JPS63115214U - - Google Patents
Info
- Publication number
- JPS63115214U JPS63115214U JP597787U JP597787U JPS63115214U JP S63115214 U JPS63115214 U JP S63115214U JP 597787 U JP597787 U JP 597787U JP 597787 U JP597787 U JP 597787U JP S63115214 U JPS63115214 U JP S63115214U
- Authority
- JP
- Japan
- Prior art keywords
- suction table
- suction
- wafer
- spin chuck
- rotating shaft
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 3
Landscapes
- Coating Apparatus (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP597787U JPS63115214U (fr) | 1987-01-21 | 1987-01-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP597787U JPS63115214U (fr) | 1987-01-21 | 1987-01-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63115214U true JPS63115214U (fr) | 1988-07-25 |
Family
ID=30788059
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP597787U Pending JPS63115214U (fr) | 1987-01-21 | 1987-01-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63115214U (fr) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142226A (ja) * | 1983-12-27 | 1985-07-27 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 圧力モニタ及び温度補償された圧力測定システム |
| JP2011216520A (ja) * | 2010-03-31 | 2011-10-27 | Dainippon Screen Mfg Co Ltd | 基板保持回転装置および基板処理装置 |
| JP2015170617A (ja) * | 2014-03-04 | 2015-09-28 | 東京エレクトロン株式会社 | 液処理装置 |
| JP2018510772A (ja) * | 2015-03-27 | 2018-04-19 | オブダカット・アーベー | コーティングデバイス用基板を保持する回転プレート |
| JPWO2021070265A1 (fr) * | 2019-10-08 | 2021-04-15 |
-
1987
- 1987-01-21 JP JP597787U patent/JPS63115214U/ja active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142226A (ja) * | 1983-12-27 | 1985-07-27 | ユナイテツド・テクノロジ−ズ・コ−ポレイシヨン | 圧力モニタ及び温度補償された圧力測定システム |
| JP2011216520A (ja) * | 2010-03-31 | 2011-10-27 | Dainippon Screen Mfg Co Ltd | 基板保持回転装置および基板処理装置 |
| JP2015170617A (ja) * | 2014-03-04 | 2015-09-28 | 東京エレクトロン株式会社 | 液処理装置 |
| JP2018510772A (ja) * | 2015-03-27 | 2018-04-19 | オブダカット・アーベー | コーティングデバイス用基板を保持する回転プレート |
| US10919071B2 (en) | 2015-03-27 | 2021-02-16 | Obducat Ab | Rotary plate for holding a substrate for a coating device |
| JPWO2021070265A1 (fr) * | 2019-10-08 | 2021-04-15 | ||
| WO2021070265A1 (fr) * | 2019-10-08 | 2021-04-15 | 株式会社日立ハイテク | Étage d'échantillon et dispositif d'inspection optique |