JPS63117074U - - Google Patents
Info
- Publication number
- JPS63117074U JPS63117074U JP749187U JP749187U JPS63117074U JP S63117074 U JPS63117074 U JP S63117074U JP 749187 U JP749187 U JP 749187U JP 749187 U JP749187 U JP 749187U JP S63117074 U JPS63117074 U JP S63117074U
- Authority
- JP
- Japan
- Prior art keywords
- base
- recess
- flange
- outer cylinder
- shape
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002184 metal Substances 0.000 claims description 10
- 238000005452 bending Methods 0.000 claims 1
Landscapes
- Details Of Connecting Devices For Male And Female Coupling (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP749187U JPS63117074U (enrdf_load_stackoverflow) | 1987-01-23 | 1987-01-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP749187U JPS63117074U (enrdf_load_stackoverflow) | 1987-01-23 | 1987-01-23 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63117074U true JPS63117074U (enrdf_load_stackoverflow) | 1988-07-28 |
Family
ID=30790993
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP749187U Pending JPS63117074U (enrdf_load_stackoverflow) | 1987-01-23 | 1987-01-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63117074U (enrdf_load_stackoverflow) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756469U (enrdf_load_stackoverflow) * | 1980-09-19 | 1982-04-02 |
-
1987
- 1987-01-23 JP JP749187U patent/JPS63117074U/ja active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5756469U (enrdf_load_stackoverflow) * | 1980-09-19 | 1982-04-02 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |