JPS63106721A - Illuminating device - Google Patents
Illuminating deviceInfo
- Publication number
- JPS63106721A JPS63106721A JP61253454A JP25345486A JPS63106721A JP S63106721 A JPS63106721 A JP S63106721A JP 61253454 A JP61253454 A JP 61253454A JP 25345486 A JP25345486 A JP 25345486A JP S63106721 A JPS63106721 A JP S63106721A
- Authority
- JP
- Japan
- Prior art keywords
- light source
- scanning
- illuminance
- secondary light
- forming means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005286 illumination Methods 0.000 claims description 16
- 230000004907 flux Effects 0.000 abstract description 10
- 230000003287 optical effect Effects 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 description 9
- 241000257465 Echinoidea Species 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000003384 imaging method Methods 0.000 description 5
- 230000001427 coherent effect Effects 0.000 description 3
- 230000001186 cumulative effect Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000001459 lithography Methods 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lasers (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
【発明の詳細な説明】
−(産業上の利用分野)
本発明は照明装置に関し、特に半導体製造において可干
渉性の良い高輝度のレーザー等の光源な用いて被照射面
である電子回路等の微細パターンが形成されているマス
ク面やレチクル面等を照明する際に光の干渉により生ず
る被照射面上の干渉縞による照明ムラを軽減し、均一な
る照明を行った照明装置に関するものである。Detailed Description of the Invention - (Industrial Application Field) The present invention relates to a lighting device, and in particular, in semiconductor manufacturing, a light source such as a high-intensity laser with good coherence is used to illuminate an irradiated surface such as an electronic circuit. The present invention relates to an illumination device that reduces illumination unevenness due to interference fringes on an irradiated surface caused by light interference when illuminating a mask surface, reticle surface, etc. on which a fine pattern is formed, and provides uniform illumination.
(従来の技術)
最近の半導体製造技術には電子回路の高集積化に伴い、
高密度の電子回路パターンが形成可能のりソグラフィ技
術が要求されている。(Conventional technology) Recent semiconductor manufacturing technology includes high integration of electronic circuits.
There is a need for a lithography technique that can form high-density electronic circuit patterns.
一般にマスク又はレチクル面上の電子回路パターンをウ
ニ八面上に転写する場合、ウニへ面上に転写される電子
回路パターンの解像線幅は光源の波長に比例してくる。Generally, when an electronic circuit pattern on a mask or reticle is transferred onto the surface of a sea urchin, the resolution line width of the electronic circuit pattern transferred onto the surface of the sea urchin is proportional to the wavelength of the light source.
この為波長200〜300nmの遠紫外(ディープUV
領域)の短い波長を発振する、例えば超高圧水銀灯やキ
セノン水銀ランプ等が用いられている。しかしながらこ
れらの光源は低輝度で指向性もなく、しかもウニへ面上
に塗布するフォトレジストの感光性も低い為、露光時間
が長くなりスルーブツトを低下させる原因となっていた
。For this reason, far ultraviolet light (deep UV) with a wavelength of 200 to 300 nm is used.
For example, ultra-high-pressure mercury lamps, xenon mercury lamps, etc., which oscillate short wavelengths in the region) are used. However, these light sources have low brightness and no directivity, and the photoresist applied to the surface of the sea urchin also has low photosensitivity, resulting in a long exposure time and a reduction in throughput.
一方最近エキシマ(excimer)レーザーというデ
ィープUV領域に発振波長を有する光源が開発され、そ
の高輝度性、単色性、指向性等の良さからりソグラフィ
技術への応用が種々研究されている。しかしながらエキ
シマレーザ−を用いると多くの場合レーザー特有の可干
渉性により、即ちコヒーレンスが良い為、マスク面やウ
ニへ面の不完全さや照明系の光学特性等が原因して、マ
スク面やウニ八面上に不規則な干渉縞が発生してくる。On the other hand, recently, a light source called an excimer laser having an oscillation wavelength in the deep UV region has been developed, and its application to lithography technology is being studied in various ways because of its high brightness, monochromaticity, directivity, etc. However, when using an excimer laser, in many cases, due to the laser's unique coherence, that is, good coherence, the mask surface or sea urchin surface may be damaged due to imperfections on the mask surface or the surface of the sea urchin, or the optical characteristics of the illumination system. Irregular interference fringes appear on the surface.
この干渉縞は照明ムラや焼付は誤差を起こしマスクパタ
ーン像の解像力を低下させる大きな原因となってくる。These interference fringes cause errors in illumination unevenness and burn-in, and are a major cause of lowering the resolution of the mask pattern image.
コヒーレンスの軽減を図る方法としては例えばレーザー
からの光束をスポット状に集光し、該光束をコンデンサ
ーレンズに導光する際、コンデンサーレンズの瞳面を光
学的に走査する方法があるが、この方法は光束の照度ム
ラが直接風われてくる欠点がある。又被照射面を直接走
査する方法があるが、この方法は被照射面上を完全に走
査するのが難しい等の欠点があった。この他例えばハエ
ノ眼レンズ等の2次光源形成手段への光束の入射角を変
化させ走査する方法があるが、この方法は比較的照度ム
ラは軽減されるが、微視的なハエノ眼しンズ間から生ず
る干渉縞を消去するのが難しい等の欠点があった。One method for reducing coherence is, for example, to condense the light beam from a laser into a spot and optically scan the pupil plane of the condenser lens when guiding the light beam to a condenser lens. has the disadvantage that the uneven illuminance of the luminous flux is directly affected by the wind. There is also a method of directly scanning the irradiated surface, but this method has the disadvantage that it is difficult to completely scan the irradiated surface. In addition, there is a method of scanning by changing the angle of incidence of the light beam on the secondary light source forming means, such as a fly's eye lens, but this method relatively reduces illuminance unevenness, but the microscopic fly's eye lens There are drawbacks such as difficulty in erasing interference fringes that occur between the two.
(発明が解決しようとする問題点)
本発明はレーザー等の可干渉性の良い高輝度の光源を用
いた際に被照射面上に生じる照度ムラの原因となる干渉
縞の軽減を図り、被照射面の均一照明を可能とした照明
装置の提供を目的とする。(Problems to be Solved by the Invention) The present invention aims to reduce interference fringes that cause uneven illuminance that occurs on the irradiated surface when a high-intensity light source with good coherence, such as a laser, is used. The purpose of the present invention is to provide a lighting device that enables uniform illumination of an irradiation surface.
(問題点を解決する為の手段)
可干渉性の良い光源からの光束を走査手段を介して2次
光源形成手段に導光し、該2次光源形成手段からの光束
を用いて照明手段により被照射面上を照明する際、該被
照射面上の積算された照度分布が予め設定された照度分
布内に入るように走査制御手段により前記走査手段の走
査状態を制御したことである。(Means for solving the problem) A light beam from a light source with good coherence is guided to a secondary light source forming means through a scanning means, and the light beam from the secondary light source forming means is used to illuminate the illumination means. When illuminating the irradiated surface, the scanning state of the scanning means is controlled by the scanning control means so that the integrated illuminance distribution on the irradiated surface falls within a preset illuminance distribution.
(実施例)
第1図は本発明の一実施例の光学系の概略図である。図
中1は可干渉性の良い光束を放射する光源で、例えばエ
キシマレーザ−等である。2は走査手段であり、例えば
可動ミラー等から成り回転若しくは振動により光源1か
らの光束を走査してビーム拡大器4に入射させている。(Embodiment) FIG. 1 is a schematic diagram of an optical system according to an embodiment of the present invention. In the figure, reference numeral 1 denotes a light source that emits a highly coherent light beam, such as an excimer laser. Reference numeral 2 denotes a scanning means, which is composed of, for example, a movable mirror, and rotates or vibrates to scan the light beam from the light source 1 and make it enter the beam expander 4.
5は2次光源形成手段であり、例えば複数のハエノ眼レ
ンズ等から成り、ビーム拡大器4を介して拡大されてき
た光束を入射面5aより導入している。これにより2次
光源形成手段5の射出面5bに2次光源面を形成してい
る。6はハーフミラ−であり2次光源面5bから射出し
てきた光束を2つの光束に分割している。7は照明手段
であり、例えばコンデンサーレンズ等から成り、ハーフ
ミラ−6からの反射光束を、例えば半導体製造用のマス
ク面若しくはレチクル面である被照射面8に入射させて
いる。9は結像レンズであり被照射面8上のパターンを
ウニへ面等の結像面10上に所定倍率で投影している。Reference numeral 5 denotes a secondary light source forming means, which is composed of, for example, a plurality of fly's eye lenses, and introduces the light beam expanded through the beam expander 4 from the entrance surface 5a. Thereby, a secondary light source surface is formed on the exit surface 5b of the secondary light source forming means 5. A half mirror 6 divides the light beam emitted from the secondary light source surface 5b into two light beams. Reference numeral 7 denotes an illumination means, which is composed of, for example, a condenser lens or the like, and makes the reflected light beam from the half mirror 6 incident on an irradiated surface 8, which is, for example, a mask surface or a reticle surface for semiconductor manufacturing. Reference numeral 9 denotes an imaging lens which projects the pattern on the irradiated surface 8 onto an imaging surface 10 such as a sea urchin surface at a predetermined magnification.
11は副照明手段でハーフミラ−6を介し照明手段7と
光学的に等価な位置に配置されており、ハーフミラ−6
を通過した光束を被照射面8と光学的に等価の位置に配
置している副液照射面12に入射させている。13は投
影系でビーム拡大器若しくは顕微鏡等から成り、副液照
射面12上に積算された照度分布なCCD等の照度検出
手段14上に投影している。15は走査制御手段で照度
検出手段14からの出力信号に基づいて予め定められた
シーケンスにより走査手段2の走査を制御してビーム拡
大器4を介して2次光源形成手段5への光束の入射角を
調整している。Reference numeral 11 denotes sub-illumination means, which is arranged at a position optically equivalent to the illumination means 7 through the half mirror 6.
The light flux that has passed through is made incident on a sub-liquid irradiation surface 12 which is arranged at a position optically equivalent to the irradiation surface 8. Reference numeral 13 denotes a projection system, which is composed of a beam expander, a microscope, etc., and projects an integrated illuminance distribution onto the auxiliary liquid irradiation surface 12 onto an illuminance detection means 14 such as a CCD. Reference numeral 15 denotes a scanning control means which controls the scanning of the scanning means 2 according to a predetermined sequence based on the output signal from the illuminance detection means 14, and makes the light flux incident on the secondary light source forming means 5 via the beam expander 4. Adjusting the corner.
本実施例では以上の構成により照度検出手段14からの
出力信号を利用して走査制御手段15により走査手段2
の走査を制御し、2次光源形成手段5への光束の入射角
を変化させることにより被照射面8上の照度分布のムラ
を調整している。In this embodiment, with the above configuration, the scanning control means 15 uses the output signal from the illuminance detection means 14 to control the scanning means 2.
The unevenness of the illuminance distribution on the irradiated surface 8 is adjusted by controlling the scanning of and changing the angle of incidence of the light beam onto the secondary light source forming means 5.
第2図は走査手段2の走査により2次光源形成手段5の
入射面5aに入射する光束の入射角を変化させたときの
被照射面8上に入射する光束の光路を示す説明図である
。FIG. 2 is an explanatory diagram showing the optical path of the light beam incident on the irradiated surface 8 when the angle of incidence of the light beam incident on the incident surface 5a of the secondary light source forming means 5 is changed by scanning by the scanning means 2. .
本実施例のように2次光源形成手段5としてハエノ眼レ
ンズを用い、これを−次元に配列したときは等価的に複
数のスリットを一次元に配列したのと同じになる。この
為走査手段2で光束を走査しない場合、即ちハエノ眼レ
ンズにコヒーレントな光束が入射した場合には各ハエノ
眼レンズを通過したコヒーレントな光束が互いに被照射
面8上で干渉し、例えば第3図に示すような干渉縞を形
成する。この結果、被照射面8上の照度ムラが大きくな
り、例えば被照射面8上のパターンを投影レンズ9で結
像面10上に投影する場合には結像性能を大きく低下さ
せる原因となってくる。As in this embodiment, when a fly's eye lens is used as the secondary light source forming means 5 and is arranged in a negative dimension, it is equivalently equivalent to arranging a plurality of slits in one dimension. Therefore, when the scanning means 2 does not scan the light beam, that is, when a coherent light beam is incident on the fly's eye lens, the coherent light beams that have passed through each fly's eye lens interfere with each other on the irradiated surface 8. Interference fringes as shown in the figure are formed. As a result, the illuminance unevenness on the irradiated surface 8 increases, which causes a significant decrease in imaging performance when, for example, a pattern on the irradiated surface 8 is projected onto the imaging surface 10 with the projection lens 9. come.
しかしながらエキシマレーザ−等のパルスレーザ−を用
いる場合、走査手段2を構成する可動ミラーを単に振動
させて2次光源形成手段5への光束の入射角φをランダ
ムに変化させたのでは有限が走査数では被照射面8上の
積算された照度分布は、例えば第4図に示すようになり
、照度ムラを完全に除去することはできない。However, when using a pulsed laser such as an excimer laser, simply vibrating the movable mirror constituting the scanning means 2 and randomly changing the incident angle φ of the light beam to the secondary light source forming means 5 results in a finite amount of scanning. In terms of numbers, the integrated illuminance distribution on the irradiated surface 8 is as shown in FIG. 4, for example, and it is not possible to completely eliminate illuminance unevenness.
そこで本実施例では被照射面8上の照度分布と光学的な
等価な副液照射面12上の照度分布を投影系13を介し
照度検出手段14より検出し、このときの照度検出手段
14からの出力信号に基づいて走査制御子設工5で走査
手段2の走査をパルス発光時期と対応させて制御するこ
とにより、被照射面8上の照度分布が例えば第5図に示
すような均一分布となるようにしている。Therefore, in this embodiment, the illuminance distribution on the subliquid irradiation surface 12, which is optically equivalent to the illuminance distribution on the irradiated surface 8, is detected by the illuminance detection means 14 via the projection system 13, and By controlling the scanning of the scanning means 2 in accordance with the pulse emission timing by the scanning control sub-device 5 based on the output signal of I am trying to make it so that
即ち照度検出手段14によって各走査毎に生ずるヤング
の干渉縞のピーク位置及びピーク間隔を測定し、2次光
源形成手段5への光束の入射角の情報を得、これを走査
制御手段15のシーケンスにより全走査の積算分布が所
定の照度分布となるように、走査手段2を制御し光束の
入射角φを調整している。これにより第3図に示す不均
一な照度ムラの原因となっているピーク位置3aが矢印
の方向に所定の速度で移動するようにして被照射面8上
の照度ムラを除去している。又これと共に2次光源形成
手段5からの射出光束のインコヒーレント化を図り、装
置全体の光学性能が2次光源形成手段からの光束のN、
Aで略決定出来るようにしている。That is, the illuminance detection means 14 measures the peak position and peak interval of Young's interference fringes that occur for each scan, obtains information on the incident angle of the light beam to the secondary light source forming means 5, and uses this information as the sequence of the scan control means 15. The scanning means 2 is controlled and the incident angle φ of the light beam is adjusted so that the integrated distribution of all scans becomes a predetermined illuminance distribution. As a result, the peak position 3a, which is the cause of the non-uniform illuminance unevenness shown in FIG. 3, moves at a predetermined speed in the direction of the arrow, thereby eliminating the illuminance unevenness on the irradiated surface 8. At the same time, the light flux emitted from the secondary light source forming means 5 is made incoherent, and the optical performance of the entire device is reduced to N of the light flux from the secondary light source forming means.
I made it possible to make a general decision with A.
尚本実施例において照度検出手段14で積算照度分布の
強度ムラを求めれば2次光源形成手段のコヒーレンス度
、即ち被照射面でのコヒーレンス度を求めることができ
る。In this embodiment, if the intensity unevenness of the cumulative illuminance distribution is determined by the illuminance detection means 14, the degree of coherence of the secondary light source forming means, that is, the degree of coherence at the irradiated surface can be determined.
第1図の実施例において投影系13を用いず照度検出手
段14を直接側被照射面12上に配置しても良い。又ビ
ーム拡大器4を用いず光源1からの光束を直接2次光源
形成手段5に入射させるようにしても良い。In the embodiment shown in FIG. 1, the illuminance detection means 14 may be placed directly on the side illuminated surface 12 without using the projection system 13. Alternatively, the beam from the light source 1 may be made to directly enter the secondary light source forming means 5 without using the beam expander 4.
(発明の効果)
本発明によれば被照射面と光学的に等価な副液照射面上
に配置した照度検出手段により積算照度分布を検出し、
即ち被照射面上のヤングの干渉縞のピーク位置とピーク
間隔等を検出し、最適な走査を行って光束を2次光源形
成手段に入射させることにより、可干渉性の良い光源を
用いたときの被照射面上の照度ムラの軽減を図り、被照
射面のコヒーレンスが照明系のN、Aのみで決定できる
ような良好なる照度分布を有した照明装置を達成するこ
とができる。(Effects of the Invention) According to the present invention, the integrated illuminance distribution is detected by the illuminance detection means disposed on the subliquid irradiation surface that is optically equivalent to the irradiated surface,
In other words, when a light source with good coherence is used by detecting the peak position and peak interval of Young's interference fringes on the irradiated surface, performing optimal scanning, and making the light beam incident on the secondary light source forming means. It is possible to reduce the unevenness of illuminance on the irradiated surface, and to achieve an illumination device having a good illuminance distribution such that the coherence of the irradiated surface can be determined only by N and A of the illumination system.
第1図は本発明の一実施例の光学系の概略図、第2図は
第1図の一部分の説明図、第3図は走査を行わないとき
の被照射面上の積算照度分布の説明図、第4図、第5図
は走査を行ったときの被照射面上の積算照度分布の説明
図である。
図中1は光源、2は走査手段、5は2次光源形成手段、
7は照明手段、8は被照射面、9は結像レンズ、10は
結像面、11は副照明手段、12は副液照射面、13は
投影系、14は照度検出手段、15は走査制御手段であ
る。
特許出願人 キャノン株式会社
夷 1 回
1ζ
裾 3 図
第 4 図
晃 5 図Fig. 1 is a schematic diagram of an optical system according to an embodiment of the present invention, Fig. 2 is an explanatory diagram of a part of Fig. 1, and Fig. 3 is an explanation of the cumulative illuminance distribution on the irradiated surface when no scanning is performed. 4 and 5 are explanatory diagrams of the cumulative illuminance distribution on the irradiated surface when scanning is performed. In the figure, 1 is a light source, 2 is a scanning means, 5 is a secondary light source forming means,
7 is an illumination means, 8 is an irradiation surface, 9 is an imaging lens, 10 is an image formation surface, 11 is a sub-illumination means, 12 is a sub-liquid irradiation surface, 13 is a projection system, 14 is an illuminance detection means, 15 is a scanning It is a control means. Patent applicant: Canon Co., Ltd. 1 time 1ζ Hem 3 Figure 4 Figure 5 Figure 5
Claims (2)
て2次光源形成手段に導光し、該2次光源形成手段から
の光束を用いて照明手段により被照射面上を照明する際
、該被照射面上の積算された照度分布が予め設定された
照度分布内に入るように走査制御手段により前記走査手
段の走査状態を制御したことを特徴とする照明装置。(1) The light beam from the light source with good coherence is guided to the secondary light source forming means via the scanning means, and the light beam from the secondary light source forming means is used to illuminate the surface to be illuminated by the illumination means. An illumination device characterized in that the scanning state of the scanning means is controlled by a scanning control means so that the integrated illuminance distribution on the irradiated surface falls within a preset illuminance distribution.
制御手段により該可動ミラーの回転若しくは振動を制御
し、前記光源からの光束の前記2次光源形成手段への入
射角を変化させたことを特徴とする特許請求の範囲第1
項記載の照明装置。(2) The scanning means is constituted by a movable mirror, and the rotation or vibration of the movable mirror is controlled by the scanning control means to change the angle of incidence of the light beam from the light source onto the secondary light source forming means. Claim 1 characterized by
The lighting device described in Section 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61253454A JP2606797B2 (en) | 1986-10-24 | 1986-10-24 | Illumination device and illumination method using the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP61253454A JP2606797B2 (en) | 1986-10-24 | 1986-10-24 | Illumination device and illumination method using the same |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63106721A true JPS63106721A (en) | 1988-05-11 |
JP2606797B2 JP2606797B2 (en) | 1997-05-07 |
Family
ID=17251619
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP61253454A Expired - Lifetime JP2606797B2 (en) | 1986-10-24 | 1986-10-24 | Illumination device and illumination method using the same |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2606797B2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59226317A (en) * | 1983-06-06 | 1984-12-19 | Nippon Kogaku Kk <Nikon> | Illuminating device |
-
1986
- 1986-10-24 JP JP61253454A patent/JP2606797B2/en not_active Expired - Lifetime
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59226317A (en) * | 1983-06-06 | 1984-12-19 | Nippon Kogaku Kk <Nikon> | Illuminating device |
Also Published As
Publication number | Publication date |
---|---|
JP2606797B2 (en) | 1997-05-07 |
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