JPS63136278A - Production system for repetitive pattern - Google Patents

Abstract

PURPOSE:To increase the producing speed of a repetitive pattern and to improve the production efficiency of the repetitive pattern despite a high repeating frequency, by using a selected bit mover to shift bits so as to obtain a partial overlap between a source and a destination. CONSTITUTION:An area in a pattern production range 111 is selected so that a partial overlap is secured between the destination of a bit mover 12 and a source in the repeating direction of a bit pattern. The contents of a bit map are read out by the bit map shift processing of the mover 12 and written again into a designated position in another bit map memory. Thus the bit map is totally shifted to a prescribed position at a high speed. As a result, the source contents of the mover 12 are copied to the destination by the shift processing of the mover 12. Then a repetitive pattern is produced.

Description

[Detailed Description of the Invention] [Summary] In a repeating pattern generation method of a bit pattern developed on a bitmap, a bit mover having a function of moving bitmap units is used, and the source and destination are moved so that the source and destination partially overlap. Generate a repeating pattern by selecting and moving the contents of the source to the destination.

This makes it possible to efficiently generate a repeating pattern even when the number of repetitions is large.

[Industrial application field]

The present invention relates to a repeating pattern generation method that uses one pattern as a source to generate a repeating pattern, in particular,
The present invention relates to a repetitive pattern generation method for efficiently generating a repetitive pattern of a bit/dot pattern expanded on a rectangular range defined in a bitmap memory, that is, a bitmap.

[Conventional technology]

Conventionally, when generating a repeating pattern using one pattern as a source, a method has been used in which the source pattern is repeatedly read and rewritten.

For example, if the diagonal pattern PTNa shown in FIG. 4(a) developed in the source range is repeated to generate the diagonal pattern PTNb shown in FIG. 4(C) in the destination range, the diagonal pattern in the source range is Read PTNa and set the first part to the first part of the destination range.
The third writing is performed (FIG. 4(a)).

Next, the diagonal line pattern PTNa in the source range is read out again, and a second write is performed following the first write in the destination range (FIG. 4(b)).
).

Thereafter, by writing the diagonal line pattern PTNa in the source range in succession in the destination range in the same manner, a repeated diagonal line pattern P as shown in FIG. 4(C) is created.
TNc is generated.

[Problem that the invention seeks to solve]

As described above, the conventional repetitive pattern generation method generates a repetitive pattern by repeatedly rewriting a bit pattern in the source range to the destination range.

For this reason, a lot of time is required for the repetitive pattern generation process, and in particular, there is a problem in that the processing time increases in proportion to the number of times the bit pattern is repeated.

The present invention utilizes a well-known Bit Mover.
), and by using the bitmap movement function to generate a pattern that manipulates the source bit pattern, it is possible to efficiently generate a repeating pattern even when the number of repetitions is large. The purpose is to provide a generation method.

[Means for solving problems]

The solution taken by the present invention will be explained with reference to the diagram illustrating the principle of the present invention shown in FIG.

In FIG. 1, reference numeral 11 denotes a bitmap memory, in which a pattern generation range 111 in a bitmap format is provided. The diagonal pattern PTNa shown in FIG. 1(a) is
This figure shows an example of a bit pattern that is subject to repeated processing. 12 is a bit mover.

The area within the pattern generation range 111. , Dl.

Ds and Dg are areas in which the bit pattern PTNa to be repeated, which is the source of the bit mover 12, is expanded.

Area D4tD5tD2 within the pattern generation range 111,
D is the destination of the bit mover 12, which is selected so as to partially overlap the source of the bit mover 12 in the repeating direction of the bit pattern. In the case of the figure, the source and destination are the areas D= , Dg , D
? , Da overlap.

Note that ΔDx is the width of the bit pattern, and ΔDy is the height of the pattern generation range 111.

The bit mover 12 is hardware that can move a bitmap and change the shape of a bit pattern developed on a bitmap at high speed in units of bitmaps.

Through the bitmap movement processing of this bit mover 12,
The contents of the bitmap are read and rewritten to specified locations in the same or other bitmap memories, and the entire bitmap is rapidly moved into position. Therefore, in FIG. 1, the contents of the sources (Do, Dt, Dt, Ds) of the bit mover 12 are changed to the destination (Dl) by the movement process of the bit mover 12.
, Ds, D2, Dt). As a result, as explained in the "Effects" section below,
A repeating pattern is generated.

[For production]

The effect of the present invention is demonstrated by the diagonal pattern PT shown in FIG. 1(a).
An example of generating a repeating pattern of Na will be explained.

The diagonal line pattern PTNa to be subjected to repeated processing is in the pattern generation range 111. IDIJDSFD4
(Fig. 1(b)).

The source of the bit mover 12 is this diagonal pattern PTN.
The region containing a (Do, Dt, Dt - Ds
) was selected. On the other hand, the destination of the bit mover 12 is the source (DO, D).

, Dt, Ds) in the bit pattern repetition direction (FIG. 1(a)).

The bit mover 12 moves the source (Do) selected in this way.
, Dl, D7, DO) to the destination (Dl, D5, D2, D3).

From the movement function of the bit mover 12, first select the source (Do
, Dt - Dl, Ds ) within the region (Do.

Diagonal line pattern PTN developed in Dl, DO, Dl)
a is read and the destination (D, ,D, ,
The region (D, ,D5°Dl, in D, ,D, )
D6') (FIG. 1(C)).

The contents of the area (DO, DI, DS, D,) in this source (Do, DI, D7, DO) are transferred to the destination (Dl, DS, D2, DI).
) Even after completing the process of moving to the area (Dl, Ds, D-, DO), the bit mover 12 continues to move to the area (Dl, Ds, D
t, Ds) written in the diagonal line pattern PTN
Read the contents of a again as the source contents,
Destination (Dl, Ds −D2 −
D3), the next area (DO, D) in D2. D3)
Performs processing to write to.

As a result, a repeating pattern PTNc is generated on the pattern generation range 111, as shown in FIG. 1(d).

In this case, if the source and destination of the bit mover 12 are selected as follows, for example, it is possible to further speed up the repetitive pattern generation process.

Now, let the height of the diagonal pattern PTNa be ΔSy, and Δ5
When y=DI DS =Do Dl, Δ5y
=D7 D2 =Da D3 (=DI DS =D
OD4). That is, if the height of the pattern generation range 111 is ΔDy, then the height of the source. D.O.
(=DI D7) is selected as Do Ds (=D+Dt)=ΔDy−Δsy, and the destination is the area (D, , D3.D2.

Select D3).

When the source and destination of the bit mover 12 are selected in this way, the entire repeating pattern is generated by one movement process by the bit mover 12, so that it is possible to further improve the efficiency of the repeating pattern generation process.

As described above, the source and destination of the bit mover 12 are selected so that they partially overlap, and the bit map unit movement function of the bit mover 12 is used to generate a repeating pattern of the bit pattern developed on the source. As a result, it is possible to speed up the repetitive pattern generation process.

Further, even if the number of repetitions of a pattern increases, the number of processing times does not increase, so the processing efficiency of generating a repetitive pattern with a large number of repetitions can be significantly improved compared to the conventional method.

〔Example〕

Embodiments of the present invention will be described with reference to FIGS. 1, 2, and 3. FIG. 2 is an explanatory diagram of the configuration of a repeating pattern generation system implementing the present invention, and FIG. 3 is an explanatory diagram of another embodiment of the present invention.

(A) Configuration of repeated pattern generation system In FIG. 2, a bitmap memory 11, a pattern generation range 11
1 and the bit mover 12 are as described in FIG.

13 is an output device such as a display or a printer.

Reference numeral 14 denotes a pattern generation section in which pattern data such as characters and figures is stored.

15 is a main control unit that controls the operation of the entire system and the operations of each part and each device within the system.

In the bitmap 11, if the output device 13 is a display, a frame memory is used for the pattern generation range 111, for example. Reference numeral 112 denotes a bit pattern storage area in which a bit pattern to be subjected to repeated processing is stored.

(B) Operation of the first embodiment The operation of the first embodiment will be explained with reference to FIG. The first example is an example in which a simple repeating pattern is generated, and the pattern to be subjected to the repeating process is the diagonal line pattern PTNa shown in FIG. 1(a).

First, processing request information for generating a repeating pattern including processing target pattern information is manually input to the main control unit 15 from a host or a keyboard (not shown).

Based on the processing target pattern information, the main control unit 15 extracts data of a diagonal line pattern PTNa that is a predetermined repetition target from the pattern generation unit 14 and develops it in the bit pattern storage area 112 of the bitmap memory 11. When this storage process is completed, the bit mover 12 is instructed to generate a repeated bit pattern.

The bit mover 12 reads out the diagonal line pattern PTNa in the bit pattern storage area 112, and uses its movement function to move the source (Do, DI,
Region (Do, D) within (DT, DS).

, D5, D,) (Fig. 1 et al.)).

In the pattern generation range 111, the source of the bit mover is the area (Do, DI) as explained in FIG.
, DT eDs ), the destination is the region (Dl , Ds , D2 , D3 ), and both are the region (Dl , Ds , DT , DS
) - Toden is the same.

Between the height ΔSy of the diagonal line pattern PTNa and both areas,
As explained in Fig. 1, Δ5y=D+ Ds = Do Dl = D? D2=D
, D3 holds true. That is, the pattern generation range 111
If the height of is ΔDy, then the height of the source. DS
(=D+D) ) is Do DS (=DI
DT ) = ΔDy - ΔSy. Further, the destination is an area (D<
= Ds, D2, D3).

The bit mover 12 moves the source (Do) selected in this way.
= DI - Dl - Da ) to the destination ( Dl - Ds , D2 , D3 )
Perform the process of moving to .

From the movement function of the bit mover 12, first select the source (Do
, DI , DT , Ds ) within the region (Do
.

1) Diagonal line pattern PTN developed in , , D, , Dl)
a is read and the destination (Dl tDs
, D2, D3) within the region (Dl, Ds
.

DT-Da) (FIG. 1(C)).

Even after the movement processing of the diagonal line pattern PTNa in this area (Do, DI, Ds, D,) is completed, the bit mover 12 continues to move the area (Dl
, Ds, DT, Ds) is read out again as the source content, and the destination (Dl, DS,
The next area (DS, Dt, D2
-Ds).

As a result, a repeating pattern PTNc is generated by one movement process by the bit mover 12, as shown in FIG. 1(d).

As is clear from the above explanation, according to the repeating pattern generation method of the present invention, the final repeating pattern is directly stored in the pattern generation range 111 where the final repeating pattern is stored, without the need for intermediate processing using a work area. It is possible to generate a repeating pattern.

In addition, the height ΔDy of the pattern generation range 111 is determined by the bit pattern (diagonal pattern PTN
It is not limited to a positive integer multiple of the height ΔSy in a), but can be any multiple value such as 2.5 times or 3.6 times. Even in that case, the entire repeating pattern can be generated by one movement process by the bit mover 12.

When the process of generating the predetermined repeating pattern PTNC in the pattern generation range 111 as described above is completed, the main control unit 15 instructs the output device 13 to output. Output device 1
3 is a repeating pattern P from the pattern generation range 111
Take out the TNc and display it on the display or print it out on the printer.

(C) Operation of the second embodiment The operation of the second embodiment will be explained with reference to FIG. The second embodiment is an example in which a pattern is generated by enlarging a part or the whole of the bit pattern by repeatedly performing pattern generation processing on each part of the bit pattern to be processed. This is an example in which a double-width pattern is generated by enlarging a bit pattern (letter pattern A) by eight times in both the vertical and horizontal directions.

In the second embodiment, the operations other than the enlarged pattern generation process are the same as in the first embodiment, so the following explanation will focus on the enlarged pattern generation process performed by the bitmap memo IJ11 and the bit mover 12. .

It is now assumed that the character pattern A to be processed stored in the bit pattern storage area 112 has eight dots in the vertical direction, as shown in (a) of FIG. 3(A).

The main control part 15 enlarges the dot pattern in each line of this character pattern eight times in the horizontal direction, and then enlarges the dot pattern in the jth (j=0
The 8th to 8th enlarged partial dot patterns are stored in the 8th row of the pattern generation range 111, as shown in FIG.

The bit mover 12 repeatedly performs pattern generation processing eight times on each partial dot pattern stored in this manner.

For example, the partial dot pattern DP in the eighth row.

To generate a repeating pattern eight times as many times as The partial dot pattern DP is moved as the destination. As a result, as shown in FIGS. 3A and 3C, a partial dot pattern DP, a pattern repeated 08 times, is generated, and the partial dot pattern DP is enlarged eight times in the vertical direction.

Similarly, by repeating the pattern generation process eight times for each partial dot pattern, a double-width pattern A is created in which the original character pattern A is enlarged eight times, as shown in FIG. 3 (Δ) (d). is generated on the pattern generation range 111.

The double-angle pattern A generated as described above is taken out by the output device 13 and displayed on a display or printed out on a printer in the same manner as in the first embodiment described above.

Immediately expand the character pattern A in the bit pattern storage area 112 without expanding it horizontally (j = 0 to 8)
If the 8th line dot pattern is stored in the 8th line of the pattern generation range 111 and the above-mentioned repetitive pattern generation process is performed, a long pattern in which the character pattern A is enlarged vertically by 8 times can be generated. I can do it.

Further, by performing repeated pattern generation processing only on some row dot patterns of character pattern A, it is possible to perform enlargement processing on a part of the character pattern.

Although each embodiment of the present invention has been described above, the present invention
The present invention is not limited to these examples, and any repeating pattern can be generated. A double-angle pattern can also be generated in which the length of the enlarged bit pattern is expanded by M times (M is an integer of 2 or more) and the width is expanded by N times (N is an integer of 1 or more).

〔Effect of the invention〕

As explained above, according to the present invention, the following effects can be obtained.

(b) Since the movement process was performed using the selected bit mover so that a part of the source and destination overlapped,
Repeated pattern generation processing can be sped up.

(b) Even if the number of repetitions of a pattern increases, the number of processing times is not determined, so that the processing efficiency of generating a repetitive pattern with a large number of repetitions can be significantly improved compared to the conventional method.

[Brief explanation of the drawing]

Fig. 1...Explanatory diagram of the principle of the present invention, Fig. 2...
...Explanatory diagram of the implementation system of the present invention, Fig. 3...
...Explanatory diagram of another embodiment of the present invention, Fig. 4...
FIG. 2 is an explanatory diagram of a conventional repeating pattern generation method. 1 to 3, 11...Bit map memory, 111...Pattern generation range, 112...Bit pattern storage area, 12...
. . . Bit mover, 13 . . . Output device, 14 . . . Main control unit.

Claims (3)

[Claims] (1) In a repeating pattern generation method of a bit pattern expanded on a bitmap formed by a rectangular area defined in a bitmap memory (11), a bit mover (12) having a function of moving in units of rectangles is provided. , a bit mover (1
2), and move the bit mover (12
) is selected, and a bit mover (12) performs movement processing between the source and destination to generate a repeating pattern of bit patterns. (2) When the height of the bitmap where the bit pattern is developed is ΔSy, and the height of the pattern generation range (111) where the repeated pattern is generated is ΔDy, the height of the source is selected as ΔDy - ΔSy. 2. The repeated pattern generation method according to claim 1, wherein the destination is selected in an area excluding a bitmap area in which the bit pattern is developed from the pattern generation range (111). (3) The repetitive pattern generation method according to claim 1, wherein a repetitive pattern generation process is performed on a partial pattern of a bit pattern.