JPS63127893U - - Google Patents

Info

Publication number
JPS63127893U
JPS63127893U JP1860787U JP1860787U JPS63127893U JP S63127893 U JPS63127893 U JP S63127893U JP 1860787 U JP1860787 U JP 1860787U JP 1860787 U JP1860787 U JP 1860787U JP S63127893 U JPS63127893 U JP S63127893U
Authority
JP
Japan
Prior art keywords
vertical
balance
inclined surface
work head
cylinder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1860787U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0344472Y2 (US07923587-20110412-C00022.png
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1860787U priority Critical patent/JPH0344472Y2/ja
Publication of JPS63127893U publication Critical patent/JPS63127893U/ja
Application granted granted Critical
Publication of JPH0344472Y2 publication Critical patent/JPH0344472Y2/ja
Expired legal-status Critical Current

Links

JP1860787U 1987-02-10 1987-02-10 Expired JPH0344472Y2 (US07923587-20110412-C00022.png)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1860787U JPH0344472Y2 (US07923587-20110412-C00022.png) 1987-02-10 1987-02-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1860787U JPH0344472Y2 (US07923587-20110412-C00022.png) 1987-02-10 1987-02-10

Publications (2)

Publication Number Publication Date
JPS63127893U true JPS63127893U (US07923587-20110412-C00022.png) 1988-08-22
JPH0344472Y2 JPH0344472Y2 (US07923587-20110412-C00022.png) 1991-09-18

Family

ID=30812436

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1860787U Expired JPH0344472Y2 (US07923587-20110412-C00022.png) 1987-02-10 1987-02-10

Country Status (1)

Country Link
JP (1) JPH0344472Y2 (US07923587-20110412-C00022.png)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010030702A (ja) * 2008-07-25 2010-02-12 Murata Machinery Ltd 昇降装置

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US9394608B2 (en) 2009-04-06 2016-07-19 Asm America, Inc. Semiconductor processing reactor and components thereof
US8946830B2 (en) 2012-04-04 2015-02-03 Asm Ip Holdings B.V. Metal oxide protective layer for a semiconductor device
US9558931B2 (en) 2012-07-27 2017-01-31 Asm Ip Holding B.V. System and method for gas-phase sulfur passivation of a semiconductor surface
US9324811B2 (en) 2012-09-26 2016-04-26 Asm Ip Holding B.V. Structures and devices including a tensile-stressed silicon arsenic layer and methods of forming same
US9589770B2 (en) 2013-03-08 2017-03-07 Asm Ip Holding B.V. Method and systems for in-situ formation of intermediate reactive species
US9484191B2 (en) 2013-03-08 2016-11-01 Asm Ip Holding B.V. Pulsed remote plasma method and system
US9018111B2 (en) 2013-07-22 2015-04-28 Asm Ip Holding B.V. Semiconductor reaction chamber with plasma capabilities
US9556516B2 (en) 2013-10-09 2017-01-31 ASM IP Holding B.V Method for forming Ti-containing film by PEALD using TDMAT or TDEAT
US9447498B2 (en) 2014-03-18 2016-09-20 Asm Ip Holding B.V. Method for performing uniform processing in gas system-sharing multiple reaction chambers
US9404587B2 (en) 2014-04-24 2016-08-02 ASM IP Holding B.V Lockout tagout for semiconductor vacuum valve
US9543180B2 (en) 2014-08-01 2017-01-10 Asm Ip Holding B.V. Apparatus and method for transporting wafers between wafer carrier and process tool under vacuum
US9478415B2 (en) 2015-02-13 2016-10-25 Asm Ip Holding B.V. Method for forming film having low resistance and shallow junction depth
US9455138B1 (en) 2015-11-10 2016-09-27 Asm Ip Holding B.V. Method for forming dielectric film in trenches by PEALD using H-containing gas
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US10770286B2 (en) 2017-05-08 2020-09-08 Asm Ip Holdings B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US12040200B2 (en) 2017-06-20 2024-07-16 Asm Ip Holding B.V. Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
US10923344B2 (en) 2017-10-30 2021-02-16 Asm Ip Holding B.V. Methods for forming a semiconductor structure and related semiconductor structures
US10290508B1 (en) 2017-12-05 2019-05-14 Asm Ip Holding B.V. Method for forming vertical spacers for spacer-defined patterning
TWI799494B (zh) 2018-01-19 2023-04-21 荷蘭商Asm 智慧財產控股公司 沈積方法
US11031242B2 (en) 2018-11-07 2021-06-08 Asm Ip Holding B.V. Methods for depositing a boron doped silicon germanium film
US12040199B2 (en) 2018-11-28 2024-07-16 Asm Ip Holding B.V. Substrate processing apparatus for processing substrates
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
CN112309843A (zh) 2019-07-29 2021-02-02 Asm Ip私人控股有限公司 实现高掺杂剂掺入的选择性沉积方法
USD979506S1 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Insulator
KR20210024423A (ko) 2019-08-22 2021-03-05 에이에스엠 아이피 홀딩 비.브이. 홀을 구비한 구조체를 형성하기 위한 방법
KR20210054983A (ko) 2019-11-05 2021-05-14 에이에스엠 아이피 홀딩 비.브이. 도핑된 반도체 층을 갖는 구조체 및 이를 형성하기 위한 방법 및 시스템
US11527403B2 (en) 2019-12-19 2022-12-13 Asm Ip Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
US12040177B2 (en) 2020-08-18 2024-07-16 Asm Ip Holding B.V. Methods for forming a laminate film by cyclical plasma-enhanced deposition processes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010030702A (ja) * 2008-07-25 2010-02-12 Murata Machinery Ltd 昇降装置

Also Published As

Publication number Publication date
JPH0344472Y2 (US07923587-20110412-C00022.png) 1991-09-18

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