JPS63139658A - Charged material maintenance device for automatic barrel machining device for thin workpiece - Google Patents

Charged material maintenance device for automatic barrel machining device for thin workpiece

Info

Publication number
JPS63139658A
JPS63139658A JP28722386A JP28722386A JPS63139658A JP S63139658 A JPS63139658 A JP S63139658A JP 28722386 A JP28722386 A JP 28722386A JP 28722386 A JP28722386 A JP 28722386A JP S63139658 A JPS63139658 A JP S63139658A
Authority
JP
Japan
Prior art keywords
hopper
synthetic resin
chute
workpiece
bucket
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28722386A
Other languages
Japanese (ja)
Inventor
Hisamine Kobayashi
久峰 小林
Koichi Suyama
須山 幸一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tipton Manufacturing Corp
Original Assignee
Tipton Manufacturing Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tipton Manufacturing Corp filed Critical Tipton Manufacturing Corp
Priority to JP28722386A priority Critical patent/JPS63139658A/en
Publication of JPS63139658A publication Critical patent/JPS63139658A/en
Pending legal-status Critical Current

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  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Abstract

PURPOSE:To prevent a thin workpiece from sticking onto an automatic barrel machining device by providing a synthetic resin particle feed device above a hopper so as to charge synthetic resin particles into the hopper, and by bonding synthetic resin rods to a charged material passage such as a chute. CONSTITUTION:A workpiece fed from a workpiece casing 10 into a hopper 3 is fed into a barrel tank from the outer cylinder 4 of a chute through a bucket 9, an upper hopper 22 and an upper chute 23. Synthetic resin particles are fed into the hopper 3 together with the workpiece from a synthetic resin particle constant amount supply device 12 arranged above the hopper 3 so that it is possible to prevent the workpiece from sticking to another workpiece. Further, synthetic resin round rods are laid closely to each other and bonded on the inner surfaces of the chute of the hopper 3, the outer cylinder 4 of the chute, the bucket 9, the upper hopper 22, and the chute 23 and the like, thereby it is possible to prevent the workpiece from sticking onto these chutes of the like.

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は、薄板、又は薄片など薄物工作物を自動バレ
ル加工するときのマス(バレル槽内に装入する装入物を
指し、一般には工作物、研磨材およびコンパウンド溶液
等の混合物を指す)の整備装置であって、薄物工作物の
自動バレル加工機のマス整備装置の製造、販売又は使用
など、バレル加工の産業分野において利用するものであ
る。
Detailed Description of the Invention (Field of Industrial Application) This invention relates to a mass (referring to the charge charged into a barrel tank, generally known as (refers to a mixture of workpieces, abrasive materials, and compound solutions, etc.) used in the industrial field of barrel processing, such as the manufacture, sale, or use of mass maintenance devices for automatic barrel processing machines for thin workpieces. It is.

(従来の技術) 従来、薄物工作物の自動バレル加工機のマス整備装置は
、薄物工作物用でない汎用のものと同一のものを使用し
ていた。
(Prior Art) Conventionally, a mass maintenance device for an automatic barrel processing machine for thin workpieces has been the same as a general-purpose device not for thin workpieces.

(発明が解決しようとする問題点) 然し乍ら、汎用のマス整備装置を薄物工作物に用いると
、整備中及び研磨中に工作物同志がはりついて有効な研
磨が行なわれないのみならず、研磨完了後に一枚づつは
がすのに多大の労力と時間とを要した。またマスをバレ
ル槽内に装入する際゛  にも、装入用シュートに工作
物がはりついて、整備後手で剥離する必要があった。
(Problems to be Solved by the Invention) However, when a general-purpose mass maintenance device is used for thin workpieces, the workpieces stick together during maintenance and polishing, which not only prevents effective polishing but also prevents polishing from being completed. It took a lot of effort and time to peel them off one by one afterwards. Also, when charging mass into the barrel tank, workpieces stuck to the charging chute and had to be removed manually after maintenance.

前記のように、薄板又は薄片などの薄物工作物において
、整備中又は研磨中に工作物のはり付きを防止しなけれ
ばならない問題点があった。
As mentioned above, there is a problem in thin workpieces such as thin plates or flakes that it is necessary to prevent the workpieces from sticking during maintenance or polishing.

(問題点を解決するための手段) この発明は上記の問題点を解決するため、マスの整備装
置において、工作物を搬送用バケットに装入するときに
同時に合成樹脂製の粒子すなわち小球、小片又は粉末を
装入する装置を具え、かつマスをバレル槽に装入するシ
ュートの下面に合成樹脂製の丸棒を敷きつめて接着し、
シュートに工作物がはりつくのを防止し、前記従来の問
題点を解消したものである。
(Means for Solving the Problems) In order to solve the above-mentioned problems, the present invention provides a mass maintenance device in which synthetic resin particles, i.e., small balls, are A chute is equipped with a device for charging small pieces or powder, and synthetic resin round rods are laid and glued on the underside of the chute for charging mass into the barrel tank.
This prevents workpieces from sticking to the chute and solves the above-mentioned conventional problems.

(発明の作用) この発明によれば、バレル加工すべき薄板又は薄片等の
薄物工作物が加工中にはりつくことも、バレル槽内に装
入するとき装入用シュート等にはりつくこともなくなっ
た。
(Action of the invention) According to this invention, thin workpieces such as thin plates or flakes to be barrel-processed no longer stick to each other during processing, nor to the charging chute, etc. when charging into a barrel tank. .

(実施例) 第1図はこの発明の実施例の正面図、第2図は同じく側
面図を示す。図において1は装置全体を支持する架構で
、その側面にはホッパーステー2が横方向に突出固定し
てあり、このホッパーステー2によりホッパー3を支持
している。前記ホッパーの詳細は第3図に示す。前記ホ
ッパー3の出口3aには下方に外筒4を具え、その下面
には接続子7を具え、接続子7とホッパー3の下面に固
定した流体圧シリンダ5のピストンロッド6の先端と連
結片6aで連結しである。前記ホッパー3の内面及び外
筒4の下面には、第4図に示すように合成樹脂製(例え
ば塩化ビニール製)の丸棒8を密接して並列固定しであ
る。この丸棒8はこの発明の主眼の一つであり、薄板又
は薄片状など薄物工作物がシュートに貼りつくのを防止
する。また前記外筒4は工作物装入時には前進してバケ
ット9の上方に突出して工作物をバケット9内に装入し
得る位置となり、後退すると、バケット9の上昇に邪魔
にならないようになっている。10は別装の工作物筐で
あり、工作物を収容して転倒し、工作物をシュート内に
装入する位置を示し、腕11は転倒位置において工作物
筺を支持している。
(Embodiment) FIG. 1 is a front view of an embodiment of the present invention, and FIG. 2 is a side view thereof. In the figure, reference numeral 1 denotes a frame for supporting the entire apparatus, and a hopper stay 2 is fixedly protruded from the side of the frame in the lateral direction, and a hopper 3 is supported by this hopper stay 2. Details of the hopper are shown in FIG. The outlet 3a of the hopper 3 is provided with an outer cylinder 4 on the lower side, and a connector 7 is provided on the lower surface of the outer cylinder 4. It is connected at 6a. On the inner surface of the hopper 3 and the lower surface of the outer cylinder 4, round rods 8 made of synthetic resin (for example, made of vinyl chloride) are closely fixed in parallel as shown in FIG. This round bar 8 is one of the main features of this invention, and prevents thin workpieces such as thin plates or flakes from sticking to the chute. Further, when loading a workpiece, the outer cylinder 4 moves forward and protrudes above the bucket 9 to be in a position where the workpiece can be loaded into the bucket 9, and when it retreats, it no longer interferes with the lifting of the bucket 9. There is. Reference numeral 10 designates a separate workpiece housing, which is shown in a position where the workpiece is accommodated and tipped over to load the workpiece into the chute, and an arm 11 supports the workpiece housing in the tipped-over position.

前記ホッパー3の上方に合成樹脂粒定量供給装置12を
設置する。前記合成樹脂粒定量供給装置12から、合成
樹脂製(スチロール製が最適である)の粒、球、チップ
、又は粗粉(以下代表して粒という)を工作物と共にホ
ッパー内に供給すると、合成樹脂粒が工作物表面に付着
して工作物同志の貼付きを防止する。この合成樹脂粒の
粒径は0.5mφ以下が適当である。例えば0.5#l
#+φ以上では合成樹脂粒の工作物表面への付着が悪く
、良い効果が得られない。前記合成樹脂粒定量供給装置
12の構造の一例と作用説明を第5図乃至第7図につい
て説明する。この実施例においては、回転円筒13の内
部に合成樹脂粒を装入しておき、蓋14との間にスリッ
ト15を残し、スリット15が下方を向いている間に合
成樹脂粒がスリット15より落下する構造となっている
。またこのスリット15の幅は蓋14を摺動開口させ変
化させることができる。すなわち回転円筒13の回転速
度、スリット15の広さ、合成樹脂粒の物性などを変え
ることによって、合成樹脂粒の一度に供給できる量を変
化させることができる(第7図)。
A synthetic resin particle quantitative supply device 12 is installed above the hopper 3. When synthetic resin grains, spheres, chips, or coarse powder (hereinafter referred to as grains) are fed from the synthetic resin grain quantitative supply device 12 into the hopper together with the workpiece, the synthetic resin grains are fed into the hopper together with the workpiece. The resin particles adhere to the workpiece surface and prevent the workpieces from sticking together. The particle size of the synthetic resin particles is suitably 0.5 mφ or less. For example 0.5#l
If #+φ or more, the adhesion of the synthetic resin particles to the workpiece surface is poor and good effects cannot be obtained. An example of the structure and operation of the synthetic resin particle quantitative supply device 12 will be explained with reference to FIGS. 5 to 7. In this embodiment, synthetic resin particles are charged inside the rotating cylinder 13, and a slit 15 is left between the rotary cylinder 13 and the lid 14, and while the slit 15 faces downward, the synthetic resin particles are inserted into the rotating cylinder 13. It has a falling structure. Further, the width of this slit 15 can be changed by sliding the lid 14 open. That is, by changing the rotational speed of the rotating cylinder 13, the width of the slit 15, the physical properties of the synthetic resin particles, etc., the amount of synthetic resin particles that can be supplied at one time can be changed (FIG. 7).

また回転円筒13内には内部空間をA、Bの2つに分離
する定量板30が取り付けられており、定め板30の先
端と、回転円813の内周面との間にはスリット31を
設け、前記スリット31とスリット15とによりバケッ
ト9内に落下する合成樹脂粒32の量を規制する。以下
定量分離について第7図のa図乃至d図に沿って説明す
る。前記回転円筒13は、第7図のa図に示すように、
合成樹脂粒がA部に収容されるような状態で停止してい
る。次に回転円筒13を矢印33の方向へ回転すると、
b図及び0図に示すように、合成樹脂粒の一部はB部へ
流出する。この流出聞は回転速度、スリット31の広さ
等により適宜調整できる。次にd図の状態になると、B
部へ移動した合成樹脂粒32は、スリット15から落下
する。この落下量は、前述したように調整することがで
きる。そして再びa図の状態にもどったならば、回転円
筒13の回転は停止する。この停止位置は近接スイッチ
16により検出される。また何等かのトラブルにより、
回転円筒13がd図の位置で停止したとしても、合成樹
脂粒32はB部へ移動した徂のみ落下する事になり、回
転円筒13内の合成樹脂粒32のほとんどはへ部内に収
納されている。従って、予期しないトラブルが発生して
も対応できることになる。
Furthermore, a metering plate 30 is installed inside the rotating cylinder 13 to separate the internal space into two parts A and B, and a slit 31 is provided between the tip of the determining plate 30 and the inner peripheral surface of the rotating circle 813. The amount of synthetic resin particles 32 falling into the bucket 9 is regulated by the slits 31 and 15. Quantitative separation will be explained below with reference to figures a to d of FIG. 7. The rotating cylinder 13, as shown in FIG. 7a,
It is stopped in such a state that the synthetic resin particles are accommodated in part A. Next, when rotating the rotating cylinder 13 in the direction of the arrow 33,
As shown in Figures b and 0, some of the synthetic resin particles flow out to part B. This flow rate can be adjusted as appropriate depending on the rotation speed, the width of the slit 31, etc. Next, when the state shown in figure d is reached, B
The synthetic resin particles 32 that have moved to the lower part fall from the slit 15. This fall amount can be adjusted as described above. Then, when the state returns to the state shown in Figure a, the rotation of the rotating cylinder 13 stops. This stop position is detected by the proximity switch 16. Also, due to some trouble,
Even if the rotating cylinder 13 stops at the position shown in figure d, only the part of the synthetic resin particles 32 that has moved to the B section will fall, and most of the synthetic resin particles 32 inside the rotating cylinder 13 are stored in the bottom section. There is. Therefore, even if an unexpected trouble occurs, it can be dealt with.

またバケット9内には、研磨終了して選別ずみの研磨石
を再び供給するための研磨石供給用シュート17、同シ
ュートを待避させるための流体圧シリンダ18、要すれ
ば摩耗した研磨石を補充する研摩石定量供給装置19、
コンパウンド溶液定量供給装置(別製、図に示していな
い)が付属している。
In addition, inside the bucket 9, there is a chute 17 for supplying polishing stones for resupplying selected polishing stones after polishing is completed, a fluid pressure cylinder 18 for retracting the chute, and replenishment of worn polishing stones if necessary. Abrasive stone quantitative supply device 19,
A compound solution quantitative supply device (manufactured separately, not shown in the figure) is included.

このようにして、−チャージ分のマスを収容したバケッ
ト9は、その側面に固定した一対のチェイン21.21
aを駆動モータ20によって上方へ移動させると、前記
バケット9は上方でガイドによって転倒される。そこで
、マスは上方ホッパー22及び上方外筒23を経て、バ
レル124内へ装入される。マス装入位置(第2図)は
、別製の蓋離脱装置26によって蓋25を離脱したバレ
ル槽24の上方にあり、蓋閉鎖時及びバレル加工装置運
転時には、上方ホッパー移動シリンダ27によって23
8の位置に待避する。バレル槽24は、第2図において
遠心流動バレル研磨機のものを例示したが、回転式バレ
ル研磨機、振動式バレル研磨機、その他いかなる形式の
バレル研@機の゛バレル槽であっても差支えない。また
上方ホッパー22の内面及び上方外筒23の内面には、
第1図の28に示すようにホッパー3及び外筒4の内面
と同様に合成樹脂製丸棒を接着し、工作物の貼付きを防
止している。
In this way, the bucket 9 containing -charges of squares is connected to a pair of chains 21, 21 fixed to its sides.
When the bucket 9 is moved upward by the drive motor 20, the bucket 9 is overturned by the guide above. There, the mass is charged into the barrel 124 via the upper hopper 22 and the upper barrel 23. The mass charging position (Fig. 2) is located above the barrel tank 24 from which the lid 25 has been removed by a separate lid removal device 26, and when the lid is closed and the barrel processing device is in operation, the upper hopper moving cylinder 27
Take shelter at position 8. Although the barrel tank 24 is that of a centrifugal flow barrel polishing machine in FIG. 2, it may be a barrel tank of a rotary barrel polishing machine, a vibratory barrel polishing machine, or any other type of barrel polishing machine. do not have. Moreover, on the inner surface of the upper hopper 22 and the inner surface of the upper outer cylinder 23,
As shown at 28 in FIG. 1, synthetic resin round rods are bonded to the inner surfaces of the hopper 3 and outer cylinder 4 to prevent workpieces from sticking.

(発明の効果) この発明の整備装置によれば、薄板状又は薄片状等の薄
物工作物をバレル加工するに当り、バレル槽へ装入まで
のホッパー、又はシュートへ薄物加工物が貼りついたり
、或いは研磨中にバレル槽内で工作物が貼りついたり、
若しくはバレル槽壁に貼りついたりすることを防止する
ことができるので、均一な研磨ができるなどの中動を有
する。
(Effects of the Invention) According to the maintenance device of the present invention, when barrel processing a thin workpiece such as a thin plate or flake, the thin workpiece does not stick to the hopper or chute before charging into the barrel tank. , or if the workpiece sticks inside the barrel tank during polishing,
Alternatively, it can prevent sticking to the barrel tank wall, so it has a medium movement that enables uniform polishing.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明の実施例の正面図、第2図は同じく側
面図、第3図は同じくホッパ一部分の拡大側面図、第4
図は同じく第3図中C−C線の端面図、第5図は同じく
合成樹脂粒定量供給装置の拡大正面図、第6図は同じく
拡大側面図、第7図のa−d図は定量供給装置の動作説
明図、第8図はこの発明実施例のバケットの拡大平面図
、第9図は同じく拡大断面図である。 1・・・架構       2・・・ホッパーステー3
・・・ホッパー     4・・・外筒5・・・流体圧
シリンダ  6・・・ピストンロッド7・・・接続子 
     8・・・丸棒9・・・バケット     1
0・・・工作物置12・・・合成樹脂粒定m供給装置 17・・・研磨石供給用シュート 18・・・流体圧シリンダ 19・・・研摩石定量供給装置
FIG. 1 is a front view of an embodiment of the invention, FIG. 2 is a side view, FIG. 3 is an enlarged side view of a portion of the hopper, and FIG.
The figure is an end view taken along the line C-C in Figure 3, Figure 5 is an enlarged front view of the synthetic resin particle quantitative supply device, Figure 6 is an enlarged side view, and views a-d in Figure 7 are quantitative FIG. 8 is an enlarged plan view of a bucket according to an embodiment of the present invention, and FIG. 9 is an enlarged cross-sectional view of the bucket according to an embodiment of the present invention. 1... Frame 2... Hopper stay 3
... Hopper 4 ... Outer cylinder 5 ... Fluid pressure cylinder 6 ... Piston rod 7 ... Connector
8...Round bar 9...Bucket 1
0...Workpiece storage 12...Synthetic resin particle metering supply device 17...Abrasive stone supply chute 18...Fluid pressure cylinder 19...Abrasive stone quantitative supply device

Claims (1)

【特許請求の範囲】 1 各種バレル加工機のバレル槽に装入する未加工工作
物を含む装入物の整備装置であって、バレル加工機に装
入する内容物すなわち未加工工作物、研磨石、コンパウ
ンド溶液などを装入するホッパーの出口シュートの先端
を伸縮自在にバケットの上方に配置し、バケットは昇降
可能で、かつ上方において転倒させた場合に、前記の内
容物が上方ホッパーを経てバレル槽内へ装入できるよう
にしたシュートを設けたバレル加工機用装入物の整備装
置において、前記ホッパーの上方に合成樹脂粒をホッパ
ー内に装入する合成樹脂粒供給装置を設置し、かつ前記
装入物の通路となるホッパー、シュート、シュート外筒
、バケット、上方ホッパー、上方シュートおよび上方シ
ュート外筒の各々の内面の全部、又は一部に合成樹脂棒
を接着したことを特徴とする薄物工作物の自動バレル加
工機用装入物整備装置 2 合成樹脂粒はスチロール粒子とした特許請求の範囲
第1項記載の薄物工作物の自動バレル加工機用装入物整
備装置 3 合成樹脂棒は塩化ビニール棒とした特許請求の範囲
第1項記載の薄物工作物の自動バレル加工機用装入物整
備装置
[Scope of Claims] 1. A maintenance device for charges including unprocessed workpieces to be charged into the barrel tank of various barrel processing machines, which comprises: The tip of the outlet chute of the hopper into which stones, compound solutions, etc. are charged is telescopically placed above the bucket, and the bucket is movable up and down, and when it is overturned from above, the contents pass through the upper hopper. A charge maintenance device for a barrel processing machine that is provided with a chute that can be charged into a barrel tank, wherein a synthetic resin particle supply device for charging synthetic resin particles into the hopper is installed above the hopper, Further, a synthetic resin rod is bonded to all or part of the inner surface of each of the hopper, chute, chute outer cylinder, bucket, upper hopper, upper chute, and upper chute outer cylinder, which serve as passages for the charge. Charge maintenance device for automatic barrel processing machine for thin workpieces 2 Charge maintenance device for automatic barrel processing machine for thin workpieces according to claim 1, wherein the synthetic resin particles are styrene particles Synthetic resin A charging material maintenance device for an automatic barrel processing machine for thin workpieces according to claim 1, wherein the rod is a vinyl chloride rod.
JP28722386A 1986-12-02 1986-12-02 Charged material maintenance device for automatic barrel machining device for thin workpiece Pending JPS63139658A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28722386A JPS63139658A (en) 1986-12-02 1986-12-02 Charged material maintenance device for automatic barrel machining device for thin workpiece

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28722386A JPS63139658A (en) 1986-12-02 1986-12-02 Charged material maintenance device for automatic barrel machining device for thin workpiece

Publications (1)

Publication Number Publication Date
JPS63139658A true JPS63139658A (en) 1988-06-11

Family

ID=17714638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28722386A Pending JPS63139658A (en) 1986-12-02 1986-12-02 Charged material maintenance device for automatic barrel machining device for thin workpiece

Country Status (1)

Country Link
JP (1) JPS63139658A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558230B2 (en) 2000-06-23 2003-05-06 Sumitomo Special Metals Co., Ltd. Method for polishing and chamfering rare earth alloy, and method and machine for sorting out ball media

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6558230B2 (en) 2000-06-23 2003-05-06 Sumitomo Special Metals Co., Ltd. Method for polishing and chamfering rare earth alloy, and method and machine for sorting out ball media

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