JPS63118603A - Ink film thickness measuring instrument - Google Patents

Ink film thickness measuring instrument

Info

Publication number
JPS63118603A
JPS63118603A JP26459986A JP26459986A JPS63118603A JP S63118603 A JPS63118603 A JP S63118603A JP 26459986 A JP26459986 A JP 26459986A JP 26459986 A JP26459986 A JP 26459986A JP S63118603 A JPS63118603 A JP S63118603A
Authority
JP
Japan
Prior art keywords
spread
detector
ink film
ink
film thickness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26459986A
Other languages
Japanese (ja)
Inventor
Kohei Hasegawa
長谷川 公平
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
Original Assignee
Sumitomo Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd filed Critical Sumitomo Heavy Industries Ltd
Priority to JP26459986A priority Critical patent/JPS63118603A/en
Publication of JPS63118603A publication Critical patent/JPS63118603A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To minimize the influence of the unevenness of the ink surface of a substrate by measuring the spread of an image or the shape of a brightness distribution, etc., with data from a detector and calculating the thickness of an ink film from the measured value. CONSTITUTION:This device consists of a laser light emission device 2, a lens 4, a detector 5, and a computing element 6 and the detector 5 measures the spread of plural projection light beams. At this time, glass which has a refractive index distribution periodically in two directions is regarded as a flat plate 9 which has many small lenses 8 and many convergent light beams 11 obtained by projecting parallel light 10 thereupon are projected on the ink film. Then, the spread of plural projection light beams on the ink surface is measured by a detector 5 and analyzed by the computing element 6. Consequently, as the spread of images becomes larger and larger, relative dispersion becomes lower and lower and the gradient of a graph increases, so that an analytical value of good quality is obtained. Therefore, even if the substrate of the ink surface has unevenness, its influence is minimized, so a decrease in measurement accuracy is eliminated and the ink film thickness is easily measured.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、レーザー光を使用して印刷機に、おけるイ
ンキ膜厚を計測するインキ膜厚計測装置に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an ink film thickness measuring device that uses laser light to measure the ink film thickness in a printing press.

〔従来技術〕[Prior art]

従来、出願人は印刷機におけるインキ膜厚を計測するこ
とができ、印刷機の性能向上および省力化を達成できる
インキ膜厚計測装置を発明し、出願済み(特願昭61−
16149.2号)である。この発明は、第1図に示す
ようにレーザー光発射装置2と検出器5および演算器6
とからなり、ローラ1表面のインキ面にレーザー光発射
装置2よりレーザー光3を当て、そのレーザー光により
生じる像を検出器5で受光し、該検出器5から送られた
データにより像の広がり、または輝度分布の形状、また
は輝度勾配を測定し、その値に基いて演算器6によりロ
ーラ表面のインキ膜厚を算出するものである。
Previously, the applicant has invented an ink film thickness measuring device that can measure the ink film thickness in a printing press, thereby improving the performance of the printing machine and saving labor.
16149.2). As shown in FIG.
A laser beam 3 is applied from a laser beam emitting device 2 to the ink surface of the roller 1, an image generated by the laser beam is received by a detector 5, and the image is spread based on the data sent from the detector 5. , the shape of the brightness distribution, or the brightness gradient, and based on the measured values, the arithmetic unit 6 calculates the ink film thickness on the roller surface.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

しかし、従来のものではインキ面に投射する光は1点で
あった。このため第2図に示すようにインキ面の基板7
が平坦で鏡面状態のときは、インキ膜層での光の広がり
が膜厚を忠実に反映したものとなるが、第3図に示すよ
うに基板7に細かいキズなどの凹凸があった場合には基
板面での光の反射方向がまちまちになり、インキ膜厚と
投射光の広がりの間に不確定な要素をもたらすことにな
って測定精度が低下してしまうという問題があった。
However, in the conventional method, only one point of light is projected onto the ink surface. Therefore, as shown in FIG.
When the substrate 7 is flat and mirror-like, the spread of light in the ink film layer will faithfully reflect the film thickness, but as shown in Figure 3, if the substrate 7 has irregularities such as fine scratches, However, there was a problem in that the direction of light reflection on the substrate surface varied, creating an element of uncertainty between the ink film thickness and the spread of the projected light, resulting in a decrease in measurement accuracy.

この発明は以上の問題点を解決するために創案されたも
ので、インキ面の基板に凹凸があった場合でもその影響
を最小限に抑えることができ、測定精度の低下を防ぐこ
とができるインキ膜厚計測装置を提供することを目的と
する。
This invention was devised to solve the above problems, and is an ink that can minimize the effect of unevenness on the substrate on the ink surface and prevent a decrease in measurement accuracy. The purpose is to provide a film thickness measuring device.

〔問題点を解決するための手段〕[Means for solving problems]

この発明のインキ膜厚計測装置は、ローラ面にレーザー
光発射装置と、そのレーザー光によりインキ面に生じる
像を受光する検出器と、該検出器から送られたデータに
より像の広がり、または輝度分布の形状、または輝度勾
配を測定し、その値に基いてインキ膜厚を算出する演算
器とからなり、前記検出器は複数の投射光の広がりを測
定することを特徴とする。
The ink film thickness measuring device of the present invention includes a laser beam emitting device on a roller surface, a detector that receives an image generated on the ink surface by the laser beam, and data sent from the detector to measure the spread or brightness of the image. The detector is characterized by comprising a calculator that measures the shape of the distribution or the brightness gradient and calculates the ink film thickness based on the value, and the detector measures the spread of a plurality of projected lights.

〔実施例〕〔Example〕

以下、この発明を図面に示す実施例に基いて説明する。 The present invention will be explained below based on embodiments shown in the drawings.

この発明のインキ膜厚計測装置は、基本的には従来例で
述べたようにレーザー光発射装置2とレンズ4と検出器
5と演算器6とからなるが、第4図に示すように前記検
出器5は、複数の投射光の広がりを測定するものである
The ink film thickness measuring device of the present invention basically consists of the laser beam emitting device 2, the lens 4, the detector 5, and the arithmetic unit 6 as described in the conventional example. The detector 5 measures the spread of a plurality of projected lights.

■第1実施例 第5図に示すように屈曲率分布を2方向に周期的にもつ
ガラスを、小さなレンズ(マイクロレンズ)8を多数持
つ平板(マイクロレンズプレート)9と見なし、そこに
平行光10を投射すると多数の集束光11が得られる。
■First Example As shown in Fig. 5, a glass having a periodic refractive index distribution in two directions is regarded as a flat plate (microlens plate) 9 with many small lenses (microlenses) 8, and parallel light is 10, a large number of focused lights 11 are obtained.

この集束光11をインキ膜に投射し、インキ面に生じた
複数の投射光の広がりを、検出器で測定し、演算器で解
析する。
This focused light 11 is projected onto the ink film, and the spread of the plurality of projected lights generated on the ink surface is measured by a detector and analyzed by a computing unit.

■第2実施例 第6図に示すようにセルホックレンズ12を多数配列し
、これに平行光10を投射して多数の集束光11を得る
。なお、第7図は第1実施例および第2実施例の投射パ
ターンを示すものである。
(2) Second Embodiment As shown in FIG. 6, a large number of self-hock lenses 12 are arranged, and parallel light 10 is projected onto them to obtain a large number of focused lights 11. Note that FIG. 7 shows projection patterns of the first embodiment and the second embodiment.

■第3実施例 多数の分離した光を投射すると、ライン状の投射光でも
第1実施例、第2実施例と同様の効果を得ることができ
る。第8図では半円柱形状のレンズ13を複数並列に並
べたものを採用し、ライン状の投射光を多数投射してい
る。第9図はその投射パターンおよび輝度分布を示すも
のである。
(3) Third Embodiment By projecting a large number of separated lights, the same effects as in the first and second embodiments can be obtained even with line-shaped projection light. In FIG. 8, a plurality of semi-cylindrical lenses 13 arranged in parallel are used to project a large number of line-shaped projection lights. FIG. 9 shows the projection pattern and brightness distribution.

■第4実施例 第10図に示すようにコリメータレンズ14を採用して
、第1.第2.第3実施例と同様の効果を得るものであ
る。第11図に示すようにコリメータレンズ14を通過
した光は複数のロール状のパターンを示す。
■Fourth Embodiment As shown in FIG. Second. This provides the same effect as the third embodiment. As shown in FIG. 11, the light passing through the collimator lens 14 shows a plurality of roll-shaped patterns.

■実験結果 第13図〜第15図は第12図に示した各位置a、b、
cでの像の広がりを示すもので、14はコリメータレン
ズ、11は集束光、16は焦点である。また第16図〜
第17図は前記各位ia、b、cの計測結果を示すグラ
フで、縦軸は画素数、横軸はインキ厚さである。これら
の図およびグラフから明らかなように、像の広がりが大
きくなるほど相対分散が低くなり、相対分散が低いほど
グラフの傾斜が高くなって良質な解析値を得ることがで
きる。
■Experimental results Fig. 13 to Fig. 15 are for each position a, b shown in Fig. 12,
It shows the spread of the image at point c, where 14 is a collimator lens, 11 is a focused beam, and 16 is a focal point. Also, Figure 16~
FIG. 17 is a graph showing the measurement results of each of the above-mentioned ia, b, and c, where the vertical axis is the number of pixels and the horizontal axis is the ink thickness. As is clear from these figures and graphs, the larger the spread of the image, the lower the relative dispersion, and the lower the relative dispersion, the higher the slope of the graph, making it possible to obtain high-quality analytical values.

〔発明の効果〕〔Effect of the invention〕

この発明は以上の構成からなり、この発明によればイン
キ面の基板に凹凸があった場合でもその影響を最小限に
抑えることができ、測定精度の低下を防ぎ、しかもイン
キ膜厚を容易に計測することができる。
This invention has the above-mentioned configuration. According to this invention, even if there are irregularities on the substrate on the ink surface, the influence can be minimized, preventing a decrease in measurement accuracy, and moreover, it is possible to easily adjust the ink film thickness. It can be measured.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来例の概念図、第2図〜第4図はインキ面の
基板に当てた投射光の広がりを示す断面図、第5図は第
1実施例を示す斜視図、第6図は第2実施例を示す斜視
図、第7図は第5図、第6図の投射パターンを示す図、
第8図は第3実施例を示す斜視図、第9図は第8図の投
射パターンおよび輝度分布を示す図、第10図は第4実
施例を示す斜視図、第11図は第10図の投射パターン
および輝度分布を示す図、第12図はコリメータレンズ
による集束光を示す概念図、第13図〜第15図はそれ
ぞれ第12図におけるa、b、cの各位置における像の
広がりを示すパターン図、第16図〜第18図はそれぞ
れ第12図におけるa、b、cの各位置における像の計
測結果を示すグラフである。 1・・・・・・ローラ、2・・・・・・レーザー光発射
装置、3・・・・・・レーザー光、4・・・・・・レン
ズ、5・・・・・・検出器、6・・・・・・演算器、7
・・・・・・基板、8・・・・・・マイクロレンズ、 9・・・・・・マイクロレンズプレート、10・・・・
・・平行光、11・・・・・・集束光、12・・・・・
・セルホックレンズ、13・・・・・・レンズ、14・
・・・・・コリメータレンズ、15・・・・・・光16
・・・・・・焦点。 第 1 図 第2図   第3面 第4図 第6図  第7図 +L1 イLll 第12図 第16図    第17図 第18図
Fig. 1 is a conceptual diagram of a conventional example, Figs. 2 to 4 are cross-sectional views showing the spread of the projected light applied to the substrate on the ink surface, Fig. 5 is a perspective view showing the first embodiment, and Fig. 6 is a perspective view showing the second embodiment; FIG. 7 is a diagram showing the projection pattern of FIGS. 5 and 6;
FIG. 8 is a perspective view showing the third embodiment, FIG. 9 is a diagram showing the projection pattern and brightness distribution of FIG. 8, FIG. 10 is a perspective view showing the fourth embodiment, and FIG. Figure 12 is a conceptual diagram showing focused light by a collimator lens, and Figures 13 to 15 show the spread of the image at each position a, b, and c in Figure 12. The pattern diagrams shown in FIGS. 16 to 18 are graphs showing the measurement results of images at positions a, b, and c in FIG. 12, respectively. 1...Roller, 2...Laser light emitting device, 3...Laser light, 4...Lens, 5...Detector, 6... Arithmetic unit, 7
...Substrate, 8...Microlens, 9...Microlens plate, 10...
...Parallel light, 11...Focused light, 12...
・Self-hook lens, 13...Lens, 14・
...Collimator lens, 15... Light 16
······focus. Figure 1 Figure 2 Figure 3 Figure 4 Figure 6 Figure 7 + L1 Illll Figure 12 Figure 16 Figure 17 Figure 18

Claims (1)

【特許請求の範囲】[Claims] ローラ面にレーザー光を当てるレーザー光発射装置と、
そのレーザー光によりインキ面に生じる像を受光する検
出器と、該検出器から送られたデータにより像の広がり
、または輝度分布の形状、または輝度勾配を測定し、そ
の値に基いてインキ膜厚を算出する演算器とからなり、
前記検出器は複数の投射光の広がりを測定することを特
徴とするインキ膜厚計測装置。
a laser beam emitting device that shines a laser beam on the roller surface;
A detector receives the image formed on the ink surface by the laser beam, and the data sent from the detector measures the spread of the image, the shape of the brightness distribution, or the brightness gradient, and the ink film thickness is determined based on the measured value. It consists of a computing unit that calculates
An ink film thickness measuring device, wherein the detector measures the spread of a plurality of projected lights.
JP26459986A 1986-11-06 1986-11-06 Ink film thickness measuring instrument Pending JPS63118603A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26459986A JPS63118603A (en) 1986-11-06 1986-11-06 Ink film thickness measuring instrument

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26459986A JPS63118603A (en) 1986-11-06 1986-11-06 Ink film thickness measuring instrument

Publications (1)

Publication Number Publication Date
JPS63118603A true JPS63118603A (en) 1988-05-23

Family

ID=17405548

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26459986A Pending JPS63118603A (en) 1986-11-06 1986-11-06 Ink film thickness measuring instrument

Country Status (1)

Country Link
JP (1) JPS63118603A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5543919A (en) * 1993-05-14 1996-08-06 Integrated Process Equipment Corp. Apparatus and method for performing high spatial resolution thin film layer thickness metrology

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5543919A (en) * 1993-05-14 1996-08-06 Integrated Process Equipment Corp. Apparatus and method for performing high spatial resolution thin film layer thickness metrology

Similar Documents

Publication Publication Date Title
US20080239267A1 (en) Exposure apparatus and exposure method for exposure apparatus
US20080142681A1 (en) Focus control method
JPH03175327A (en) Method and apparatus for conducting direct phase measurement of electromagnetic rays, particularly light rays
US10101589B2 (en) Optical element, display device, master, and method for manufacturing optical element
TW201221901A (en) Method and device for evaluating surface shape
US7419271B2 (en) Manufacturing method for fine structure element, fine structure element manufactured by the method, spatial light modulator, and projector
CN109212890B (en) Mask, display substrate and manufacturing method thereof
JP3799614B2 (en) Exposure equipment
KR20160061253A (en) Illumination optical apparatus and device manufacturing method
JPS63118603A (en) Ink film thickness measuring instrument
CN104880913A (en) Focusing-leveling system for increasing process adaptability
JPH09133517A (en) Distribution measuring device
JP2939386B2 (en) Painted surface smoothness measuring device
JPS59188931A (en) Height measuring apparatus for wafer
US8139215B2 (en) Method for measuring polarization characteristics and measurement apparatus
JP2720202B2 (en) Gap control method in substrate exposure apparatus
US20210191285A1 (en) A system for making accurate grating patterns using multiple writing columns each making multiple scans
JPS6034699B2 (en) hardness tester
JPH01212338A (en) Apparatus for measuring surface properties of glass plate
CN103307997A (en) Angle resolution scattering measurement device and measurement method thereof
JPS63118604A (en) Ink film thickness measuring instrument
KR20090068838A (en) Apparatus for inspection of surface shape
JP2008288528A5 (en)
JPH07140041A (en) Accuracy inspection method for lenticular sheet using moire pattern
KR100478560B1 (en) Light guide plate having 2-dimensional pattern, and pattern design method thereof