JPS63106945A - optical disk board - Google Patents
optical disk boardInfo
- Publication number
- JPS63106945A JPS63106945A JP61252280A JP25228086A JPS63106945A JP S63106945 A JPS63106945 A JP S63106945A JP 61252280 A JP61252280 A JP 61252280A JP 25228086 A JP25228086 A JP 25228086A JP S63106945 A JPS63106945 A JP S63106945A
- Authority
- JP
- Japan
- Prior art keywords
- optical disk
- sol
- recording
- disk board
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 238000003980 solgel method Methods 0.000 claims description 3
- 238000001879 gelation Methods 0.000 claims description 2
- 239000010408 film Substances 0.000 description 7
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 206010040925 Skin striae Diseases 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011240 wet gel Substances 0.000 description 1
Landscapes
- Glass Melting And Manufacturing (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は高密度大容量で、非接触で記録再生のできる信
頼性の高い記録方式である元メモリーに用いる光デイス
ク基板に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an optical disk substrate used in a source memory, which has a high density, large capacity, and has a highly reliable recording system that allows non-contact recording and reproduction.
磁気記録方式の１０倍の記録容重の可能な記録方式をし
て元ディスクメモリーが注目されている。Original disk memory is attracting attention because it has a recording method that allows a recording capacity ten times that of magnetic recording.
元ディスクメモリーＵ再生専用型（ＲＯＭ）、追記可能
型（ＤＲＡＷ、ＷＯＲＭ）、書き換え可能型（］！１Ｒ
Ａ８ＡＢＬＥｉ ）がある。いずれも透明基板を用い、
表面に真壁蒸着やスパッタリングで記録膜を形成し、長
面側からの元で薔き込み、！み出し上行なっている。Original disk memory U playback only type (ROM), write-once type (DRAW, WORM), rewritable type (]!1R
A8ABLEi). Both use transparent substrates,
A recording film is formed on the surface by Makabe vapor deposition or sputtering, and it is embedded from the long side. It's going up and down.
特に書き換え可能型が有望とされ、Ｔｅ系統の薄Ｊｌｆ
４ｔ−用いる相変化型、Ｔｅ、Ｆｅ、Ｃｏ等の薄膜を用
いる光磁気型がある。The rewritable type is particularly promising, and Te-based thin Jlf
There is a phase change type using 4T, and a magneto-optical type using a thin film of Te, Fe, Co, etc.
（エレクトロニクス 昭和６１年３月号Ｐ２１）
通常基板材料としてはＰＭＭＡ９ポリカーボネートが用
いられ、これらの表面にはトラッキング用の溝が射出成
型で形成されている。(Electronics, March 1986 issue, P21) PMMA9 polycarbonate is usually used as the substrate material, and tracking grooves are formed on the surface of these by injection molding.
一方石英ガラスの合成方法としてのゾルゲル法は作孔等
に詳しい報皆かめる。On the other hand, the sol-gel method as a method for synthesizing silica glass has detailed information on hole making, etc.
（Ｏ］ｎＲＡＭ工ＯＢＵＬＬＥＴ工Ｎ ＶＯＬ、６４．
Ｎ１１１ 。(O] nRAM OBULLET N VOL, 64.
N111.
Ｐ１４６３，１９８５）
〔発明が解決しょうとする問題点〕
プラスチックを用いる従来の光デイスク基板には以下の
如き問題点を有している。P1463, 1985) [Problems to be Solved by the Invention] Conventional optical disk substrates using plastic have the following problems.
■ 射出時の歪や脈理、厚みバラツキが残りＯＩＭｌ悪
くする。■ Distortion, striae, and thickness variations during injection remain and worsen OIMl.
■ 熱膨張係数が大きく、トラッキングｎ度が悪く、ト
ラッキングが遅い。■ Large thermal expansion coefficient, poor tracking n degree, and slow tracking.
■ 耐熱性が低い為に底膜時に於ける加熱が制約され、
膜本来の特性が出せない。又、記録再生動作に熱印加が
伴なう為にプラスチックでは劣化を起し易い。■ Due to low heat resistance, heating during the bottom film is restricted,
The original characteristics of the film cannot be expressed. Furthermore, since the recording/reproducing operation involves the application of heat, plastics are susceptible to deterioration.
■ 気体の透過率が大きい為に、特に水分全透過してメ
モリー膜を劣化させ長期信頼性に欠ける。■ Due to its high gas permeability, it completely permeates moisture, deteriorating the memory membrane and lacking long-term reliability.
■ 真空中でメモリーｘｔ−ｇ膜する際、ガスを発生し
、膜特性を劣化させる。■ When forming a memory xt-g film in a vacuum, gas is generated and the film properties deteriorate.
■ 透過光の波長領域が制限される。特に短波長域の透
過率が悪い為に高密直配−の為の短波長光による記録及
び再生が不可能である。■ The wavelength range of transmitted light is limited. In particular, since the transmittance in the short wavelength region is poor, recording and reproducing using short wavelength light for high-density direct connection is impossible.
本発明による光デイスク基板はゾルゲル法により合成し
、ゲル化の際に案内溝をｍ成し九石英ガラスエリなるこ
とを特徴とする。The optical disk substrate according to the present invention is synthesized by a sol-gel method, and is characterized by forming guide grooves during gelation and being made of quartz glass.
エチルシリケート１０Ｋｆ’ｊｉ水１１Ｋｆと塩酸１２
で加水分解しｔ後、二酸化硅素微粉末ｌｉ添加混合分散
した。十分分散させた後アンモニア水を滴下し、ＰＨを
４に調整してゾルを得几。Ethyl silicate 10Kf'ji water 11Kf and hydrochloric acid 12
After hydrolyzing with t, silicon dioxide fine powder li was added and mixed and dispersed. After sufficient dispersion, ammonia water was added dropwise and the pH was adjusted to 4 to obtain a sol.
次に第１図に示す様なゲル化容器にゾルを注入し尺、ゲ
ル化容器は型Ａ・１と型Ｂ・２とよりなり、型Ａ・１に
はその表面にＮ１電鋳で作製され、高さ１２μｍでピッ
チが五２μｍの案内溝３の反ｆ、 ハｐ−ンが形成され
几スタンパ−４が貼！７ツｆｆられている。型Ｂ・２に
は深さ２．５ｍで内径１８ｃｍ１ｌの円型状の空腔５が
形成され、更にこの空腔５に通じる様にゾル注入口６が
設けられている。Next, the sol is injected into a gelling container as shown in Figure 1.The gelling container consists of mold A.1 and mold B.2, and mold A.1 has N1 electroformed on its surface. Then, the grooves 3 of the guide grooves 3 with a height of 12 μm and a pitch of 52 μm are formed, and the stamper 4 is pasted! 7 ffs have been given. A circular cavity 5 with a depth of 2.5 m and an inner diameter of 18 cm 1 l is formed in the mold B-2, and a sol injection port 6 is further provided so as to communicate with this cavity 5.
型Ａ・１とｍＢ・２を密着固定しｔ後ゾル注入口６から
ゾル全注入する。３０℃２４時間の熟成の後、型Ａ１と
型Ｂ２を分解し、内部のウェットゲル２ｓｏ℃の純水中
に浸漬した後、別の容器で６０℃ｏｙ、、燥を行ない、
更に真空炉中で１１５０’Ｃ（Ｄｍ［−２ＦＱ闇行’ｌ
’：）几。The molds A.1 and mB.2 are tightly fixed, and after t, the entire sol is injected from the sol injection port 6. After aging at 30°C for 24 hours, mold A1 and mold B2 were disassembled, the wet gel inside was immersed in pure water at 2so°C, and then dried at 60°C in a separate container.
Further, in a vacuum furnace at 1150'C (Dm[-2FQ dark row'l
':) 几.
深さくＬ１μｍで１．６μｍピッチの案内溝の形成され
九五５インチ径の石英ガラス製の元メモリー基板が得ら
れｔ。An original memory substrate made of quartz glass with a diameter of 955 inches was obtained, in which guide grooves were formed with a depth L of 1 μm and a pitch of 1.6 μm.
以上述べ九如く、本発明に工ればメモリー薄膜ＳＣ膜時
に高温か印加できて高品質のメモリー膜が得られ、基板
自体に歪や脈理、厚みむらなどがカい為に０７Ｎ特性が
良く、熱膨張係数が２Ｘ１Ｇ′Ｆと小さい為にトラッキ
ング絹にの良い光デイスク基板が得られた。特に本発明
の基板は書き換え可能型の光磁気記録方式に寂適である
。更に本発明による基板は気体を全く通過しない為に長
期信頼性が高く、又２００ｎｍの波長域でも９０％以上
の透過率が確保でき、紫外光にＬる高密度記録も可能と
なつｔ。As stated above, if the present invention is applied, high temperature can be applied during the memory thin film SC film formation, and a high quality memory film can be obtained, and the substrate itself has good 07N characteristics because there are no distortions, striae, or thickness unevenness. Since the coefficient of thermal expansion was as small as 2×1 G'F, an optical disk substrate with good tracking properties was obtained. In particular, the substrate of the present invention is suitable for rewritable magneto-optical recording systems. Furthermore, the substrate according to the present invention has high long-term reliability because it does not allow gas to pass through it at all, and can also ensure transmittance of 90% or more even in the wavelength range of 200 nm, making it possible to perform high-density recording even with ultraviolet light.
第１図は本発明の詳細な説明するゲル化容器の断面内で
ある。
１−一一型 Ａ
２・・・型Ｂ
５・・・案内溝反転パターン
４・・・スタンパ−
５・・・空腔
６・・・ゾル注入口
以上FIG. 1 is a cross-sectional view of a gelling container that provides a detailed explanation of the present invention. 1-11 type A 2... Type B 5... Guide groove reversal pattern 4... Stamper 5... Cavity 6... Sol injection port or above
Claims (1)
た石英ガラスよりなることを特徴とする光ディスク基板
。An optical disk substrate characterized by being made of quartz glass synthesized by a sol-gel method and forming guide grooves during gelation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61252280A JPS63106945A (en) | 1986-10-23 | 1986-10-23 | optical disk board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61252280A JPS63106945A (en) | 1986-10-23 | 1986-10-23 | optical disk board |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63106945A true JPS63106945A (en) | 1988-05-12 |
Family
ID=17235050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61252280A Pending JPS63106945A (en) | 1986-10-23 | 1986-10-23 | optical disk board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63106945A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7043940B2 (en) * | 2002-03-15 | 2006-05-16 | Yazaki Corporation | Method for making thin fused glass articles |
-
1986
- 1986-10-23 JP JP61252280A patent/JPS63106945A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7043940B2 (en) * | 2002-03-15 | 2006-05-16 | Yazaki Corporation | Method for making thin fused glass articles |
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