JPS63132143A - Foreign matter inspection instrument - Google Patents

Foreign matter inspection instrument

Info

Publication number
JPS63132143A
JPS63132143A JP27660886A JP27660886A JPS63132143A JP S63132143 A JPS63132143 A JP S63132143A JP 27660886 A JP27660886 A JP 27660886A JP 27660886 A JP27660886 A JP 27660886A JP S63132143 A JPS63132143 A JP S63132143A
Authority
JP
Japan
Prior art keywords
foreign matter
scattered light
pattern
light
filter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP27660886A
Other languages
Japanese (ja)
Other versions
JPH0776753B2 (en
Inventor
Shoichi Horiuchi
堀内 昭一
Takashi Maruyama
隆 丸山
Kazuhide Mukohara
和秀 向原
Juichiro Ukon
寿一郎 右近
Yutaka Saijo
豊 西條
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Horiba Ltd
Hitachi Ltd
Original Assignee
Horiba Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Horiba Ltd, Hitachi Ltd filed Critical Horiba Ltd
Priority to JP61276608A priority Critical patent/JPH0776753B2/en
Publication of JPS63132143A publication Critical patent/JPS63132143A/en
Publication of JPH0776753B2 publication Critical patent/JPH0776753B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/94Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To securely detect foreign matter even when a pattern becomes fine by irradiating a sample with polarized laser and detecting and comparing scattered light beams from the sample through two polarizing filters different in angle of polarization. CONSTITUTION:When S-polarized laser light L0 is projected as shown by an arrow, the foreign matter 7 generates scattered light L1 consisting of S-polarized light and vertical polarized light and the pattern 8 generates scattered light L2 consisting principally of P-polarized light. Those scattered light beams L1 and L2 are guided to the two polarizing filters 9a and 9b and photodetected by detectors 4a and 4b, respectively. Here, the filter 9a is set to for example, a 0 deg. angle of polarization and the filter 9b is set to, for example, 90 deg.. Then, a comparator 10 compares the signals of the detectors 4a and 4b with each other to recognize the scattered light L1 from the foreign matter when 4a>4b in terms of intensity and the scattered light L2 from the pattern 8 when 4a<4b. Therefore, only when 4a>4b, the signal of the detector 4a is sent to an arithmetic processing part 11 to compute the size of the foreign matter. Consequently, the arithmetic result is only output information from the foreign matter 7.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、微小なゴミなどの異物を検出する装置に係り
、特に微細パターンを形成したレティクルなどに付着し
た異物検出に好適な異物検査装置に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a device for detecting foreign matter such as minute dust, and in particular, a foreign matter inspection device suitable for detecting foreign matter attached to a reticle formed with a fine pattern. Regarding.

〔従来の技術〕[Conventional technology]

従来の装置は、特開昭59−82727号公報に記載の
ようにパターン付基板上の異物を検出する方法が知られ
ている。しかし、この方式においてパターンが微細化す
るに従い検出異物も微小化することから異物とパターン
の弁別能力が低下し、パターンを誤検出する点について
は配慮されていなかった。
As a conventional device, a method for detecting foreign matter on a patterned substrate is known, as described in Japanese Patent Laid-Open No. 59-82727. However, in this method, as the pattern becomes finer, the detected foreign matter also becomes finer, so that the ability to discriminate between the foreign matter and the pattern deteriorates, and no consideration is given to the possibility of erroneously detecting the pattern.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術は異物とパターンを弁別し異物のみの信号
を得るため被検体に偏光レーザを照射し、被検体から散
乱した散乱光を偏光フィルターを通し異物から垂直偏光
(以降S偏光と略称する)成分のみを検出するようにし
ているが、パターンの微細化に伴い、検出異物も微小化
し、ノイズ成分であるパターンの信号台が増え、逆に異
物は微小化と共に信号レベルが低下するため、S/N比
が益々低下する問題が発生する。
In the above conventional technology, in order to distinguish between foreign objects and patterns and obtain a signal of only the foreign objects, the object is irradiated with a polarized laser, and the scattered light from the object is passed through a polarizing filter to form vertically polarized light (hereinafter abbreviated as S-polarized light) from the foreign object. We are trying to detect only the component, but as the pattern becomes finer, the detected foreign matter also becomes finer, and the number of pattern signals that are noise components increases.Conversely, the signal level of foreign matter decreases as the size of the foreign matter becomes finer, so the S A problem arises in which the /N ratio decreases more and more.

本発明の目的は、パターンが微細化してもパターンの影
響を受けずに異物を確実に検出する異物検査装置を提供
することにある。
An object of the present invention is to provide a foreign matter inspection device that reliably detects foreign matter without being affected by the pattern even if the pattern becomes finer.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、異物及びパターンから散乱される偏光レー
ザの偏光特性を多面的に活用することにより解決できる
The above object can be achieved by making multifaceted use of the polarization characteristics of the polarized laser that is scattered from the foreign object and the pattern.

すなわち、S偏光レーザを被検体に照射し、偏光フィル
ターの偏光角度を0°、90°に変えパターンと異物の
信号レベルを比較すると、Ooでは異物〉パターン、9
0°では異物くパターンと変化するため、この2つの角
度の信号を比較することにより、異物とパターンの弁別
能力を飛躍的に向上することができる。
In other words, when the S-polarized laser is irradiated onto the subject and the polarization angle of the polarizing filter is changed to 0° and 90° and the signal level of the pattern and the foreign object are compared, Oo is the foreign object> pattern, 9
At 0°, the foreign object changes to the pattern, so by comparing the signals at these two angles, the ability to discriminate between the foreign object and the pattern can be dramatically improved.

〔動作〕〔motion〕

散乱光を検出する検出系に角度の異なるOoと90’の
偏光フィルターと、それと対となる検出素子を配置した
散乱光をそれぞれ検出するか、あるいは、一つの偏光フ
ィルターで同一の散乱光を偏光角度0°と90°で検出
するようにする。
Either Oo and 90' polarizing filters with different angles and a pair of detection elements are arranged in the detection system to detect the scattered light, or one polarizing filter can be used to polarize the same scattered light. Detect at angles of 0° and 90°.

このようにしておくと前述した如く、0″と90”で異
物とパターンの信号レベルが極端に異なるため、両者の
信号強度を比較することによりパターンを弁別できる。
If this is done, as described above, since the signal levels of the foreign object and the pattern are extremely different between 0'' and 90'', the pattern can be discriminated by comparing the signal intensities of the two.

すなわち、異物はolく90°となりパターンは0″〈
90°となるため、後者をパターンと認識することがで
き弁別可能となる。
In other words, the foreign object is 90° and the pattern is 0''
Since the angle is 90°, the latter can be recognized as a pattern and can be discriminated.

〔実施例〕〔Example〕

以下本発明の一実施例を図により説明する。 An embodiment of the present invention will be described below with reference to the drawings.

第1図は、検出系のポイントを示す図で、被検体、例え
ばレティクル1にはパターン形成上に異物付着を防止す
る為、0.8 μm厚などのプラスチックフィルムと金
属枠で構成したペリクル2が貼り付けられている。この
レティクル1の異物を検査するため、先づAの如く偏光
レーザを照射し、レティクル1の上にYで示す方向にス
キャンし、Y線上で発生する散乱光をペリクル2の枠に
影響されずに検出する為、Y線上左右を2分割し、それ
ぞれ散乱光1aを検出器3で散乱光2aを検出器4で検
出する。
Figure 1 is a diagram showing the points of the detection system.In order to prevent foreign matter from adhering to the pattern formed on the object to be inspected, for example, the reticle 1, there is a pellicle 2 made of a plastic film with a thickness of 0.8 μm or the like and a metal frame. is pasted. In order to inspect this reticle 1 for foreign matter, first irradiate a polarized laser as shown in A, scan the reticle 1 in the direction shown by Y, and scatter light generated on the Y line without being affected by the frame of the pellicle 2. In order to detect this, the left and right sides on the Y line are divided into two parts, and the scattered light 1a is detected by the detector 3 and the scattered light 2a is detected by the detector 4, respectively.

一方、レティクル1はステージ(図示せず)の移動でX
方向手前側に移動しレティクル1上の半面の検査を終る
0次にレーザをBの如く反対方向から照射し、手前側半
面の検査をする。
On the other hand, the reticle 1 is moved by the movement of the stage (not shown).
The laser beam is irradiated from the opposite direction as shown in B to inspect the front half of the reticle 1.

第2図は検出系の原理を示す図で、S偏光レーザLoを
矢印の方向から照射すると異物7からはS偏光と垂直偏
光(以降P偏光と略称する)が混在した散乱光LLが発
生し、パターン8からは主にP偏光の散乱光Lzが発生
する。両者の散乱光を検出するため、偏光フィルター9
を通して検出器4で受光する。この時の偏光特性を第3
図により説明する。
Figure 2 is a diagram showing the principle of the detection system. When the S-polarized laser Lo is irradiated from the direction of the arrow, the foreign object 7 generates scattered light LL, which is a mixture of S-polarized light and vertically polarized light (hereinafter abbreviated as P-polarized light). , the pattern 8 mainly generates P-polarized scattered light Lz. In order to detect the scattered light of both, a polarizing filter 9 is used.
The light is received by the detector 4 through the light. The polarization characteristics at this time are
This will be explained using figures.

偏光フィルター9の偏光角度を変化させると図に示す如
く、異物7とパターン8から発する散乱光強度が出きく
変化する。そこで、第4図の一実施例に示す如く、検出
系を構成する。
As shown in the figure, when the polarization angle of the polarizing filter 9 is changed, the intensity of scattered light emitted from the foreign object 7 and the pattern 8 changes significantly. Therefore, a detection system is constructed as shown in one embodiment of FIG.

異物7とパターン8から発する1′!1乱光I、1. 
r、aを2つの偏光フィルター9a、9bに導き、それ
ぞれ検出器4a、4bで受光する。ここで、偏光フィル
ター9aは偏光角が例えばOoに、偏光フィルター9b
は、例えば90″に設定しておく。
1' emitted from foreign object 7 and pattern 8! 1 Scattered light I, 1.
r and a are guided to two polarizing filters 9a and 9b, and are received by detectors 4a and 4b, respectively. Here, the polarizing filter 9a has a polarization angle of, for example, Oo, and the polarizing filter 9b
is set to, for example, 90''.

この様にしておくと、偏光フィルタ9a、9bを透過し
た光は、第3図に示す、偏光角度0′″と90@の散乱
光特性に基づくものとなる。したがって、コンパレータ
10、で検出器4a、4bの信号を比較し、その強度が
、4a>4bの管台は異物7、からの散乱光L1であり
、4a(4bの場合はパターン8からの散乱光L2と認
識することができるので、4a)4bの時のみ、演算処
理部11.に4aからの信号のみを送信し、異物サイズ
の演算をする。この様に演算処理部11、にはパターン
8、からの信号は送信されないため、演算結果は、異物
7、からの情報のみが出力されパターン8からの演報は
なくなる。
If this is done, the light transmitted through the polarizing filters 9a and 9b will be based on the scattered light characteristics of polarization angles of 0'' and 90@ as shown in FIG. Comparing the signals of 4a and 4b, the nozzle whose intensity is 4a>4b can be recognized as the scattered light L1 from the foreign object 7, and in the case of 4a (4b), it can be recognized as the scattered light L2 from the pattern 8. Therefore, only in the case of 4a) and 4b, only the signal from 4a is sent to the arithmetic processing section 11 to calculate the foreign object size.In this way, the signal from pattern 8 is not sent to the arithmetic processing section 11. Therefore, as a calculation result, only the information from the foreign object 7 is output, and the information from the pattern 8 is not output.

第5図は1本発明に係るもう一つの実施例を示す図で、
偏光フィルター9、を一つの構成し、このフィルタ9は
偏光角度を変更可能なフィルター回転駆動部12と連結
されており、演算処理部11、からの同期信号により駆
動信号を生し、フイルター9、の偏光角度を0@と90
”などのあらかじめ決められた2つの角度に変え散乱光
Lx。
FIG. 5 is a diagram showing another embodiment according to the present invention,
A polarizing filter 9 constitutes one unit, and this filter 9 is connected to a filter rotation drive unit 12 that can change the polarization angle, and generates a drive signal in response to a synchronization signal from an arithmetic processing unit 11. The polarization angle of 0@ and 90
”The scattered light Lx is changed to two predetermined angles such as “.

Lzを検出器4、で受光する。さらに、演算処理部11
、はフィルター9の駆動信号と同期して、0°と90°
の偏光角度に相当する受光信号をそれぞれメモリし、前
記実施例の要領でコンパレータ10、相当以降の伴走と
、演算を行うことで前記実施例と同様の効果を得ること
が出来る。
A detector 4 receives Lz. Furthermore, the arithmetic processing unit 11
, are 0° and 90° in synchronization with the drive signal of filter 9.
It is possible to obtain the same effect as in the above embodiment by storing the received light signals corresponding to the polarization angles respectively in memory, and performing calculations with the comparator 10 and the corresponding subsequent ones in the same manner as in the above embodiment.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、パターンと異物の偏光特性により、パ
ターンの弁別が確実にでき、従来パターンが微細になる
と誤報となっていた現象が全くなくなるため、今後益々
微細化されるパターンを形成した例えば、レティクル上
の異物検査装置に装備することが大きな効果が期待され
る。
According to the present invention, patterns can be reliably distinguished by the polarization characteristics of patterns and foreign objects, and the phenomenon that conventionally caused false alarms when patterns become finer can be completely eliminated. It is expected that a great effect will be achieved by equipping the foreign object inspection device on the reticle.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の検出系の概要を示す図、第2@は、
検出原理を示す図、第3図は、偏光特性を示す図、第4
図は、検出系の第1の構成例を示す図、第5図は検出系
の第2の構成例を示す図。 1・・・レティクル、2・・・ペリクル、3・・・検出
器、4・・・検出器、7・・・異物、8・・・パターン
、9・・・偏光フィルター、10・・・コンパレータ、
11・・・演算処理部・              
        ′7−h代理人 弁理士 小川勝男 
  シ2′第1 図 / −−−Lティクlし Z −・ペリ7/L/ 3−一一才史出各 4−梗云呑 第2図 7−−−莫勿 8−−− /う一ン q−一−イ涛Fteプヂルタ− 第3 区 侮光 角IE(dq) 第4図 9υ −−一鳴1光フィルターレ 10−−−コン/マし−7 1/ −−一涜′$処理卵
FIG. 1 is a diagram showing an outline of the detection system of the present invention, and FIG.
Figure 3 is a diagram showing the detection principle, and Figure 4 is a diagram showing polarization characteristics.
FIG. 5 is a diagram showing a first configuration example of the detection system, and FIG. 5 is a diagram showing a second configuration example of the detection system. DESCRIPTION OF SYMBOLS 1... Reticle, 2... Pellicle, 3... Detector, 4... Detector, 7... Foreign object, 8... Pattern, 9... Polarizing filter, 10... Comparator ,
11...Arithmetic processing unit/
'7-h Agent Patent Attorney Katsuo Ogawa
shi 2' 1st figure / --- L tick l Z - Peri 7 / L / 3 - 11 years old each 4 - Kyo Yun drink 2nd figure 7 --- Mo Mu 8 --- / U 1 - 1 - 1 Fte pulter - 3rd ward light angle IE (dq) Fig. 4 9υ -- one sound 1 light filter 10 --- con / mashi - 7 1 / -- one samurai' $ processed eggs

Claims (1)

【特許請求の範囲】 1、パターン付基板上に付着した異物を偏光レーザを用
い検出する装置において、被検体から発する散乱光を2
つの異なる偏光角度を有する偏光フィルターを通してそ
れぞれ検出し、2つの信号の強度判定結果に基づき、異
物とパターンを弁別することを特徴とする異物検査装置
。 2、偏光フィルターを偏光角度の異なる2つのフィルタ
ーで構成したことを特徴とする特許請求の範囲1項の異
物検査装置。 3、1つの偏光フィルターと該フィルターの偏光角度を
変えるための機構を有する検出系で構成したことを特徴
とする特許請求の範囲1項の異物検査装置。
[Claims] 1. In an apparatus for detecting foreign matter attached to a patterned substrate using a polarized laser, scattered light emitted from a subject is
1. A foreign object inspection device characterized by detecting the two signals through polarizing filters having different polarization angles, and discriminating between foreign objects and patterns based on the intensity determination results of the two signals. 2. The foreign matter inspection device according to claim 1, wherein the polarizing filter is composed of two filters having different polarization angles. 3. The foreign matter inspection device according to claim 1, comprising a detection system having one polarizing filter and a mechanism for changing the polarization angle of the filter.
JP61276608A 1986-11-21 1986-11-21 Foreign matter inspection device Expired - Lifetime JPH0776753B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61276608A JPH0776753B2 (en) 1986-11-21 1986-11-21 Foreign matter inspection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61276608A JPH0776753B2 (en) 1986-11-21 1986-11-21 Foreign matter inspection device

Publications (2)

Publication Number Publication Date
JPS63132143A true JPS63132143A (en) 1988-06-04
JPH0776753B2 JPH0776753B2 (en) 1995-08-16

Family

ID=17571811

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61276608A Expired - Lifetime JPH0776753B2 (en) 1986-11-21 1986-11-21 Foreign matter inspection device

Country Status (1)

Country Link
JP (1) JPH0776753B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001041289A (en) * 1999-07-15 2001-02-13 Valeo Flexible flywheel for automobile clutch
WO2011099404A1 (en) * 2010-02-15 2011-08-18 Ricoh Company, Ltd. Transparent object detection system and transparent flat plate detection system
JP2011164061A (en) * 2010-02-15 2011-08-25 Ricoh Co Ltd Transparent object detection system
JP2011164062A (en) * 2010-02-15 2011-08-25 Ricoh Co Ltd Transparent flat plate detection system
WO2019102734A1 (en) * 2017-11-24 2019-05-31 ソニー株式会社 Detection device and electronic device manufacturing method

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61230048A (en) * 1985-04-05 1986-10-14 Hitachi Ltd Foreign matter detecting method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61230048A (en) * 1985-04-05 1986-10-14 Hitachi Ltd Foreign matter detecting method

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001041289A (en) * 1999-07-15 2001-02-13 Valeo Flexible flywheel for automobile clutch
WO2011099404A1 (en) * 2010-02-15 2011-08-18 Ricoh Company, Ltd. Transparent object detection system and transparent flat plate detection system
JP2011164061A (en) * 2010-02-15 2011-08-25 Ricoh Co Ltd Transparent object detection system
JP2011164062A (en) * 2010-02-15 2011-08-25 Ricoh Co Ltd Transparent flat plate detection system
US9080986B2 (en) 2010-02-15 2015-07-14 Ricoh Company, Ltd. Transparent object detection system and transparent flat plate detection system
WO2019102734A1 (en) * 2017-11-24 2019-05-31 ソニー株式会社 Detection device and electronic device manufacturing method
US11598715B2 (en) 2017-11-24 2023-03-07 Sony Corporation Detection apparatus and method of producing electronic apparatus

Also Published As

Publication number Publication date
JPH0776753B2 (en) 1995-08-16

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