Country Link
JP (1) JPH073596B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02213465A (en) * 1988-11-14 1990-08-24 Xerox Corp Partial crystallization-inhibiting method for chalcogenide alloy
KR101502434B1 (en) * 2013-08-21 2015-03-24 영동제약 주식회사 Slide chamber for cell smear

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02213465A (en) * 1988-11-14 1990-08-24 Xerox Corp Partial crystallization-inhibiting method for chalcogenide alloy
KR101502434B1 (en) * 2013-08-21 2015-03-24 영동제약 주식회사 Slide chamber for cell smear

Also Published As

Publication number Publication date
JPH073596B2 (en) 1995-01-18

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