JPS63126889A - (dipyridyl) (cis-1,2-ethyleneditholato)nickel derivative - Google Patents
(dipyridyl) (cis-1,2-ethyleneditholato)nickel derivativeInfo
- Publication number
- JPS63126889A JPS63126889A JP61271114A JP27111486A JPS63126889A JP S63126889 A JPS63126889 A JP S63126889A JP 61271114 A JP61271114 A JP 61271114A JP 27111486 A JP27111486 A JP 27111486A JP S63126889 A JPS63126889 A JP S63126889A
- Authority
- JP
- Japan
- Prior art keywords
- group
- ring
- methanol
- formulas
- dipyridyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 title claims abstract description 8
- 150000002815 nickel Chemical class 0.000 title claims description 3
- 239000000126 substance Substances 0.000 claims abstract description 20
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 19
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 14
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims abstract description 7
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 6
- 125000003118 aryl group Chemical group 0.000 claims abstract description 4
- 125000005161 aryl oxy carbonyl group Chemical group 0.000 claims abstract description 4
- 125000004093 cyano group Chemical group *C#N 0.000 claims abstract description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 abstract description 72
- 150000001875 compounds Chemical class 0.000 abstract description 32
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract description 15
- 239000000463 material Substances 0.000 abstract description 8
- 239000002244 precipitate Substances 0.000 abstract description 8
- 239000006096 absorbing agent Substances 0.000 abstract description 7
- 239000003960 organic solvent Substances 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 7
- 239000013078 crystal Substances 0.000 abstract description 6
- 239000011230 binding agent Substances 0.000 abstract description 3
- 238000002360 preparation method Methods 0.000 abstract description 2
- 230000003449 preventive effect Effects 0.000 abstract description 2
- 239000003795 chemical substances by application Substances 0.000 abstract 1
- -1 indophenol Chemical class 0.000 description 23
- 239000000975 dye Substances 0.000 description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- 230000003287 optical effect Effects 0.000 description 9
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000004743 Polypropylene Substances 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 229920001155 polypropylene Polymers 0.000 description 6
- 238000003756 stirring Methods 0.000 description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 229910052759 nickel Inorganic materials 0.000 description 5
- 239000000049 pigment Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000012141 concentrate Substances 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 239000000706 filtrate Substances 0.000 description 4
- 239000000976 ink Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 4
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 238000003786 synthesis reaction Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 125000006606 n-butoxy group Chemical group 0.000 description 3
- 150000007530 organic bases Chemical class 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- 238000001782 photodegradation Methods 0.000 description 3
- 229910052723 transition metal Inorganic materials 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- 102000004190 Enzymes Human genes 0.000 description 2
- 108090000790 Enzymes Proteins 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 125000001309 chloro group Chemical group Cl* 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 241000238413 Octopus Species 0.000 description 1
- 241000233855 Orchidaceae Species 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- AOZMBMOAFWUDGX-UHFFFAOYSA-N S1SC(C=C1)C(=O)O.C=C Chemical compound S1SC(C=C1)C(=O)O.C=C AOZMBMOAFWUDGX-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000010724 Wisteria floribunda Nutrition 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000002835 absorbance Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000013040 bath agent Substances 0.000 description 1
- 238000003287 bathing Methods 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- 230000008033 biological extinction Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 239000012216 imaging agent Substances 0.000 description 1
- RSAZYXZUJROYKR-UHFFFAOYSA-N indophenol Chemical compound C1=CC(O)=CC=C1N=C1C=CC(=O)C=C1 RSAZYXZUJROYKR-UHFFFAOYSA-N 0.000 description 1
- 238000002329 infrared spectrum Methods 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 230000008635 plant growth Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- AYEKOFBPNLCAJY-UHFFFAOYSA-O thiamine pyrophosphate Chemical compound CC1=C(CCOP(O)(=O)OP(O)(O)=O)SC=[N+]1CC1=CN=C(C)N=C1N AYEKOFBPNLCAJY-UHFFFAOYSA-O 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/40—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography
- B41M5/46—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used characterised by the base backcoat, intermediate, or covering layers, e.g. for thermal transfer dye-donor or dye-receiver sheets; Heat, radiation filtering or absorbing means or layers; combined with other image registration layers or compositions; Special originals for reproduction by thermography characterised by the light-to-heat converting means; characterised by the heat or radiation filtering or absorbing means or layers
- B41M5/465—Infrared radiation-absorbing materials, e.g. dyes, metals, silicates, C black
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
- Optical Filters (AREA)
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は
l)近赤外線吸収性を有し、
−)有機基体物質を−yt、vc対して安定化する作用
を有する。DETAILED DESCRIPTION OF THE INVENTION "Industrial Application Field" The present invention has l) near-infrared absorbing properties, and -) an effect of stabilizing an organic substrate substance against -yt and vc.
耐光性、耐熱性が優れ、且つ有*溶媒への溶解性の優れ
た新規な化合物(ジピリジル)(シス−1゜−一エチレ
ンジチオラト)ニッケル酵導体に関する。The present invention relates to a novel compound (dipyridyl) (cis-1°-1 ethylene dithiolate) nickel enzyme conductor that has excellent light resistance, heat resistance, and solubility in organic solvents.
「従来の技術」
本発明において近赤外線とは、波長が約200nmから
約−、ooonmの電磁波を言う。"Prior Art" In the present invention, near-infrared rays refer to electromagnetic waves having a wavelength of about 200 nm to about -00 nm.
また、有機基体物′Xもしくは基体化合物なる用語は1
日光の照射下において1人間の眼に有色もしくは無色に
みえる物質を包含し、率に可視域に吸収惨大を有する@
負だけでなく、たとえば、光学的増白剤あるいは赤外部
に吸収極大を有する物質をも包含する。In addition, the term organic base substance 'X or base compound is 1
Contains substances that appear colored or colorless to the human eye under sunlight, and have significant absorption in the visible range.
It includes not only negative substances but also, for example, optical brighteners or substances having an absorption maximum in the infrared region.
本願発明においては、M@基基体負負、紫外部O約JO
Onmから、近赤外部の約2,000nmに吸収極大を
有する有機物質を包含する。In the present invention, M@substrate negative, ultraviolet O approximately JO
Onm includes organic substances that have an absorption maximum in the near-infrared region of about 2,000 nm.
本願明細書において1色素もしくは染料なる用##は、
8尤の照射下において、人間の眼にM色にみえる有機物
*を包含する。In this specification, ## for 1 pigment or dye is:
Contains organic substances* that appear M-colored to the human eye under 8 degrees of irradiation.
従来、以下に挙げる技術が知られていた。Conventionally, the following techniques have been known.
(1)近赤外−吸収性の物質は赤外−カットフィルター
、例えば近赤外@感光性の感光材料用セーフライトフィ
ルター、人間の目に有害な赤外縁カットフィルター、植
物の生育制御用に用いられるプラスチックフィルム、シ
リコンフォトダイオード(以下SPDという)などの半
専坏受元素子の近赤外線カットフィルターなどに用いら
れている。又、近赤外線を吸収して熱に交換する性jX
を生かして、レーザーによるg熱発色、感熱記録、元デ
ィスク記kwIへの利用、インク学科の乾珠促運なとに
使用されており、史には、近赤外線の吸収性を利用して
、各極悪光材料中に口布分散させて、アンチハレーショ
ン層を形成させmfiiの向上、良化を図ることも行わ
れており、又、レーザー元による読取可能なカード用イ
ンクへの添加、インクジェットプリンタ用インクへの添
加なども試みられている。(1) Near-infrared-absorbing substances can be used as infrared-cut filters, such as safelight filters for near-infrared @ photosensitive materials, infrared edge cut filters that are harmful to human eyes, and plant growth control. It is used in plastic films and near-infrared cut filters for semi-dedicated receiving elements such as silicon photodiodes (hereinafter referred to as SPDs). In addition, it has the ability to absorb near-infrared rays and exchange them into heat.
Taking advantage of this, it has been used for g-thermal coloring with lasers, thermosensitive recording, original disk recording, and for ink studies. It is also being dispersed in various ultraviolet materials to form an antihalation layer to improve mfii, and it is also being added to ink for cards that can be read by laser sources, and by inkjet printers. Attempts have also been made to add it to commercial inks.
これらに用いられる近赤外脚吸収剤としては。Near-infrared light absorbers used in these applications include:
各棟の化合物が開発されている。Compounds for each building are being developed.
例えば、遷移金syh:含まない有機化合物としてり、
特公昭J6−674J号、籍告昭uO−JjJμ7号、
#!f公昭4cJ−コJJJj号、特公昭参!−/JJ
26号、特公昭参4−J″110号、特公昭ダ4−//
コ参2号、特開昭10−722332号、特開昭j7−
μ!!OP号、米1%許第211310−号、米13!
特許第λjりjりsr号などに記載されている化合物が
ある。For example, as an organic compound that does not contain transition gold syh,
Special public Sho J6-674J, registered Sho uO-JjJμ7,
#! f Kosho 4cJ-ko JJJj issue, special public Shosan! -/JJ
No. 26, Special Public Shosan 4-J'' No. 110, Special Public Shoda 4-//
Kosan No. 2, JP-A No. 10-722332, JP-A No. 7-72-
μ! ! OP No., US 1% Permit No. 211310-, US 13!
There are compounds described in Patent No. λjrjr sr.
又、遷移金属を含んでいるものとしては、例えば、特公
昭藝4−JAS2号、特開昭μターー2−27弘1号、
米国特許第JJtt216号、米国待fF第J44JO
rり号、米国特許第JI06参6−号、米国特許第JI
7j/??号、米国特許第327り513号、米t3!
%許第4cotコ147号、米国軸軒参/!2JJコ号
、米国特許第参ダ3−!?j号などに紀幀されている化
合物がある。In addition, examples of materials containing transition metals include, for example, Tokko Shogei 4-JAS No. 2, Tokko Shogei No. 2-27 Kou 1,
U.S. Patent No. JJtt216, U.S. Patent No. J44JO
No. r, U.S. Patent No. JI06 No. 6-, U.S. Patent No. JI
7j/? ? No. 327-513, US t3!
% permission No. 4 cot number 147, American chiken san/! 2JJ Co., U.S. Patent No. 3-! ? There are some compounds that are known as No.J.
(■)従来から、有機基体物質、たとえば色素。(■) Conventionally, organic substrate substances, such as pigments.
染料、もしくは高分子物質などが光vcよって退色変色
もしくは分解、劣化する傾向があることが知られており
、この退色、変色もしくは、分解劣化を減少せしめる方
法、すなわち光劣化を防ぎ、耐光性を向上せしめる方法
については多(の報告がある。It is known that dyes, polymeric substances, etc. have a tendency to discolor, discolor, decompose, or deteriorate due to light VC, and methods to reduce this fading, discoloration, or decomposition deterioration, that is, prevent photodeterioration and improve light resistance. There are many reports on how to improve it.
たとえば、米国特許9pIJ、≠32,300号には、
インドフェノール、インドアニリン、アゾおよびアゾメ
チン染料のような有機化合物を、融合複素環系を有する
フェノールタイプの化合物と混合することにより、可視
おLび紫外の元に対する堅牢性が改良されることが記載
されている。For example, in US Patent 9pIJ, ≠ 32,300,
It has been described that organic compounds such as indophenol, indoaniline, azo and azomethine dyes are improved in their fastness to visible light and ultraviolet sources by mixing them with phenolic type compounds having fused heterocyclic ring systems. has been done.
また、ハロゲン化銀与真感光材料の分野では、C,E、
に、Meesお↓びT 、 H、James着@The
Theory of the Photogr
aphicProcess”(Macmilfan社1
276年刊)の第17章に記載されているように、芳香
族第一級アミン曳像主薬の飯化体と発色剤(カップラー
)との反応によって、アゾメチン染料またはインドアユ
1フン染料が形成されるが、これらの染料からできた像
、丁なわちカラー画像の光に対する安定性を改良する方
法については、数多くのものが知られている。たとえば
、米国特許第コ、J40゜2り0号、同第2,4A/1
,413号、同第2゜47!、J/弘号、同第−,70
/ 、/り7号。In addition, in the field of silver halide photosensitive materials, C, E,
, Mees ↓ and T , H , James arrival @The
Theory of the Photographer
aphicProcess” (Macmilfan Company 1
As described in Chapter 17 of 276, azomethine dyes or Indian azomethine dyes are formed by the reaction of an aromatic primary amine imaging agent with a color former (coupler). However, a number of methods are known for improving the light stability of images, ie, color images, made from these dyes. For example, U.S. Pat.
, No. 413, No. 2゜47! , J/Hiro issue, same number -, 70
/ , /ri No. 7.
同%J、70μ、7/J号、同第2 、7211 、4
jり号、同第コ、732.300号、同第λ、7J!T
、71,1号、同18λ、yio、roi号、同第コ、
tits、oコ1号、英国特許第1.J4J。Same%J, 70μ, 7/J No. 2, 7211, 4
No. J, No. 732.300, No. λ, 7J! T
, 71, No. 1, 18λ, yio, roi, No. 1,
tits, Oco No. 1, British Patent No. 1. J4J.
タコ7号等に記載されたハイドロキノン訪導体、米13
A特FfmJ、uj7.079号、同wIJ、06り、
26−号、特公昭μJ−/ J 、弘26号等に記載さ
れた没食子酸誘導体、米国特許第2.73j 、761
号、同第3,6りl、りOり号に記載されたp−アルコ
キシフェノール類、米国を許第J、uJコ、JQO号、
同率3.!7J 、010号、同′fPI3.j74A
、4λ7号、同第3.76参。Hydroquinone conductor described in Octopus No. 7, etc., US 13
A special FfmJ, uj7.079, wIJ, 06ri,
Gallic acid derivatives described in No. 26-, Tokuko Sho μJ-/J, Kou No. 26, etc., U.S. Patent No. 2.73j, 761
p-alkoxyphenols described in No. 3, No. 3, No. 6, No. 1, No. J, UJ, JQO,
Tie rate 3. ! 7J, No. 010, same'fPI3. j74A
, 4λ7, 3.76.
337号、同第3,57μ、626号、同第J。No. 337, No. 3, 57μ, No. 626, No. J of the same.
491.90P号、 同wIg 、0/j 、9YO号
VC記載されたごときクロマンやクマラン等の酵導体な
どが知られている。Ferment derivatives such as chromans and coumarans as described in No. 491.90P, wIg, 0/j, and 9YO VC are known.
また、lr機機体体化合物光に対する安定性を、その吸
収極大が%基体化合物の吸収極大エリも深色性であるよ
うなアゾメチン消光化合物を用いて改良する方法が、英
国特許第1.≠ji、oo。British Patent No. 1 discloses a method for improving the stability of lr aircraft compounds against light using an azomethine quenching compound whose absorption maximum is also bathochromic. ≠ji,oo.
号に記載されている。listed in the number.
また、高分子化合物、たとえばポリオレフィンなどが、
光によって劣化することが、以前エリ知られているが、
これを防ぐために、従来、ベンゾフェノン肪導体などの
紫外線吸収剤やヒンダードアミンが多く使われてきた。In addition, polymer compounds such as polyolefins,
It was previously known that Eri deteriorates due to light, but
To prevent this, UV absorbers such as benzophenone fat conductors and hindered amines have traditionally been used.
一万、金属錯体による染料の安定化の方法が英国特許第
16り、りt6号、米国特許第μ・Qjo 、pJt号
およびRe5erch Disclosureistt
a(iり76)に記載されており、また、金属錯体をポ
リマーの光劣化防止に使用することが0.C1cche
tti、Adv、Polymer Sci。10,000, a method for stabilizing dyes with metal complexes is disclosed in British Patent No. 16, Rit6, U.S. Patent No. μ.Qjo, pJt and Research Disclosure.
a (i-76), and the use of metal complexes to prevent photodeterioration of polymers is described in 0. C1cche
tti, Adv, Polymer Sci.
ヱ70(/970) ;M、S 、A11en。ヱ70(/970) ;M,S ,A11en.
J、F、Mckellar 、Chem、Soc、Re
v、<c s Js (/ 97z ); D、J、C
arlson、D、M。J,F,McKellar,Chem,Soc,Re
v, <c s Js (/97z); D, J, C
arlson, D.M.
Wiles+J、Macromol、Sci、Rev。Wiles+J, Macromol, Sci, Rev.
Macromol、Chem、C/44 4 j(tり
76);R,B、Wal ter +J、F、John
son、J、PolymerSci、/j 29(/
9103などに記載されている。Macromol, Chem, C/44 4 j (tri 76); R, B, Walter + J, F, John
son, J, Polymer Sci, /j 29 (/
9103, etc.
「発明が解決しようとする問題点」
(1)前項(1)であげた遷移金属を含fない近赤外線
吸収剤の全てに渡って、共通の欠点は、耐熱性、耐光性
が看しく劣り、実用に耐えないということである。"Problems to be Solved by the Invention" (1) All of the near-infrared absorbers that do not contain transition metals mentioned in the previous section (1) have a common drawback that they have poor heat resistance and light resistance. , it is not practical.
又、遷移金属を含む化合物は、有機浴剤に対する溶解性
が悪く%実用化しにくいという欠点な有する。例えば、
先に述べた如き用途、例えばSPD用フ用層イルターて
は、極めて薄いフィルムで赤外−の吸収効率の良いフィ
ルムが望まれるが。Furthermore, compounds containing transition metals have the disadvantage of poor solubility in organic bath agents, making them difficult to put into practical use. for example,
For the above-mentioned applications, such as SPD layer filters, an extremely thin film with good infrared absorption efficiency is desired.
そのためには、樹脂中に多量の赤外線吸収剤が分散され
ねばならず、有機溶媒に対するf8解度の小さい赤外線
吸収剤Cその目的を満足させることができなかった。For this purpose, a large amount of infrared absorber must be dispersed in the resin, and infrared absorber C, which has a low f8 solubility with respect to organic solvents, cannot satisfy the purpose.
(n)前項(■)であげた有機化合物である光劣化防止
剤は効果はあるが、十分ではなく、また金属な含む光劣
化防止剤は、有機溶媒への溶解性が高くないので光劣化
防止効果を十分介挿せしめるだけの量を加えることがで
きない。その上、これらの化合@は、それ自体の着色が
大きいため、多1ivC添加すると、有@基体物實、%
に、染料や色素の色相ならびに純良に悪影##を及は丁
という欠点を有している。(n) Photodegradation inhibitors, which are organic compounds mentioned in the previous section (■), are effective, but are not sufficient, and photodegradation inhibitors containing metals do not have high solubility in organic solvents, so they are not photodegradable. It is not possible to add enough amount to have a sufficient preventive effect. Moreover, since these compounds themselves have a large coloration, when a large amount of 1ivC is added, the presence of the substrate substance increases by %.
However, it has the drawback that the hue of the dye or pigment and the quality of the dye may cause negative shadows.
従って1本発明の目的は第一に、耐熱性、耐光性が極め
て高り、*に有機#4媒への俗解度が高(かつフィルム
形成性バインダーなどとの相溶性のよい近赤外線吸収性
物質を提供することであり、第二に、単位厚さ当りの近
赤外光の遮断能力が大きくて可視領埴の光透過率が高く
熱および元に対して堅牢な光学フィルター全形成しうる
近赤外線吸収性物質を提供することであり、
又、第三に、有機基体?!4貿の尤に対する安定性を改
良する物質′1jI−提供することであり。Therefore, the object of the present invention is, first of all, to have extremely high heat resistance and light resistance, *high compatibility with organic #4 media (and near-infrared absorbing properties with good compatibility with film-forming binders, etc.). Second, it is possible to form an optical filter that has a large near-infrared light blocking ability per unit thickness, has high visible light transmittance, and is robust against heat and radiation. The object of the present invention is to provide a near-infrared absorbing substance, and thirdly, to provide a substance that improves stability against organic substrates.
第四に、有機基体物質%特に色素もしくは染料の色相な
らびに純度を悪化させることなしに、これらの物質の光
に対する安定性を改良する化合物を提供することである
。Fourth, it is an object to provide compounds that improve the light stability of organic substrate materials, especially pigments or dyes, without deteriorating their hue and purity.
本発明者は、上記の目的を達成するため種々研究を1ね
た結果、本発明を完成するに至ったっ「問題点を解決す
るための手段」
丁なわち本発明は、下記一般式で表わされる(ジピリジ
ル)(シス−1,−一エチレンジチオラト)ニッケルa
!4体を提供するものである。The present inventor has conducted various studies to achieve the above object, and as a result has completed the present invention. (dipyridyl)(cis-1,-1ethylenedithiolat)nickel a
! It provides four bodies.
式中、R1−R4は、水素原子、アルキル基、アルコキ
シ基、フェニル基、アルコキシカルボニル基、アリーロ
キシカルボニル基を示し、これらは、同じでも異ってい
ても工(、また、これらのうち隣り合った二つの置換基
は結合して環ヲ形成してもよい。また、二つのR’fl
互いに結合して環を形成してもよい。In the formula, R1 to R4 represent a hydrogen atom, an alkyl group, an alkoxy group, a phenyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group, and these may be the same or different, and may be Two matching substituents may be combined to form a ring.Also, two R'fl
They may be bonded to each other to form a ring.
R%Rは水素原子、アルキル基、アリール基、シアノ基
を示し、これらは、それぞれ同じでも異っていても工く
、RとRは、結合して環を形成していてもよい。R%R represents a hydrogen atom, an alkyl group, an aryl group, or a cyano group, and these may be the same or different. R and R may be combined to form a ring.
但し、上記一般式において 更に、置換基について詳細に説明する。However, in the above general formula Furthermore, the substituents will be explained in detail.
上記一般式で表わされる化合物においてR1−R4で表
わされるアルキル基は、好ましくは炭素数lないしλO
のアルキル基な示し、このアルキル基として、たとえば
メチル基、エチル基%n−ブチル基、n−オクチル基、
n−ドデシル基、n−オクタデシル基などをあげること
ができる。In the compound represented by the above general formula, the alkyl group represented by R1-R4 preferably has a carbon number of 1 to λO
This alkyl group includes, for example, methyl group, ethyl group, n-butyl group, n-octyl group,
Examples include n-dodecyl group and n-octadecyl group.
この場合、アルキル基は、 *vcfi1換されていて
もよい。In this case, the alkyl group may be substituted with *vcfi1.
R1〜Rで表わされるアルコキシ基は好ヱしくは、炭素
数7ないし−20のアルコキシ基を示し、このアルコキ
シ基として、たとえば、メトキシ基、エトキシ4 n
−7’トキシ基、n−ヘキプデシルオキ7基などをあげ
ることができる。The alkoxy group represented by R1 to R preferably represents an alkoxy group having 7 to -20 carbon atoms, and examples of the alkoxy group include methoxy group, ethoxy 4 n
-7'toxy group, n-hekypdecyloxy7 group, etc. can be mentioned.
この場合、アルコキシ基は、史K[j!されていてもよ
い。In this case, the alkoxy group has the history K[j! may have been done.
R1〜Rで表わされるアルコキシカルボニル基は好まし
くは、炭素数コないしミーのアルコキシカルボニル基を
示し、このアルコキシカルボニル基として1例えば、メ
トキシカルボニル基、n−ブトキシカルボニル基などを
あげることができる。The alkoxycarbonyl group represented by R1 to R is preferably an alkoxycarbonyl group having 1 to 1 carbon atoms, and examples of the alkoxycarbonyl group include methoxycarbonyl group and n-butoxycarbonyl group.
この場合、アルコキクカルボニル基は、 史vc置換さ
れていてもよい。In this case, the alkoxycarbonyl group may be substituted.
R−Rで表わされるアリーロキシカルボニル基は、好ま
しくは、フェノキシカルミニル基、またはtフトキシカ
ルボニル基ヲ示し、これらのフェニルJilたはナフチ
ル基は、更に置換されていてもよい。The aryloxycarbonyl group represented by RR preferably represents a phenoxycarminyl group or a t-phthoxycarbonyl group, and these phenyl or naphthyl groups may be further substituted.
R1〜Rがアルキル基、アルコキシ基、アル;キシカル
ボニル基またはアリーロキシカルボニル基であり、これ
らが史に1llk侠されている場合のfIII!I!基
としては、例えはハロゲン原子(例えば塩素原子、臭素
原子など)、炭素数lないしコQのアルキル基(たとえ
ばメチル基、エチル−ihbn−ブチル基、n−オクチ
ル基など)、炭素数lないしミーのアルコキシ基(たと
えばメトキシ基、エトキシ基、n−ブトキシ基など)が
挙げられる。fIII when R1 to R are an alkyl group, an alkoxy group, an al; I! Examples of the group include a halogen atom (e.g., chlorine atom, bromine atom, etc.), an alkyl group having 1 to 7 carbon atoms (e.g., methyl group, ethyl-ihbn-butyl group, n-octyl group, etc.), Examples include alkoxy groups (eg, methoxy group, ethoxy group, n-butoxy group, etc.).
またアルキル基、アルコキシfiまだはアルコキ7カル
ボニル基の場合には更に水t1!基で置換されていても
よい。In addition, in the case of an alkyl group, alkoxy fi and alkoxy 7 carbonyl group, water t1! It may be substituted with a group.
R1−R4のうち隣り合った二つの#!14基は結合し
て環を形成してもよ(、この環は、好ましく框、!員環
もしくは6員環であり、縮合環でもよい。また、二つの
R4は互いに結合して環を形成してもよく、この環は好
ましくは、6j[である。Two adjacent #s among R1-R4! 14 groups may be combined to form a ring (this ring is preferably a square, !-membered ring or 6-membered ring, and may be a fused ring. Also, two R4 groups may be combined with each other to form a ring). and this ring is preferably 6j[.
R’ 、Rで表わされるアルキル基は好ましくは、炭素
数7ないし−20のアルキル基を示し、このアルキル基
として、たとえばメチル基、エチルAs n−ブチル基
、n−ヘキシル基、n−オクチル2111i% n−ド
デシル基、n−へキプデシル基などをあげることができ
る。The alkyl group represented by R' and R is preferably an alkyl group having 7 to -20 carbon atoms, and examples of the alkyl group include methyl group, ethyl As, n-butyl group, n-hexyl group, n-octyl group, etc. % n-dodecyl group, n-hekypdecyl group, etc.
この場合、アルキル基は、更に[換されていてもよく、
例えば、炭素数lないしミーのアルキル基(たとえば、
メチル基、エチル基、n−ブチル基、n−オクチル基な
ど)炭素数7ないしミーのアルコキシ基(たとえばメト
キシ基、エトキシ基、n−ブトキシ基など)などで置換
されていてもよい。In this case, the alkyl group may be further substituted with
For example, an alkyl group having 1 to 1 carbon atoms (for example,
methyl group, ethyl group, n-butyl group, n-octyl group, etc.), or an alkoxy group having 7 to 1 carbon atoms (eg, methoxy group, ethoxy group, n-butoxy group, etc.).
R%Rで表わされるアリール基は、好ましくはフェニル
基であり、この場合、フェニル基は、更に置換されてい
てもよく、例えば、ハロゲン原子(塩素原子、臭素原子
など)炭素数lないしλOのアルキル基(たとt#i、
メチル基、エチル基、n−ブチル基% n−オクチル基
、n−デフル泰など)、R8数lないし−20のアルコ
キシ基(たとえば、メトキシ基、エトキシ基、n−ブト
キシ基、n−ドデシルオキシ基など]などでfit換さ
れていても工い。The aryl group represented by R%R is preferably a phenyl group, and in this case, the phenyl group may be further substituted, for example, a halogen atom (chlorine atom, bromine atom, etc.) having a carbon number of 1 to λO. Alkyl group (t#i,
Methyl group, ethyl group, n-butyl group (% n-octyl group, n-defluoride, etc.), R8 alkoxy group (e.g., methoxy group, ethoxy group, n-butoxy group, n-dodecyloxy group) It does not work even if it has been changed to fit such as "base etc."
R5とRは互いに結合して環を形成していてもよいが、
この場合、好ましくはj!A壌または6員環がよく、環
の構成元素は炭素以外の元FA(たとえば、酸素原子、
窒素原子、イオウ原子など]でもよい。また、これらの
塊ハ、ハロゲン原子。R5 and R may be combined with each other to form a ring,
In this case, preferably j! A ring or a 6-membered ring is preferable, and the constituent elements of the ring are elemental FA other than carbon (e.g., oxygen atom,
Nitrogen atoms, sulfur atoms, etc.] may also be used. Also, these lumps are halogen atoms.
アルキル基、アルコキシ基、アリーロキシ基によって置
換されていてもよく、または、他の環と縮合していても
よい。It may be substituted with an alkyl group, an alkoxy group, or an aryloxy group, or it may be fused with another ring.
尚、特許請求の範囲から除外した錯体は、いづれも有機
溶媒への溶解性が低く、実用的価値の少いものである。All of the complexes excluded from the scope of the claims have low solubility in organic solvents and have little practical value.
前記一般式で表わされる(ジピリジル)(シス−1,コ
ーエチレンジチオラト)ニッケル酵導体の製造は、一般
に、次のようにして行うことができる。The (dipyridyl)(cis-1, co-ethylenedithiolat) nickel enzyme conductor represented by the above general formula can generally be produced as follows.
無水メタノールにシス−7,λ−エチレンジチオール#
s4体又は、そのアルカリ金属塩を浴か丁。Cis-7,λ-ethylenedithiol # in anhydrous methanol
Bathing with S4 form or its alkali metal salt.
(前駆体から調製する場合もある)この溶液に。(sometimes prepared from precursors) to this solution.
(ジピリジル)(ジハロ)ニッケル(■)紡導体錯体を
粉末又はメタノール溶液で加えて、かくはんし、生成し
た沈殿をろ過する。この沈殿をジクロロメタンなどの有
機溶媒で抽出し、Saして。Add the (dipyridyl)(dihalo)nickel (■) spinner complex as a powder or methanol solution, stir, and filter the formed precipitate. This precipitate was extracted with an organic solvent such as dichloromethane, and then extracted with Sa.
ゆっくりメタノールを加えると求める錯体の結晶が得ら
れる。Add methanol slowly to obtain crystals of the desired complex.
前記一般式で表わされる化合物のうち好ましいものを例
示すれば次の通りであるが、本発明は、これらの例示化
合物に限定されるものではないことはもちろんである。Preferred examples of the compounds represented by the above general formula are as follows, but it goes without saying that the present invention is not limited to these exemplified compounds.
(3す
(38]
←l)
(8す
これらの化合物のいくつかの吸収極大(λmaX)と篭
ル吸光係数(gmaX I l−mol−’ ・cm
−1単位、及び融点(分解点)は下記第1表の通りであ
る。(3s(38) ←l) (8s) The absorption maximum (λmaX) and extinction coefficient (gmaX I l-mol-' ・cm of some of these compounds)
-1 unit and melting point (decomposition point) are as shown in Table 1 below.
「発明の効果」
本発明の(ジピリジル)(クスー7.コーエチレンジテ
オラト)ニッケル誘導体は有機溶媒への溶解性が高(、
フィルム形成性バインダーなどとの相溶性が優れ、また
近赤外光の遮断能力が大ぎ(、可視領域の光透過率が高
いという優れた性質を有する。"Effects of the Invention" The (dipyridyl)(cous7.coethylenediteorato)nickel derivative of the present invention has high solubility in organic solvents (,
It has excellent compatibility with film-forming binders, etc., and has excellent near-infrared light blocking ability (and high light transmittance in the visible region).
更に、これらの錯体は、有機基体物質、特に染料、色素
や高分子物質の光による劣化防止作用に優れ、それ自体
の着色が少いため有機基体物質の色相ならびに純度に悪
影響を及ばさない。Furthermore, these complexes have an excellent effect of preventing deterioration of organic base materials, especially dyes, pigments, and polymeric substances due to light, and since they are less colored by themselves, they do not adversely affect the hue and purity of the organic base materials.
また、この化合物は耐熱性、耐光性に−れる。This compound also has heat resistance and light resistance.
加えて、置換基の導入位置が多いため、それらの組合せ
により、吸収極大波長を容易に選択できる。In addition, since there are many positions for introducing substituents, the maximum absorption wavelength can be easily selected by combining them.
更に、これらの錯体は1合成が容易であり、低コストで
製造できるという夫用上優れた利点4I−有する。Furthermore, these complexes have the advantage that they are easy to synthesize and can be produced at low cost.
従って、本発明の錯体は、近赤外線吸収剤として光吸収
を利用した近赤外線カットフィルター、インクなどの他
、光→熱交換を利用したレーザーによる感熱発色、感熱
記録、光ディスク記録層への利用、及び、有機基体物質
の光劣化防止剤としての利用など各種の用途に利用でき
る。Therefore, the complex of the present invention can be used as a near-infrared absorber for near-infrared cut filters and inks that utilize light absorption, as well as for thermal coloring by laser using light → heat exchange, thermal recording, and optical disk recording layers. In addition, it can be used for various purposes such as use as a photodegradation inhibitor for organic substrate substances.
[夾施−月 次に本発明を実施例に基づき、更に詳細に説明する。[Kyosei - Moon Next, the present invention will be explained in more detail based on examples.
本発94に用いる出発物質である各種(、ジビリジk)
(ジハロ)ニッケルM4体t! J 、 I no r
g。Various starting materials used in this invention 94 (, Giviridi K)
(Dihalo) Nickel M4 body t! J, I no r
g.
Nucl、Chem、J? 10447(/り67)
に記載の方法に倣ってvI4製した。従って、以下の実
施例では、それぞれの調製法は省略する。Nucl, Chem, J? 10447 (/ri67)
vI4 was produced according to the method described in . Therefore, in the following examples, the respective preparation methods are omitted.
実施例1.化合物(2)の合成
蓼、j−ジメチル−/、J−ジチオール−一−オン0.
00λモルを無水メタノール20mに分散する。これに
ナトリウムメトキサイド0.00参モル(メタノール浴
液で4よい)を加えて室温で2時間か(はんする。この
溶液にジピリジルジクロロニッケル0.002モルを加
え、史に室温で1時間か(はんする。析出した沈殿をろ
過し、メタノールで洗い風乾する。これtジクロロメタ
ンコoOydVc溶かし、ろ過する。ろ液を濃縮して、
イソプロパツ−ルを加えて1時間放置。析出した結晶を
ろ過して、イソプロパツールで洗い、風乾する。 収量
0.J9゜
実施例1 化合物(30)の合成
参、j−ジ−p−メトキクフェニル−7,3−ジチオー
ルーコーオン0.00λモルを無水メタノール20WL
tVc分散し、これにナトリウムメトキサイドo、oo
aモル(メタノール浴液でもよい)を加えて、室温で3
時間か(はんする。この溶液にジピリジルジクロロニッ
ケル0.00−モルを加え、更に室温で1時間かくはん
する。析出した沈殿をロカし、メタノールで洗い風乾す
る。これをジクロロメタン2001dWCffJかし、
ろ過下る。Example 1. Synthesis of compound (2), J-dimethyl-/, J-dithiol-1-one 0.
00 λ moles are dispersed in 20 ml of absolute methanol. Add 0.00 mol of sodium methoxide (methanol bath solution) to this solution and let it stand at room temperature for 2 hours. Add 0.002 mol of dipyridyldichloronickel to this solution and let it sit at room temperature for 1 hour. Filter the precipitate, wash with methanol, and air dry. Dissolve this in dichloromethane and filter. Concentrate the filtrate.
Add isopropanol and leave for 1 hour. The precipitated crystals are filtered, washed with isopropanol, and air-dried. Yield 0. J9゜Example 1 Synthesis of compound (30) 0.00 λ mol of j-di-p-methoxyphenyl-7,3-dithiol-coon was added to 20 WL of anhydrous methanol.
tVc is dispersed, and sodium methoxide o, oo is added to this.
Add a mol (methanol bath solution may also be used) and incubate at room temperature for 3
Add 0.00 mole of dipyridyl dichloronickel to this solution and stir for 1 hour at room temperature. Locate the precipitate, wash with methanol, and air dry.
Filter down.
ろ液V濃縮して、メタノールを加えてl夜j0Cで放置
。析出した結晶をろ過、メタノールで洗って風乾する。Concentrate the filtrate, add methanol, and leave at 0C overnight. The precipitated crystals are filtered, washed with methanol, and air-dried.
収量o、tg
実施例3.化合物(65ンの合成
弘、j−ジメチル−1,3−ジテオ−ルー一−オン0.
00λモルを無水メタノール2Q1に分散する。これに
ナトリウムメトキサイド0.00φモル(メタノール溶
液でもよい。)を加えて、室温で2時間かくはんする。Yield o, tg Example 3. Synthesis of compound (65), j-dimethyl-1,3-diteol-one 0.
00λ moles are dispersed in anhydrous methanol 2Q1. Add 0.00 φ mol of sodium methoxide (a methanol solution may be used) and stir at room temperature for 2 hours.
こQ浴液に(/、10−フェナントロリン)シ/ロロニ
ッケル01QQ2モ)を加え、更に、室温で1時間かく
はんする。析出した沈殿ヲロ過し、メタノールで洗い、
風乾する。これ全ジクロロメタン200m1IC/gか
し、ろ過する。ろ液ヲ濃縮して、メタノールを加えて、
−夜装置する。析出した結晶をろ過してメタノールで洗
い、風乾する。 収量o、sg0夾施例4.化合物(8
6)の合成
参、j−ジ−p−メトキシフェニル−1,3−ジチオー
ル−2−オン0.00λモルを無水メタノール2(NL
Iに分散し、これにナトリウムメトキサイドo、oou
モル(メタノール溶液でもよい)を加えて、室温で3時
間か(はんする。この溶液ニ(μ、7−ジフェニルー/
、10−フェナントロリン)ジクロロニッケル0.0
0−モルを加え。Add (/, 10-phenanthroline)/Roronickel 01QQ2mo) to this Q bath solution, and further stir for 1 hour at room temperature. Filter the deposited precipitate, wash with methanol,
Air dry. This was filtered using 200 ml of dichloromethane/IC/g. Concentrate the filtrate, add methanol,
- Set up at night. The precipitated crystals are filtered, washed with methanol, and air-dried. Yield o, sg0 Example 4. Compound (8
Synthesis of 6), 0.00 λ mol of j-di-p-methoxyphenyl-1,3-dithiol-2-one was added to anhydrous methanol 2 (NL
Dispersed in I, sodium methoxide o, oou
mol (a methanol solution may also be used) and incubate at room temperature for 3 hours.
, 10-phenanthroline) dichloronickel 0.0
Add 0-mol.
更に室温で1時間かくはんする。析出した沈殿!ロカし
、メタノールで洗い風乾する。これをジクaaメタンコ
00dyC溶かしろ過する。ろ液を濃縮して、メタノー
ルを加えて、l夜装置。析出した結晶をろ過、メタノー
ルで洗って風乾する。Stir for an additional hour at room temperature. Precipitate! Wash with methanol and air dry. Dissolve this in diku aa methane 00dyC and filter. Concentrate the filtrate, add methanol, and incubate overnight. The precipitated crystals are filtered, washed with methanol, and air-dried.
収量O0λI0
実施例5
実施例4で合成した例示化合物(86)を用い赤外線吸
収性組成物を調製し光学フィルターを作成した。丁なわ
ち、下に部(重量部を意味するλで示した組成で各成分
を混合しよく攪拌してから、ろ通抜、金属の支持体上に
流延法により塗布して製膜後剥離し、目的とする光学フ
ィルターを得た。Yield O0λI0 Example 5 An infrared absorbing composition was prepared using the exemplary compound (86) synthesized in Example 4, and an optical filter was created. After mixing each component with the composition indicated by λ, which means parts by weight, stirring thoroughly, passing through a filtration, and coating it on a metal support by a casting method to form a film. It was peeled off to obtain the desired optical filter.
このようにして得られた光学フィルター(乾燥後の厚さ
AOiクロン)の光学濃には約り70nmに吸収極大!
持つフィルターであった。The optical density of the optical filter thus obtained (thickness after drying: AOi cm) is approximately 70 nm, with maximum absorption at 70 nm!
It was a filter that had.
同様に第7表に示される他の化合物についても光学フィ
ルターを作製したところ、近赤外域に吸収を持つ光学フ
ィルターが得られた。When optical filters were similarly prepared using other compounds shown in Table 7, optical filters having absorption in the near-infrared region were obtained.
〔組成」
TAC(三酊酸セルロース) /70部TPP
()リフェニルホスフ
エイト) 10部メチレ
ンクロリド too部メタノール
ibo部例示化合物(86)
要部実施例6
ポリプロピレン粉末に、実施例1で合成した化合物(2
)917 、J慢(1髄)加え、lり00011分間加
圧し、フィルム(コoop)を作り、これをキセノンウ
ェザ−メーター〔アトラス・ウェザ−・0・メーター(
キセノン4.sKW、照度lO万ルクス)〕を用いてパ
ネル温度40’C1相対湿度10%の条件で露光し、露
光時間に応じたカルボニルインデックスを蘭1足してプ
ロピレンの劣化を調べた、無添加のポリプロピレンを対
照物とした。その結果を第3図に示す。[Composition] TAC (cellulose triacetate) / 70 parts TPP
() Riphenyl phosphate) 10 parts methylene chloride too parts methanol
ibo part exemplified compound (86)
Main part Example 6 The compound (2) synthesized in Example 1 was added to polypropylene powder.
) 917, add 1 marrow (1 marrow), pressurize for 1 minute, make a film (coop), and add this to a xenon weather meter [Atlas Weather 0 Meter (
Xenon 4. Additive-free polypropylene was exposed to light at a panel temperature of 40'C and a relative humidity of 10% using a 10000000000000000000000 sKW, illuminance 10,000 lux), and the deterioration of propylene was investigated by adding 1 orchid to the carbonyl index according to the exposure time. This was used as a control object. The results are shown in FIG.
ここで、カルボニルインデックスとは、ボリブat?レ
ンが光劣化してくるにつれて生成するカルボニルfig
、試料の赤外スペクトルで追跡し、そのi、yio
Cmにおける吸光度を試料の岸さくξクロン)で除し
たものである。Here, the carbonyl index is boli at? Carbonyl produced as len photodegrades fig
, traced in the infrared spectrum of the sample, its i, yio
It is the absorbance at Cm divided by the depth of the sample (ξ chron).
第3図エリ明らかなように、化合物(2)はポリプロピ
レンの光劣化を防止する効果があった。As is clear from FIG. 3, compound (2) was effective in preventing photodeterioration of polypropylene.
第1図及び第2図は、実施例1及び4により得られた本
発明の錯体である化合物(2)と(86)のC12cg
z中の電子スペクトルをそれぞれ示す。
第3図は、実施例1で得られた本発明の錯体である化合
物(2)を用いて実施9136 IC工って測定したポ
リプロピレンのカルボニルインデックスの変化を示すグ
ラフである。
図中、実栂は本発明の化合物を添加していないポリプロ
ピレンの場合を示し1点f!は本発明の化合物(2)を
添加したポリプロピレンを示す・特許出願人 富士写真
フィルム株式会社第1図
り[1(nmン
第2図
板長(n m)Figures 1 and 2 show C12cg of compounds (2) and (86), which are the complexes of the present invention obtained in Examples 1 and 4.
The electron spectra in z are shown respectively. FIG. 3 is a graph showing the change in the carbonyl index of polypropylene measured using Compound (2), which is the complex of the present invention obtained in Example 1, using an IC. In the figure, 1 point f! indicates the case of polypropylene to which the compound of the present invention is not added. indicates polypropylene added with the compound (2) of the present invention. Patent applicant: Fuji Photo Film Co., Ltd. 1st figure [1 (nm) 2nd figure plate length (nm)
Claims (1)
−エチレンジチオラト)ニッケル誘導体。 ▲数式、化学式、表等があります▼ 式中、R^1〜R^4は、水素原子、アルキル基、アル
コキシ基、フェニル基、アルコキシカルボニル基、アリ
ーロキシカルボニル基を示し、これらは、同じでも異つ
ていてもよく、また、これらのうち隣り合った二つの置
換基は結合して環を形成してもよい。また、二つのR^
4は互いに結合して環を形成してもよい。 R^5、R^6は水素原子、アルキル基、アリール基、
シアノ基を示し、これらは、それぞれ同じでも異つてい
てもよく、R^5とR^6は、結合して環を形成してい
てもよい。 但し、上記一般式において ▲数式、化学式、表等があります▼ ▲数式、化学式、表等があります▼及び ▲数式、化学式、表等があります▼を除く。[Claims] (Dipyridyl) (cis-1,2) represented by the following general formula
- ethylene dithiolat) nickel derivative. ▲There are mathematical formulas, chemical formulas, tables, etc.▼ In the formula, R^1 to R^4 represent a hydrogen atom, an alkyl group, an alkoxy group, a phenyl group, an alkoxycarbonyl group, or an aryloxycarbonyl group, and they may be the same or They may be different, and two adjacent substituents among these may be combined to form a ring. Also, two R^
4 may be bonded to each other to form a ring. R^5 and R^6 are hydrogen atoms, alkyl groups, aryl groups,
It represents a cyano group, which may be the same or different, and R^5 and R^6 may be combined to form a ring. However, in the above general formulas, ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ and ▲ There are mathematical formulas, chemical formulas, tables, etc. ▼ are excluded.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61271114A JPS63126889A (en) | 1986-11-14 | 1986-11-14 | (dipyridyl) (cis-1,2-ethyleneditholato)nickel derivative |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61271114A JPS63126889A (en) | 1986-11-14 | 1986-11-14 | (dipyridyl) (cis-1,2-ethyleneditholato)nickel derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63126889A true JPS63126889A (en) | 1988-05-30 |
JPH0569838B2 JPH0569838B2 (en) | 1993-10-01 |
Family
ID=17495528
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61271114A Granted JPS63126889A (en) | 1986-11-14 | 1986-11-14 | (dipyridyl) (cis-1,2-ethyleneditholato)nickel derivative |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63126889A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001194522A (en) * | 2000-01-11 | 2001-07-19 | Konica Corp | Optical film and its manufacturing method |
US8119037B2 (en) | 2008-10-16 | 2012-02-21 | Novaled Ag | Square planar transition metal complexes and organic semiconductive materials using them as well as electronic or optoelectric components |
DE102008051737B4 (en) | 2007-10-24 | 2022-10-06 | Novaled Gmbh | Square-planar transition metal complexes, organic semiconducting materials, and electronic or optoelectronic devices comprising them and use thereof |
-
1986
- 1986-11-14 JP JP61271114A patent/JPS63126889A/en active Granted
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001194522A (en) * | 2000-01-11 | 2001-07-19 | Konica Corp | Optical film and its manufacturing method |
JP4568934B2 (en) * | 2000-01-11 | 2010-10-27 | コニカミノルタホールディングス株式会社 | Optical film and manufacturing method thereof |
DE102008051737B4 (en) | 2007-10-24 | 2022-10-06 | Novaled Gmbh | Square-planar transition metal complexes, organic semiconducting materials, and electronic or optoelectronic devices comprising them and use thereof |
US8119037B2 (en) | 2008-10-16 | 2012-02-21 | Novaled Ag | Square planar transition metal complexes and organic semiconductive materials using them as well as electronic or optoelectric components |
Also Published As
Publication number | Publication date |
---|---|
JPH0569838B2 (en) | 1993-10-01 |
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